CN110064384B - Photocatalytic slurry, photocatalytic fabric and preparation method thereof - Google Patents

Photocatalytic slurry, photocatalytic fabric and preparation method thereof Download PDF

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CN110064384B
CN110064384B CN201910382967.3A CN201910382967A CN110064384B CN 110064384 B CN110064384 B CN 110064384B CN 201910382967 A CN201910382967 A CN 201910382967A CN 110064384 B CN110064384 B CN 110064384B
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photocatalytic
fabric
slurry
graphene
semiconductor material
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CN110064384A (en
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尤勇
徐凯
汤京敏
王胜
刘兆平
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Ningbo Graphene Innovation Center Co Ltd
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Ningbo Graphene Innovation Center Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/18—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
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    • B01J23/24—Chromium, molybdenum or tungsten
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    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
    • B01J23/32—Manganese, technetium or rhenium
    • B01J23/34—Manganese
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
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    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
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    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/46—Oxides or hydroxides of elements of Groups 4 or 14 of the Periodic Table; Titanates; Zirconates; Stannates; Plumbates
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    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
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    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
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    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
    • D06M11/48—Oxides or hydroxides of chromium, molybdenum or tungsten; Chromates; Dichromates; Molybdates; Tungstates
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    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/51—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with sulfur, selenium, tellurium, polonium or compounds thereof
    • D06M11/55—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with sulfur, selenium, tellurium, polonium or compounds thereof with sulfur trioxide; with sulfuric acid or thiosulfuric acid or their salts
    • D06M11/56—Sulfates or thiosulfates other than of elements of Groups 3 or 13 of the Periodic Table
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    • D06M16/00—Biochemical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. enzymatic
    • D06M16/003—Biochemical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. enzymatic with enzymes or microorganisms
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Abstract

The application provides a photocatalytic slurry, a photocatalytic fabric and a preparation method thereof, and relates to the technical field of photocatalysts. The photocatalytic fabric is obtained by forming photocatalytic slurry on the surface of a fabric and carrying the photocatalytic slurry on the surface of the fabric through treatment at the temperature of 70-100 ℃. The preparation method of the photocatalytic slurry comprises the following steps: the graphene material, the semiconductor material and the engineering bacteria colony are dispersed in a liquid phase substance, and the liquid phase substance comprises an alcohol substance and/or water. The mucus secreted by the engineering bacteria under the induction of proper temperature can play a role in bonding, and is beneficial to loading the photocatalytic slurry on the fabric.

Description

Photocatalytic slurry, photocatalytic fabric and preparation method thereof
Technical Field
The application relates to the technical field of photocatalysts, in particular to a photocatalytic slurry, a photocatalytic fabric and a preparation method thereof.
Background
The photocatalyst has unique catalytic reaction performance on organic matters, so the photocatalyst has a very wide application prospect in the aspect of environmental management. The photocatalyst is converted into an excited state from a stable state under the irradiation of sunlight, internal electrons jump from the excited band to a conduction band, and corresponding electron holes are generated on the excited band, wherein the electron holes react with water molecules attached to the surface of the photocatalyst to further generate hydroxyl radicals, and photo-generated electrons react with oxygen molecules to generate superoxide anions. The hydroxyl free radical and the superoxide anion have strong oxidizability, and can decompose organic pollutants into carbon dioxide and water, so that the purpose of treating the environment is achieved, and the photocatalyst does not change in the whole process, so that the photocatalyst has long-term activity.
However, the existing photocatalyst is difficult to be loaded on the surface of the fabric during the application.
Disclosure of Invention
An object of an embodiment of the present application is to provide a photocatalytic slurry, a photocatalytic fabric and a preparation method thereof, and aims to solve the problem that a photocatalyst is difficult to load on the surface of a fabric.
In a first aspect, an embodiment of the present application provides a photocatalytic slurry, which includes a liquid-phase substance and a main material dispersed in the liquid-phase substance, where the main material includes a graphene material, a semiconductor material, and an engineering bacteria colony, and the liquid-phase substance includes an alcohol substance and/or water.
In the implementation process, the energy band structure of the semiconductor material is composed of a low-energy valence band and a high-energy conduction band, under illumination, electrons on the valence band of the semiconductor material are excited onto the conduction band, and meanwhile, holes are generated on the valence band, the valence band holes are good oxidizing agents, the conduction band electrons are good reducing agents, the valence band holes react with water molecules attached to the surface of the photocatalytic material to further generate hydroxyl radicals, and the conduction band electrons react with oxygen molecules to generate superoxide anions. The hydroxyl free radicals and the superoxide anions have strong oxidizability, pollutants can be decomposed into carbon dioxide and water, and the whole process of the semiconductor material is not changed. In addition, because the semiconductor material and the graphene material are both dispersed in a liquid phase substance, conduction band electrons are easily transferred from the semiconductor to the graphene material through an interface formed by the semiconductor and the graphene material, and the two-dimensional plane structure of the graphene material can rapidly transfer the electrons to pollutants with high carrier mobility, so that the mean free path of the conduction band electrons is prolonged, the recombination of valence band holes and the conduction band electrons is reduced, and the photocatalysis efficiency is improved. And the graphene material has a large amount of n electrons, so that n-n action can be generated between the graphene material and pollutant molecules, and the adsorption capacity of the photocatalytic slurry and pollutants is improved, so that the photocatalytic degradation efficiency is improved. In addition, the inventor finds that mucus secreted by engineering bacteria under the induction of proper temperature can play a role in adhesion, and is beneficial to loading photocatalytic slurry on fabrics. And the engineering bacteria have the characteristic of degrading pollutants such as nitrogen, phosphorus and the like, so that the sewage treatment efficiency can be improved. In addition, the engineering bacteria can survive in the liquid phase environment in the scheme, and the liquid phase substance is relatively environment-friendly and has no pollution to the environment.
In one possible embodiment, the engineering bacteria comprise one or more of bacillus licheniformis, bacillus subtilis, bacillus amyloliquefaciens and bacillus thuringiensis.
The engineering bacteria can generate mucus at a proper temperature, and the photocatalytic slurry is favorably loaded on the fabric.
In one possible embodiment, the semiconductor material comprises TiO2、ZnO、CdS、MnO2、WO3And BiVO4One or more of;
and/or the graphene material comprises one or more of graphene, graphene oxide and reduced graphene oxide.
In the implementation process, the semiconductor material has better photocatalytic capability and can be compounded with the graphene material to increase the photocatalytic effect of the semiconductor material. In addition, the graphene material can increase the photocatalytic effect of the semiconductor material.
In one possible embodiment, the alcohol species comprises any one of methanol, ethanol, propanol, and n-butanol.
In the implementation process, the engineering bacteria colony is easy to survive in the alcohol substance, and the graphene material, the semiconductor material and the engineering bacteria colony can be well dispersed in the alcohol substance.
In a possible embodiment, the weight ratio of the graphene material, the semiconductor material and the bacterial colony of the engineering bacteria is 1 (10-50) to (10-50).
In the implementation process, the photocatalytic slurry can be well loaded on the surface of the fabric by the graphene material, the semiconductor material and the engineering bacteria colony in the proportion.
In a second aspect, embodiments of the present application provide a method for preparing a photocatalytic paste according to an embodiment of the first aspect, including: and dispersing the graphene material, the semiconductor material and the bacterial colony of the engineering bacterium in a liquid-phase substance.
In the implementation process, the graphene material and the semiconductor material are dispersed in a liquid phase, and the monoatomic layer two-dimensional plane structure of the graphene material has a large specific surface area, so that the dispersion of the semiconductor material is facilitated, and a good interface can be formed between the graphene material and the semiconductor material, so that the graphene material two-dimensional plane structure can rapidly transfer electrons to pollutants with high carrier mobility. In addition, the engineering bacteria, the graphene material and the semiconductor material are dispersed in a liquid phase substance together, the engineering bacteria can secrete mucus to exert viscosity under a proper temperature condition, the graphene material and the semiconductor material can be well combined together, and the photocatalytic slurry is better loaded on the surface of the fabric.
In one possible embodiment, the graphene material and the semiconductor material are firstly sanded, and then the engineering bacteria colony, the sanded graphene material and the sanded semiconductor material are dispersed in the liquid phase substance; or dispersing the graphene material, the semiconductor material and the engineering bacteria colony in a liquid phase substance, and then sanding.
In the implementation process, the graphene material and the semiconductor material are firstly subjected to sanding, so that the particle size of the graphene material and the particle size of the semiconductor material are reduced, and the graphene material and the semiconductor material are favorably dispersed in a liquid phase substance better. The graphene material, the semiconductor material and the engineering bacteria colony are dispersed in the liquid phase substance, and then sanding is carried out, so that the granularity of the graphene material and the semiconductor material is reduced, and the dispersion effect in the liquid phase substance is better.
In a third aspect, embodiments of the present application provide a photocatalytic fabric, where the photocatalytic fabric is obtained by supporting the photocatalytic slurry of the embodiment of the first aspect on the surface of the fabric.
In the implementation process, because the photocatalytic slurry in the embodiment of the first aspect has better photocatalytic degradation efficiency and sewage treatment capability, the photocatalytic fabric obtained by loading the photocatalytic slurry on the surface of the fabric also has better photocatalytic degradation efficiency and sewage treatment capability, and the photocatalytic fabric can be applied to various aspects such as clothing, environmental management and the like.
In a fourth aspect, embodiments of the present application provide a method for preparing a photocatalytic fabric according to embodiments of the third aspect, including: and forming the photocatalytic slurry on the surface of the fabric, and treating at the temperature of 70-100 ℃.
In the implementation process, engineering bacteria in the photocatalyst slurry can secrete mucus to play a role in viscosity at 70-100 ℃, so that the photocatalyst slurry can be adhered to the surface of a fabric, and a solid substance is formed after the photocatalyst slurry is dried and loaded on the surface of the fabric.
In one possible embodiment, the manner in which the photocatalytic paste is formed on the surface of the fabric includes coating and/or soaking.
In the implementation process, the photocatalytic slurry can be attached to the surface of the fabric in a coating or soaking mode or a coating and soaking mode.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are required to be used in the embodiments of the present application will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and that those skilled in the art can also obtain other related drawings based on the drawings without inventive efforts.
Fig. 1 is an SEM test pattern of a photocatalytic fabric provided in example 1 of the present application;
fig. 2 is an SEM test pattern of the photocatalytic fabric provided in example 2 of the present application;
fig. 3 is an SEM test pattern of the photocatalytic fabric provided in example 3 of the present application;
FIG. 4 is an SEM test pattern of a photocatalytic fabric provided in comparative example 1 of the present application;
fig. 5 is an SEM test pattern of the photocatalytic fabric provided in comparative example 2 of the present application.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions of the embodiments of the present application will be clearly and completely described below. The examples, in which specific conditions are not specified, were conducted under conventional conditions or conditions recommended by the manufacturer. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products available commercially.
It should be noted that "and/or" in the present application, such as "scheme a and/or scheme B" means that the three modes of scheme a alone, scheme B alone, scheme a plus scheme B may be used. The plurality of embodiments in the present application is two or more unless otherwise specified.
A photocatalytic slurry, a photocatalytic fabric, and a method for preparing the same in the embodiments of the present application will be described below.
The embodiment provides a photocatalytic slurry, which comprises a liquid-phase substance and a main material dispersed in the liquid-phase substance, wherein the main material comprises a graphene material, a semiconductor material and an engineering bacteria colony, and the liquid-phase substance comprises an alcohol substance and/or water.
The main material dispersed in the liquid phase material, that is, the liquid phase material is a material capable of dispersing the main material in the system. The alcohol substance and/or water refers to alcohol substance, water, or water solution of alcohol substance. The aqueous solution of the alcohol substance herein refers to a liquid obtained by mixing the alcohol substance with water at any ratio, and illustratively, the mass percentage concentration of the alcohol substance in the aqueous solution of the alcohol substance is 1% to 99%, or 5% to 80%, or 20% to 60%, for example, including but not limited to one or any range between 99%, 95%, 85%, 75%, 60%, 50%, 30%, 10%, 5%, 1%, etc. In addition, alcohols refer to anhydrous alcohols.
In some possible embodiments, the alcohol species includes any one of methanol, ethanol, propanol, and n-butanol.
Further, the engineering bacteria comprise one or more of bacillus licheniformis, bacillus subtilis, bacillus amyloliquefaciens and bacillus thuringiensis.
In addition, the semiconductor material comprises TiO2、ZnO、CdS、MnO2、WO3And BiVO4One or more of;
and/or the graphene material comprises one or more of graphene, graphene oxide and reduced graphene oxide.
Further, in a possible embodiment, the weight ratio of the graphene material, the semiconductor material and the bacterial colony of the engineering bacteria is 1 (10-50) to (10-50). Illustratively, the weight ratio of the graphene material, the semiconductor material and the engineered bacteria colony is, for example, but not limited to, one or a range between any two of 1:10:10, 1:10:50, 1:50:10, 1:20:10, 1:30:10, 1:40:10, 1:20:20, 1:30:20, 1:40:20, 1:50:20, 1:20:30, 1:20:40, 1:20:50, 1:30:30, 1:30:40, 1:30:50, 1:40:30, 1:50:40, and 1:40: 50.
The embodiment provides a preparation method of the photocatalytic slurry, which comprises the following steps: and dispersing the graphene material, the semiconductor material and the bacterial colony of the engineering bacterium in a liquid-phase substance.
Illustratively, the graphene material, the semiconductor material and the engineered bacteria colony can be respectively dispersed in the liquid phase substance in sequence, wherein the sequence of adding the graphene material, the semiconductor material and the engineered bacteria colony in sequence is not limited. Or the graphene material and the semiconductor material can be mixed and then dispersed in the liquid phase substance, and then the engineering bacteria colony is dispersed in the liquid phase substance. Or the engineering bacteria colony is dispersed in the liquid phase substance, then the graphene material and the semiconductor material are mixed, and then the mixture is dispersed in the liquid phase substance. It should be noted that, in the present application, there is no specific limitation on how the graphene material, the semiconductor material, and the engineering bacteria colony are dispersed in the liquid-phase substance, as long as the graphene material, the semiconductor material, and the engineering bacteria colony can be dispersed in the liquid-phase substance.
In a possible embodiment, the graphene material and the semiconductor material are firstly sanded, and then the engineering bacteria colony, the sanded graphene material and the sanded semiconductor material are dispersed in the liquid phase substance.
In another possible embodiment, the graphene material, the semiconductor material and the engineering bacteria colony are dispersed in a liquid phase substance and then subjected to sand grinding.
For example, the above solution may be wet-sanded by using a sand mill. Optionally, the rotation speed of the sand mill is 500-5000 r/min, and the sand milling time is 1-10 h. Optionally, the rotation speed is 1000-4000 r/min, or 2000-3000 r/min. The rotational speed is, for example, but not limited to, a range between one or any two of 500r/min, 800r/min, 1000r/min, 1500r/min, 2000r/min, 3000r/min, 3500r/min, 4000r/min, and 5000 r/min. Optionally, the sanding time is 2-8 hours, or 4-6 hours. Sanding times are for example, but not limited to, one or a range between any two of 1h, 2h, 4h, 5h, 6h, 7h, 8h, and 10 h.
In the two schemes, as long as the purpose of sanding can be achieved, the sanding equipment and the sanding mode are not particularly limited in the embodiment of the present application.
The embodiment also provides a photocatalytic fabric, and the photocatalytic fabric is obtained by loading the photocatalytic slurry on the surface of the fabric.
The material of the fabric according to the embodiment of the present invention includes, but is not limited to, silk, cotton, hemp, wool, polyester, and the like. It is understood that the fabric may be a pure woven fabric made of one of the above materials, or a blended or blended fabric made of two or more different materials. The type of fabric is not particularly limited in this application.
The embodiment also provides a preparation method of the photocatalytic fabric, which comprises the following steps: and forming the photocatalytic slurry on the surface of the fabric, and treating at the temperature of 70-100 ℃ to load the photocatalytic slurry on the surface of the fabric.
Illustratively, the manner in which the photocatalytic paste is formed on the surface of the fabric includes coating and/or soaking. The photocatalytic slurry can be attached to the surface of the fabric in a coating or soaking or coating and soaking mode, engineering bacteria secrete mucus to play a viscosity role at the temperature of 70-100 ℃, so that the photocatalytic slurry can be attached to the surface of the fabric, and the photocatalytic slurry is dried to form a solid matter to be loaded on the surface of the fabric. Wherein the treatment temperature is optionally in a range of one or any two of 70 ℃, 75 ℃, 80 ℃, 85 ℃, 90 ℃, 95 ℃ and 100 ℃. In addition, the coating method includes, but is not limited to, a blade coating method, a casting coating method, a brush coating method, a roll coating method, a spray coating method, and the like.
The features and properties of the present application are described in further detail below with reference to examples.
Example 1
Mixing graphene and TiO2Dispersing the mixture and the bacillus licheniformis in water according to the weight ratio of 1:10:10 to obtain a dispersion solution, placing the dispersion solution in a sand mill, and sanding for 1h under the condition that the rotating speed is 500r/min to obtain the photocatalytic slurry.
Soaking the fabric in the photocatalytic slurry, coating the photocatalytic slurry on the surface of the fabric by using a roll coating method, and drying at the temperature of 70 ℃ to obtain the photocatalytic fabric.
Example 2
Mixing graphene and TiO2Dispersing the mixture and the bacillus licheniformis in water according to the weight ratio of 1:20:20 to obtain a dispersion solution, placing the dispersion solution in a sand mill, and sanding for 3 hours at the rotation speed of 1000r/min to obtain the photocatalytic slurry.
Soaking the fabric in the photocatalytic slurry, coating the photocatalytic slurry on the surface of the fabric by using a roll coating method, and drying at the temperature of 80 ℃ to obtain the photocatalytic fabric.
Example 3
Dispersing graphene, ZnO and bacillus amyloliquefaciens in water according to the weight ratio of 1:50:50 to obtain a dispersion liquid, placing the dispersion liquid in a sand mill, and sanding for 10 hours at the rotation speed of 5000r/min to obtain the photocatalytic slurry.
Soaking the fabric in the photocatalytic slurry, coating the photocatalytic slurry on the surface of the fabric by using a roll coating method, and drying at the temperature of 100 ℃ to obtain the photocatalytic fabric.
Example 4
Mixing graphene oxide and MnO2Dispersing the mixture and the bacillus subtilis in a weight ratio of 1:10:50 into 75% ethanol water solution by mass percentage to obtain dispersion liquid, placing the dispersion liquid into a sand mill, and sanding for 7 hours at a rotating speed of 2000r/min to obtain the photocatalytic slurry.
And coating the photocatalytic slurry on the surface of the fabric by using a roll coating method, and drying at the temperature of 90 ℃ to obtain the photocatalytic fabric.
Example 5
Mixing graphene oxide and WO3Dispersing the dispersion liquid and the Bacillus thuringiensis in a weight ratio of 1:50:10 into 95% ethanol water solution to obtain dispersion liquid, placing the dispersion liquid into a sand mill, and sanding for 7 hours at a rotating speed of 2000r/min to obtain the photocatalytic slurry.
Coating the photocatalytic slurry on the surface of the fabric by a blade coating method, and drying at the temperature of 90 ℃ to obtain the photocatalytic fabric.
Example 6
Dispersing reduced graphene oxide, ZnO and bacillus licheniformis in a weight ratio of 1:20:30 into 25% ethanol water solution by mass percent to obtain dispersion, placing the dispersion in a sand mill, and sanding for 5 hours at a rotating speed of 3000r/min to obtain the photocatalytic slurry.
And coating the photocatalytic slurry on the surface of the fabric by using a roll coating method, and drying at the temperature of 85 ℃ to obtain the photocatalytic fabric.
Comparative example 1
Mixing graphene and TiO2Dispersing the mixture and the bacillus licheniformis in water according to the weight ratio of 1:10:10 to obtain a dispersion solution, placing the dispersion solution in a sand mill, and sanding for 1h under the condition that the rotating speed is 500r/min to obtain the photocatalytic slurry.
Soaking the fabric in the photocatalytic slurry, coating the photocatalytic slurry on the surface of the fabric by using a roll coating method, and drying at the temperature of 60 ℃ to obtain the photocatalytic fabric.
Comparative example 2
Mixing graphene and TiO2Dispersing the mixture and the bacillus licheniformis in water according to the weight ratio of 1:20:20 to obtain a dispersion solution, placing the dispersion solution in a sand mill, and sanding for 3 hours at the rotation speed of 1000r/min to obtain the photocatalytic slurry.
Soaking the fabric in the photocatalytic slurry, coating the photocatalytic slurry on the surface of the fabric by using a roll coating method, and drying at the temperature of 110 ℃ to obtain the photocatalytic fabric.
Test examples
(1) The photocatalytic fabrics of examples 1-3 and comparative examples 1-2 were observed under a scanning electron microscope to obtain SEM images as shown in FIGS. 1-5.
And (4) analyzing results: as can be seen from fig. 1, the thickness of the photocatalytic paste on the surface of the fabric of example 1 after drying was 20 nm. As can be seen from fig. 2, the thickness of the photocatalytic paste on the surface of the fabric of example 2 after drying was 50 nm. As can be seen from FIG. 3, the thickness of the photocatalytic paste on the surface of the fabric of example 3 after drying was 200 nm. As can be seen from fig. 4, the thickness of the photocatalytic paste on the surface of the fabric of comparative example 1 after drying was 5 nm. As can be seen from fig. 5, the thickness of the photocatalytic paste on the surface of the fabric of comparative example 2 after drying was 15 nm. From the above results, it can be seen that the fabric surface of examples 1 to 3 of the present application was supported with a dried photocatalytic paste thickness higher than that of comparative examples 1 to 2.
(2) And (3) load rate testing: the fabrics of examples 1-3 and comparative examples 1-2 were weighed to obtain a result of M1, and the photocatalytic fabrics of examples 1-3 and comparative examples 1-2 were weighed to obtain a result of M2, and the loading ratio was (M2-M1)/M1. The results of the load factor tests for examples 1-3 and comparative examples 1-2 are reported in table 1.
Table 1 load factor test results
Example 1 Example 2 Example 3 Comparative example 1 Comparative example 2
Rate of load 3％ 10％ 30％ 1％ 2％
As can be seen from the results of Table 1, the load ratios of examples 1 to 3 were all larger than those of comparative examples 1 to 2. In addition, by comparing example 1 and comparative example 1, the preparation steps and processes of the photocatalytic fabrics of example 1 and comparative example 1 are different only in treatment temperature, and example 1 having a treatment temperature of 70 ℃ has a higher loading rate than comparative example 1 having a treatment temperature of 60 ℃. By comparing example 2 and comparative example 2, the preparation steps and processes of the photocatalytic fabrics of example 2 and comparative example 2 are different only in treatment temperature, and example 2 having a treatment temperature of 80 ℃ has a higher loading rate than comparative example 2 having a treatment temperature of 110 ℃. The method is used for solving the problem that the photocatalytic slurry can be better loaded on the surface of the fabric due to the fact that the engineering bacteria secrete mucus at a proper treatment temperature (70-100 ℃).
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (6)

1. A photocatalytic fabric is characterized in that the photocatalytic fabric is obtained by loading photocatalytic slurry on the surface of a fabric; the photocatalytic slurry comprises a liquid-phase substance and main materials dispersed in the liquid-phase substance, wherein the main materials comprise a graphene material, a semiconductor material and an engineering bacterium colony, and the liquid-phase substance comprises an alcohol substance and/or water;
the engineering bacteria comprise one or more of bacillus licheniformis, bacillus subtilis, bacillus amyloliquefaciens and bacillus thuringiensis.
2. The photocatalytic fabric of claim 1, wherein the semiconductor material comprises TiO2、ZnO、CdS、MnO2、WO3And BiVO4One or more of;
and/or the graphene material comprises one or more of graphene, graphene oxide and reduced graphene oxide.
3. The photocatalytic fabric of claim 1, wherein the alcohol substance includes any one of methanol, ethanol, propanol and n-butanol.
4. The photocatalytic fabric as set forth in any one of claims 1 to 3, wherein the weight ratio of the graphene material, the semiconductor material and the bacterial colony of the engineering bacteria is 1 (10-50) to (10-50).
5. A method for preparing a photocatalytic fabric as set forth in any one of claims 1 to 4, comprising: and forming the photocatalytic slurry on the surface of the fabric, and treating at the temperature of 70-100 ℃.
6. The method of claim 5, wherein the photocatalytic slurry is formed on the surface of the fabric by coating and/or soaking.
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