CN109696720A - A kind of reflection-type near ultraviolet cut-off diffusion barrier - Google Patents
A kind of reflection-type near ultraviolet cut-off diffusion barrier Download PDFInfo
- Publication number
- CN109696720A CN109696720A CN201711050965.1A CN201711050965A CN109696720A CN 109696720 A CN109696720 A CN 109696720A CN 201711050965 A CN201711050965 A CN 201711050965A CN 109696720 A CN109696720 A CN 109696720A
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- Prior art keywords
- reflection
- near ultraviolet
- diffusion barrier
- type near
- chiral
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
Abstract
The present invention relates to a kind of reflection-type near ultraviolets to end diffusion barrier, it includes substrate and the near ultraviolet cut-off diffusion layer composition for anchoring at substrate single face, near ultraviolet cut-off diffusion layer is by photonic crystal particles or microballoon and the coating of the polymeric coating layer with reflection-type function is fixed on substrate surface, it is assembled using macromolecular structure, control different polymer monomer combinations, initiator amount and initiation conditions, form molecular density gradient difference, and then realize height refringence inside high molecular polymer, realize height index matching, reach the part reflection of 400-450nm wave band, realize near ultraviolet cutoff function.Preparation method of the invention is cheap, simple process, only need to be coated with one layer of polymeric coating layer in substrate surface, be advantageously implemented industrialization；The cut-off diffusion barrier of reflection-type near ultraviolet made of the present invention can be widely applied to indicator screen or the cut-off of illuminating near ultraviolet, also can be used for improving colour gamut, the intensity of light source.
Description
Technical field
The present invention relates to one kind to end diffusion barrier for indicator screen or illuminating reflection-type near ultraviolet.
Background technique
The effect of diffusion barrier is to homogenize light source, corrects light source.Its backlight module for being widely used in flat-panel monitor and
In novel illumination light source, such as TV, computer monitor, laptop, mobile phone, digital camera, MP4 player, GPS navigator
And various daily and industrial lighting source etc..
Blue light is largely present in the light such as computer monitor, fluorescent lamp, mobile phone, digital product, display screen, LED, the wave
Blue light in length can be such that the macular area toxin amount in eyes increases, and seriously threaten our eye health.Wherein, wavelength 400-
Shortwave blue light between 450nm is maximum to the extent of injury of retina.
In international light association annual meeting in 2010, the top optics expert in the world unanimously points out: shortwave blue light has high energy
Amount can penetrate the through retina of crystalline lens.Blue light illumination retina can generate free radicals, and these free radicals will lead to view
The decline of membranochromic pigments epithelial cell, the decline of epithelial cell will lead to photaesthesia cell and lack nutrient so as to cause vision impairment, and
And these damages are irreversible.
The present invention relates to a kind of reflection-type near ultraviolets to end diffusion barrier, and it is by photonic crystal particles that near ultraviolet, which ends diffusion layer,
Or bead and the polymeric coating layer with reflection function are coated with fixation on substrate surface, are assembled, are controlled using macromolecular structure
Different polymer monomer combinations, initiator amount and initiation conditions, form molecular density gradient difference, and then realize macromolecule
Polymeric inner height refringence realizes height index matching, reaches the part reflection of 400-450nm wave band, both had
The intensity for obstructing the effect of black light, while colour gamut can also being improved, enhance light source.
Summary of the invention
In order to overcome the complex process of existing near ultraviolet cut film, equipment investment is high, low efficiency, higher cost.The present invention
It is related to a kind of reflection-type near ultraviolet cut-off diffusion barrier, the reflection-type near ultraviolet cut film simple process and low cost, adhesive force is good,
Transparency is high, can reach the part reflection of 400-450nm wave band.
To achieve the above object, the technical solution adopted by the present invention is that:
A kind of reflection-type near ultraviolet ends diffusion barrier, which is characterized in that it includes substrate and anchors at substrate single face
Near ultraviolet end diffusion layer.Containing optical diffusant and with the macromolecule of reflection function in the near ultraviolet cut-off diffusion layer
Coating.
Substrate as described above is polyester film, polycarbonate resin, polystyrene film, polyacrylate film, gathers
The mixture of one or more of methacrylic acid ester film, polyurethane film, polyvinyl resin and polyvinyl chloride film；Base
The thickness of material is at 20-250 μm.
Optical diffusant photonic crystal particles or microballoon as described above, can be zinc oxide, aluminum oxide, sulfuric acid
One of barium, polymethyl methacrylate, melamine resin are a variety of, and average grain diameter is at 100nm-20 μm.
Polymeric coating layer as described above includes: the donor or receptor of hydrogen bond, achiral polymerisable monomer, Chiral polymerisable
Monomer and solvent become crosslinking polymer network by polymerization；The mass percent of the component of achiral polymerisable monomer 1~
Between 50%wt；The constituent mass percentage of Chiral polymerisable monomer is between 1~70%wt；The quality percentage of the component of solvent
Than between 1~80%wt；Further, initiator of the mass percent of component between 0~10%wt is added, accelerates polymerization
Speed；Moistening flatting agent of the mass percent of component between 0.0001~5%wt is added, improves the knot of macromolecule and substrate
Conjunction ability and film forming.
The donor or receptor of hydrogen bond as described above, contain amino, imido grpup, nitro, hydroxyl, carboxyl, pyridyl group, piperidines
One or more group in base, isonicotinic acid.
The chiral primitive of Chiral polymerisable monomer as described above is chiral isoamyl alcohol, chiral sec-octyl alcohol, chiral phenyl second
In the chloro- 4- methyl-1-hexanol of glycol, 6-, the bromo- 4- methyl-1 of 6--hexanol, isobide, anhydromannitol and Binaphthol
It is one or more.
Achiral polymerisable monomer or Chiral polymerisable monomer as described above have one or more polymerizable groups, can
Polymer-based group is acryloyl group, methylacryloyl, fluoropropene base, Chloroallyl, trifluoromethyl acrylic, oxetanes
Base, vinyl ether, vinyl ketone base, dimaleoyl imino, phenyl maleimide base, vinyl, styryl, diacetyl
One of base and epoxy group are a variety of.
Initiator as described above is multifunctional initiator and macromole evocating agent, such as crosses ketenes silane acetal, oxidation
Benzoyl, benzoin ethers, benzil ketals class, diaryl iodonium salt, triarylsulfonium salt, diphenyl iodine arsenate, benzene
Ethyl ketone class, benzophenone, 4- methoxyphenyl phenyl-iodide tetrafluoroborate, 4- methoxyphenyl phenyl-iodide hexafluoro phosphonic acids
Salt, 4- tert-butyl-phenyl iodine diphenyl iodine hexafluorophosphonate, 4- methoxyphenyl diphenyl sulfonium tetrahydro phosphonate, triphen
Base sulfonium tetraborate, 4- methoxyphenyl diphenyl sulfonium trifluoromethayl sulfonic acid ester, 4- phenyl thiophenyl diphenyl sulfonium six
One of fluorine arsenate, benzil dimethyl ketal and double-phenylphosphine oxide are a variety of.
Solvent as described above is tetrahydrofuran, acetonitrile, benzene,toluene,xylene, acetone, cyclopropanone, cyclohexanone, toluene
Cyclohexanone, dioxane, ethylene glycol, glycerine, styrene, perchloroethylene, trichloro ethylene, ethylene glycol ether, triethanolamine,
One of hexamethylene, pentane, hexane, octane, ethyl acetate, glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether
Or it is several.It is preferred that having good dissolubility energy boiling point between 60-200 DEG C polymer monomer, being non-toxic or low-toxic, corrosion-free
Property, recyclable solvent.
Macromolecule coating fluid as described above further include polymerization inhibitor, defoaming agent, diluent, ultraviolet absorbing agent, alignment agent,
One of surfactant, uv-curable glue and heat-curable glue are a variety of.
Compared with prior art, the invention has the beneficial effects that:
1. manufacture craft of the invention is simple, only it need to be coated with one layer of macromolecule coating fluid in substrate surface, prepared resulting
Near ultraviolet cut film has good thermo mechanical stability and weatherability, and light transmittance is high, nontoxic, applied widely, and more
Layer squeezes out, coating process is compared, and greatly reduces cost；
2. polymer monomer used in the present invention there are several compositions, two or more molecular density products may be implemented, lead to
It crosses chiral molecule cross-link together, high low-refraction collocation in same high polymer may be implemented, reach the portion of 400-450nm wave band
Divide reflection, realizes near ultraviolet cutoff function；The function of may also function as and improve colour gamut, enhance light-source brightness.
Detailed description of the invention
Fig. 1 is the polymerisable monomer structural formula in one embodiment of the invention in macromolecule coating fluid, wherein (a) is hand
Property polymerisable monomer a structural formula, (b) be achiral monomers polymerized monomer a structural formula.
Fig. 2 is the projection spectrogram of the reflection-type near ultraviolet cut film provided.
Specific embodiment
Below in conjunction with specific embodiment, technical scheme is described further.
1. the excessively smooth iron plate of tinfoil is put into baking oven first, it is baked to 70-90 DEG C (practical is normally 75-80 DEG C)；
2. 10 parts of 5% nitroaniline is secondly taken, 10 parts of Chiral polymerisable monomer (a), achiral polymerisable monomer (b) 10
Part, 20 parts of PMMA resin microsphere (average grain diameter is 10 microns), initiator crosses 0.6 part, 0.1 part levelling agent of ketenes silane acetal
100 parts, 0.2 part Solvesso150,20 parts of cyclohexanone, toluene curing agent DACH, above-mentioned material stirring is uniformly mixed, and is made
Near ultraviolet ends macromolecule coating fluid, and with RDS4# bar (10 μm of wet film gap), control wet-film thickness is 2-20 μm of even spread
On 50 μm of the PET without any HC or primer；
3. wet film is put on baking oven tinfoil or iron plate after the completion of coating, solvent is removed to 1min within baking 15 seconds.Due to
There are hydrogen bond action between chiral polymerized monomer and nitroaniline, Chiral polymerisable monomer molecule is migrated to nitrobenzene amine layer, with
Other polymerized monomers form concentration gradient, and then form pitch gradient；
4. finally taking the film out by 40mj/cm2-800mj/cm2UV curing, fixed pitch gradient obtains near ultraviolet
Cut film tests its performance.Transmitted light spectrogram is as shown in Figure 2.
It is finally noted that the purpose for publicizing and implementing mode is to help to further understand the present invention, but ability
The technical staff in domain is understood that without departing from the spirit and scope of the invention and the appended claims, various replacements and
Modification is all possible.Therefore, the present invention should not be limited to embodiment disclosure of that, the scope of protection of present invention with
Subject to the range that claims define.
Claims (10)
1. the present invention relates to a kind of reflection-type near ultraviolets to end diffusion barrier, which is characterized in that it includes substrate and anchors at base
The near ultraviolet of material single face ends diffusion layer, contains optical diffusant in the near ultraviolet cut-off diffusion layer and has reflection function
Polymeric coating layer.
2. a kind of reflection-type near ultraviolet according to claim 1 ends diffusion barrier, it is characterised in that: the substrate is poly-
Ester film, polycarbonate resin, polystyrene film, polyacrylate film, polymethacrylates film, thin polyurethane
The mixture of one or more of film, polyvinyl resin and polyvinyl chloride film；The thickness of substrate is at 20-250 μm.
3. a kind of reflection-type near ultraviolet according to claim 1 ends diffusion barrier, it is characterised in that: the optics diffusion
Agent photonic crystal particles or microballoon can be zinc oxide, aluminum oxide, barium sulfate, polymethyl methacrylate, melamine resin
One of or it is a variety of, average grain diameter is at 100nm-20 μm.
4. a kind of reflection-type near ultraviolet according to claim 1 ends diffusion barrier, it is characterised in that: the macromolecule applies
Layer includes: the donor or receptor of hydrogen bond, and achiral polymerisable monomer, Chiral polymerisable monomer and solvent are become by polymerization and handed over
Linked polymer network；The mass percent of the component of achiral polymerisable monomer is between 1~50%wt；Chiral polymerisable monomer
Constituent mass percentage between 1~70%wt；The mass percent of the component of solvent is between 1~80%wt；Further,
Initiator of the mass percent of component between 0~10%wt is added, accelerates polymerization speed；The mass percent of component is added
Moistening flatting agent between 0.0001~5%wt improves the binding ability and film forming of macromolecule and substrate.
5. a kind of preparation method of reflection-type near ultraviolet cut film according to claim 4, it is characterised in that: the hydrogen bond
Donor perhaps receptor containing one in amino, imido grpup, nitro, hydroxyl, carboxyl, pyridyl group, piperidyl, isonicotinic acid or
Multiple groups.
6. a kind of reflection-type near ultraviolet according to claim 4 ends diffusion barrier, it is characterised in that: the Chiral polymerisable
The chiral primitive of monomer is chiral isoamyl alcohol, chiral sec-octyl alcohol, chiral styrene glycol, the chloro- 4- methyl-1-hexanol of 6-, 6- bromo-
One or more of 4- methyl-1-hexanol, isobide, anhydromannitol and Binaphthol.
7. a kind of reflection-type near ultraviolet according to claim 4 ends diffusion barrier, it is characterised in that: the achirality can gather
Closing monomer or Chiral polymerisable monomer has one or more polymerizable groups, and polymerizable groups are acryloyl group, metering system
Acyl group, fluoropropene base, Chloroallyl, trifluoromethyl acrylic, oxetanyl, vinyl ether, vinyl ketone base, Malaysia
One of imide, phenyl maleimide base, vinyl, styryl, diacetyl and epoxy group are a variety of.
8. a kind of reflection-type near ultraviolet according to claim 4 ends diffusion barrier, it is characterised in that: the initiator is more
Functional group initiator and macromole evocating agent such as cross ketenes silane acetal, Benzoyl Oxide, benzoin ethers, benzil contracting
Ketone, diaryl iodonium salt, triarylsulfonium salt, diphenyl iodine arsenate, acetophenones, benzophenone, 4- methoxyl group
Phenyl iodine tetrafluoroborate, 4- methoxyphenyl phenyl-iodide hexafluorophosphonate, 4- tert-butyl-phenyl iodine diphenyl
Iodine hexafluorophosphonate, 4- methoxyphenyl diphenyl sulfonium tetrahydro phosphonate, triphenylsulfonium tetraborate, 4- methoxybenzene
Base diphenyl sulfonium trifluoromethayl sulfonic acid ester, 4- phenyl thiophenyl diphenyl sulfonium hexafluoro arsenate, benzil dimethyl ketal
With one of double-phenylphosphine oxide or a variety of.
9. a kind of reflection-type near ultraviolet according to claim 4 ends diffusion barrier, it is characterised in that: the solvent is four
Hydrogen furans, acetonitrile, benzene,toluene,xylene, acetone, cyclopropanone, cyclohexanone, toluene cyclohexanone, dioxane, ethylene glycol, the third three
Alcohol, styrene, perchloroethylene, trichloro ethylene, ethylene glycol ether, triethanolamine, hexamethylene, pentane, hexane, octane, acetic acid
One or more of ethyl ester, glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether.It is preferred that having to polymer monomer
Solvent of the good dissolubility energy boiling point between 60 DEG C -200 DEG C, non-toxic or low-toxic, non-corrosive, recyclable.
10. a kind of reflection-type near ultraviolet ends diffusion barrier according to claim 4, it is characterised in that: the macromolecule applies
Cloth liquid further includes polymerization inhibitor, defoaming agent, diluent, ultraviolet absorbing agent, alignment agent, surfactant, uv-curable glue and heat
One of solidification glue is a variety of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711050965.1A CN109696720A (en) | 2017-10-23 | 2017-10-23 | A kind of reflection-type near ultraviolet cut-off diffusion barrier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201711050965.1A CN109696720A (en) | 2017-10-23 | 2017-10-23 | A kind of reflection-type near ultraviolet cut-off diffusion barrier |
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| CN109696720A true CN109696720A (en) | 2019-04-30 |
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| CN201711050965.1A Withdrawn CN109696720A (en) | 2017-10-23 | 2017-10-23 | A kind of reflection-type near ultraviolet cut-off diffusion barrier |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110256921A (en) * | 2019-06-27 | 2019-09-20 | 张保平 | A kind of transparent high definition imaging agent of photon crystallite and preparation method |
| CN112389057A (en) * | 2020-10-28 | 2021-02-23 | 合肥华聚微科新材料有限责任公司 | Novel optical diffusion material with multilayer composite microporous structure for flat panel display |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110256921A (en) * | 2019-06-27 | 2019-09-20 | 张保平 | A kind of transparent high definition imaging agent of photon crystallite and preparation method |
| CN112389057A (en) * | 2020-10-28 | 2021-02-23 | 合肥华聚微科新材料有限责任公司 | Novel optical diffusion material with multilayer composite microporous structure for flat panel display |
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Application publication date: 20190430 |