CN109737912B - Eccentricity detection method and eccentricity detection device - Google Patents
Eccentricity detection method and eccentricity detection device Download PDFInfo
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- CN109737912B CN109737912B CN201910216821.1A CN201910216821A CN109737912B CN 109737912 B CN109737912 B CN 109737912B CN 201910216821 A CN201910216821 A CN 201910216821A CN 109737912 B CN109737912 B CN 109737912B
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Abstract
The invention discloses an eccentricity detection device, which is used for detecting the eccentricity of an object caused by rotation, and comprises: the method comprises the steps of arranging a main mark on a rotating object, wherein the main mark is provided with a first structure with dimension change along the width direction, and the width direction is perpendicular to one radius of the rotating object. When the eccentric rotary mark is used, a signal generating device sends a detection signal to act on the main mark, the main mark is used as a reference track when the rotary object is not eccentric, the detection signal at the moment is used as a reference pulse, when the rotary object rotates to cause eccentricity, the pulse obtained by the detection signal changes, and an eccentricity calculation value is obtained according to the change quantity. The invention also discloses an eccentricity detection method based on the eccentricity detection device.
Description
Technical Field
The invention relates to the technical field of eccentricity detection, in particular to an eccentricity detection method and an eccentricity detection device.
Background
Aiming at the zero position positioning and detection of the chip, the instrument uses a zero position switch on a rotating shaft as a zero point, and obviously, the method depends on the matching of processing precision to ensure the consistency and the accuracy of the zero position.
Due to the lack of rigidity and large deformation of the chip, the non-wear-resistant material can be eccentric in the high-speed circumferential rotating mechanism. When the detection holes distributed on the circumference of the chip are smaller or the radius of the chip is larger, the deviation between the center of the detection hole and the center of a detection light path changes in the rotation process. This in turn introduces errors in detecting well fluorescence. In extreme cases, this error can cause false positives.
At present, in the prior art, no detection device is provided for eccentricity, and the eccentric movement is controlled by methods such as structural positioning and clamping. This requires that the precision of the processing from the structure of the instrument to the consumable chip be guaranteed, leading to an increase in the cost of the consumable, a complex structure of the instrument, but even then the satisfaction of the user is low. Because the precision is improved, the comfort level of user installation is reduced, otherwise, the processing precision is reduced, the error of the detection result is increased, and the possibility of misjudgment is high!
The matching between the chip and the fixed tray is difficult to ensure that no eccentricity exists, and the performance index of the instrument is reduced due to the change of fluorescence values or absorbance caused by the eccentricity difference generated among batches.
Therefore, how to provide an eccentricity detecting device to detect the eccentricity is a technical problem that needs to be solved by those skilled in the art.
Disclosure of Invention
The invention aims to provide an eccentricity detection device for detecting the eccentricity; another object of the present invention is to provide an eccentricity detection method based on the eccentricity detection device.
In order to solve the technical problems, the invention provides the following scheme:
an eccentricity detecting device for detecting eccentricity of an object itself caused by rotation, comprising:
the method comprises the steps of arranging a main mark on a rotating object, wherein the main mark is provided with a first structure with dimension change along the width direction, and the width direction is perpendicular to one radius of the rotating object.
Preferably, the main mark includes a first mark block, a second mark block and a third mark block,
the first marker blocks are symmetrically arranged along one of the radii of the rotating object,
the second mark block is arranged at the left side of the first mark block, a first interval is arranged between the first mark block and the first mark block, the first interval is arranged in an equal width mode, the first interval has a length extending along the vertical direction of one radius,
the third marker block is arranged on the right side of the first marker block, a second interval is arranged between the third marker block and the first marker block, the second interval is arranged in an equal width mode, the second interval has a length extending along the vertical direction of one radius,
the first and second spacings are symmetrically disposed about the one of the radii,
the first mark block, the second mark block and the third mark block have the same length in the direction of the one of the radii.
Preferably, the main mark includes a fourth mark block and a fifth mark block,
the main marks are symmetrically arranged along one of the radii of the rotating object,
a third space is provided between the fourth mark block and the fifth mark block, the third space is arranged in an equal width, the third space has a length extending along a direction perpendicular to the one radius,
the fourth mark block and the fifth mark block have the same length in the direction of the one of the radii.
Preferably, the main mark includes a sixth mark block and a seventh mark block,
a fourth spacing is provided between the sixth marker block and the seventh marker block, a centerline of the fourth spacing being disposed parallel to one of the radii of the rotating object,
the fourth interval is arranged in an equal width,
the sixth mark block and the seventh mark block have the same length in the direction of the one of the radii,
the right side of the seventh mark block has a length extending in a direction perpendicular to the one of the radii.
Preferably, the primary mark is a hole formed in the rotating body.
Preferably, the eccentricity detecting device further includes a sub-mark,
the secondary mark has a second structure that varies in size in the direction of the one of the radii.
The invention also provides an eccentricity detection method, based on the eccentricity detection device,
the signal generating device sends out a detection signal to act on the main mark, the detection signal is a reference pulse when the rotating object has no eccentricity, the pulse obtained by the detection signal changes when the rotating object rotates to cause eccentricity, and an eccentricity calculation value is obtained according to the change quantity.
Preferably, the eccentricity detection method further includes correcting the detection signal according to the calculated eccentricity value to perform effective compensation.
The invention also provides an eccentricity detection method, based on the eccentricity detection device,
and also comprises a secondary mark which is arranged on the main body,
the secondary marks have a second structure which varies in size in the direction of the other radius,
the rotating object is offset in the horizontal and vertical planes,
the eccentric displacement generated by the main mark and the direction of the rotation center after detection and conversion is a main offset m, the eccentric displacement generated by the auxiliary mark and the direction of the rotation center after detection and conversion is an auxiliary offset l,
the actually measured positive included angle of the two offset mark quantities is phi, and the position movement of the rotating object meets the superposition relation, so the maximum eccentricity is calculated to meet the operation relation of the vector:
calculating the forward included angle phi of l and m according to actual measured values of the two marks, after determining the maximum eccentric direction and the size, calculating the relative angle of each detection hole from the maximum eccentric direction, creating a coordinate system rotating the original coordinate origin to a new coordinate system, taking the maximum eccentric direction as the initial angle of a polar coordinate system by the two circles, and establishing a polar coordinate equation:
the center of the rotating object is at the origin, and the polar equation of a circle with radius R is:
r(θ)＝R；
wherein theta is an included angle between a straight line from a point on the circle to the origin of the polar coordinate and a horizontal line,
in a polar coordinate system, an equation of a circle with a center at (E, θ ═ 0) and a radius R is as follows:
r2-2Er cosθ+E2＝R2；
by using the formula, the change of the rotation angle of the detection hole caused by eccentricity is calculated according to the relative angle of the detection hole and the cosine law,
wherein, the rotation center after the eccentricity is generated is marked as O, the geometric center of the rotating object without eccentricity is marked as A, and the maximum eccentricity direction is
The eccentricity value is E, the zero position of the main mark is marked as B, the position of the detected hole is marked as C, the angle BAC is sigma, the angle BOC is alpha, the angle AOC is beta,
calculated according to the following formula:
OB＝R+m；
∠OAC＝∠OAB+∠BAC＝γ；
OC2＝OA2+AC2-2×OA×ACcosγ＝E2+R2-2×E×Rcosγ；
to obtain
Eccentric distance in direction:
eσ＝OC-R；
calculated according to the following formula:
the obtained corrected rotation angle α is phi- β,
and correcting the rotation angle according to the obtained corrected rotation angle alpha, and correcting the detection result of fluorescence or absorbance according to the eccentric distance.
Preferably, the main mark and the auxiliary mark are converted by projection, and the main mark and the auxiliary mark are not arranged on a horizontal line.
The eccentricity detection device provided by the invention is used for detecting the eccentricity of an object caused by rotation, and comprises:
the method comprises the steps of arranging a main mark on a rotating object, wherein the main mark is provided with a first structure with dimension change along the width direction, and the width direction is perpendicular to one radius of the rotating object.
When the eccentric rotary mark is used, a signal generating device sends a detection signal to act on the main mark, the main mark is used as a reference track when the rotary object is not eccentric, the detection signal at the moment is used as a reference pulse, when the rotary object rotates to cause eccentricity, the pulse obtained by the detection signal changes, and an eccentricity calculation value is obtained according to the change quantity.
Drawings
FIG. 1 is a schematic structural diagram of an eccentricity detection apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a first embodiment of an eccentricity detection apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a second embodiment of an eccentricity detection apparatus according to an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a third embodiment of an eccentricity detection apparatus according to an embodiment of the present invention;
FIG. 5 is a schematic perspective view of an eccentricity detection apparatus according to an embodiment of the present invention;
fig. 6 is a schematic structural diagram of an eccentricity detection device according to an embodiment of the present invention;
fig. 7 is a schematic view of a calculation angle during the eccentricity detection of the eccentricity detection apparatus according to the embodiment of the present invention.
In the above FIGS. 1-7:
the marking device comprises a first marking block 1, a second marking block 2, a third marking block 3, a fourth marking block 4, a fifth marking block 5, a sixth marking block 6, a seventh marking block 7, a rotating object 8, an auxiliary mark 9, a signal generating device 10, a first line 11, a second line 12, a third line 13, a rotating shaft 14 and an eccentric circle center 15.
Detailed Description
In order that those skilled in the art will better understand the disclosure, the invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Referring to fig. 1 to 7, fig. 1 is a schematic structural diagram of an eccentricity detection apparatus according to an embodiment of the present invention; FIG. 2 is a schematic structural diagram of a first embodiment of an eccentricity detection apparatus according to an embodiment of the present invention; FIG. 3 is a schematic structural diagram of a second embodiment of an eccentricity detection apparatus according to an embodiment of the present invention; FIG. 4 is a schematic structural diagram of a third embodiment of an eccentricity detection apparatus according to an embodiment of the present invention; FIG. 5 is a schematic perspective view of an eccentricity detection apparatus according to an embodiment of the present invention; fig. 6 is a schematic structural diagram of an eccentricity detection device according to an embodiment of the present invention; fig. 7 is a schematic view of a calculation angle during the eccentricity detection of the eccentricity detection apparatus according to the embodiment of the present invention.
The eccentricity detection device provided by the embodiment of the invention is used for detecting the eccentricity of an object caused by rotation, and comprises:
on a rotating object 8, for example a chip, main marks are provided, which have a first structure with a dimension varying in the width direction, with the width direction being perpendicular to one of the radii of the rotating object 8.
When the eccentric rotating device is used, a detection signal is sent by the signal generating device to act on the main mark, the main mark is a reference track when the rotating object 8 is not eccentric, the detection signal at the moment is a reference pulse, when the rotating object 8 rotates to cause eccentricity, the pulse obtained by the detection signal changes, and an eccentricity calculation value is obtained according to the change quantity.
In a first embodiment, as shown in fig. 1, the main mark includes a first mark block 1, a second mark block 2 and a third mark block 3, the first mark block 1 is symmetrically disposed along one of the radii of the rotating object 8, the second mark block 2 is disposed on the left side of the first mark block 1 with a first space therebetween, the first space is disposed with an equal width, the first space has a length extending along a direction perpendicular to one of the radii, the third mark block 3 is disposed on the right side of the first mark block 1 with a second space therebetween, the second space is disposed with an equal width, the second space has a length extending along a direction perpendicular to one of the radii, the first space and the second space are symmetrically disposed with one of the radii, the first mark block 1, the second mark block 2 and the third mark block 3 have the same length in the direction of one of the radii.
Specifically, the first marking block 1 is an isosceles trapezoid, the second marking block 2 and the third marking block 3 are both isosceles triangles, the oblique sides of the second marking block 2 and the third marking block 3 are respectively arranged opposite to the two oblique sides of the first marking block 1 to form a first gap and a second gap,
alternatively, the first and second electrodes may be,
first mark piece 1 is fan-shaped, and second mark piece 2 and third mark piece 3 are all waist shape such as just having the arc limit, and the arc limit on second mark piece 2 and the third mark piece 3 sets up relative first mark piece 1's arc limit respectively and forms first clearance and second clearance.
In a second embodiment, as shown in fig. 2, the main mark comprises a fourth mark block 4 and a fifth mark block 5, the main mark is symmetrically arranged along one of the radii of the rotating object 8, a third interval is arranged between the fourth mark block 4 and the fifth mark block 5, the third interval is arranged in an equal width, the third interval has a length extending along a direction perpendicular to one of the radii, and the lengths of the fourth mark block 4 and the fifth mark block 5 along one of the radii are the same.
Specifically, the fourth marking block 4 and the fifth marking block 5 are both isosceles triangles, the oblique sides of the fourth marking block 4 and the fifth marking block 5 are oppositely arranged to form a third gap,
alternatively, the first and second electrodes may be,
the fourth marking block 4 and the fifth marking block 5 are both in an isosceles shape and are provided with arc-shaped edges, the arc-shaped edges on the fourth marking block 4 and the fifth marking block 5 are oppositely arranged to form a third gap,
alternatively, the first and second electrodes may be,
the fourth marking block 4 and the fifth marking block 5 are both in a right trapezoid shape, and the oblique sides of the fourth marking block 4 and the fifth marking block 5 are oppositely arranged to form a third gap.
In a third embodiment, as shown in fig. 4, the main mark includes a sixth mark block 6 and a seventh mark block 7, a fourth interval is provided between the sixth mark block 6 and the seventh mark block 7, a center line of the fourth interval is arranged in parallel with one of the radii of the rotating object 8, the fourth interval is arranged in an equal width, lengths of the sixth mark block 6 and the seventh mark block 7 in a direction of one of the radii are the same, and a right side of the seventh mark block 7 has a length extension in a direction perpendicular to one of the radii.
Specifically, the sixth marker block 6 is rectangular, and the seventh marker block 7 is triangular, or semicircular or fan-shaped.
In a fourth embodiment, the primary indicia are holes cut into the rotating object 8. At this time, the main mark is a hole, and is manufactured on the chip, the result desired by the eccentricity detection method provided by the embodiment of the invention can still be realized, but if the hole is circular, the eccentricity amount must be ensured to be smaller than the aperture diameter, otherwise, a signal judgment error occurs. The range of eccentricity is predictable, and therefore the size of the aperture is well defined.
In terms of calculation methods, calculation can be achieved using both polar coordinates and rectangular coordinates, and one is disclosed herein.
In order to further optimize the solution, the eccentricity detection device further comprises a secondary mark 9, and the secondary mark 9 has a second structure with a size changing along the direction of one radius. When the movement smoothness of the chip is not good, the chip can have an inclination in the vertical direction besides the eccentricity in the horizontal direction, the auxiliary mark 9 is used for aiming at the condition that the rotating object 8 deviates in the horizontal plane and the vertical plane, and ideally, the rotating object 8 only has the eccentricity in the horizontal plane and can be used without being provided with the auxiliary mark.
The embodiment of the invention also provides an eccentricity detection method, based on the eccentricity detection device described in any one of the above embodiments,
the signal generating device 10 sends out a detection signal to act on the main mark, the detection signal is a reference pulse when the rotating object 8 has no eccentricity, and when the rotating object 8 rotates to cause eccentricity, the pulse obtained by the detection signal changes, and an eccentricity calculation value is obtained according to the change quantity. Specifically, the signal generating device 10 includes a laser optoelectronic transmitter and receiver.
In order to further optimize the above solution, the above eccentricity detection method further comprises performing effective compensation according to the eccentricity calculation value correction detection signal.
The eccentricity detection method and the eccentricity detection device provided by the embodiment of the invention can solve the error caused by eccentricity, and solve the problem that the position deviation of the fit with a large clearance is necessary, which is an important problem for determining the performance of the instrument.
In the prior art, the material which lacks rigidity and has larger deformation and is not wear-resistant has the phenomena of eccentricity and the like in a high-speed circumferential rotating mechanism. When the detection holes distributed on the circumference of the chip are smaller or the radius of the chip is larger, the deviation between the center of the detection hole and the center of a detection light path changes in the rotation process. This in turn introduces errors in detecting well fluorescence. In extreme cases, this error can cause false positives. For this reason, it is necessary to solve this problem to improve the stability of the product.
To address this problem, prior art instruments employ over-positioning and interference fits between the chip and the turntable to control the eccentric movement. But this would make taking and placing the chip inconvenient. Some companies have adopted a method of clamping the chip by a metal cover and a turntable, which may be improved to some extent, but this method cannot be realized if a valve or a heater is protruded on the chip. And the method still cannot solve the rotation angle error of the chip and the turntable.
The solutions in the prior art described above all require high precision injection molding of the chip and control of the shrinkage of the material. Thus, the manufacturing cost of the chip is inevitably increased, and the shrinkage can not be controlled by using the additive optionally because of the special characteristics of the medical material. Therefore, a systematic method capable of perfectly solving the eccentricity and zero position errors needs to be found, so that the development difficulty of consumables is reduced, and the cost is reduced.
Considering the common injection molding chip, a certain gap is left in the design to match with the turntable. The fit between the chip and the instrument structure is loose, which results in the motor or the zero position of the structure cannot correctly express the position of the chip. If the positioning mechanism is used, the operation is inconvenient, the cost is greatly increased due to the improvement of the processing precision of chip consumables, and uncertain errors can still be introduced when the positioning is damaged due to a high-temperature process. For this reason, additional methods have to be found to solve this problem. The eccentricity detection method and the eccentricity detection device provided by the embodiment of the invention can solve the problems.
The eccentric detection device provided by the embodiment of the invention comprises:
1. it is to print or process a mark having a zero position locating function, such as the first mark block 1, on the chip. This sign requires strips of equal width or axisymmetric strips: such as an isosceles triangle, an isosceles trapezoid, a semicircle, etc.
2. Printing or processing a strip with a width that varies with the movement of the center of the circle, such as the first marking block 1, the fourth marking block 4, the fifth marking block 5 and the seventh marking block 7, on the chip. The shape can also be triangle, trapezoid or semicircle, which is used to measure the offset of the center of circle.
3. It is known that the eccentricity of the chip positioning design has the largest direction. In use, the main mark for eccentricity detection is placed in the maximum direction, and the sub-mark is placed in the vertical direction.
4. A main mark is added in the direction of serious eccentricity of the chip, and the direction of the serious eccentricity is known. In the vertical direction of which another secondary mark 9 can be placed. The shape and primary mark may be the same or similar, but is not generally used for zero detection. If a separate mark is additionally provided for zero detection, the primary and secondary marks may be placed identically or in reverse.
5. Generally, the main mark and the auxiliary mark 9 need to be vertically arranged, and for a fan-shaped or other rotating object 8 which may not be suitable for vertically arranging the main mark and the auxiliary mark 9, the main mark and the auxiliary mark may not be vertically arranged, but the main mark and the auxiliary mark need to be converted by projection, assuming that the main mark is an X axis, the auxiliary mark needs to be projected to a Y axis for conversion, the mathematical method of the conversion is known, and the two marks cannot be arranged on a horizontal line. That is, the main mark and the sub mark 9 are converted by projection, and the main mark and the sub mark 9 are not placed on a horizontal line. If the secondary mark 9 cannot be placed, it can be omitted. This relies on tighter positioning to limit eccentricity in other directions.
When the eccentricity detection device provided by the embodiment of the invention is used, as shown in fig. 5: the chip icon is detected by means of a device with a laser photoemission and receiver, the detector being placed in the position of the central dimension of the primary and secondary marks 9 in the condition of no eccentricity. The chip is in the shape of a disk.
Only the main mark and the auxiliary mark 9 need to be added on the dark-colored disc as the reflective marks, and the reflective photoelectric sensor is used for detecting the width change of the reflective strip.
When the disc is of transparent material, the primary and secondary marks 9 applied to the disc are dark opaque marks, and the width change is detected using a transmissive laser photosensor.
Assuming the disk rotation is clockwise, the movement of the flag as represented in FIG. 2 is from right to left. When there is no eccentricity, the laser photodetection position is scanned along the trace of the dotted line in the middle of fig. 2, which is a scanning trace without eccentricity. Two electrical pulse signals of equal width are obtained, as shown in fig. 2.
If the position of the chip relative to the mark is eccentric towards the inner side of the rotating shaft, the chip is positioned at one side of the mark close to the circumference of the chip, namely the upper part of a broken line in the middle in fig. 2, namely an inner eccentric scanning track, the cutting electric pulse is a pulse Ta3, then a pulse Tb3, the pulse Ta3 is wider than the pulse Ta1 on the non-eccentric scanning track, and the pulse Tb3 is narrower than the pulse Tb1 on the non-eccentric scanning track. If the position of the chip relative to the mark is eccentric towards the outer side of the rotating shaft, the opposite result can be obtained from the above, namely the cutting electric pulse is a pulse Ta2, and then a pulse Tb2, wherein the pulse Ta2 is narrower than the pulse Ta1 on the non-eccentric scanning track, and the pulse Tb2 is wider than the pulse Tb1 on the non-eccentric scanning track.
If the direction of the rotating disk changes, the resulting electrical signals are all opposite.
In fig. 2, the Total value should be a fixed value when there is no chip tilt. The value of Total refers to a complete pulse, i.e., from the start of Ta1 to the end of Tc1, with Total in combination with a position sensor, a measurement of zero can be achieved. The zero measurement cannot in principle be influenced by eccentricity. The zero position measurement starts with the rising edge of Ta1 and ends with the falling edge of Tc1, so that the obtained signal is a rectangle, the central position of the rectangle is not changed along with the eccentricity, and the zero position is obtained by calculating the central position of the rectangle. In this principle, the null measurement is virtually any rectangular pulse measurement that can be generated in a symmetrical pattern, but the present invention emphasizes the use of a pattern mark that does not vary with eccentricity to measure the null, considering that if the pulse is too narrow, it will cause increased error in the null calculation.
By this means, it is possible to detect a change in eccentricity and detect an offset amount. The eccentricity in the other direction can likewise be detected by the secondary marks 9 in the vertical direction. And correcting the detection signal according to the eccentric calculation value to realize effective compensation of measurement. The eccentricity and the zero point can be obtained by horizontally turning the main mark and the sub mark 9 of fig. 2 by 180 degrees. The Total is a fixed value by using the main mark and the auxiliary mark 9, and compensation can be performed according to the speed regulation difference existing in uniform motion. The requirement of the instrument on the precision of the motion control speed is reduced, and the smoothness is not reduced.
When the smoothness of movement of the chip is not good, the chip may have a tilt in the vertical direction in addition to the eccentricity in the horizontal direction, for example, a reflection, which causes the zero point to be detected in advance.
Therefore, the embodiment of the present invention further provides an eccentricity detection method, based on the eccentricity detection apparatus as described in any one of the above embodiments, further comprising a sub-mark 9, the sub-mark 9 having a second structure with dimension change along the direction of another radius, the rotating object 5 having offset in the horizontal plane and the vertical plane,
the eccentric displacement generated by the main mark and the direction of the rotation center after detection and conversion is a main offset m, the eccentric displacement generated by the auxiliary mark and the direction of the rotation center after detection and conversion is an auxiliary offset l,
the positive included angle of two actually measured offset mark quantities is phi, m and l are equal to 0 when no eccentricity exists, at this time, if the converted value is negative, the opposite direction of the eccentricity displacement 180 degrees is taken as the positive direction, the position movement of the rotating object meets the superposition relationship, and therefore the maximum eccentricity meets the operation relationship of the vector:
the forward included angle phi of 1 and m is calculated according to actual measured values of two marks, after the maximum eccentric direction and the size are determined, the relative angle of each detection hole starting from the maximum eccentric direction is calculated, an original coordinate origin is rotated to a new coordinate system, two circles use the maximum eccentric direction as the initial angle of a polar coordinate system, and a polar coordinate equation is established:
the center of the rotating object is at the origin, and the polar equation of a circle with radius R is:
r(θ)＝R；
wherein theta is an included angle between a straight line from a point on the circle to the origin of the polar coordinate and a horizontal line,
in a polar coordinate system, an equation of a circle with a center at (E, θ ═ 0) and a radius R is as follows:
r2-2Er cosθ+E2＝R2；
by using the formula, the change of the rotation angle of the detection hole caused by eccentricity is calculated according to the relative angle of the detection hole and the cosine law,
wherein, the rotation center after the eccentricity is generated is marked as O, the geometric center of the rotating object without eccentricity is marked as A, and the maximum eccentricity direction is
The eccentricity value is E, the zero position of the main mark is marked as B, the position of the detected hole is marked as C, the angle BAC is sigma, sigma is the rotating angle of the detected position C under the condition of no eccentricity from the zero mark to the position, the angle BOC is alpha, alpha is the actual deflection angle of the eccentric lead-in detected target, the angle AOC is beta, phi is known,
calculated according to the following formula:
OB ═ R + m; assuming that the rotation of the flag can be ignored or compensated,
∠OAC＝∠OAB+∠BAC＝γ；
OC2＝OA2+AC2-2×OA×AC cosγ＝E2+R2-2×E×Rcosγ；
to obtain
Eccentric distance in direction:
eσOC-R; when e isσNegative means that the eccentricity direction is the opposite side of 180 degrees,
calculated according to the following formula:
the obtained corrected rotation angle α is phi- β,
and correcting the rotation angle according to the obtained corrected rotation angle alpha, and correcting the detection result of fluorescence or absorbance according to the eccentric distance.
In the eccentricity detection method provided by the embodiment of the invention, according to the consideration of the 90-degree vertical placement marker, the superposition theorem is satisfied in consideration of the fact that the eccentricity movement occurs on a plane and all mass points are rigid translations. Can be viewed as a superimposed movement in two directions. Let us assume that the position shift detected by the main mark is the main offset m, the position shift detected by the auxiliary mark 9 is the auxiliary offset l, and the positive angle between the two measured offsets is phi.
The above calculation method is also applicable to a case where only the horizontal plane is eccentric and the vertical plane is not inclined.
Referring to fig. 6, a solid circle is an offset position of a chip, an imaginary center circle is a theoretical position of the chip, a rotation axis 14 is an actual rotation axis, an eccentric center 15 is a center of the chip after eccentricity, a second line 12 indicates a vertical placing mark included angle after eccentricity, a first line 11 indicates a relation between a mark and the rotation axis, and a third line 13 indicates a maximum eccentricity direction.
And finally, correcting the fluorescence value or the absorbance value according to the deviation degree and the light path transfer function. This is the principle of the eccentricity calculation of the eccentricity detection method provided by the embodiment of the present invention.
A measurement error is introduced due to the rotation of the sensing flag during the eccentric displacement. If one wants to counteract this error, one method is to perform a second compensation calculation based on the shape of the mark, and another method is to use fan-shaped marks instead of triangles or trapezoids. Since the circle is uniform in all directions for rotation, this error is automatically compensated for.
If the instrument can not detect any one of the mark signals, hardware errors are eliminated, namely, the eccentricity is too large and exceeds the mark, and the eccentricity signal cannot be acquired. Therefore, the size of the detection flag needs to be set according to the maximum eccentric size, and is not too small or too large.
The principles and embodiments of the present invention are explained herein using specific examples, which are presented only to assist in understanding the method and its core concepts. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention.
Claims (6)
1. An eccentricity detecting device for detecting eccentricity of an object itself caused by rotation, comprising:
setting a main mark on a rotating object, wherein the vertical direction of one radius of the rotating object is taken as the width direction, and the main mark is provided with a first structure with dimension change along the width direction;
the main mark includes a first mark block, a second mark block and a third mark block,
the first marker blocks are symmetrically arranged along one of the radii of the rotating object,
the second mark block is arranged at the left side of the first mark block, a first interval is arranged between the first mark block and the first mark block, the first interval is arranged in an equal width mode, the first interval has a length extending along the vertical direction of one radius,
the third marker block is arranged on the right side of the first marker block, a second interval is arranged between the third marker block and the first marker block, the second interval is arranged in an equal width mode, the second interval has a length extending along the vertical direction of one radius,
the first and second spacings are symmetrically disposed about the one of the radii,
the first mark block, the second mark block and the third mark block have the same length in the direction of the one of the radii,
alternatively, the main mark includes a fourth mark block and a fifth mark block,
the main marks are symmetrically arranged along one of the radii of the rotating object,
a third space is provided between the fourth mark block and the fifth mark block, the third space is arranged in an equal width, the third space has a length extending along a direction perpendicular to the one radius,
the fourth mark block and the fifth mark block have the same length in the direction of the one of the radii,
alternatively, the main mark includes a sixth mark block and a seventh mark block,
a fourth spacing is provided between the sixth marker block and the seventh marker block, a centerline of the fourth spacing being disposed parallel to one of the radii of the rotating object,
the fourth interval is arranged in an equal width,
the sixth mark block and the seventh mark block have the same length in the direction of the one of the radii,
the right side of the seventh mark block has a length extending in a direction perpendicular to the one of the radii;
and also comprises a secondary mark which is arranged on the main body,
the secondary mark has a second structure that varies in size in the direction of one of the radii.
2. The eccentricity detection device of claim 1, wherein the primary marker is a hole cut in the rotating object.
3. An eccentricity detection method, based on the eccentricity detection apparatus according to any one of claims 1 to 2,
the signal generating device sends out a detection signal to act on the main mark, the detection signal is a reference pulse when the rotating object has no eccentricity, the pulse obtained by the detection signal changes when the rotating object rotates to cause eccentricity, and an eccentricity calculation value is obtained according to the change quantity.
4. The eccentricity detection method according to claim 3, further comprising correcting the detection signal for effective compensation based on the calculated eccentricity value.
5. An eccentricity detection method, based on an eccentricity detection device for detecting eccentricity of an object itself caused by rotation, comprising: providing a main mark on a rotating object, the main mark having a first structure with a dimension varying in a width direction, with a direction perpendicular to one of radii of the rotating object being the width direction,
and also comprises a secondary mark which is arranged on the main body,
the secondary marks have a second structure which varies in size in the direction of the other radius,
the rotating object is offset in the horizontal and vertical planes,
the eccentric displacement generated by the main mark and the direction of the rotation center after detection and conversion is a main offset m, the eccentric displacement generated by the auxiliary mark and the direction of the rotation center after detection and conversion is an auxiliary offset l,
the actually measured positive included angle of the two deviation mark quantities is phi, and the position movement of the rotating object meets the superposition relation, so the maximum eccentricity is calculated to meet the vector
The operational relationship of (1):
calculating the forward included angle phi of l and m according to actual measured values of the two marks, after determining the maximum eccentric direction and the size, calculating the relative angle of each detection hole from the maximum eccentric direction, creating a coordinate system rotating the original coordinate origin to a new coordinate system, taking the maximum eccentric direction as the initial angle of a polar coordinate system by the two circles, and establishing a polar coordinate equation:
the center of the rotating object is at the origin, and the polar equation of a circle with radius R is:
r(θ)＝R；
wherein theta is an included angle between a straight line from a point on the circle to the origin of the polar coordinate and a horizontal line,
in a polar coordinate system, an equation of a circle with a center at (E, θ ═ 0) and a radius R is as follows:
r2-2Er cosθ+E2＝R2；
by using r2-2Er cosθ+E2＝R2The formula calculates the change of the rotation angle of the detection hole caused by eccentricity according to the relative angle of the detection hole and the cosine theorem,
wherein, the rotation center after the eccentricity is generated is marked as O, the geometric center of the rotating object without eccentricity is marked as A, and the maximum eccentricity direction is
The eccentricity value is E, the zero position of the main mark is marked as B, the position of the detected hole is marked as C, the angle BAC is sigma, the angle BOC is alpha, the angle AOC is beta,
calculated according to the following formula:
∠OAC＝∠OAB+∠BAC＝γ；
OC2＝OA2+AC2-2×OA×ACcosγ＝E2+R2-2×E×Rcosγ；
to obtain
Eccentric distance in direction:
eσ＝OC-R；
calculated according to the following formula:
the obtained corrected rotation angle α is phi- β,
and correcting the rotation angle according to the obtained corrected rotation angle alpha, and correcting the detection result of fluorescence or absorbance according to the eccentric distance.
6. The eccentricity detection method according to claim 5, wherein the main marks and the sub marks are converted by projection, and the main marks and the sub marks are not arranged on a horizontal line.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107883892A (en) * | 2016-09-30 | 2018-04-06 | 佳能株式会社 | Eccentric computational methods, rotary encoder, robots arm and robot device |
| CN108713129A (en) * | 2016-04-25 | 2018-10-26 | 株式会社尼康 | Encoder apparatus, driving device, bearing table device and robot device |
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| EP1944582A1 (en) * | 2007-01-09 | 2008-07-16 | Leica Geosystems AG | Method for determining an influencing variable on the eccentricity of a goniometer |
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