CN109814342A - A kind of ultraviolet multi-wavelength exposure light source and exposure sources - Google Patents
A kind of ultraviolet multi-wavelength exposure light source and exposure sources Download PDFInfo
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- CN109814342A CN109814342A CN201910120063.3A CN201910120063A CN109814342A CN 109814342 A CN109814342 A CN 109814342A CN 201910120063 A CN201910120063 A CN 201910120063A CN 109814342 A CN109814342 A CN 109814342A
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Abstract
Ultraviolet multi-wavelength exposure light source provided by the invention, including multiple UVLED illuminator disk modules, UVLED collimating module, close beam module, even optical module and matching lens module, the light beam of UVLED illuminator disk module outgoing, after corresponding UVLED collimating module collimation, it is incident on respectively and closes beam module, close the smear light beam that light combination mirror in beam module transmits incident light beam and/or formed after being reflected, even optical module is incident on certain subtended angle, even optical module carries out cutting amplification combination producing uniform light spots to different spaces non-uniform beam of light hot spot, matched camera lens converts beam sizes and subtended angle again, form light beam parameters required by external graphics generator and projection lens, ultraviolet multi-wavelength exposure light source provided by the invention, so that alternative ultraviolet band increases significantly , the ultraviolet band for being used to expose field of complete series can be covered, expand its application range.
Description
Technical field
The present invention relates to optical devices technologies field, in particular to a kind of ultraviolet multi-wavelength exposure light source.
Background technique
High-density circuit board (HDI-PCB) and flexible circuit board (FPC), liquid crystal touch screen etc. are exposed using Conventional parallel light
Ray machine has been extremely difficult to expected precision and yields, such product generallys use laser direct imaging (LDI) exposure at present and sets
It is standby to generate its line pattern, have and do not need mask plate (film), precision is high, the high feature of yields.
LDI equipment is mainly made of light source, pattern generator, projection lens, motion control and software.Wherein light source,
Pattern generator, projection lens are LDI device core components.The intensity of light source, angle, wavelength influence LDI equipment yield, yields
And covering process.LDI equipment generallys use laser as light source at present, only has in the alternative wavelength of ultraviolet band
375nm and 405nm can only realize that the mixed exposure of Single wavelength, dual wavelength, covering process are mainly exposed in route, and its
It is expensive, restrict the universal and application field of LDI equipment.
Summary of the invention
Have in view of that, it is necessary in view of the defects existing in the prior art, provide a kind of using ultraviolet LED (UVLED) conduct
A kind of method of light source, and multi-wavelength is mixed, and realize the ultraviolet multi-wavelength exposure light source that its wavelength selectivity is opened.
To achieve the above object, the present invention adopts the following technical solutions:
A kind of ultraviolet multi-wavelength exposure light source, comprising: multiple UVLED illuminator disk modules and any one UVLED illuminator
UVLED collimating module, conjunction beam module, even optical module and the matching lens module that disk module is correspondingly arranged, the conjunction beam module packet
Several light combination mirrors are included, any one light combination mirror is correspondingly arranged with the UVLED collimating module, and the light combination mirror can be to incidence
Light beam carry out transmission or reflection, in which:
The light beam of the UVLED illuminator disk module outgoing, after the corresponding UVLED collimating module collimation, point
It is not incident on the conjunction beam module, shape after the light combination mirror closed in beam module is transmitted and/or reflected to incident light beam
At smear light beam, the even optical module is incident on certain subtended angle, the even optical module is to different spaces non-uniform beam of light
Hot spot carries out cutting amplification combination producing uniform light spots, then converts beam sizes and subtended angle through the matching camera lens, shape
At light beam parameters required by external graphics generator and projection lens.
In some preferred embodiments, the UVLED illuminator disk module is 4, is denoted as the first UVLED light source respectively
Lamp panel module, the 2nd UVLED illuminator disk module, the 3rd UVLED illuminator disk module and the 4th UVLED illuminator disk module,
The 2nd UVLED illuminator disk module, the 3rd UVLED illuminator disk module and the 4th UVLED illuminator disk module are set side by side
It sets, wherein the light beam of the first UVLED illuminator disk module outgoing is incident after the corresponding UVLED collimating module collimation
To the conjunction beam module, the light combination mirror closed in beam module transmits incident light beam；The 2nd UVLED illuminator
Disk module and the light beam of the 3rd UVLED illuminator disk module outgoing are incident on institute after the correspondence UVLED collimating module collimation
It states and closes beam module, the light combination mirror closed in beam module reflects incident light beam to be transmitted through other light combination mirrors again, described
The light beam of 4th UVLED illuminator disk module outgoing is incident on the conjunction beam after the corresponding UVLED collimating module collimation
Module, the light combination mirror closed in beam module reflect incident light beam, and 4 UVLED illuminator disk modules are through institute
It states and forms smear light beam after closing beam module.
In some preferred embodiments, 4 UVLED illuminator disk modules form smear after the conjunction beam module
The luminous intensity of light beam are as follows:
W=W1T1,1T2,1T3,1+W2R1,1T3,2T3,2+W3R2,3T3,3+W4R4,4, wherein the first UVLED illuminator disk module goes out
The light beam wavelength penetrated is λ1, light power W1, the light beam wavelength of the 2nd UVLED illuminator disk module outgoing is λ2, light power
For W2, the light beam wavelength of the 3rd UVLED illuminator disk module outgoing is λ3, light power W3, the 4th UVLED light source lamp panel mould
The light beam wavelength of block outgoing is λ4, light power W4, corresponding light combination mirror is to λ1Transmitance is T1,1, it is R to 2 reflectivity of λ1,1,
Corresponding light combination mirror is to λ1Transmitance is T2,1, to λ2Transmitance is T2,2, to λ3Reflectivity is R2,3, corresponding light combination mirror is to λ1Thoroughly
Crossing rate is T3,1, to λ2Transmitance is T3,2, to λ3Transmitance is T3,3, to λ4Reflectivity is R4,4。
In some preferred embodiments, the UVLED illuminator disk module includes substrate, is fixed on the substrate
UVLED, be bonded with the substrate heat sink and be opened in it is described it is heat sink on intake tunnel and exhalant canal.
In some preferred embodiments, the even optical module is single strip lens splicing or two list lens combinations.
In some preferred embodiments, the matching lens module is one group of lens combination, for single group lens or thoroughly
Microscope group form.
In some preferred embodiments, the lens combination is that single group lens combination or lens group combine.
In some preferred embodiments, further include UVLED control module, the UVLED control module with it is multiple described
UVLED illuminator disk module is electrically connected, and the UVLED control module can control the light of the UVLED illuminator disk module
Shu Bochang and power.
On the other hand, the present invention also provides a kind of exposure sources, including ultraviolet multi-wavelength as described in claim 1 to expose
Radiant.
The present invention by adopting the above technical scheme, has an advantage that
Ultraviolet multi-wavelength exposure light source provided by the invention, including multiple UVLED illuminator disk modules, UVLED collimate mould
Block closes beam module, even optical module and matches lens module, the light beam of the UVLED illuminator disk module outgoing, and process is corresponding
After the UVLED collimating module collimation, it is incident on the conjunction beam module respectively, the light combination mirror closed in beam module is to incidence
The smear light beam that light beam is transmitted and/or formed after being reflected is incident on the even optical module, the even light with certain subtended angle
Module carries out cutting amplification combination producing uniform light spots to different spaces non-uniform beam of light hot spot, then through the matching camera lens by light
Beam size and subtended angle are converted, and light beam parameters required by external graphics generator and projection lens are formed, and the present invention mentions
The ultraviolet multi-wavelength exposure light source of confession, including multiple UVLED illuminator disk modules, and the wave of multiple UVLED illuminator disk modules
Length is mixed, so that alternative ultraviolet band increases significantly, can cover the ultraviolet waves for being used to expose field of complete series
Section, expands its application range.
In addition, ultraviolet multi-wavelength exposure light source provided by the invention, by even optical module to different spaces non-uniform beam of light
Hot spot carries out cutting amplification combination producing uniform light spots, and matching camera lens converts beam sizes and subtended angle, forms exterior view
Light beam parameters required by shape generator and projection lens, are no longer coupled with optical fiber, and stringent encapsulation, structure are not needed
Simply, complicated and expensive equipment is not needed, production cost is low.
In addition, ultraviolet multi-wavelength exposure light source provided by the invention, since UVLED illuminator disk module does not need to carry out light
Fibre coupling, thus can using each wavelength UVLED as an independent mould group, when strength retrogression occurs in UVLED or turns off the light, can
The UVLED mould group of the wavelength is replaced, replacement is convenient and maintenance cost is low.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
Other attached drawings are obtained according to these attached drawings.
Fig. 1 is a kind of ultraviolet multi-wavelength exposure light source structural schematic diagram provided in an embodiment of the present invention；
Fig. 2 is the structural schematic diagram of UVLED illuminator disk module provided in an embodiment of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts all other
Embodiment shall fall within the protection scope of the present invention.
A kind of structural schematic diagram of ultraviolet multi-wavelength exposure light source provided by the invention, comprising: multiple UVLED light source lamp panels
Module, the UVLED collimating module being correspondingly arranged with any one UVLED illuminator disk module, close beam module, even optical module 4 and
Commanding lens module 5, the conjunction beam module includes several light combination mirrors, any one light combination mirror and the UVLED collimating module
It is correspondingly arranged, the light combination mirror can carry out transmission or reflection to incident light beam.
Ultraviolet multi-wavelength exposure light source provided by the invention, working method are as follows:
The light beam of the UVLED illuminator disk module outgoing, after the corresponding UVLED collimating module collimation, point
It is not incident on the conjunction beam module, shape after the light combination mirror closed in beam module is transmitted and/or reflected to incident light beam
At smear light beam, the even optical module 4 is incident on certain subtended angle, the even optical module 4 is to the non-homogeneous light of different spaces
Beam hot spot carries out cutting amplification combination producing uniform light spots, then carries out beam sizes and subtended angle through the matching lens module 5
Transformation forms light beam parameters required by external graphics generator and projection lens.
Referring to Fig. 1, the structural schematic diagram of the ultraviolet multi-wavelength exposure light source provided for a preferred embodiment of the present invention.
The UVLED illuminator disk module is 4, is denoted as the first UVLED illuminator disk module 1.1, the 2nd UVLED respectively
Illuminator disk module 1.2, the 3rd UVLED illuminator disk module 1.3 and the 4th UVLED illuminator disk module 1.4, described second
UVLED illuminator disk module 1.2, the 3rd UVLED illuminator disk module 1.3 and the 4th UVLED illuminator disk module 1.4 are set side by side
It sets, wherein the light beam of the first UVLED illuminator disk module 1.1 outgoing is collimated through the corresponding UVLED collimating module 2.1
After be incident on the conjunction beam module, described 3.1 pairs of incident light beams of light combination mirror closed in beam module transmit；Described second
UVLED illuminator disk module 1.2 and the light beam of the 3rd UVLED illuminator disk module 1.3 outgoing are through the correspondence UVLED collimation mould
The conjunction beam module is incident on after block (being respectively labeled as 2.2 and 2.3) collimation, corresponding light combination mirror (divides in the conjunction beam module
It Biao Ji not be and 3.2) incident light beam is reflected be transmitted again through other light combination mirrors (being respectively labeled as 3.1 and 3.2),
The light beam that the 4th UVLED illuminator disk module 1.4 is emitted is incident after the corresponding UVLED collimating module 2.4 collimates
To the conjunction beam module, 3.3 pairs of incident light beams of corresponding light combination mirror reflect in the conjunction beam module, 4 UVLED
Illuminator disk module forms smear light beam after the conjunction beam module.
It is appreciated that the ultraviolet multi-wavelength exposure light source that the above embodiment of the present invention provides, including multiple UVLED illuminators
Disk module, and the wavelength of multiple UVLED illuminator disk modules is mixed, so that alternative ultraviolet band increases significantly,
Substantially the ultraviolet band for being used to expose field for covering 435nm, 405nm, 395nm, 385nm, 365nm etc., expands its application
Range.
It is appreciated that being coated with high saturating or highly reflecting films for the surface for closing light combination mirror in beam module, root is needed in practice
It requires to design suitable membrane system according to different wave length, keeps the light intensity finally after closing the outgoing of beam module maximum.
In some preferred embodiments, 4 UVLED illuminator disk modules form smear after the conjunction beam module
The luminous intensity of light beam are as follows:
W=W1T1,1T2,1T3,1+W2R1,1T3,2T3,2+W3R2,3T3,3+W4R4,4, wherein the first UVLED illuminator disk module
The light beam wavelength of 1.1 outgoing is λ1, light power W1, the light beam wavelength of the 2nd UVLED illuminator disk module 1.2 outgoing is λ2,
Light power is W2, the light beam wavelength of the 3rd UVLED illuminator disk module 1.3 outgoing is λ3, light power W3, the 4th UVLED
The light beam wavelength that illuminator disk module 1.4 is emitted is λ4, light power W4, corresponding light combination mirror is to λ1Transmitance is T1,1, to λ
2 reflectivity are R1,1, corresponding light combination mirror is to λ1Transmitance is T2,1, to λ2Transmitance is T2,2, to λ3Reflectivity is R2,3, corresponding
Light combination mirror to λ1Transmitance is T3,1, to λ2Transmitance is T3,2, to λ3Transmitance is T3,3, to λ4Reflectivity is R4,4。
Referring to Fig. 2, the UVLED illuminator disk module include substrate 9, the UVLED10 being fixed on the substrate 9,
Be bonded with the substrate 9 heat sink 8 and be opened in it is described it is heat sink on intake tunnel 7.1 and exhalant canal 7.2, it is possible thereby to really
Protect the heat dissipation for carrying out continuous and effective to UVLED in small space.
In some preferred embodiments, substrate 9 is aluminium or copper base.
In some preferred embodiments, the even optical module 4 is single strip lens splicing or two list lens combinations, can
Incident light beam is homogenized.
In some preferred embodiments, the matching lens module 5 is one group of lens combination, for single group lens or thoroughly
Smear light beam after even light is incident on back-end graphical generator with certain subtended angle by microscope group form, the matching lens module,
In, matching lens module 5 is achromatism form.
In some preferred embodiments, the lens combination is that single group lens combination or lens group combine.
It in some preferred embodiments, further include UVLED control module 6, the UVLED control module 6 and multiple institutes
It states UVLED illuminator disk module to be electrically connected, the UVLED control module can control the UVLED illuminator disk module
Light beam wavelength and power.
Ultraviolet multi-wavelength exposure light source provided by the invention, including multiple UVLED illuminator disk modules, and multiple UVLED
The wavelength of illuminator disk module is mixed, so that alternative ultraviolet band increases significantly, can cover being used for for complete series
The ultraviolet band in exposure field expands its application range；And UVLED has higher service life, usual LD relative to LD
Operating at full capacity can achieve 10,000 hours, and UVLED then can achieve for 20,000 even more long-lives without greater attenuation.
In addition, ultraviolet multi-wavelength exposure light source provided by the invention, by even optical module to different spaces non-uniform beam of light
Hot spot carries out cutting amplification combination producing uniform light spots, and matching camera lens converts beam sizes and subtended angle, forms exterior view
Light beam parameters required by shape generator and projection lens, are no longer coupled with optical fiber, and stringent encapsulation, structure are not needed
Simply, complicated and expensive equipment is not needed, production cost is low.
In addition, ultraviolet multi-wavelength exposure light source provided by the invention, since UVLED illuminator disk module does not need to carry out light
Fibre coupling, thus can using each wavelength UVLED as an independent mould group, when strength retrogression occurs in UVLED or turns off the light, can
The UVLED mould group of the wavelength is replaced, replacement is convenient and maintenance cost is low.
The light source of exposure sources can be used in ultraviolet multi-wavelength exposure light source provided by the invention.
Certainly ultraviolet multi-wavelength exposure light source of the invention can also have a variety of transformation and remodeling, it is not limited to above-mentioned reality
Apply the specific structure of mode.In short, protection scope of the present invention should include that those show to those skilled in the art
And the transformation or substitution that are clear to and remodeling.
Claims (9)
1. a kind of ultraviolet multi-wavelength exposure light source characterized by comprising multiple UVLED illuminator disk modules, with it is any one
UVLED collimating module, conjunction beam module, even optical module and the matching lens module that UVLED illuminator disk module is correspondingly arranged, it is described
Closing beam module includes several light combination mirrors, and any one light combination mirror is correspondingly arranged with the UVLED collimating module, the conjunction beam
Mirror can carry out transmission or reflection to incident light beam, in which:
The light beam of the UVLED illuminator disk module outgoing enters respectively after the corresponding UVLED collimating module collimation
It is mapped to the conjunction beam module, the light combination mirror closed in beam module transmits incident light beam and/or formed after being reflected
Smear light beam is incident on the even optical module with certain subtended angle, and the even optical module is to different spaces non-uniform beam of light hot spot
Cutting amplification combination producing uniform light spots are carried out, then convert beam sizes and subtended angle through the matching camera lens, are formed outer
Light beam parameters required by portion's pattern generator and projection lens.
2. ultraviolet multi-wavelength exposure light source as described in claim 1, which is characterized in that the UVLED illuminator disk module is 4
It is a, it is denoted as the first UVLED illuminator disk module, the 2nd UVLED illuminator disk module, the 3rd UVLED illuminator disk module respectively
And the 4th UVLED illuminator disk module, the 2nd UVLED illuminator disk module, the 3rd UVLED illuminator disk module and the 4th
UVLED illuminator disk module is arranged side by side, wherein the light beam of the first UVLED illuminator disk module outgoing is through corresponding described
The conjunction beam module is incident on after UVLED collimating module collimation, the light combination mirror closed in beam module carries out incident light beam
Transmission；The 2nd UVLED illuminator disk module and the light beam of the 3rd UVLED illuminator disk module outgoing are through described in correspondence
The conjunction beam module is incident on after UVLED collimating module collimation, corresponding light combination mirror is to incident light beam in the conjunction beam module
It is reflected and is transmitted again through other light combination mirrors, the light beam of the 4th UVLED illuminator disk module outgoing is through corresponding described
The conjunction beam module is incident on after UVLED collimating module collimation, corresponding light combination mirror is to incident light beam in the conjunction beam module
It is reflected, 4 UVLED illuminator disk modules form smear light beam after the conjunction beam module.
3. ultraviolet multi-wavelength exposure light source as claimed in claim 2, which is characterized in that 4 UVLED illuminator disk modules
The luminous intensity of smear light beam is formed after the conjunction beam module are as follows:
W=W1T1,1T2,1T3,1+W2R1,1T3,2T3,2+W3R2,3T3,3+W4R4,4, wherein the outgoing of the first UVLED illuminator disk module
Light beam wavelength is λ1, light power W1, the light beam wavelength of the 2nd UVLED illuminator disk module outgoing is λ2, light power is
W2, the light beam wavelength of the 3rd UVLED illuminator disk module outgoing is λ3, light power W3, the 4th UVLED illuminator disk module
The light beam wavelength of outgoing is λ4, light power W4, corresponding light combination mirror is to λ1Transmitance is T1,1, it is R to 2 reflectivity of λ1,1, right
The light combination mirror answered is to λ1Transmitance is T2,1, to λ2Transmitance is T2,2, to λ3Reflectivity is R2,3, corresponding light combination mirror is to λ1Through
Rate is T3,1, to λ2Transmitance is T3,2, to λ3Transmitance is T3,3, to λ4Reflectivity is R4,4。
4. ultraviolet multi-wavelength exposure light source as described in claim 1, which is characterized in that the UVLED illuminator disk module packet
Include substrate, the UVLED being fixed on the substrate, be bonded with the substrate heat sink and be opened in it is described it is heat sink on water inlet it is logical
Road and exhalant canal.
5. ultraviolet multi-wavelength exposure light source as described in claim 1, which is characterized in that the even optical module is single strip lens
Splicing or two list lens combinations.
6. ultraviolet multi-wavelength exposure light source as described in claim 1, which is characterized in that the matching lens module is one group saturating
Microscope group is closed, and is single group lens or lens group form.
7. ultraviolet multi-wavelength exposure light source as claimed in claim 6, which is characterized in that the lens combination is single group lens group
It closes or lens group combines.
8. ultraviolet multi-wavelength exposure light source as described in claim 1, which is characterized in that it further include UVLED control module, it is described
UVLED control module is electrically connected with multiple UVLED illuminator disk modules, and the UVLED control module can control institute
State the light beam wavelength and power of UVLED illuminator disk module.
9. a kind of exposure sources, which is characterized in that including ultraviolet multi-wavelength exposure light source as described in claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910120063.3A CN109814342A (en) | 2019-02-18 | 2019-02-18 | A kind of ultraviolet multi-wavelength exposure light source and exposure sources |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910120063.3A CN109814342A (en) | 2019-02-18 | 2019-02-18 | A kind of ultraviolet multi-wavelength exposure light source and exposure sources |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102518971A (en) * | 2011-12-30 | 2012-06-27 | 深圳市润天智数字设备股份有限公司 | Ultraviolet light emitting diode light source |
| CN202486497U (en) * | 2012-01-13 | 2012-10-10 | 合肥芯硕半导体有限公司 | Multi-wavelength mask-free exposure device |
| CN206684475U (en) * | 2017-03-01 | 2017-11-28 | 贾亚飞 | A kind of new UV exposure systems for litho machine |
| CN107765513A (en) * | 2017-12-05 | 2018-03-06 | 中国科学院重庆绿色智能技术研究院 | A kind of ultraviolet LED exposure system for liquid crystal panel manufacture |
| CN208506382U (en) * | 2018-06-26 | 2019-02-15 | 上海微电子装备（集团）股份有限公司 | A kind of multi-wavelength optical system and a kind of laser anneal device |
-
2019
- 2019-02-18 CN CN201910120063.3A patent/CN109814342A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102518971A (en) * | 2011-12-30 | 2012-06-27 | 深圳市润天智数字设备股份有限公司 | Ultraviolet light emitting diode light source |
| CN202486497U (en) * | 2012-01-13 | 2012-10-10 | 合肥芯硕半导体有限公司 | Multi-wavelength mask-free exposure device |
| CN206684475U (en) * | 2017-03-01 | 2017-11-28 | 贾亚飞 | A kind of new UV exposure systems for litho machine |
| CN107765513A (en) * | 2017-12-05 | 2018-03-06 | 中国科学院重庆绿色智能技术研究院 | A kind of ultraviolet LED exposure system for liquid crystal panel manufacture |
| CN208506382U (en) * | 2018-06-26 | 2019-02-15 | 上海微电子装备（集团）股份有限公司 | A kind of multi-wavelength optical system and a kind of laser anneal device |
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Application publication date: 20190528 |