CN109917955B - Substrate, touch display device and manufacturing method of touch display device - Google Patents
Substrate, touch display device and manufacturing method of touch display device Download PDFInfo
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- CN109917955B CN109917955B CN201910130539.1A CN201910130539A CN109917955B CN 109917955 B CN109917955 B CN 109917955B CN 201910130539 A CN201910130539 A CN 201910130539A CN 109917955 B CN109917955 B CN 109917955B
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Abstract
The invention provides a substrate, a touch display device and a touch display device manufacturing method. In the substrate, the touch display device and the touch display device manufacturing method provided by the invention, the first conductive electrode and the second conductive electrode are arranged on the same layer, and the disjunction part of the second conductive electrode is connected through the connecting bridge, so that the first conductive electrode and the second conductive electrode can be formed simultaneously, only one photomask is needed during etching, the manufacturing process is simplified, and the thickness of the touch display device is reduced.
Description
Technical Field
The invention relates to the technical field of display, in particular to a substrate, a touch display device and a manufacturing method of the touch display device.
Background
With the continuous progress of display technology, touch display devices have gradually spread throughout the lives of people. As shown in fig. 1, a typical touch display device includes a counter substrate (not shown), a substrate 91 disposed opposite to the counter substrate, and a liquid crystal layer (not shown) disposed between the counter substrate and the substrate 91. The substrate 91 is sequentially provided with a first conductive electrode 912, a first protective layer 914, a second conductive electrode 916, and a second protective layer 918. The first protective layer 914 and the second protective layer 918 are both OC layers.
However, in the above structure, the first conductive electrode 912 and the second conductive electrode 916 are formed in two steps, and two masks are required to form patterns, which is complicated and costly. Moreover, the two electrode layers also increase the thickness of the entire substrate 91, and the thickness of the OC layer is also large, which is not favorable for the light weight and miniaturization of the touch display device. In addition, the second protective layer 918 is likely to peel off, which causes problems such as the second conductive electrode 916 being exposed and being likely to be corroded.
Disclosure of Invention
The invention provides a substrate, a touch display device and a manufacturing method of the touch display device, which can simplify the manufacturing process of the touch display device and reduce the thickness of the touch display device.
The invention provides a substrate, which comprises a second substrate, a shading structure and a color resistance layer, wherein the shading structure and the color resistance layer are arranged on one side surface of the second substrate, a first conductive electrode and a second conductive electrode are arranged on the other side surface of the second substrate, the first conductive electrode and the second conductive electrode are arranged in a staggered and insulated mode and are respectively of a grid structure, the second conductive electrode comprises a breaking part for breaking the second conductive electrode, a connecting bridge is respectively and electrically connected with the second conductive electrodes on two sides of the breaking part, and the connecting bridge is intersected with the projection of the first conductive electrode on the second substrate.
Furthermore, the substrate further comprises a first insulating layer, the first insulating layer covers the first conductive electrode, the second conductive electrode and the second substrate, the connecting bridge is arranged on one side, far away from the first conductive electrode and the second conductive electrode, of the first insulating layer, and the connecting bridge penetrates through the first insulating layer to be electrically connected with the second conductive electrodes on two sides of the cutting position respectively.
Furthermore, the substrate further comprises a second insulating layer, and the second insulating layer covers the connecting bridge and the first insulating layer.
Furthermore, the substrate further includes a third insulating layer and a fourth insulating layer, the third insulating layer is sandwiched between the connecting bridge and the first conductive electrode to insulate the connecting bridge from the first conductive electrode, the third insulating layer is disposed in an intersection region of projections of the connecting bridge and the second conductive electrode on the second substrate, and the fourth insulating layer covers the connecting bridge, the second conductive electrode not covered by the third insulating layer, and the second substrate.
Further, the first conductive electrode comprises a plurality of first sensing units extending along the transverse direction, the second conductive electrode comprises a plurality of second sensing units extending along the longitudinal direction, and the width of the first sensing units in the longitudinal direction is larger than that of the second sensing units in the transverse direction.
Furthermore, the grid density of the first conductive electrode in the overlapping area of the first sensing unit and the second sensing unit is half of the grid density of the first conductive electrode in the overlapping area of the first sensing unit and the second sensing unit.
Further, the color of the side of the cover plate facing the display panel is the same as the color of the side of the main plate facing the display panel.
Further, the cover plate is movably disposed on the main board or the display panel.
Further, the cover plate comprises a first cover plate and a second cover plate, and the first cover plate and the second cover plate can respectively slide relative to the main plate along a straight line; or the cover plate is a whole plate and can slide relative to the main plate along a straight line; alternatively, the cover plate may be rotatable about an axis relative to the main plate.
The invention also provides a touch display device which comprises an opposite substrate, a substrate arranged opposite to the opposite substrate and a liquid crystal layer positioned between the opposite substrate and the substrate, wherein the substrate is the substrate.
The invention also provides a manufacturing method of the touch display device, which comprises the following steps:
providing a second substrate, and forming a first conductive electrode and a second conductive electrode on one side of the second substrate, wherein the first conductive electrode and the second conductive electrode are arranged in a staggered and insulated mode and are respectively of a grid-shaped structure, and the second conductive electrode comprises a breaking part for breaking the second conductive electrode;
forming a first insulating layer on the first conductive electrode and the second conductive electrode, respectively forming first via holes on two sides of a dividing position of the first insulating layer corresponding to the second conductive electrode, wherein the first insulating layer also covers the second substrate which is not covered by the first conductive electrode and the second conductive electrode;
forming a connecting bridge on one side of the first insulating layer, which is far away from the first conductive electrode and the second conductive electrode, wherein the connecting bridge penetrates through the first through hole of the first insulating layer and is electrically connected with the second conductive electrodes on two sides of the disjunction position respectively, and the connecting bridge is intersected with the projection of the first conductive electrode on the second substrate;
forming a light shielding structure and a color resistance layer on one side of the second substrate opposite to the first conductive electrode and the second conductive electrode, thereby forming a substrate; and
an opposing substrate and a liquid crystal layer are provided, the liquid crystal layer being disposed between the substrate and the opposing substrate.
Further, the method for manufacturing the touch display device further comprises the steps of forming a connecting bridge on one side of the first insulating layer far away from the first conductive electrode and the second conductive electrode, and forming a light shielding structure and a color resistance layer on one side of the second substrate opposite to the first conductive electrode and the second conductive electrode, so as to form a space between the substrates:
and forming a second insulating layer on the connecting bridge, wherein the second insulating layer covers the connecting bridge and the first insulating layer.
The invention also provides a manufacturing method of the touch display device, which comprises the following steps:
providing a second substrate, and forming the first conductive electrode and the second conductive electrode on one side of the second substrate, wherein the first conductive electrode and the second conductive electrode are arranged in a staggered and insulated manner and are respectively of a grid-shaped structure, and the second conductive electrode comprises a breaking part for breaking the second conductive electrode;
forming a third insulating layer on the second conductive electrode, wherein the third insulating layer covers the first conductive electrode passing through the breaking point and the breaking point;
forming a connecting bridge on one side of the third insulating layer, which is far away from the first conductive electrode and the second conductive electrode, wherein the connecting bridge is respectively electrically connected with the second conductive electrodes on two sides of the disjunction position, and the connecting bridge is intersected with the projection of the first conductive electrode on the second substrate;
forming a fourth insulating layer on the connecting bridge, wherein the fourth insulating layer covers the connecting bridge, covers the second conductive electrode which is not covered by the third insulating layer and the second substrate;
forming a light shielding structure and a color resistance layer on one side of the second substrate opposite to the first conductive electrode and the second conductive electrode, thereby forming a substrate; and
an opposing substrate and a liquid crystal layer are provided, the liquid crystal layer being disposed between the substrate and the opposing substrate.
According to the substrate, the touch display device and the manufacturing method of the touch display device, the first conductive electrode and the second conductive electrode are arranged on the same layer, and the disjunction part of the second conductive electrode is connected through the connecting bridge, so that the first conductive electrode and the second conductive electrode can be formed simultaneously, only one photomask is needed during etching, the manufacturing process is simplified, and the thickness of the touch display device is reduced.
Drawings
Fig. 1 is a schematic diagram of a substrate structure of a touch display device of a conventional touch display device.
Fig. 2 is a schematic structural diagram of a touch display device according to a first embodiment of the invention.
Fig. 3 is a schematic plan view of the first conductive electrode and the second conductive electrode of the touch display device shown in fig. 2.
Fig. 4 is a flowchart illustrating a method for manufacturing a touch display device according to a second embodiment of the invention.
Fig. 5a is a schematic structural diagram of the substrate of the touch display device in step S11 in fig. 4.
Fig. 5b is a schematic structural diagram of the substrate of the touch display device in step S13 in fig. 4.
Fig. 5c is a schematic structural diagram of the substrate of the touch display device in step S15 in fig. 4.
Fig. 6 is a schematic structural diagram of a touch display device according to a third embodiment of the invention.
Fig. 7 is a schematic plan view of the first conductive electrode and the second conductive electrode of the touch display device shown in fig. 6.
Fig. 8 is a flowchart illustrating a method for manufacturing a touch display device according to a fourth embodiment of the invention.
Fig. 9a is a schematic structural diagram of the substrate of the touch display device in step S31 in fig. 8.
Fig. 9b is a schematic structural diagram of the substrate of the touch display device in step S33 in fig. 8.
Fig. 9c is a schematic structural diagram of the substrate of the touch display device in step S35 in fig. 8.
Fig. 10 is a schematic structural diagram of a touch display device according to a fifth embodiment of the invention.
Fig. 11 is a schematic plan view of the first conductive electrode and the second conductive electrode of the touch display device shown in fig. 10.
Fig. 12 is a flowchart illustrating a method for manufacturing a touch display device according to a sixth embodiment of the invention.
Fig. 13a is a schematic structural diagram of the substrate of the touch display device in step S51 in fig. 12.
Fig. 13b is a schematic structural diagram of the substrate of the touch display device in step S53 in fig. 12.
Fig. 13c is a schematic structural diagram of the substrate of the touch display device in step S55 in fig. 12.
Fig. 13d is a schematic structural diagram of the substrate of the touch display device in step S57 in fig. 12.
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
First embodiment
Referring to fig. 2, the touch display device according to an embodiment of the present invention includes an opposite substrate 10, a substrate 30 disposed opposite to the opposite substrate 10, and a liquid crystal layer 50 disposed between the opposite substrate 10 and the substrate 30. The counter substrate 10 includes a first substrate 102, a switching element 103, a first insulating layer 104, a first electrode layer 105, a second insulating layer 106, and a second electrode layer 107, and the switching element 103, the first insulating layer 104, the first electrode layer 105, the second insulating layer 106, and the second electrode layer 107 are sequentially stacked and disposed on a surface of the first substrate 102 facing the liquid crystal layer 50. The counter substrate 10 is also defined by scan lines and data lines to form a plurality of pixel units P. The substrate 30 includes a second substrate 302, a light shielding structure 304 and a color resist layer 306, wherein the light shielding structure 304 and the color resist layer 306 are sequentially disposed on a surface of the second substrate 302 facing the liquid crystal layer 50. Referring to fig. 3, the touch display device further includes a first conductive electrode 72, a second conductive electrode 74, a connecting bridge 76, and a first insulating layer 82. The first conductive electrode 72 and the second conductive electrode 74 are both disposed on a side surface of the second substrate 302 away from the opposite substrate 10, the first conductive electrode 72 and the second conductive electrode 74 are arranged in a staggered and insulated manner, and are respectively in a grid-like structure, and the second conductive electrode 74 includes a breaking portion for breaking the second conductive electrode 74. The first insulating layer 82 covers the first conductive electrode 72 and the second conductive electrode 74, the connecting bridge 76 is disposed on one side of the first insulating layer 82 away from the first conductive electrode 72 and the second conductive electrode 74, the connecting bridge 76 penetrates through the first insulating layer 82 and is electrically connected with the second conductive electrode 74 on two sides of the cutting position, and the projection of the connecting bridge 76 and the first conductive electrode 72 on the second substrate 302 intersects. Specifically, in the present embodiment, the first conductive electrode 72 provides a touch driving signal to form a touch driving electrode, and the second conductive electrode 74 provides a touch sensing signal to form a touch sensing electrode. In the present embodiment, the first conductive electrode 72 and the second conductive electrode 74 are directly formed on the second substrate 302, so that the substrate 30 is in the form of an embedded (on-cell) structure.
In the touch display device, the first conductive electrode 72 and the second conductive electrode 74 are arranged on the same layer, and the cut part of the second conductive electrode 74 is connected through the connecting bridge 76, so that the first conductive electrode 72 and the second conductive electrode 74 can be formed simultaneously, only one photomask is needed during etching, the manufacturing process is simplified, and the thickness of the touch display device is reduced.
In this embodiment, the first substrate 102 and the second substrate 302 are plastic plates or glass plates, and the second substrate 302 is a color film substrate.
In this embodiment, one switching element 103 is provided in each pixel unit P. Specifically, each thin film transistor includes a gate electrode disposed on the first substrate 102, a semiconductor layer, a source electrode and a drain electrode disposed on the semiconductor layer and in contact with the semiconductor layer, the source electrode and the drain electrode being disposed at an interval from each other, wherein the drain electrode is electrically connected to the pixel electrode, the gate electrode is electrically connected to the scan line, and the source electrode is electrically connected to the data line. The grid electrode of the thin film transistor is provided with a passivation layer, and the semiconductor layer is arranged on the passivation layer.
In this embodiment, a planarization layer 109 is further disposed between the first insulating layer 104 and the first electrode layer 105.
In the present embodiment, as shown in fig. 3, the first conductive electrode 72 and the second conductive electrode 74 each form a grid-like structure having a plurality of diamond-shaped meshes.
In this embodiment, the first conductive electrode 72 includes a plurality of first sensing cells 722 extending along a scan line direction (i.e., a transverse direction), the second conductive electrode 74 includes a plurality of second sensing cells 742 extending along a data line direction (i.e., a longitudinal direction), a width L1 of the first sensing cells 722 in the data line direction is greater than a width L2 of the second sensing cells 742 in the scan line direction, so that impedance of the first conductive electrode 72 can be effectively reduced, and meanwhile, a signal-to-noise ratio can be reduced, and touch sensitivity can be improved, specifically, L1 can be 2250 and 4950 micrometers, L2 can be 1500 and 3750 micrometers, more specifically, L1 can be 2976 micrometers, and L2 can be 2 micrometers.
Specifically, the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742 is half of the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742. Since the grid density of the first conductive electrode 72 is greater in the non-overlapped region of the first sensing cell 722 and the second sensing cell 742, the impedance and capacitance of the first conductive electrode 72 can be reduced. More specifically, the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the overlapping region of the first sensing cell 722 and the second sensing cell 742 is twice the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the non-overlapping region of the second sensing cell 742. Specifically, in the present embodiment, the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the overlapping region of the first sensing cell 722 and the second sensing cell 742 is 606 micrometers, and the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the non-overlapping region of the second sensing cell 742 is 303 micrometers.
In this embodiment, the connection bridge 76 is an Indium Tin Oxide (ITO) transparent conductive film.
In the present embodiment, the first insulating layer 82 is a PV layer. The thickness of the PV layer is smaller than that of the OC layer, so that the thickness of the touch display device can be further reduced, and the PV layer has stronger adhesive force than that of the OC layer and is not easy to peel off. Specifically, the first insulating layer 82 also covers the second substrate 302 not covered by the first conductive electrode 72 and the second conductive electrode 74, that is, the first insulating layer 82 is an entire surface.
In this embodiment, the first insulating layer 82 has first vias 822 formed on two sides of the dividing portion corresponding to the second conductive electrode 74, respectively, for the connecting bridge 76 to pass through.
Second embodiment
As shown in fig. 4, the method for manufacturing a touch display device according to a second embodiment of the present invention is used for manufacturing the touch display device according to the first embodiment, and includes the following steps:
s11, providing a second substrate 302, and forming a first conductive electrode 72 and a second conductive electrode 74 on one side of the second substrate 302.
Referring to fig. 2 and 5a, the first conductive electrode 72 and the second conductive electrode 74 are alternately and insulatively disposed, and each of the first conductive electrode 72 and the second conductive electrode 74 has a grid-like structure, and the second conductive electrode 74 includes a breaking portion for breaking the second conductive electrode 74. Specifically, when the first conductive electrode 72 and the second conductive electrode 74 are formed, the first conductive electrode 72 and the second conductive electrode 74 are formed by patterning by etching before forming a metal layer on the second substrate 302. In the process, the first conductive electrode 72 and the second conductive electrode 74 are formed by the same metal layer, and only one photomask is needed during etching, so that the manufacturing process is simplified, and the thickness of the touch display device is reduced.
In the present embodiment, as shown in fig. 3, the first conductive electrode 72 and the second conductive electrode 74 each form a grid-like structure having a plurality of diamond-shaped meshes.
In this embodiment, the first conductive electrode 72 includes a plurality of first sensing cells 722 extending in a transverse direction, the second conductive electrode 74 includes a plurality of second sensing cells 742 extending in a longitudinal direction, a width L1 of the first sensing cells 722 in the longitudinal direction is greater than a width L2 of the second sensing cells 742 in the transverse direction, so that the impedance of the first conductive electrode 72 can be effectively reduced, and simultaneously the signal-to-noise ratio can be reduced, and the touch sensitivity can be improved, specifically, L1 can be 2250 and 4950 micrometers, L2 can be 1500 and 3750 micrometers, more specifically, L1 can be 2976 micrometers, and L2 can be 2200 micrometers.
Specifically, the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742 is half of the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742. Since the grid density of the first conductive electrode 72 is greater in the non-overlapped region of the first sensing cell 722 and the second sensing cell 742, the impedance and capacitance of the first conductive electrode 72 can be reduced. More specifically, the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the overlapping region of the first sensing cell 722 and the second sensing cell 742 is twice the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the non-overlapping region of the second sensing cell 742. Specifically, in the present embodiment, the diagonal distance in the transverse direction of the diamond-shaped grids of the first conductive electrode 72 in the overlapping region of the first sensing cell 722 and the second sensing cell 742 is 606 micrometers, and the diagonal distance in the transverse direction of the diamond-shaped grids of the first conductive electrode 72 in the non-overlapping region of the second sensing cell 742 is 303 micrometers.
S13, forming a first insulating layer 82 on the first conductive electrode 72 and the second conductive electrode 74, and forming first vias 822 on two sides of the first insulating layer 82 corresponding to the dividing portions of the second conductive electrode 74. Specifically, as shown in fig. 5b, the first insulating layer 82 also covers the second substrate 302 not covered by the first conductive electrode 72 and the second conductive electrode 74, that is, the first insulating layer 82 is a whole surface. The first insulating layer 82 is a PV layer. The thickness of the PV layer is smaller than that of the OC layer, so that the thickness of the touch display device can be further reduced, and the PV layer has stronger adhesive force than that of the OC layer and is not easy to peel off.
S15, a connecting bridge 76 is formed on the first insulating layer 82 at a side away from the first conductive electrode 72 and the second conductive electrode 74. Specifically, as shown in fig. 5c, the connecting bridge 76 penetrates through the first via 822 of the first insulating layer 82 to be electrically connected to the second conductive electrodes 74 on two sides of the dividing position, and the projection of the connecting bridge 76 and the first conductive electrode 72 on the second substrate 302 intersects.
S17, a light shielding structure 304 and a color resist layer 306 are formed on the opposite side of the second substrate 302 from the first conductive electrode 72 and the second conductive electrode 74, thereby forming the substrate 30.
S18, the counter substrate 10 and the liquid crystal layer 50 are provided, and the liquid crystal layer 50 is provided between the substrate 30 and the counter substrate 10. The opposite substrate 10 and the liquid crystal layer 50 are the opposite substrate 10 and the liquid crystal layer 50 in the first embodiment, and the detailed structure thereof is not described herein.
Third embodiment
As shown in fig. 6, the touch display device of the third embodiment of the present invention has substantially the same structure as the touch display device of the first embodiment, except that in the third embodiment, the touch display device includes a first conductive electrode 72, a second conductive electrode 74, a connecting bridge 76, a first insulating layer 82 and a second insulating layer 84. The first conductive electrode 72 and the second conductive electrode 74 are both disposed on a side surface of the second substrate 302 away from the opposite substrate 10, the first conductive electrode 72 and the second conductive electrode 74 are arranged in a staggered and insulated manner, and are respectively in a grid-like structure, and the second conductive electrode 74 includes a breaking portion for breaking the second conductive electrode 74. The first insulating layer 82 is disposed on the first conductive electrode 72 and the second conductive electrode 74, and the connecting bridge 76 penetrates through the first insulating layer 82 and is electrically connected to the second conductive electrode 74 on two sides of the dividing position, respectively, and the projection of the connecting bridge 76 and the first conductive electrode 72 on the second substrate 302 intersects. The second insulating layer 84 covers the connecting bridge 76.
In the present embodiment, as shown in fig. 7, the first conductive electrode 72 and the second conductive electrode 74 each form a grid-like structure having a plurality of diamond-shaped meshes.
In this embodiment, the first conductive electrode 72 includes a plurality of first sensing units 722 extending along a scan line direction (i.e., a transverse direction), the second conductive electrode 74 includes a plurality of second sensing units 742 extending along a data line direction (i.e., a longitudinal direction), and a width L1 of the first sensing units 722 in the data line direction is greater than a width L2 of the second sensing units 742 in the scan line direction, so that the impedance of the first conductive electrode 72 can be effectively reduced, the signal-to-noise ratio can be reduced, and the touch sensitivity can be improved. Specifically, L1 can be 2250-4950 microns, L2 can be 1500-3750 microns, more specifically L1 can be 2976 microns, and L2 can be 2200 microns.
Specifically, the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742 is half of the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742. Since the grid density of the first conductive electrode 72 is greater in the non-overlapped region of the first sensing cell 722 and the second sensing cell 742, the impedance and capacitance of the first conductive electrode 72 can be reduced. More specifically, the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the overlapping region of the first sensing cell 722 and the second sensing cell 742 is twice the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the non-overlapping region of the second sensing cell 742. Specifically, in the present embodiment, the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the overlapping region of the first sensing cell 722 and the second sensing cell 742 is 606 micrometers, and the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the non-overlapping region of the second sensing cell 742 is 303 micrometers.
In this embodiment, the first and second insulating layers 82, 84 are both PV layers. The thickness of the PV layer is smaller than that of the OC layer, so that the thickness of the touch display device can be further reduced, and the PV layer has stronger adhesive force than that of the OC layer and is not easy to peel off. The second insulating layer 84 covers the connecting bridges 76 to protect the connecting bridges 76 from corrosion.
In this embodiment, the first insulating layer 82 and the second insulating layer 84 are both entirely covered, that is, the first insulating layer 82 also covers the second substrate 302 not covered by the first conductive electrode 72 and the second conductive electrode 74, and the second insulating layer 84 also covers the first insulating layer 82.
In this embodiment, the first insulating layer 82 has first vias 822 formed on two sides of the dividing portion corresponding to the second conductive electrode 74, respectively, for the connecting bridge 76 to pass through. Since the same mask as that used for forming the first insulating layer 82 is used for forming the second insulating layer 84, the second via 842 is formed at a position of the second insulating layer 84 corresponding to the first via 822.
Fourth embodiment
The method for manufacturing a touch display device according to the fourth embodiment of the present invention is used for manufacturing the touch display device according to the third embodiment, and as shown in fig. 8, the method for manufacturing a touch display device according to the fourth embodiment includes the following steps:
s31, providing a second substrate 302, and forming a first conductive electrode 72 and a second conductive electrode 74 on one side of the second substrate 302.
Referring to fig. 6 and 9a, the first conductive electrode 72 and the second conductive electrode 74 are alternately and insulatively disposed, and each of the first conductive electrode 72 and the second conductive electrode 74 has a grid-like structure, and the second conductive electrode 74 includes a breaking portion for breaking the second conductive electrode 74. Specifically, when the first conductive electrode 72 and the second conductive electrode 74 are formed, the first conductive electrode 72 and the second conductive electrode 74 are formed by patterning by etching before forming a metal layer on the second substrate 302. In the process, the first conductive electrode 72 and the second conductive electrode 74 are formed by the same metal layer, and only one photomask is needed during etching, so that the manufacturing process is simplified, and the thickness of the touch display device is reduced.
In the present embodiment, as shown in fig. 7, the first conductive electrode 72 and the second conductive electrode 74 each form a grid-like structure having a plurality of diamond-shaped meshes.
In this embodiment, the first conductive electrode 72 includes a plurality of first sensing units 722 extending along a transverse direction, the second conductive electrode 74 includes a plurality of second sensing units 742 extending along a longitudinal direction, and a width L1 of the first sensing units 722 in the longitudinal direction is greater than a width L2 of the second sensing units 742 in the transverse direction, so that the impedance of the first conductive electrode 72 can be effectively reduced, and meanwhile, the signal-to-noise ratio can be reduced, and the touch sensitivity can be improved. Specifically, L1 can be 2250-4950 microns, L2 can be 1500-3750 microns, more specifically L1 can be 2976 microns, and L2 can be 2200 microns.
Specifically, the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742 is half of the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742. Since the grid density of the first conductive electrode 72 is greater in the non-overlapped region of the first sensing cell 722 and the second sensing cell 742, the impedance and capacitance of the first conductive electrode 72 can be reduced. More specifically, the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the overlapping region of the first sensing cell 722 and the second sensing cell 742 is twice the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the non-overlapping region of the second sensing cell 742. Specifically, in the present embodiment, the diagonal distance in the transverse direction of the diamond-shaped grids of the first conductive electrode 72 in the overlapping region of the first sensing cell 722 and the second sensing cell 742 is 606 micrometers, and the diagonal distance in the transverse direction of the diamond-shaped grids of the first conductive electrode 72 in the non-overlapping region of the second sensing cell 742 is 303 micrometers.
S33, forming a first insulating layer 82 on the first conductive electrode 72 and the second conductive electrode 74, and forming first vias 822 on two sides of the first insulating layer 82 corresponding to the dividing portions of the second conductive electrode 74. Specifically, as shown in fig. 9b, the first insulating layer 82 also covers the second substrate 302 not covered by the first conductive electrode 72 and the second conductive electrode 74, that is, the first insulating layer 82 is a whole surface. The first insulating layer 82 is a PV layer. The thickness of the PV layer is smaller than that of the OC layer, so that the thickness of the touch display device can be further reduced, and the PV layer has stronger adhesive force than that of the OC layer and is not easy to peel off.
S35, a connecting bridge 76 is formed on the first insulating layer 82 at a side away from the first conductive electrode 72 and the second conductive electrode 74. Specifically, as shown in fig. 9c, the connecting bridge 76 penetrates through the first via 822 of the first insulating layer 82 to be electrically connected to the second conductive electrodes 74 on two sides of the dividing position, and the projection of the connecting bridge 76 and the first conductive electrode 72 on the second substrate 302 intersects.
S37, a second insulating layer 84 is formed on the connecting bridge 76. Specifically, the first insulating layer 82 and the second insulating layer 84 are both entirely covered, that is, the first insulating layer 82 also covers the second substrate 302 not covered by the first conductive electrode 72 and the second conductive electrode 74, and the second insulating layer 84 also covers the first insulating layer 82. The first insulating layer 82 has first vias 822 formed on two sides of the dividing portion corresponding to the second conductive electrode 74, respectively, for the connecting bridge 76 to pass through. Since the same mask as that used for forming the first insulating layer 82 is used for forming the second insulating layer 84, the second via 842 is formed at a position of the second insulating layer 84 corresponding to the first via 822.
S38, a light shielding structure 304 and a color resist layer 306 are formed on the opposite side of the second substrate 302 from the first conductive electrode 72 and the second conductive electrode 74, thereby forming the substrate 30.
S39, the counter substrate 10 and the liquid crystal layer 50 are provided, and the liquid crystal layer 50 is provided between the substrate 30 and the counter substrate 10. The opposite substrate 10 and the liquid crystal layer 50 are the opposite substrate 10 and the liquid crystal layer 50 in the first embodiment, and the detailed structure thereof is not described herein.
Fifth embodiment
As shown in fig. 10, the touch display device of the fifth embodiment of the present invention has substantially the same structure as the touch display device of the first embodiment, except that in the fifth embodiment, the touch display device includes a first conductive electrode 72, a second conductive electrode 74, a connecting bridge 76, a third insulating layer 86, and a fourth insulating layer 88. The first conductive electrode 72 and the second conductive electrode 74 are both disposed on a side surface of the second substrate 302 away from the opposite substrate 10, the first conductive electrode 72 and the second conductive electrode 74 are arranged in a staggered and insulated manner, and are respectively in a grid-like structure, and the second conductive electrode 74 includes a breaking portion for breaking the second conductive electrode 74. The third insulating layer 86 is disposed on the second conductive electrode 74, the connecting bridge 76 is electrically connected to the second conductive electrode 74 at two sides of the dividing position, and the projection of the connecting bridge 76 and the first conductive electrode 72 on the second substrate 302 intersects. The third insulating layer 86 is sandwiched between the connecting bridge 76 and the first conductive electrode 72 to insulate the connecting bridge 76 from the first conductive electrode 72, and the third insulating layer 86 is disposed at an intersection region of the connecting bridge 76 and a projection of the second conductive electrode 74 on the second substrate 302. The fourth insulating layer 88 covers the connecting bridge 76. Specifically, in the present embodiment, the first conductive electrode 72 provides a touch driving signal to form a touch driving electrode, and the second conductive electrode 74 provides a touch sensing signal to form a touch sensing electrode.
In the present embodiment, as shown in fig. 11, the first conductive electrode 72 and the second conductive electrode 74 each form a grid-like structure having a plurality of rhombic cells.
In this embodiment, the first conductive electrode 72 includes a plurality of first sensing units 722 extending along a scan line direction (i.e., a transverse direction), the second conductive electrode 74 includes a plurality of second sensing units 742 extending along a data line direction (i.e., a longitudinal direction), and a width L1 of the first sensing units 722 in the data line direction is greater than a width L2 of the second sensing units 742 in the scan line direction, so that the impedance of the first conductive electrode 72 can be effectively reduced, the signal-to-noise ratio can be reduced, and the touch sensitivity can be improved. Specifically, L1 may be 3279 microns and L2 may be 2424 microns.
Specifically, the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742 is half of the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742. Since the grid density of the first conductive electrode 72 is greater in the non-overlapped region of the first sensing cell 722 and the second sensing cell 742, the impedance and capacitance of the first conductive electrode 72 can be reduced. More specifically, the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the overlapping region of the first sensing cell 722 and the second sensing cell 742 is twice the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the non-overlapping region of the second sensing cell 742. Specifically, in the present embodiment, the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the overlapping region of the first sensing cell 722 and the second sensing cell 742 is 606 micrometers, and the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the non-overlapping region of the second sensing cell 742 is 303 micrometers.
In this embodiment, the third insulating layer 86 and the fourth insulating layer 88 are both PV layers. The thickness of the PV layer is smaller than that of the OC layer, so that the thickness of the touch display device can be further reduced, and the PV layer has stronger adhesive force than that of the OC layer and is not easy to peel off. The fourth insulating layer 88 covers the connecting bridges 76 to protect the connecting bridges 76 from corrosion.
Sixth embodiment
A method for manufacturing a touch display device according to a sixth embodiment of the present invention is used for manufacturing the touch display device according to the fifth embodiment, and as shown in fig. 12, the method for manufacturing a touch display device according to the sixth embodiment includes the following steps:
s51, providing a second substrate 302, and forming a first conductive electrode 72 and a second conductive electrode 74 on one side of the second substrate 302.
Referring to fig. 10 and fig. 13a, the first conductive electrode 72 and the second conductive electrode 74 are alternately and insulatively disposed, and each of the first conductive electrode 72 and the second conductive electrode 74 has a grid-shaped structure, and the second conductive electrode 74 includes a breaking portion for breaking the second conductive electrode 74. Specifically, when the first conductive electrode 72 and the second conductive electrode 74 are formed, the first conductive electrode 72 and the second conductive electrode 74 are formed by patterning by etching before forming a metal layer on the second substrate 302. In the process, the first conductive electrode 72 and the second conductive electrode 74 are formed by the same metal layer, and only one photomask is needed during etching, so that the manufacturing process is simplified, and the thickness of the touch display device is reduced.
In the present embodiment, as shown in fig. 11, the first conductive electrode 72 and the second conductive electrode 74 each form a grid-like structure having a plurality of rhombic cells.
In this embodiment, the first conductive electrode 72 includes a plurality of first sensing units 722 extending along a scan line direction (i.e., a transverse direction), the second conductive electrode 74 includes a plurality of second sensing units 742 extending along a data line direction (i.e., a longitudinal direction), and a width L1 of the first sensing units 722 in the data line direction is greater than a width L2 of the second sensing units 742 in the scan line direction, so that the impedance of the first conductive electrode 72 can be effectively reduced, the signal-to-noise ratio can be reduced, and the touch sensitivity can be improved. Specifically, L1 may be 3279 microns and L2 may be 2424 microns.
Specifically, the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742 is half of the grid density of the first conductive electrodes 72 in the overlapping region of the first sensing cells 722 and the second sensing cells 742. Since the grid density of the first conductive electrode 72 is greater in the non-overlapped region of the first sensing cell 722 and the second sensing cell 742, the impedance and capacitance of the first conductive electrode 72 can be reduced. More specifically, the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the overlapping region of the first sensing cell 722 and the second sensing cell 742 is twice the diagonal distance in the scan line direction of the diamond-shaped meshes of the first conductive electrode 72 of the non-overlapping region of the second sensing cell 742. Specifically, in the present embodiment, the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the overlapping region of the first sensing cell 722 and the second sensing cell 742 is 606 micrometers, and the diagonal distance in the scan line direction of the diamond-shaped grid of the first conductive electrode 72 in the non-overlapping region of the second sensing cell 742 is 303 micrometers.
S53, a third insulating layer 86 is formed on the second conductive electrode 74, the third insulating layer 86 covering the first conductive electrode 72 and the break. Specifically, as shown in fig. 13b, the third insulating layer 86 forms an insulating island around the dividing point, and the third insulating layer 86 may also cover a portion of the second conductive electrode 74 near the dividing point.
S55, a connecting bridge 76 is formed on the third insulating layer 86 on a side away from the first conductive electrode 72 and the second conductive electrode 74. Specifically, as shown in fig. 13c, the connecting bridge 76 is electrically connected to the second conductive electrodes 74 on two sides of the dividing position, and the connecting bridge 76 intersects with the projection of the first conductive electrode 72 on the second substrate 302.
S57, a fourth insulating layer 88 is formed on the connecting bridge 76. Specifically, as shown in fig. 13d, the fourth insulating layer 88 covers the connecting bridge 76, the second conductive electrode 74 uncovered by the third insulating layer 86, and the second substrate 302.
S58, a light shielding structure 304 and a color resist layer 306 are formed on the opposite side of the second substrate 302 from the first conductive electrode 72 and the second conductive electrode 74, thereby forming the substrate 30.
S59, the counter substrate 10 and the liquid crystal layer 50 are provided, and the liquid crystal layer 50 is provided between the substrate 30 and the counter substrate 10. The opposite substrate 10 and the liquid crystal layer 50 are the opposite substrate 10 and the liquid crystal layer 50 in the first embodiment, and the detailed structure thereof is not described herein.
Seventh embodiment
The seventh embodiment of the present invention further provides a substrate 30, where the substrate 30 is the substrate 30 described in the first, third, and fifth embodiments, and the detailed structure thereof is not repeated herein.
In the drawings, the size and relative sizes of layers and regions may be exaggerated for clarity. It will be understood that when an element such as a layer, region or substrate is referred to as being "formed on," "disposed on" or "located on" another element, it can be directly on the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly formed on" or "directly disposed on" another element, there are no intervening elements present.
As described above, any person skilled in the art can easily conceive of changes or substitutions within the technical scope of the present disclosure, and all such changes or substitutions are included in the scope of the present disclosure. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (9)
1. A substrate, comprising a second substrate (302), wherein a first conductive electrode (72) and a second conductive electrode (74) are disposed on the other side surface of the second substrate (302), the first conductive electrode (72) and the second conductive electrode (74) are metal patterns, the first conductive electrode (72) and the second conductive electrode (74) are arranged in a staggered and insulated manner and are respectively in a grid-like structure, the second conductive electrode (74) includes a breaking point for breaking the second conductive electrode (74), a connecting bridge (76) is electrically connected to the second conductive electrode (74) at two sides of the breaking point, and the connecting bridge (76) intersects with the projection of the first conductive electrode (72) on the second substrate (302); the connecting bridge (76) is a transparent conductive film; the first conductive electrode (72) comprises a plurality of first sensing units (722) extending along the transverse direction, the second conductive electrode (74) comprises a plurality of second sensing units (742) extending along the longitudinal direction, the first sensing units (722) and the second sensing units (742) respectively comprise a plurality of rhombic grids, and the grid density of the first conductive electrode (72) in the overlapping area of the first sensing units (722) and the second sensing units (742) is half of the grid density of the first conductive electrode (72) in the overlapping area of the first sensing units (722) and the second sensing units (742).
2. The substrate of claim 1, further comprising a first insulating layer (82), wherein the first insulating layer (82) covers the first conductive electrode (72), the second conductive electrode (74) and the second substrate (302), the connecting bridge (76) is disposed on a side of the first insulating layer (82) away from the first conductive electrode (72) and the second conductive electrode (74), and the connecting bridge (76) penetrates through the first insulating layer (82) and is electrically connected to the second conductive electrode (74) on both sides of the dividing portion.
3. The substrate of claim 2, further comprising a second insulating layer (84), the second insulating layer (84) overlying the connecting bridge (76) and the first insulating layer (82).
4. The substrate of claim 1, further comprising a third insulating layer (86) and a fourth insulating layer (88), wherein the third insulating layer (86) is sandwiched between the connecting bridge (76) and the first conductive electrode (72) to insulate the connecting bridge (76) from the first conductive electrode (72), the third insulating layer (86) is disposed at an intersection region of projections of the connecting bridge (76) and the second conductive electrode (74) on the second substrate (302), the fourth insulating layer (88) covers the connecting bridge (76) and the second conductive electrode (74) not covered by the third insulating layer (86), and the second substrate (302).
5. The substrate according to any of claims 1-4, wherein the width (L1) of the first sensing cell (722) in the longitudinal direction is greater than the width (L2) of the second sensing cell (742) in the transverse direction.
6. Touch display device comprising a counter substrate (10), characterized in that it further comprises a substrate (30) according to any one of claims 1-5, said substrate (30) being arranged opposite to said counter substrate (10).
7. A method for manufacturing a touch display device comprises the following steps:
providing a second substrate (302), and forming a first conductive electrode (72) and a second conductive electrode (74) on one side of the second substrate (302), wherein the first conductive electrode (72) and the second conductive electrode (74) are metal patterns, the first conductive electrode (72) and the second conductive electrode (74) are arranged in a staggered and insulated mode and are respectively of a grid-shaped structure, and the second conductive electrode (74) comprises a breaking part for breaking the second conductive electrode (74); the first conductive electrode (72) comprises a plurality of first sensing units (722) extending along the transverse direction, the second conductive electrode (74) comprises a plurality of second sensing units (742) extending along the longitudinal direction, the first sensing units (722) and the second sensing units (742) respectively comprise a plurality of rhombic grids, and the grid density of the first conductive electrode (72) in the overlapping area of the first sensing units (722) and the second sensing units (742) is half of the grid density of the first conductive electrode (72) in the overlapping area of the first sensing units (722) and the second sensing units (742);
forming a first insulating layer (82) on the first conductive electrode (72) and the second conductive electrode (74), and respectively forming first via holes (822) on two sides of a cutting part of the first insulating layer (82) corresponding to the second conductive electrode (74), wherein the first insulating layer (82) also covers the second substrate (302) which is not covered by the first conductive electrode (72) and the second conductive electrode (74);
forming a connecting bridge (76) on one side of the first insulating layer (82) far away from the first conductive electrode (72) and the second conductive electrode (74), wherein the connecting bridge (76) penetrates through the first through hole (822) of the first insulating layer (82) to be electrically connected with the second conductive electrode (74) on two sides of the cutting position respectively, and the connecting bridge (76) is intersected with the projection of the first conductive electrode (72) on the second substrate (302); the connecting bridge (76) is a transparent conductive film;
forming a light shielding structure (304) and a color resist layer (306) on a side of the second substrate (302) opposite to the first conductive electrode (72) and the second conductive electrode (74) to form a substrate (30); and
an opposing substrate (10) and a liquid crystal layer (50) are provided, and the liquid crystal layer (50) is provided between the substrate (30) and the opposing substrate (10).
8. The method of claim 7, further comprising the steps of forming a connecting bridge (76) on a side of the first insulating layer (82) away from the first conductive electrode (72) and the second conductive electrode (74) and forming a light shielding structure (304) and a color resistance layer (306) on a side of the second substrate (302) opposite to the first conductive electrode (72) and the second conductive electrode (74) to form the substrate (30):
a second insulating layer (84) is formed on the connecting bridge (76), and the second insulating layer (84) covers the connecting bridge (76) and the first insulating layer (82).
9. A method for manufacturing a touch display device comprises the following steps:
providing a second substrate (302), and forming a first conductive electrode (72) and a second conductive electrode (74) on one side of the second substrate (302), wherein the first conductive electrode (72) and the second conductive electrode (74) are metal patterns, the first conductive electrode (72) and the second conductive electrode (74) are arranged in a staggered and insulated mode and are respectively of a grid-shaped structure, and the second conductive electrode (74) comprises a breaking part for breaking the second conductive electrode (74); the first conductive electrode (72) comprises a plurality of first sensing units (722) extending along the transverse direction, the second conductive electrode (74) comprises a plurality of second sensing units (742) extending along the longitudinal direction, the first sensing units (722) and the second sensing units (742) respectively comprise a plurality of rhombic grids, and the grid density of the first conductive electrode (72) in the overlapping area of the first sensing units (722) and the second sensing units (742) is half of the grid density of the first conductive electrode (72) in the overlapping area of the first sensing units (722) and the second sensing units (742);
forming a third insulating layer (86) on the second conductive electrode (74), the third insulating layer (86) covering the first conductive electrode (72) and the dividing portion passing through the dividing portion;
forming a connecting bridge (76) on one side of the third insulating layer (86) far away from the first conductive electrode (72) and the second conductive electrode (74), wherein the connecting bridge (76) is respectively electrically connected with the second conductive electrodes (74) on two sides of a cutting position, and the connecting bridge (76) is intersected with the projection of the first conductive electrode (72) on the second substrate (302); the connecting bridge (76) is a transparent conductive film;
forming a fourth insulating layer (88) on the connecting bridge (76), the fourth insulating layer (88) covering the connecting bridge (76) and covering the second conductive electrode (74) uncovered by the third insulating layer (86), and the second substrate (302);
forming a light shielding structure (304) and a color resist layer (306) on a side of the second substrate (302) opposite to the first conductive electrode (72) and the second conductive electrode (74) to form a substrate (30); and
an opposing substrate (10) and a liquid crystal layer (50) are provided, and the liquid crystal layer (50) is provided between the substrate (30) and the opposing substrate (10).
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| CN107122077B (en) * | 2017-05-02 | 2020-06-02 | 上海天马微电子有限公司 | Touch display device |
| CN107831943A (en) * | 2017-11-28 | 2018-03-23 | 武汉天马微电子有限公司 | A kind of touch-control display panel and display device |
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| CN102955639A (en) * | 2012-11-09 | 2013-03-06 | 北京京东方光电科技有限公司 | Plug-in touch module and touch display device |
| CN103901650A (en) * | 2012-12-25 | 2014-07-02 | 上海天马微电子有限公司 | Embedded type touch control display device |
| WO2015037399A1 (en) * | 2013-09-10 | 2015-03-19 | シャープ株式会社 | Touch panel and touch panel equipped display device |
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