CN109809483A - A kind of thick zirconium chloride impurity removal and purification technique - Google Patents
A kind of thick zirconium chloride impurity removal and purification technique Download PDFInfo
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- CN109809483A CN109809483A CN201711160293.XA CN201711160293A CN109809483A CN 109809483 A CN109809483 A CN 109809483A CN 201711160293 A CN201711160293 A CN 201711160293A CN 109809483 A CN109809483 A CN 109809483A
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- zirconium chloride
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- thick zirconium
- sodium hydroxide
- hydroxide
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Abstract
The invention discloses a kind of thick zirconium chloride impurity removal and purification techniques, belong to chemical technology field.Its sodium hydroxide can be one of sodium hydroxide, potassium hydroxide, calcium hydroxide, naoh concentration 30%-60%.Sodium hydroxide is added in thick zirconium chloride, after coming into full contact with, after sedimentation, solid separation, the solid impurity in thick zirconium chloride is removed.The impurity such as alchlor, silicon tetrachloride in thick zirconium chloride can not only be effectively reduced in method provided by the invention, and sodium hydroxide reacts to form colloidal aluminium hydroxide, sodium metasilicate as flocculant with alchlor, silicon tetrachloride, the rate of settling that can accelerate other solid impurities in zirconium chloride, effectively improves dust removal rate.Compared with traditional settling methods, dust removal rate can be improved 30% or more by a kind of thick zirconium chloride impurity removal and purification technique.
Description
Technical field
The invention belongs to chemical technology fields, and in particular to a kind of thick zirconium chloride impurity removal and purification technique.
Background technique
Zirconium chloride is a kind of important intermediate products of chloridising production zirconium white powder.Zirconium white powder (TiO2) is a kind of white face
Material has excellent optical property and pigment performance, whiteness height, strong covering power, reducing power as a kind of important chemical products
It is high and be easily dispersed, thus it is widely used in the fields such as coating, plastics, papermaking, ink, rubber.Chloridising produces zirconium white powder tool
Have that process flow is short, production capacity is big, can be continuously produced, control easy to automate, stable product quality, the three wastes are few, energy consumption
Low advantage, thus rapidly developed in recent years.
However, the thick zirconium chloride that either fluidizing chlorination or fused salt chlorimation obtain all contains plurality of impurities, such as trichlorine
Change iron, calcium chloride, magnesium chloride, silicon tetrachloride, manganese chloride, vanadium oxytrichloride, alchlor and fail the high zirconium slag reacted completely,
Rutile and petroleum coke etc. are in burgundy.In order to guarantee the product quality of zirconium white powder, it is necessary to cleaned to thick zirconium chloride,
Purification, obtains refined zirconium tetrachloride.
Gravitational settling is traditionally relied on, the bulky grain solid impurity in thick zirconium chloride is tentatively removed, still, weight
The power rate of settling is very slow, and production efficiency is very low, and is difficult to remove the alchlor being dissolved in thick zirconium chloride, silicon tetrachloride
Equal impurity.
Summary of the invention
To solve the above-mentioned problems of the prior art, realized slightly the object of the present invention is to provide a kind of using sodium hydroxide
The method of zirconium chloride removal of impurities.
In order to achieve the above objectives, the technical solution of the present invention is as follows:
A kind of thick zirconium chloride impurity removal and purification technique, the method are that the sodium hydroxide that concentration is 30%-60% is added
Into thick zirconium chloride, make sodium hydroxide and thick zirconium chloride come into full contact with and with alchlor, the tetrachloro in thick zirconium chloride
SiClx reacts
Aluminium hydroxide, the sodium metasilicate of generation are colloidal, play flocculation in thick zirconium chloride solution, can accelerate
The rate of settling of other solid impurities, effectively improves dust removal rate in zirconium chloride.
Compared with the existing technology, the beneficial effects of the present invention are:
1, sodium hydroxide is added in thick zirconium chloride, makes alchlor in sodium hydroxide and thick zirconium chloride, four
The reaction such as silicon chloride, can reduce the content of alchlor, silicon tetrachloride impurity in thick zirconium chloride.
2, sodium hydroxide is reacted with alchlor, silicon tetrachloride generates colloidal aluminium hydroxide and sodium metasilicate, can play
Flocculation further decreases the solid impurity content in thick zirconium chloride, and can accelerate the rate of settling, effectively improves removal of impurities effect
Rate.Compared with traditional settling methods, a kind of thick zirconium chloride impurity removal and purification technique dust removal rate can be improved 30% with
On, while removing the impurity such as alchlor, the silicon tetrachloride being partly dissolved in thick zirconium chloride.
Specific embodiment
The present invention is further elaborated with reference to embodiments.
A kind of thick zirconium chloride impurity removal and purification technique, the method are sodium hydroxide, the hydrogen-oxygen for being 30%-60% by concentration
Change potassium or calcium hydroxide sodium hydroxide is added in thick zirconium chloride gas-liquid mixture or thick zirconium chloride liquid, thick zirconium chloride
Temperature is 20 DEG C -220 DEG C, and the adding proportion of sodium hydroxide and thick zirconium chloride is 1: 200-300, makes sodium hydroxide and thick tetrachloro
To change zirconium to come into full contact with, time of contact is 1-20min and reacts and answer with alchlor, the silicon tetrachloride in thick zirconium chloride,
Aluminium hydroxide, the sodium metasilicate of generation are colloidal, play flocculation in thick zirconium chloride solution, can accelerate zirconium chloride
In other solid impurities the rate of settling, effectively improve dust removal rate.
Embodiment 1:
A kind of thick zirconium chloride impurity removal and purification technique, sodium hydroxide use the material of weight components proportion: hydroxide
Sodium: water=45: 55.By sodium hydroxide, according to 1: 200 ratio, (sodium hydroxide: thick zirconium chloride=1: 200) spray is added to
In 20 DEG C of thick zirconium chloride gas-liquid mixture, sodium hydroxide and zirconium chloride is made to contact 3min, after sedimentation, solid separation,
The alchlor and content of silicon tetrachloride that may be implemented in thick four zirconium chloride reduce by 80%, and solid content reduces by 72%.
Embodiment 2:
A kind of thick zirconium chloride impurity removal and purification technique, sodium hydroxide use the material of weight components proportion: hydroxide
Sodium: water=45: 55.Sodium hydroxide (sodium hydroxide: thick zirconium chloride=1: 200) is added to 100 DEG C according to 1: 200 ratio
In liquid crude zirconium chloride, sodium hydroxide and four zirconium chlorides is made to contact 1min, after sedimentation, solid separation, may be implemented thick
Alchlor and content of silicon tetrachloride in zirconium chloride reduce by 78%, and solid content reduces by 76%.
Claims (1)
1. a kind of thick zirconium chloride impurity removal and purification technique, which is characterized in that the method is the hydrogen-oxygen for being 30%-60% by concentration
Change sodium to be added in thick zirconium chloride, make sodium hydroxide and thick zirconium chloride come into full contact with and with the tri-chlorination in thick zirconium chloride
Aluminium, silicon tetrachloride react, and generate aluminium hydroxide, silicate colloid, play flocculation in thick zirconium chloride solution,
The rate of settling for accelerating other solid impurities in zirconium chloride, to achieve the effect that removal of impurities.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711160293.XA CN109809483A (en) | 2017-11-20 | 2017-11-20 | A kind of thick zirconium chloride impurity removal and purification technique |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711160293.XA CN109809483A (en) | 2017-11-20 | 2017-11-20 | A kind of thick zirconium chloride impurity removal and purification technique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109809483A true CN109809483A (en) | 2019-05-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201711160293.XA Pending CN109809483A (en) | 2017-11-20 | 2017-11-20 | A kind of thick zirconium chloride impurity removal and purification technique |
Country Status (1)
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| CN (1) | CN109809483A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112079382A (en) * | 2020-09-21 | 2020-12-15 | 宝钛华神钛业有限公司 | Collecting device and collecting method for waste gas generated in purification process of crude zirconium tetrachloride |
| CN112206729A (en) * | 2020-11-24 | 2021-01-12 | 宝钛华神钛业有限公司 | Method for recovering aluminum chloride by aiming at crude zirconium tetrachloride purification seeds |
-
2017
- 2017-11-20 CN CN201711160293.XA patent/CN109809483A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112079382A (en) * | 2020-09-21 | 2020-12-15 | 宝钛华神钛业有限公司 | Collecting device and collecting method for waste gas generated in purification process of crude zirconium tetrachloride |
| CN112206729A (en) * | 2020-11-24 | 2021-01-12 | 宝钛华神钛业有限公司 | Method for recovering aluminum chloride by aiming at crude zirconium tetrachloride purification seeds |
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| Date | Code | Title | Description |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190528 |
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| WD01 | Invention patent application deemed withdrawn after publication |