CN109850848A - The method of hydrogen fluoride is removed in hydrogen chloride gas - Google Patents
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- CN109850848A CN109850848A CN201910271649.XA CN201910271649A CN109850848A CN 109850848 A CN109850848 A CN 109850848A CN 201910271649 A CN201910271649 A CN 201910271649A CN 109850848 A CN109850848 A CN 109850848A
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- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 title claims abstract description 64
- 239000007789 gas Substances 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims abstract description 45
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 229910000040 hydrogen fluoride Inorganic materials 0.000 title claims abstract description 39
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 title claims abstract description 20
- 229910000041 hydrogen chloride Inorganic materials 0.000 title claims abstract description 20
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims abstract description 54
- 238000006243 chemical reaction Methods 0.000 claims abstract description 24
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 22
- 239000011737 fluorine Substances 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000006227 byproduct Substances 0.000 claims abstract description 8
- 239000006096 absorbing agent Substances 0.000 claims abstract description 7
- 239000011552 falling film Substances 0.000 claims abstract description 7
- 239000012530 fluid Substances 0.000 claims abstract description 6
- 239000007921 spray Substances 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 239000007791 liquid phase Substances 0.000 claims abstract description 5
- 239000002994 raw material Substances 0.000 claims abstract description 5
- 230000006837 decompression Effects 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 21
- 238000010992 reflux Methods 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000012071 phase Substances 0.000 claims description 5
- 229910052681 coesite Inorganic materials 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 4
- 229910052906 cristobalite Inorganic materials 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 229910052682 stishovite Inorganic materials 0.000 claims description 4
- 229910052905 tridymite Inorganic materials 0.000 claims description 4
- 239000000376 reactant Substances 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000006115 defluorination reaction Methods 0.000 abstract description 2
- 238000000746 purification Methods 0.000 abstract description 2
- RWRIWBAIICGTTQ-UHFFFAOYSA-N difluoromethane Chemical compound FCF RWRIWBAIICGTTQ-UHFFFAOYSA-N 0.000 description 20
- 230000008569 process Effects 0.000 description 16
- -1 silane compound Chemical class 0.000 description 7
- 239000003507 refrigerant Substances 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 5
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical group FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 4
- 238000005660 chlorination reaction Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 2
- GDXWHFPKFUYWBE-UHFFFAOYSA-N [F].Cl Chemical compound [F].Cl GDXWHFPKFUYWBE-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000001110 calcium chloride Substances 0.000 description 2
- 229910001628 calcium chloride Inorganic materials 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical class [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- NPNPZTNLOVBDOC-UHFFFAOYSA-N 1,1-difluoroethane Chemical group CC(F)F NPNPZTNLOVBDOC-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- POFAUXBEMGMSAV-UHFFFAOYSA-N [Si].[Cl] Chemical compound [Si].[Cl] POFAUXBEMGMSAV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000012824 chemical production Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Abstract
The invention belongs to chemical technology fields.The technical problem to be solved by the present invention is existing defluorination method, unavoidably brings the chemical substances such as some organic matters or inorganic matter into, hydrochloric acid quality after purification is influenced.The technical scheme is that, the method of hydrogen fluoride is removed in hydrogen chloride gas, the following steps are included: raw material methylene chloride and anhydrous hydrogen fluoride are after metering, methylene chloride is via metering pump sleeve pipe 1#, and anhydrous hydrogen fluoride is via another metering pump sleeve pipe 2#；After heating muff 1# and casing 2#, methylene chloride and anhydrous hydrogen fluoride, which are mixed into multiple reaction kettles, carries out gas-liquid phase reaction, it is entered in fluorine remover by decompression, and add circulation fluid spray, it is entered in falling-film absorber from the gas come out in fluorine remover, two-stage tandem is carried out with water and absorbs HCL gas, obtains byproduct hydrochloric acid.The beneficial effects of the invention are as follows hydrochloric acid fluorinated volume can be greatly reduced.
Description
Technical field
The present invention relates to chemical technology field, a kind of specifically relate to remove hydrogen fluoride in hydrogen chloride gas method.
Background technique
Difluoromethane (CH2F2) be a kind of function admirable nonpolluting cold-producing medium, at normal temperature for it is colourless, without odour,
When pressurization is compressed into liquid, and colorless and transparent state, it is nontoxic, flammable, it is soluble in oil, is insoluble in water.
Difluoromethane is mainly used for substituting HCFC-22 refrigerant and low-temperature refrigerant R-502, or respectively with HFC-
134a, HFC-152a form mix refrigerant.High-purity difluoromethane also serves as the dry etching agent in electronics industry.
As the substitute of HCFC-22, compound in low-temperature mixed refrigerant.It is completely suitable for normalized compression
Machine, and thermodynamic property ratio HCFC-22 15% are the important refrigerants for substituting HCFC-22.It is also to prepare hybrid refrigeration work
One of important source material of matter.
Difluoromethane (CH at present2F2) preparation mainly pass through raw material methylene chloride (CH2Cl2) and anhydrous hydrogen fluoride
(AHF) after metering, respectively by metering pump (CH2Cl2Need to be by water removal), and respectively after heating muff, temperature reaches requirement
Afterwards, it is mixed into multiple reaction kettles and carries out gas-liquid phase reaction, gas phase discharging.
Overall reaction equation is as follows:
2HF+CH2Cl2=CH2F2+2H Cl↑
Fluorine-containing hydrochloric acid largely containing hydrogen fluoride is generated in fluorine chemical production process.Since the presence of hydrofluoric acid makes hydrochloric acid
Application value sharp fall, not only easily causes equipment to corrode, and easily brings environmental issue, potentially hazardous to environment generation,
Some enterprises are even used as waste acid treatment, seriously affect economic benefit.Therefore it needs to seek to effectively remove hydrogen fluoride in hydrochloric acid
Method.
Patent US5122356 describes a kind of method for refining of hydrochloric acid comprising: make silane compound and containing hydrogen fluoride
The process of hydrochloric acid contact；The process of the trialkyl fluorosilane compounds generated in Contact operation with regeneration.In the method, it connects
Silane mixture described in process is touched by six alkyl disiloxane of main component and 1-30%, the trialkyl chlorine silicon for being optimized for 20%
Alkane composition, step for regeneration includes: to hydrolyze trialkyl fluorosilane compounds, the process for being transformed into trialkyl silica alkanol compounds；
It is condensed with by trialkyl silica alkanol compounds, the process for being transformed into six alkyl disiloxane compounds, by will be in recovery process
Six obtained alkyl disiloxane compound chlorinations, generate edittrialkyl chlorosilane compound, which exists
It is reused in Contact operation.In order to need the high salt concentration of 25 weight % or more for six alkyl disiloxane compound chlorinations
Acid or by hydrogen chloride and hydrochloric acid combination chlorination.This method needs the intermediate product chlorination of regenerative process to generate edittrialkyl chlorosilane
After recycle, process is complicated, safety requirements is high.
A kind of method that JP1987241806 has invented chlorosilane defluorinate.800ml is put into polyethylene reaction flask containing fluorination
32% by-product hydrochloric acid of hydrogen 116.4ppm, 1.8g dimethyldichlorosilane, after stirring diel, after separating organic layer, hydrochloric acid
In hydrogen fluoride content be 0.7ppm, hydrogen fluoride removal efficiency 99.4%, if when dimethyldichlorosilane 0.3g, being fluorinated in hydrochloric acid
Hydrogen concentration is 13ppm, and hydrogen fluoride removal efficiency is 88.8%.This method haves the defects that the defluorinate time long.
The method that JP60027604 is used is: HCl solution containing 20ppmHF and 0.2g diameter is 200~1000 μm of nothings
Water AlCl3 is stirred, and HF content is 6ppm in HCl solution after processing.Inventor has found that this method cannot achieve fluorine-containing hydrochloric acid
Effective defluorinate and metal ion can be brought into.
A kind of Luo Qixin homemade defluorinating agent reported in the 4th phase in 2007 " fluorine-containing hydrochloric acid defluorination technology " can make in hydrochloric acid
Fluorine ion is disposably down to 0.1% or less.This method has brought nearly 1% solable matter into, and defluorinate rate is not high.
Above method unavoidably brings the chemical substances such as some organic matters or inorganic matter into, influences hydrochloric acid matter after purification
Amount, and limited by method, the hydrochloric acid fluorine content after fluorine removal is still unable to reach some requirements, influences purposes.
Summary of the invention
Based on above-mentioned technical problem, the purpose of the present invention is to provide the sides that hydrogen fluoride is removed in a kind of hydrogen chloride gas
Method, this method can be handled hydrogen fluoride contained in material gas etc. is come out from difluoromethane reflux column, so that after going
In the gas for absorbing process, hydrogen fluoride content is reduced, and is reduced with reaching the hydrochloric acid fluorinated volume of by-product.
To achieve the above object, the invention provides the following technical scheme: the method for removing hydrogen fluoride in hydrogen chloride gas, packet
Include following steps:
Step 1: raw material methylene chloride (CH2Cl2) with anhydrous hydrogen fluoride (AHF) by metering after, methylene chloride
(CH2Cl2) via metering pump sleeve pipe 1#, anhydrous hydrogen fluoride (AHF) is via another metering pump sleeve pipe 2#；
Step 2: after heating muff 1# and casing 2#, methylene chloride (CH2Cl2) be mixed into anhydrous hydrogen fluoride (AHF)
Enter and carries out gas-liquid phase reaction in multiple reaction kettles, gas phase discharging；
Step 3: making multiply material gas collection before HCL tower in surge tank, and surge tank (gas-liquid separator) outlet passes through
Decompression enters in fluorine remover, and adds circulation fluid spray, comes out from hydrogen fluoride contained in material gas etc. carries out to from reflux column
Reason；
Step 4: entering in falling-film absorber from the gas come out in fluorine remover, carries out two-stage tandem with water and absorbs HCL
Gas obtains byproduct hydrochloric acid.
Further, each reaction kettle is provided with reaction reflux column in the step 2, and flow back most of unreacting material,
There is a condenser at the top of reflux column, after the pre-cooling of reaction mass gas, then flows back into inside reaction reflux column.
Further, the fluorine remover in the step 3 is double fluorine removers in parallel, and fluorine remover is provided with defluorinating agent.And
Double fluorine remover the using and the reserved of connection, a use, a processing meet production requirement in the case where not stopping production.
Further, the defluorinating agent is glass (SiO2).
Further, react defluorinating agent glass (SiO2) with HF, without reacting with HCl.
Compared with prior art, the beneficial effects of the present invention are: this technology of Fluoride Removal is solid-state technology of Fluoride Removal, in difluoromethane
Double fluorine removers (parallel connection) are used on process units, built-in (practical is inexpensive glass, such as discarded glass there are many multilayer defluorinating agent
Glass), and add circulation fluid spray, it handles hydrogen fluoride contained in material gas etc. is come out from difluoromethane reflux column, thus
So that being absorbed in the gas of process after going, hydrogen fluoride content is reduced, and is reduced with reaching the hydrochloric acid fluorinated volume of by-product.This technology of Fluoride Removal
Especially to the technique for absorbing water is done using calcium chloride reuse clear water, not only can largely be recycled during Calcium Chloride Production
Generated waste water, moreover it is possible to play the role of reducing the falling-film absorber blocking in process units, reduce production risk.
Detailed description of the invention
Fig. 1 is present invention process general flow chart.
Fig. 2 is prior art processes general flow chart.
Specific embodiment
Technical solution of the present invention is clearly and completely described below in conjunction with the embodiment of the present invention, it is clear that retouched
The embodiment stated is only a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, originally
Field those of ordinary skill every other embodiment obtained without making creative work, belongs to the present invention
The range of protection.
Embodiment 1
As depicted in figs. 1 and 2, raw material methylene chloride (CH2Cl2) with anhydrous hydrogen fluoride (AHF) by metering after, respectively by
Metering pump (CH2Cl2Need to be by water removal), and respectively after temperature reaches requirement, be mixed into multiple reaction kettles after heating muff
Carry out gas-liquid phase reaction, gas phase discharging.Each reaction kettle is provided with reaction reflux column, and flow back most of unreacting material, reflux
Top of tower has a condenser, after the pre-cooling of reaction mass gas, then flows back into inside reflux column, top is produced with HCl and CH2Cl2For
Main material gas；Multiply material gas collection is before HCL tower in big buffer.Big buffer (gas-liquid separator) outlet is by drop
Pressure enters in fluorine remover, and adds circulation fluid spray, handles hydrogen fluoride contained in material gas etc. is come out from reflux column
Decompression enters in falling-film absorber, carries out two-stage tandem with water and absorbs HCL gas, level-one produces 30% hydrochloric acid of byproduct, outside
It sells.For material gas using water scrubber, caustic wash tower etc. removes acidic materials, and (optional) by concentrated sulfuric acid drying tower after absorption
Reason, before treated dry material gas enters compressor in buffer gas tank.
The dry material gas come out from buffer gas tank is overpressurized condensation, after compressor one stage of compression, equipped with cold dry device (
Cool-drying has knockout drum), further decrease the moisture content and high-boiling components in material gas.Finally by final compression, make dry
Material atmospheric pressure reaches technique requirement.Again by middle tail cooler, liquid crude product R32 is congealed into material air cooling and is collected into centre
It is kept in crude product slot.On-condensible gas in tail gas condenser irregularly empties.
Thick R32 product in intermediate crude product slot, finally pass through force (forcing) pump (can also not need), be sent to rectifying column and degassing tower into
After row is re-refined, whole finished product CH is obtained2Cl2.It produces product or passes through products dryer, enter and examine qualification in pan tank
Afterwards, it sells outside.
Separately refined raffinate is recycled, is first kept in R31 relay reservoir, after reaching certain reserves, opens R31 tower,
After recycling R31, R31 is returned in reaction system and is reused.Remaining raffinate is discharged in the outer sewage treatment of system and handles or raffinate is gone to burn
Burn station burning disposal.
Overall reaction equation is as follows:
It should be noted that because difference with the prior art of the present invention is: being used on difluoromethane process units
Double fluorine removers (parallel connection), built-in there are many multilayer defluorinating agent (practical are inexpensive glass, such as scrap glass), and add circulation fluid spray
Leaching, is handled hydrogen fluoride contained in material gas etc. is come out from difluoromethane reflux column, so that absorbing process after going
Gas in, hydrogen fluoride content reduce, with reach by-product hydrochloric acid fluorinated volume reduce.Since subsequent technique is similar, so Fig. 1 is saved
Subsequent technique is omited.
It is an advantage of the invention that (the CH in specific device2Cl2Equal refrigerants process units), to unstripped gas (containing a small amount of
Hydrogen fluoride) it carries out removing hydrogen fluoride in advance, then absorbing hydrogen chloride is removed to do hydrochloric acid.It does so, is exactly to remove fluorination from source
Hydrogen generates microsolubility fluoride so as to avoid during subsequent hydrogen chloride absorption；That is falling-film absorber is reduced
During absorbing hydrogen chloride, generate fluoride deposition a possibility that, reduce a possibility that blocking in falling-film absorber.
Although the present invention is described in detail referring to the foregoing embodiments, for those skilled in the art,
It is still possible to modify the technical solutions described in the foregoing embodiments, or part of technical characteristic is carried out etc.
With replacement, all within the spirits and principles of the present invention, any modification, equivalent replacement, improvement and so on should be included in this
Within the protection scope of invention.
Claims (5)
1. removing the method for hydrogen fluoride in hydrogen chloride gas, which comprises the following steps:
Step 1: raw material methylene chloride (CH2Cl2) with anhydrous hydrogen fluoride (AHF) by metering after, methylene chloride (CH2Cl2) via
Metering pump sleeve pipe 1#, anhydrous hydrogen fluoride (AHF) is via another metering pump sleeve pipe 2#；
Step 2: after heating muff 1# and casing 2#, methylene chloride (CH2Cl2) with anhydrous hydrogen fluoride (AHF) be mixed into it is more
Gas-liquid phase reaction, gas phase discharging are carried out in a reaction kettle；
Step 3: making multiply material gas collection before HCL tower in surge tank, and surge tank outlet enters fluorine remover by decompression
In, and add circulation fluid spray, it handles hydrogen fluoride contained in material gas etc. is come out from reflux column；
Step 4: entering in falling-film absorber from the gas come out in fluorine remover, carries out two-stage tandem with water and absorbs HCL gas
Body obtains byproduct hydrochloric acid.
2. removing the method for hydrogen fluoride in hydrogen chloride gas according to claim 1, it is characterised in that: in the step 2
Each reaction kettle is provided with reaction reflux column, and flow back most of unreacting material, has a condenser at the top of reflux column, to reactant
After expecting gas pre-cooling, then flow back into inside reaction reflux column.
3. removing the method for hydrogen fluoride in hydrogen chloride gas according to claim 1, it is characterised in that: removing in step 3
Fluorine device is double fluorine removers in parallel, and fluorine remover is provided with defluorinating agent.
4. removing the method for hydrogen fluoride in hydrogen chloride gas according to claim 3, it is characterised in that: the defluorinating agent is
Glass (SiO2).
5. removing the method for hydrogen fluoride in hydrogen chloride gas according to claim 4, it is characterised in that: make in fluorine remover
Defluorinating agent glass (SiO2) is reacted with HF, without reacting with HCl.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111847382A (en) * | 2020-08-03 | 2020-10-30 | 江苏三美化工有限公司 | Reaction system for removing hydrogen fluoride in hydrogen chloride |
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| CN107892275A (en) * | 2017-10-31 | 2018-04-10 | 巨化集团技术中心 | A kind of fluorine-containing hydrochloric acid defluorination method |
| CN108529560A (en) * | 2018-04-27 | 2018-09-14 | 江苏优普生物化学科技股份有限公司 | The method that hydrogen chloride is produced from fluorination tail gas |
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2019
- 2019-04-04 CN CN201910271649.XA patent/CN109850848A/en active Pending
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| CN1994987A (en) * | 2006-12-22 | 2007-07-11 | 山东东岳化工有限公司 | Difluoro-methane production process |
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| CN107892275A (en) * | 2017-10-31 | 2018-04-10 | 巨化集团技术中心 | A kind of fluorine-containing hydrochloric acid defluorination method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111847382A (en) * | 2020-08-03 | 2020-10-30 | 江苏三美化工有限公司 | Reaction system for removing hydrogen fluoride in hydrogen chloride |
| CN111847382B (en) * | 2020-08-03 | 2023-05-30 | 江苏三美化工有限公司 | Reaction system for removing hydrogen fluoride in hydrogen chloride |
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