CN109852254A - For moisture-free basis shear thickening-chemical cooperated polishing fluid of crystals for ultra-precision processing can be deliquesced - Google Patents
For moisture-free basis shear thickening-chemical cooperated polishing fluid of crystals for ultra-precision processing can be deliquesced Download PDFInfo
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- CN109852254A CN109852254A CN201910231949.5A CN201910231949A CN109852254A CN 109852254 A CN109852254 A CN 109852254A CN 201910231949 A CN201910231949 A CN 201910231949A CN 109852254 A CN109852254 A CN 109852254A
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Abstract
A kind of moisture-free basis shear thickening-chemical cooperated polishing fluid processed for that can deliquesce crystals for ultra-precision, ingredient are as follows: silica/alumina mixes abrasive grain 10wt.%-20wt.%, organic substance 40wt.%-50wt.%, shear thickening reinforced phase 20wt.%-25wt.%, green active plant enzyme 5wt.%-25wt.%.The present invention is provided to which moisture-free basis Compostie abrasive particles shear thickening-chemical cooperated polishing fluid of crystals for ultra-precision processing can be deliquesced, material removal efficiency, processing quality are improved.
Description
Technical field
The present invention relates to a kind of moisture-free basis shear thickening-chemical cooperated polishing fluids, are processed for that can deliquesce crystal.
Background technique
Common deliquesces optical crystal, such as KDP (potassium dihydrogen phosphate, KH2PO4) crystal, DKDP (potassium dideuterium phosphate,
KD2PO4) etc..It deliquesces and refers to that crystalline solid can spontaneously absorb the water in air and form the aqueous solution of saturation in the surface of solids
Or hydrate, belong to physical change process.
With the generation and development of laser technology, can deliquesce optical crystal material played in every field it is more and more important
Effect.This crystalloid have biggish nonlinear optical electrostrictive coefficient, high laser damage threshold, low optical absorption coefficient etc.,
For optical field, such as laser frequency, electro-optical modulation and various light reactions switch；Especially led in the research of laser fusion
Domain has played particularly important effect, and the massive optics used such as the U.S. " national igniter (NIF) " is up to more than 7000
It is a, wherein the element for needing to use KDP crystal just has 576.In addition, French " megajoule laser (LMJ) " is directly by KDP crystal
Precision Machining is included in the first place that must solve key problem.But this crystalloid belongs to soft brittle crystal mostly, and easily deliquesces,
Surface is easy to produce crackle when heated, and fusing point is low, thus Ultra-precision Turning is extremely difficult.
Authorized Chinese invention patent (ZL201210192915.8), patent name: one kind is based on non-Newtonian shear
The ultraprecise curved surface polishing method of thickening effect, disclose a kind of water mixed with polyhydroxy aldehyde high polymer composition containing water base shearing increasing
Thick polishing fluid, polyhydroxy aldehyde high polymer is as dispersed phase.When machining area reaches certain shear, can be sent out containing water base polishing fluid
Raw shear thickening phenomenon, viscosity increased dramatically, and increase and form " fixation flexible to the holding power containing abrasive grain in water base polishing fluid
Mold " processes workpiece surface.A kind of efficient ultraprecise shearing of patent of invention (CN201810095554.2) has been authorized to increase
Thick-chemical cooperated polishing method also with water as polishing base fluid, and adds shear thickening reinforced phase and greenization thereto
Environmentally friendly substance is learned, while realizing shear thickening effect, generates chemical reaction to realize that high efficiency polishes.Both the above adds
Polishing fluid involved in work method contains water constituent, and which limits its ranges of work, and crystal can be deliquesced by not being suitable for processing,
Such as KDP, DKDP crystal.
It has authorized patent of invention (ZL201410436510.3), patent name: based on non-Newtonian shear thickening and electricity
The ultraprecise processing method for solving complex effect, disclose it is a kind of can occur shear thickening effect and electrolytic effect simultaneously contain water base throwing
Light liquid, equally contains water constituent, can not be used to process that crystal can be deliquesced, and the polishing fluid requires processing object that must have conduction
Performance limits its range of work, this substance of crystal can be deliquesced by causing it that can not process.In addition, electrolytic polishing liquid has largely
It is unfavorable for the substance of environmental protection, there is certain influence on environment.
It has authorized patent of invention (CN102660198.A), patent name: a kind of soft crisp deliquescent crystal chemical machinery nothing
Water non-abrasive polishing solution discloses a kind of anhydrous non-abrasive polishing solution, is mainly used for chemically-mechanicapolish polishing.Due to containing in polishing fluid
A large amount of chemical components, such as organic corrosive agent, organic corrosion inhibitor, are processed by chemical action completely, this can be to ring
Border generates serious pollution, does not meet the theory of green processing；In addition, the anhydrous non-abrasive polishing solution is free of abrasive grain, material removal
Low efficiency, processing efficiency, processing quality need to be further increased.
Summary of the invention
The material removal efficiency for having anhydrous non-abrasive polishing solution is low, the lower deficiency of processing quality in order to overcome, this hair
The bright moisture-free basis Compostie abrasive particles shear thickening-chemical cooperated polishing fluid provided for that can deliquesce crystals for ultra-precision processing, improves
Material removal efficiency, workpiece processing quality.
The technical solution adopted by the present invention to solve the technical problems is:
A kind of moisture-free basis shear thickening-chemical cooperated polishing fluid processed for that can deliquesce crystals for ultra-precision, ingredient are as follows:
Silica/alumina mixes abrasive grain 10wt.%-20wt.%, organic substance 40wt.%-50wt.%, shear thickening reinforced phase
20wt.%-25wt.%, green active plant enzyme 5wt.%-25wt.%.
Further, in the silica/alumina mixing abrasive grain, silica, aluminium oxide are mixed in molar ratio for 3:1
Mix abrasive grain.
Further, the organic substance selects esters solvent polymethacrylates.
It preferably, is liquid under the polymethacrylates room temperature, colourless nontoxic, chemical property is stable and viscosity and water
It is close, it is 0.002Pas, is also easy to produce shear thickening effect.
Further, the shear thickening reinforced phase selects alkyl quaternary ammonium salts.
In the present invention, using the anhydrous polishing fluid with the chemical cooperated effect of shear thickening-, polymethylacrylic acid is utilized
The low viscosity of ester, not volatile and chemical inertness itself are not easy to deliquesce the features such as crystal generation is reacted, generation with what is processed
Polishing fluid dispersed phase is used as deionized water (or pure water or aqueous solution etc.).
Silica/alumina mixes abrasive grain, and 3:1 is mixed in molar ratio；Utilize silicon oxide particle good dispersion, chemistry
The features such as property is more active can produce the chemical cooperated effect of good shear thickening-and carry out material to worked crystal surface
It removes；Larger using alumina abrasive grain hardness, the stronger feature of grinding force can carry out micro mechanics effect to worked crystal surface.
Select alkyl quaternary ammonium salts as Chemical enhancement phase, main function is can be with during shear thickening polishing
Worked crystal surface generates microchemical reaction, effectively improves material removing rate and processing efficiency, reduces workpiece surface damage.
Green active plant enzyme is added in polishing fluid, its role is to the macros to alkyl quaternary ammonium salts and plane of crystal
The pH value reacted inducing action, maintained polishing fluid.
Beneficial effects of the present invention are mainly manifested in: for that can deliquesce crystal physical characteristic soluble easily in water, polished
In journey using organic substance polymethacrylates as polishing fluid dispersed phase replace the conduct such as water, deionized water, aqueous solution into
Row processing, good physical characteristic, such as colourless nontoxic, chemical property are stablized, and viscosity and water approach and has chemistry
Inertia is not easy to chemically react with inorganic salts.These properties make polymethacrylates completely and can replace water participation shearing
The processing of polishing is thickened, and generates good shear thickening effect.It is brilliant with processing using alkyl quaternary ammonium salts as Chemical enhancement phase
Body is produced as faint chemical reaction, forms one layer of chemical reaction thin layer, and surface hardness decline is reached a kind of and assisted with chemical action
With the effect of shear thickening polishing, workpiece surface or sub-surface damage are effectively reduced.Using green active biological enzyme as induction
Activating agent meets the theory of green processing.This polishing fluid configuration method is simple, and the processable overwhelming majority can deliquesce crystal, nothing
Poison is pollution-free, and stability is good, and polishing efficiency is high, easy to maintain, improves workpiece processing quality.
Specific embodiment
The invention will be further described below.
A kind of moisture-free basis shear thickening-chemical cooperated polishing fluid processed for that can deliquesce crystals for ultra-precision, ingredient are as follows:
Silica/alumina mixes abrasive grain 10wt.%-20wt.%, organic substance 40wt.%-50wt.%, shear thickening reinforced phase
20wt.%-25wt.%, green active plant enzyme 5wt.%-25wt.%.
Further, in the silica/alumina mixing abrasive grain, silica, aluminium oxide are mixed in molar ratio for 3:1
Mix abrasive grain.
Further, the organic substance selects esters solvent polymethacrylates.
It preferably, is liquid under the polymethacrylates room temperature, colourless nontoxic, chemical property is stable and viscosity and water
It is close, it is 0.002Pas, is also easy to produce shear thickening effect.
Further, the shear thickening reinforced phase selects alkyl quaternary ammonium salts.
In the present embodiment, the ingredient that polishing fluid can choose is as follows:
Silica/alumina mixes abrasive grain 10wt.%, organic substance 40wt.%, shear thickening reinforced phase 25wt.%, green
Color active plant enzyme 25wt.%；
Either: silica/alumina mixes abrasive grain 15wt.%, organic substance 45wt.%, shear thickening reinforced phase
20wt.%, green active plant enzyme 20wt.%；
Again either: silica/alumina mixes abrasive grain 20wt.%, organic substance 50wt.%, shear thickening reinforced phase
25wt.%, green active plant enzyme 5wt.%；
Or be: silica/alumina mixes abrasive grain 20wt.%, organic substance 50wt.%, shear thickening reinforced phase
20wt.%, green active plant enzyme 10wt.%；
Again or be: silica/alumina mixes abrasive grain 16wt.%, organic substance 48wt.%, shear thickening enhancing
Phase 22wt.%, green active plant enzyme 14wt.%.
The moisture-free basis shear thickening for deliquescing crystal-chemical cooperated polishing fluid preparation method of the present embodiment, including with
Lower step:
1) abrasive grain 10wt.%-20wt.% is mixed according to silica/alumina, organic substance 40wt.%-50wt.%, cut
Thickening reinforced phase 20wt.%-25wt.%, green active plant enzyme 5wt.%-25wt.% are cut, each substance is weighed, it is spare；
2) it takes organic substance (polymethacrylates) to be placed in a sealing container tank, is heated to 25 DEG C -30 DEG C slightly simultaneously
It keeps temperature constant, shear thickening reinforced phase (alkyl quaternary ammonium salts) and green active biological enzyme is added thereto in TM-2 type mixing
It is taken out after mixing 18~36h in machine；
3) take silica/alumina mixing abrasive grain with above-mentioned after 2) liquid mixes, through ultrasonic wave dispersion 0.3h~1.0h system
At.
Example 1: polishing fluid made of in aforementioned manners processes KDP crystal, and under the conditions of pressure is 90kPa, polishing disk turns
Speed is set as 40-50r/min, processes 1h, and obtained KDP plane of crystal roughness is 1.21nm, surface no marking.Increase in shearing
Thick polishing while the following chemical reaction of generation:
CH3-(CH2)10-CH2-NH2+KH2PO4→CH3-(CH2)10-CH2-NH3++KHPO4 -
The reaction belongs to acid-base neutralization reaction, and since alkyl quaternary ammonium salts belongs to basic salt, KDP crystal belongs to ackd salt, C-N
Between chemical bond and O-H between chemical bond occur cleavage reaction generate free state NH3+Ion and KHPO4 -Ion, can be
It is removed in filter device.It, can be by controlling its mass fraction in polishing fluid between since quaternary ammonium alkyl saline alkali is weaker
It connects and chemical reaction is controlled, achieve the effect that auxiliary polishing without injured surface, to realize ultraprecise, high efficiency, height
Quality polish.
Example 2: polishing fluid made of in aforementioned manners processes DKDP crystal, and under the conditions of pressure is 90kpa, polishing disk turns
Speed is set as 30-40r/min, processes 1h, and obtained DKDP plane of crystal roughness is 1.12nm, surface no marking.It is shearing
Thickening polishing while the similar chemical reaction of generation:
CH3-(CH2)10-CH2-NH2+KD2PO4→CH3-(CH2)10-CH2-NH3 ++KDPO4 -
The reaction belongs to acid-base neutralization reaction, and since alkyl quaternary ammonium salts belongs to basic salt, DKDP crystal belongs to ackd salt, C-
The NH that cleavage reaction generates free state occurs for the chemical bond between the chemical bond and O-H between N3 +Ion and KHPO4 -Ion, can
It is removed in filter device.Since quaternary ammonium alkyl saline alkali is weaker, can by control its mass fraction in polishing fluid to
Chemical reaction is controlled indirectly, achieve the effect that auxiliary polishing without injured surface, thus realize ultraprecise, high efficiency,
High quality polished.
Claims (5)
1. a kind of for moisture-free basis shear thickening-chemical cooperated polishing fluid of crystals for ultra-precision processing can be deliquesced, which is characterized in that
The ingredient of the polishing fluid is as follows: silica/alumina mixes abrasive grain 10wt.%-20wt.%, organic substance 40wt.%-
50wt.%, shear thickening reinforced phase 20wt.%-25wt.%, green active plant enzyme 5wt.%-25wt.%.
2. as described in claim 1 for moisture-free basis shear thickening-chemical cooperated polishing of crystals for ultra-precision processing can be deliquesced
Liquid, which is characterized in that in the silica/alumina mixing abrasive grain, silica, aluminium oxide are mixed in molar ratio for 3:1
Mix abrasive grain.
3. as claimed in claim 1 or 2 for moisture-free basis shear thickening-chemical cooperated throwing of crystals for ultra-precision processing can be deliquesced
Light liquid, which is characterized in that the organic substance selects esters solvent polymethacrylates.
4. as claimed in claim 3 for moisture-free basis shear thickening-chemical cooperated polishing of crystals for ultra-precision processing can be deliquesced
Liquid, which is characterized in that be liquid under the polymethacrylates room temperature, colourless nontoxic, chemical property is stable and viscosity and water
It is close, it is 0.002Pas, is also easy to produce shear thickening effect.
5. as claimed in claim 1 or 2 for moisture-free basis shear thickening-chemical cooperated throwing of crystals for ultra-precision processing can be deliquesced
Light liquid, which is characterized in that the shear thickening reinforced phase selects alkyl quaternary ammonium salts.
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| CN2019100777516 | 2019-01-28 | ||
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112139859A (en) * | 2020-09-21 | 2020-12-29 | 大连理工大学 | Method for anhydrous polishing of KDP crystal |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1858134A (en) * | 2006-05-31 | 2006-11-08 | 河北工业大学 | Chemical and mechanical water-free polishing liquid for lithium-cessium borate crystal and leveling method |
| CN102660198A (en) * | 2012-04-11 | 2012-09-12 | 南京航空航天大学 | Waterless abrasive-free polishing solution for chemical-mechanical polishing of flexible, crisp and deliquescent crystals |
| WO2013016779A1 (en) * | 2011-08-03 | 2013-02-07 | The University Of Sydney | Methods, systems and compositions for polishing |
| CN102717325B (en) * | 2012-06-08 | 2014-06-11 | 浙江工业大学 | Ultra-precise curved surface finishing method based on non-Newtonian fluid shear thickening effect |
| CN108555698A (en) * | 2018-01-31 | 2018-09-21 | 湖南科技大学 | A kind of efficient ultraprecise shear thickening-chemical cooperated polishing method |
-
2019
- 2019-03-26 CN CN201910231949.5A patent/CN109852254A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1858134A (en) * | 2006-05-31 | 2006-11-08 | 河北工业大学 | Chemical and mechanical water-free polishing liquid for lithium-cessium borate crystal and leveling method |
| WO2013016779A1 (en) * | 2011-08-03 | 2013-02-07 | The University Of Sydney | Methods, systems and compositions for polishing |
| CN102660198A (en) * | 2012-04-11 | 2012-09-12 | 南京航空航天大学 | Waterless abrasive-free polishing solution for chemical-mechanical polishing of flexible, crisp and deliquescent crystals |
| CN102717325B (en) * | 2012-06-08 | 2014-06-11 | 浙江工业大学 | Ultra-precise curved surface finishing method based on non-Newtonian fluid shear thickening effect |
| CN108555698A (en) * | 2018-01-31 | 2018-09-21 | 湖南科技大学 | A kind of efficient ultraprecise shear thickening-chemical cooperated polishing method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112139859A (en) * | 2020-09-21 | 2020-12-29 | 大连理工大学 | Method for anhydrous polishing of KDP crystal |
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