CN109709630A - Surpass the sub-wavelength vortex beams array production method on surface based on metal nano - Google Patents
Surpass the sub-wavelength vortex beams array production method on surface based on metal nano Download PDFInfo
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Abstract
The invention proposes a kind of sub-wavelength vortex beams array production methods for surpassing surface based on metal nano, it prepares the super surface texture of special metal nanometer being made of metal nano-rod array first, then pass through the circularly polarized light vertical irradiation super surface texture of special metal nanometer, thus circularly polarized light is transformed into the vortex beam array of sub-wavelength dimensions, the present invention also passes through the size and arrangement for rationally designing metal nano-rod, prepare the super surface texture of special metal nanometer that can produce sub-wavelength vortex beam array, compared to other vortex light beam producing methods, method therefor of the present invention has structure simple, with be easily integrated, the advantages that light distribution is uniform, and the vortex beams array that this method generates can not only transmit and enhancement information safety and capacity in storage in information, a large amount of particles are disposably captured in particle capture , and the kinetic characteristic of different objects can be detected simultaneously, expand the application field of vortex light beam.
Description
Technical field
The present invention relates to light field regulation and control fields novel in micronano optical, and in particular to is based on the super surface of metal nano to a kind of
Sub-wavelength vortex beams array production method.
Background technique
Vortex beams are also known as optical vortex, are a kind of light fields with isolated singularity, wherein carrying the title of phase singularity
For phase vortex light beam (Orbital Angular Momentum, OAM), the wave vector of phase vortex light beam has orientation item, and
It is rotated around vortex core, in optics expression formula μ0(r, θ, z)=μ0There are phase factors in (r, z) exp (il θ) exp (- ikz)
Exp (il θ), wherein r is the displacement vector at origin, μ0Indicate that amplitude, θ indicate azimuth, z indicates propagation distance, l
For its topological charge number, k is wave number, and size isThe wavelength of λ expression incident light.Due to different topological charge numbers, each
The orbital angular momentum that photon carriesIt is different.The center of vortex beams is a micron-sized blackening, and to micro-nano particle manipulation
When without thermal losses effect, this makes vortex beams have a wide range of applications in Micro and nano manipulation field, while vortex beams are to particle
When imprison, particle can be allowed to rotate by orbital angular momentum, therefore also referred to as " optical wrench ".Vortex beams are over long distances
Stability is strong when transmission, and theoretically has unlimited quadrature, is between the vortex beams of the different orientations of coaxial transmission
Mutually orthogonal, the crosstalk between light beam is minimum, so light beam effectively can be multiplexed and demultiplex, this makes vortex beams exist
There is huge application prospect in secret communication field.In addition, vortex beams are also in biomedicine, Micromechanics, astronomy, quantum
There is huge application potential in the fields such as information processing.
The method for generating vortex beams at present specifically includes that spiral phase plate method, geometric mode transformation approach, space light modulation
Device method and calculating holography method etc..Spiral phase plate method is by adding a screw type to light during with screw type phase
Phase, geometric mode variation are to change the mode of incident light by optical device, and the essence of both methods is all to incident light
Light path be modulated from what and make different location that there is different phases, but the accumulation of light path is so that device must have centainly
Physical size, this also at limit its to micromation, integrated development a key factor；Spatial light modulator method and meter
Calculating holography method is to reproduce vortex beams by principle of holography, and this mode can generate multiple vortex beams, but light beam photic-energy transfer
Unevenly, and not overlapping is had between the light beam of same order, therefore, it is difficult to therefrom isolate the vortex beams of single topological charge number.To the greatest extent
Pipe generates there are many ways to vortex beams, but all there are some defects, and application scenarios are limited.Therefore, a kind of energy is developed
Enough generating photic-energy transfer uniformly, without high order diffraction influences, and the vortex beams array generator of sub-wavelength dimensions is led in micronano optical
Domain has great importance.
1984, Britain professor Berry was put forward for the first time the concept of geometric phase.Berry is the study found that when a thermal break
Reason system develops a cycle along a certain path (in certain parameter space or state space) from initial state and returns to initial shape
When state, most final state and initial state and inequivalence, and need to increase an additional phase factor (Quantal phase
Factors accom panying adiabatic changes, M.V.Berry, Proceedings of the Royal
Society A:Mathematical, Physical and Engineering Sciences, Vol.392, No.1802,
Pages 45-57,08March 1984)；1956, Raman study institute, India professor Pancharatnam studied to obtain electromagnetic wave
An additional phase (Generalized theory of interference and can be generated in polarization state conversion process
Its applications, Pancharatnam S., Proc eedings of the Indian Academy of
Sciences-Section A, Vol.44, No.5, pages 247-262,30October 1956).The electromagnetism of a certain polarization state
Wave develops and returns to initial state along a certain path in Poincare sphere surface, and final state differs a phase factor, value etc. with initial state
In the half of the enclosed closed loop solid angle of evolution path geodesic curve.Based on these theories, correlative study person proposes geometry phase
The concept on the super surface of bit-type.Always regulate and control electromagnetic wave phase in the geometry song of two-dimensional surface by sub-wavelength metal or dielectric structure
Parameter to construct desired wavefront, and then has obtained including planar imaging lens, orientation surface wave coupler, super concussion
A series of complex planar optical device including lens, vortex beams generator, vortex beam splitter.The present invention is based on several
What super study of surfaces of phase type has obtained a kind of sub-wavelength vortex beams array production method.
In above-mentioned background technique, such as spiral phase plate method, geometric mode transformation approach, spatial light modulator method and calculating are complete
All there are some defects in the vortex beams such as breath method production method, application scenarios are limited.Researching and designing of the present invention is a kind of based on gold
Belong to the sub-wavelength vortex beams array production method on the super surface of nanometer, can not only transmit in information and pacify with enhancement information in storage
Quan Xingyu capacity captures a large amount of particles of manipulation simultaneously in Micro and nano manipulation, and can detect the kinetic characteristic of different objects simultaneously,
The application field of vortex light beam is expanded.
Summary of the invention
It is an object of the invention to the amplitude of vortex beams array and phase are converted to the size and rotation of metal nano-rod
Corner is regulated and controled while realization to incident beam amplitude with phase by the size and rotation angle of rational design metal nano-rod,
And using the metal nano-rod array of electron beam etching method manufacturing cycle distribution, the super surface texture of metal nano is thus constituted,
In the case where circularly polarized light surpasses surface texture bottom normal incidence from metal nano, is produced from the transmission region that the super surface texture of metal nano is formed
The vortex beams array for the sub-wavelength dimensions that the third contact of a total solar or lunar eclipse can be evenly distributed, to solve the problems, such as background technique.Of the invention
Other vortex beams are compared based on the sub-wavelength vortex beams array production method that metal nano surpasses surface and generate originating party formula, are had
The advantages such as structure is simple, is easily integrated.
It is of the invention that surpass the sub-wavelength vortex beams array production method on surface based on metal nano include: to prepare first
The entirety being made of metal nano-rod array and quartz glass substrate is in the super surface texture of special metal nanometer of rectangular shape,
The metal nano-rod array includes n metal nano-rod, wherein n is positive integer and n > 4, the metal nano-rod period row
Cloth is on the upper surface of the quartz glass substrate, and with metal nano-rod array upper surface, institute any point is in the planes
Origin, from the origin, the length and width direction of the super surface texture of special metal nanometer is respectively X-axis and Y-axis, institute
The opposite direction for stating the super surface structure thickness of special metal nanometer is Z axis；Then by wavelength be 532nm circularly polarized light from Z <'s 0
Region vertical irradiation is to the super surface texture of special metal nanometer, after the circularly polarized light is acted on any one metal nano-rod,
Its phase of light wave just adds 2 θ of phase factor, and wherein θ is the angle of any one metal nano-rod long axis and X-axis, because every
The long axis of one metal nano-rod and the angle theta of X-axis are different, and the circularly polarized light transmitted from the X/Y plane of Z=0 is Z >'s 0
The different location of transmission region is presented different phases, and 4 adjacent metal nano-rods generate one in X and Y-axis both direction
Vortex beams, the diameter of the vortex beams are 180nm, due to the effect of metal nano-rod array, are produced in the transmission region of Z > 0
The third contact of a total solar or lunar eclipse can be evenly distributed and the vortex beams array of the sub-wavelength dimensions of phase Spiral distribution.
Wherein, the specific method for preparing the super surface texture of special metal nanometer includes the following steps:
S1) the spin coating photoresist in quartz glass substrate
S11 quartz glass substrate) is cleaned
It is 0.5mol/L that the virgin quartz substrate of glass of rectangular shape, which is placed in concentration, and temperature is 35 DEG C~50 DEG C
It in HCl solution, stands after ten minutes, quartz glass substrate is placed in 50 DEG C or so of pure water and is impregnated 5 minutes, take out quartzy glass
Glass substrate carries out secondary cleaning with 50 DEG C or so of pure water again, completes the chemical cleaning of quartz glass substrate；
S12 quartz glass substrate) is dried
Step S11 will be passed through) the quartz glass substrate of processing is placed on cleaning basket, and is passed through temperature into cleaning basket and is
80 DEG C or so of noble and unsullied net air or nitrogen continues 10~20 minutes, after quartz glass substrate and cleaning basket are sufficiently dried,
The drying of quartz glass substrate is completed；
S13) spin coating photoresist
Will pass through step S12) processing quartz glass substrate be adsorbed on vacuum chuck, adjustment vacuum chuck revolving speed be
500rpm, and instill photoresist to quartz glass substrate upper surface center, after 5 seconds, vacuum chuck revolving speed is increased to 3000~
7000rpm whirl coating 30 seconds, forms the photoresist coating with a thickness of 140nm；
S14) soft baking quartz glass substrate after spin coating
After photoresist quartz glass substrate upper surface coating uniformly after, will pass through step S13) handle quartz glass substrate
Bottom is placed on soft on 80 DEG C of vacuum hot plate dry 2~5 minutes；
S2) electron beam exposure obtains figure
S21 electron beam exposure) is focused
It is 30KV with acceleration voltage, spot size 30nm, exposure dose is 25 μ c/cm2Electron beam exposure vector machine
To pass through step S1) treated, and quartz glass substrate is exposed, using pre-set programs control electron beam exposure vector machine with
It is 90nm in the stick length that quartz glass substrate upper surface obtains photoresist nanometer rods, stick width is 30nm, and thickness is 140~
The photoresist nanometer stick array figure of 150nm, wherein the photoresist of every 1 row and every 1 column is received in photoresist nanometer stick array figure
Rice stick is alternatively arranged with X-axis in 45 °, -45 ° of angles respectively, and between any two adjacent photoresist nanometer rods geometric centers
Distance be 180nm；
S22 quartz glass substrate is dried after) exposing
Step S21 will be passed through) quartz glass substrate that treated is placed in 150 DEG C~170 DEG C of oven, toast 90 points
Clock, and cooling 30 minutes are stood in normal temperature environment；
S3) develop
S31) develop, be fixed
Step S2 will be passed through) quartz glass substrate that treated be immersed in temperature be 60 in 21 ± 0.2 DEG C of developer solution~
It 120 seconds, is then placed in aqueous isopropanol 30~40 seconds, completes fixing, obtain the nanometer positioned at quartz glass substrate upper surface
Stick array pattern；
S32 substrate is dried after) being fixed
It takes out and is placed on soft baking 2~5 minutes on 80 DEG C of vacuum hot plate by step S31) quartz glass substrate that treated,
Obtain the nanometer stick array figure of the drying positioned at quartz glass substrate upper surface；
S33) figure inspection, evaporated metal film
Using scanning electron microscopy observation technology to passing through step S32) baking of treated quartz glass substrate upper surface
Dry nanometer stick array figure checked, is determined after the nanometer stick array figure of the drying is qualified with thermal evaporation station to quartzy glass
Glass substrate carries out metallic gold (Au) evaporation, wherein golden (Au) with a thickness of 20nm~30nm；
S34) removal photoresist obtains metallic pattern
Acetone removing is carried out to by step S33) quartz glass substrate that treated, removes remaining electron beam resist
And metallic gold, gold nano stick array is obtained in quartz glass substrate upper surface, wherein the gold nanorods in the gold nano stick array
Size is long 90nm, wide 30nm, thick 25nm, and the gold nanorods of every 1 row and every 1 column are in X-axis respectively in gold nano stick array
45 °, -45 ° of angles be alternatively arranged, and any two adjacent the distance between gold nanorods geometric centers are 180nm, thus
Obtain the super surface texture of special metal nanometer.
The present invention passes through the size and arrangement for rationally designing metal nano-rod, and this is more mature using electron beam lithography
Micro-nano processing method prepares the super surface of periodical metal nano-rod that can produce sub-wavelength vortex beam array.Compared to it
His vortex light beam producing method, method therefor of the present invention has many advantages, such as that structure is simple and is easily integrated, light distribution is uniform.
And this method generate vortex beams array can not only information transmit with store in enhancement information safety and capacity,
A large amount of particles are disposably captured in particle capture, and can detect the kinetic characteristic of different objects simultaneously, have expanded vortex light beam
Application field.
Detailed description of the invention
Fig. 1 is the schematic diagram of the super surface texture of metal nano of the present invention
Fig. 2 be the transmission region (region of Z > 0) that emulates of Fdtd Method along Z axis apart from gold nano stick array
Single vortex beams phase distribution figure at 100nm；
Fig. 3 is the simulation result that Fdtd Method obtains: (a) transmission region (region of Z > 0) is along Z axis apart from Jenner
The surface of intensity distribution at rice stick array 100nm；(b) transmission region (region of Z > 0) is along Z axis at gold nano stick array 100nm
Phase distribution figure
Fig. 4 is the electron scanning micrograph that electron beam lithography obtains gold nano stick array
Specific embodiment
The present invention is described in further detail with reference to the accompanying drawing.
The sub-wavelength vortex beams array production method for surpassing surface based on metal nano of the invention is prepared specific first
The super surface texture of metal nano, preparation are the highly transmissive quartz glass using rectangular shape as substrate, utilize electron beam
Etching technics prepares the gold nano stick array of period arrangement in upper surface of substrate, and the gold nano stick array includes n Jenner
Rice stick, wherein n is positive integer and n > 4, using gold nano stick array upper surface institute in the planes any point as origin, from
The origin sets out, and the length and width direction of the super surface texture of special metal nanometer is respectively X-axis and Y-axis, described specific
The opposite direction of the super surface structure thickness of metal nano is Z axis, i.e. the upper surface of gold nano stick array is located at the X/Y plane at Z=0
On, and the size of gold nanorods is 90nm × 30nm × 25nm, and respectively with laterally, it is longitudinal be respectively in 45 ° with X-axis ,-
45 ° of angles are staggered, i.e., gold nanorods are with the arrangement of 360nm ± 10nm period distances, due to every 1 row in gold nano stick array
On every 1 column, gold nanorods are all using 180nm as interval, be respectively in 45 ° with X-axis, -45 ° of angles it is spaced, from one and X
Axis is in the gold nanorods that the next and X-axis on the gold nanorods to the row or the column of 45 ° of angles arrangement is in that 45 ° of angles arrange
Between be spaced 360nm, in addition allowable error range, therefore claim the gold nanorods in gold nano stick array with 360nm ± 10nm
For period distances arrangement；Then by wavelength be 532nm circularly polarized light from the region vertical irradiation of Z < 0 to special metal nanometer
After super surface texture, the circularly polarized light and the effect of any one gold nanorods, phase of light wave just adds a phase factor 2
θ, wherein θ be any one gold nanorods long axis and X-axis angle, because each gold nanorods long axis and X-axis angle theta not
Together, different phases is presented in different location of the circularly polarized light that the X/Y plane from Z=0 transmits in the transmission region of Z > 0
4 adjacent gold nanorods generate a vortex beams in position, X and Y-axis both direction, and the diameter of the vortex beams is 180nm,
That is the diameter of the vortex beams wavelength that is less than incident circularly polarized light, therefore under the action of gold nano stick array, in the saturating of Z > 0
It penetrates region and generates photic-energy transfer uniformly and the vortex beams array of the sub-wavelength dimensions of phase Spiral distribution.
The specific method that the super surface texture of special metal nanometer is prepared in the present invention includes the following steps:
S1) the spin coating photoresist in quartz glass substrate
S11 quartz glass substrate) is cleaned
It is 90% by refractive index, highest heatproof is 1500 DEG C, and with a thickness of 3mm, length and width is the cuboid of 800nm
The high-purity quartz glass substrate of shape is placed in concentration as 0.5mol/L, in the HCl solution that temperature is 45 DEG C, stands 10 minutes
Afterwards, quartz glass substrate is placed in 50 DEG C or so of pure water and is impregnated 5 minutes, taken out quartz glass substrate and use 50 DEG C or so again
Pure water carries out secondary cleaning, completes the chemical cleaning of quartz glass substrate；
S12 quartz glass substrate) is dried
Step S11 will be passed through) the quartz glass substrate of processing is placed on cleaning basket, and is passed through temperature into cleaning basket and is
80 DEG C or so of noble and unsullied net air or nitrogen continues 10~20 minutes, after quartz glass substrate and cleaning basket are sufficiently dried,
The drying of quartz glass substrate is completed；
S13) spin coating photoresist
Will pass through step S12) processing quartz glass substrate be adsorbed on vacuum chuck, adjustment vacuum chuck revolving speed be
500rpm, and the polymethyl methacrylate (polymethyl that concentration is 5% is instilled to quartz glass substrate upper surface center
Methacrylate, PMMA) photoresist, after 5 seconds, vacuum chuck revolving speed is increased to 3000~7000rpm, whirl coating 30 seconds, shape
At the photoresist coating with a thickness of 140nm；
S14) soft baking quartz glass substrate after spin coating
After photoresist quartz glass substrate upper surface coating uniformly after, will pass through step S13) handle quartz glass substrate
Bottom is placed on soft on 80 DEG C of vacuum hot plate dry 2~5 minutes；
S2) electron beam exposure obtains figure
S21 electron beam exposure) is focused
It is 30nm, acceleration voltage 30KV, 25 μ c/cm of exposure dose with spot size2Model Raith 150 electricity
Beamlet exposure vector machine carries out exposure vector to by step S1) quartz glass substrate that treated, is controlled using pre-set programs
Electron beam exposure vector machine is 90nm with the stick length for obtaining photoresist nanometer rods in quartz glass substrate upper surface, and stick width is
30nm, thickness are the photoresist nanometer stick array figure of 150nm, wherein every 1 row and every 1 in photoresist nanometer stick array figure
The photoresist nanometer rods of column are alternatively arranged with X-axis in 45 °, -45 ° of angles respectively, and any two adjacent photoresist nanometer rods
The distance between geometric center is 180nm.
S22 quartz glass substrate is dried after) exposing
Step S21 will be passed through) quartz glass substrate that treated is placed in 170 DEG C of oven, it toasts 90 minutes, and
It is stood in normal temperature environment 30 minutes cooling；
S3) develop
S31) develop, be fixed
Step S2 will be passed through) to be immersed in temperature be 21 ± 0.2 DEG C of two pentanone of tetramethyl to quartz glass substrate that treated
(MIBK) and isopropanol (IPA) was with 100 seconds in the developer solution of the ratio mixing of 1:3, was then placed in aqueous isopropanol 40 seconds, complete
At fixing, the nanometer stick array figure positioned at quartz glass substrate upper surface is obtained；
S32 substrate is dried after) being fixed
It takes out and is placed on soft baking 2~5 minutes on 80 DEG C of vacuum hot plate by step S31) quartz glass substrate that treated,
Obtain the nanometer stick array figure of the drying positioned at quartz glass substrate upper surface；
S33) figure inspection, evaporated metal film
Using scanning electron microscopy (SEM) observation technology to passing through step S32) treated quartz glass substrate upper surface
The nanometer stick array figure of drying checked, determine after the nanometer stick array figure of the drying is qualified with thermal evaporation station to stone
English substrate of glass evaporates the metallic gold (Au) of 1 layer of 25nm thickness；
S34) removal photoresist obtains metallic pattern
Acetone removing is carried out to by step S33) quartz glass substrate that treated, removes remaining electron beam resist
And metallic gold, gold nano stick array is obtained in quartz glass substrate upper surface, wherein the gold nanorods in the gold nano stick array
Size is long 90nm, wide 30nm, thick 25nm, and the gold nanorods of every 1 row and every 1 column are in X-axis respectively in gold nano stick array
45 °, -45 ° of angles be alternatively arranged, and any two adjacent the distance between gold nanorods geometric centers are 180nm, thus
Obtain the super surface texture of special metal nanometer.Fig. 4 is its scanning electron microscope (SEM) photo, the 100nm only conduct in Fig. 4
Scale.
Fig. 2~Fig. 3 is to emulate the above-mentioned special metal being made of metal nano-rod array using time-domain finite difference
The sub-wavelength period vortex light beam of the super surface texture of nanometer tells on:
25 are arranged first respectively with laterally, it is longitudinal be respectively in 45 ° with X-axis, -45 ° of angles are alternatively arranged and all with 360nm
The gold nano stick array of period distances arrangement, as shown in Figure 1, wherein the length of 25 gold nanorods is 90nm, and width is
30nm, thickness are 25nm, as shown in Figure 1；Then 400nm × 400nm × 2000nm is set by simulating area, and wave is set
The left circularly polarized light of a length of 532nm is from the bottom vertical irradiation of the super surface texture of special metal nanometer to the special metal nanometer
In the gold nano stick array of super surface texture；Then in transmission region (region of Z > 0) along Z axis on gold nano stick array
A field monitor is respectively set at 1000nm, 2000nm in surface 20nm, 50nm, 100nm, 500nm, each to monitor respectively
Electric field, magnetic field of monitor position etc.；The electric field strength point of each position in transmission region is obtained finally by simulation calculation
Cloth, field vector phase distribution etc..The transmission region of Fig. 3 (a) expression super surface texture of special metal nanometer is along Z axis apart from nanometer rods
Electric-field intensity distribution at array 100nm, light energy are more concentrated in periodic distribution；Fig. 3 (b) indicates special metal nanometer
Phase distribution of the transmission region of super surface texture along Z axis at nanometer stick array 100nm, it can be seen that its phase is with Fig. 3
(a) centered on each spiral center (i.e. light intensity point of maximum intensity), phase is in-π~π Spiral distribution.Above-mentioned simulation result shows one
After the super surface texture of special metal nanometer that beam circularly polarized light vertical irradiation is prepared to the present invention, transmitted from the X/Y plane of Z=0
Circularly polarized light out is transformed to the vortex beams array of sub-wavelength；Fig. 2 is by a certain single vortex beams of Fig. 3 (b)
Data individually extract drawing again as a result, to obtain obvious spiral effect.
The present invention passes through the size and arrangement for rationally designing metal nano-rod, and this is more mature using electron beam lithography
Micro-nano processing method prepares the super surface of periodical metal nano-rod that can produce sub-wavelength vortex beam array.Compared to it
His vortex light beam producing method, method therefor of the present invention has many advantages, such as that structure is simple and is easily integrated, light distribution is uniform.
And this method generate vortex beams array can not only information transmit with store in enhancement information safety and capacity,
A large amount of particles are disposably captured in particle capture, and can detect the kinetic characteristic of different objects simultaneously, have expanded vortex light beam
Application field.
Although the illustrative specific embodiment of the present invention is described above, in order to the technology of the art
Personnel understand the present invention, it should be apparent that the present invention is not limited to the ranges of specific real-time mode.It is all to use equivalent replacement or equivalent
Replacement, these variations are it is clear that all utilize the innovation and creation of present inventive concept in the column of protection.
Claims (10)
1. a kind of sub-wavelength vortex beams array production method for surpassing surface based on metal nano, which is characterized in that this method packet
It includes, prepares the entirety being made of metal nano-rod array and quartz glass substrate first and received in the special metal of rectangular shape
The super surface texture of rice, the metal nano-rod array include n metal nano-rod, wherein n is positive integer and n > 4, the gold
The category nanometer rods period is arranged on the upper surface of the quartz glass substrate, with flat where metal nano-rod array upper surface
Any point is origin in face, from the origin, the length and width direction point of the super surface texture of special metal nanometer
Not Wei the opposite direction of X-axis and Y-axis, the super surface structure thickness of special metal nanometer be Z axis；It then is 532nm's by wavelength
Circularly polarized light from the region vertical irradiation of Z < 0 to the super surface texture of special metal nanometer, the circularly polarized light with it is any one
After a metal nano-rod effect, phase of light wave just adds 2 θ of phase factor, and wherein θ is that any one metal nano-rod is long
The angle of axis and X-axis, because the long axis of each metal nano-rod and the angle theta of X-axis are different, the X/Y plane from Z=0 is transmitted
Different location of the circularly polarized light in the transmission region of Z > 0 come is presented different phases, adjacent 4 in X and Y-axis both direction
A metal nano-rod generates a vortex beams, and the diameter of the vortex beams is 180nm, due to the work of metal nano-rod array
With, Z > 0 transmission region generate photic-energy transfer uniformly and phase Spiral distribution sub-wavelength dimensions vortex beams array.
2. the sub-wavelength vortex beams array production method according to claim 1 for surpassing surface based on metal nano, special
Sign is that the preparation method of the super surface texture of special metal nanometer includes the following steps:
S1) the spin coating photoresist in quartz glass substrate
S11 quartz glass substrate) is cleaned
It is 0.5mol/L, the HCl that temperature is 35 DEG C~50 DEG C that the virgin quartz substrate of glass of rectangular shape, which is placed in concentration,
It in solution, stands after ten minutes, quartz glass substrate is placed in 50 DEG C or so of pure water and is impregnated 5 minutes, take out quartz glass
Substrate carries out secondary cleaning with 50 DEG C or so of pure water again, completes the chemical cleaning of quartz glass substrate；
S12 quartz glass substrate) is dried
Will pass through step S11) processing quartz glass substrate be placed on cleaning basket on, and to cleaning basket in be passed through temperature be 80 DEG C
The noble and unsullied net air or nitrogen of left and right, continue 10~20 minutes, after quartz glass substrate and cleaning basket are sufficiently dried, quartz
The drying of substrate of glass is completed；
S13) spin coating photoresist
Will pass through step S12) processing quartz glass substrate be adsorbed on vacuum chuck, adjustment vacuum chuck revolving speed be
500rpm, and instill photoresist to quartz glass substrate upper surface center, after 5 seconds, vacuum chuck revolving speed is increased to 3000~
7000rpm whirl coating 30 seconds, forms the photoresist coating with a thickness of 140nm；
S14) soft baking quartz glass substrate after spin coating
After photoresist quartz glass substrate upper surface coating uniformly after, will pass through step S13) processing quartz glass substrate put
It is soft on 80 DEG C of vacuum hot plate to dry 2~5 minutes；
S2) electron beam exposure obtains figure
S21 electron beam exposure) is focused
It is 30KV with acceleration voltage, spot size 30nm, exposure dose is 25 μ c/cm2Electron beam exposure vector machine to process
Step S1) treated, and quartz glass substrate is exposed, using pre-set programs control electron beam exposure vector machine in quartz
The stick length that substrate of glass upper surface obtains photoresist nanometer rods is 90nm, and stick width is 30nm, and thickness is 140~150nm
Photoresist nanometer stick array figure, wherein in photoresist nanometer stick array figure every 1 row and every 1 column photoresist nanometer rods point
It is not alternatively arranged with X-axis in 45 °, -45 ° of angles, and any two adjacent the distance between photoresist nanometer rods geometric centers
It is 180nm；
S22 quartz glass substrate is dried after) exposing
Step S21 will be passed through) quartz glass substrate that treated is placed in 150 DEG C~170 DEG C of oven, it toasts 90 minutes,
And it is stood in normal temperature environment 30 minutes cooling；
S3) develop
S31) develop, be fixed
Step S2 will be passed through) to be immersed in temperature be 60~120 in 21 ± 0.2 DEG C of developer solution to quartz glass substrate that treated
Second, it is then placed in aqueous isopropanol 30~40 seconds, completes fixing, obtain the nanometer rods battle array positioned at quartz glass substrate upper surface
Column figure；
S32 substrate is dried after) being fixed
It takes out and is placed on soft baking 2~5 minutes on 80 DEG C of vacuum hot plate by step S31) quartz glass substrate that treated, obtain
Positioned at the nanometer stick array figure of the drying of quartz glass substrate upper surface；
S33) figure inspection, evaporated metal film
Using scanning electron microscopy observation technology to passing through step S32) drying of treated quartz glass substrate upper surface
Nanometer stick array figure checked, is determined after the nanometer stick array figure of the drying is qualified with thermal evaporation station to quartz glass substrate
Bottom carries out metallic gold (Au) evaporation, wherein golden (Au) with a thickness of 20nm~30nm；
S34) removal photoresist obtains metallic pattern
Acetone removing is carried out to by step S33) quartz glass substrate that treated, removes remaining electron beam resist and gold
Belong to gold, obtains gold nano stick array in quartz glass substrate upper surface, wherein the gold nanorods size in the gold nano stick array
Be long 90nm, wide 30nm, thick 25nm, in gold nano stick array the gold nanorods of every 1 row and every 1 column respectively with X-axis in 45 ° ,-
45 ° of angles are alternatively arranged, and any two adjacent the distance between gold nanorods geometric centers are 180nm, are thus obtained
The super surface texture of special metal nanometer.
3. the sub-wavelength vortex beams array production method according to claim 2 for surpassing surface based on metal nano, special
Sign is, the step S11) in virgin quartz substrate of glass be thickness 3mm, length and width is 800nm, and light transmittance is big
In 90%, the high-purity quartz glass that 1500 DEG C of highest heatproof.
4. the sub-wavelength vortex beams array production method according to claim 3 for surpassing surface based on metal nano, special
Sign is, the step S13) described in photoresist be polymethyl methacrylate (PMMA) that concentration is 5%.
5. the sub-wavelength vortex beams array production method according to claim 4 for surpassing surface based on metal nano, special
Sign is, the step S31) described in developer solution be that two pentanone of tetramethyl (MIBK) and isopropanol (IPA) are mixed with the ratio of 1:3
The solution of conjunction.
6. the sub-wavelength vortex beams array production method according to claim 4 for surpassing surface based on metal nano, special
Sign is, the step S11) described in the temperature of HCl solution be 45 DEG C.
7. the sub-wavelength vortex beams array production method according to claim 5 for surpassing surface based on metal nano, special
Sign is, the step S22) in oven temperature be 170 DEG C.
8. the sub-wavelength vortex beams array production method according to claim 6 for surpassing surface based on metal nano, special
Sign is, the step S31) in quartz glass substrate to be immersed in the time in developer solution be 100 seconds, be put into aqueous isopropanol
Time be 40 seconds.
9. the sub-wavelength vortex beams array production method according to claim 6 for surpassing surface based on metal nano, special
Sign is, the step S33) described in gold (Au) with a thickness of 25nm.
10. the sub-wavelength vortex beams array for surpassing surface based on metal nano described in -9 any one according to claim 1 produces
Generation method, which is characterized in that the circularly polarized light is left circularly polarized light.
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