CN110058491A - Photoresist and display panel - Google Patents
Photoresist and display panel Download PDFInfo
- Publication number
- CN110058491A CN110058491A CN201910320458.8A CN201910320458A CN110058491A CN 110058491 A CN110058491 A CN 110058491A CN 201910320458 A CN201910320458 A CN 201910320458A CN 110058491 A CN110058491 A CN 110058491A
- Authority
- CN
- China
- Prior art keywords
- photoresist
- absorption particle
- particle
- duv
- euv
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
The present invention provides a kind of photoresist and display panel.Photoresist of the invention includes resin, emulsion, polymer monomer, solvent and UV Absorption particle, the UV Absorption particle is used to absorb the ultraviolet light injected in the photoresist, by introducing UV Absorption particle in the photoresist, part DUV and EUV ultraviolet light can be absorbed respectively in the DUV board cleaning processing procedure and EUV board cleaning processing procedure of display panel, to reduce destruction of the DUV/EUV ultraviolet light to photoresist, reduce influence of the DUV/EUV board cleaning processing procedure to Other substrate materials film layer in display panel, inhibit the generation of Other substrate materials film layer emergent gas, and then reduce the ion concentration in LCD panel liquid crystal layer, improve the display quality of LCD.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of photoresists and display panel.
Background technique
Thin-film transistor LCD device (Thin Film Transistor Liquid Crystal Display,
TFT-LCD) there are many merits such as thin fuselage, power saving, radiationless, be widely used.Liquid crystal on existing market
Showing device is largely backlight liquid crystal display device comprising liquid crystal display panel and backlight module (backlight
module).Usual liquid crystal display panel by color film (Color Filter, CF) substrate, tft array substrate, be sandwiched in color membrane substrates
Liquid crystal (Liquid Crystal, LC) and the sealing frame glue'' (Sealant) composition between tft array substrate.CF substrate is LCD
For realizing the main devices of colored display, constitute and generally include substantially: glass substrate, black matrix" (Black Matrix,
BM), chromatic filter layer etc..Wherein, chromatic filter layer is mainly and passes through chromatic photoresist to achieve the effect that colored display, backlight
The light of sending is incident on CF substrate by the modulation of liquid crystal molecule, is enameled red (R) photoresist, green of filter layer by CF substrate
The filter action of color (G) photoresist and blue (B) photoresist shows three kinds of light of red, green, blue, the photoresist point of different colours respectively
The light of other TEM investigation color bands, to realize the colored display of display.
The photoresist raw material important as TFT-LCD industry is widely used in the production of modern panel, such as CF substrate-side
Black matrix", the resistance of chromatic filter layer RGB color, organic coating layer (over coat, OC) and spacer (photo spacer, PS)
Deng the organic insulation flatness layer (Polymer Film on Array, PFA) etc. of tft array substrate side for another example.This kind of photoresist
Material can be used as direct material and retain in the panel, thus the stability of such material is such as: heat resistance, resistant to chemical etching
Property, light shine etc. are particularly important to panel quality.
In TFT-LCD processing procedure, the cleanliness of substrate has vital influence to the yield of panel and quality.It is dark purple
The ultraviolet light of outer light (Deep Ultraviolet, DUV) or extreme ultraviolet (Extreme Ultraviolet, EUV) cleans conduct
The most effectual way of removal organic polluter is gone to be widely used in the board cleaning technique of TFT-LCD.DUV or EUV ultraviolet light
Clean principle is: the change of the solvent or organic matter that remain on substrate is interrupted using the ultraviolet light of the wave band of 254nm or 172nm
Key is learned, so that the oligomer for resolving into gas removal or it is made to resolve into small-molecular-weight residual organic matter charing, then matches again
The cleaning such as lye or chemical liquid is closed, the organic substance residues on substrate are finally completely removed.
DUV or EUV cleaning as removal substrate organic substance residues most efficient method, wavelength respectively correspond 254nm and
172nm, photon energy are enough to interrupt most of chemical bonds in photoetching gum resin, such as common acrylic tree in photoresist
Rouge, to make acryl resin that scission of link occur or decompose to generate emergent gas (outgas).And decompose outgas pairs generated
It is totally unfavorable factor for TFT-LCD, there are two main influences: (1) after CF substrate and tft array substrate are assembled into box
Outgas is slowly escaped, and is rushed in liquid crystal and is generated liquid crystal bubbles (bubble);(2) the outgas contaminated liquid in liquid crystal is rushed in
Crystalline substance, ion concentration promotion causes image retention (image sticking) to occur, to influence TFT-LCD display quality.
Summary of the invention
The purpose of the present invention is to provide a kind of photoresists, can reduce DUV/EUV board cleaning processing procedure in display panel
The influence of Other substrate materials film layer inhibits the generation of Other substrate materials film layer emergent gas.
The object of the invention is also to provide a kind of display panels, can reduce DUV/EUV board cleaning processing procedure to display surface
The influence of Other substrate materials film layer in plate inhibits the generation of Other substrate materials film layer emergent gas.
To achieve the above object, the present invention provides a kind of photoresists, including resin, emulsion, polymer monomer, solvent
And UV Absorption particle, the UV Absorption particle are used to absorb the ultraviolet light injected in the photoresist.
The UV Absorption particle is inorganic matter nano particle;The forbidden bandwidth of the UV Absorption particle is 4.5-
8.5ev。
The UV Absorption particle includes SiO2Nano particle, GeO2Nano particle and Ga2O3One of nano particle
Or it is a variety of.
The partial size of the UV Absorption particle is 1-50nm.
Weight percentage of the UV Absorption particle in the photoresist is 0.1%-2%.
The UV Absorption particle is distributed in the photoresist by way of physical blending.
The photoresist is colored photoresist, further includes colorant and dispersing agent, the coloured silk being used to prepare in display panel
Color filtering optical layer;
The weight percentage of the solvent, resin, polymer monomer, emulsion in the photoresist is respectively 80-
90%, 5-8%, 5-8% and 0.2-0.6%.
The colorant is the combination of pigment, dyestuff or both.
The photoresist is transparent photomask glue, is used to prepare array substrate side organic insulator;
The weight percentage of the solvent, resin, polymer monomer, emulsion in the photoresist is respectively 80-
85%, 10-15%, 5-8% and 2-5%.
The present invention also provides a kind of display panel, including photoresist film layer, the photoresist film layer is by light as described above
Photoresist is prepared.
Beneficial effects of the present invention: photoresist of the invention, including resin, emulsion, polymer monomer, solvent and purple
Outer light absorption particle, the UV Absorption particle are used to absorb the ultraviolet light injected in the photoresist, by
UV Absorption particle is introduced in photoresist, it can be in the DUV board cleaning processing procedure and EUV board cleaning processing procedure of display panel
Part DUV and EUV ultraviolet light is absorbed respectively, to reduce destruction of the DUV/EUV ultraviolet light to photoresist, reduces DUV/EUV base
Plate cleans influence of the processing procedure to Other substrate materials film layer in display panel, inhibits the generation of Other substrate materials film layer emergent gas,
And then the ion concentration in LCD panel liquid crystal layer is reduced, improve the display quality of LCD.Display panel of the invention, including by upper
The photoresist film layer that photoresist is prepared is stated, can effectively reduce DUV/EUV board cleaning processing procedure to photoresist in display panel
The influence of film layer inhibits the generation of Other substrate materials film layer emergent gas, and then reduces the ion in LCD panel liquid crystal layer
Concentration improves the display quality of LCD.
Detailed description of the invention
With reference to the accompanying drawing, by the way that detailed description of specific embodiments of the present invention, technical solution of the present invention will be made
And other beneficial effects are apparent.
In attached drawing,
Fig. 1 is the structural schematic diagram of one preferred embodiment of display panel of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example is described in detail.
Present invention firstly provides a kind of photoresists, including resin, emulsion, polymer monomer, solvent and at least one
UV Absorption particle, the UV Absorption particle are used to absorb the ultraviolet light injected in the photoresist.
Specifically, the UV Absorption particle is inorganic matter nano particle;The forbidden band of the UV Absorption particle is wide
Degree is 4.5-8.5ev.
Specifically, the UV Absorption particle can be selected from SiO2(silica) nano particle, GeO2(germanium oxide) nanometer
Grain, Ga2O3(calcium oxide) nano particle and other nano particles etc. with UV Absorption property, wherein SiO2Nano particle,
GeO2Nano particle, Ga2O3Forbidden bandwidth corresponding to nano particle respectively may be about 8ev, 5.04ev and 4.9ev.
Specifically, the partial size of the UV Absorption particle is 1-50nm.
Specifically, weight percentage of the UV Absorption particle in the photoresist is 0.1%-2%.
Specifically, the UV Absorption particle is distributed in the photoresist by way of physical blending.
Specifically, the photoresist can be colourama photoresist, further include colorant and dispersing agent, be used to prepare colour
Filter layer;The weight percentage of the solvent, resin, polymer monomer, emulsion in the photoresist is respectively 80-
90%, 5-8%, 5-8% and 0.2-0.6%;Wherein, the colorant is the combination of pigment, dyestuff or both.
Alternatively, the photoresist may be transparent photomask glue, it is used to prepare array substrate side organic insulator
(PFA);The weight percentage of the solvent, resin, polymer monomer, emulsion in the photoresist is respectively 80-
85%, 10-15%, 5-8% and 2-5%.
Photoresist of the invention, including resin, emulsion, polymer monomer, solvent and UV Absorption particle, it is described
UV Absorption particle is used to absorb the ultraviolet light injected in the photoresist, by introducing ultraviolet light in the photoresist
Absorbing particle, can be absorbed respectively in the DUV board cleaning processing procedure and EUV board cleaning processing procedure of display panel part DUV and
EUV ultraviolet light reduces DUV/EUV board cleaning processing procedure to display surface to reduce destruction of the DUV/EUV ultraviolet light to photoresist
The influence of Other substrate materials film layer in plate inhibits the generation of Other substrate materials film layer emergent gas, and then reduces LCD panel liquid crystal
Ion concentration in layer, improves the display quality of LCD.
Referring to Fig. 1, based on above-mentioned photoresist, the present invention also provides a kind of display panels, including by above-mentioned photoresist
The photoresist film layer of prepared formation.
Fig. 1 is the structural schematic diagram of one preferred embodiment of display panel of the invention, as shown in Figure 1, the present embodiment includes
The upper substrate 1 being oppositely arranged and lower substrate 2 and liquid crystal layer 3 and spacer 4 between the upper substrate 1 and lower substrate 2,
In, the upper substrate includes the first underlay substrate 11 and the black set on first underlay substrate 11 close to 2 side of lower substrate
Matrix 12;The lower substrate 2 is including TFT substrate 21 and is sequentially arranged in colour filter of the TFT substrate 21 close to 1 side of upper substrate
Photosphere 22 and organic insulator 23.
Specifically, the chromatic filter layer 22 includes red color resistance layer 221 arranged side by side, green color blocking layer 222 and blue color
Resistance layer 223.
Specifically, the organic insulator 23, red color resistance layer 221, green color blocking layer 222 and blue color blocking layer 223 are equal
It include the UV Absorption particle 50 for the photoresist film layer.
Specifically, it is used to form the system of the photoresist of red color resistance layer 221, green color blocking layer 222 and blue color blocking layer 223
Standby process is to be pre-mixed colorant, dispersing agent and the UV Absorption particle 50 after surface treatment according to certain proportion,
Then circulation stirring and filtering are carried out in stirred tank after the processing of dispersion machine imperceptibility, form evenly dispersed intermediate system
Product;By scattered intermediate again with resin, polymer monomer, emulsion, solvent, additive etc. in stirred tank through recycling
Stirring is filtered to uniform, is finally respectively formed the evenly dispersed and stable photoresist for being used to form RGB color resistance layer, wherein molten
The weight percentage of agent is 80-90%, and the weight percentage of resin is 5-8%, the weight percentage of polymer monomer
For 5-8%, the weight percentage of emulsion is 0.2-0.6%, and the weight percentage of UV Absorption particle is 0.1%-
2%, the weight percentage of additive is < 1%.
Specifically, the preparation process for being used to form the photoresist of the organic insulator 23 is, by resin, emulsion, molten
Agent, additive and UV Absorption particle circulation stirring, mistake in stirred tank according to a certain percentage after surface treatment
Filter is ultimately formed and is stablized and finely dispersed photoresist, wherein the weight percentage of solvent is 80-85%, resin to uniform
Weight percentage be 0-15%, the weight percentage 2-5% of emulsion, the weight percentage of UV Absorption particle
For 0.1%-2%, the weight percentage of additive is between 0-2%.
Further, the manufacturing process of the present embodiment display panel, specifically comprises the following steps:
Step S1, TFT substrate 21 is provided, forms the red color resistance of the chromatic filter layer 22 in 21 side of TFT substrate
Layer 221.
Step S2, DUV cleaning treatment or EUV cleaning treatment are carried out to TFT substrate 21, due to being radiated at red color resistance layer
DUV (254nm) or EUV (172nm) ultraviolet light on 221 can be by 50 parts of UV Absorption particle in red color resistance layer 221
It absorbs, damage is generated to the resin in the red color resistance layer 221 on substrate and is caused to can effectively reduce DUV/EUV ultraviolet light
Scission of link;Then the green color blocking layer 222 of the chromatic filter layer 22 is formed in 21 side of TFT substrate.
Step S3, DUV cleaning treatment or EUV cleaning treatment are carried out to TFT substrate 21, at this time red color resistance layer 221 and green
UV Absorption particle 50 in color color blocking layer 222 can absorb part short wave ultraviolet light, so that it is ultraviolet to can effectively reduce DUV/EUV
Light generates damage to the resin in the red color resistance layer 221 and green color blocking layer 222 on substrate;Then in the TFT substrate 21
Side forms the blue color blocking layer 223 of the chromatic filter layer 22, obtains the chromatic filter layer 22.
Step S4, DUV cleaning treatment or EUV cleaning treatment, during cleaning, red color resistance layer are carried out to TFT substrate 21
221, the UV Absorption particle 50 in green color blocking layer 222 and blue color blocking layer 223 can absorb part short wave ultraviolet light, thus
DUV/EUV ultraviolet light be can effectively reduce in red color resistance layer 221, green color blocking layer 222 and the blue color blocking layer 223 on substrate
Resin generate damage, so that the generation of photoresist emergent gas is reduced on the whole, then in the TFT substrate 21 and colored filter
The organic insulator 23 is formed on photosphere 22, obtains the lower substrate 2.
Step S5, it provides the upper substrate 1 and lower substrate 2 and 1 pair of composition box of upper substrate is obtained into display panel.
Display panel of the invention, including photoresist film layer, the photoresist film layer contain UV Absorption particle 50, can have
Effect reduces influence of the DUV/EUV board cleaning processing procedure to Other substrate materials film layer in display panel, inhibits Other substrate materials film layer
The generation of emergent gas, and then the ion concentration in LCD panel liquid crystal layer is reduced, improve the display quality of LCD.
In conclusion photoresist of the invention, including resin, emulsion, polymer monomer, solvent and UV Absorption
Particle, the UV Absorption particle is used to absorb the ultraviolet light injected in the photoresist, by the photoresist
UV Absorption particle is introduced, can be absorbed respectively in the DUV board cleaning processing procedure and EUV board cleaning processing procedure of display panel
Part DUV and EUV ultraviolet light reduces DUV/EUV board cleaning system to reduce destruction of the DUV/EUV ultraviolet light to photoresist
Influence of the journey to Other substrate materials film layer in display panel inhibits the generation of Other substrate materials film layer emergent gas, and then reduces
Ion concentration in LCD panel liquid crystal layer improves the display quality of LCD.Display panel of the invention, including by above-mentioned photoresist
The photoresist film layer being prepared can effectively reduce DUV/EUV board cleaning processing procedure to Other substrate materials film layer in display panel
Influence, inhibit Other substrate materials film layer emergent gas generation, and then reduce LCD panel liquid crystal layer in ion concentration, change
The display quality of kind LCD.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the claims in the present invention
Protection scope.
Claims (10)
1. a kind of photoresist, which is characterized in that including resin, emulsion, polymer monomer, solvent and UV Absorption grain
Son, the UV Absorption particle are used to absorb the ultraviolet light injected in the photoresist.
2. photoresist as described in claim 1, which is characterized in that the UV Absorption particle is inorganic matter nano particle;
The forbidden bandwidth of the UV Absorption particle is 4.5-8.5ev.
3. photoresist as claimed in claim 2, which is characterized in that the UV Absorption particle includes SiO2Nano particle,
GeO2Nano particle and Ga2O3One of nano particle is a variety of.
4. photoresist as described in claim 1, which is characterized in that the partial size of the UV Absorption particle is 1-50nm.
5. photoresist as described in claim 1, which is characterized in that weight of the UV Absorption particle in the photoresist
Amount percentage composition is 0.1%-2%.
6. photoresist as described in claim 1, which is characterized in that the UV Absorption particle is by way of physical blending
It is distributed in the photoresist.
7. photoresist as described in claim 1, which is characterized in that for colored photoresist, further include colorant and dispersing agent, use
In preparing chromatic filter layer;
The weight percentage of the solvent, resin, polymer monomer, emulsion in the photoresist be respectively 80-90%,
5-8%, 5-8% and 0.2-0.6%.
8. photoresist as claimed in claim 7, which is characterized in that the colorant is the combination of pigment, dyestuff or both.
9. photoresist as described in claim 1, which is characterized in that be transparent photomask glue, it is organic to be used to prepare array substrate side
Insulating layer;
The weight percentage of the solvent, resin, polymer monomer, emulsion in the photoresist be respectively 80-85%,
10-15%, 5-8% and 2-5%.
10. a kind of display panel, which is characterized in that including photoresist film layer, the photoresist film layer is by such as claim 1-9
Described in any item photoresists are prepared.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910320458.8A CN110058491A (en) | 2019-04-19 | 2019-04-19 | Photoresist and display panel |
PCT/CN2019/101904 WO2020211232A1 (en) | 2019-04-19 | 2019-08-22 | Photoresist and display panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910320458.8A CN110058491A (en) | 2019-04-19 | 2019-04-19 | Photoresist and display panel |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110058491A true CN110058491A (en) | 2019-07-26 |
Family
ID=67319942
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910320458.8A Pending CN110058491A (en) | 2019-04-19 | 2019-04-19 | Photoresist and display panel |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN110058491A (en) |
WO (1) | WO2020211232A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020211232A1 (en) * | 2019-04-19 | 2020-10-22 | 深圳市华星光电技术有限公司 | Photoresist and display panel |
WO2021017298A1 (en) * | 2019-07-31 | 2021-02-04 | Tcl华星光电技术有限公司 | Display panel and preparation method therefor |
CN114333586A (en) * | 2021-12-30 | 2022-04-12 | 武汉华星光电半导体显示技术有限公司 | Display panel and mobile terminal |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000284112A (en) * | 1999-03-30 | 2000-10-13 | Dainippon Printing Co Ltd | Color filter and its production |
JP2003268367A (en) * | 2002-03-18 | 2003-09-25 | Kasei Optonix Co Ltd | Fluorescent substance for forming fluorescent film and slurry thereof |
CN1760293A (en) * | 2004-10-07 | 2006-04-19 | 拜尔材料科学股份公司 | Hybrid topcoat |
CN103270435A (en) * | 2010-12-24 | 2013-08-28 | 富士胶片株式会社 | Photosensitive transparent composition for color filter of solid-tate imaging device, and production method of color filter of solid-<wbr/>state imaging device, color filter of solid-<wbr/>state imaging device, and solid-<wbr/>state imaging device, each using the sam |
CN105440933A (en) * | 2015-02-15 | 2016-03-30 | 广东天安新材料股份有限公司 | Electron beam curing coating |
CN108885367A (en) * | 2016-05-02 | 2018-11-23 | 株式会社Lg化学 | Polarizer and liquid crystal display including it |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110058491A (en) * | 2019-04-19 | 2019-07-26 | 深圳市华星光电技术有限公司 | Photoresist and display panel |
-
2019
- 2019-04-19 CN CN201910320458.8A patent/CN110058491A/en active Pending
- 2019-08-22 WO PCT/CN2019/101904 patent/WO2020211232A1/en active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000284112A (en) * | 1999-03-30 | 2000-10-13 | Dainippon Printing Co Ltd | Color filter and its production |
JP2003268367A (en) * | 2002-03-18 | 2003-09-25 | Kasei Optonix Co Ltd | Fluorescent substance for forming fluorescent film and slurry thereof |
CN1760293A (en) * | 2004-10-07 | 2006-04-19 | 拜尔材料科学股份公司 | Hybrid topcoat |
CN103270435A (en) * | 2010-12-24 | 2013-08-28 | 富士胶片株式会社 | Photosensitive transparent composition for color filter of solid-tate imaging device, and production method of color filter of solid-<wbr/>state imaging device, color filter of solid-<wbr/>state imaging device, and solid-<wbr/>state imaging device, each using the sam |
CN105440933A (en) * | 2015-02-15 | 2016-03-30 | 广东天安新材料股份有限公司 | Electron beam curing coating |
CN108885367A (en) * | 2016-05-02 | 2018-11-23 | 株式会社Lg化学 | Polarizer and liquid crystal display including it |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020211232A1 (en) * | 2019-04-19 | 2020-10-22 | 深圳市华星光电技术有限公司 | Photoresist and display panel |
WO2021017298A1 (en) * | 2019-07-31 | 2021-02-04 | Tcl华星光电技术有限公司 | Display panel and preparation method therefor |
CN114333586A (en) * | 2021-12-30 | 2022-04-12 | 武汉华星光电半导体显示技术有限公司 | Display panel and mobile terminal |
WO2023123546A1 (en) * | 2021-12-30 | 2023-07-06 | 武汉华星光电半导体显示技术有限公司 | Display panel and mobile terminal |
Also Published As
Publication number | Publication date |
---|---|
WO2020211232A1 (en) | 2020-10-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110058491A (en) | Photoresist and display panel | |
TWI553410B (en) | Composition, infrared ray transmitting filter and fabricating method thereof, and infrared ray sensor | |
JP5604968B2 (en) | Green colorant composition for color filter, color filter substrate and liquid crystal display device | |
US9261779B2 (en) | Photoresist composition and method of preparing the same, color film substrate, and display apparatus | |
CN102636904B (en) | Color filter and production method thereof as well as liquid crystal panel | |
KR102243166B1 (en) | A photo sensitive resin composition, a pattern layer prepared by using the composition, a color filter comprising the pattern layer, and a display device comprising the color filter | |
WO2020199463A1 (en) | Method for preparing pigment dispersion | |
JP2003185830A (en) | Color filter and liquid crystal display device | |
WO2010150843A1 (en) | Colorant composition for a color filter, color filter using the same, and liquid crystal display device | |
CN102040795A (en) | Resin composition | |
CN105392847A (en) | Light-blocking pigment composition and light-blocking member for display | |
JP5262691B2 (en) | Color filter substrate for liquid crystal display device and liquid crystal display device using the same | |
US8168689B2 (en) | High optical contrast pigment and colorful photosensitive composition employing the same and fabrication method thereof | |
JP4821316B2 (en) | Red colorant composition and color filter | |
CN108117873A (en) | Oriented material composition, liquid crystal display panel and preparation method thereof, display device | |
JP2004093656A (en) | Color filter, liquid crystal display panel, and paste for forming resin black matrix | |
CN101544929A (en) | Edge gluing cleaning agent used in processing procedure of colored filter | |
JP2013257493A (en) | Black material, black material fluid dispersion, black resin composition, black film and base material with black film | |
JP2009036804A (en) | Method for correcting color filter defect, and color filter substrate | |
JP5564809B2 (en) | Manufacturing method of color filter | |
JP2015069181A (en) | Radiation-sensitive resin composition, cured film, method for forming the same and display element | |
JP2017053942A (en) | Photosensitive coloring composition, cured product, colored spacer, and image display device | |
JP5564825B2 (en) | Coloring composition, method for producing color filter, and color filter | |
CN110658697A (en) | Developing solution composition | |
CN107589581B (en) | Preparation method of color resistance layer of array substrate, array substrate and display panel |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190726 |
|
WD01 | Invention patent application deemed withdrawn after publication |