CN109828370A - A kind of design method of mirror symmetry optical eddy ligh trap mask plate - Google Patents
A kind of design method of mirror symmetry optical eddy ligh trap mask plate Download PDFInfo
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- CN109828370A CN109828370A CN201910062168.8A CN201910062168A CN109828370A CN 109828370 A CN109828370 A CN 109828370A CN 201910062168 A CN201910062168 A CN 201910062168A CN 109828370 A CN109828370 A CN 109828370A
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- 238000013461 design Methods 0.000 title claims abstract description 15
- 150000001875 compounds Chemical class 0.000 claims abstract description 12
- 238000002834 transmittance Methods 0.000 claims abstract description 12
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 238000012576 optical tweezer Methods 0.000 abstract description 13
- 239000002245 particle Substances 0.000 abstract description 11
- 230000003068 static effect Effects 0.000 abstract description 5
- 230000000694 effects Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
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- 230000008569 process Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 210000005253 yeast cell Anatomy 0.000 description 2
- 206010052128 Glare Diseases 0.000 description 1
- 241000235342 Saccharomycetes Species 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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Abstract
A kind of design method of mirror symmetry optical eddy ligh trap mask plate, steps are as follows: Step 1: the phase factor in conjunction at the beginning of the helical phase factor, a radial direction Jing Guo asymmetric compound phase operation can flow the factor and one, obtains the complex amplitude transmittance of the vortex beams mask plateE, Step 2: by above-mentioned complex amplitude transmittanceEIt is superimposed to obtain mirror symmetry optical eddy ligh trap mask plate with balzed grating, the mask plate obtained by the design method, it can produce mirror symmetry optical eddy ligh trap in its far field, realize the combination of optical wrench and static optical tweezer, ligh trap capture range can be controlled by changing the radial size that can flow parameter, there is very important value in particle manipulation field.
Description
Technical field
The present invention relates to optical tweezer field, specifically a kind of design side of mirror symmetry optical eddy ligh trap mask plate
Method.
Background technique
Optical acquisition and particle manipulation are reported within 1970 for the first time.Hereafter, since it is in bioscience, nanotechnology and day
The application of body physics etc. is widely studied.Wherein, single Gaussian beam gradient force ligh trap is the most commonly used one kind of research
Optical tweezer technology, the capture from sub-nanometer to micron order particle may be implemented in it at present.For this traditional single Gaussian beam light
Tweezers are learned, capture range depends on the spot size of Gaussian beam, after being focused by 100 X microscope objectives, Gaussian beam
Spot size it is very small, about 1 μm.Capture range is the important parameter for designing single-beam optical tweezers.Intuitively, expand light
Spot size is the direct method for increasing capture range.However, spot size only allows to be slightly increased, because of biggish spot size
It will lead to intensity gradient reduction, the condition of meeting breaking stable trap.Therefore, the capture range of the single light beam of expansion optics tweezer is
One important task.
In order to cope with this challenge, a kind of effective method is that had annular intensity distribution using structure light beam and taken
The optical eddy light beam of belt track angular momentum (OAM).Since particle can be captured by the gradient force in annular light intensity.Cause
This, capture range is expanded to the circle determined by ring of light diameter.But particle it is captured after can constantly be rotated by the effect of OAM,
It is difficult to static capture, and then realizes the controllable manipulation of particles spatial position.In conclusion now lacking a kind of suitable for monochromatic light
The ligh trap that size can freely be regulated and controled in beam optical tweezer field while to guarantee static capture, expands the capture of single beam optical tweezer
Range.
Summary of the invention
In order to solve the above technical problems, this application provides a kind of design sides of mirror symmetry optical eddy ligh trap mask plate
Method, the mask plate obtained by the design method can produce mirror symmetry optical eddy ligh trap in its far field, realize optics and pull
The combination of hand and static optical tweezer can control ligh trap capture range by changing the radial size that can flow parameter, grasp in particle
Vertical field has very important value.
The present invention is based on asymmetric compound phase operation technology using principle of holography is calculated, and breaks traditional perfect circle that is vortexed
Symmetrical structure, coding obtain mirror symmetry optical eddy ligh trap mask plate.To generate mirror symmetry optical eddy light in far field
Trap, this mirror symmetry optical eddy ligh trap increase the capture range of traditional single beam optical tweezer, thus in particle manipulation field
With important application value.
The present invention to solve above-mentioned technical problem used by technical solution:
A kind of design method of mirror symmetry optical eddy ligh trap mask plate, steps are as follows:
Step 1: the factor and one can be flowed in conjunction with the helical phase factor, a radial direction Jing Guo asymmetric compound phase operation
Phase factor at the beginning of a obtains the complex amplitude transmittance E of the vortex beams mask plate, complex amplitude transmittance expression formula are as follows:
Wherein, EvFor the helical phase factor Jing Guo asymmetric compound phase operation；
EaRadial direction can flow the factor, can provide the energy flow component of a radial direction in far field；
For first phase factor, increase the Modulatory character of mirror symmetry optical eddy ligh trap；
Step 2: above-mentioned complex amplitude transmittance E is superimposed to obtain mirror symmetry optical eddy ligh trap mask plate with balzed grating,
Expression formula is
Wherein, circ (ρ < P) is an annular diaphragm, and to give the cut-off of one radial direction of mask plate, parameter P determines that diaphragm is big
It is small；Angle () expression takes phase operation；X is rectangular co-ordinate；D is the balzed grating, period.
Further, the helical phase factor E by asymmetric compound phase operationv, expression formula are as follows:
Wherein, i is imaginary unit；For polar coordinate system；M is helical phase factor topology charge values, the reflection mirror image
The local orbital angular momentum size of symmetrical optical vortex ligh trap；Step () is jump function；~it is to negate logical operation；For
Multiplying.
Further, the radial direction can flow factor EaExpression formula are as follows:
Wherein, a is that radial direction can flow parameter, determines the radial size that can be flowed.Due to the helical phase of asymmetric compound phase operation
The factor provide one it is angular can flow so that the light beam that the mask plate generates be distributed in far field formation semicircle it is a series of
Light valve, to meet design requirement.The effect that the radial direction can flow the factor be to provide one it is sufficiently large can flow, to certain
Angular energy flow distribution is neutralized in degree, realizes the mirror symmetry optical eddy ligh trap.
Further, the first phase factorExpression formula are as follows:
Wherein,For the helical phase factor part first phase adjustment parameter, the mirror symmetry optics can be regulated and controled
Vortex ligh trap neutron ligh trap position.
In experiment, mirror symmetry optical eddy ligh trap mask plate designed by the present invention is loaded into a space light modulation
Device can generate mirror symmetry optical eddy ligh trap in far field, and ligh trap is coupled to a typical inversion microcobjective optical tweezer
The light manipulation to particle can be realized in device.
Technical effect of the invention
Mask plate designed by the present invention may be implemented to generate mirror symmetry optical eddy ligh trap in the far field of the mask plate.It is special
Point is to realize the combination of optical wrench and static optical tweezer.Ligh trap is controlled by changing the radial size that can flow parameter a
Capture range, a is bigger, and capture range is bigger；Regulation topology charge values m can change the size of the angular spanner power of local；Regulation is just
Phase adjustment parameterIt can change sub-light trap spatial position.Before thus there is very important application in optical manipulation field
Scape.
Detailed description of the invention
Fig. 1 is that the present invention generates mirror symmetry optical eddy ligh trap mask plate.Topological charge values m=20, can radially flow parameter a
=1.5, first phase adjustment parameter
Fig. 2 is that the mirror symmetry optical eddy ligh trap that phase mask plate demonstrated in Figure 1 generates and manipulation saccharomycete are thin
The light manipulation process of born of the same parents.
Specific embodiment
For realize the present invention technological means, creation characteristic, reach purpose and beneficial effect is easy to understand, under
Face combines specific embodiment, and the present invention is further explained.
Fig. 1 is the mirror symmetry optical eddy ligh trap mask plate generated using method of the present invention；It mainly comprises the processes of
Phase factor at the beginning of the factor and one can be flowed in conjunction with the helical phase factor, a radial direction Jing Guo asymmetric compound phase operation,
Obtain the complex amplitude transmittance E of the vortex beams mask plate, complex amplitude transmittance expression formula are as follows:
Wherein, EvFor the helical phase factor Jing Guo asymmetric compound phase operation；EaRadial direction can flow the factor, provide one in far field
A radial energy flow component；For first phase factor, increase the Modulatory character of mirror symmetry optical eddy ligh trap；
The helical phase factor by asymmetric compound phase operation, expression formula are as follows:
Wherein, i is imaginary unit；For polar coordinate system；M is helical phase factor topology charge values, the reflection mirror image
The local orbital angular momentum size of symmetrical optical vortex ligh trap, value 20 in specific embodiment；Step () is jump function；
~it is to negate logical operation；For multiplying；
The radial direction can flow factor expression are as follows:
Wherein, a is that radial direction can flow parameter, determines the radial size that can be flowed, value 1.5 in specific embodiment.Due to asymmetric
The helical phase factor of composite phase operation provide one it is angular can flow so that the light beam that the mask plate generates is remote
Field forms a series of smooth valves of semicircle distribution, to meet design requirement.The effect that the radial direction can flow the factor is to provide one
Sufficiently large can flow, and to neutralize angular energy flow distribution to a certain extent, realize the mirror symmetry optical eddy ligh trap；
The first phase factor expression are as follows:
Wherein,For the helical phase factor part first phase adjustment parameter, the mirror symmetry optics can be regulated and controled
Vortex ligh trap neutron ligh trap position, value 0 in specific embodiment.
It can be superimposed to obtain designed mirror symmetry optical eddy ligh trap mask with balzed grating, by above-mentioned complex amplitude transmittance E
Plate, expression formula are
Wherein, circ (ρ < P) is an annular diaphragm, and to give the cut-off of one radial direction of mask plate, parameter P determines that diaphragm is big
It is small, value 7mm in specific embodiment；Angle () expression takes phase operation；X is rectangular co-ordinate；D is the balzed grating, period,
Value 0.08mm in specific embodiment.
In experiment, mirror symmetry optical eddy ligh trap mask plate designed by the present invention is loaded into a space light modulation
Device can generate mirror symmetry optical eddy ligh trap in far field, and ligh trap is coupled to a typical inversion microcobjective optical tweezer
The light manipulation to particle can be realized in device.
Fig. 2 is the mirror symmetry optical eddy ligh trap under specific embodiment value.It is worth noting that, Fig. 2 is only spy
Determine the ligh trap under value, it is radial in the present invention to flow parameter a, first phase adjustment parameter in the case where testing needsIt glares
Grid cycle D can continuous value；Topological charge m value is integer.
Embodiment
Below by taking the mask plate of 1024 × 1024 sizes as an example, mirror image is given for the laser that operation wavelength is 532nm
Symmetrical optical vortex ligh trap mask plate.According in specific embodiment mask plate transmittance function and mask plate parameter value most
Mirror symmetry optical eddy ligh trap mask plate is obtained eventually, shown in Fig. 1.This mirror symmetry optical eddy ligh trap mask plate can lead to
A spatial light modulator is crossed to realize.It is with the pluto-vis-016 model spatial light modulator of German Holoeye company
Example carries out experimental verification to the mirror symmetry optical eddy ligh trap mask plate proposed.
Shown in Fig. 2, we, which test, has obtained this mirror symmetry optical eddy ligh trap mask plate in the aobvious of 100X, 1.25NA
Ligh trap light distribution in micro- focal plane of lens and the acquisition procedure to yeast cell at any time.It can be seen from the figure that I
Obtained topological charge values be 20, mirror symmetry optical eddy ligh trap.Our optical tweezers experiment the result shows that, by this hair
This mirror symmetry optical eddy ligh trap mask plate of bright proposition, available mirror symmetry optical eddy ligh trap, and can be steady
Surely yeast cell is captured, the capture range of single beam optical tweezer is increased.This will provide a kind of new operation for particle manipulation field
Means.
In conclusion the invention proposes the specific design schemes and reality of a kind of mirror symmetry optical eddy ligh trap mask plate
Scheme is applied, and parameter a=1.5, first phase adjustment parameter can be flowed with the 100X microcobjective of NA=1.25, topological charge m=20, radial directionFor, the laser for being 532nm for operation wavelength proposes a kind of skill of mirror symmetry optical eddy ligh trap mask plate
Art implementation route.
The above generates mirror symmetry optical eddy ligh trap mask plate and only expresses a kind of specific embodiment party of the invention
Formula, it cannot be understood as limiting the scope of the invention.It should be pointed out that for the ordinary skill of this field
For personnel, under the premise of not departing from basic thought of the present invention, the specific implementation details that can also be proposed to this patent are done
Several modifications and improvements out, these are all within the scope of protection of the present invention.
Claims (4)
1. a kind of design method of mirror symmetry optical eddy ligh trap mask plate, it is characterised in that:
Step 1: the factor and one can be flowed in conjunction with the helical phase factor, a radial direction Jing Guo asymmetric compound phase operation
Phase factor at the beginning of a obtains the complex amplitude transmittance E of the vortex beams mask plate, complex amplitude transmittance expression formula are as follows:
Wherein, EvFor the helical phase factor Jing Guo asymmetric compound phase operation；
EaRadial direction can flow the factor, can provide the energy flow component of a radial direction in far field；
For first phase factor, increase the Modulatory character of mirror symmetry optical eddy ligh trap；
Step 2: above-mentioned complex amplitude transmittance E is superimposed to obtain mirror symmetry optical eddy ligh trap mask plate with balzed grating,
Expression formula is
Wherein, circ (ρ < P) is an annular diaphragm, and to give the cut-off of one radial direction of mask plate, parameter P determines that diaphragm is big
It is small；Angle () expression takes phase operation；X is rectangular co-ordinate；D is the balzed grating, period.
2. a kind of design method of mirror symmetry optical eddy ligh trap mask plate according to claim 1, it is characterised in that:
The helical phase factor E by asymmetric compound phase operationv, expression formula are as follows:
Wherein, i is imaginary unit；For polar coordinate system；M is helical phase factor topology charge values, the reflection mirror image
The local orbital angular momentum size of symmetrical optical vortex ligh trap；Step () is jump function；~it is to negate logical operation；For
Multiplying.
3. a kind of design method of mirror symmetry optical eddy ligh trap mask plate according to claim 1, it is characterised in that:
The radial direction can flow factor EaExpression formula are as follows:
Wherein, a is the radial size that can be flowed parameter, can flow for determining radial direction.
4. a kind of design method of mirror symmetry optical eddy ligh trap mask plate according to claim 1, it is characterised in that:
The first phase factorExpression formula are as follows:
Wherein,For the helical phase factor part first phase adjustment parameter, the mirror symmetry optics can be regulated and controled
Vortex ligh trap neutron ligh trap position.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910062168.8A CN109828370B (en) | 2019-01-24 | 2019-01-24 | Design method of mirror symmetry optical vortex optical trap mask plate |
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| CN201910062168.8A CN109828370B (en) | 2019-01-24 | 2019-01-24 | Design method of mirror symmetry optical vortex optical trap mask plate |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111175969A (en) * | 2020-01-03 | 2020-05-19 | 浙江大学 | Optical tweezers system based on vortex pair light beam |
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| JP2008211210A (en) * | 2007-02-20 | 2008-09-11 | Asml Holding Nv | Optical system and method for illuminating reflective spatial light modulator for maskless lithography |
| DE102010002822A1 (en) * | 2010-03-12 | 2011-09-15 | Carl Zeiss Smt Gmbh | Lighting system for use in microlithography projection exposure system for lighting reticle in object field for manufacturing semiconductor components by extreme UV lithography process, has selection device provided with selection mirror |
| CN105043543A (en) * | 2015-08-27 | 2015-11-11 | 河南科技大学 | Apparatus for generating controllable super-Rayleigh speckle field and method for generating the same |
| CN108121067A (en) * | 2017-12-27 | 2018-06-05 | 河南科技大学 | A kind of design method of the oval perfect vortex beams mask plate of more notches |
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2019
- 2019-01-24 CN CN201910062168.8A patent/CN109828370B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008211210A (en) * | 2007-02-20 | 2008-09-11 | Asml Holding Nv | Optical system and method for illuminating reflective spatial light modulator for maskless lithography |
| DE102010002822A1 (en) * | 2010-03-12 | 2011-09-15 | Carl Zeiss Smt Gmbh | Lighting system for use in microlithography projection exposure system for lighting reticle in object field for manufacturing semiconductor components by extreme UV lithography process, has selection device provided with selection mirror |
| CN105043543A (en) * | 2015-08-27 | 2015-11-11 | 河南科技大学 | Apparatus for generating controllable super-Rayleigh speckle field and method for generating the same |
| CN108121067A (en) * | 2017-12-27 | 2018-06-05 | 河南科技大学 | A kind of design method of the oval perfect vortex beams mask plate of more notches |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111175969A (en) * | 2020-01-03 | 2020-05-19 | 浙江大学 | Optical tweezers system based on vortex pair light beam |
| CN111175969B (en) * | 2020-01-03 | 2020-12-11 | 浙江大学 | Optical tweezers system based on vortex pair light beam |
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Application publication date: 20190531 Assignee: Luoyang pingconvex Technology Co.,Ltd. Assignor: HENAN University OF SCIENCE AND TECHNOLOGY Contract record no.: X2021980013091 Denomination of invention: A design method of mirror symmetric optical vortex trap mask Granted publication date: 20210108 License type: Exclusive License Record date: 20211125 |
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