CN110144535A - A method of changing Hastelloy surface crystal orientation - Google Patents
A method of changing Hastelloy surface crystal orientation Download PDFInfo
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- CN110144535A CN110144535A CN201910497332.8A CN201910497332A CN110144535A CN 110144535 A CN110144535 A CN 110144535A CN 201910497332 A CN201910497332 A CN 201910497332A CN 110144535 A CN110144535 A CN 110144535A
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- hastelloy
- handling member
- electron beam
- current pulsed
- orientation
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/02—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working in inert or controlled atmosphere or vacuum
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
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- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
A method of changing Hastelloy surface crystal orientation.It includes the pretreatment for selecting commercially available Hastelloy material as handling member, including handling member surface is polished, polished and cleaned；Pretreated handling member is placed in high-current pulsed electron beam vacuum specimen chamber, then start high-current pulsed electron beam equipment, handling member is bombarded using the high-current pulsed electron beam that the equipment issues, thus the crystal orientation for changing handling member surface, obtains the Hastelloy material of preferable grain orientation.The invention has the advantages that high-current pulsed electron beam can be modified its surface in the case where not damaging Hastelloy material, and it is extremely short because of beam bombardment action time, material surface energy generates the physical chemical phenomenons such as quickly solidification, vaporization, therefore surface composition homogenizes.The Hastelloy material surface crystal grain refinement and preferred orientation handled by high-current pulsed electron beam can be observed by electron backscatter diffraction and be verified, while twin occurs in surface.
Description
Technical field
The invention belongs to Hastelloy process for modifying surface fields, and in particular to a kind of to be bombarded using high-current pulsed electron beam
Method to change Hastelloy surface crystal orientation.
Background technique
Nickel alloy is widely used in various components due to its excellent mechanical property.The title of Hastelloy is from English
Literary " Hastelloy " is that one kind of Hastelloy international corporation, the U.S. (Haynes International, INC.) production is anti-corrosion
Nickel-base alloy.Currently, the said firm mainly develops the alloy of two big series, i.e. high temperature resistant and corrosion-resistant Hastelloy.Hastelloy
Aircraft industry has been widely used in it, with the development of aircraft industry, the requirement for its military service performance is higher and higher, that is, needs the conjunction
Gold works at higher temperature and more harsh environment.
From the point of view of microstructure, in general polycrystal, each crystal grain has the crystalline orientation different from vincial faces, from entirety
It sees, the orientation of all crystal grains is Arbitrary distribution；In some cases, the crystal grain of crystal surrounds certain special to varying degrees
Orientations, be known as preferred orientation or abbreviation texture.Texture directly affects the physics, chemistry and mechanical property of material.
High-current pulsed electron beam (HCPEB) technology is a kind of material processing method, in its process to material surface bombardment
In, huge energy is to accelerate electronics to be forcedly injected material surface within the time of Microsecond grade as carrier.It is produced in modifying process
Raw Thermal-mechanical Coupling effect can make material surface Surface Texture occur, and then change the surface property of alloy.
Currently, the Hastelloy surface microstructure growth directly cast out is mixed and disorderly unordered, electron backscatter diffraction can not be utilized
(EBSD) observational study is carried out.
Summary of the invention
To solve the above-mentioned problems, the purpose of the present invention is to provide a kind of sides of change Hastelloy surface crystal orientation
Method.
In order to achieve the above object, the method provided by the invention for changing Hastelloy surface crystal orientation includes in order
The following steps of progress:
1) it selects commercially available Hastelloy material as handling member, then the surface of handling member is polished, is polished and clearly
Pretreatment including washing；
2) pretreated handling member is placed in high-current pulsed electron beam vacuum specimen chamber, is then started strong current pulsed
Electron beam equipment bombards handling member using the high-current pulsed electron beam that the equipment issues, and thus changes handling member surface
Crystal orientation, obtain the Hastelloy material of preferable grain orientation.
In step 1), the grinding process uses waterproof abrasive paper, and polishing treatment uses diamond polishing agent, cleaning treatment
Using ultrasonic wave and ethyl alcohol.
In step 2), acceleration voltage used in the bombardment process is 27kV, and target source distance is 20cm, and energy is close
Degree is 3J/cm2, the burst length is 1.5 μ s, is bombarded number 1~20 time.
The method provided by the invention for changing Hastelloy surface crystal orientation is breathed out using high-current pulsed electron beam bombardment
Family name's alloy material, by transient heating, energy sedimentation time is short on the surface of the material in the process, and S. E. A. is high, material
The melting of surface moment and quickly solidification, and so that crystal grain orientation is changed during recrystallization.
Compared with prior art, the method provided by the invention for changing Hastelloy surface crystal orientation has following excellent
Point:
1, high-current pulsed electron beam can be modified its surface in the case where not damaging Hastelloy material, and because
It is extremely short for beam bombardment action time, material surface energy generate quickly solidification, vaporization etc. physical chemical phenomenons, therefore surface at
Divide homogenization.
2, by the Hastelloy material surface crystal grain refinement and preferred orientation of high-current pulsed electron beam processing, can pass through
Electron backscatter diffraction observation verifying, while there is twin in surface.
Detailed description of the invention
Fig. 1 is the Hastelloy scanning of materials electron microscope surface topography map not bombarded.
Fig. 2 is the Hastelloy scanning of materials electron microscope surface topography map that 5 times are bombarded using the method for the present invention.
Fig. 3 is the Hastelloy scanning of materials electron microscope Cross Section Morphology figure that 5 times are bombarded using the method for the present invention.
Fig. 4 is that the Hastelloy material electronics back scattering diffraction crystal grain bombarded under number using the method for the present invention difference is orientated
Figure, wherein Fig. 4 (a) is the primary Hastelloy material of bombardment, and Fig. 4 (b) is the Hastelloy material for bombarding 5 times, and Fig. 4 (c) is
The Hastelloy material that bombardment is 10 times, Fig. 4 (d) are the Hastelloy material for bombarding 20 times, and Fig. 4 (e) is.
Specific embodiment
The present invention is described in further detail in the following with reference to the drawings and specific embodiments.
One, embodiment
The method provided in this embodiment for changing Hastelloy surface crystal orientation includes the following steps carried out in order:
1) it selects commercially available Hastelloy X as handling member, successively uses the waterproof abrasive paper of 600#, 1000#, 1200# and 1500#
Grinding process is carried out to handling member surface step by step, is polished after ethyl alcohol cleaning using 0.5 μm of granularity of diamond polishing agent, it
By spare after ultrasonic cleaning and ethanol.
2) pretreated handling member is placed in high-current pulsed electron beam vacuum specimen chamber, and be fixed on
Then the vertical bombardment face of Nadezhda-2 type high-current pulsed electron beam equipment starts the high-current pulsed electron beam equipment, utilize
The high-current pulsed electron beam that the equipment issues bombards handling member, thus changes the crystal orientation on handling member surface, obtains
The Hastelloy material of preferable grain orientation.Wherein, the parameter of high-current pulsed electron beam bombardment are as follows: acceleration voltage 27kV, target source
Distance 20cm, energy density about 3J/cm2, 1.5 μ s of burst length, bombardment number be respectively 1,5,10,20 time.
Two, Hastelloy material modification layer Microstructure characterization and the performance detection experiment of preferable grain orientation
The first step, configure " Glyceregia " corrosive agent, after using cotton swab to dip the corrosive agent wiping as sample not
The surface 60s of 5 handling member of bombardment processing part and bombardment, the sample after being corroded；
Second step observes the sample pattern after above-mentioned corrosion using scanning electron microscope (SEM).Examination is not bombarded
The surface topography of sample is as shown in Figure 1, the surface topography of 5 samples of bombardment is as shown in Figure 2.It can be seen from the figure that not bombarding examination
The grain boundaries corrosion of sample is got deeply stuck in, and the crystal boundary for bombarding 5 samples is white, illustrates that grain boundaries corrosion condition obviously weakens.Fig. 3 is to bang
The sectional view for hitting 5 samples is clear that about 2 μm of thickness of remelted layer, the remelted layer can effectively hinder the expansion of crackle
Exhibition.
Third step is closed with the Kazakhstan that electron backscatter diffraction (EBSD) observes the preferable grain orientation of above-mentioned experimental example preparation
Golden material.It is 20kV that acceleration voltage, which is arranged, in instrument, and material tilts 70 °, and that for acquisition is mutually Ni-superalloy.Difference is banged
The EBSD crystal grain orientation on number surface is hit as shown in Fig. 4 (a)-(d).From the graph, it is apparent that grain size can be with bombardment
Number generates variation；And the case where Hastelloy material surface preferable grain orientation of different bombardment numbers, is different, wherein Hong
Hit 5 times it is more consistent with 20 crystal grain orientation, crystal orientation is mostly (101) and (111), as shown in Fig. 4 (e).
This explanation, high-current pulsed electron beam bombards the performance that can effectively improve Hastelloy X, and can make the material surface
There is texture, which can be identified by EBSD.
Claims (3)
1. a kind of method for changing Hastelloy surface crystal orientation, it is characterised in that: the change Hastelloy surface is brilliant
The method of body orientation includes the following steps carried out in order:
1) it selects commercially available Hastelloy material as handling member, then the surface of handling member is polished, polished and cleaned
Interior pretreatment；
2) pretreated handling member is placed in high-current pulsed electron beam vacuum specimen chamber, then starts strong current pulsed electronics
Beam device bombards handling member using the high-current pulsed electron beam that the equipment issues, and thus changes the crystalline substance on handling member surface
Body orientation, obtains the Hastelloy material of preferable grain orientation.
2. the method according to claim 1 for changing Hastelloy surface crystal orientation, it is characterised in that: in step 1)
In, the grinding process uses waterproof abrasive paper, and polishing treatment uses diamond polishing agent, and cleaning treatment uses ultrasonic wave and second
Alcohol.
3. the method according to claim 1 for changing Hastelloy surface crystal orientation, it is characterised in that: in step 2)
In, acceleration voltage used in the bombardment process is 27kV, and target source distance is 20cm, energy density 3J/cm2, pulse
Time is 1.5 μ s, is bombarded number 1~20 time.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910497332.8A CN110144535A (en) | 2019-06-06 | 2019-06-06 | A method of changing Hastelloy surface crystal orientation |
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| CN201910497332.8A CN110144535A (en) | 2019-06-06 | 2019-06-06 | A method of changing Hastelloy surface crystal orientation |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5120373A (en) * | 1991-04-15 | 1992-06-09 | United Technologies Corporation | Superalloy forging process |
| CN102560042A (en) * | 2012-01-13 | 2012-07-11 | 上海工程技术大学 | Method for realizing nanominiaturization of metal material surface crystal grain |
| US8220697B2 (en) * | 2005-01-18 | 2012-07-17 | Siemens Energy, Inc. | Weldability of alloys with directionally-solidified grain structure |
| CN104480465A (en) * | 2014-12-24 | 2015-04-01 | 上海交通大学 | Method for manufacturing nickel-based monocrystal high-temperature alloy component by utilizing laser cladding technology |
-
2019
- 2019-06-06 CN CN201910497332.8A patent/CN110144535A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5120373A (en) * | 1991-04-15 | 1992-06-09 | United Technologies Corporation | Superalloy forging process |
| US8220697B2 (en) * | 2005-01-18 | 2012-07-17 | Siemens Energy, Inc. | Weldability of alloys with directionally-solidified grain structure |
| CN102560042A (en) * | 2012-01-13 | 2012-07-11 | 上海工程技术大学 | Method for realizing nanominiaturization of metal material surface crystal grain |
| CN104480465A (en) * | 2014-12-24 | 2015-04-01 | 上海交通大学 | Method for manufacturing nickel-based monocrystal high-temperature alloy component by utilizing laser cladding technology |
Non-Patent Citations (1)
| Title |
|---|
| 杨盛志 等: "强流脉冲电子束作用下镍基高温合金GH4169的微观结构及腐蚀性能", 《机械工程学报》 * |
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