CN110016110A - A kind of brush block polymer and its synthetic method and application - Google Patents
A kind of brush block polymer and its synthetic method and application Download PDFInfo
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- CN110016110A CN110016110A CN201810016123.2A CN201810016123A CN110016110A CN 110016110 A CN110016110 A CN 110016110A CN 201810016123 A CN201810016123 A CN 201810016123A CN 110016110 A CN110016110 A CN 110016110A
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- 238000010189 synthetic method Methods 0.000 title claims abstract description 10
- 229920000642 polymer Polymers 0.000 title abstract description 8
- 238000006243 chemical reaction Methods 0.000 claims abstract description 45
- 229920001400 block copolymer Polymers 0.000 claims abstract description 39
- 206010028933 Neonatal diabetes mellitus Diseases 0.000 claims abstract description 38
- 239000000463 material Substances 0.000 claims abstract description 23
- 239000013078 crystal Substances 0.000 claims abstract description 20
- 239000000178 monomer Substances 0.000 claims abstract description 13
- 208000003013 permanent neonatal diabetes mellitus Diseases 0.000 claims abstract description 10
- 238000010791 quenching Methods 0.000 claims abstract description 10
- 230000000171 quenching effect Effects 0.000 claims abstract description 10
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims abstract description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims abstract description 8
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 claims abstract description 8
- 235000010290 biphenyl Nutrition 0.000 claims abstract description 4
- 239000004305 biphenyl Substances 0.000 claims abstract description 4
- 239000003054 catalyst Substances 0.000 claims abstract description 4
- 238000007334 copolymerization reaction Methods 0.000 claims abstract description 4
- 239000003960 organic solvent Substances 0.000 claims abstract description 4
- 238000006116 polymerization reaction Methods 0.000 claims description 46
- 238000001338 self-assembly Methods 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 2
- 239000000049 pigment Substances 0.000 abstract description 4
- 239000000975 dye Substances 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 54
- 238000010438 heat treatment Methods 0.000 description 27
- 239000000243 solution Substances 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 12
- 239000004038 photonic crystal Substances 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000001291 vacuum drying Methods 0.000 description 6
- 238000005119 centrifugation Methods 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 230000004043 responsiveness Effects 0.000 description 5
- 238000000985 reflectance spectrum Methods 0.000 description 4
- 235000008708 Morus alba Nutrition 0.000 description 3
- 240000000249 Morus alba Species 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 229920003213 poly(N-isopropyl acrylamide) Polymers 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 101150058790 bcp gene Proteins 0.000 description 2
- 101150038746 bcp1 gene Proteins 0.000 description 2
- 101150023633 bcpB gene Proteins 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- -1 poly(N-isopropylacrylamide) Polymers 0.000 description 2
- 238000007152 ring opening metathesis polymerisation reaction Methods 0.000 description 2
- 230000009329 sexual behaviour Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
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- 239000011557 critical solution Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000001548 drop coating Methods 0.000 description 1
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- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000004446 light reflex Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
Abstract
The invention discloses a kind of brush block polymer and its synthetic method and applications, the synthetic method of the brush block copolymer, the following steps are included: the norbornene monomer NBPM with biphenyl structural is taken to be dissolved into organic solvent, G-3 catalyst is added, it is stirred to react at 20-40 DEG C, so that monomer NBPM homopolymerization, then the norbornene monomer NDM with decane based structures dissolved is added in above-mentioned reaction solution that the reaction was continued, to realize NBPM, the copolymerization of NDM, terminator quenching reaction is added after the reaction was completed, finally obtain target brush block copolymer PNBPM-b-PNDM.The invention enables photon crystal materials can be applied to optical sensor, light valve and pigment and dyestuff etc., has great practical value.
Description
Technical field
The present invention relates to the preparation technical field of brush block copolymer, more particularly to a kind of brush block polymer and
Its synthetic method and application.
Background technique
Photonic crystal is because the presence of internal photon forbidden band structure can regulate and control the propagation of light wave, to make it have very big
Application value, such as do special pigment, waveguide and reflectance coating.Responsive photonic crystals are that a kind of reflection wavelength can be with
Extraneous physics or the material of electrochemical conditions variation and change.This material is in addition to the period necessary to conventional photonic crystals
Except property structure, it is necessary to which there are responsiveness groups.It common are two methods and introduce responsiveness group: (1) utilizing responsiveness
Material carrys out direct construction photon crystal structure as matrix, such as prepares 1-D photon crystal using block polymer self assembly,
Segment swelling is to show the change of reflection wavelength under solvent atmosphere.(2) photon crystal structure is prepared first, then will
Responsiveness is material doped into matrix, forms stable photonic crystal composite material.As needed, pass through both the above method
It can design and prepare the different Responsive photonic crystals material such as Ph, temperature, chemical solvent, electric field and magnetic field.
Thermo-sensitive photonic crystal is a kind of to study relatively broad Responsive photonic crystals material.From Asher (A.Asher,
Et al. Science 1996,274,959.) start sex work since, the similar Thermo-sensitive photonic crystal material of numerous structures
Material is reported.Wherein it is more be colloidal crystal is embedded in it is temperature sensitive made from poly(N-isopropylacrylamide) (PNIPAM)
Property hydrogel photonic crystal.Because PNIPAM is a kind of thermally sensitive polymeric, with lower critical solution temperature (LCST, about 32
DEG C), when the temperature increases, polymer becomes hydrophobic from hydrophilic, discharge moisture and volume contraction, so that the grain in colloidal crystal
Sub- spacing reduces, and leads to reflection wavelength blue shift.When the temperature decreases, and can restore to original state.Although utilizing such method
The photon crystal material of preparation has more apparent temperature-responsive sexual behaviour, but process is more complex, and is difficult to prepare big model
The photon crystal material enclosed.Because of a kind of simple possible of the invention, inexpensive technology carrys out the one-dimensional photon of preparation temperature responsiveness
Crystalline material is particularly important.
A kind of novel brush block copolymer (PNBPM-b-PNDM) of invention, it is molten by simple low boiling point
Agent film self assembly has obtained a series of 1-D photon crystal materials, and has apparent temperature-responsive in a heated condition
Behavior.Be expected in terms of obtain practical application.
Summary of the invention
In view of the technical drawbacks of the prior art, it is an object of the present invention to provide a kind of brush block polymer and
Its synthetic method, the Thermo-sensitive 1-D photon crystal being prepared by simple self assembly mode, is expected in light sensing
Practical application is obtained in terms of device, light valve and pigment and dyestuff.
The technical solution adopted to achieve the purpose of the present invention is:
A kind of brush block copolymer of the invention, is denoted as PNBPM-b-PNDM, structural formula are as follows:
Wherein m is the degree of polymerization of NBPM, m=100-1500；N is the degree of polymerization of NDM, n=100-1500；Backbone polymerization
Degree is 200-3000；
Wherein: the structural formula of NBPM are as follows:
The structural formula of NDM are as follows:
Preferably, m=n.
Another aspect of the present invention further includes the synthetic method of the brush block copolymer, comprising the following steps:
It takes the norbornene monomer NBPM with biphenyl structural to be dissolved into organic solvent, G-3 catalyst is added, in 20-
It is stirred to react at 40 DEG C, so that monomer NBPM homopolymerization, the norbornene monomer with decane based structures that then will have been dissolved
NDM's is added in above-mentioned reaction solution that the reaction was continued, to realize the copolymerization of NBPM, NDM, terminator is added after the reaction was completed and quenches
It goes out reaction, finally obtains target brush block copolymer PNBPM-b-PNDM.
Preferably, the molar ratio of described G-3, NBPM and NDM are as follows: 1:(100-1500): (100-1500).
Preferably, the molar ratio of described G-3, NBPM and NDM are as follows: 1:(300-800): (300-800).
Another aspect of the present invention further includes that the brush block copolymer is preparing Thermo-sensitive 1-D photon crystal material
Application on material.
Preferably, the brush block copolymer passes through self assembly 1-D photon crystal material.
The self assembly object of the brush block copolymer, i.e., the described 1-D photon crystal material have the property that
The degree of polymerization m of the NBPM is the polymerization degree n of 180-220, NDM when being 180-220, the self assembly object heating
Preceding is in mulberry, blue after heating, preferably m=200, n=200.
The degree of polymerization m of the NBPM is the polymerization degree n of 280-320, NDM when being 280-320, the self assembly object heating
It is preceding blue, it is in bright green, preferably m=300, n=300 after heating.
The degree of polymerization m of the NBPM is the polymerization degree n of 380-420, NDM when being 380-420, and the self assembly object is in green
Color takes on a red color, preferably m=400 after heating, n=400.
The degree of polymerization m of the NBPM is the polymerization degree n of 480-520, NDM when being 480-520, the self assembly object heating
Before take on a red color, after heating be in taupe, preferably m=500, n=500.
The self-assembling method of the brush block copolymer, comprising the following steps: by the brush block copolymer of synthesis
(PNBPM-b-PNDM) it is dispersed in tetrahydrofuran (THF), on the glass sheet by mixed liquor coating, solvent is waved at room temperature
Thin polymer film is obtained after hair.
Preferably, the self-assembling method further includes thermal quenching step, specially takes the thin polymer film to be placed in and puts
It is placed in flat heater platform, keeps 1-24h under the conditions of 50-300 DEG C.
The self-assembling method of the brush block copolymer can regulate and control the color of polymerizate.
The degree of polymerization m of the NBPM is the polymerization degree n of 180-220, NDM when being 180-220, the self assembly object heating
Preceding is in mulberry, blue after heating, preferably m=200, n=200；The degree of polymerization m of the NBPM is the poly- of 280-320, NDM
It is blue before the self assembly object heating when right n is 280-320, it is in bright green, preferably m=300, n=300 after heating；
The degree of polymerization m of the NBPM is the polymerization degree n of 380-420, NDM when being 380-420, and the self assembly object is in green, after heating
It takes on a red color, preferably m=400, n=400；The degree of polymerization m of the NBPM is the polymerization degree n of 480-520, NDM when being 480-520,
It takes on a red color before the self assembly object heating, is in taupe, preferably m=500, n=500 after heating.
Compared with prior art, the beneficial effects of the present invention are:
Brush block copolymer of the invention is synthesized by a series of controllable ring-opening metathesis polymerization (ROMP) of activity
What method obtained, one-dimensional photonic crystal film is prepared by low boiling point solvent self assembly first, then by heating,
Have studied its Thermo-sensitive feature.Reflectance spectrum test shows that being heat-treated back reflection wavelength has more apparent red shift, and reflectivity
Decrease to some degree shows it with obvious temperature-responsive.Furthermore we have also obtained backbone polymerization degree and master
Linear relationship chart between reflection wavelength preferably combines the relationship between material structure and performance.The invention enables
Photon crystal material can be applied to optical sensor, light valve and pigment and dyestuff etc., have great practical value.
Detailed description of the invention
The synthetic line of 1 brush block copolymer (PNBPM-b-PNDM) of Fig. 1 embodiment.
The nuclear magnetic spectrum of 1 brush block copolymer (PNBPM-b-PNDM) of Fig. 2 embodiment.
2 brush block copolymer (PNBPM-b-PNDM) self assembly of Fig. 3 embodiment heat treatment front and back compares picture.
The reflectance spectrum figure of 2 photon crystal film of Fig. 4 embodiment.A1-A6 and B1-B6 respectively represents hot group of BCP1-BCP6
Fill the reflectance spectrum of front and back.
Specific embodiment
The present invention is described in further detail below in conjunction with the drawings and specific embodiments.It should be appreciated that described herein
Specific embodiment be only used to explain the present invention, be not intended to limit the present invention.
Embodiment 1
The preparation method of brush block copolymer B CP1-6: its preparation route as shown in Figure 1,
The general structure of BCP1-6 are as follows:
The synthesis step of BCP1 (m=200, n=200) is as follows:
NBPM (57.6mg, 91.2 μm of ol) are added in 10mL polymerization bottle, G-3 is added in 1mL dry methylene chloride
(0.41mg, 0.46×10-3Mmol dichloromethane solution 0.1mL) is stirred to react 30 minutes, at normal temperature then by 1.1mL
The solution of methylene chloride containing NDM (72.2mg, 91.2 μm of ol) is added in above-mentioned reaction solution that the reaction was continued 1 hour, entirely
Charging and reaction process carry out in glove box.1mL vinyl ethyl ether quenching reaction is added after the reaction was completed.Remove gloves
Case precipitates in anhydrous methanol, and centrifugation, vacuum drying obtains the brush block copolymer B CP1 that backbone polymerization degree is 400,
The degree of polymerization that the degree of polymerization of middle NBPM is 200, NDM is 200.
The synthesis step of BCP2 (m=300, n=300) is as follows:
NBPM (57.6mg, 91.2 μm of ol) are added in 10mL polymerization bottle, G-3 is added in 1mL dry methylene chloride
(0.27mg, 0.31×10-3Mmol dichloromethane solution 0.1mL) is stirred to react 30 minutes, at normal temperature then by 1.1mL
The solution of methylene chloride containing NDM (72.2mg, 91.2 μm of ol) is added in above-mentioned reaction solution that the reaction was continued 1 hour, entirely
Charging and reaction process carry out in glove box.1mL vinyl ethyl ether quenching reaction is added after the reaction was completed.Remove gloves
Case precipitates in anhydrous methanol, and centrifugation, vacuum drying obtains the brush block copolymer B CP2 that backbone polymerization degree is 600,
The degree of polymerization that the degree of polymerization of middle NBPM is 300, NDM is 300.
The synthesis step of BCP3 (m=400, n=400) is as follows:
NBPM (57.6mg, 91.2 μm of ol) are added in 10mL polymerization bottle, G-3 is added in 1mL dry methylene chloride
(0.21mg, 0.23×10-3Mmol dichloromethane solution 0.1mL) is stirred to react 30 minutes, at normal temperature then by 1.1mL
The solution of methylene chloride containing NDM (72.2mg, 91.2 μm of ol) is added in above-mentioned reaction solution that the reaction was continued 1 hour, entirely
Charging and reaction process carry out in glove box.1mL vinyl ethyl ether quenching reaction is added after the reaction was completed.Remove gloves
Case precipitates in anhydrous methanol, and centrifugation, vacuum drying obtains the brush block copolymer B CP3 that backbone polymerization degree is 800,
The degree of polymerization that the degree of polymerization of middle NBPM is 400, NDM is 400.
The synthesis step of BCP4 (m=500, n=500) is as follows:
NBPM (57.6mg, 91.2 μm of ol) are added in 10mL polymerization bottle, G-3 is added in 1mL dry methylene chloride
(0.16mg, 0.18×10-3Mmol dichloromethane solution 0.1mL) is stirred to react 30 minutes, at normal temperature then by 1.1mL
The solution of methylene chloride containing NDM (72.2mg, 91.2 μm of ol) is added in above-mentioned reaction solution that the reaction was continued 1 hour, entirely
Charging and reaction process carry out in glove box.1mL vinyl ethyl ether quenching reaction is added after the reaction was completed.Remove gloves
Case precipitates in anhydrous methanol, and centrifugation, vacuum drying obtains the brush block copolymer B CP4 that backbone polymerization degree is 1000,
The degree of polymerization that the degree of polymerization of middle NBPM is 500, NDM is 500.
The synthesis step of BCP5 (m=700, n=700) is as follows:
NBPM (57.6mg, 91.2 μm of ol) are added in 10mL polymerization bottle, G-3 is added in 1mL dry methylene chloride
(0.12mg, 0.13×10-3Mmol dichloromethane solution 0.1mL) is stirred to react 30 minutes, at normal temperature then by 1.1mL
The solution of methylene chloride containing NDM (72.2mg, 91.2 μm of ol) is added in above-mentioned reaction solution that the reaction was continued 1 hour, entirely
Charging and reaction process carry out in glove box.1mL vinyl ethyl ether quenching reaction is added after the reaction was completed.Remove gloves
Case precipitates in anhydrous methanol, and centrifugation, vacuum drying obtains the brush block copolymer B CP5 that backbone polymerization degree is 1400,
The degree of polymerization that the degree of polymerization of middle NBPM is 700, NDM is 700.
The synthesis step of BCP6 (m=1000, n=1000) is as follows:
NBPM (57.6mg, 91.2 μm of ol) are added in 10mL polymerization bottle, G-3 (0.082 is added in 1mL dry methylene chloride
mg,0.092×10-3Mmol dichloromethane solution 0.1mL) is stirred to react 30 minutes at normal temperature, then contains 1.1mL
The solution of the methylene chloride of NDM (72.2mg, 91.2 μm of ol) is added in above-mentioned reaction solution that the reaction was continued 1 hour, entire to feed
It is carried out in glove box with reaction process.1mL vinyl ethyl ether quenching reaction is added after the reaction was completed.Glove box is removed,
It precipitating, is centrifuged in anhydrous methanol, vacuum drying obtains the brush block copolymer B CP6 that backbone polymerization degree is 2000, wherein
The degree of polymerization that the degree of polymerization of NBPM is 1000, NDM is 1000.
It is illustrated in figure 2 the nucleus magnetic hydrogen spectrum figure of block polymer BCP4, it is known that all monomers convert completely, and each
Peak can be belonged to well.
Embodiment 2
Synthesized serial brush block copolymer (BCP1-BCP6) solvent volatilization self assembly and heat treatment condition:
The tetrahydrofuran solution that the brush block copolymer (BCP1-BCP6) of synthesis is prepared to 10mg/mL respectively, will mix
Drop coating obtains 6 kinds of different thin polymer films after solvent volatilization completely, as in clean horizontal glass on piece to liquid dropwise
Manufactured 1-D photon crystal material.Then one-dimensional photonic crystal film obtained is heated under the conditions of 130 DEG C
30min studies its Thermo-sensitive feature.It is illustrated in figure 2 BCP1-BCP6 heat treatment front and back self assembly picture, is shown obvious
Light reflex and temperature sensitive sexual behaviour it is obvious.It is in mulberry before the self assembly object heating of BCP1, it is blue after heating；BCP2
Self assembly object heating before it is blue, after heating be in bright green；The self assembly object of BCP3 takes on a red color after heating in green, BCP4
Self assembly object heating before take on a red color, after heating be in taupe.
Fig. 3 is the reflectance spectrum figure of BCP1-BCP6 heat treatment front and back, and heating back reflection wavelength has apparent red shift, reflects
Rate decrease to some degree shows that Thermo-sensitive 1-D photon crystal material is succeeded preparation.
The above is only a preferred embodiment of the present invention, it is noted that for the common skill of the art
For art personnel, various improvements and modifications may be made without departing from the principle of the present invention, these are improved and profit
Decorations also should be regarded as protection scope of the present invention.
Claims (10)
1. a kind of brush block copolymer, which is characterized in that its structural formula are as follows:
Wherein m is the degree of polymerization of NBPM, m=100-1500；N is the degree of polymerization of NDM, n=100-1500；Backbone polymerization degree is
200-3000；
Wherein: the structural formula of NBPM are as follows:
The structural formula of NDM are as follows:
2. a kind of brush block copolymer as described in claim 1, which is characterized in that m=n.
3. a kind of brush block copolymer as described in claim 1, which is characterized in that prepare in accordance with the following methods: taking and have
The norbornene monomer NBPM of biphenyl structural is dissolved into organic solvent, and G-3 catalyst is added, is stirred to react at 20-40 DEG C,
So that monomer NBPM homopolymerization, then above-mentioned anti-by being added to for the norbornene monomer NDM with decane based structures dissolved
It answers in liquid that the reaction was continued, to realize the copolymerization of NBPM, NDM, terminator quenching reaction is added after the reaction was completed, finally obtains target
Brush block copolymer (PNBPM-b-PNDM).
4. a kind of brush block copolymer as described in claim 1, which is characterized in that mole of described G-3, NBPM and NDM
Than are as follows: 1:(100-1500): (100-1500).
5. a kind of brush block copolymer as claimed in claim 4, which is characterized in that mole of described G-3, NBPM and NDM
Than are as follows: 1:(300-800): (300-800).
6. the synthetic method of brush block copolymer as described in claim 1, which comprises the following steps:
It takes the norbornene monomer NBPM with biphenyl structural to be dissolved into organic solvent, G-3 catalyst is added, at 20-40 DEG C
Under be stirred to react so that monomer NBPM homopolymerization, then by the norbornene monomer NDM's with decane based structures dissolved plus
Enter into above-mentioned reaction solution that the reaction was continued, to realize the copolymerization of NBPM, NDM, terminator quenching reaction is added after the reaction was completed, most
Target brush block copolymer (PNBPM-b-PNDM) is obtained eventually.
7. the synthetic method of brush block copolymer as claimed in claim 6, which is characterized in that described G-3, NBPM and NDM
Molar ratio are as follows: 1:(100-1500): (100-1500).
8. the synthetic method of brush block copolymer as claimed in claim 7, which is characterized in that described G-3, NBPM and NDM
Molar ratio are as follows: 1:(300-800): (300-800).
9. brush block copolymer as described in claim 1 is preparing the application on Thermo-sensitive 1-D photon crystal material.
10. brush block copolymer as claimed in claim 5 is preparing the application on Thermo-sensitive 1-D photon crystal material,
Be characterized in that: the brush block copolymer passes through self assembly 1-D photon crystal material.
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| CN201810016123.2A CN110016110B (en) | 2018-01-08 | 2018-01-08 | Brush-shaped block polymer and synthesis method and application thereof |
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2018
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