CN110136975A - A kind of preparation method and applications of amorphous tetrathio cobalt molybdate/nickelous selenide nano-chip arrays composite material - Google Patents

A kind of preparation method and applications of amorphous tetrathio cobalt molybdate/nickelous selenide nano-chip arrays composite material Download PDF

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CN110136975A
CN110136975A CN201910394958.6A CN201910394958A CN110136975A CN 110136975 A CN110136975 A CN 110136975A CN 201910394958 A CN201910394958 A CN 201910394958A CN 110136975 A CN110136975 A CN 110136975A
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CN110136975B (en
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范乐庆
顾芸
吴季怀
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Huaqiao University
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/24Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/30Electrodes characterised by their material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13Energy storage using capacitors

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  • Chemical & Material Sciences (AREA)
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Abstract

The present invention discloses a kind of amorphous CoMoS4The preparation method of/NiSe nano-chip arrays composite material, comprising the following steps: (1) under hydrothermal conditions, cabaltous nitrate hexahydrate and seven molybdic acid hydrate sodium react, and CoMoO is grown in nickel foam4Nano-chip arrays;(2) by vulcanized sodium and CoMoO4Nano-chip arrays carry out hydro-thermal reaction and form amorphous CoMoS4Nano-chip arrays;(3) under hydrothermal conditions, Nickel dichloride hexahydrate, selenium dioxide and urea react to form amorphous NiSe, and are deposited on amorphous CoMoS4The surface of nano-chip arrays finally obtains amorphous CoMoS4/ NiSe nano-chip arrays composite material.The preparation method is simple, at low cost, and amorphous CoMoS obtained4/ NiSe nano-chip arrays composite material has high specific capacitance and good cyclical stability, can be applied to electrode material for super capacitor, has a good application prospect.

Description

A kind of system of amorphous tetrathio cobalt molybdate/nickelous selenide nano-chip arrays composite material Preparation Method and its application
Technical field
The present invention relates to supercapacitor technologies fields, and in particular to be a kind of amorphous tetrathio cobalt molybdate/selenizing The application of the preparation method of nickel nano film array composite material and the composite material as electrode material for super capacitor.
Background technique
Supercapacitor is made of electrode, electrolyte, collector and diaphragm, is a kind of novel electrochemical energy storing device. Compared with lithium ion battery, energy density is lower for it.But it has the advantages that itself, for example power density is high, charge/discharge speed One of fastly and have extended cycle life, thus become current research hot spot.
Supercapacitor is divided into pseudocapacitors and double layer capacitor.Pseudocapacitors rely on the faraday of electrode material surface Redox reaction energy storage, and double layer capacitor carries out energy storage by the adsorption charge of electrode material surface.Just because of two Person's energy storage mechnism is different, so the energy density of pseudocapacitors is much higher than double layer capacitor, but compared with lithium ion battery also There is biggish gap.Common fake capacitance material includes transition metal oxide, transition metal hydroxide and conducting polymer, And transient metal sulfide in recent years newly developed etc..The fake capacitance material overwhelming majority is crystalline material at present, but crystalline state material Material is unfavorable for ion and quickly spreads, it is difficult to obtain high specific capacitance, therefore be not easy to form high-energy due to its anisotropic characteristic The supercapacitor of density.In addition, preparing electrode of super capacitor often needing to that binder is added, bonding electrode material is played With the effect of collector;But binder can block the hole of electrode material to a certain extent, will certainly reduce supercapacitor Energy storage capacity.
Summary of the invention
The purpose of the present invention is to provide a kind of amorphous tetrathio cobalt molybdate/nickelous selenide (i.e. CoMoS4/ NiSe) nanometer The preparation method of chip arrays composite material, preparation method is simple, at low cost, and amorphous CoMoS obtained4/ NiSe nanometer sheet Array composite material has high specific capacitance and good cyclical stability, can be applied to electrode material for super capacitor, has Good application prospect.
In order to achieve the above objectives, solution of the invention is:
A kind of amorphous CoMoS4The preparation method of/NiSe nano-chip arrays composite material, including CoMoO4Nanometer sheet battle array The preparation of column, amorphous CoMoS4The preparation of nano-chip arrays and amorphous CoMoS4/ NiSe nano-chip arrays composite material Prepare three steps;
The CoMoO4The preparation method of nano-chip arrays be first at room temperature, the nickel foam cleaned is immersed in six water In the mixed aqueous solution for closing cobalt nitrate and seven molybdic acid hydrate sodium, 80~180 DEG C of progresss hydro-thermal reactions are heated to seal to, keep the temperature 4~ 10h is cooled to room temperature, and obtains reaction product A;Then it by reaction product A cleaning, drying, obtains being grown in the nickel foam CoMoO4Nano-chip arrays;
The amorphous CoMoS4The preparation method of nano-chip arrays be first at room temperature, growth is had into the CoMoO4It receives The nickel foam of rice chip arrays is placed in sodium sulfide solution, is heated to seal to 60~120 DEG C of progress hydro-thermal reactions, keeps the temperature 4~10h, It then cools to room temperature, obtains reaction product B, then by reaction product B cleaning, drying, obtain being grown in the nickel foam Amorphous CoMoS4Nano-chip arrays;
The amorphous CoMoS4The preparation method of/NiSe nano-chip arrays composite material be first at room temperature, will grow There is the amorphous CoMoS4The mixing that the nickel foam of nano-chip arrays is placed in Nickel dichloride hexahydrate, selenium dioxide and urea is water-soluble In liquid, 100~200 DEG C of progress hydro-thermal reactions are heated to seal to, 5~20h is kept the temperature, then cools to room temperature, obtain reaction product C;
Finally by reaction product C cleaning, drying, the amorphous CoMoS is obtained4/ NiSe nano-chip arrays composite material.
In the mixed aqueous solution of the cabaltous nitrate hexahydrate and seven molybdic acid hydrate sodium, the cabaltous nitrate hexahydrate and seven hydrations The molar ratio of sodium molybdate is 1:0.5~2, and the amount ratio of the cabaltous nitrate hexahydrate and deionized water is 1mmol:10~15mL.
In the sodium sulfide solution, the amount ratio of the vulcanized sodium and deionized water is 1mmol: 25~35mL.
In the mixed aqueous solution of the Nickel dichloride hexahydrate, selenium dioxide and urea, the Nickel dichloride hexahydrate, titanium dioxide The molar ratio of selenium and urea is 1: 1~4: 5~20, the amount ratio of the Nickel dichloride hexahydrate and deionized water is 1mmol: 50~ 70mL。
The cleaning step is successively multiple using deionized water and ethyl alcohol cleaning.
The drying is vacuum drying.
The amorphous CoMoS4Application of/NiSe nano-chip arrays the composite material as electrode material for super capacitor.
After adopting the above technical scheme, a kind of amorphous CoMoS of the present invention4The system of/NiSe nano-chip arrays composite material Preparation Method has the advantage that
(1) preparation method is simple, at low cost, reproducible;
(2) amorphous CoMoS4/ NiSe nano-chip arrays composite material is grown directly upon in foam nickel base, is effectively kept away The use of binder is opened;
(3) the amorphous CoMoS being prepared4/ NiSe nano-chip arrays composite material can form open pore structure, promote Into electrolyte and interelectrode contact;
(4) the amorphous CoMoS4In/NiSe nano-chip arrays composite material, CoMoS4It is amorphous structure with NiSe, It can be spread for ion and channel abundant is provided, to have high specific capacitance and high cyclical stability.
Detailed description of the invention
Fig. 1 is the resulting CoMoO of the embodiment of the present invention 14Nano-chip arrays, amorphous CoMoS4Nano-chip arrays and CoMoS4The X-ray diffractogram of/NiSe nano-chip arrays composite material;
Fig. 2 is the resulting amorphous CoMoS of the embodiment of the present invention 14Nano-chip arrays and amorphous CoMoS4/ NiSe nanometers The selective electron diffraction figure of chip arrays composite material;
Fig. 3 is the resulting amorphous CoMoS of the embodiment of the present invention 14The energy spectrum diagram of/NiSe nano-chip arrays composite material;
Fig. 4 is the resulting amorphous CoMoS of the embodiment of the present invention 14The photoelectron energy of/NiSe nano-chip arrays composite material Spectrogram;
Fig. 5 is the resulting CoMoO of the embodiment of the present invention 14Nano-chip arrays, amorphous CoMoS4Nano-chip arrays and without fixed Shape CoMoS4The scanning electron microscope (SEM) photograph of/NiSe nano-chip arrays composite material;
Fig. 6 is the resulting amorphous CoMoS of the embodiment of the present invention 14Nano-chip arrays and amorphous CoMoS4/ NiSe nanometers Specific capacitance relational graph of the chip arrays composite material under different current densities;
Fig. 7 is CoMoS in the embodiment of the present invention 14Energy density-power of/NiSe//AC Asymmetric Supercapacitor is close Spend graph of relation;
Fig. 8 is CoMoS in the embodiment of the present invention 14The stable circulation linearity curve of/NiSe//AC Asymmetric Supercapacitor Figure.
Specific embodiment
In order to further explain the technical solution of the present invention, being explained in detail below by specific embodiment the present invention It states.
Embodiment 1
One, the preparation of composite material
A kind of amorphous CoMoS4The preparation method of/NiSe nano-chip arrays composite material, comprising the following steps:
Step 1, at room temperature, by 5mmol cabaltous nitrate hexahydrate, seven molybdic acid hydrate sodium of 2.5mmol and 50mL deionized water It is added in 100mL autoclave, stirring and dissolving, obtains mixed aqueous solution A;
The nickel foam cleaned is immersed in mixed aqueous solution A by step 2, and by autoclave be heated to seal to 80 DEG C into Row hydro-thermal reaction keeps the temperature 10h, is cooled to room temperature, obtains reaction product A;
Reaction product A is successively cleaned for several times with deionized water and ethyl alcohol, and is dried in vacuo 12h at 60 DEG C by step 3, Obtain being grown in the CoMoO in nickel foam4Nano-chip arrays;
Step 4, at room temperature, 2mmol vulcanized sodium and 50mL deionized water are added in 100mL autoclave, are stirred molten Solution, obtains sodium sulfide solution;
Step 5, the growth for obtaining step 3 have CoMoO4The nickel foam of nano-chip arrays is placed in sodium sulfide solution, and Autoclave is heated to seal to 60 DEG C of progress hydro-thermal reactions, 10h is kept the temperature, is cooled to room temperature, obtains reaction product B;
Reaction product B is successively cleaned for several times with deionized water and ethyl alcohol, and is dried in vacuo 12h at 60 DEG C by step 6, Obtain being grown in the amorphous CoMoS in nickel foam4Nano-chip arrays;
Step 7, at room temperature, by 1mmol Nickel dichloride hexahydrate, 1mmol selenium dioxide, 5mmol urea and 50mL go from Sub- water is added in 100mL autoclave, stirring and dissolving, obtains the mixed aqueous solution of Nickel dichloride hexahydrate, selenium dioxide and urea B;
Step 8, the growth for obtaining step 6 have amorphous CoMoS4The nickel foam of nano-chip arrays is placed in mixed aqueous solution In B, and autoclave is heated to seal to 100 DEG C of progress hydro-thermal reactions, keeps the temperature 20h, at this time under hydrothermal conditions, six chloride hydrates Nickel, selenium dioxide and urea reaction form amorphous NiSe, and are deposited on amorphous CoMoS4The surface of nano-chip arrays, then It is cooled to room temperature, obtains reaction product C;
Reaction product C is successively cleaned for several times with deionized water and ethyl alcohol, and is dried in vacuo 12h at 60 DEG C by step 9, Obtain amorphous CoMoS4/ NiSe nano-chip arrays composite material.
Two, structural characterization
XRD is tested as shown in Figure 1, CoMoO4Nano-chip arrays are crystalline state, and CoMoS4Nano-chip arrays and CoMoS4/ The X-ray diffractogram of NiSe nano-chip arrays composite material does not have diffraction maximum, illustrates CoMoS4Nano-chip arrays and CoMoS4/ NiSe nano-chip arrays composite material is amorphous structure.
Fig. 2 is amorphous CoMoS4Nano-chip arrays and amorphous CoMoS4The constituency of/NiSe nano-chip arrays composite material Wide and fuzzy annulus is presented in electron diffraction diagram, further illustrates that the two is amorphous structure.
By testing amorphous CoMoS4The energy spectrum diagram (such as Fig. 3) and photoelectron energy of/NiSe nano-chip arrays composite material Spectrogram (such as Fig. 4) confirms that the composite material is by CoMoS4It is formed with NiSe.
Scanning electron microscope result is as shown in figure 5, the CoMoO that explanation is grown in nickel foam4、 CoMoS4And CoMoS4/NiSe What composite material was presented is nano-chip arrays, has open pore structure.
Three, performance test
1, directly with amorphous CoMoS4Nano-chip arrays and amorphous CoMoS4/ NiSe nano-chip arrays composite material is Working electrode, Hg/HgO electrode are reference electrode, and 3mol/L KOH aqueous solution is electrolyte, carry out three electrode tests.Test knot Fruit as shown in fig. 6, when current density be 1A/g when, amorphous CoMoS4The specific capacitance of/NiSe nano-chip arrays composite material is high It is more than amorphous CoMoS up to 5757F/g4The specific capacitance (2776F/g) of nano-chip arrays;When current density rises to 10A/g, Amorphous CoMoS4The specific capacitance of/NiSe nano-chip arrays composite material can still maintain high specific capacitance (3120F/g), explanation This material is forthright with good times.
2, with amorphous CoMoS4/ NiSe nano-chip arrays composite material is anode, and active carbon (AC) is cathode, 3mol/ L KOH aqueous solution is electrolyte, is assembled into CoMoS4/ NiSe//AC Asymmetric Supercapacitor, and it is measured in different electric currents Charging and discharging curve under density, to obtain energy density-saturation effect curve graph.As shown in fig. 7, being in power density When 875W/kg, the energy density of the capacitor is up to 69Wh/kg.
Under conditions of current density is 5A/g, the survey of charge and discharge cycles stability is carried out to the Asymmetric Supercapacitor Examination, test results are shown in figure 8: after 10000 circulations, capacitor can still keep about 86% specific capacitance, illustrate this capacitor With good cyclical stability, the amorphous CoMoS of preparation4/ NiSe nano-chip arrays composite material can be used as super capacitor Equipment material is applied.
Embodiment 2
A kind of amorphous CoMoS4The preparation method of/NiSe nano-chip arrays composite material, comprising the following steps:
Step 1, at room temperature, 5mmol cabaltous nitrate hexahydrate, seven molybdic acid hydrate sodium of 10mmol and 75mL deionized water are added Enter into 100mL autoclave, stirring and dissolving, obtains mixed aqueous solution A;
The nickel foam cleaned is immersed in mixed aqueous solution A by step 2, and by autoclave be heated to seal to 180 DEG C into Row hydro-thermal reaction keeps the temperature 4h, is cooled to room temperature, obtains reaction product A;
Reaction product A is successively cleaned for several times with deionized water and ethyl alcohol, and is dried in vacuo 12h at 60 DEG C by step 3, Obtain being grown in the CoMoO in nickel foam4Nano-chip arrays;
Step 4, at room temperature, 2mmol vulcanized sodium and 70mL deionized water are added in 100mL autoclave, are stirred molten Solution, obtains sodium sulfide solution;
Step 5, the growth for obtaining step 3 have CoMoO4The nickel foam of nano-chip arrays is placed in sodium sulfide solution, and Autoclave is heated to seal to 120 DEG C of progress hydro-thermal reactions, 4h is kept the temperature, is cooled to room temperature, obtains reaction product B;
Reaction product B is successively cleaned for several times with deionized water and ethyl alcohol, and is dried in vacuo 12h at 60 DEG C by step 6, Obtain being grown in the amorphous CoMoS in nickel foam4Nano-chip arrays;
Step 7, at room temperature, 1mmol Nickel dichloride hexahydrate, 4mmol selenium dioxide, 20mmol urea and 70mL are gone Ionized water is added in 100mL autoclave, stirring and dissolving, and the mixing for obtaining Nickel dichloride hexahydrate, selenium dioxide and urea is water-soluble Liquid B;
Step 8, the growth for obtaining step 6 have amorphous CoMoS4The nickel foam of nano-chip arrays is placed in mixed aqueous solution In B, and autoclave is heated to seal to 200 DEG C of progress hydro-thermal reactions, keeps the temperature 5h, at this time under hydrothermal conditions, six chloride hydrates Nickel, selenium dioxide and urea reaction form amorphous NiSe, and are deposited on amorphous CoMoS4The surface of nano-chip arrays, then It is cooled to room temperature, obtains reaction product C;
Reaction product C is successively cleaned for several times with deionized water and ethyl alcohol, and is dried in vacuo 12h at 60 DEG C by step 9, Obtain amorphous CoMoS4/ NiSe nano-chip arrays composite material.
Above-described embodiment and schema and non-limiting product form and style of the invention, any technical field it is common The appropriate changes or modifications that technical staff does it all should be regarded as not departing from patent category of the invention.

Claims (7)

1. a kind of amorphous CoMoS4The preparation method of/NiSe nano-chip arrays composite material, it is characterised in that: including CoMoO4 The preparation of nano-chip arrays, amorphous CoMoS4The preparation of nano-chip arrays and amorphous CoMoS4/ NiSe nano-chip arrays are multiple Three steps of preparation of condensation material;
The CoMoO4The preparation method of nano-chip arrays be first at room temperature, the nickel foam cleaned is immersed in six hydration nitre In the mixed aqueous solution of sour cobalt and seven molybdic acid hydrate sodium, 80~180 DEG C of progress hydro-thermal reactions are heated to seal to, keep the temperature 4~10h, It is cooled to room temperature, obtains reaction product A;Then it by reaction product A cleaning, drying, obtains being grown in the nickel foam CoMoO4Nano-chip arrays;
The amorphous CoMoS4The preparation method of nano-chip arrays be first at room temperature, growth is had into the CoMoO4Nanometer sheet The nickel foam of array is placed in sodium sulfide solution, is heated to seal to 60~120 DEG C of progress hydro-thermal reactions, keeps the temperature 4~10h, then It is cooled to room temperature, obtains reaction product B, then by reaction product B cleaning, drying, the nothing for obtaining being grown in the nickel foam is fixed Shape CoMoS4Nano-chip arrays;
The amorphous CoMoS4The preparation method of/NiSe nano-chip arrays composite material is that first at room temperature, growth is had described Amorphous CoMoS4The nickel foam of nano-chip arrays is placed in the mixed aqueous solution of Nickel dichloride hexahydrate, selenium dioxide and urea, 100~200 DEG C of progress hydro-thermal reactions are heated to seal to, 5~20h is kept the temperature, then cools to room temperature, obtain reaction product C;
Finally by reaction product C cleaning, drying, the amorphous CoMoS is obtained4/ NiSe nano-chip arrays composite material.
2. a kind of amorphous CoMoS according to claim 14The preparation method of/NiSe nano-chip arrays composite material, It is characterized in that: in the mixed aqueous solution of the cabaltous nitrate hexahydrate and seven molybdic acid hydrate sodium, the cabaltous nitrate hexahydrate and seven water The molar ratio for closing sodium molybdate is 1:0.5~2, the amount ratio of the cabaltous nitrate hexahydrate and deionized water be 1mmol:10~ 15mL。
3. a kind of amorphous CoMoS according to claim 14The preparation method of/NiSe nano-chip arrays composite material, Be characterized in that: in the sodium sulfide solution, the amount ratio of the vulcanized sodium and deionized water is 1mmol: 25~35mL.
4. a kind of amorphous CoMoS according to claim 14The preparation method of/NiSe nano-chip arrays composite material, It is characterized in that: in the mixed aqueous solution of the Nickel dichloride hexahydrate, selenium dioxide and urea, the Nickel dichloride hexahydrate, dioxy The molar ratio for changing selenium and urea is 1: 1~4: 5~20, and the amount ratio of the Nickel dichloride hexahydrate and deionized water is 1mmol: 50 ~70mL.
5. a kind of amorphous CoMoS according to claim 14The preparation method of/NiSe nano-chip arrays composite material, Be characterized in that: the cleaning step is successively multiple using deionized water and ethyl alcohol cleaning.
6. a kind of amorphous CoMoS according to claim 14The preparation method of/NiSe nano-chip arrays composite material, Be characterized in that: the drying is vacuum drying.
7. a kind of amorphous CoMoS according to claim 14The preparation method of/NiSe nano-chip arrays composite material is made The standby obtained amorphous CoMoS4Application of/NiSe nano-chip arrays the composite material as electrode material for super capacitor.
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