CN109954509B - Preparation method and application of silicon carbide-based photocatalyst - Google Patents

Preparation method and application of silicon carbide-based photocatalyst Download PDF

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CN109954509B
CN109954509B CN201910377368.2A CN201910377368A CN109954509B CN 109954509 B CN109954509 B CN 109954509B CN 201910377368 A CN201910377368 A CN 201910377368A CN 109954509 B CN109954509 B CN 109954509B
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CN109954509A (en
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张燕
张玉琰
郦雪
李绘
吕宪俊
陈平
胡术刚
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Shandong University of Science and Technology
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Abstract

The invention discloses a preparation method and application of a silicon carbide-based double-assistant hydrogen production photocatalyst, which comprises the following steps: a, pretreating silicon carbide; b, preparing a molybdenum disulfide suspension with the weight percent of 8 in the whole hydrothermal reaction system by taking molybdenum disulfide as a raw material; and c, putting 100mL of 8wt% molybdenum disulfide suspension into a beaker, sequentially adding silicon carbide (SiC), Graphene Oxide (GO) and 2 drops of 1-butyl-3-methylimidazole hexafluorophosphate ionic liquid, ultrasonically stirring to uniformly mix the materials, transferring the materials into a high-temperature reaction kettle, reacting for 20 hours at 200 ℃, then centrifugally washing until the pH value is =7, putting the materials into a vacuum drying oven, and drying in vacuum for later use. And carrying out hydro-thermal synthesis to obtain the silicon carbide-based double-assisted hydrogen production photocatalyst. The present invention utilizes GO and molybdenum disulfide (MoS)2) The silicon carbide-based double-assistant hydrogen production photocatalyst prepared by the synergistic effect of the double-assistant catalysts improves the performance of hydrogen production by photocatalytic decomposition of water by visible light, and can lay a certain foundation for the subsequent high-efficiency application of the visible light catalyst.

Description

Preparation method and application of silicon carbide-based photocatalyst
Technical Field
The invention relates to a preparation method of a visible light photocatalyst, and particularly relates to a silicon carbide-based double-assisted hydrogen production photocatalyst and a preparation method thereof.
Background
At present, most of the known hydrogen-producing photocatalysts are TiO2The modified hydrogen-producing catalyst is modified on the basis, so that the modified hydrogen-producing catalyst meets the requirements of visible light photocatalysis hydrogen production and promotes the hydrogen production efficiency. The catalyst has a certain catalytic action, but the semiconductor material with narrow forbidden band width more meets the requirement of ultraviolet light photocatalysis hydrogen production. The SiC is used for preparing hydrogen by photocatalytic water splitting in view of good response of the SiC to visible light and the positions of a conduction band and a valence band of the SiC, which completely meet the requirement of water splitting by photolysis. But the defects of the method cause the method to have certain difficulty in photolyzing water, which is mainly shown in the following aspects: firstly, SiC has certain hydrophobicity, so that the SiC is difficult to contact with water molecules; and secondly, the electron holes are easy to recombine, so that the hydrogen production efficiency is low. Based on the defects, in order to improve the hydrogen production efficiency of SiC photocatalysis, the modification by using the cocatalyst is a common solution. The Yuanyxia topic group at present utilizes CdS and Pt to dope and modify SiC, and the hydrogen production rate is 259 mu mol.h-1g-1. However, Cd is a heavy metal and has a certain risk of secondary pollution, and Pt is a noble metal and has certain limitation on large-scale industrial application. Applicant utilizes MoS2Doping SiC by using coordination effect of Graphene Oxide (GO) double-promoter, and utilizing MoS2And the hydrogen production material of the SiC-based visible light catalyst is constructed by the advantages of GO so as to make up the defects of the SiC-based visible light catalyst.
Disclosure of Invention
The invention aims to provide a preparation method of a silicon carbide-based double-assisted hydrogen production photocatalyst, wherein GO and MoS are introduced into the catalyst prepared by the method2As a double-promoter, SiC is modified by utilizing the synergistic effect of the double-promoter so as to improve the photocatalytic hydrogen production efficiency.
The technical solution adopted by the invention is as follows:
a preparation method of a silicon carbide-based photocatalyst specifically comprises the following steps:
(1) preparing pure SiC: roasting the SiC powder at high temperature, and naturally cooling to room temperature to remove impurity carbon; then the mass fraction isSoaking in 2% HF solution in sealed and light-proof condition to remove SiO2And other oxides; finally, repeatedly centrifuging and washing the SiC powder by using deionized water until the pH is =7, and placing the SiC powder in a vacuum drying oven to obtain pure SiC;
(2)MoS2suspension: mixing MoS2Placing in deionized water, and mixing uniformly to obtain MoS2A suspension;
(3) mixing: to MoS2Adding pure SiC, GO and ionic liquid into the suspension in sequence, and ultrasonically stirring to uniformly mix the pure SiC, the GO and the ionic liquid;
(4) preparing a silicon carbide-based double-promoter photocatalyst by a hydrothermal reaction: and (4) transferring the suspension obtained in the step (3) to a high-temperature reaction kettle, reacting at 200 ℃ for a period of time, then centrifugally washing until the pH is =7, and drying in vacuum to obtain the photocatalytic material.
Further, the roasting temperature in the step (1) is 600-800 ℃, preferably 700 ℃, the roasting time is 2-6h, preferably 5h, and the vacuum drying temperature is 60 ℃.
Further, in the hydrothermal system in the step (3), MoS is calculated by molybdenum element22-10% by weight, preferably 8%; the weight percentage of GO calculated by carbon element is 0.5-3%, preferably 2.5%.
Further, the ultrasonic stirring time in the step (3) is 10 hours, the hydrothermal reaction time in the step (4) is 20 hours, and the vacuum drying temperature is 60 ℃.
Further, the ionic liquid in step (3) includes, but is not limited to, one of 1-butyl-3-methylimidazole hexafluorophosphate, 1-butyl-3-methylimidazole-tetrafluoroborate, bromo-1-butyl-3-methylimidazole and tetrafluoroborate-1-ethyl-3-methylimidazole.
The photocatalyst prepared by the method is applied to water photolysis, and the hydrogen production rate is 55 mu mol.h-1·g-1The above.
The beneficial technical effects of the invention are as follows:
MoS in the modification Process2As a layered transition metal sulfide, active S atoms of the layered transition metal sulfide are positioned at exposed edges, active sites for photocatalytic hydrogen production can be increased, and GO has a large surface areaAnd good electron transfer capacity, can improve the photocatalytic activity, and more importantly MoS2The catalyst and GO have a synergistic effect, so that the silicon carbide-based double-assisted hydrogen production photocatalyst has higher photocatalytic hydrogen production efficiency than silicon carbide and a silicon carbide-based single-assisted hydrogen production photocatalyst, and the synthesis method is simpler, is easy to operate and can be synthesized in one step.
Drawings
FIG. 1 shows MoS prepared according to the present invention2The XRD spectrogram of the silicon carbide-based double-assisted hydrogen production photocatalyst with variable load.
FIG. 2 is an XRD spectrogram of a GO-loading-variable silicon carbide-based double-assisted hydrogen production photocatalyst prepared by the method
FIG. 3 is a self-made photocatalytic reaction system.
FIG. 4 shows MoS prepared according to the present invention2And the silicon carbide-based double-assistant hydrogen production photocatalyst, pure silicon carbide and silicon carbide-based single-assistant hydrogen production photocatalyst with variable load capacity are shown in a 4-hour hydrogen production efficiency graph.
FIG. 5 is a 4h hydrogen production efficiency diagram of a silicon carbide-based double-assisted hydrogen production photocatalyst with variable GO loading prepared by the method.
FIG. 6 shows MoS prepared according to the present invention2The ultraviolet-visible diffuse reflection spectrogram of the silicon carbide-based double-assisted hydrogen production photocatalyst with variable load capacity and the pure silicon carbide.
Detailed Description
The invention is further illustrated by the following specific examples.
Example 1
(1) Preparing pure SiC, namely placing SiC powder in a muffle furnace, roasting for 5 hours at 700 ℃, and naturally cooling to room temperature to remove impurity carbon; soaking in 2% HF solution in sealed dark condition for one night to remove SiO2And other oxides; repeatedly centrifuging and washing with deionized water for 11 times until pH =7, placing in a vacuum drying oven, and vacuum drying at 60 deg.C;
(2)MoS2suspension: 0.1741gMoS was added at room temperature2Placing the mixture in 100mL of deionized water, and uniformly mixing to obtain MoS2A suspension;
(3) mixing: to MoS at room temperature2In suspension in sequenceAdding 5.0g of pure SiC, 0.05gGO and 2 drops of 1-butyl-3-methylimidazolium hexafluorophosphate ionic liquid, and stirring for 10 hours by ultrasonic waves to uniformly mix the materials;
(4) the silicon carbide-based double-assistant hydrogen production photocatalytic material is prepared by a hydrothermal synthesis method: and (3) placing the suspension subjected to ultrasonic treatment in a 300mL high-temperature reaction kettle, reacting at 200 ℃ for 20h, then centrifugally washing for 5 times until the pH =7, placing the suspension in a vacuum drying oven, and performing vacuum drying at 60 ℃ to obtain the SGM-2 photocatalytic material. MoS2The weight percentage of the catalyst in the hydrothermal reaction system is 2 percent (calculated by molybdenum element).
Example 2
This example removes MoS from step (2)2Is 0.4590gMoS2Otherwise, the same procedure as in example 1 was repeated to obtain an SGM-5 photocatalytic material; MoS2The weight percentage of the catalyst in the hydrothermal reaction system is 5 percent (calculated by molybdenum element).
Example 3
This example removes MoS from step (2)20.7769g MoS2Otherwise, the same procedure as in example 1 was repeated to obtain an SGM-8 photocatalytic material; MoS2The weight percentage of the catalyst in the hydrothermal reaction system is 8 percent (calculated by molybdenum element).
Example 4
This example removes MoS from step (2)2Is 1.01g MoS2Otherwise, the same procedure as in example 1 was repeated to obtain an SGM-10 photocatalytic material; MoS2The weight percentage of the catalyst in the hydrothermal reaction system is 10 percent (calculated by molybdenum element).
FIG. 1 is XRD spectra of pure SiC and silicon carbide-based double-assisted hydrogen-producing photocatalytic materials prepared in examples 1-4. As can be seen from fig. 1, the characteristic peaks of the other samples are shifted to the left compared to pure SiC, with SGM-8 being the most shifted and the intensity of the characteristic peak being the most enhanced. Thus, MoS2The change of the loading amount has the promotion effect on the growth of the SiC crystal form. The intensity of the characteristic peak of SGM-10 sample compared with SGM-8 sample is slightly weakened, indicating that MoS exists in the sample preparation process2The optimum load range. The sample SGM-8 has the best crystal form, and good crystallization can reduce the defects of semiconductor photocatalysis and is beneficial to the on-crystal generation of photon-generated carriersAnd the transfer between lattices can improve the photocatalytic activity.
Example 5
(1) Preparing pure SiC, namely placing SiC powder in a muffle furnace, roasting for 5 hours at 700 ℃, and naturally cooling to room temperature to remove impurity carbon; soaking in 2% HF solution in sealed dark condition for one night to remove SiO2 and other oxides; repeatedly centrifuging and washing with deionized water for 11 times until pH =7, placing in a vacuum drying oven, and vacuum drying at 60 deg.C;
(2)MoS2suspension: 0.7769g MoS was added at room temperature2Placing the mixture in 100mL of deionized water, and uniformly mixing to obtain MoS2A suspension;
(3) mixing: to MoS at room temperature2Adding 5.0g of pure SiC, 0.0583g of GO and 2 drops of 1-butyl-3-methylimidazolium hexafluorophosphate ionic liquid into the suspension in sequence, and stirring for 10 hours by ultrasonic waves to uniformly mix the materials;
(4) the silicon carbide-based double-assistant hydrogen production photocatalytic material is prepared by a hydrothermal synthesis method: and (3) placing the suspension subjected to ultrasonic treatment in a 300mL high-temperature reaction kettle, reacting at 200 ℃ for 20h, then centrifugally washing for 5 times until the pH is =7, placing the suspension in a vacuum drying oven, and performing vacuum drying at 60 ℃ to obtain the SMG-1 photocatalytic material. The weight percentage of GO in the hydrothermal reaction system is 1% (calculated by carbon element).
Example 6
In this example, except that GO in step (3) is 0.0880gGO, the same procedure as in example 5 was repeated to obtain SMG-1.5 photocatalytic material; the mass percentage ratio of GO in the hydrothermal reaction system is 1.5% (calculated by carbon element).
Example 7
In the embodiment, except that GO in the step (3) is 0.1178gGO, the other steps are the same as those in the embodiment 5, so that the SMG-2 photocatalytic material is obtained; the weight percentage of GO in the hydrothermal reaction system is 2% (calculated by carbon element).
Example 8
In this example, except that GO in step (3) is 0.1481gGO, the same procedure as in example 5 was repeated to obtain SMG-2.5 photocatalytic material; the weight percentage of GO in the hydrothermal reaction system is 2.5% (calculated by carbon element).
Example 9
In this example, except that GO in step (3) is 0.1787gGO, the other steps are the same as those in example 5, and an SMG-3 photocatalytic material is obtained; the weight percentage of GO in the step (3) in the hydrothermal system is 3% (calculated by carbon element).
FIG. 2 is XRD spectra of pure SiC and the silicon carbide-based double-assisted hydrogen-producing photocatalytic materials prepared in examples 5-9. As can be seen from fig. 2, the characteristic peaks of the other samples are shifted to the right compared to pure SiC, with sample SMG-2.5 being shifted to the greatest extent and the characteristic peak intensity being enhanced to the greatest extent. Therefore, the change of GO loading has a promoting effect on the growth of SiC crystal forms. The intensity of the characteristic peak of sample SMG-3 compared to sample SMG-2.5 was slightly weaker and the degree of right shift decreased, indicating that there is a GO optimum loading range for the sample preparation process. The sample SMG-2.5 has the best crystal form, and good crystallization can reduce the defects of semiconductor photocatalysis and is beneficial to the transfer of photon-generated carriers in crystal lattices and among the crystal lattices, thereby improving the activity of photocatalysis.
Example 10
(1) Preparing pure SiC, namely placing SiC powder in a muffle furnace, roasting for 6 hours at the temperature of 600 ℃, and naturally cooling to room temperature to remove impurity carbon; soaking in 2% HF solution in sealed dark condition for one night to remove SiO2 and other oxides; repeatedly centrifuging and washing with deionized water for 11 times until pH =7, placing in a vacuum drying oven, and vacuum drying at 60 deg.C; (2) MoS2 suspension: 0.8g of MoS at room temperature2Placing the mixture in 100mL of deionized water, and uniformly mixing to obtain MoS2A suspension;
(3) mixing: at room temperature, sequentially adding 5.0g of pure SiC, 0.0583gGO and 2 drops of 1-ethyl-3-methylimidazole tetrafluoroborate ionic liquid into the MoS2 suspension, and ultrasonically stirring for 10 hours to uniformly mix the materials;
(4) the silicon carbide-based double-assistant hydrogen production photocatalytic material is prepared by a hydrothermal synthesis method: and (3) placing the suspension subjected to ultrasonic treatment in a 300mL high-temperature reaction kettle, reacting at 200 ℃ for 20h, then centrifugally washing for 5 times until the pH value is =7, placing the suspension in a vacuum drying oven, and performing vacuum drying at 60 ℃ to obtain the photocatalytic material.
Comparative example 1
Placing the SiC powder in a muffle furnace, roasting at 700 ℃ for 5h, naturally cooling to room temperature to remove impurity carbon, then sealing and soaking in 2% HF solution in dark place for one night to remove SiO2And other oxides; repeatedly centrifuging and washing with deionized water for 12 times until the pH is =7, placing in a vacuum drying oven, and vacuum drying at 60 ℃ to obtain pure SiC.
Comparative example 2
(1) Preparing pure SiC, namely placing SiC powder in a muffle furnace, roasting for 5 hours at 700 ℃, and naturally cooling to room temperature to remove impurity carbon; soaking in 2% HF solution in sealed dark condition for one night to remove SiO2And other oxides; repeatedly centrifuging and washing with deionized water for 11 times until pH =7, placing in a vacuum drying oven, and vacuum drying at 60 deg.C;
(2)MoS2suspension: 0.7769gMoS was added at room temperature2Placing the mixture in 100mL of deionized water, and uniformly mixing to obtain MoS2A suspension;
(3) mixing: at room temperature, 5.0g of pure SiC and 0.5898g of MoS are sequentially added into the molybdenum disulfide solution2(MoS calculated as molybdenum element)20.85 percent of hydrothermal system and 2 drops of 1-butyl-3-methylimidazolium hexafluorophosphate ionic liquid are ultrasonically stirred for 10 hours to be uniformly mixed;
(4) preparing a SiC/M-8 hydrogen production photocatalytic material by a hydrothermal synthesis method: and (3) placing the suspension subjected to ultrasonic treatment in a 300mL high-temperature reaction kettle, reacting at 200 ℃ for 20h, then centrifugally washing for 5 times until the pH =7, placing the suspension in a vacuum drying oven, and performing vacuum drying at 60 ℃ to obtain the SiC/M-8 photocatalytic material.
Comparative example 3
(1) Preparing pure SiC, namely placing SiC powder in a muffle furnace, roasting for 3 hours at 700 ℃, and naturally cooling to room temperature to remove impurity carbon; soaking in 2% HF solution in sealed dark condition for one night to remove SiO2And other oxides; repeatedly centrifuging and washing with deionized water for 11 times until pH =7, placing in a vacuum drying oven, and vacuum drying at 60 deg.C;
(2) GO suspension: placing 0.4391gGO in 100mL of deionized water at room temperature, and uniformly mixing to obtain a GO suspension;
(3) at room temperature, sequentially adding 5.0g of pure SiC, 0.05gGO and 2 drops of 1-butyl-3-methylimidazolium hexafluorophosphate ionic liquid into the GO suspension, and ultrasonically stirring for 10 hours to uniformly mix the materials;
(4) preparing a SiC/GO hydrogen production photocatalytic material by a hydrothermal synthesis method: and (3) placing the suspension subjected to ultrasonic treatment in a 300mL high-temperature reaction kettle, reacting for 20h at 200 ℃, then centrifuging and washing for 5 times until the pH value is =7, placing the suspension in a vacuum drying oven, and performing vacuum drying at 60 ℃ to obtain the SiC/GO photocatalytic material. The weight percentage of GO in the step (2) in the hydrothermal system is 8% (calculated by carbon element).
In a self-made photocatalytic reaction system (as shown in FIG. 3), 0.5g of the visible light photocatalyst prepared in examples 1-9 and comparative examples 2-3 was respectively weighed and dispersed in 100mL of a solution containing 0.1M Na2S·9H2O and 0.1M Na2SO3Is in aqueous solution of the sacrificial agent and the magnetic stirrer is turned on. Before light irradiation, N is introduced230min to ensure that the whole reaction system is in N2Under the protection of (3), after 4 hours, 1mL of gas was withdrawn with an airtight needle, and the amount of hydrogen produced was measured by gas chromatography. The hydrogen production efficiency after 4h is shown in fig. 4 and 5.
As can be seen from fig. 4 and 5, the hydrogen production efficiency of example 8 was the highest as compared with the hydrogen production efficiency of the other examples and comparative examples under the experimental conditions. By comparing the examples with comparative examples, it can be seen that GO and MoS2The double-promoter can improve the photocatalytic activity of SiC, thereby improving the hydrogen production efficiency.
The samples of examples 1-4 and comparative example 1 were characterized by uv-vis diffuse reflectance spectroscopy, respectively. The UV-visible diffuse reflectance spectrum is shown in FIG. 6.
As can be seen from fig. 6, in example, the absorption peak edge length was significantly red-shifted as compared with comparative example 1, and the red-shifts of example 3 and example 4 were close to each other.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all equivalent structures or equivalent processes used in the present specification and applied to other related fields directly or indirectly are encompassed by the present invention.

Claims (5)

1. The preparation method of the silicon carbide-based photocatalyst is characterized by comprising the following steps:
(1) preparing pure SiC: roasting the SiC powder at high temperature, and naturally cooling to room temperature to remove impurity carbon; then soaking in HF solution with the mass fraction of 2% in a sealed and light-proof manner to remove SiO2And other oxides; finally, repeatedly centrifuging and washing the SiC powder by using deionized water until the pH is =7, and placing the SiC powder in a vacuum drying oven to obtain pure SiC;
(2)MoS2suspension: mixing MoS2Placing in deionized water, and mixing uniformly to obtain MoS2A suspension;
(3) mixing: to MoS2Adding pure SiC, GO and ionic liquid into the suspension in sequence, and ultrasonically stirring to uniformly mix the pure SiC, the GO and the ionic liquid;
(4) preparing a silicon carbide-based photocatalyst by a hydrothermal reaction: transferring the suspension obtained in the step (3) into a high-temperature reaction kettle, reacting for a period of time at 200 ℃, then centrifugally washing until the pH is =7, and drying in vacuum to obtain the photocatalytic material, wherein MoS is calculated by molybdenum in the hydrothermal reaction system22-10% of the total weight of the carbon-based composite material, wherein the weight percentage of GO is 0.5-3% calculated by carbon element;
the prepared photocatalyst is applied to the aspect of photolysis of water;
the ionic liquid in the step (3) is 1-butyl-3-methylimidazolium hexafluorophosphate.
2. The method as claimed in claim 1, wherein the calcination temperature in step (1) is 600-800 ℃, the calcination time is 2-6h, and the vacuum drying temperature is 60 ℃.
3. The method for preparing a silicon carbide-based photocatalyst according to claim 1, wherein the calcination temperature in the step (1) is 700 ℃ and the calcination time is 5 hours.
4. According to claim 1The preparation method of the silicon carbide-based photocatalyst is characterized in that MoS is calculated by molybdenum element in a hydrothermal reaction system2Is 8wt%, and the weight percentage of GO calculated by carbon element is 0.85 wt%.
5. The method for preparing the silicon carbide-based photocatalyst according to claim 1, wherein the ultrasonic stirring time in the step (3) is 10 hours, the hydrothermal reaction time in the step (4) is 20 hours, and the vacuum drying temperature is 60 ℃.
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