CN109946908A - A kind of optical tunnel and lighting system - Google Patents
A kind of optical tunnel and lighting system Download PDFInfo
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- CN109946908A CN109946908A CN201711386683.9A CN201711386683A CN109946908A CN 109946908 A CN109946908 A CN 109946908A CN 201711386683 A CN201711386683 A CN 201711386683A CN 109946908 A CN109946908 A CN 109946908A
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- optical tunnel
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Abstract
The invention discloses a kind of optical tunnel, the inside or/and end face of optical tunnel are equipped with diffracting layer, and diffracting layer is equipped with diffraction pattern.Due to being equipped with the diffracting layer containing diffraction pattern in the inside of optical tunnel or/and end face, diffracting layer enhances even light effect, so that not increasing optical tunnel or obtaining preferably even light in the case where increasing microlens array, be conducive to shorten the length of big field illumination system, the adjustment difficulty for simplifying optical path, is particularly suitable in illumination/projection optical system of big visual field.
Description
Technical field
The present invention relates to optical technical fields, and in particular to a kind of optical tunnel and lighting system.
Background technique
Optical tunnel, also referred to as optical wand, light pipe, commonly used in being homogenized to light beam.According to different structure type, even light
Stick can be divided into solid bar and hollow bar.In laser projection system, microscope, gene sequencing device illumination, photo-etching machine illumination system
In system, optical tunnel realizes good illumination uniformity as light balancing device.
The principle of the even light of progress of optical tunnel are as follows: the light progress that will be incident to certain dispersion angle of optical tunnel is repeatedly anti-
It penetrates, keeps beam distribution uniform, and then realize the effect of the even light of optical tunnel.
In the application such as projecting illumination system, micro-imaging lighting system, light source generallys use high coherence, high-power
Laser light source.Optical tunnel is generally placed at lighting source and the cohesive position of x ray machine part, for receiving light source transmitting
The incident light of certain angle range, and will be exported again after beam homogenization to subsequent light fixture, into projection objective or micro-
In object lens, Uniform Illumination or imaging are finally realized.
According to the principle of the even light of optical tunnel, the face size of illumination uniformity and optical tunnel inversely, with optical tunnel
Length it is proportional.The visual field of demand illumination is bigger, it is desirable that the face size of optical tunnel is bigger, the road of light primary event
Diameter is longer, and the number of reflection is also required to increase.Therefore, it is the illumination for realizing big visual field, high uniformity, needs to increase optical tunnel
Length.
In order to shorten optical path, enhancing illumination uniformity, microlens array or micro- cylindrical mirror battle array are applied in some illumination paths
Column, there are also systems to use optical tunnel and microlens array or microtrabeculae face array combination.
To enhance illumination uniformity, meets the needs of more large visual field optical system Uniform Illumination, by increasing optical tunnel
Method cause lamp optical system volume increase, especially length can increase rapidly, this cause entire product volume increase and
The raising of cost.
Then cause lamp optical system adjustment process complicated in such a way that optical tunnel and microlens array etc. combine, difficulty
Increase.
Summary of the invention
The application provides a kind of small size and optical tunnel and lighting system with high uniformity illumination.
According in a first aspect, providing a kind of optical tunnel in a kind of embodiment, the inside or/and end face of optical tunnel are equipped with diffraction
Layer, diffracting layer are equipped with diffraction pattern.
Further, diffracting layer has several, is located at the inside and end face of optical tunnel.
Further, optical tunnel includes the unit barred body that multistage is stitched together, and diffracting layer is located at the splicing of unit barred body
In place and end face.
Further, diffracting layer is the dielectric layer in the end face processing and fabricating of unit barred body.
Further, processing and fabricating is photoetching or laser direct-writing.
In other embodiments, diffracting layer is the quartz glass plate containing diffraction pattern.
Further, diffraction pattern is the opening diffracting for being covered with diffracting layer.
In other embodiments, diffraction pattern is the center of circle containing opening diffracting and several concentric ring bands.
Further, equal optical rod is the hollow barred body that solid stick or inner sidewall are coated with reflectance coating.
According to second aspect, a kind of lighting system is provided in a kind of embodiment, including any of the above-described kind of optical tunnel.
According to the optical tunnel and lighting system of above-described embodiment, spread out due to being equipped with to contain in the inside of optical tunnel or/and end face
The diffracting layer of pattern is penetrated, diffracting layer enhances even light effect, so that in the case where not increasing optical tunnel or increasing microlens array
Preferably even light is obtained, the length for shortening big field illumination system is conducive to, simplifies the adjustment difficulty of optical path, is particularly suitable for big
In illumination/projection optical system of visual field.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of optical tunnel in embodiment；
Fig. 2 is a kind of decomposition texture schematic diagram of optical tunnel in embodiment；
Fig. 3 is a kind of another decomposition texture schematic diagram of optical tunnel in embodiment；
Fig. 4 is a kind of structural schematic diagram of diffracting layer in embodiment；
Fig. 5 is a kind of another structural schematic diagram of diffracting layer in embodiment；
Fig. 6 is the structural schematic diagram that optical tunnel diffraction homogenizes laser in a kind of embodiment；
Fig. 7 is a kind of structural schematic diagram of diffracting layer diffracted laser in embodiment；
Fig. 8 is the structural schematic diagram that another kind implements middle lighting system.
Specific embodiment
Below by specific embodiment combination attached drawing, invention is further described in detail.
Embodiment one:
Present embodiments provide a kind of optical tunnel containing diffracting layer.Optical tunnel is that solid stick or inner sidewall are coated with instead
Penetrate the hollow barred body of film.Diffracting layer includes one or more, and the middle part or end face of optical tunnel is arranged in diffracting layer, or sets simultaneously
It sets at the middle part and end face of optical tunnel, it is preferred that the end face equipped with diffracting layer is the light-emitting surface of optical tunnel.Diffracting layer, which is equipped with, to spread out
Pattern is penetrated, diffraction pattern is mainly opening diffracting, carries out diffraction by light of multiple opening diffractings to incidence angles degree, improves even
The uniformity of optical wand emergent light, while it is no longer uniformly point for tending to Gaussian that the Energy distribution of laser beam, which is intended to,
Cloth.Diffracting layer makes laser that diffraction occur during optical tunnel transmission, due to there are certain angle of diffraction, and angle of diffraction
Size can use the size of diffraction pattern to control, therefore play the role of it is homogenized so that the optical tunnel of small size has
Better even light effect.
And optical tunnel diffracting layer in optical tunnel can be perpendicular to optical tunnel, be also possible to be not orthogonal to optical tunnel, i.e.,
Have an angle, it is preferable that each diffracting layer along optical axis direction be arranged and it is vertical with optical axis, wherein the length side of optical tunnel
To being optical axis direction, so that the light in optical tunnel occurs diffraction through diffracting layer and uniformly dissipates, reach optimal diverging
Effect.
Specifically, left side is into light as shown in Figure 1, optical tunnel 1 includes two sections of unit barred bodies 11 being stitched together
Face, right side are light-emitting surface, and two unit barred bodies 11 are arranged to isometric square body.The stitching portion and position of two unit barred bodies 11
In being respectively provided with a diffracting layer 12 on the light-emitting surface of right end.Two diffracting layers 12 successively carry out diffraction homogenizing to incident light.
In other embodiments, the length of two unit barred bodies 11 can be configured as difference, or be arranged to cylinder；Or
It is docked equipped with more unit barred bodies 11, such as optical tunnel 1 by three or four unit barred bodies 11, and in each stitching portion
Equipped with a diffracting layer 12.
The diffracting layer 12 of the present embodiment has two types, a kind of in the medium of 11 end face processing and fabricating of unit barred body
Layer, another kind are independent structure layer.To constitute the optical tunnel 1 of three types, the first optical tunnel 1 includes medium channel type
Diffracting layer 12, second optical tunnel 1 include the diffracting layer 12 of independent structure channel type, the third optical tunnel 1 include dielectric layer and
The two kinds of diffracting layer 12 of independent structure layer.
As shown in Fig. 2, the non-in addition increased layer structure of diffracting layer 12, diffracting layer 12 by the end face processing of unit barred body 11 and
At diffracting layer 12, in the dielectric layer of 11 end face processing and fabricating of unit barred body, passes through bonding by modes such as photoetching or laser direct-writings
Etc. modes be bonded together with adjacent unit barred body 11.
As shown in figure 3, diffracting layer 12 is independent independent structure layer, diffracting layer 12 is diffraction surfaces or diffracting object, such as is spread out
Penetrating layer 12 is the quartz glass plate etc. containing diffraction pattern.Diffracting layer 12 is located at the docking between two unit barred bodies 11, folder
Between two unit barred bodies 11 or the splicing of diffracting layer 12 is on the light-emitting surface of 1 right end of optical tunnel.
Diffraction pattern on diffracting layer 12 has a variety of, and the diffracting layer 12 in the present embodiment mainly uses two kinds of diffraction patterns
Case, as shown in figure 4, the diffraction pattern of diffracting layer 12 is the opening diffracting for being covered with diffracting layer 12.As shown in figure 5, diffracting layer 12 spreads out
Penetrating pattern to be includes the center of circle and several concentric ring bands, and several opening diffractings, concentric ring are equipped on the center of circle and concentric ring band
Band becomes narrow gradually from inside to outside, and opening diffracting gradually becomes smaller from inside to outside and becomes close.In other embodiments, spreading out on optical tunnel 1
Penetrating layer 12 only includes one of above two diffraction pattern, or can be arranged to other patterns according to actual needs.
As shown in fig. 6, the optical tunnel 1 of the present embodiment is spliced by two unit barred bodies 11, in two unit barred bodies 11
Stitching portion, which is provided with, is covered with the diffracting layer 12 for having opening diffracting (diffracting layer 12 i.e. shown in Fig. 4), goes out in the right end of unit barred body 11
Smooth surface is equipped with the diffracting layer 12 (diffracting layer 12 i.e. shown in fig. 5) comprising the center of circle He several concentric ring bands.Laser is from optical tunnel 1
Left end is incident, and diffracting layer 12 of the light between two unit barred bodies 11 dissipates after diffraction occurs, as shown in fig. 7, playing even light
Effect；When light propagation to the light-emitting surface of optical tunnel 1, diffraction occurs again in second diffracting layer 12, obtains more uniform swashing
Light, and can cooperate with subsequent condenser system and realize even optical illumination.By the setting of diffracting layer 12, optical tunnel 1 can be controlled and gone out
The angle of light is penetrated, to meet the requirement of shooting angle.
Optical tunnel provided in this embodiment, due to being equipped with the diffraction containing diffraction pattern in the inside of optical tunnel 1 or/and end face
Layer 12, diffracting layer 12 enhances even light effect, so that not increasing optical tunnel 1 or obtaining in the case where increasing microlens array more preferable
Even light, be conducive to the length for shortening big field illumination system, simplify the adjustment difficulty of optical path, be particularly suitable for the photograph of big visual field
In bright/projection optical system.
Embodiment two:
A kind of lighting system of optical tunnel including above-described embodiment one is present embodiments provided, lighting system further includes light
The optical components such as source, illumination microscope group, the lighting system with above-mentioned optical tunnel can irradiate better even light.The present embodiment with
It is illustrated for lighting system as shown in Figure 8, in other embodiments, lighting system can include above-mentioned optical tunnel 1
On the basis of have other optical components.
As shown in figure 8, the lighting system of the present embodiment includes light source 2, optical tunnel 1, condenser 3, illuminated mirror from top to bottom
Group 4 and microcobjective 5.
Light source 2 includes laser and the optical fiber being attached thereto, and laser passes through fibre optical transmission laser.Light source 2 can emit one
Kind wavelength or multi-wavelength's laser, and the laser emitted has high coherence.For example, 2 solid state laser of light source and single-mode optics
Fibre, the laser that light source 2 emits are the visible light that wavelength is 532nm.
The even optical illumination principle of this lighting system are as follows: light source 2 passes through fibre optical transmission laser, laser light incident to optical tunnel 1
Incidence surface, laser homogenize propagation in optical tunnel 1, and laser spreads out when propagating to the diffracting layer 12 at even middle part in optical tunnel 1
It penetrates and laser is dissipated, the laser after diffraction diverging continues to propagate to light-emitting surface in optical tunnel 1, and spreading out on light-emitting surface
It penetrates layer 2 and diffraction occurs again, laser beam is decomposed into multiple small light beams, and expose to condenser 3, light beam passes through condenser
It is exposed to after 3 convergences in illumination microscope group 4, becomes directional light and be emitted at the emergent pupil A of illumination microscope group 4, illuminated at 4 emergent pupil A of microscope group
It is simultaneously also at the entrance pupil of microcobjective 5, laser is uniformly radiated at the focal plane B of microcobjective 5 after microcobjective 5
On, focal plane B is to plane of illumination.This lighting method is the critical illumination mode of microcobjective.
Lighting system provided in this embodiment, due to including the optical tunnel 1 containing two diffracting layers 12, what light source 2 irradiated
Diffraction twice successively occurs on optical tunnel 1 for laser and cooperate optical tunnel 1 itself homogenizes effect, greatly improves laser
Effect is homogenized, so as to obtain preferably even light in the case where not increasing optical tunnel 1 or increasing microlens array, is conducive to contract
The length of short big field illumination system simplifies the adjustment difficulty of optical path, is particularly suitable for illumination/projection optical system of big visual field
In
Use above specific case is illustrated the present invention, is merely used to help understand the present invention, not to limit
The system present invention.For those skilled in the art, according to the thought of the present invention, can also make several simple
It deduces, deform or replaces.
Claims (10)
1. a kind of optical tunnel, which is characterized in that the inside or/and end face of the optical tunnel are equipped with diffracting layer, on the diffracting layer
Equipped with diffraction pattern.
2. optical tunnel as described in claim 1, which is characterized in that the diffracting layer has several, is located at described even
The inside and end face of optical wand.
3. optical tunnel as claimed in claim 2, which is characterized in that the optical tunnel includes the unit stick that multistage is stitched together
Body, the diffracting layer are located on the stitching portion and end face of the unit barred body.
4. optical tunnel as claimed in claim 3, which is characterized in that the diffracting layer is to process in the end face of the unit barred body
The dielectric layer of production.
5. optical tunnel as claimed in claim 4, which is characterized in that the processing and fabricating is photoetching or laser direct-writing.
6. optical tunnel as claimed in claim 3, which is characterized in that the diffracting layer is the quartz glass containing diffraction pattern
Piece.
7. optical tunnel as described in claim 1, which is characterized in that the diffraction pattern is the opening diffracting for being covered with diffracting layer.
8. optical tunnel as described in claim 1, which is characterized in that the diffraction pattern is containing the center of circle of opening diffracting and several
Concentric ring band.
9. optical tunnel as described in claim 1, which is characterized in that the equal optical rod is that solid stick or inner sidewall are coated with
The hollow barred body of reflectance coating.
10. a kind of lighting system, which is characterized in that including the optical tunnel as described in claim 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711386683.9A CN109946908A (en) | 2017-12-20 | 2017-12-20 | A kind of optical tunnel and lighting system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711386683.9A CN109946908A (en) | 2017-12-20 | 2017-12-20 | A kind of optical tunnel and lighting system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109946908A true CN109946908A (en) | 2019-06-28 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711386683.9A Pending CN109946908A (en) | 2017-12-20 | 2017-12-20 | A kind of optical tunnel and lighting system |
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| Country | Link |
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| CN (1) | CN109946908A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111273441A (en) * | 2020-02-25 | 2020-06-12 | 业成科技（成都）有限公司 | Optical module and electronic equipment |
| CN113126273A (en) * | 2019-12-30 | 2021-07-16 | 长春长光华大智造测序设备有限公司 | Bar-shaped illumination optical system of microscope objective |
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| WO2007115664A1 (en) * | 2006-04-06 | 2007-10-18 | Oc Oerlikon Balzers Ag | Projection illumination system, in which lenses with diffractive optical elements are used. |
| CN201434340Y (en) * | 2008-11-10 | 2010-03-31 | 长春理工大学 | Near-field uniform illumination device with diffraction hole arrays |
| CN102566294A (en) * | 2010-12-28 | 2012-07-11 | 上海微电子装备有限公司 | Photoetching lamp optical system |
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| CN106773480A (en) * | 2016-12-19 | 2017-05-31 | 海信集团有限公司 | A kind of optical tunnel and illuminator |
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Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3519992A (en) * | 1966-08-10 | 1970-07-07 | North American Rockwell | Photointerpretation system |
| WO2007115664A1 (en) * | 2006-04-06 | 2007-10-18 | Oc Oerlikon Balzers Ag | Projection illumination system, in which lenses with diffractive optical elements are used. |
| CN201434340Y (en) * | 2008-11-10 | 2010-03-31 | 长春理工大学 | Near-field uniform illumination device with diffraction hole arrays |
| CN102566294A (en) * | 2010-12-28 | 2012-07-11 | 上海微电子装备有限公司 | Photoetching lamp optical system |
| CN103597400A (en) * | 2011-04-12 | 2014-02-19 | 巴库股份有限公司 | Laser projector with reduced speckle |
| CN103293677A (en) * | 2012-02-24 | 2013-09-11 | 中国科学院微电子研究所 | Dodging device and manufacturing method thereof |
| CN104965307A (en) * | 2015-07-28 | 2015-10-07 | 山东大学 | Device and method being capable of achieving light beam shaping dodging and speckle eliminating at the same time |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113126273A (en) * | 2019-12-30 | 2021-07-16 | 长春长光华大智造测序设备有限公司 | Bar-shaped illumination optical system of microscope objective |
| CN113126273B (en) * | 2019-12-30 | 2022-12-23 | 长春长光华大智造测序设备有限公司 | Bar-shaped lighting optical system of microobjective |
| CN111273441A (en) * | 2020-02-25 | 2020-06-12 | 业成科技（成都）有限公司 | Optical module and electronic equipment |
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| CB02 | Change of applicant information |
Address after: 130033 No. 1 Building, Incubation Base, 77 Yingkou Road, Changchun Economic Development Zone, Jilin Province Applicant after: Changchun Changguang Huada Zhizao sequencing Equipment Co.,Ltd. Address before: 130033 Building 1, hatchery, 77 Yingkou Road, Changchun Economic Zone, Jilin Applicant before: CHANGGUANG HUADA GENE SEQUENCING EQUIPMENT (CHANGCHUN) Co.,Ltd. |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190628 |
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| RJ01 | Rejection of invention patent application after publication |