CN109891001A - Component and its manufacturing method including nickel base single crystal substrate - Google Patents

Component and its manufacturing method including nickel base single crystal substrate Download PDF

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Publication number
CN109891001A
CN109891001A CN201780066439.6A CN201780066439A CN109891001A CN 109891001 A CN109891001 A CN 109891001A CN 201780066439 A CN201780066439 A CN 201780066439A CN 109891001 A CN109891001 A CN 109891001A
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layer
coating
type
platinum
silicon
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CN109891001B (en
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艾玛尔·撒伯恩德吉
维尔日妮·杰凯特
杰瑞米·雷姆
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Safran SA
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Safran SA
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
    • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00—Layers arrangement
    • B32B2250/04—4 layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2250/00—Layers arrangement
    • B32B2250/05—5 or more layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/06—Coating on the layer surface on metal layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/20—Inorganic coating
    • B32B2255/205—Metallic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/30—Properties of the layers or laminate having particular thermal properties
    • B32B2307/306—Resistant to heat
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Abstract

The present invention relates to a kind of methods for manufacturing the component (1) including nickel base single crystal substrate (2).The method is characterized in that the following steps are included: manufacture nickel base single crystal substrate (2)；Coating (3) are formed on the substrate (2), the coating includes the layer (30) of at least one first kind containing aluminium and platinum, at least one containing aluminium, silicon, platinum Second Type layer (31) and nickeliferous, aluminium, silicon and platinum third type layer (32), the outermost layer of the layer (32) of the third type in the coating (3) in stacking；And the alumina layer (4) of silicon doping is formed on the layer (32) of the third type.

Description

Component and its manufacturing method including nickel base single crystal substrate
Technical field
The invention belongs to nickel base single crystal fields.
More particularly, the present invention relate to manufacture the method for the component including nickel base single crystal substrate, and packet Include the component of nickel base single crystal substrate.
Background technique
Term " superalloy " refers to that (especially machinery is answered to oxidation, burn into creep and pulsating stress at high temperature and pressure Power or thermal stress) show the composite alloy of very good patience.The concrete application of these superalloy is manufacture aviation component, example Such as turbo blade.
Dawn known in the state of the art successively include: from inside to outside nickel base single crystal substrate, one or more bottom and The component of thermal insulation layer.
In fig. 1, it can be seen that the schematic cross section of the embodiment of this component.It successively includes: Ni-based list Brilliant superalloy substrate A；Bottom (sous-couche) B of alloy selected from NiAlPt, MCrAlY, wherein M is Co and/or Ni；Oxygen The layer C of compound (such as aluminium oxide)；And finally, thermal insulation layer D.
Caused by numerous studies are it has been shown that the phase counterdiffusion of chemical component and oxygen are spread between superalloy and its coating The oxidation of alumina layer crystal boundary can all have a negative impact to the service life of component.
When above-mentioned component be, for example, 800 DEG C to 1600 DEG C at a temperature of use turbo blade when, could be aware that, Due to substrate superalloy and cover it different layers between chemical component difference, so phase counterdiffusion is significant between them 's.For example, the titanium that the aluminium of bottom B can be diffused into substrate A or substrate can be diffused into bottom B.Expansion relevant to this phenomenon Scattered flux may generate different consequences.
Firstly, above-mentioned flux leads to the pre-mature exhaustion of alumina layer C, so as to cause the martensite transfor mation (β-NiAl of bottom B Phase transition is at γ '-Ni3Al phase).These transformations crack and cause falling off for oxide skin(coating).
Secondly, the diffusion of certain elements (such as titanium) or certain impurity (such as sulphur) will deteriorate oxide skin(coating) C in superalloy Adhesiveness between thermal insulation layer D.
On the other hand, phase counterdiffusion will lead to the formation of second order reaction area (SRZ), this will significantly reduce coated super conjunction The mechanical performance (creep, fatigue strength) of gold.
Finally, the hot gas (mainly oxygen) from combustion chamber diffuses through more when above-mentioned component is turbo blade Hole thermal insulation layer, until reaching alumina layer.This leads to the oxidation of the crystal boundary of alumina layer and the expansion of alumina layer.This differentiation Along with long compressive stress caused by being grown due to crystal boundary, so as to cause bottom B surface undulation (referred to as " fold ") and every The loss (falling off) of the adhesion strength of thermosphere D.What is interesting is notice bottom B be β-(Ni Pt) Al phase form in the case where, This phenomenon further increases, because there are significant differences between the ingredient of the superalloy of bottom B and substrate A.
It is known in the state of the art in order to limit the negative effect of phase counterdiffusion and extend the service life of coated superalloy Solution be that inserting thickness is several microns of diffusion barrier layer between superalloy substrate A and bottom B.
The diffusion barrier layer is for example constituted by aluminium oxide or by the compacted zone of rhenium-base alloy, and has found that substrate A's is super Slow diffusion of the certain elements (such as titanium or sulphur) in the diffusion barrier layer in alloy.
However, it is contemplated that the difference of the thermal expansion coefficient between diffusion barrier layer, bottom B and substrate A, the diffusion barrier layer Use reduce the thermal fatigue strength of component.In addition, the diffusion barrier layer is in diffusion barrier layer during mechanical fatigue stress Place exacerbates crack initiation.
Summary of the invention
Therefore, it is an object of the invention to propose for obtaining the nickel base single crystal for being covered with coating and alumina layer The technical solution of substrate, simultaneously:
In the case where the mechanical performance of superalloy will not be deteriorated, limit between superalloy substrate and the layer of the coating Phase interdiffusion phenomenon；
Limit the oxidation of the crystal boundary of alumina layer；
And extend the service life of whole system (coated substrate).
When alumina layer is further coated with thermal insulation layer, another object of the present invention is to improve alumina layer and heat-insulated Adhesiveness between layer.
For this purpose, the present invention relates to a kind of methods for manufacturing the component including nickel base single crystal substrate.
According to the present invention, method includes the following steps:
Manufacture nickel base single crystal substrate；
Coating is formed on the substrate, and the coating includes the layer of at least one first kind containing aluminium and platinum, at least The layer of the third type of the layer and nickeliferous, aluminium, silicon and platinum of one Second Type containing aluminium, silicon and platinum, the third type layer exist In the outermost of the coating of stacking；
The alumina layer of silicon doping is formed on the layer of the third type.
Due to these features of the invention, the feelings of the different layers of the coating in the mechanical performance that will not deteriorate these superalloy Under condition, the phase interdiffusion phenomenon between the superalloy of substrate and alumina layer is limited.
In addition, silicon is diffused into alumina layer, so that the alumina layer constitutes having to the oxygen from outside atmosphere Imitate diffusion barrier layer.
Finally, the service life of the component obtained by this method is extended.
Other advantageous and unrestricted features according to the present invention, these features can deposit for form that is independent or combining :
The coating includes the layer of at least three first kind；
The coating includes the layer of two Second Types；
The coating includes the layer of a series of first kind and/or the layer of a series of Second Type；
In the coating, the layer contacted with nickel base single crystal substrate is the layer of the first kind；
At least one of the layer of the layer of the first kind, the layer of Second Type and third type layer is formed by following:
By the nanocrystal layer of deposition of aluminum and then for the layer of the first kind, the nanocrystal of platinum is deposited Layer, or the nanocrystal layer by depositing platinum and then the nanocrystal layer of deposition of aluminum is formed,
For the layer of the Second Type, by with the nanocrystal layer of the nanocrystal layer of random order deposition of aluminum, platinum It is formed with the nanocrystal layer of silicon,
And the layer for the third type, by with the nanocrystal layer of random order deposition of aluminum, platinum it is nanocrystalline The nanocrystal layer of body layer, the nanocrystal layer of nickel and silicon is formed,
Also, the nanocrystal layer is set to be subjected to DIFFUSION TREATMENT, to form the coating；
The different layers of the coating are deposited by physical vapour deposition (PVD) or chemical vapor deposition；
By cathodic sputtering come the different layers of depositing coating；
This method includes the additional step that thermal insulation layer is deposited on the alumina layer of silicon doping.
The invention further relates to the components including nickel base single crystal substrate.
According to the present invention, which successively includes the coating for being covered with the alumina layer of silicon doping, institute on the substrate State the layer that coating includes at least one first kind containing aluminium and platinum, the layer of at least one Second Type containing aluminium, silicon and platinum with And the layer of the third type of nickeliferous, aluminium, silicon and platinum, the layer of the third type is in the outermost in the coating being laminated.
Advantageously, the alumina layer of the silicon doping is covered with thermal insulation layer.
Detailed description of the invention
According to the description carried out referring to attached drawing, it will be apparent from other features and advantages of the present invention, wherein appended attached drawing Several possible embodiments are shown in a manner of non-limitative illustration.
In the drawings:
Fig. 1 is according to the schematic sectional view of the component of the prior art, and wherein the component includes being covered with multiple coatings Nickel base single crystal substrate；And
Fig. 2 is the schematic sectional view for covering cated substrate according to one embodiment of the present invention,
Fig. 3 be according to the schematic sectional view of the cated substrate of covering of another embodiment of the present invention,
Fig. 4 is to deposit different layers according to specific embodiment to form the detailed schematic cross-sectional of the coating of substrate Figure；
Fig. 5 is the schematic sectional view of two embodiments of component according to the present invention.
Specific embodiment
The method that manufacture component according to the present invention will now be described.
First embodiment of the invention according to figure 5, the component end item that appended drawing reference 1 indicates are more including being covered with The substrate 2 of layer coating 3, the laminated coating 3 are covered with alumina layer 4 in itself.
Second embodiment of the present invention according to figure 5, alumina layer 4 are covered with thermal insulation layer 5.Component end item is by attached Icon remembers that 1' is indicated.
Substrate 2 is made of nickel base single crystal.
The substrate is for example obtained by casting or adding material manufacture and has required final shape, such as turbo blade Shape.
As just illustrative example, the superalloy for manufacturing substrate 2 is shown in the following table 1.These superalloy are by word Female A to F mark.Also other nickel base single crystals can be used.
Table 1
Illustrative nickel base single crystal
For each superalloy, term " surplus " corresponds to reaches 100% with mentioned various other components jointly Residual mass percentage.
As shown in Fig. 2, the coating 3 formed on a substrate 2 includes at least one 30 (referred to as " first kind of layer containing aluminium and platinum The layer of type "), the layer 32 of at least one layer 31 (referred to as " layer of Second Type ") and nickeliferous, aluminium, silicon and platinum containing aluminium, silicon and platinum (referred to as " layer of third type ").Outermost of the layer 32 of third type in the coating 3 in stacking.In other words, third type Layer 32 it is farthest apart from substrate 2.
Preferably, coating 3 includes the layer of at least three first kind.It is further preferred that coating 3 includes two Second Types Layer 31.Different layers 30 and 31 can alternately exist, but this is not enforceable.
Can also have the layer 30 of a series of first kind and/or the layer 31 of a series of Second Type.
Thus, for example, coating 3 includes three continuous first kind in the Fig. 3 for showing another embodiment variant The layer 30 of type, followed by the layer 31 of two continuous Second Types, are finally the layers 32 of third type.
Preferably, the layer contacted with substrate 2 is the layer 30 of the first kind.
Advantageously, the tripe systems stratification of coating 3 is prepared on same depositing device.They can pass through different physics gas Deposit (PVD) or chemical vapor deposition (CVD) technique mutually to deposit.
The embodiment of physical vapour deposition (PVD) includes: using electro beam physics vapour deposition (EBPVD), vapor deposition, pulse laser Ablation or sputtering (cathodic sputtering).Cathodic sputtering technology is preferred.It has the advantage that being capable of forming nanoscale or micron The dense film of grade thickness, and the dense film is better than than obtaining film to preceding layer with other deposition techniques the adhesiveness of preceding layer Adhesiveness.
The example of chemical vapor deposition (CVD) technology includes:
Plasma enhanced chemical vapor deposition (PECVD),
Low-pressure chemical vapor deposition (LPCVD),
Ultra-high vacuum CVD (UHVCVD),
Atom pressure chemical vapor deposition (APCVD), and
Atomic layer chemical vapor deposition (ALCVD).
It is to be noted, however, that platinum can only be deposited by PVD or electro-deposition.
According to first embodiment, at least one of layer 30,31,32 of coating 3 constitutes this layer not by being co-deposited It is formed with chemical element.
Therefore, which can for example be carried out by single alloys target, which includes that composition is described to be formed The various chemical elements of layer.For example, the alloys target comprising aluminium, platinum and silicon can be used in order to form the layer 31 of Second Type.
The co-deposition can also be carried out for example by several different targets, and every kind of target contains the chemical element for constituting layer to be formed One of.For example, can use four targets simultaneously in order to form the layer 32 of third type, i.e., use aluminium target, nickel simultaneously Target, silicon target and platinum (or chromium) target.
No matter what type of co-deposition is selected, which can obtain the layer 30,31 and 32 of alloy form (respectively The Al/Pt alloy of the layer 30 of the first kind, the Al/ of the layer 32 of the Al/Pt/SiS alloy and third type of the layer 31 of Second Type Pt/Si/Ni alloy).
According to second embodiment of the present invention as shown in Figure 4, it also may be formed the different layers of coating 3.
For the layer 30 of the first kind, the nanocrystal layer 301 of platinum is deposited, then the nanocrystal layer 302 of deposition of aluminum, or Then the nanocrystal layer 301 of deposition of aluminum deposits the nanocrystal layer 302 of platinum.
For the layer 31 of Second Type, with the nanocrystal layer 302 of random order deposition of aluminum, the nanocrystal layer 301 of platinum With the nanocrystal layer 310 of silicon.
Finally, for the layer 32 of third type, with the nanocrystal layer 302 of random order deposition of aluminum, the nanocrystal of platinum The nanocrystal layer 320 of layer 301, the nanocrystal layer 303 of nickel and silicon.
Term " nanocrystal " refers to less than 1 micron of the size (1 μm) for constituting the crystal (crystal grain) of these polycrystalline material layers.
Advantageously, two silicon layers 310,320 have the thickness less than 100nm.Preferably, nickel layer 303, which has, is less than 100nm Thickness.
Additionally advantageously, platinum layer 301 and/or aluminium layer 302 have the thickness less than 1 micron (1 μm).
Once the different layers of coating 3 have been formed, expanded by being heated to the temperature preferably between 200 DEG C to 1200 DEG C Dissipate processing.
It should be noted that the layer 30,31,32 of acquisition remains as nanocrystal after DIFFUSION TREATMENT.
Then alumina layer 4 is formed on the layer 32 of third type.Thus, it is preferable that make the substrate 2 for being covered with coating 3 In oxygen partial pressure or under the partial pressure of oxygen and argon gas, through heat-treated.
Advantageously, which includes: to elevate the temperature until reach 900 DEG C to 1200 DEG C of temperature the step of；At this At a temperature of the step of remaining less than 1 hour；And it is cooling until the step of reaching room temperature.
Finally, depositing thermal insulation layer 5 on alumina layer 4 when needing substrate 1'.
The thermal insulation layer is the zirconium oxide layer of yttrium, such as at least one yttrium zirconium oxide layer (containing yttrium) and extremely The alternating of a few ceramic layer.
Preferably, the thermal insulation layer 5 is deposited by electro beam physics vapour deposition (EBPVD).
The effect of different layers is as follows.
Platinum layer 301 and aluminium layer 302 are nanocrystal, and which increase the total surface areas of crystal boundary, form good diffusion resistance Barrier, with the phase counterdiffusion between the superalloy of restricting substrate 2 and its coating 3.In addition, the crystal boundary of platinum layer and aluminium layer also limits The corrosion and oxidation of substrate 2.
By coating 3 have the advantages that the fact that extremely multiple layers bring it is another be number of interfaces multiplication.These interfaces are resistances The potential approach of oxygen and other metals is kept off, therefore they limit the phase interdiffusion phenomenon between substrate 2 and alumina layer 4.Cause This, laminated coating 3 improves whole part 1 or the elasticity of 1'.
Another advantage of laminated coating 3 is its abrasion mechanism., there is compression in each interface between two pantostrats Stress and tensile stress.Accordingly, it is possible to which the crackle occurred is preferentially propagated along interface rather than vertical Es-region propagations.Due to number of interfaces It is numerous, to extend component 1 or the service life of 1'.
Finally, the multiplication of the layer of coating 3 allows to combine different types of coating material and certain layers in coating 3 In there is defect and/or crackle in the case where, increase coating 3 whole impenetrability.
In addition, each layer 31,32 containing silicon all have the function of it is very special.
The crystal boundary that some silicon in the layer 32 of third type diffuse to adjacent alumina layer 4 neutralizes another layer of its adjoining In (that is, being aluminium layer 302 or platinum layer 301 according to sedimentary sequence).
Under turbo blade operating condition, i.e., within the temperature range of 800 DEG C to 1600 DEG C, silicon in aluminium oxide crystal boundary with The hot gas (such as oxygen and/or nitrogen) generated in aircraft combustion chamber is reacted to form Si oxide (SiO2) and/or silicon nitrogen Compound (Si3N4)。
The Si oxide and nitride constitute the very effective diffusion resistance for oxygen since diffusion coefficient is relatively low Barrier.
By being diffused into the crystal boundary of alumina layer 4, silicon has slowed down the oxidation of alumina layer, extends its service life, and therefore Extend the service life of whole part 1,1'.
In addition, the silicon in the layer 31 of Second Type is used as in the case where the silicon of the layer 32 of third type is totally consumed The reservoir of silicon in the layer 32 of third type.When there are multiple layers 31, silicon effect having the same therein.

Claims (11)

1. method of the one kind for manufacturing the component (1) including nickel base single crystal substrate (2), which is characterized in that the side Method the following steps are included:
It manufactures nickel base single crystal substrate (2)；
It is formed on the substrate (2) coating (3), the coating (3) includes the layer of at least one first kind containing aluminium and platinum (30), the layer of the third type of the layer (31) and nickeliferous, aluminium, silicon and platinum of at least one Second Type containing aluminium, silicon and platinum (32), outermost of the layer (32) of the third type in the coating (3) in stacking；
The alumina layer (4) of silicon doping is formed on the layer (32) of the third type.
2. the method according to claim 1, wherein the coating (3) includes the layer of at least three first kind (30)。
3. method according to claim 1 or 2, which is characterized in that the coating (3) includes the layer of two Second Types (31)。
4. method according to any of the preceding claims, which is characterized in that the coating (3) includes a series of The layer (30) of one type and/or the layer (31) of a series of Second Type.
5. method according to any of the preceding claims, which is characterized in that in the coating (3), with Ni-based list The layer of brilliant superalloy substrate (2) contact is the layer (30) of the first kind.
6. method according to any of the preceding claims, which is characterized in that the layer (30) of the first kind, described At least one of the layer (31) of Second Type and the layer (32) of the third type layer are formed by following:
For the layer (30) of the first kind, the nanocrystal of platinum is then deposited by the nanocrystal layer (302) of deposition of aluminum Layer (301), or formed by the nanocrystal layer (302) of the nanocrystal layer (301) and then deposition of aluminum that deposit platinum,
For the layer (31) of the Second Type, by nanocrystal layer (302) with random order deposition of aluminum, platinum it is nanocrystalline The nanocrystal layer (310) of body layer (301) and silicon is formed,
And the layer (32) for the third type, pass through nanocrystal layer (302) with random order deposition of aluminum, platinum The nanocrystal layer (320) of nanocrystal layer (301), the nanocrystal layer (303) of nickel and silicon is formed,
And it is characterized in that, the nanocrystal layer (301,302,303,310,320) is made to be subjected to DIFFUSION TREATMENT, described in being formed Coating (3).
7. method according to any of the preceding claims, which is characterized in that pass through physical vapour deposition (PVD) or chemical gas It mutually deposits to carry out the deposition of the different layers of the coating (3).
8. the method according to the description of claim 7 is characterized in that carrying out each of the coating (3) by cathodic sputtering The deposition of layer.
9. method according to any of the preceding claims, which is characterized in that the described method includes: being adulterated in the silicon Alumina layer (4) on deposit thermal insulation layer (5) additional step.
10. the component (1) that one kind includes nickel base single crystal substrate (2), which is characterized in that the component (1) is in the base It successively include the coating (3) for being covered with the alumina layer (4) of silicon doping on plate (2), the coating (3) includes at least one containing aluminium With the layer (30) of the first kind of platinum, the layer (31) and nickeliferous, aluminium, silicon and platinum of at least one Second Type containing aluminium, silicon and platinum Third type layer (32), the third type layer (32) in stacking coating (3) outermost.
11. component according to claim 10, which is characterized in that the alumina layer (4) of the silicon doping is covered with heat-insulated Layer (5).
CN201780066439.6A 2016-10-27 2017-10-19 Component comprising a nickel-based single crystal superalloy substrate and method of making the same Active CN109891001B (en)

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FR1660417 2016-10-27
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EP3532653B1 (en) 2023-03-15
JP7057778B2 (en) 2022-04-20
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CN109891001B (en) 2021-01-05
FR3058164B1 (en) 2020-02-07

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