CN110143767A - A kind of film plating process and coated glass - Google Patents
A kind of film plating process and coated glass Download PDFInfo
- Publication number
- CN110143767A CN110143767A CN201910569148.XA CN201910569148A CN110143767A CN 110143767 A CN110143767 A CN 110143767A CN 201910569148 A CN201910569148 A CN 201910569148A CN 110143767 A CN110143767 A CN 110143767A
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- substrate
- plating process
- film plating
- oxidation treatment
- cleaned
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- 238000000034 method Methods 0.000 title claims abstract description 44
- 230000008569 process Effects 0.000 title claims abstract description 31
- 238000007747 plating Methods 0.000 title claims abstract description 24
- 239000011521 glass Substances 0.000 title claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 105
- 238000010301 surface-oxidation reaction Methods 0.000 claims abstract description 22
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 14
- 238000004140 cleaning Methods 0.000 claims description 12
- 230000003749 cleanliness Effects 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 3
- 238000005554 pickling Methods 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 abstract description 8
- 230000001070 adhesive effect Effects 0.000 abstract description 8
- 239000005416 organic matter Substances 0.000 abstract description 7
- 238000000151 deposition Methods 0.000 abstract description 6
- 230000003213 activating effect Effects 0.000 abstract description 5
- 230000008021 deposition Effects 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 238000005259 measurement Methods 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000003708 ampul Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- NZZFYRREKKOMAT-UHFFFAOYSA-N diiodomethane Chemical compound ICI NZZFYRREKKOMAT-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/001—Other surface treatment of glass not in the form of fibres or filaments by irradiation by infrared light
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
This application discloses a kind of film plating process, comprising: provides a substrate；The substrate is cleaned, and utilizes infrared baking, obtains first substrate；Surface oxidation treatment is carried out to the first substrate, obtains the second substrate；To the second substrate vacuum coating.As it can be seen that the application is by carrying out surface oxidation treatment to the second substrate after carrying out conventional treatment, by the fracture of the bond energys such as oily matter, organic matter on substrate, activating surface, the surface for enhancing substrate can, coated film deposition is carried out again, and the adhesive ability of film layer is greatly improved.The application additionally provides a kind of coated glass simultaneously, has above-mentioned beneficial effect.
Description
Technical field
This application involves coating technique field, in particular to a kind of film plating process and coated glass.
Background technique
As the application of touch screen is increasingly broad, many products can use and to production under more harsh natural conditions
The service life of product also increases, and the selection of production process and technologic requirement are just higher.Wherein vacuum coating is wanted
It asks also higher, especially for the adhesive ability between film layer and substrate, directly determines that can product bear various natural items
The index of part.
Substrate is cleaned by wet process, then carries out infrared baking, and then vacuum coating, but substrate is clear by wet process
After washing, the customary impurities on substrate can only be handled, some oiliness bulky grain organic matters not can be carried out and completely clean up,
Film layer delamination easy to form when depositing on these foreign matters causes film layer adhesive ability to die down.
Therefore, how to provide a kind of scheme of solution above-mentioned technical problem is that those skilled in the art need to solve at present
Problem.
Summary of the invention
The purpose of the application is to provide a kind of film plating process and coated glass, can be improved the adhesive ability of film layer.It has
Body scheme is as follows:
The application provides a kind of film plating process, comprising:
One substrate is provided；
The substrate is cleaned, and utilizes infrared baking, obtains first substrate；
Surface oxidation treatment is carried out to the first substrate, obtains the second substrate；
To the second substrate vacuum coating.
Optionally, the surface oxidation treatment is ultraviolet lamp processing.
Optionally, the light wavelength of the ultraviolet lamp is 180-360nm.
Optionally, the surface oxidation treatment is vacuum plasma processing.
Optionally, the substrate is cleaned, comprising:
Pickling or alkali cleaning or washing are carried out to the substrate.
Optionally, the substrate is glass plate.
Optionally, to the second substrate vacuum coating, comprising:
Judge whether the surface cleanliness of the second substrate meets preset standard；
If meeting the preset standard, to the second substrate vacuum coating.
Optionally, the substrate is cleaned, comprising:
The substrate is cleaned by cleaning solution using ultrasonic technique.
The application provides a kind of coated glass, is made using such as above-mentioned film plating process.
The application provides a kind of film plating process, comprising: provides a substrate；The substrate is cleaned, and is utilized infrared
Baking, obtains first substrate；Surface oxidation treatment is carried out to the first substrate, obtains the second substrate；To the second substrate
Vacuum coating.
As it can be seen that the application carries out surface oxidation treatment by after carrying out conventional treatment, to the second substrate, it will be on substrate
The fracture of the bond energys such as oily matter, organic matter, activating surface enhances the surface energy of substrate, then carries out coated film deposition, the attachment of film layer
Ability is greatly improved.The application additionally provides a kind of coated glass simultaneously, has above-mentioned beneficial effect, no longer superfluous herein
It states.
Detailed description of the invention
In order to illustrate the technical solutions in the embodiments of the present application or in the prior art more clearly, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
The embodiment of application for those of ordinary skill in the art without creative efforts, can also basis
The attached drawing of offer obtains other attached drawings.
Fig. 1 is a kind of flow chart of film plating process provided by the embodiment of the present application.
Specific embodiment
To keep the purposes, technical schemes and advantages of the embodiment of the present application clearer, below in conjunction with the embodiment of the present application
In attached drawing, the technical scheme in the embodiment of the application is clearly and completely described, it is clear that described embodiment is
Some embodiments of the present application, instead of all the embodiments.Based on the embodiment in the application, those of ordinary skill in the art
Every other embodiment obtained without making creative work, shall fall in the protection scope of this application.
In common coating process, substrate is cleaned by wet process, then carries out infrared baking, and then vacuum coating,
But substrate can only handle the customary impurities on substrate after wet process cleans, not for some oiliness bulky grain organic matters
It can be carried out and completely clean up, film layer delamination easy to form when depositing on these foreign matters causes film layer adhesive ability to die down.
Based on above-mentioned technical problem, the present embodiment provides a kind of film plating process, by being carried out after carrying out conventional treatment to the second substrate
The bond energys such as oily matter, organic matter on substrate are broken, activating surface by surface oxidation treatment, enhance substrate surface can, then
Coated film deposition is carried out, the adhesive ability of film layer is greatly improved, specifically referring to FIG. 1, Fig. 1 is provided by the embodiment of the present application
A kind of film plating process flow chart, specifically include:
S101, a substrate is provided.
The present embodiment is not defined the material of substrate with size, and substrate can be glass substrate, PCB substrate, ceramics
Substrate, as long as being that by the purpose of the present embodiment.
S102, substrate is cleaned, and utilizes infrared baking, obtain first substrate.
First substrate is the substrate for being cleaned to substrate, being obtained after infrared baking.First substrate surface has not at this time
The oiliness bulky grain organic matter that can be cleaned up.
Further, substrate is cleaned, comprising: pickling or alkali cleaning or washing are carried out to substrate；The present embodiment is not right
The cleaning solution of cleaning is defined, and user can select according to actual needs.Then toasted using infrared, so as into
It being capable of rapid draing after row cleaning.
S103, surface oxidation treatment is carried out to first substrate, obtains the second substrate.
The second substrate is to carry out the obtained substrate of surface oxidation treatment to first substrate, at this time remaining oily matter, have
The fracture of the bond energys such as machine object, the surface of activating surface, substrate can enhance.Concrete principle includes:
R-O-H → R-O-+R-, wherein R indicates any polyatom group.
R-/R-O- group is that substrate surface is formed after overactivation, R-/R-O- group need to capture other groups or
Atom is stablized, and the target atom in plated film plasma is deposited on substrate, and the adhesive ability after film layer accumulation becomes strong.
Carrying out surface oxidation treatment method for first substrate surface, there are many kinds, such as: vacuum plasma handles, is ultraviolet
The method for oxidation such as the processing of light lamp, dielectric barrier discharge processing.For example, dielectric barrier discharge processing is to carry out substrate surface cleaning and modification
When, dielectric barrier discharge processing be between two electrodes be added at least one layer dielectric material it is for example quartzy, pass to high current voltage
Current potential can then decompose the gas activation flowed through between two electrodes, to be cleaned and be modified to substrate surface.
S104, to the second substrate vacuum coating.
Based on the above-mentioned technical proposal, the present embodiment is by carrying out surface oxidation to the second substrate after carrying out conventional treatment
The bond energys such as oily matter, organic matter on substrate are broken, activating surface by processing, enhance substrate surface can, then carry out plated film
Deposition, the adhesive ability of film layer are greatly improved.
Further, surface oxidation treatment is ultraviolet lamp processing.Ultraviolet lamp processing can choose 180-360nm wave
It is long, the energy of breaking portion macromolecular bond energy is provided.The device that ultraviolet lamp processing uses makes ultraviolet light generator, wherein purple
Outer optical generator includes quartz ampoule and ultraviolet lamp, and ultraviolet lamp is set in quartz ampoule, and ultraviolet light generator is set to above substrate,
So as to which high efficiency carries out surface oxidation treatment to first substrate, the second substrate is obtained.As it can be seen that utilizing ultraviolet lamp processing side
Method is simple, easy to operate.
Further, surface oxidation treatment is vacuum plasma processing.
Surface oxidation treatment is vacuum plasma processing, since plasma is the 4th state outside solid, liquid, gas tri-state,
After mainly being ionized under high electromagnetic field by gas, to form negative electron, positive and negative ion and free radical isoreactivity gas group,
And substrate surface is cleaned and modified with plasma.By gas ionization under electric field action, the ion after ionization has by force
Oxidability, by part larger molecular organics, the oxygenolysis such as oily matter.
Further, substrate is glass plate.
Further, to the second substrate vacuum coating, comprising: it is default to judge whether the surface cleanliness of the second substrate meets
Standard；If meeting preset standard, to the second substrate vacuum coating.
The purpose for judging whether the surface cleanliness of the second substrate meets preset standard is determined so that by surface oxidation
Whether the oiliness bulky grain organic matter on the substrate surface of processing is removed；It is pre- to judge whether the surface cleanliness of the second substrate meets
Bidding is quasi-, can be and carries out Contact-angle measurement to the second substrate, can use water, diiodomethane or other substances and surveyed
Amount carrys out the surface cleanliness of the second substrate to contact the result of angle measurements and whether meets preset standard；In general, Contact-angle measurement
To be judged according to angle, when measure contact angle it is smaller when, then represent substrate or substrate surface cleanliness be better, this implementation
Example is not defined the preset standard for being directed to Contact-angle measurement, can be 3-50 °, it is of course also possible to be other ranges,
User can customize setting.The application carries out surface oxidation treatment to first substrate using surface oxidation technology, therefore can reduce
Bond power between oiliness bulky grain organic molecule, enables oiliness bulky grain organic matter fast decoupled, to reach cleaning substrate
Purpose.
Further, substrate is cleaned, comprising: substrate is cleaned by cleaning solution using ultrasonic technique.Tool
Body, ultrasonic wave is since frequency is high, wavelength is short, thus good directionality, the penetration capacity propagated are strong, and the cavitation of ultrasonic technology is made
With, acceleration effect and direct flow effect to liquid and dirt directly, indirectly effect, make crud layer by dispersion, emulsification, removing
And reach cleaning purpose.
A kind of coated glass provided by the embodiments of the present application is introduced below, coated glass described below and above
The film plating process of description can correspond to each other reference.
The application provides a kind of coated glass, is made using such as above-mentioned film plating process.
Further, the plated film of glass substrate is AG film layer, AR film layer, any one in AF film layer
Since the embodiment of coated glass part is corresponded to each other with the embodiment of film plating process part, coated glass portion
The embodiment divided refers to the description of the embodiment of film plating process part, wouldn't repeat here.
Each embodiment is described in a progressive manner in specification, the highlights of each of the examples are with other realities
The difference of example is applied, the same or similar parts in each embodiment may refer to each other.For system disclosed in embodiment
Speech, since it is corresponded to the methods disclosed in the examples, so being described relatively simple, related place is referring to method part illustration
?.It should be pointed out that for those skilled in the art, under the premise of not departing from the application principle, also
Can to the application, some improvement and modification can also be carried out, these improvement and modification also fall into the protection scope of the claim of this application
It is interior.
It should also be noted that, in the present specification, relational terms such as first and second and the like be used merely to by
One entity or operation are distinguished with another entity or operation, without necessarily requiring or implying these entities or operation
Between there are any actual relationship or orders.Moreover, the terms "include", "comprise" or its any other variant meaning
Covering non-exclusive inclusion, so that the process, method, article or equipment for including a series of elements not only includes that
A little elements, but also including other elements that are not explicitly listed, or further include for this process, method, article or
The intrinsic element of equipment.Under the situation not limited more, the element limited by sentence "including a ..." is not arranged
Except there is also other identical elements in the process, method, article or apparatus that includes the element.
Claims (9)
1. a kind of film plating process characterized by comprising
One substrate is provided；
The substrate is cleaned, and utilizes infrared baking, obtains first substrate；
Surface oxidation treatment is carried out to the first substrate, obtains the second substrate；
To the second substrate vacuum coating.
2. film plating process according to claim 1, which is characterized in that the surface oxidation treatment is ultraviolet lamp processing.
3. film plating process according to claim 2, which is characterized in that the light wavelength of the ultraviolet lamp is 180-360nm.
4. film plating process according to claim 1, which is characterized in that the surface oxidation treatment is at vacuum plasma
Reason.
5. film plating process according to claim 1, which is characterized in that cleaned to the substrate, comprising:
Pickling or alkali cleaning or washing are carried out to the substrate.
6. film plating process according to claim 1, which is characterized in that the substrate is glass plate.
7. film plating process according to any one of claims 1 to 6, which is characterized in that the second substrate vacuum coating,
Include:
Judge whether the surface cleanliness of the second substrate meets preset standard；
If meeting the preset standard, to the second substrate vacuum coating.
8. film plating process according to any one of claims 1 to 6, which is characterized in that clean, wrap to the substrate
It includes:
The substrate is cleaned by cleaning solution using ultrasonic technique.
9. a kind of coated glass, which is characterized in that be made using film plating process as claimed in any one of claims 1 to 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910569148.XA CN110143767A (en) | 2019-06-27 | 2019-06-27 | A kind of film plating process and coated glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910569148.XA CN110143767A (en) | 2019-06-27 | 2019-06-27 | A kind of film plating process and coated glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110143767A true CN110143767A (en) | 2019-08-20 |
Family
ID=67596605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910569148.XA Pending CN110143767A (en) | 2019-06-27 | 2019-06-27 | A kind of film plating process and coated glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110143767A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101402095A (en) * | 2008-09-09 | 2009-04-08 | 上海拓引数码技术有限公司 | Plasma surface cleaning apparatus |
| CN103008311A (en) * | 2012-12-18 | 2013-04-03 | 江苏宇迪光学股份有限公司 | Ultraviolet-based dry type cleaning method |
| CN103214186A (en) * | 2013-03-29 | 2013-07-24 | 中国建筑材料科学研究总院 | Glass substrate and preparation method thereof |
| CN104801516A (en) * | 2015-03-30 | 2015-07-29 | 南京菱亚汽车技术研究院 | Method for cleaning glass substrates by use of ultraviolet light |
-
2019
- 2019-06-27 CN CN201910569148.XA patent/CN110143767A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101402095A (en) * | 2008-09-09 | 2009-04-08 | 上海拓引数码技术有限公司 | Plasma surface cleaning apparatus |
| CN103008311A (en) * | 2012-12-18 | 2013-04-03 | 江苏宇迪光学股份有限公司 | Ultraviolet-based dry type cleaning method |
| CN103214186A (en) * | 2013-03-29 | 2013-07-24 | 中国建筑材料科学研究总院 | Glass substrate and preparation method thereof |
| CN104801516A (en) * | 2015-03-30 | 2015-07-29 | 南京菱亚汽车技术研究院 | Method for cleaning glass substrates by use of ultraviolet light |
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| PB01 | Publication | ||
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190820 |
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