CN109713132A - Thin-film solar cells and preparation method thereof - Google Patents
Thin-film solar cells and preparation method thereof Download PDFInfo
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Abstract
The present invention provides thin-film solar cells and preparation method thereof, the thin-film solar cells includes the transparent electrode being cascading, electron transfer layer, perovskite light-absorption layer, hole transmission layer and metal electrode, wherein, transparent electrode has multiple spaced grooves.It can inhibit the light absorption of transparent electrode by the way that groove is arranged in the battery, while not will cause apparent resistive loss, and then can be improved sun light utilization efficiency, improve the energy conversion efficiency of battery.
Description
Technical field
The present invention relates to technical field of solar batteries, and in particular to thin-film solar cells and preparation method thereof.
Background technique
Currently, perovskite solar battery has attracted extensive concern as novel efficient thin-film solar cells, inhale
Photosphere is film-type light-absorption layer, can easily be prepared by solution-coating method, and most of process in manufacturing process
It can carry out under cryogenic, and then flexible perovskite battery can be prepared.Furthermore, it has been reported that its energy conversion effect
Rate can be higher than 20%, but the energy conversion efficiency of current solar battery is still lower, how to further increase solar battery
Energy conversion efficiency is still the emphasis studied in the industry.
Summary of the invention
The present invention is directed to solve at least some of the technical problems in related technologies.For this purpose, of the invention
One purpose is to propose that one kind can effectively reduce light loss, while will not cause the thin film solar of obvious resistive loss
Battery.
In one aspect of the invention, the present invention provides a kind of thin-film solar cells.According to an embodiment of the invention,
The thin-film solar cells includes the transparent electrode being cascading, electron transfer layer, perovskite light-absorption layer, hole transmission layer
And metal electrode, wherein the transparent electrode has multiple spaced grooves.It can be inhibited by the way that groove is arranged as a result,
The light absorption of transparent electrode, while not will cause apparent resistive loss, and then can be improved sun light utilization efficiency, improve electricity
The energy conversion efficiency in pond.
In another aspect of this invention, the present invention provides a kind of thin-film solar cells.According to an embodiment of the invention,
Thin-film solar cells includes the buffer layer being cascading, transparent electrode, perovskite light-absorption layer, charge transport layer and metal
Electrode, wherein the transparent electrode has multiple spaced grooves.It can by setting groove in the thin-film solar cells
To reduce the thickness of the partially transparent electrode, to inhibit the light absorption of transparent electrode, while the transparent electrode of non-recessed portion
Still there is suitable thickness, resistance not will increase, so that apparent resistive loss will not be caused, and then can effectively mention
The energy conversion efficiency of high sun light utilization efficiency and battery.
According to an embodiment of the invention, the groove is located on surface of the transparent electrode far from the transparent substrate.
According to an embodiment of the invention, the depth of the groove accounts for the 40%~100% of the thickness of the transparent electrode.
According to an embodiment of the invention, the transparent electrode is single layer structure or multilayered structure.
According to an embodiment of the invention, the ratio of the area of the groove and the area of the transparent electrode is greater than 0 and is less than
0.325。
According to an embodiment of the invention, the material for forming the transparent electrode is transparent conductive oxide.
According to an embodiment of the invention, the groove is located at the transparent electrode on the surface of the transparent substrate,
And the part buffer layer cooperation is filled in the groove.
According to an embodiment of the invention, the material for forming the buffer layer includes Al2O3、SiOxNy、SiNxAnd MgF2In
It is at least one, wherein x=0.4~1.8, y=0.2~1.6.
In another aspect of this invention, the present invention provides a kind of sides for preparing mentioned-above thin-film solar cells
Method.According to an embodiment of the invention, this method includes sequentially forming transparent electrode, electron transfer layer, calcium titanium on the transparent substrate
Mine light-absorption layer, hole transmission layer and metal electrode, wherein the transparent electrode has multiple spaced grooves.Inventor
It was found that this method is simple, convenient, quick, and the thin-film solar cells prepared can inhibit the light of transparent electrode
It absorbs, while not will cause apparent resistive loss, and then can be improved sun light utilization efficiency, improve the energy conversion of battery
Efficiency.
In another aspect of this invention, the present invention provides a kind of sides for preparing mentioned-above thin-film solar cells
Method.According to an embodiment of the invention, this method includes sequentially forming buffer layer, transparent electrode, perovskite on the transparent substrate to inhale
Photosphere, charge transport layer and metal electrode, wherein the transparent electrode has multiple spaced grooves.Inventors have found that
This method is simple, convenient, quick, and the thin-film solar cells prepared can inhibit the light absorption of transparent electrode,
It not will cause apparent resistive loss simultaneously, and then can be improved sun light utilization efficiency, improve the energy conversion efficiency of battery.
According to an embodiment of the invention, the step of forming the transparent electrode includes: to be formed thoroughly on the transparent substrate
Bright conductive layer；Multiple spaced grooves are formed on the transparency conducting layer using laser, obtain the transparent electrode.
Detailed description of the invention
Fig. 1 is the schematic diagram of the section structure of existing thin-film solar cells.
Fig. 2 is the schematic diagram of the section structure of the thin-film solar cells of the embodiment of the present invention.
Fig. 3 is the planar structure schematic diagram of the transparent electrode of the embodiment of the present invention.
Fig. 4 is the planar structure schematic diagram of the transparent electrode of the embodiment of the present invention.
Fig. 5 is the schematic diagram of the section structure of the thin-film solar cells of the embodiment of the present invention.
Fig. 6 is the schematic diagram of the section structure of the thin-film solar cells of the embodiment of the present invention.
Fig. 7 is the method flow schematic diagram of the preparation transparent electrode of the embodiment of the present invention.
Fig. 8 is the planar structure schematic diagram of the transparent electrode of the embodiment of the present invention.
Fig. 9 is that the spectral irradiance of AM1.5G in the embodiment of the present invention is distributed and the absorption characteristic of ito transparent electrode is with wave
Long and transparent electrode thickness result of variations figure.
Figure 10 be in the embodiment of the present invention because different-thickness ito transparent electrode reflex and optical absorption and
The test result of caused photogenerated current loss.
Figure 11 is the photogenerated current of the transparent electrode of different depths of groove in the embodiment of the present invention with transparent electrode aperture opening ratio
Result of variations figure.
Figure 12 is that photogenerated current increases caused power gain in the embodiment of the present invention and resistance increases caused power damage
Consume the result of variations figure with aperture opening ratio.
Figure 13 be in the embodiment of the present invention thin-film solar cells efficiency with the result of variations figure of aperture opening ratio.
Specific embodiment
The embodiment of the present invention is described below in detail.The embodiments described below is exemplary, and is only used for explaining this hair
It is bright, and be not considered as limiting the invention.Particular technique or condition are not specified in embodiment, according to text in the art
It offers described technology or conditions or is carried out according to product description.Reagents or instruments used without specified manufacturer,
For can be with conventional products that are commercially available.
The present invention is following discovery based on inventor and understanding and completes:
Inventor research in find, thin-film solar cells have high efficiency and low cost advantage, but its have it is smaller
Electric current, battery performance is undesirable.Main cause is that sunlight is not used effectively, and causes photogenerated current smaller, specifically
, it is on the one hand because the surface of each layer of structure is smooth in thin-film solar cells, will lead to higher reflectivity, (principle is shown
It is intended to referring to Fig.1) it is absorbed by light-absorption layer for generating photogenerated current so that sunlight is reflected without；On the other hand be because
For widely used transparent conductive oxide electrode (TCO) because its band gap (~3eV) has light absorption and free carrier electricity
Lotus induction absorbs, so that the sunlight for generating photogenerated current tails off.Currently, improvement regarding to the issue above, is primarily upon
Reflectivity is being reduced, the various trials for reducing the high reflectance of thin-film solar cells have appeared in the newspapers, however about electrically conducting transparent
The problems in terms of light absorption of oxide electrode, never very good solution method.For above-mentioned problems in terms of light absorption, inventor is carried out
Further investigation, discovery TCO be not only used as electrode but also be used as optical window, to consider its transmitance and resistance simultaneously, be based on this, mention
Groove is formed on transparent electrode layer out, then not only can light absorption be reduced, but also not will cause the increase of resistance, so that
Light utilization efficiency and battery efficiency are effectively promoted.
In view of this, in one aspect of the invention, the present invention provides a kind of thin-film solar cells.According to the present invention
Embodiment, referring to Fig. 2, which includes the transparent electrode 20 being cascading, electron transfer layer 30, calcium
Titanium ore light-absorption layer 40, hole transmission layer 50 and metal electrode 60, wherein the transparent electrode 20 has multiple spaced recessed
Slot 21.It can reduce the thickness of the partially transparent electrode by the way that groove is arranged in the thin-film solar cells, to inhibit transparent
The light absorption of electrode, while the transparent electrode of non-recessed portion still has suitable thickness, resistance can't obviously increase, from
Without will cause apparent resistive loss, and then the energy conversion efficiency of sun light utilization efficiency and battery can be effectively improved.
Have it will be understood by those skilled in the art that each layer structure in above-mentioned thin-film solar cells needs to be arranged at one
Have on the substrate of supporting role, in addition, it is also desirable to above structure especially perovskite light-absorption layer is protected, therefore, reference
Fig. 2, usual thin film solar further include the transparent substrate 10 being arranged in transparent electrode far from electron transfer layer side, are arranged in gold
Belong to encapsulated layer 70 of the electrode 60 far from hole transmission layer side and backboard 80 of the encapsulated layer far from metal electrode side is set.Root
According to the embodiment of the present invention, transparent substrate and backboard can be respectively glass substrate or plastic base, and encapsulating structure can be light
Curing resin layer etc..
According to an embodiment of the invention, the groove 21 is located at the transparent electrode 20 and passes close to the electronics referring to Fig. 2
On the surface 22 of defeated layer 30.So set, transparent electrode layer can be made easily prepared, simplify preparation step and process, saves
Cost.In some specific implementations, transparency conducting layer can be directly formed on the transparent substrate 10, and then transparency conducting layer is carried out
The operations such as laser treatment or etching form groove.
According to an embodiment of the invention, the flat shape of groove 21 can be strip, or point referring to Fig. 3 and Fig. 4
Shape (is specifically as follows circle, triangle, quadrangle and other rules or irregular polygon, the feelings of rectangle shown in Fig. 4
Condition).As a result, those skilled in the art can flexible choice groove according to actual needs flat shape, the scope of application is wider.
According to an embodiment of the invention, in order to preferably reduce the light absorption of transparent electrode while electricity will not be obviously increased
Resistance, the depth H 1 of the groove accounts for the 40%~100% of the thickness H2 of the transparent electrode, such as 40%, 45%, 50%, 55%,
60%, 65%, 70%, 75%, 80%, 85%, 90%, 95%, 100% etc., wherein the thickness of depth of groove and transparent electrode
When than being 100%, i.e. expression groove runs through transparent electrode.Specifically, the thickness with transparent electrode increases, reflectivity gradually subtracts
Small, light absorption gradually increases, and resistance is gradually reduced, and comprehensively considers the above-mentioned influence factor of transparent electrode, and the depth of groove exists
Above range enables to thin-film solar cells to have better service performance.
According to an embodiment of the invention, in order to obtain better service performance, the thickness H2 of transparent electrode can be 50nm
~1000nm, as 50nm, 100nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm, 450nm, 500nm, 550nm,
600nm, 650nm, 700nm, 750nm, 800nm, 850nm, 900nm, 950nm, 1000nm etc..It, can be in the thickness range
So that transparent electrode has less light absorption, while there is suitable resistance, so that battery has high higher light benefit
With rate and energy conversion efficiency.
According to an embodiment of the invention, the ratio of the area of the groove and the area of the transparent electrode is greater than 0 and is less than
0.325, such as 0.1,0.125,0.15,0.175,0.2,0.225,0.25,0.275,0.3,0.325.Show by test recessed
The area accounting of slot is bigger, and the light absorption reduction of transparent electrode is more, and the resistance increase of transparent electrode is also more, in above-mentioned face
Within the scope of product accounting, resistance will not preferably can be significantly increased while effectively reducing light absorption.
According to an embodiment of the invention, the transparent electrode can be single layer structure, or multilayered structure.Adjacent two
The material of layer structure may be the same or different, and those skilled in the art can flexible choice according to actual needs.
According to an embodiment of the invention, the material for forming the transparent electrode can be transparent conductive oxide, such as wrap
Include but be not limited to tin indium oxide (ITO), fluorine-doped tin oxide (FTO), antimony-doped tin oxide (ATO), aluminium-doped zinc oxide (ZAO)
Etc..Both effectively sunlight can be made by being irradiated on light absorbing layer as a result, and there is preferable electric conductivity, be easy real
Now adulterate, it is easily prepared.
According to an embodiment of the invention, the material and thickness of electron transfer layer are not particularly limited, it can be normal for this field
The electron transport layer materials and thickness of rule.In some specific embodiments, the material of electron transfer layer can be zinc oxide, oxidation
Tin, titanium dioxide etc. can specifically include titanium dioxide dense layer and mesoporous titanium dioxide layer etc. by taking titanium dioxide as an example, electricity
The thickness of sub- transport layer can be 40nm~250nm, as 40nm, 50nm, 80nm, 100nm, 120nm, 150nm, 160nm,
170nm, 190nm, 200nm, 220nm, 240nm, 250nm etc..Thereby, it is possible to effectively facilitate photo-generate electron-hole to separation,
Separation of charge and efficiency of transmission are improved, influence of the charge accumulated to battery life is avoided.
According to an embodiment of the invention, the specific material and thickness of perovskite light-absorption layer are it is not also specifically limited, can be
The material and thickness of the perovskite light-absorption layer of this field routine.In some specific embodiments, the specific material of perovskite light-absorption layer
It can be CH3NH3(MA)PbX3、CHNH2(FA)PbX3Or organic hybrid (FA, MA) PbX3Deng, wherein MA indicates methylamine cation,
FA indicates carbonamidine amine cation, and X is halogen, such as I, Br, Cl, F.Thereby, it is possible to efficiently complete sun light absorption, photoproduction simultaneously
Multiple processes such as excitation, transport and the separation of carrier, light absorpting ability is strong, and light abstraction width is wide, and carrier lifetime is long, complete
Open-circuit voltage is higher under illumination, it is simple and convenient to prepare, and preparation condition is mild, can prepare under cryogenic, and is suitable for preparation
Flexible battery.
According to an embodiment of the invention, the material and thickness of hole transmission layer are not particularly limited, it can be normal for this field
The hole transport layer material and thickness of rule.In some specific embodiments, the material of hole transmission layer can for Spiro-OMeTAD,
CuSCN, CuI, PEDOT:PSS, P3HT or PTAA etc., the thickness of hole transmission layer can be 10nm~400nm, as 10nm,
30nm, 50nm, 60nm, 80nm, 90nm, 100nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm etc..As a result, can
Photo-generate electron-hole is enough effectively facilitated to separation, is conducive to hole transport to metal electrode, improves battery service performance.
According to an embodiment of the invention, metal electrode may be the metal electrode in traditional films solar battery, tool
Body, the material of metal electrode can be silver, copper, aluminium, molybdenum or in which the cladding of two or more compositions etc..Have as a result, good
Good electric conductivity, battery service performance are preferable.
In another aspect of this invention, the present invention provides a kind of thin-film solar cells.According to an embodiment of the invention,
Referring to Fig. 5, the thin-film solar cells include the buffer layer 90 being cascading, transparent electrode 20, perovskite light-absorption layer 40,
Charge transport layer 100 and metal electrode 60, wherein the transparent electrode 20 has multiple spaced grooves 21.The film
It can reduce the thickness of the partially transparent electrode by the way that groove is arranged in solar battery, so that the light of transparent electrode be inhibited to inhale
It receives, while the transparent electrode of non-recessed portion still has suitable thickness, resistance not will increase, to will not cause obvious
Resistive loss, and then the energy conversion efficiency of sun light utilization efficiency and battery can be effectively improved.
According to an embodiment of the invention, the groove 21 is located at the transparent electrode 20 close to the transparent base referring to Fig. 6
On the surface of plate 10, and the part cooperation of buffer layer 90 is filled in the groove 21.That is, in the corresponding position of groove
It sets different with the thickness of buffer layer 90 at non-recessed corresponding position.The convex-concave pattern of buffer-layer surface can effectively subtract as a result,
The reflection of few light conducive to the utilization rate for improving light, and then improves battery efficiency.
According to an embodiment of the invention, the material for forming the buffer layer 90 includes Al2O3、SiOxNy、SiNxAnd MgF2In
At least one, wherein x=0.4~1.8, y=0.2~1.6.Thus, it is possible to realize that refractive index gradient successively decreases, it is conducive to reduce
Reflection, improve light utilization efficiency from and battery efficiency.
According to an embodiment of the invention, charge transport layer involved in the thin-film solar cells and previously described hole
Transport layer is consistent, no longer excessively repeats herein；Transparent substrate involved in the thin-film solar cells, transparent electrode, perovskite
Light-absorption layer, metal electrode, encapsulated layer and backboard can be consistent with the previously described, and this is no longer going to repeat them.
In another aspect of this invention, the present invention provides a kind of sides for preparing mentioned-above thin-film solar cells
Method.According to an embodiment of the invention, this method includes sequentially forming transparent electrode, electron transfer layer, calcium titanium on the transparent substrate
Mine light-absorption layer, hole transmission layer and metal electrode, wherein the transparent electrode has multiple spaced grooves.Inventor
It was found that this method is simple, convenient, quick, and the thin-film solar cells prepared can inhibit the light of transparent electrode
It absorbs, while not will cause apparent resistive loss, and then can be improved sun light utilization efficiency, improve the energy conversion of battery
Efficiency.
According to an embodiment of the invention, obtaining higher photogenerated current, this hair to reduce the light absorption of transparent electrode
It is bright that groove is formed using induced with laser Patternized technique, to optimize the balance between current gain and power loss, and relative to
Conventional preparation techniques do not need additional operation equipment and operating procedure.It will be understood by those skilled in the art that solar battery
The transparent electrode layer of flood is formed usually on the substrate opened greatly, and laser then is carried out to the transparent electrode layer on big substrate and is cut
The transparent electrode to be formed in single solar battery is cut, induced with laser Patternized technique of the invention can be used and be cut with laser
Identical technique is cut to carry out.According to a particular embodiment of the invention, referring to Fig. 7 and Fig. 8, the step of forming the transparent electrode, can
To include: to form flood transparency conducting layer 24 on transparent substrate 10 greatly；Flood transparency conducting layer 24 is cut using laser
At multiple sub- transparency conducting layers, every sub- transparency conducting layer is used to form the transparent electrode in a solar battery, the step
In multiple spaced grooves 21 can be formed on sub- transparency conducting layer using laser simultaneously, obtain the transparent electrode
20.It does not need to increase additional operation equipment and operating procedure as a result, it can be completely compatible with conventional preparation techniques.
In another aspect of this invention, the present invention provides a kind of sides for preparing mentioned-above thin-film solar cells
Method.According to an embodiment of the invention, this method includes sequentially forming transparent electrode, perovskite light-absorption layer, electricity on the transparent substrate
Lotus transport layer and metal electrode, wherein the transparent electrode has multiple spaced grooves.Inventors have found that this method
It is simple, convenient, quick, and the thin-film solar cells prepared can inhibit the light absorption of transparent electrode, while not
It will cause apparent resistive loss, and then can be improved sun light utilization efficiency, improve the energy conversion efficiency of battery.
According to some embodiments of the present invention, the step of forming transparent electrode layer may include: to be formed on the buffer layer thoroughly
Bright conductive layer；Multiple spaced grooves are formed on the transparency conducting layer using laser, obtain the transparent electrode.Tool
Body steps and operations can be consistent with the previously described, no longer excessively repeats herein.
Other embodiments according to the present invention, the groove on transparent electrode layer can be the morphogenesis by buffer layer
, specifically, the buffer layer of surfacing can first be formed on the transparent substrate, then to the buffer layer of surfacing far from thoroughly
The surface of bright substrate carries out laser treatment, forms protrusion, then forms transparent electrode on the raised surface of buffer layer, then
In the corresponding position of protrusion, corresponding groove is formed in transparent electrode.
The embodiment of the present invention is described below in detail, the specific test method in following example is normal according to this field
The basic logic method of rule carries out what emulation measuring and calculating carried out.
Embodiment 1:
Test sample: it is 50nm's and 500nm that thickness (Thickness) is respectively formed on the surface of glass transparent substrate
Tin indium oxide (ITO) transparent electrode, obtains test sample.
Test method: the absorbing properties of above-mentioned test sample, test result and AM1.5G are tested under the conditions of AM1.5G
Fig. 9 is shown in spectral irradiance distribution.
Fig. 9 shows that the spectral irradiance of AM1.5G is distributed and the absorption characteristic of ito transparent electrode is with wavelength and transparent electricity
The result of variations figure of pole thickness.As seen from Figure 9, when wavelength is less than 450nm, as transparent electrode thickness increases light absorption
Rate significantly increases, and sharply declines as wavelength increases absorptivity, when wavelength further increases, inhales as wavelength increases light
Yield slightly increases；And when wavelength be 300nm when, with a thickness of 50nm transparent electrode have 30% absorptivity, and with a thickness of
The transparent electrode of 500nm, with 100% absorptivity；And with a thickness of the transparent electrode of 500nm, when wavelength is 400nm, still
With the absorptivity for being greater than 40%.
Embodiment 2
Test sample: test sample is multiple solar batteries, which includes the glass being cascading
Transparent substrate, ito transparent electrode, electron transfer layer (titanium dioxide), perovskite light-absorption layer, hole transmission layer (Spiro-
OMeTAD) and silver electrode, the thickness of the ito transparent electrode in multiple solar batteries is different, and respectively 0nm (does not include ITO
Transparent electrode), 100nm, 200nm, 300nm, 400nm and 500nm.
Test method: being directed to above-mentioned multiple solar batteries, is emulated respectively according to the basic logic method of this field routine
Calculate because different-thickness transparent electrode layer reflex caused by photogenerated current loss and because of transparent electrode light absorption caused by
Photogenerated current loss, test result are shown in Figure 10.
Figure 10 is shown because of photoproduction caused by the reflex and optical absorption of the ito transparent electrode of different-thickness
The test result of current loss.As shown in Figure 10, as ito transparent electrode thickness increases, photogenerated current caused by reflex
Loss is gradually reduced, and because the loss of photogenerated current caused by optical absorption gradually increases, and total photogenerated current loss
It gradually increases.Therefore, when not having ito transparent electrode, minimum 20.9mA/cm is lost in photogenerated current2, than with a thickness of 500nm
The photogenerated current of ito transparent electrode small 1.56mA/cm is lost2.However, while ito transparent electrode is as optical window also
It is used as electrode, to constitute the essential component of solar battery, therefore, in order to further increase photogenerated current and battery
Efficiency, it is necessary to which exploitation can reduce the current loss of transparent electrode layer absorption, and minimize the resistance loss occurred at this time
Technology.
Embodiment 3
Test sample: ito transparent electrode (with a thickness of 500nm), electron transfer layer are sequentially formed on glass transparent substrate
(titanium dioxide, with a thickness of 40nm), perovskite light-absorption layer (MAPbI3, with a thickness of 500nm), hole transmission layer (Spiro-
OMeTAD, with a thickness of 150nm), metal electrode (silver, with a thickness of 100nm), encapsulated layer (ethylene-vinyl acetate copolymer, EVA)
With backboard (glass), test sample is obtained, wherein the forming step of ito transparent electrode are as follows: form transparent lead on the transparent substrate
Electric layer；Multiple spaced grooves are formed on the transparency conducting layer using laser, obtain transparent electrode.Utilize above-mentioned side
It is different too with the transparent electrode thickness of bottom portion of groove that method prepares a series of aperture opening ratios (groove area/transparent electrode gross area)
Positive energy battery.
Test method: being directed to a series of above-mentioned solar batteries, is emulated and is surveyed according to the basic logic method of this field routine
The photogenerated current Jph of solar battery is calculated, test result is shown in Figure 11, wherein 0%, 20%, 40%, 60%, 80% indicates groove
The thickness of the transparent electrode of bottom accounts for the percentage of transparent electrode overall thickness, i.e., (transparent electrode overall thickness H2- depth of groove H1)/
Transparent electrode overall thickness H2.
As shown in Figure 11, photogenerated current Jph increases as aperture opening ratio increases, the photoproduction electricity when groove runs through transparent electrode
Stream and its rate of rise reach maximum value, although however, photogenerated current is maximum in no transparent electrode, but transparent electrode is made
It is the essential component part of thin-film solar cells for the electrode in thin-film solar cells, in thin-film solar cells
Setting transparent electrode is still needed to, therefore, it is necessary to reasonably select the thickness of transparent electrode.
Embodiment 4
Test sample: ito transparent electrode (with a thickness of 500nm), electron transfer layer are sequentially formed on glass transparent substrate
(titanium dioxide, with a thickness of 40nm), perovskite light-absorption layer (MAPbI3, with a thickness of 500nm), hole transmission layer (Spiro-
OMeTAD, with a thickness of 150nm), metal electrode (silver, with a thickness of 100nm), encapsulating material (ethylene-vinyl acetate copolymer,
EVA) and backboard (glass), test sample is obtained, wherein the forming step of ito transparent electrode are as follows: formed on the transparent substrate saturating
Bright conductive layer；Multiple interval settings are formed on the transparency conducting layer using laser and run through the groove of transparent electrode layer, are obtained
To transparent electrode.A series of different solar battery of aperture opening ratios, transparent substrate in solar battery are prepared using the above method
It can refer to the plan view of transparent electrode referring to Fig. 3.
Test method: being directed to a series of above-mentioned solar batteries, is emulated and is surveyed according to the basic logic method of this field routine
The photogenerated current for calculating solar battery increases caused power gain, resistance increases power loss caused by flesh, and test result is shown in figure
12 and Figure 13.
By Figure 12 and Figure 13 it is found that power gain caused by photogenerated current increases increases with the increase of aperture opening ratio, and
Power loss caused by the increase of transparent electrode resistance also with aperture opening ratio increase and increase, and when 0 < aperture opening ratio < 0.325
When, the overall power of battery increases, wherein power loss Ploss caused by the increase of transparent electrode resistance passes through following public affairs
Formula is calculated:
dPloss=I2dR
Wherein: ρs: transparent electrode resistance (Ω/sq)
L: transparent electrode length (cm)
J: current density (A/cm2)
S: recess width (cm)
In the description of this specification, reference term " one embodiment ", " some embodiments ", " example ", " specifically show
The description of example " or " some examples " etc. means specific features, structure, material or spy described in conjunction with this embodiment or example
Point is included at least one embodiment or example of the invention.In the present specification, schematic expression of the above terms are not
It must be directed to identical embodiment or example.Moreover, particular features, structures, materials, or characteristics described can be in office
It can be combined in any suitable manner in one or more embodiment or examples.In addition, without conflicting with each other, the skill of this field
Art personnel can tie the feature of different embodiments or examples described in this specification and different embodiments or examples
It closes and combines.
Although the embodiments of the present invention has been shown and described above, it is to be understood that above-described embodiment is example
Property, it is not considered as limiting the invention, those skilled in the art within the scope of the invention can be to above-mentioned
Embodiment is changed, modifies, replacement and variant.
Claims (10)
1. a kind of thin-film solar cells, which is characterized in that including the transparent electrode that is cascading, electron transfer layer, calcium titanium
Mine light-absorption layer, hole transmission layer and metal electrode, wherein the transparent electrode has multiple spaced grooves.
2. a kind of thin-film solar cells, which is characterized in that including buffer layer, transparent electrode, the perovskite being cascading
Light-absorption layer, charge transport layer and metal electrode, wherein the transparent electrode has multiple spaced grooves.
3. thin-film solar cells according to claim 1 or 2, which is characterized in that the groove is located at the transparent electricity
On surface extremely far from the transparent substrate.
4. thin-film solar cells according to claim 1 or 2, which is characterized in that meet at least one of the following conditions:
The depth of the groove accounts for the 40%~100% of the thickness of the transparent electrode；
The ratio of the area of the groove and the area of the transparent electrode is greater than 0 and less than 0.325.
5. thin-film solar cells according to claim 1 or 2, which is characterized in that the transparent electrode meets following item
At least one of part:
For single layer structure or multilayered structure；
The material for forming the transparent electrode is transparent conductive oxide.
6. thin-film solar cells according to claim 2, which is characterized in that the groove is located at the transparent electrode and leans on
On the surface of the nearly transparent substrate, and the part buffer layer cooperation is filled in the groove.
7. the thin-film solar cells according to claim 2 or 6, which is characterized in that form the material packet of the buffer layer
Include Al2O3、SiOxNy、SiNxAnd MgF2At least one of, wherein x=0.4~1.8, y=0.2~1.6.
8. a kind of method for preparing thin-film solar cells described in any one of claim 1,3-5, which is characterized in that including
Transparent electrode, electron transfer layer, perovskite light-absorption layer, hole transmission layer and metal electrode are sequentially formed on the transparent substrate,
In, the transparent electrode has multiple spaced grooves.
9. a kind of method for preparing thin-film solar cells described in any one of claim 2-7, which is characterized in that be included in
Buffer layer, transparent electrode, perovskite light-absorption layer, charge transport layer and metal electrode are sequentially formed on transparent substrate, wherein described
Transparent electrode has multiple spaced grooves.
10. method according to claim 8 or claim 9, which is characterized in that the step of forming the transparent electrode include:
Transparency conducting layer is formed on the transparent substrate；
Multiple spaced grooves are formed on the transparency conducting layer using laser, obtain the transparent electrode.
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| CN110265682A (en) * | 2019-06-06 | 2019-09-20 | 深圳市致远动力科技有限公司 | The preparation method of battery testing intermediate |
| WO2023071203A1 (en) * | 2021-10-25 | 2023-05-04 | 隆基绿能科技股份有限公司 | Perovskite cell having hole transport layer of comb-like fiber structure and preparation method for perovskite cell |
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