CN109754902A - Glass composition for conducting composition - Google Patents
Glass composition for conducting composition Download PDFInfo
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- CN109754902A CN109754902A CN201711086959.1A CN201711086959A CN109754902A CN 109754902 A CN109754902 A CN 109754902A CN 201711086959 A CN201711086959 A CN 201711086959A CN 109754902 A CN109754902 A CN 109754902A
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Abstract
The present invention relates to the glass compositions for being used to form conducting composition.It include conducting metal particles, organic carrier and glass composition comprising tellurium oxide (TeO2), zinc oxide (ZnO) and lithia (Li2O) for the conducting composition in solar panel technology in one aspect of the present invention.
Description
Technical field
The present invention relates to the glass compositions for being used to form conducting composition.In one aspect of the present invention, it to be used for the sun
Conducting composition in energy panel technology comprising conducting metal particles, organic carrier and includes tellurium oxide (TeO2), oxygen
Change the glass composition of zinc (ZnO) and lithia (Li2O).
Background
Solar battery is the device that luminous energy is converted to electricity using photovoltaic effect.Solar energy is attractive green energy
Source, because it is sustainable and only generates on-contaminated by-product.Therefore, numerous studies have been put at present to develop to have and mention
High efficiency, while persistently reducing the solar battery of material and production cost.In operation, when light hits solar battery
When, a part of incident light is by surface reflection, and remaining is transmitted in solar battery.The photon of transmitted light is by usually by semiconductor
Material solar battery as made of silicon absorbs.The electronics for carrying out the energy excitation semiconductor material of self-absorption photon leaves its original
Son generates electron-hole pair.Then these electron-hole pairs are separated and be applied in solar cell surface by p-n junctions
Conductive electrode is collected.
Solar battery usually has the electroconductive paste for being applied to it on the front and back.Typical electroconductive paste includes conductive gold
Metal particles, frit and organic carrier.The positive batter for generally comprising silver is applied on the front of matrix for use as preceding electrode.One
In a little situations, frit is etched through the anti-reflection coating such as silicon nitride coating on Si-substrate surface when firing, and help is being led
Electrical contact is established between electric particle and silicon matrix.On the other hand, it is desirable that frit will not so aggressivity so that it is burning
P-n junction is shunted after system.For example, the frit of the lead comprising relatively high amount and bismuth oxide may damage anti-reflecting layer and make base
The p-n junction of matter is degraded.Accordingly, it is possible to endanger the electrical property of solar battery.Additionally, it is known that frit has wide melting temperature model
It encloses, so that they depend strongly on its composition and machined parameters and behavior.Thus, joined using the prediction glass processing of known glass material
Several and the behavior under quick method for cooking ability is difficult.Further, since lead and bismuth are the elements toxic to environment, reason
What is thought is to reduce or eliminate its use in electroconductive paste.Conventional electroconductive paste must also adhere well in following matrix with
It is mechanically and structurally upper reliable.
Therefore, it is necessary to improve the electrical contact between electroconductive paste and following matrix by improvement transmitting weight to change to realize
Into solar battery efficiency glass composition.Improved total battery performance is also by for example higher short-circuit voltage, lower
The preferable adhesive force and higher electric current of series resistance, electrode in matrix indicate.The glass composition should not so be corroded
Property so that they damage anti-reflecting layers and p-n junction.In addition, reducing or eliminating toxic lead and bismuth oxygen for environment and health
The existing glass composition of compound is ideal.In addition, it is desirable to which there is wider process window and more predictable melt row
For frit.Finally, the frit for improving the adhesive force on electroconductive paste silicon matrix below is ideal.
It summarizes
One aspect of the present invention is related to conducting composition, it includes conducting metal particles, at least one glass composition and organic
Carrier, the glass composition include that the total weight based on glass composition has the tellurium oxide for being at least about 70 weight % altogether
(TeO2), zinc oxide (ZnO) and lithia (Li2O),.At least one glass composition preferably comprises less than about 5 weight %'s
Bismuth oxide (Bi2O3) and lead oxide (PbO).When Bi2O3 is present in glass composition, the weight ratio of Bi2O3 and ZnO are preferred
Less than about 0.15.It is at least 2 weight % that at least one glass composition, which preferably comprises the total weight based on glass composition,
Li2O。
Another aspect of the present invention is related to conducting composition, it includes conducting metal particles, at least one glass composition,
And organic carrier, the glass composition include tellurium oxide (TeO2), zinc oxide (ZnO) and the total weight based on glass composition
Lithia (Li2O) more than about 1 weight %.The total amount of TeO2, ZnO and Li2O are based on glass at least one glass composition
The total weight of glass composition is at least about 70 weight %, and the weight ratio of (a) TeO2 and (b) ZnO and Li2O is about 1-25, preferably
About 2-15.At least one glass composition preferably comprises less than about 5 weight % bismuth oxides (Bi2O3), more preferably less than about 2.5 weights
Measure % (such as less than about 2.0 weight %) and lead oxide (PbO).At least one glass composition is preferably comprised based on glass
The total weight of composition is the Li2O of at least 2 weight %.
Another aspect of the present invention is related to conducting composition, it includes conducting metal particles, at least one glass composition,
And organic carrier, the glass composition include tellurium oxide (TeO2), zinc oxide (ZnO) and the total weight based on glass composition
Lithia (Li2O) more than about 1 weight %.The total amount of TeO2, ZnO and Li2O are based on glass at least one glass composition
The total weight of glass composition is at least about 70 weight %, and the weight ratio of ZnO and Li2O is about 0.5-25, preferably from about 1-20.?
In one preferred embodiment, glass composition include more than 1.0 weight %Li2O (for example, at least 1.1,1.2,1.5,1.6,
1.7,1.8,1.9 or 2.0 weight %).In one embodiment, the weight ratio of ZnO and Li2O is about 1-25, preferably from about 2-
15.The combined amount of bismuth oxide (Bi2O3) and lead oxide (PbO) is based on glass composition in at least one glass composition
100% total weight is preferably less than about 5 weight %, more preferably less than about 2.5 weight % (such as less than about 2.0 weight %).
Another aspect of the present invention is conducting compositions, it includes conducting metal particles, at least one glass composition, and
Organic carrier, the glass composition include tellurium oxide (TeO2), zinc oxide (ZnO) and lithia (Li2O).(a) Li2O with
(b) weight ratio of the combined amount of TeO2 and Li2O is about 0.001-0.3 (preferably from about 0.001-0.15), and (a) ZnO and (b)
The weight ratio of the combined amount of TeO2 and ZnO is about 0.001-0.35, preferably from about 0.005-0.35.At least one glass composition
The combined amount of middle bismuth oxide (Bi2O3) and lead oxide (PbO) is preferably less than about 5 weight %, more preferably less than about 2.5 weight %
(such as less than about 2.0 weight %).In a preferred embodiment, glass composition includes to be more than 1.0 weight %Li2O (examples
Such as at least 1.1,1.2,1.5,1.6,1.7,1.8,1.9 or 2.0 weight %).
The present invention also provides what is produced and conducting composition of the present invention is applied on silicon wafer and fires silicon wafer
Solar battery.Another aspect of the present invention is the solar cell modules that solar battery is electrically interconnected comprising the present invention.
The present invention further provides the methods of production solar battery comprising step: providing has front and back
Electroconductive paste of the present invention is applied on silicon wafer (such as front of chip), and silicon wafer is fired by silicon wafer.
It is described in detail
The present invention relates to the glass compositions preferably with low lead and/or bi content or without lead and/or bismuth.Preferably at one
In embodiment, glass composition is unleaded and/or without bismuth.While not limited to the application, glass composition of the present invention is available
In conducting composition, such as in those of the electrode that is used to form on solar battery.Conducting composition of the present invention is preferred
Include conducting metal particles, organic carrier and the glass composition.Conducting composition can further include one or more
Additive.
Conducting composition may include glass composition (preferably unleaded and/or without bismuth glass composition) or add in physics
Work (such as mechanochemistry processing, crush or grinding) or chemical process (such as fire, thermal decomposition or light or radiation chemistry point
Solution) during formed glass compound (such as organo-metallic compound, salt) combination.In other embodiments, glass is formed
The element of glass composition be may be present in one-component or be distributed in two or more components, and the component can be nothing
Setting, crystallization or partially crystallizable.
When be applied to silicon solar cell when, it is this kind of paste can be used on the front or the back side of silicon wafer formed electric contacting layer or
Electrode.In a preferred embodiment, electroconductive paste is in the front of the silicon wafer for solar battery, and includes silver-colored conductive
Particle, glass composition of the present invention and organic carrier.
Glass composition
Glass composition of the present invention is used as multiple functions when in conducting composition.Firstly, glass mentions for conductive particle
For pumped (conveying) medium, them is allowed to migrate from paste to the interface of semiconductor substrate.Glass also for paste component provide reaction medium with
Physical and chemical reaction is subjected on interface when being subjected to raised temperature.Physical reactions include but is not limited to melt, dissolution, expand
It dissipates, sintering, precipitate and crystallize.Chemical reaction includes but is not limited to synthesize (forming new chemical bond) and decomposition, reduction and oxidation,
And phase transformation.In addition, glass acts also as adhesion medium, the combination between conductive particle and semiconductor substrate is provided, is thus improved
Electrical contact performance during the service life of solar device.It is existing due to the insulation performance of glass although being intended to realize same effect
Glass composition can generate high contact resistance on the interface of electroconductive paste and silicon wafer.Glass composition of the present invention is defeated needed for providing
It send, reactive and adhesion medium, and reduces contact resistance and improve total battery performance.Improved total battery performance is also by for example
The preferable adhesive force and higher electric current of higher short-circuit voltage, lower series resistance, electrode in matrix indicate.
Without being bound by any particular theory, it is believed that glass provides conductive particle and semiconductor substrate (example in solar battery
Such as silicon matrix) between improved ohm and Schottky contacts.Glass is the reaction-ability medium relative to silicon and produces on silicon matrix
Liveliness proof area, which improve total contacts, such as by directly contacting or tunnelling.Improved contact performance provides better ohm
Contact and Schottky contacts, and therefore better total solar cell properties.It is provided in addition, glass ingredient is combined with specific quantity
With widen the glass transition temperature of range, softening temperature, melting temperature, crystallization temperature and flowing temperature paste, therefore open up
The process window that wide gained is pasted.This allows gained electroconductive paste to have the improved compatibility with a variety of matrix.
According to a preferred embodiment, glass composition has suboxides lead content.According to another preferred embodiment,
Glass composition is unleaded.As described herein, term " low lead content ", which refers to, has at least 0.5 weight % and less than about 5 weights
Measure %, such as less than about 4 weight %, less than about 3 weight %, less than about 2 weight %, less than about 1 weight % and less than about 0.8 weight
Measure the composition of the oxidation lead content of %.As described herein, term " unleaded " refers to having less than about 0.5 weight %, preferably less than
About 0.4 weight %, more preferably less than about 0.3 weight %, more preferably less than about 0.2 weight %, most preferably less than about 0.1 weight %
The composition of the oxidation lead content of lead oxide (100% total weight based on glass composition).In a more preferred embodiment,
Glass composition includes less than about 0.01 weight % lead oxide, can be used as the incidental impurities from other glass ingredients and exists.
In a preferred embodiment, glass composition does not include any lead oxide being deliberately added.
According to another preferred embodiment, glass composition has low bismuth oxide content.According to another preferred embodiment
For no bismuth.As described herein, term " low bi content ", which refers to, has at least 0.5 weight % and less than about 5 weight %, such as less than
The bismuth oxide of about 4 weight %, less than about 3 weight %, less than about 2 weight %, less than about 1 weight % and less than about 0.8 weight %
The composition of content.As described herein, term " no bismuth " refers to having less than about 0.5 weight %, preferably less than about 0.4 weight %,
More preferably less than about 0.3 weight %, more preferably less than about 0.2 weight %, most preferably less than about 0.1 weight % (are based on glass group
Close object 100% total weight) oxidation bi content composition.In a more preferred embodiment, glass composition includes few
In about 0.01 weight % bismuth oxide, it can be used as the incidental impurities from other glass ingredients and exist.A preferred implementation side
In case, glass composition does not include any bismuth oxide being deliberately added.
In one embodiment, 100% total weight of the total amount of Bi2O3 and PbO together based on glass composition is preferred
For less than 5 weight %, more preferably less than 3 weight %, more preferably less than 2.5 weight %, most preferably in less than 2.0 weight %.Most
In preferred embodiment, glass composition is unleaded and without bismuth.
Glass composition includes tellurium oxide (TeO2), lithia (Li2O) and zinc oxide (ZnO).In an embodiment
In, glass composition also includes sodium oxide molybdena (Na2O).
In at least one embodiment, 100% total weight of the total amount of TeO2, Li2O and ZnO based on glass composition
It is at least 50 weight %, preferably at least 60 weight %, most preferably at least 70 weight %.In other embodiments, the weight of component
Measuring ratio can be one of the following or any combination:
● Bi2O3:ZnO is less than about 0.15 preferably less than about 0.13;
● TeO2:(ZnO+Li2O) it is about 1-25, preferably from about 2-15, more preferably from about 3-15, most preferably from about 3.5-15;
● ZnO:Li2O is about 0.5-25, preferably from about 1-20, more preferably from about 1-15;
● Li2O:(TeO2+Li2O) it is about 0.001-0.3, preferably 0.001-0.15;With
● ZnO:(TeO2+ZnO) it is about 0.001-0.35, preferably 0.005-0.35.
In another embodiment, the weight ratio of component can be one of the following or any combination:
● TeO2:(ZnO+Li2O) it is about 1-35, preferably from about 2-20 (such as 4-11);
● ZnO:Li2O is about 0.2-25, preferably 0.5-20, more preferable 1-20 (such as 1-7);
● Li2O:(TeO2+Li2O) it is about 0.001-0.3, preferably 0.01-0.2 (such as 0.02-0.06);With
● ZnO:(TeO2+ZnO) it is about 0.005-0.5, preferably 0.02-0.3 (such as 0.07-0.15).
It is about 50-99.4 weight % that glass composition, which preferably comprises 100% total weight based on TeO2, ZnO and Li2O,
TeO2, more preferably from about 65-97 weight %, most preferably from about 74-95 weight %.In a preferred embodiment, glass composition
Include the no more than about 95 weight %TeO2 of 100% total weight based on entire glass composition, preferably no more than about 93 weight %
TeO2, most preferably no more than about 90 weight %TeO2.In another preferred embodiment of the present, glass composition includes to be based on entire glass
100% total weight of glass composition is at least 40 weight %TeO2, preferably at least about 50 weight %TeO2, most preferably at least about 60
Weight %TeO2.
In another embodiment, the amount of Li2O is preferably more than about 1 based on 100% total weight of TeO2, ZnO and Li2O
Weight %.It is about 0.1-15 weight %Li2O that glass composition, which preferably comprises 100% total weight based on TeO2, ZnO and Li2O,
More preferably from about 1-10 weight %Li2O, most preferably from about 1-7 weight %Li2O.In a preferred embodiment, glass composition
Comprising 100% total weight based on entire glass composition be at least 1 weight %Li2O (for example, at least about 1.0,1.1,1.2,
1.5,1.6,1.7,1.8 and 1.9 weight %), preferably at least 2 weight %Li2O.In another embodiment, glass composition is excellent
Choosing includes 100% total weight based on entire glass composition no more than about 15 weight %Li2O, preferably no more than about 12 weights
Measure %, most preferably no more than about 10 weight %.
Glass composition preferably comprises 100% total weight based on TeO2, ZnO and Li2O more than about 1 weight %ZnO.?
In one embodiment, glass composition includes the 100% total weight about 0.5-35 weight % based on TeO2, ZnO and Li2O
ZnO, preferably from about 2-25 weight %ZnO, most preferably from about 4-19 weight %ZnO.
In another embodiment, glass composition further includes 100% total weight based on glass composition at least
About 0.1 weight %Na2O.In one embodiment, glass composition includes about 0.1-5 weight %Na2O, preferably from about 0.1-4
Weight %Na2O, most preferably from about 0.1-3 weight %Na2O.In one embodiment, glass composition does not include Na2O.
Glass composition may include glass material, ceramic material, form reaction at elevated temperatures as is generally known in the art
Any other compound of property matrix.In one embodiment, glass composition may include at least one essentially amorphous glass
Glass material.In another embodiment, glass composition in combination with crystalline phase or compound or amorphous, partially crystallizable and/or
The mixture of crystalline material.Glass composition also may include other oxide or compound as known in the art.For example, can make
With boron, aluminium, gallium, silicon, nickel, tungsten, gadolinium, tantalum, antimony, cerium, zirconium, titanium, manganese, tin, ruthenium, cobalt, iron, copper and chromium or its at least two it is any
The oxide for combining (preferably calcium halophosphate activated by antimony andmanganese, nickel, tungsten and ruthenium or its at least two combination) can produce those metal oxygens when firing
At least two mixture in the compound of compound or above-mentioned metal, at least two mixture, is burning in above-mentioned oxide
Any two kind are can produce in the above compound of those metal oxides at least two mixture or said components when processed
Or more mixture.Other glass matrix forming agents or glass modifier, such as germanium oxide, vanadium oxide, molybdenum oxide, niobium
Oxide, indium oxide, phosphorous oxides, rare-earth oxide, alkali metal oxide, alkaline earth oxide, metal tripolyphosphate
Salt and metal halide (such as zinc fluoride) and chalcogenide also can be used as additive for adjusting total glass composition
Performance, such as glass transition temperature.In one embodiment, glass composition may include at least one glass and at least
A kind of combination of oxide or additive.In one embodiment, glass composition includes 100% based on glass composition
The total weight other oxides of at least about 0.1 weight % and/or additive and no more than about 50 weight %, preferably no more than about 40 weights
Measure %, more preferably no more than about 30 weight %, most preferably no more than about 20 this type oxide of weight % and/or additive.For example,
In one embodiment, glass composition may include MgO, TiO2, SiO2, B2O3, Na2O, K2O, CaO, SrO, BaO,
V2O5, MoO3, Cr2O3, WO3, MnO, Al2O3, P2O5, CdO, Ag2O, AgI, AgBr, AgCl or combinations thereof.
Glass composition can be formed by any method known in the art, including solid-state is synthesized, melts and is quenched or it
Its ChimieDouce (softening is learned) method.In typical melting and method of quenching, first step is that suitable raw material is (logical
Often it is powder type) mixing.The mixture is heated in air or in oxygen-containing atmosphere to form melt.Melt is rapid
It is cold, then by its grinding, ball milling and/or screening, to provide the mixture with required granularity.For example, can be by powder type
Component is mixed together in V-comb mixing machine.Then by mixture heating (such as to about 800-1200 DEG C) about 30-40 minutes
So that raw material can react to form single glass system.Then the system is quenched, sand shape consistency is presented.The corase meal is for example in ball milling
It is ground in machine or jet mill, until generating fine powder.Glass particle can be ground to about 0.01-20 μm, preferably from about 0.1-5 μm flat
Equal granularity (d50).In one embodiment, glass particle can form the nano-scale particle of the d50 with about 1 to about 100nm.
ChimieDouce (softening learn) method about 20 DEG C to about 500 DEG C at a temperature of carry out.ChimieDouce reaction
For topotactic reaction, it is intended that the structural element of reactant is kept in the product, but is formed and changed.Such methods include but unlimited
In sol-gel process, precipitating, the hot method of hydrothermal/solvent and pyrolysis.Conventional solid synthesis can also be used for preparing glass described herein
Glass composition.In the method, coarse raw materials are sealed under vacuum in vitreosil pipe or tantalum or platinotron, are then heated to
About 700-1200 DEG C.Material keeps about 12-48 hours at the raised temperature, and then Slow cooling (about 0.1 DEG C/min) is extremely
Room temperature.In some cases, solid-state reaction can carry out in air in alumina crucible.Prepare the another side of glass composition
Method is co-precipitation.In the method, by adjusting pH it is horizontal or and being incorporated to reducing agent by metallic element reduction and and its
Its metal oxide or hydroxide co-precipitation are to form the solution comprising metal cation.Then by these metals, metal oxygen
Compound or the drying precipitate of hydroxide are simultaneously fired under vacuum at about 400-800 DEG C to form fine powder.
According to an embodiment of the invention, glass composition has the required firing temperature glass below in electroconductive paste
Change transformetion range (Tg).Preferred glass composition is at least about 150 DEG C, preferably at least 180 DEG C, most preferably at least
210 DEG C of Tg range.Meanwhile when being measured using thermodynamic analysis, preferred glass material has no more than about 750 DEG C, excellent
Choosing is not greater than about 700 DEG C, most preferably no greater than about 650 DEG C of Tg range.Specifically, DSC can be used in glass transition temperature
Equipment, such as TAInstrumentsSDTQ600SimultaneousTGA/DSC (TAInstruments) measurement.For measurement
And data assessment, using Survey Software TAUniversalAnalysis2000, V4.5A.As the disk for reference and sample,
Use the alumina sample cup (commercially available by TAInstruments) of the volume of the diameter with 6.8mm and about 90 μ l.By about 20-
The sample of the amount of 50mg is put into tray sample with the accuracy weighing of 0.01mg.Empty reference dish and tray sample are put into equipment,
Stove is closed and starts to measure.The heating of 10-50 DEG C/min is used to 1000 DEG C of final temperature from 25 DEG C of initial temperature
Rate.Always the surplus in instrument is cleaned with nitrogen (N25.0), and with synthesis of air, (80%N2 and 20%O2 come by stove
It is cleaned from Linde) with the flow velocity of 50ml/min.The first step of DSC signal is glass transition using above-mentioned software evaluation, and is surveyed
Fixed initial value is considered the temperature of Tg.
Glass particle well known in the art can show various shapes, size and coating.For example, a large amount of shapes of glass particle
It is as known in the art.Some examples include (plate, the piece) of spherical, angular, elongated (stick or needle-shaped) peace.Glass
The combination that particle also can be used as the particle of different shape (such as ball and piece) exists.It is preferred that having to the advantageous of generated electrode
The glass particle for helpful shape or the combination of shapes of adhering.
Median particle diameter d50 is particle characteristic well known in the art.D50 is the intermediate value of median diameter or size distribution.It
It is in cumulative distribution 50% particle size values.Size distribution can by laser diffraction, dynamic light scattering, imaging, electrophoretic light scattering or
Any other method measurement known in the art.The HoribaLA-910 being connected on the computer with LA-910 software program
Laser diffraction particle size analyzer is used to measure the size distribution of frit.Artificial selection frit glass particles is opposite from LA-910
Refractive index simultaneously enters in software program.The appropriate filler line that will be filled in test cabinet in deionized water to tank.Then by using
Circulation and agitating function in software program recycle solution.After 1 minute, solution is discharged.This repeat in addition once with
Ensure that room removes any residual materials.Then deionized water third time in room is filled and it is made to recycle and stir 1 minute.It is logical
Cross any background particle eliminated in solution using the blank function in software.Then start ultrasonic agitation, and by frit
It is slowly added in the solution in test cabinet until transmissivity item is in the suitable area in software program.When transmissivity is correct horizontal
When, laser diffraction analysis is run, the size distribution of glass is measured and is provided as d50.In a preferred embodiment, glass
The median particle diameter d50 of particle is at least about 0.1 μm, and is preferably no greater than about 20 μm, more preferably not greater than about 10 μm, more preferably not
Greater than about 5 μm, most preferably no greater than about 3 μm.
Specific surface area is also particle characteristics well known in the art.As described herein, the measurement of all surface product uses BET
(Brunauer-Emmett-Teller) method by operated according to SMART method MonosorbMS-22 analyzer (by
QuantachromeInstrumentsofBoyntonBeach, Florida production) it carries out.It prepares and is used in built-in degasification station
The sample of analysis.Flowing gas removes impurity, generates the clean surface that can be adsorbed on it.Sample can be added with what is provided
Heat cover is heated to the selectable temperature of user.Digital temperature control and display are mounted on instrument panel.It is complete in degasification
After, sample cell is transferred to analysis station.Quick coupling fittings automatically seal sample cell during transfer.With single button
It pushes, starts to analyze.Dewar flask filled with coolant automatically increases, and impregnates sample cell and causes to adsorb.Instrument detection
It arrives, when (2-3 minutes) are completed in absorption, automatically reduces Dewar flask, and leniently will examination using built-in hot air blowers
Heat back room temperature in sample pond.Therefore, desorption gas signal is shown on digital instrument, and surface area is directly displayed and shown in front panel
Show on device.Entire measurement (the absorption and desorption) period usually needs to be less than 6 minutes.The technology is detected using highly sensitive thermal conductivity
Device measurement adsorbate/inert carrier gas mixture concentration when inspiration row is conciliate in absorption changes.When pass through airborne electronic equipment device
When part is integrated and compared with calibration, detector provides the volume of absorption or desorption gas.Built-in miniature processor ensures linearly simultaneously
The BET surface area for automatically calculating sample, is indicated with m2/g.In one embodiment, glass particle has at least about
0.1m2/g and be not greater than about 15m2/g, preferably at least about 1m2/g and be not greater than about 10m2/g specific surface area.
Conducting composition
One aspect of the present invention is related to conducting composition.Required electroconductive paste is for highly conductive so that the electrical property of gained solar battery
It can optimized electroconductive paste.Conducting composition generally comprises metallic particles, organic carrier and at least one glass described herein
Composition.According to an embodiment, electroconductive paste includes: (i) at least about 50 weight % and no more than about 95 weight % metals
Grain;(ii) at least about 0.1 weight % and no more than about 10 weight % glass;(iii) at least about 1 weight % and no more than about 25
Weight % organic carrier (100% total weight based on paste).
In a preferred embodiment, conducting composition includes at least about 0.1 weight % glass composition, preferably extremely
Few about 0.5 weight %.Meanwhile paste includes the no more than about 10 weight % glass compositions of 100% total weight based on paste, preferably not
More than about 8 weight %, most preferably no more than about 6 weight %.
Conducting metal particles
Electroconductive paste includes conducting metal particles.Electroconductive paste may include at least about 50 weight % metals of 100% total weight based on paste
Particle, preferably at least about 60 weight %, more preferably at least about 70 weight %, most preferably at least about 80 weight %.Meanwhile paste is preferred
Include the no more than about 95 weight % metallic particles of 100% total weight based on paste.
It can be used as is generally known in the art and think all metallic particles suitable for electroconductive paste.Preferably metallic particles is
It shows those of high conductivity, generates the electricity with high efficiency and fill factor and low series resistance and grid resistance
Pole.Preferred metallic particles is metal element, alloy, metal derivative, the mixture of at least two metals, at least two alloys
Mixture or at least one metal and at least one alloy mixture.Preferred metal includes silver, aluminium, gold, copper and mickel
And its at least one of alloy or mixture.In a preferred embodiment, metallic particles includes silver.In another preferred reality
It applies in scheme, metallic particles includes silver and aluminium.Suitable silver derivative includes such as silver alloy and/or silver salt, such as silver-colored halogenation
Object (such as silver chlorate), silver nitrate, silver acetate, silver trifluoroacetate, silver orthophosphate and combinations thereof.In one embodiment, golden
Metal particles include the metal or alloy for being coated with one or more kinds of different metals or alloy, such as are coated with Argent grain or the painting of aluminium
There is the copper particle of silver.
Such as glass particle, metallic particles can show a variety of shapes and sizes.Metallic particles also can be used as different shape
The combination of the particle of (such as ball and piece) exists.It is preferred that having the metal to the advantageous shape of improved conductivity or combination of shapes
Particle.A kind of method for characterizing surface nature of this kind of shape without considering particle is by following parameter: length, width and thickness
Degree.In the context of the present invention, the length of particle is provided by the length of longest space displacement vector, two endpoint is included in
In particle.The width of particle is provided by the length of the longest space displacement vector perpendicular to length vector defined above,
Two endpoint is included in particle.The thickness of particle by perpendicular to length vector defined above and width vector most
Long spacing displacement vector provides, two endpoint is included in particle.In one embodiment, it is preferred to have as far as possible uniformly
Shape (i.e. wherein about length, width and thickness ratio as close possible to 1;Preferably at least 0.7, more preferably at least 0.8, most
Preferably at least 0.9, and preferably no greater than about 1.5, preferably no greater than about 1.3, most preferably no greater than about 1.2 shape) metal
Particle.In this embodiment, the example of the preferable shape of metallic particles is spherical and cube or combinations thereof or it is a kind of
Or a variety of and other shapes of combination.In another embodiment, preferably there is the metallic particles of the shape of low uniformity, preferably
About length, the size of width and thickness than at least one of be about 1.5 or more, more preferably from about 3 or more, most preferably from about 5 with
On.It is piece type, stick or needle-like or piece type, stick or needle-like and other shapes of combination according to the preferable shape of the embodiment.
It is preferred that the median particle diameter d50 (use is measured with the identical method described in glass particle) of metallic particles is at least
About 0.1 μm, and it is preferably no greater than about 10 μm, preferably no greater than about 8 μm, more preferably not greater than about 7 μm, most preferably no greater than about 5 μ
m.In addition, metallic particles have at least about 0.1m2/g and no more than about 10m2/g specific surface area (use with about glass particle
The identical method measurement).According to a preferred embodiment, using at least about 0.2m2/g, preferably at least 0.5m2/
G, and the silver powder of the specific surface area no more than about 5m2/g simultaneously.
It is preferred that contributing other components of more favorable contact performance and conductivity.For example, metallic particles can have surface painting
Layer.As is generally known in the art and it is considered suitable to this any type coating in the context of the invention and can be used on metallic particles.Preferably
Coating is those of the adhesiveness for promoting gained electroconductive paste coating.If there is the coating, then preferred coatings are based on metal
100% total weight of grain is no more than about 10 weight %, preferably no more than about 8 weight %, most preferably no more than about 5 weight %.
Organic carrier
Electroconductive paste of the present invention also may include organic carrier.In one embodiment, organic carrier is with 100% gross weight based on paste
Measure at least about 0.01 weight % and no more than about 50 weight %, preferably no more than about 30 weight %, most preferably no more than about 20 weights
The amount of amount % is present in electroconductive paste.
In the context of the present invention preferred organic carrier be based on one or more solvents, preferable organic solvent it is molten
Liquid, lotion or dispersion, ensure the component of electroconductive paste with dissolve, emulsify or discrete form exist.Preferably organic carrier is
The optimum stabilization of the component of electroconductive paste is provided and assigns those of the viscosity that paste allows effective printing.
In one embodiment, organic carrier includes organic solvent and optional adhesive (such as polymer), surface
One of activating agent and thixotropic agent are a variety of.For example, in one embodiment, organic carrier includes in organic solvent
One or more adhesives.
Preferred adhesive is to contribute to form with favourable stability, impressionability, viscosity in the context of the present invention
Those of with the electroconductive paste of sintering character.As is generally known in the art and think that all adhesives suitable for the context of the invention can
As the adhesive in organic carrier.Preferred adhesive (its classification for generally falling into referred to as " resin ") is polymer-bonded
Agent, monomeric cement and the combined adhesive for polymer and monomer.Polymer adhesive can also be wherein at least two
A different monomeric unit includes the copolymer in single molecule.Preferred polymer adhesive is band in the polymer backbone
There is in those of those of functional group, main chain tyre functional group and main chain and all has outside main chain those of functional group.It is preferred that
Main chain in the polymer with functional group be such as polyester, replace polyester, polycarbonate, replace polycarbonate, band in main chain
There is the polymer of cyclic group, glycan, replaces glycan, polyurethane, replace polyurethane, polyamide, replace polyamide, phenolic aldehyde tree
Rouge, substituted phenolic resin, one or more aforementioned polymers monomer optionally with the copolymer of other comonomers or its at least
Two kinds of combination.According to an embodiment, adhesive can be polyvinyl butyral or polyethylene.Band in preferred main chain
The polymer for having cyclic group be such as polyvinyl butyl alcohol ester (PVB) and its derivative and poly- terpineol and its derivative or its
Mixture.Preferred glycan is such as cellulose and its alkyl derivative, preferably methylcellulose, ethyl cellulose, ethoxy
Cellulose, propyl cellulose, hydroxypropyl cellulose, butyl cellulose and its derivative and its at least two mixture.It is other
Preferred polymer is cellulose ester resin, such as cellulose-acetate propionate, cellulose acetate-butyrate and any combination thereof.It is preferred that
Host polymer chain outside have functional group polymer be with those of amide group, with acid and/or those of ester group,
Commonly referred to as acrylic resin, or the combined polymer with above-mentioned functional group, or combinations thereof.It is had outside preferred main chain
The polymer of amide is such as polyvinylpyrrolidone (PVP) and its derivative.Acid and/or ester group are had outside preferred main chain
Polymer be such as polyacrylic acid and its derivative, polymethacrylates (PMA) and its derivative or polymethylacrylic acid
Or mixtures thereof methyl esters (PMMA) and its derivative,.Preferred monomeric cement is ethylene glycol monomer, terpin alcohol resin or pine
Or mixtures thereof fragrant derivative,.Be preferably based on ethylene glycol monomeric cement be with those of ether group, ester group, or
Person has those of ether group and ester group, and preferred ether group is methyl, ethyl, propyl, butyl, amyl, hexyl and higher
Grade alkyl ether, preferred ester group are acetic acid esters and its alkyl derivative, preferably ethylene glycol monobutyl ether monoacetate or it is mixed
Close object.Alkylcellulose, preferred, ethyl, its derivative and its with from aforementioned listed adhesive or other adhesives
The mixture of other adhesives is most preferred adhesive in the context of the invention.Adhesive can be based on organic carrier
The amount of 100% total weight at least about 0.1 weight %, preferably at least about 0.5 weight % exist.Meanwhile adhesive can be to be based on
100% total weight of organic carrier no more than about 10 weight %, preferably no more than about 8 weight %, more preferably no more than about 7 weights
The amount for measuring % exists.
Preferred solvent is the component removed from paste to obvious degree during firing.It is preferred that they are after firing
To reduce at least about 80% than before with firing, the absolute weight for preferably reducing at least about 95% than before with firing is deposited
?.Preferred solvent is to contribute those of advantageous viscosity, impressionability, stability and sintering characteristic.As is generally known in the art and
Being considered suitable to all solvents in the context of the invention can be used as solvent in organic carrier.Preferred solvent is in standard environment
Temperature and pressure (SATP) (298.15K, 25 DEG C, 77 °F) exists as liquid under 100kPa (14.504psi, 0.986atm)
Those of, preferably there is those of the fusing point of about 90 DEG C or more of -20 DEG C of boiling point peace treaty.Preferred solvent is polarity or nonpolarity
, proton or non-proton, aromatics or non-aromatic.Preferred solvent be single methanol, glycol, polyalcohol, monoesters, diester, polyester,
Monoether, diether, polyethers, at least one of functional group comprising these classifications or a variety of optionally include the function of other classifications
Alcohol groups that group, preferably cyclic group, aromatic group, unsaturated bond, one or more O atom are exchanged for heteroatoms, one or
The solvent for the ester group that ether group that multiple O atoms are exchanged for heteroatoms, one or more O atoms are exchanged for heteroatoms, and
The mixture of two or more in above-mentioned solvent.Preferred ester is the dialkyl ester of adipic acid herein, wherein preferably
Alkyl component is the group of methyl, ethyl, propyl, butyl, amyl, hexyl and more advanced alkyl or two different this kind of alkyl
It closes, preferably the mixture of dimethyl adipate and two or more adipate esters.Preferred ether is diether herein, excellent
The dialkyl ether of ethylene glycol is selected, wherein preferred alkyl component is methyl, ethyl, propyl, butyl, amyl, hexyl and more advanced
The combination of alkyl or two different this kind of alkyl and the mixture of two kinds of diether.Preferred alcohol is primary, secondary and tertiary herein
Alcohol, the preferably tertiary alcohol, wherein it is preferred that the mixture of terpineol and its derivative or two or more alcohol.Preferred combination is more
In a different functional groups solvent be 2,2,4- trimethyl -1,3- pentanediol mono isobutyrates, commonly referred to as texanol, and
Its derivative, 2- (2- ethoxy ethoxy) ethyl alcohol, commonly referred to as carbitol, alkyl derivative, preferably methyl, ethyl, third
Base, butyl, amyl and hexyl Carbitol, preferably hexyl Carbitol or butyl carbitol and its acetic ester derivative, preferably butyl
Carbitol acetate, or at least two mixture among the above.Organic solvent can be with 100% gross weight based on organic carrier
At least about 60 weight % are measured, the amount of more preferably at least about 70 weight %, most preferably at least about 80 weight % exist.Meanwhile it is organic
Solvent can with the no more than about 99 weight % of 100% total weight based on organic carrier, more preferably no more than about 95 weight %'s
Amount exists.
Organic carrier also may include one or more surfactants and/or additive.Preferred surfactant is to have
Help to be formed those of the electroconductive paste with advantageous stability, impressionability, viscosity and sintering character.As is generally known in the art and
Being considered suitable to all surface activating agent in the context of the invention can be used as surfactant in organic carrier.Preferred surface
Activating agent is based on those of linear chain, branch, chains of aromatic, fluorination chain, siloxane chain, polyether chain and combinations thereof.Preferred table
Face activating agent is including but not limited to single-stranded, double-strand or multichain polymer.Preferred surfactant can have nonionic, yin from
Son, cation, amphiphilic or zwitterionic head.Preferred surfactant can for polymerization and monomer or mixtures thereof.
Preferred surfactant can have pigment affinity group, hydroxyl-functional carboxylate preferably with pigment affinity group (such as
Produced by BYKUSA, Inc.), the acrylate copolymer (such as being produced by BYKUSA, Inc.) with pigment affinity group, tool
There is the modified polyether (such as DISPERS655, produced by EvonikTegoChemieGmbH) of pigment affinity group, there is Gao Yan
Expect other surfactants (such as DISPERS662C, produced by EvonikTegoChemieGmbH) of affinity group.Do not exist
Other preferred polymers in above-listed include but be not limited to polyethylene glycol oxide, polyethylene glycol and its derivative and alkyl carboxylic acid and
Or mixtures thereof its derivative or salt,.Preferred polyethyleneglycol derivative is poly(ethylene glycol) acetic acid.Preferably alkyl carboxylic acid is
With those of fully saturated alkyl chain and with those of single or multiple unsaturated alkyl chain or its mixture.Preferably have
The carboxylic acid of saturated alkyl chain be those of the alkyl chain length with about 8 to about 20 carbon atoms, preferably C9H19COOH (capric acid),
C11H23COOH (lauric acid), C13H27COOH (myristic acid), C15H31COOH (palmitinic acid), C17H35COOH are (stearic
Acid) or its salt or mixture.The preferred carboxylic acid with unsaturated alkyl chain is C18H34O2 (oleic acid) and C18H32O2
(linoleic acid).Preferred monomcric surfactant is benzotriazole and its derivative.If it exists, surfactant can base
In organic carrier 100% total weight be at least about 0.01 weight %.Meanwhile surfactant based on organic carrier 100%
Total weight preferably no more than about 10 weight %, preferably no more than about 8 weight %, more preferably no more than about 6 weight %.
Additive in preferred organic carrier be different from said components and contribute to the advantageous property of electroconductive paste if any
Those of sharp viscosity, impressionability, stability and sintering characteristic material.It can be used as is generally known in the art and be considered suitable to the present invention
Additive in context.Preferred additive include but is not limited to thixotropic agent, viscosity modifier, stabilizer, inorganic additive,
Thickener, emulsifier, dispersing agent and pH adjusting agent.Preferred thixotropic agent includes but is not limited to carboxylic acid derivates, preferred fatty acid
Derivative or combinations thereof.Preferred derivative of fatty acid includes but is not limited to C9H19COOH (capric acid), C11H23COOH (laurel
Acid), C13H27COOH (myristic acid), C15H31COOH (palmitinic acid), C17H35COOH (stearic acid), C18H34O2 (oil
Acid), C18H32O2 (linoleic acid) and combinations thereof.Herein, preferably the group comprising fatty acid is combined into castor oil.
Additive
According to another embodiment, electroconductive paste may include the additive different from conductive particle, glass and organic carrier.Preferably
Additive contributes to the raising performance of electroconductive paste, its electrode generated or gained solar battery.As is generally known in the art and think
It can be used as the additive in electroconductive paste suitable for all additives in the context of the invention.Preferably additive includes but is not limited to
Thixotropic agent, viscosity modifier, emulsifier, stabilizer or pH adjusting agent, inorganic additive, thickener and dispersing agent or its at least
Two kinds of combination.Most preferably inorganic additive.Preferred inorganic additive includes but is not limited to alkali and alkaline-earth metal, transition gold
Belong to, such as nickel, zirconium, titanium, manganese, tin, ruthenium, cobalt, iron, copper and chromium, tungsten, molybdenum, zinc;Late transition metal, for example, boron, silicon, germanium, tellurium, gadolinium,
Antimony, rare earth metal, such as lanthanum, cerium oxide, mixed-metal oxides, complex compound, or it is fixed by the nothing that those oxides are formed
Shape or partially crystallizable glass or its at least two combination, preferably bismuth, zinc, calcium halophosphate activated by antimony andmanganese, magnesium, nickel, tungsten, alkali metal and alkaline earth gold
Category, tellurium and ruthenium or its at least two combination, oxide can produce the chemical combination of those metal oxides or glass when firing
At least two mixture in object or above-mentioned metal, at least two mixture in above-mentioned oxide, it is above-mentioned can when firing
It generates in those metal oxides, mixed-metal oxides, compound or amorphous or partially crystallizable glass compound extremely
Few two kinds of mixture or two or more above-mentioned any mixture.
In one embodiment, conducting composition includes selected from by Li3PO4, MnO, MnO2, Ag2MoO4 and its group
The independent and unique additive for the group being combined into.Term " independence " and " uniqueness " indicate the additive and remaining paste component (i.e.
Conducting metal particles, glass composition, organic carrier) it is dividually added in paste and is separated with paste component chemical before firing.
If it exists, conducting composition may include at least about 0.1 weight % of 100% total weight based on paste addition
Agent.Meanwhile paste preferably comprises the no more than about 10 weight % of 100% total weight based on paste, preferably no more than about 5 weight %, more
Preferably no more than about 2 weight % additives.
Form conducting composition
To form conducting composition, it can be used any method known in the art for being used to prepare paste composite by glass composition
In conjunction with conducting metal particles and organic carrier.Preparation method be not it is crucial, condition is that it generates evenly dispersed paste.It can incite somebody to action
Component is for example mixed with mixing machine, then for example, by three roller mills, to prepare finely dispersed paste.
Solar battery
On the one hand, the present invention relates to solar batteries.In one embodiment, solar battery is by semiconductor substrate such as silicon wafer
It is formed with according to the conducting composition of any of embodiment described herein.
On the other hand, the present invention relates to the solar batteries being prepared via a method which, the method includes will be according to this
The conducting composition of any of the text embodiment is applied on semiconductor substrate and fires semiconductor substrate.
Silicon wafer
Other than other areas of solar battery, preferred chip has can be with high efficiency absorption light to obtain electron-hole
To and with high efficiency on boundary, by hole and the region being electrically separated preferably on p-n junction boundary.Preferred chip be comprising
Those of the monolithic entity being made of front doped layer and back side doped layer.
It is preferred that chip includes quadrivalent element, binary compound, ternary compound or the alloy suitably adulterated.Herein,
Preferred quadrivalent element is silicon, Ge or Sn, preferably silicon.Preferred binary compound is the group of two or more quadrivalent elements
Close, the binary compound of group-III element and V group element, II race element and VI race element binary compound or IV race element
With the binary compound of VI race element.The group of preferred quadrivalent element is combined into two or more members selected from silicon, germanium, tin or carbon
The combination of element, preferably SiC.The binary compound of preferred group-III element and V group element is GaAs.It is preferably implemented according to one
Scheme, chip are silicon.The foregoing description for wherein specifically mentioning silicon is also applied for other wafer compositions described herein.
The position that p-n junction boundary is located at the front doped layer of chip and back side doped layer meets.In N-shaped solar battery
In, back side doped layer is doped with electron n-type dopant and front doped layer is doped with receiving electronics or to hole p-type doping
Agent.In p-type solar battery, back side doped layer is doped with p-type dopant and front doped layer is doped with n-type dopant.Root
According to a preferred embodiment, the chip with p-n junction boundary by providing doping silicon matrix first, then by opposite type
Doped layer is applied in the one side of matrix and prepares.
It is well known in the art for adulterating silicon matrix.Doping silicon matrix can be by as is generally known in the art and being considered suitable to this hair
Bright any method preparation.Preferred silicon matrix source is monocrystalline silicon, polysilicon, amorphous silicon and high-grade metalluragical silicon, optimal
Menu crystal silicon or polysilicon.Doping and form doping silicon matrix and can be added dopant during the preparation in silicon matrix simultaneously into
It goes or it can be carried out in a subsequent step.Doping can be orientated for example, by gas diffusion and give birth to after the preparation of silicon matrix
It grows and carries out.Doping silicon matrix be also be easy it is commercially available.According to an embodiment, the initial dopant of silicon matrix can be by that will mix
It is formed in miscellaneous dose of addition silicon mixture to carry out simultaneously.According to another embodiment, front doped layer and if there is
The application for talking about the back layer of high doped can be carried out by gas phase oriented growth.Preferably at least about 500 DEG C of gas phase oriented growth,
It is carried out at a temperature of preferably at least about 600 DEG C, most preferably at least about 650 DEG C.Meanwhile gas phase oriented growth is preferably being not greater than about
900 DEG C, more preferably not greater than about 800 DEG C carry out at a temperature of most preferably no greater than about 750 DEG C.Oriented growth is further preferably extremely
Few 2kPa, preferably at least about 10kPa, most preferably at least about carry out under the pressure of 30kPa.Meanwhile oriented growth is being not greater than about
100kPa, preferably no greater than about 80kPa are most preferably no greater than about carried out under the pressure of 70kPa.
Various shapes, surface texture and size may be present in silicon matrix as is generally known in the art.For some examples, the shape of matrix
It may include cube, disk, chip and irregular polyhedrons.According to a preferred embodiment, chip is with similar, preferably
Identical two peacekeepings are significantly less than the cube of the third dimension of other two dimensions.The third dimension can be tieed up small at least than the first two
100 times.
In addition, a variety of surface types are as known in the art.In one embodiment, it is preferred to rough surface
Silicon matrix.A kind of method for assessing the roughness of matrix is to assess the surface roughness ginseng of matrix sub-surface (sub-surface)
Number, with the total surface area of matrix compared be it is small, preferably total surface area less than about 1%, and it is flat substantially.Table
The value of surface roughness parameter is provided by the ratio of the area of subsurface and the area of theoretical surface, and the area of the theoretical surface is logical
It crosses and the subsurface is projected and is formed and minimizing mean square displacement in the plane of subsurface best fit.Higher table
Surface roughness parameter value indicates rougher, more irregular surface, and lower surface roughness parameter value indicates more smooth, relatively equal
Even surface.It is preferred that the surface roughness of silicon matrix is modified to generate multinomial factor (including but not limited to light absorption and in table
Adhesive force on face) between optimum balance.
The larger dimension of two of changeable silicon matrix is to be suitble to application required by gained solar battery.It is preferred that the thickness of silicon wafer
Degree is at least about 0.01mm.Meanwhile thickness is preferably not greater than about 0.5mm, more preferably not greater than about 0.3mm, most preferably less
In about 0.2mm.According to an embodiment, silicon wafer can have the minimum thickness of 0.01mm.
It is preferred that front doped layer is thin compared with the doped layer of the back side.Further preferably front doped layer has at least about 0.1 μm,
And it is not greater than about 10 μm, and preferably no greater than about 5 μm, most preferably no greater than about 2 μm of thickness.
High doped layer can be applied to the back side of silicon matrix overleaf between doped layer and any other layer.This is highly mixed
Diamicton have doping type identical with back side doped layer, and the layer usually with+indicates (n+ type layer applied to the N-shaped back side doping
On layer and p+ type layer is applied on the doped layer of the p-type back side).The high doped back layer is used to help the electric conductivity that metallizes and improve
Energy.It is preferred that if it exists, high doped back layer have at least about 1 μm, and be not greater than about 100 μm, preferably no greater than about
50 μm, most preferably no greater than about 15 μm of thickness.
Dopant
Preferred dopant is to form p-n junction boundary and electronics or hole are introduced into band structure when being added in silicon wafer
Those of.It is preferred that specifically selecting characteristic and the concentration of these dopants to adjust the band structure feature of p-n junction and according to need
Light absorption and conductivity feature are set.Preferred p-type dopant is will be those of in hole addition silicon wafer band structure.Ability
Domain is known and is considered suitable to all dopants in the context of the invention and can be used as p-type dopant.Preferably p-type dopant includes
But it is not limited to triad, especially those of 13 race of periodic table.Preferred 13 race's element of periodic table include but is not limited to boron,
Aluminium, gallium, indium, thallium or in which at least two combination, wherein particularly preferred boron.
Preferred n-type dopant is will be those of in electronics addition silicon wafer band structure.It is known in the art and be considered suitable to
All dopants in the context of the invention can be used as n-type dopant.Preferred n-type dopant includes but is not limited to periodic table 15
The element of race.Preferred 15 race element include but is not limited to nitrogen, phosphorus, arsenic, antimony, bismuth or in which at least two combination, wherein special
Not preferred phosphorus.
As described above, the various doped levels of p-n junction can be changed to adjust the required performance of gained solar battery.
According to certain embodiment, semiconductor substrate (i.e. silicon wafer), which has, is greater than about 60 Ω/, such as greater than about 65 Ω/
, 70 Ω/, 90 Ω/, 95 Ω/ or 100 Ω/ sheet resistance.
Solar battery structure
One aspect of the present invention is can solar battery obtained by the method for the present invention.Preferred solar battery is to be converted to electricity
Can output total incident optical energy ratio in terms of, have it is efficient those.Further preferably light-weight and durable solar battery.
At least, solar battery generally comprises: electrode before (i), the front (ii) doped layer, (iii) p-n junction boundary, the back side (iv) doping
Layer and (v) weld pad (solderingpad).Solar battery also may include other layers for chemical/mechanical protection.
Anti-reflecting layer
Anti-reflecting layer can be used as outer layer application before by front of the application of electrode in solar battery.Preferably anti-reflecting layer is
It reduces the incident light ratio by head-on reflection and improves those of the incident light ratio for crossing front to be absorbed by chip.Have
The absorption/reflection ratio of benefit is easy to etch by electroconductive paste, or resistant to temperature needed for electroconductive paste firing, and not tribute
It is preferred for offering the anti-reflecting layer for the electrons and holes recombination that electrode interface nearby improves.It can be used as is generally known in the art and think
Suitable for all anti-reflecting layers in the context of the invention.Preferred anti-reflecting layer include but is not limited to SiNx, SiO2, Al2O3,
The mixture of TiO2 or in which at least two and/or its at least two layers combination.According to a preferred embodiment, antireflection
Layer is SiNx, wherein using especially such if silicon wafer.
The thickness of anti-reflecting layer is suitable for the wavelength of appropriate light.A preferred embodiment according to the present invention, anti-reflecting layer tool
There are at least about 20nm, preferably at least about 40nm, the most preferably at least about thickness of 60nm.Meanwhile thickness is preferably not greater than about
300nm, preferably no greater than about 200nm, most preferably no greater than about 90nm.
Passivation layer
One or more passivation layers can be used as outer layer applied on the front and/or the back side of silicon wafer.Passivation layer can be electric before formation
It is applied before extremely or before application anti-reflecting layer (if there is one).Preferred passivation layer is to reduce electrode interface
Those of neighbouring electron/hole recombination rate.It can be used as is generally known in the art and be considered suitable to any in the context of the invention
Passivation layer.Preferred passivation layer includes but is not limited to silicon nitride, silica and titanium dioxide.According to a preferred implementation side
Case uses silicon nitride.Preferred passivation layers have at least 0.1nm, preferably at least about 10nm, the most preferably at least about thickness of 30nm.
Meanwhile passivation layer is preferably not greater than about 2 μm, more preferably not greater than about 1 μm, most preferably no greater than about 200nm.
Other protective layers
In addition to the above-mentioned layer of major function for directly contributing solar battery, it can be added other for what is mechanically and chemically protected
Layer.
It can be by cell package to provide chemoproection.Encapsulation is well known in the art and usable suitable for times of the invention
What is encapsulated.According to a preferred embodiment, if there is the encapsulation, then transparent polymer, commonly referred to as transparent thermoplastic tree
Rouge is used as encapsulating material.Preferred transparent polymer includes but is not limited to silicon rubber and polyethylene vinylacetate (PVA).
Transparency glass plate can also be added in the front of solar battery to provide the mechanical protection to battery front side.Transparent glass
Glass plate is well known in the art, and suitable any suitable translucent glass plate can be used.
Back-protective material can be added in the back side of solar battery to provide mechanical protection.Back-protective material is ability
Known in domain, and any suitable back-protective material can be used.Preferred back-protective material is with good mechanical
Those of energy and resistance to weathering.Preferred back-protective material is the polyethylene terephthalate with polyvinyl fluoride layer.
It is preferred that back-protective material is present in below encapsulated layer (there are back-protective layer and encapsulation).
Frame material can be added to the outside of solar battery to obtain mechanical support.Frame material is well known in the art
, and any frame material being considered suitable in the context of the invention can be used.Preferred frame material is aluminium.
The method for preparing solar battery
Solar battery can be by the anti-reflection coating that is applied to conducting composition on the front of semiconductor substrate such as silicon wafer
As prepared on silicon nitride, silica, titanium oxide or aluminium oxide with forming front electrode.Then back side electroconductive paste is applied to too
The back side of positive energy battery is to form weld pad.Electroconductive paste can with as is generally known in the art and be considered suitable in the context of the invention appoint
Where formula applies.Example include but is not limited to impregnate, submerge, pouring into, drop coating, injection, spraying, blade coating, curtain coating, brushing or print
Brush or its at least two combination.Preferred printing technology is ink jet printing, silk-screen printing, bat printing
(tamponprinting), hectographic printing, letterpress or stencil printing or its at least two combination.It is preferred that conductive
Paste is preferably applied by silk-screen printing by printing.Specifically, it is at least about 10 μm that network optimization choosing, which has diameter, more preferably extremely
It is about 15 μm few, more preferably at least about 20 μm, most preferably at least about 25 μm of finger line opening.Refer to line opening diameter preferably not simultaneously
Greater than about 100 μm, more preferably not greater than about 80 μm, most preferably no greater than about 70 μm.
Then aluminium paste is applied to the back side of matrix, be overlapped the edge of the weld pad formed by back side electroconductive paste to form BSF.
Then matrix is fired according to the suitable profile determined that forms by matrix and electroconductive paste.
Firing is by the electrode of printing and weld pad sintering to be formed necessary to solid conduction body.Firing is ripe in this field
Know, and can be to be considered suitable to carry out in a manner of any in the context of the invention.It is preferred that fire glass material Tg with
Upper progress.
Being arranged for the maximum temperature of firing is about 900 DEG C hereinafter, preferably from about 860 DEG C or less.About 820 DEG C of firing temperature
For obtaining solar battery.Usually setting firing temperature profile is can burn out the organic bond from conducting composition
Material and existing any other organic material.The firing step is usually in band oven in air or in oxygen-containing atmosphere
It carries out.It is preferred that firing with quick method for cooking with about 30 seconds to about 3 minutes, more preferably from about 30 seconds to about 2 minutes, most preferably from about 40
Total firing time of second to about 1 minute carries out.It is selected as about 3-7 seconds in 600 DEG C or more of time optimals.Matrix can reach about 700-
900 DEG C of peak temperature about 1-5 seconds.Firing can also be carried out with high delivery rate, for example, about 100-500cm/min, be generated about
0.05-5 minutes retention times.Hot profile needed for multiple humidity provinces, such as 3-12 area can be used to control.
Electroconductive paste firing on the front and back can be carried out simultaneously or sequentially.If being applied to the conduction on two faces
Paste has similar, preferably identical best firing condition, then it is suitable for firing simultaneously.If applicable, preferably simultaneously into
Row is fired.If firing sequentially carries out, preferably applies and fire back side electroconductive paste first, be thereafter applied to electroconductive paste just
On face and fire.
Measure the performance of electroconductive paste
For the performance for measuring solar battery, standard electric test is carried out.Use the business IV from HalmElektronikGmbH
Testing machine " cetisPV-CTL1 " characterization is printed on the sample solar battery of front and back paste thereon.It will be surveyed during electrical measurement
All components and solar battery to be tested for measuring equipment are maintained at 25 DEG C.The temperature always during actual measurement
It is measured simultaneously on battery surface by temperature probe.With the known AM1.5 of 1000W/m2 on Xe arc lamp simulated battery surface
The daylight of intensity.To make simulator reach the intensity, flash lamp in a short time several times until it reaches by IV testing machine
The maintenance level that " PVCTControl4.260.0 " software supervision arrives.HalmIV testing machine measures electric current using Multi-contact method
(I) and voltage (V) is to measure the IV curve of battery.For doing so, by solar battery so that probe refers to the main grid with battery
The mode of line contact is placed between Multi-contact probe.The number of contact probe line is adjusted to the number of main gate line on battery surface
Mesh.All electricity values are directly automatically measured by the curve by the software package executed.As reference standard, test by same area
Size, same wafer material form and use the calibration solar battery from ISEFreiburg of identical front wiring processing
And data and validation value are compared.The chip that measurement at least five is processed in much the same way, data are by calculating each value
Average value and embody.Software PVCTControl4.260.0 provide about efficiency, fill factor, short circuit current, series resistance and
The value of open-circuit voltage.
The adhesive performance of solar battery, which can be used, comes from SomontGmbH, German commercially available welding bench M300-0000-
0901 test.Sample is fixed on the platform first, the welding (ECu+62Sn-36Pb-2Ag) from BrukerSpalek is used
FluxKester952S (come from Kester) coating, and the power by applying 12 heat burnings needle (heatedpin) be adhered to
On the finger line (fingerline) or main gate line of test, the heat, which burns needle and is pressed in welding, to be referred in line or main gate line.Heat burns needle set
There is 280 DEG C of set temperature and sample welding preheating table placed on it is set as to 175 DEG C of temperature.Be cooled to room temperature with
Afterwards, sample is mounted in GPStable-TestPro testing machine (GPSolarGmbH, Germany).It secures the strap on measuring head
And by the speed of 100mm/s and in a manner of so that the band part being fixed on battery surface and the band part of pull is surrounded angle at 45 °
Pull.Power needed for taking out main gate line/refer to line is measured with newton.At along finger 10 same intervals points of line/main gate line
Contact, this method is repeated, including in one of every one end measurement.Take the average value of 10 results.
Specific contact resistivity can measure in the air conditioning room with 22 ± 1 DEG C, wherein will own before measuring
Equipment and Material Balance.The specific contact resistivity of the firing silver electrode on the doped layer of front to measure silicon solar cell, can make
With " GP4-TestPro " for being equipped with " GP-4Test1.6.6Pro " software package from GPSolarGmbH.The device applies 4
Point measuring principle simultaneously assesses specific contact resistivity by transmission length method (TLM).Printing to measure specific contact resistivity, with chip
Refer to that line vertically cuts the wafer strip of 2 one (1) cm wide.By micrometer with the precision measurement of 0.05mm each definite width
Degree.It is equipped with wide scope zoom lens VH-Z100R's with from KeyenceCorp at a difference in three (3) on this
The width that silver refers to line is fired in digital microscope " VHX -600D " measurement.On each point, width 10 is measured by 2 mensurations
It is secondary.Refer to that line width angle value is the average value of all 30 times measurements.Software package is using referring to that line width, width and printing refer to that line is mutual
Distance calculates specific contact resistivity.Measurement electric current is set as 14mA.Installation is adapted for contact with a adjacent more contact measurements for referring to line in six (6)
Head (Part No. 04.01.0016) is simultaneously contacted with a adjacent finger line in six (6).It is a to measure five (5) being equally distributed on each
It is carried out on point.Specific contact resistivity value (m Ω * cm2) after starting measurement, in software measurement strip at each point.Take all 10
The average value of a point is as specific contact resistivity value.
Solar cell module
Another aspect of the present invention is the solar cell module formed by solar battery of the present invention.It can be by multiple solar batteries
Space arrangement and the collectivity arrangement for being electrically interconnected to form referred to as module.Preferred module can have multiple arrangements, preferably be known as
The rectangular arrangement of solar panel.It arranges and consolidates by a variety of methods of solar battery electrical connection and by this kind of battery machine
Determine to form a variety of methods of collectivity arrangement to be well known in the art.It can be used as is generally known in the art and be considered suitable to this hair
Any such methods in bright context.Preferred method is to generate low quality: power output ratio, low volume: power output ratio
Those of with high-durability.Aluminium is the preferred material being mechanically fixed for solar battery.Embodiment
Embodiment 1
Respectively prepared by the preparaton according to the following table 1 for one group of 3 kinds of exemplary glass composition (G1-G3).All amounts are based on glass group
100% total weight of object is closed with weight % offer.
The preparaton of 1. glass G1-G3 of table
G1G2G3TeO<sub>2</sub>85.88177.6Li<sub>2</sub>
O3.54.55.3Na<sub>2</sub>O12.12.7ZnO9.712.414.4
Glass is formed using melting and method of quenching, wherein raw material is mixed in powder form with predetermined amount.Then by mixture
It heats in air or in oxygen-containing atmosphere to form melt, is then quenched.Then the glass of quenching is crushed, ball milling
And it sieves to provide the mixture with required granularity.
Then each exemplary glass composition of about 2.5 weight % and about 88 weight % silver powder and about 9.5 weight % is organic
Carrier (100% total weight based on paste composite) is combined to form example paste P1-P3.When will paste mix to homogeneous consistency when,
They are screen printed into 90 Ω/ thin-layer electric with about 16 μm of silk diameters and 15 μm of EOM using with 360 mesh stainless steel wires
On the front of the blank polysilicon chip of resistance.Commercially available back side paste is used to form weld pad, extend throughout battery whole length and
It is about 4mm wide.Then, commercially available aluminium back side paste is printed on all remaining areas of cell backside to form aluminium BSF.Then
Battery is dried at a suitable temperature.Then will there is peak of the silicon matrix of printing front and back paste at about 700-975 DEG C
It is fired at a temperature of value.
The electric conductivity of paste P1-P3 is described in the following table 2.Efficiency (Eta, %), fill factor (FF, %) and 3 standards
Series resistance under luminous intensity (Rs3, Ω) is all calculated according to parameter described herein.The adhesive performance of P1 is pasted also according to described herein
Parameter calculates.Adhesion test result is in the following table 3 with newton (N) description.
The electrical property of 2. example of table paste P1-P3
The adhesive performance of 3. example of table paste P1
5.78 intermediate value (N) of P1 average value (N), 5.70 maximum value (N) 9.16
Embodiment 2
Respectively prepared by the preparaton according to the following table 4 for another group of exemplary glass composition (G6-G10).All amounts are based on glass group
100% total weight of object is closed with weight % offer.Glass composition is formed by 1 the method for embodiment.
The preparaton of 4. glass G6-G10 of table
G6G7G8G9G10TeO<sub>2</sub>87.485.384.885.285.1Li<sub>2&
lt;/sub>O3.13.53.53.53.5Na<sub>2</sub>
O11111ZnO8.59.69.59.69.6MgO-0.6---TiO<sub>2</sub>--1.2--SiO<
sub>2</sub>---0.7-B<sub>2</sub>O<sub>3</sub&
gt;----0.8
It then will each exemplary glass composition of about 2.5 weight % and about 88.5 weight % silver powder and about 9 weight % organic carrier knots
It closes to form example paste P6-P10 and mix, print and fire as described in Example 1.
The conduction and adhesive performance of paste P6-P10 is described in the following table 5 and 6.Efficiency (Eta, %), fill factor (FF, %)
It is all calculated according to parameter described herein with the series resistance under 3 etalon optical powers (Rs3, Ω).Adhere to force data according to implementation
Identical parameter described in example 1 calculates.
The electrical property of 5. example of table paste P6-P10
P6P7P8P9P10Eta17.77617.72017.70417.53117.693FF78.67178.59178.55078.36077.
959Rs30.00300.00300.00300.00320.0027
The adhesive performance of 6. example of table paste P6-P10
Embodiment 3
Respectively prepared by the preparaton according to the following table 7 for another group of exemplary glass composition (G11-G16).All amounts are based on glass group
100% total weight of object is closed with weight % offer.Glass composition is formed by 1 the method for embodiment.
The preparaton of 7. glass G11-G16 of table
G11G12G13G14G15G16TeO<sub>2</sub>84.282.685.284.683.686.7Li&
lt;sub>2</sub>O3.53.44.24.94.13.6Na<sub>2</sub>O11111-
ZnO11.313.09.69.511.39.7
It then will each exemplary glass composition of about 2.5 weight % and about 88.5 weight % silver powder and about 9 weight % organic carrier knots
It closes to form example paste P11-P16 and mix, print and fire as described in Example 1.
The electric conductivity of paste P11-P16 is described in the following table 8.Efficiency (Eta, %), fill factor (FF, %) and 3 marks
Series resistance under quasi-optical intensity (Rs3, Ω) is all calculated according to parameter described herein.
The electrical property of 8. example of table paste P11-P16
P11P12P13P14P15P16Eta17.58817.60817.53217.53017.59217.552FF79.34179.25479
.27179.05979.40779.115Rs30.00250.00260.00250.00270.00260.0028
Embodiment 4
One group of example paste composite (P17-P20) uses the G1 glass from embodiment 1, the about 88.5 weight % of about 2.5 weight %
Silver powder and the preparation of about 9 weight % organic carriers.Paste composite is formed by 1 the method for embodiment.Each example is pasted
Other oxides as described in the following table 9 of about 0.2 weight %.
Table 9. pastes unique oxide addition in P17-P20
The electric conductivity of paste P17-P20 is described in the following table 10.Efficiency (Eta, %), fill factor (FF, %) and 3 standard light
Series resistance under intensity (Rs3, Ω) is all calculated according to parameter described herein.
The electrical property of 10. example of table paste P17-P21
P17P18P19P20Eta16.33917.51717.44917.549FF73.17478.62478.25578.567Rs30.008
00.00300.00310.0030
Embodiment 5
Other three kinds of exemplary glass compositions (G21-G23) are prepared to measure the performance for changing Li2O content to gained electroconductive paste
It influences.The preparaton of glass G21-G23 is described in the following table 4.All amounts are based on 100% total weight of glass composition with weight
% is measured to provide.Glass composition is formed by method described in embodiment 1.
The preparaton of 11. glass G21-G23 of table
G21G22G23TeO<sub>2</sub>85.886.987.69Li<sub>2</sub&
gt;O3.52.41.45Na<sub>2</sub>O111ZnO9.79.79.86
One group of example paste composite (P21-P23) with each glass G21-G23 of about 2.5 weight %, about 88.5 weight % silver powder and
The preparation of about 9 weight % organic carriers.Paste composite and example solar cell are formed by 1 the method for embodiment, and are made
Solar battery is also subjected to the electrical performance test of the parameter according to embodiment 1.As a result it is described in the following table 12.
The electrical property of 12. example of table paste P21-23
P21P22P23Eta19.02418.81117.868FF78.83078.08174.147Rs30.003280.003920.0072
6
As can be seen that the example paste comprising 2.4 and 3.5 weight %Li2O in table 12 and only included 1.45 weight %Li2O
Paste P23, which is compared, shows better efficiency, fill factor and series resistance.
These and other advantage of the invention is that those skilled in the art learn from previous specification.Therefore, this field
Technical staff, which recognizes, can make being altered or modified without departing from wide creative concept of the invention to the embodiment above.It retouches
The specific scale for stating any specific embodiment is merely to illustrate.It is therefore understood that the present invention is not limited to described herein specific
Embodiment, but it is intended to cover in all changes in scope and spirit of the present invention and improvement.
Claims (10)
1. conducting composition, it includes:
Conducting metal particles;
At least one glass composition, it includes the total weights based on glass composition to have the oxidation for being at least about 70 weight % altogether
Tellurium (TeO2), zinc oxide (ZnO) and lithia (Li2O);With
Organic carrier,
Wherein at least one glass composition includes the less than about bismuth oxide (Bi2O3) of 5 weight % and lead oxide (PbO),
And when there are Bi2O3, the weight ratio of Bi2O3 and ZnO are less than about 0.15.
2. conducting composition, it includes:
Conducting metal particles;
At least one glass composition, it includes tellurium oxide (TeO2), zinc oxide (ZnO) and based on the gross weight of glass composition
Amount is more than the lithia (Li2O) of about 1 weight %, and wherein the total amount of TeO2, ZnO and Li2O are at least about 70 weight % and (a)
The weight ratio of TeO2 and (b) ZnO and Li2O is about 1-25, preferably from about 2-15;With
Organic carrier,
Wherein at least one glass composition includes the less than about bismuth oxide (Bi2O3) of 2.5 weight % and lead oxide
(PbO)。
3. conducting composition according to claim 2, wherein the weight ratio of (a) TeO2 and (b) ZnO and Li2O is about 3-15,
Preferably from about 3.5-15.
4. conducting composition, it includes:
Conducting metal particles;
At least one glass composition, it includes tellurium oxide (TeO2), zinc oxide (ZnO) and based on the gross weight of glass composition
Amount is more than the lithia (Li2O) of about 1.0 weight %, and wherein the total amount of TeO2, ZnO and Li2O are at least about 70 weight % and ZnO
Weight ratio with Li2O is about 0.5-25, preferably from about 1-20;With
Organic carrier,
Wherein the combined amount of bismuth oxide (Bi2O3) and lead oxide (PbO) is based on glass group at least one glass composition
Close the 100% total weight less than about 2.5 weight % of object.
5. conducting composition, it includes:
Conducting metal particles;
At least one glass composition, it includes tellurium oxide (TeO2), zinc oxide (ZnO) and lithias (Li2O), wherein (a)
The weight ratio of the combined amount of Li2O and (b) TeO2 and Li2O is about 0.001-0.15, and the group of (a) ZnO and (b) TeO2 and ZnO
The weight ratio of resultant is about 0.001-0.35, preferably from about 0.005-0.35;With
Organic carrier,
The wherein combined amount of bismuth oxide (Bi2O3) and lead oxide (PbO) less than about 2.5 weights at least one glass composition
Measure %.
6. conducting composition according to claim 5, wherein when bismuth oxide (Bi2O3) and lead oxide (PbO) are all present in institute
When stating at least one glass composition, the weight ratio of Bi2O3 and ZnO are less than about 0.13.
7. conducting composition as claimed in one of claims 1-6, wherein glass composition include based on TeO2, ZnO and
100% total weight of Li2O is the TeO2 of about 50-99.4 weight %.
8. conducting composition as claimed in one of claims 1-7, wherein glass composition include based on TeO2, ZnO and
100% total weight of Li2O is the Li2O of about 0.1-15 weight %.
9. conducting composition as claimed in one of claims 1-8, wherein glass composition include based on TeO2, ZnO and
100% total weight of Li2O is the ZnO of about 0.5-35 weight %.
10. conducting composition as claimed in one of claims 1-10 is applied on silicon wafer;With
Silicon wafer is fired.
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---|---|---|---|
CN201711086959.1A CN109754902A (en) | 2017-11-07 | 2017-11-07 | Glass composition for conducting composition |
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