CN109910487A - A kind of realization technique of high photolytic silver space pattern - Google Patents
A kind of realization technique of high photolytic silver space pattern Download PDFInfo
- Publication number
- CN109910487A CN109910487A CN201910096848.1A CN201910096848A CN109910487A CN 109910487 A CN109910487 A CN 109910487A CN 201910096848 A CN201910096848 A CN 201910096848A CN 109910487 A CN109910487 A CN 109910487A
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- China
- Prior art keywords
- moulded product
- back side
- transparent injected
- pattern
- injected
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Abstract
The invention discloses a kind of realization techniques of high photolytic silver space pattern, comprising the following steps: Step 1: selecting transparent injected-moulded product, the back side of transparent injected-moulded product is plane, and front is convex surface, and the mark pattern being recessed is marked out at the back side of transparent injected-moulded product；Step 2: being printed at the above-mentioned transparent injected-moulded product back side, the part overall printed in addition to indicating pattern；Step 3: the mark pattern to the above-mentioned transparent injected-moulded product back side carries out UV primary coat spraying；It aluminizes Step 4: carrying out vacuum electric to the above-mentioned transparent injected-moulded product back side；Step 5: apply on UV to the mark pattern at the above-mentioned transparent injected-moulded product back side.When a kind of realization technique of high photolytic silver space pattern of the present invention can be realized visual from front, mark pattern has solid, bright effect.
Description
Technical field
The present invention relates to a kind of realization techniques of high photolytic silver space pattern.
Background technique
With the development of the times, the type for indicating pattern is also more and more diversified, appearance sense organ of the people for product
Effect requirements are also higher and higher.There are two types of the main techniques for realizing mark pattern at present, and one is outer surfaces to print (such as Fig. 1),
Technique is: the printing of injection moulded products (not needing transparent material) → outer surface pattern → (this coating is according to client for spraying celluloid paint
It is required that can have or nothing).Feature: mark pattern is directly presented in product surface；Another kind is back up (such as Fig. 2), work
Skill is: the printing → spraying tinted paint of injection moulded products (must be transparent material) → rear surface pattern.Feature: mark pattern passes through saturating
Bright material, is presented on the surface.Since mark pattern directly prints out, and print usually plane or slight
Arc surface causes mark pattern to seem no three-dimensional sense, and the effect that the pattern printed does not highlight.
Summary of the invention
The purpose of the present invention is to provide a kind of realization techniques of high photolytic silver space pattern, can be enhanced by the technique
Indicate the stereoscopic effect of pattern.
To achieve the goals above, the technical scheme is to design a kind of realization works of high photolytic silver space pattern
Skill, comprising the following steps:
Step 1: selecting transparent injected-moulded product, the back side of transparent injected-moulded product is plane, and front is convex surface, in the back of transparent injected-moulded product
Face marks out the mark pattern being recessed；In the purpose of the mark pattern of transparent injected-moulded product back side marking recess: 1, can process
Modelling effect；2, facilitate printing.
Step 2: being printed at the above-mentioned transparent injected-moulded product back side, the part overall printed in addition to indicating pattern；
Step 3: the mark pattern to the above-mentioned transparent injected-moulded product back side carries out UV primary coat spraying；
It aluminizes Step 4: carrying out vacuum electric to the above-mentioned transparent injected-moulded product back side；
Step 5: apply on UV to the mark pattern at the above-mentioned transparent injected-moulded product back side.
Step 3: Step 4: step 5 is vacuum plating process, it is therefore an objective to make to indicate pattern with metal sense, visually more
It is bright.
The advantages and beneficial effects of the present invention are: a kind of realization technique of high photolytic silver space pattern of the present invention can be real
When now visual from front, mark pattern has solid, bright effect.
Detailed description of the invention
Fig. 1 is a kind of product front diagram of prior art manufacture.
Fig. 2 is diagram behind the product of another prior art manufacture.
Fig. 3 is diagram behind the product manufactured using present invention process.
Specific embodiment
With reference to the accompanying drawings and examples, further description of the specific embodiments of the present invention.Following embodiment is only
For clearly illustrating technical solution of the present invention, and not intended to limit the protection scope of the present invention.
Embodiment:
A kind of realization technique of high photolytic silver space pattern, comprising the following steps:
Step 1: selecting transparent injected-moulded product, the back side of transparent injected-moulded product is plane, and front is convex surface, in the back of transparent injected-moulded product
Face marks out the mark pattern being recessed；
Step 2: being printed at the above-mentioned transparent injected-moulded product back side, the part overall printed in addition to indicating pattern；
Step 3: the mark pattern to the above-mentioned transparent injected-moulded product back side carries out UV primary coat spraying；
It aluminizes Step 4: carrying out vacuum electric to the above-mentioned transparent injected-moulded product back side；
Step 5: apply on UV to the mark pattern at the above-mentioned transparent injected-moulded product back side.
If Fig. 1 is a kind of product front diagram that prior art manufactures, it can be seen that mark pattern is printed directly on note
On the convex surface of modeling product front, lack three-dimensional sense.
If Fig. 2 is diagram behind the product of another prior art manufacture, it can be seen that mark pattern is printed directly on
In injection moulded products backward plane, since injection moulded products use transparent material, when in terms of front, it can be seen that it is subsequent to be printed on injection moulded products
Indicate pattern.
If Fig. 3 is diagram behind the product manufactured using present invention process, since mark pattern is marked in transparent note
In modeling product backward plane, and pass through vacuum plating process, in terms of front when transparent injection moulded products, mark pattern has three-dimensional light
Visual effect.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, several improvements and modifications can also be made, these improvements and modifications
Also it should be regarded as protection scope of the present invention.
Claims (1)
1. a kind of realization technique of high photolytic silver space pattern, which comprises the following steps:
Step 1: selecting transparent injected-moulded product, the back side of transparent injected-moulded product is plane, and front is convex surface, in the back of transparent injected-moulded product
Face marks out the mark pattern being recessed；
Step 2: being printed at the above-mentioned transparent injected-moulded product back side, the part overall printed in addition to indicating pattern；
Step 3: the mark pattern to the above-mentioned transparent injected-moulded product back side carries out UV primary coat spraying；
It aluminizes Step 4: carrying out vacuum electric to the above-mentioned transparent injected-moulded product back side；
Step 5: apply on UV to the mark pattern at the above-mentioned transparent injected-moulded product back side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910096848.1A CN109910487A (en) | 2019-01-31 | 2019-01-31 | A kind of realization technique of high photolytic silver space pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910096848.1A CN109910487A (en) | 2019-01-31 | 2019-01-31 | A kind of realization technique of high photolytic silver space pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109910487A true CN109910487A (en) | 2019-06-21 |
Family
ID=66961160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910096848.1A Pending CN109910487A (en) | 2019-01-31 | 2019-01-31 | A kind of realization technique of high photolytic silver space pattern |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109910487A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101159107A (en) * | 2007-09-28 | 2008-04-09 | 余章军 | Sign plate manufacturing method |
| KR20110121413A (en) * | 2010-04-30 | 2011-11-07 | 김현수 | Method of forming dual pattern on plastic molding |
-
2019
- 2019-01-31 CN CN201910096848.1A patent/CN109910487A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101159107A (en) * | 2007-09-28 | 2008-04-09 | 余章军 | Sign plate manufacturing method |
| KR20110121413A (en) * | 2010-04-30 | 2011-11-07 | 김현수 | Method of forming dual pattern on plastic molding |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190621 |