CN110137063A - 离子源和离子注入装置 - Google Patents
离子源和离子注入装置 Download PDFInfo
- Publication number
- CN110137063A CN110137063A CN201811472876.0A CN201811472876A CN110137063A CN 110137063 A CN110137063 A CN 110137063A CN 201811472876 A CN201811472876 A CN 201811472876A CN 110137063 A CN110137063 A CN 110137063A
- Authority
- CN
- China
- Prior art keywords
- long hole
- ion source
- ion
- container
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 title claims abstract description 21
- 230000000903 blocking effect Effects 0.000 claims abstract description 18
- 150000002500 ions Chemical class 0.000 claims description 44
- 238000009826 distribution Methods 0.000 claims description 33
- 238000010884 ion-beam technique Methods 0.000 claims description 8
- 238000000605 extraction Methods 0.000 abstract description 8
- 238000012546 transfer Methods 0.000 abstract description 5
- 210000002381 plasma Anatomy 0.000 description 22
- 208000001308 Fasciculation Diseases 0.000 description 10
- 206010028293 Muscle contractions involuntary Diseases 0.000 description 10
- 230000005611 electricity Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000000265 homogenisation Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 101700004678 SLIT3 Proteins 0.000 description 1
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
- H01J37/165—Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/083—Beam forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/083—Beam forming
- H01J2237/0835—Variable cross-section or shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
- H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
- H01J2237/24542—Beam profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30472—Controlling the beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018021919A JP7029633B2 (ja) | 2018-02-09 | 2018-02-09 | イオン源、イオン注入装置 |
| JP2018-021919 | 2018-02-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110137063A true CN110137063A (zh) | 2019-08-16 |
Family
ID=67568374
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811472876.0A Pending CN110137063A (zh) | 2018-02-09 | 2018-12-04 | 离子源和离子注入装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10573490B2 (https=) |
| JP (1) | JP7029633B2 (https=) |
| KR (1) | KR20190096791A (https=) |
| CN (1) | CN110137063A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1671542S (https=) | 2019-12-06 | 2020-11-02 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7078714B2 (en) | 2004-05-14 | 2006-07-18 | Nissin Ion Equipment Co., Ltd. | Ion implanting apparatus |
| JP4875400B2 (ja) | 2005-05-06 | 2012-02-15 | アドバンスト イオン ビーム テクノロジー インク | リボンイオンビーム用高アスペクト比、高質量分解能アナライザマグネット及びシステム |
| US8003956B2 (en) | 2008-10-03 | 2011-08-23 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling beam current uniformity in an ion implanter |
| JP5041260B2 (ja) | 2010-06-04 | 2012-10-03 | 日新イオン機器株式会社 | イオン注入装置 |
| JP2013041703A (ja) | 2011-08-12 | 2013-02-28 | Sumitomo Heavy Ind Ltd | ラインプラズマ発生装置 |
| EP3043370A1 (de) | 2015-01-09 | 2016-07-13 | Meyer Burger (Germany) AG | Vorrichtung zur Extraktion von elektrischen Ladungsträgern aus einem Ladungsträgererzeugungsraum sowie ein Verfahren zum Betreiben einer solchen Vorrichtung |
| US9734982B1 (en) | 2016-05-24 | 2017-08-15 | Nissin Ion Equipment Co., Ltd. | Beam current density distribution adjustment device and ion implanter |
-
2018
- 2018-02-09 JP JP2018021919A patent/JP7029633B2/ja active Active
- 2018-12-04 CN CN201811472876.0A patent/CN110137063A/zh active Pending
- 2018-12-06 KR KR1020180155814A patent/KR20190096791A/ko not_active Withdrawn
- 2018-12-19 US US16/224,910 patent/US10573490B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US10573490B2 (en) | 2020-02-25 |
| JP7029633B2 (ja) | 2022-03-04 |
| JP2019139950A (ja) | 2019-08-22 |
| KR20190096791A (ko) | 2019-08-20 |
| US20190326089A1 (en) | 2019-10-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190816 |
|
| WD01 | Invention patent application deemed withdrawn after publication |