CN110109293A - The manufacturing method of the inorganic orientation film of liquid crystal - Google Patents

The manufacturing method of the inorganic orientation film of liquid crystal Download PDF

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Publication number
CN110109293A
CN110109293A CN201910270034.5A CN201910270034A CN110109293A CN 110109293 A CN110109293 A CN 110109293A CN 201910270034 A CN201910270034 A CN 201910270034A CN 110109293 A CN110109293 A CN 110109293A
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CN
China
Prior art keywords
manufacturing
film layer
solution
baking procedure
yttrium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910270034.5A
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Chinese (zh)
Inventor
张宇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to CN201910270034.5A priority Critical patent/CN110109293A/en
Priority to PCT/CN2019/082628 priority patent/WO2020199244A1/en
Publication of CN110109293A publication Critical patent/CN110109293A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation

Abstract

The present invention discloses a kind of manufacturing method of inorganic orientation film of liquid crystal, comprising: mixes step, including lanthanum nitrate hexahydrate, yttrium nitrate solution and strontium nitrate solution is placed into a container, and be stirred the solution up to one section of mixing time;Stand reaction step, including by the solution left standstill after being stirred up to one section of time of repose so that the solution reaction generate include lanthanum yttrium strontium oxygen and nitric anhydride orientation solution;Application step, including by the orientation solution coating to the surface of an indium tin oxide layer with formed one include lanthanum yttrium strontium oxygen and nitric anhydride film layer;And baking procedure, including being toasted the crystallization of lanthanum yttrium strontium oxygen and the formation inorganic orientation film of one liquid crystal so that in the film layer to the film layer.The inorganic orientation film of liquid crystal manufactured by manufacturing method of the present invention while dielectric constant with higher and wider band gap.

Description

The manufacturing method of the inorganic orientation film of liquid crystal
Technical field
The invention relates to a kind of manufacturing method of the inorganic orientation film of liquid crystal, orientation solution needed for preparation process Preparation method it is simple, performance stablize.
Background technique
Compared with organic material, inorganic material is as the advantage of both alignment layers: because inorganic material capacitance is low to have There is very low threshold voltage, so that the energy needed during driving is small.In these inorganic material, strontium oxide strontia (SrO) With very high dielectric constant, relatively narrow band gap and low breakdown voltage;Therefore lanthanum (La) and yttrium are just added wherein (Y), because it is with relatively large band gap and high breakdown voltage so that strontium oxide strontia (SrO) obtain simultaneously it is higher Dielectric constant and wider band gap.Bing and multi-component material have more outstanding filming performance.
The advantage of solwution method is that lanthanum (La), yttrium (Y), the component ratio of strontium oxide strontia (SrO) are adjustable, and shape after annealing At crystalline membrane and liquid crystal between there is stronger Van der Waals force (Van der Waals force), do not need to carry out special Allocating process.
Therefore, it is necessary to a kind of manufacturing method of inorganic orientation film of liquid crystal is provided, to solve to ask present in the prior art Topic.
Summary of the invention
In view of this, the present invention provides a kind of manufacturing method of inorganic orientation film, orientation needed for preparation process is molten The preparation method of liquid is simple, and performance is stablized, and solves the problems of prior art whereby.
The main purpose of the present invention is to provide a kind of manufacturing methods of the inorganic orientation film of liquid crystal, comprising:
Step is mixed, including by lanthanum nitrate (La (NO3)3) solution, yttrium nitrate (Y (NO3)3) solution and strontium nitrate (Sr (NO3)2) solution is placed into a container, and is stirred the lanthanum nitrate (La (NO3)3) solution, the yttrium nitrate (Y (NO3)3) solution and the strontium nitrate (Sr (NO3)2) solution is up to one section of mixing time;
Reaction step is stood, including by (La (the NO of the lanthanum nitrate after being stirred3)3) solution, yttrium nitrate (Y (NO3)3) molten Liquid and strontium nitrate (Sr (NO3)2) solution left standstill is up to one section of time of repose, so that the lanthanum nitrate (La (NO3)3) solution, institute State yttrium nitrate (Y (NO3)3) solution and the strontium nitrate (Sr (NO3)2) solution reaction generate include lanthanum yttrium strontium oxygen (LaYSr3O6) and nitric anhydride (N2O5) orientation solution;
Application step, including by the orientation solution coating a to tin indium oxide (Indium Tin Oxide, ITO) layer Include lanthanum yttrium strontium oxygen (LaYSr on surface to form one3O6) and nitric anhydride (N2O5) film layer;And
Baking procedure, including being toasted the lanthanum yttrium strontium oxygen (LaYSr so that in the film layer to the film layer3O6) crystallization And form the inorganic orientation film of a liquid crystal.
In an embodiment of the present invention, it is executed under conditions of the mixing step is at least 75 degree Celsius.
In an embodiment of the present invention, the mixing time of the mixing step is at least 2 hours.
In an embodiment of the present invention, the standing reaction step is to carry out in air, and the standing reaction step In the time of repose be at least 24 hours.
In an embodiment of the present invention, the application step is carried out in a manner of using spin coating.
In an embodiment of the present invention, the baking procedure includes main baking procedure, and the main baking procedure is Celsius The film layer is toasted under conditions of 400 to 800 degree.
In an embodiment of the present invention, the main baking procedure is to toast the film layer under conditions of 500 degree Celsius.
In an embodiment of the present invention, the main baking procedure includes toasting the film layer to be at least up to 3 hours.
In an embodiment of the present invention, the baking procedure includes previously baked step and main baking procedure;It is described pre- First baking procedure is that the film layer is toasted under conditions of at least 100° centigrade;The main baking procedure is in the preparatory baking It is executed after roasting step, and is to toast the film layer under conditions of 500 degree Celsius.
In an embodiment of the present invention, the previously baked step includes toasting the film layer to be at least up to 5 minutes;The master Baking procedure includes toasting the film layer to be at least up to 3 hours.
Compared with prior art, the inorganic orientation of liquid crystal manufactured by the manufacturing method of the inorganic orientation film of the present invention is thin Film while dielectric constant with higher and wider band gap.Compared with the inorganic orientation film of the prior art, the present invention is inorganic Van der Waals force between the inorganic orientation film of liquid crystal prepared by the manufacturing method of orientation film and liquid crystal is strong, is not necessarily to special orientation Processing procedure.
For above content of the invention can be clearer and more comprehensible, preferred embodiment is cited below particularly, cooperates institute's accompanying drawings, makees detailed Carefully it is described as follows:
Detailed description of the invention
Indium tin oxide layer Fig. 1 of the invention and the thereon side sectional view of film layer.
Fig. 2 is the step flow chart of the manufacturing method of the inorganic orientation film of liquid crystal of the present invention.
Fig. 3 is another flow chart of steps of the manufacturing method of the inorganic orientation film of liquid crystal of the present invention.
Specific embodiment
Please refer to Fig. 1 and Fig. 2, the manufacturing method of the inorganic orientation film of liquid crystal of the present invention, comprising: mix step S01, stand Reaction step S02, application step S03 and baking procedure S04.
The mixing step S01, including by lanthanum nitrate (La (NO3)3) solution, yttrium nitrate (Y (NO3)3) solution and nitre Sour strontium (Sr (NO3)2) solution is placed into a container, and is stirred the lanthanum nitrate (La (NO3)3) solution, the nitric acid Yttrium (Y (NO3)3) solution and the strontium nitrate (Sr (NO3)2) solution is up to one section of mixing time.In an embodiment of the present invention, It is executed under conditions of the mixing step is at least 75 degree Celsius.In an embodiment of the present invention, the mixing step The mixing time is at least 2 hours.
The standing reaction step S02, including by (La (the NO of the lanthanum nitrate after being stirred3)3) solution, yttrium nitrate (Y (NO3)3) solution and strontium nitrate (Sr (NO3)2) solution left standstill is up to one section of time of repose, so that the lanthanum nitrate (La (NO3)3) Solution, the yttrium nitrate (Y (NO3)3) solution and the strontium nitrate (Sr (NO3)2) solution reaction generate include lanthanum yttrium strontium oxygen (LaYSr3O6) and nitric anhydride (N2O5) orientation solution.In an embodiment of the present invention, the standing reaction step S02 be It is carried out in air, and the time of repose stood in reaction step S02 is at least 24 hours.The chemistry of the reaction is anti- Answer formula as follows: La (NO3)3+Y(NO3)3+3Sr(NO3)2=LaYSr3O6+6N2O5, lanthanum yttrium strontium oxygen (LaYSr is obtained after reaction3O6) And nitric anhydride (N2O5) solution.
The application step S03, including by the orientation solution coating a to tin indium oxide (Indium Tin Oxide, It ITO include) lanthanum yttrium strontium oxygen (LaYSr to form one on the surface of layer 103O6) and nitric anhydride (N2O5) film layer 20.In the present invention In one embodiment, the application step S03 is carried out in a manner of using spin coating.
The baking procedure S04, including being toasted the lanthanum yttrium strontium oxygen so that in the film layer 20 to the film layer 20 (LaYSr3O6) crystallize and form the inorganic orientation film of a liquid crystal.
Referring to figure 3., in an embodiment of the present invention, the baking procedure S04 includes main baking procedure S042, the master Baking procedure S042 is to toast the film layer 20 under conditions of Celsius 400 to 800 degree.Preferably, the main baking procedure S042 is that the film layer 20 is toasted under conditions of 500 degree Celsius.In an embodiment of the present invention, the main baking procedure S042 It is at least up to 3 hours including toasting the film layer 20.
Referring to figure 3., in an alternative embodiment of the invention, the baking procedure S04 include previously baked step S041 with And main baking procedure S042;The previously baked step S041 toasts the film under conditions of being included at least 100° centigrade Layer 20;The main baking procedure S042 is executed after being included in the previously baked step S041, and is Celsius 400 to 800 The film layer 20 is toasted under conditions of degree.Preferably, the main baking procedure S042 are under conditions of Celsius 400 to 800 degree Toast the film layer 20.The previously baked step S041 includes toasting the film layer 20 to be at least up to 5 minutes;The main baking step Rapid S042 includes toasting the film layer 20 to be at least up to 3 hours.Better, the main baking procedure S042 is at 500 degree Celsius Under the conditions of toast the film layer 20.
Compared with prior art, the inorganic orientation of liquid crystal manufactured by the manufacturing method of the inorganic orientation film of the present invention is thin Film while dielectric constant with higher and wider band gap.Compared with the inorganic orientation film of the prior art, the present invention is inorganic Van der Waals force between the inorganic orientation film of liquid crystal prepared by the manufacturing method of orientation film and liquid crystal is strong, is not necessarily to special orientation Processing procedure.

Claims (10)

1. a kind of manufacturing method of the inorganic orientation film of liquid crystal, which is characterized in that the manufacturing method includes:
Step is mixed, including lanthanum nitrate hexahydrate, yttrium nitrate solution and strontium nitrate solution are placed into a container, and is stirred The mixing lanthanum nitrate hexahydrate, the yttrium nitrate solution and the strontium nitrate solution are mixed up to one section of mixing time;
Reaction step is stood, including reaching the lanthanum nitrate hexahydrate after being stirred, yttrium nitrate solution and strontium nitrate solution standing One section of time of repose, so that the lanthanum nitrate hexahydrate, the yttrium nitrate solution and strontium nitrate solution reaction generate and include The orientation solution of lanthanum yttrium strontium oxygen and nitric anhydride;
Application step, including lanthanum yttrium strontium oxygen will be included to form one in the orientation solution coating to the surface of an indium tin oxide layer And the film layer of nitric anhydride;And
Baking procedure, including the film layer is toasted so that in the film layer lanthanum yttrium strontium oxygen crystallization and formed a liquid crystal without Machine orientation film.
2. manufacturing method as described in claim 1, it is characterised in that: in the mixing step be in 75 degree of item at least Celsius It is executed under part.
3. manufacturing method as described in claim 1, it is characterised in that: the mixing time of the mixing step is at least 2 Hour.
4. manufacturing method as described in claim 1, it is characterised in that: the standing reaction step be carry out in air, and The time of repose in the standing reaction step is at least 24 hours.
5. manufacturing method as described in claim 1, it is characterised in that: the application step is carried out in a manner of using spin coating.
6. manufacturing method as described in claim 1, it is characterised in that: the baking procedure includes main baking procedure, the master Baking procedure is to toast the film layer under conditions of Celsius 400 to 800 degree.
7. manufacturing method as claimed in claim 6, it is characterised in that: the main baking procedure is in 500 degree of condition Celsius The lower baking film layer.
8. manufacturing method as claimed in claim 7, it is characterised in that: the main baking procedure includes toasting the film layer at least Up to 3 hours.
9. manufacturing method as described in claim 1, it is characterised in that: the baking procedure includes previously baked step and master Baking procedure;The previously baked step is that the film layer is toasted under conditions of at least 100° centigrade;The main baking procedure It is to be executed after the previously baked step, and is to toast the film layer under conditions of 500 degree Celsius.
10. manufacturing method as claimed in claim 9, it is characterised in that: the previously baked step includes toasting the film layer At least up to 5 minutes;The main baking procedure includes toasting the film layer to be at least up to 3 hours.
CN201910270034.5A 2019-04-04 2019-04-04 The manufacturing method of the inorganic orientation film of liquid crystal Pending CN110109293A (en)

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PCT/CN2019/082628 WO2020199244A1 (en) 2019-04-04 2019-04-15 Method for manufacturing liquid crystal inorganic alignment thin film

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Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1415694A (en) * 2002-12-10 2003-05-07 中国科学院长春应用化学研究所 Red luminescent powder mixed with europium and its method
CN1468934A (en) * 2003-06-16 2004-01-21 中国科学院长春应用化学研究所 Prepn of luminous tungstate film
US20040165334A1 (en) * 2003-02-26 2004-08-26 Tdk Corporation Multi-layered unit
CN1591134A (en) * 2003-09-04 2005-03-09 精工爱普生株式会社 Inorganic orientation film and its forming method,substrate for electronic device,liquid crystal panel
CN101030526A (en) * 2006-03-03 2007-09-05 株式会社半导体能源研究所 Method of manufacyuring semiconductor device
CN101046582A (en) * 2006-03-28 2007-10-03 联诚光电股份有限公司 Process of making liquid crystal orienting film
CN101109879A (en) * 2006-07-19 2008-01-23 株式会社日立显示器 Liquid display device and fabrication method thereof
CN101395527A (en) * 2006-03-07 2009-03-25 日产化学工业株式会社 Silicon-containing liquid crystal aligning agent, liquid crystal alignment film and their production methods
CN101523280A (en) * 2006-10-06 2009-09-02 日产化学工业株式会社 Silicon-containing liquid crystal aligning agent and liquid crystal alignment film
CN101805618A (en) * 2009-02-18 2010-08-18 Jsr株式会社 The manufacture method of formation method, liquid crystal display device and the liquid crystal display device of liquid crystal aligning agent, liquid crystal orientation film
JP2011141502A (en) * 2010-01-09 2011-07-21 Seiko Epson Corp Method of manufacturing liquid crystal device
CN102135685A (en) * 2010-01-27 2011-07-27 精工爱普生株式会社 Liquid crystal device and method of producing the same
CN102214699A (en) * 2006-07-04 2011-10-12 株式会社半导体能源研究所 Method for manufacturing display device
CN102212367A (en) * 2010-04-08 2011-10-12 海洋王照明科技股份有限公司 Luminescent thin film and preparation method thereof
CN102308250A (en) * 2008-12-26 2012-01-04 日产化学工业株式会社 Liquid crystal aligning agent for inkjet coating, liquid crystal alignment film and liquid crystal display element
CN102414605A (en) * 2009-05-01 2012-04-11 日产化学工业株式会社 Silicon liquid crystal orientation agent, liquid crystal oriented film, and liquid crystal display element
CN102934013A (en) * 2010-04-06 2013-02-13 日产化学工业株式会社 Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element
CN103718091A (en) * 2011-05-27 2014-04-09 日产化学工业株式会社 Silicon-based liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element
CN104054019A (en) * 2011-11-17 2014-09-17 日产化学工业株式会社 Silicon-based liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element
CN104656311A (en) * 2013-11-15 2015-05-27 Jsr株式会社 Manufacturing method for liquid crystal alignment film, substrate for liquid crystal display device and manufacturing method thereof, and liquid crystal display device
CN104737069A (en) * 2012-08-30 2015-06-24 日产化学工业株式会社 Liquid crystal aligning agent and liquid crystal display element using same
CN105452262A (en) * 2013-06-06 2016-03-30 日产化学工业株式会社 Alkoxysilane compound, liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element
CN106773330A (en) * 2016-11-25 2017-05-31 深圳市华星光电技术有限公司 Liquid crystal panel and its LCD alignment method, liquid crystal display
CN107293741A (en) * 2017-06-29 2017-10-24 宁波吉电鑫新材料科技有限公司 A kind of continuous electronic ion Quick conductive double-perovskite Magnesium ion battery negative material and preparation method thereof
CN109121438A (en) * 2016-02-12 2019-01-01 株式会社半导体能源研究所 Semiconductor device and display device including the semiconductor device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH636453A5 (en) * 1978-11-17 1983-05-31 Bbc Brown Boveri & Cie Liquid-crystal cell having electrode-covering coatings, and method for producing it
TW539901B (en) * 1997-07-31 2003-07-01 Matsushita Electric Ind Co Ltd Chemisorption matter and liquid crystal oriented film and liquid crystal display element using it
JP2002196337A (en) * 2000-09-06 2002-07-12 Seiko Epson Corp Manufacturing method and manufacturing apparatus for optoelectronic device and manufacturing method and manufacturing apparatus for liquid crystal panel
JP3914011B2 (en) * 2001-08-07 2007-05-16 触媒化成工業株式会社 Liquid crystal display cell and coating liquid for liquid crystal display cell
KR100707031B1 (en) * 2005-02-04 2007-04-11 비오이 하이디스 테크놀로지 주식회사 Method for forming alignment film in horizontal electric field mode LCD
CN103739205B (en) * 2013-11-08 2017-06-13 北京京东方光电科技有限公司 Functional material and preparation method thereof, display structure form material, color membrane substrates, display device

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1415694A (en) * 2002-12-10 2003-05-07 中国科学院长春应用化学研究所 Red luminescent powder mixed with europium and its method
US20040165334A1 (en) * 2003-02-26 2004-08-26 Tdk Corporation Multi-layered unit
CN1468934A (en) * 2003-06-16 2004-01-21 中国科学院长春应用化学研究所 Prepn of luminous tungstate film
CN1591134A (en) * 2003-09-04 2005-03-09 精工爱普生株式会社 Inorganic orientation film and its forming method,substrate for electronic device,liquid crystal panel
CN101030526A (en) * 2006-03-03 2007-09-05 株式会社半导体能源研究所 Method of manufacyuring semiconductor device
CN101395527A (en) * 2006-03-07 2009-03-25 日产化学工业株式会社 Silicon-containing liquid crystal aligning agent, liquid crystal alignment film and their production methods
CN101046582A (en) * 2006-03-28 2007-10-03 联诚光电股份有限公司 Process of making liquid crystal orienting film
CN102214699A (en) * 2006-07-04 2011-10-12 株式会社半导体能源研究所 Method for manufacturing display device
CN101109879A (en) * 2006-07-19 2008-01-23 株式会社日立显示器 Liquid display device and fabrication method thereof
CN101523280A (en) * 2006-10-06 2009-09-02 日产化学工业株式会社 Silicon-containing liquid crystal aligning agent and liquid crystal alignment film
CN102308250A (en) * 2008-12-26 2012-01-04 日产化学工业株式会社 Liquid crystal aligning agent for inkjet coating, liquid crystal alignment film and liquid crystal display element
CN101805618A (en) * 2009-02-18 2010-08-18 Jsr株式会社 The manufacture method of formation method, liquid crystal display device and the liquid crystal display device of liquid crystal aligning agent, liquid crystal orientation film
CN102414605A (en) * 2009-05-01 2012-04-11 日产化学工业株式会社 Silicon liquid crystal orientation agent, liquid crystal oriented film, and liquid crystal display element
JP2011141502A (en) * 2010-01-09 2011-07-21 Seiko Epson Corp Method of manufacturing liquid crystal device
CN102135685A (en) * 2010-01-27 2011-07-27 精工爱普生株式会社 Liquid crystal device and method of producing the same
CN102934013A (en) * 2010-04-06 2013-02-13 日产化学工业株式会社 Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element
CN102212367A (en) * 2010-04-08 2011-10-12 海洋王照明科技股份有限公司 Luminescent thin film and preparation method thereof
CN103718091A (en) * 2011-05-27 2014-04-09 日产化学工业株式会社 Silicon-based liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element
CN104054019A (en) * 2011-11-17 2014-09-17 日产化学工业株式会社 Silicon-based liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element
CN104737069A (en) * 2012-08-30 2015-06-24 日产化学工业株式会社 Liquid crystal aligning agent and liquid crystal display element using same
CN105452262A (en) * 2013-06-06 2016-03-30 日产化学工业株式会社 Alkoxysilane compound, liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element
CN104656311A (en) * 2013-11-15 2015-05-27 Jsr株式会社 Manufacturing method for liquid crystal alignment film, substrate for liquid crystal display device and manufacturing method thereof, and liquid crystal display device
CN109121438A (en) * 2016-02-12 2019-01-01 株式会社半导体能源研究所 Semiconductor device and display device including the semiconductor device
CN106773330A (en) * 2016-11-25 2017-05-31 深圳市华星光电技术有限公司 Liquid crystal panel and its LCD alignment method, liquid crystal display
CN107293741A (en) * 2017-06-29 2017-10-24 宁波吉电鑫新材料科技有限公司 A kind of continuous electronic ion Quick conductive double-perovskite Magnesium ion battery negative material and preparation method thereof

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
G.M.WU: "RF sputtering deposited a-IGZO films for LCD alignment layer application", 《APPLIED SURFACE SCIENCE》 *
卢自桂: "锰酸镧和氧化钇稳定的氧化锆复合阴极的研究", 《高等学校化学学报》 *
曹梦军: "非摩擦液晶取向技术专利分析", 《河南科技》 *
章艳玲: "硝酸镧掺杂对6061铝合金表面硅烷膜耐蚀性能的影响", 《材料保护》 *

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