CN109666903B - Cookware handle surface heat-insulating coating and preparation method thereof - Google Patents

Cookware handle surface heat-insulating coating and preparation method thereof Download PDF

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Publication number
CN109666903B
CN109666903B CN201710953443.6A CN201710953443A CN109666903B CN 109666903 B CN109666903 B CN 109666903B CN 201710953443 A CN201710953443 A CN 201710953443A CN 109666903 B CN109666903 B CN 109666903B
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handle
vacuum chamber
sio
coating
cookware
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CN109666903A (en
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赵彦辉
徐丽
刘占奇
肖金泉
于宝海
欧剑华
刘炳耀
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Guangdong Master Group Co ltd
Institute of Metal Research of CAS
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Guangdong Master Group Co ltd
Institute of Metal Research of CAS
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cookers (AREA)

Abstract

The invention belongs to the technical field of heat insulation coatings deposited on the surfaces of metal materials, and particularly relates to an aluminum oxide/silicon oxide composite heat insulation coating on the surfaces of cookware handles and a preparation method thereof. Depositing a transition layer formed by an AlSi film and Al on the surface of a cookware handle in sequence2O3/SiO2Composite coating of Al2O3/SiO2The thickness of the composite coating is 1-50 microns. The invention is completed by adopting a magnetic field enhanced arc ion plating technology, and the heat insulation coating prepared by the method has the advantages of good heat insulation performance, high hardness, scratch resistance and the like, and is suitable for the fields of heat insulation of kitchen ware parts, heat insulation of mechanical parts and the like.

Description

Cookware handle surface heat-insulating coating and preparation method thereof
The technical field is as follows:
the invention belongs to the technical field of heat insulation coatings deposited on the surfaces of metal materials, and particularly relates to an aluminum oxide/silicon oxide composite heat insulation coating on the surfaces of cookware handles and a preparation method thereof.
Background art:
the cookware is more and more widely applied to daily life of people, and people not only cook food, but also heat drinks such as milk and the like. At present, stainless steel is mostly selected as a base body for pots on the market, and a layer of plastic is generally added at a pot handle so as to prevent hands from being scalded due to contact with the pot handle in the using process. However, the use of plastics for thermal insulation does not provide good results because of the limited thermal insulation effect of common plastics and the low heat resistance temperature of plastics.
Therefore, it is necessary to find more effective materials or methods for the material of the pot handle to increase the heat insulation effect so as to meet the normal use requirement of the pot.
Disclosure of Invention
Aiming at the defects of the plastic heat-insulating material of the existing pot handle, the invention aims to provide a heat-insulating coating on the surface of the pot handle and a preparation method thereof.
In order to achieve the purpose, the technical scheme of the invention is as follows:
a heat-insulating coating on the surface of a cookware handle is prepared by sequentially depositing a transition layer formed by an AlSi film and Al on the surface of the cookware handle2O3/SiO2Composite coating of Al2O3/SiO2The thickness of the composite coating is 1-50 micrometers (preferably 20-30 micrometers).
The pot handle surface heat insulation coating is characterized in that the thickness of a transition layer formed by the AlSi film is 0.1-5 micrometers (preferably 0.5-3 micrometers).
In the pot handle surface heat insulation coating, the transition layer formed by the AlSi film contains 20-90 at% (preferably 50-80 at%).
The surface of the cookware handle is provided with a heat insulation coating Al2O3/SiO2Al in composite coating2O3The content of (b) is 20-90 at% (preferably 50-80 at%).
The preparation method of the heat-insulating coating on the surface of the cookware handle comprises the following specific steps:
(1) pre-cleaning the surface of a cookware handle: the handle of the pot is placed in a sand blasting machine for sand blasting treatment, then oil removal treatment, ultrasonic cleaning and drying are carried out;
(2) plating transition layer, namely placing the dried pot handle in an arc ion plating machine, adopting an aluminum-silicon alloy target, and when the vacuum degree in a vacuum chamber reaches 5 × 10-4Pa～1×10-2Pa (preferably 1 × 10-3Pa～9×10-3Pa), heating the vacuum chamber to 300-650 ℃ (preferably 350-500 ℃); introducing argon into the vacuum chamber, and controlling the air pressure to be between 0.5 and 4Pa (preferably 1.0 and 2.0 Pa); the substrate is applied with pulse negative bias in the range of-500 to-1000V (preferably-600 to-800V), so that the gas generates glow discharge, and the sample is subjected to glow cleaning for 5 to 30 minutes; adjusting argon flowThe vacuum chamber is controlled to have the air pressure of 0.01-3.0 Pa (preferably 0.05-0.5 Pa), an aluminum-silicon alloy target arc source is started, the arc current is 40-100A (preferably 40-60A), the ion bombardment is continuously carried out on the handle of the cooker for 1-10 minutes, the flow of argon is adjusted to further reduce the air pressure of the vacuum chamber to 0.01-2.0 Pa (preferably 0.05-0.5 Pa, the pulse negative bias is adjusted to-50V-500V (preferably-50-200V), and the AlSi film, namely the transition layer is deposited for 1-30 minutes;
(3) plated with Al2O3/SiO2And (3) composite coating: adopting an aluminum-silicon alloy target, controlling the total deposition pressure within the range of 0.01-2 Pa (preferably 0.1-0.5 Pa), and controlling the flow ratio of oxygen to argon to be 1-5: 1; applying pulse negative bias of-50V to-600V (preferably-60V to-200V) to the substrate, adjusting the duty ratio to be 20-80% (preferably 30-60%), and adjusting the aluminum-silicon alloy target current to be 40-100A (preferably 40-60A); starting an electromagnetic field device at the rear part of the target, adjusting the current of a magnetic field coil to be 0.1-5A (preferably 0.5-2A), and setting the deposition time to be 20-300 minutes (preferably 30-120 minutes);
(4) after the deposition is finished, stopping arc, stopping the pulse negative bias of the substrate, stopping introducing gas, closing the electromagnetic field device, continuing vacuumizing, cooling the pan handle to below 80 ℃ along with the furnace, opening the vacuum chamber, and taking out the pan handle.
Compared with the prior art, the invention has the beneficial effects that:
1. the invention prepares a transition layer formed by an AlSi film and Al on the surface of a cookware handle2O3/SiO2The heat insulation coating formed by the composite coating is scratch-resistant and has a good heat insulation effect.
2. The invention is completed by adopting a magnetic field enhanced arc ion plating technology, and the method adopts an electromagnetic coil to generate an axial magnetic field, the magnetic field not only can accelerate the movement speed of arc spots and reduce the large particle injection on the surface of a target material, but also can focus plasma generated by arc discharge, thereby greatly improving the ion energy and density and greatly improving the coating deposition efficiency. The heat insulation coating prepared by the method has the advantages of good scratch resistance, high hardness, good heat insulation effect and the like.
The specific implementation mode is as follows:
in the specific implementation process, the heat-insulating coating on the surface of the cookware handle comprises the cookware handle (such as a stainless steel handle, an aluminum alloy handle and the like), wherein a transition layer formed by an aluminum-silicon (AlSi) film and Al are sequentially arranged on the surface of the cookware handle2O3/SiO2And (4) composite coating.
The present invention will be described in further detail below with reference to examples.
Example 1
In the embodiment, the cookware handle is made of 304 stainless steel, the surface of the cookware handle is ground and polished, then the cookware handle is placed in a sand blasting machine for sand blasting treatment, then oil removal treatment is carried out, ultrasonic cleaning and drying are carried out, the dried cookware handle is placed in an electric arc ion plating machine, an aluminum-silicon alloy target is adopted, and when the vacuum degree in a vacuum chamber reaches 6 × 10-3Heating the vacuum chamber to 350 ℃ when Pa is needed; introducing argon into the vacuum chamber, and controlling the air pressure to be 2.0 Pa; the substrate is applied with pulse negative bias at-700V to make the gas generate glow discharge, and the sample is cleaned for 15 minutes in glow; adjusting the argon flow to make the air pressure of the vacuum chamber 0.5Pa (adjusting the argon flow has the effects of making the alloy target discharge stably and the plasma density moderate), simultaneously starting an aluminum-silicon alloy target arc source, making the arc current 50A, and continuously carrying out ion bombardment on the handle of the cooker for 6 minutes; adjusting the argon flow to ensure that the air pressure of the vacuum chamber is 0.2Pa (further reducing the argon flow has the effects of reducing the space free path of ions, improving the ion energy and promoting the crystallinity of a film structure), adjusting the negative bias of a pulse to-200V, ensuring the duty ratio to be 40 percent, depositing an AlSi film, namely a transition layer for 15 minutes, wherein the thickness of the transition layer formed by the AlSi film is 0.6 micron, and the content of Al is 85at percent; then introducing oxygen, wherein the flow ratio of the oxygen to the argon is 2:1, and the total deposition pressure is controlled to be 0.3 Pa; applying pulse negative bias of-100V to the substrate, regulating the duty ratio to be 60%, and regulating the current of the aluminum-silicon alloy target to be 60A; starting an electromagnetic field device at the rear part of the target, adjusting the current of a magnetic field coil to be 1.0A, and setting the deposition time to be 120 minutes; stopping arc, stopping pulse negative bias of base body, stopping gas introduction, closing electromagnetic field device, continuously vacuumizing, cooling the handle of cooker to below 80 deg.C, and openingEmpty chamber, taking out the handle of the pot and coating.
Obtained Al2O3/SiO2The appearance of the cookware handle with the composite coating is purple black, the total thickness of the coating tested by a scanning electron microscope is 16.1 microns, and Al2O3/SiO2Al in composite coating2O3The content of (b) was 68 at.%, and the heat insulating effect was tested to be good.
Example 2
In the embodiment, the cookware handle is made of 304 stainless steel, the surface of the cookware handle is ground and polished, then the cookware handle is placed in a sand blasting machine for sand blasting treatment, then oil removal treatment is carried out, ultrasonic cleaning and drying are carried out, the dried cookware handle is placed in an electric arc ion plating machine, an aluminum-silicon alloy target is adopted, and when the vacuum degree in a vacuum chamber reaches 7 × 10-3Heating the vacuum chamber to 380 ℃ when Pa is needed; introducing argon into the vacuum chamber, and adjusting the air pressure to 2.0 Pa; the substrate is applied with pulse negative bias at-700V to make the gas generate glow discharge, and the sample is cleaned for 25 minutes in glow; adjusting the flow of argon gas to make the air pressure of the vacuum chamber be 0.3Pa, simultaneously starting an aluminum-silicon alloy target arc source, setting the arc current to be 55A, and continuously carrying out ion bombardment on the handle of the pot for 10 minutes; adjusting the flow of argon gas to make the air pressure of a vacuum chamber be 0.3Pa, adjusting the negative bias of a pulse to-150V, depositing an AlSi film, namely a transition layer, for 10 minutes at a duty ratio of 40%, wherein the thickness of the transition layer formed by the AlSi film is 0.4 micron, and the content of Al is 86 at%; then introducing oxygen, wherein the flow ratio of the oxygen to the argon is 3:1, and the total deposition pressure is controlled to be 0.4 Pa; applying pulse negative bias of-120V to the substrate, regulating the duty ratio to be 60%, and regulating the current of the aluminum-silicon alloy target to be 65A; starting an electromagnetic field device at the rear part of the target, and adjusting the current of a magnetic field coil to be 2.5A; the deposition time was 150 minutes; after the deposition is finished, stopping arc, stopping the pulse negative bias of the substrate, stopping introducing gas, closing the electromagnetic field device, continuing vacuumizing, cooling the pan handle to below 80 ℃ along with the furnace, opening the vacuum chamber, taking out the pan handle, and finishing the film coating process.
Obtained Al2O3/SiO2The appearance of the cookware handle with the composite coating is purple black, the total thickness of the coating tested by a scanning electron microscope is 20.6 microns, and Al2O3/SiO2CompoundingAl in the coating2O3The content of (b) was 77 at.%, and the heat insulating effect was tested to be good.
Example 3
In the embodiment, the pan handle is made of 430 stainless steel, the surface of the pan handle is ground and polished, then the pan handle is placed in a sand blasting machine for sand blasting treatment, then oil removal treatment is carried out, ultrasonic cleaning and drying are carried out, the dried pan handle is placed in an electric arc ion plating machine, an aluminum-silicon alloy target is adopted, and when the vacuum degree in a vacuum chamber reaches 5 × 10-3Heating the vacuum chamber to 480 ℃ when Pa is needed; introducing argon into the vacuum chamber, and adjusting the air pressure to 2.1 Pa; the substrate is applied with pulse negative bias at-600V to make the gas generate glow discharge, and the sample is cleaned for 25 minutes in glow; adjusting the flow of argon gas to make the air pressure of the vacuum chamber be 0.6Pa, simultaneously starting an aluminum-silicon alloy target arc source, setting the arc current to be 55A, and continuously carrying out ion bombardment on the handle of the pot for 10 minutes; adjusting the flow of argon gas to make the air pressure of a vacuum chamber be 0.4Pa, adjusting the negative bias of a pulse to-90V, depositing an AlSi film, namely a transition layer, for 10 minutes at a duty ratio of 40%, wherein the thickness of the transition layer formed by the AlSi film is 0.4 micron, and the content of Al is 70 at%; then introducing oxygen, wherein the flow ratio of the oxygen to the argon is 1:1, and the total deposition pressure is controlled to be 0.6 Pa; applying pulse negative bias of-120V to the substrate, regulating the duty ratio to be 40%, and regulating the current of the aluminum-silicon alloy target to be 65A; starting an electromagnetic field device at the rear part of the target, and adjusting the current of a magnetic field coil to be 1.5A; the deposition time was 180 minutes; after the deposition is finished, stopping arc, stopping the pulse negative bias of the substrate, stopping introducing gas, closing the electromagnetic field device, continuing vacuumizing, cooling the pan handle to below 80 ℃ along with the furnace, opening the vacuum chamber, taking out the pan handle, and finishing the film coating process.
Obtained Al2O3/SiO2The appearance of the cookware handle with the composite coating is purple black, the total thickness of the coating tested by a scanning electron microscope is 28.6 microns, and Al2O3/SiO2Al in composite coating2O3The content of (b) is 60 at.%, and the heat insulating effect is tested to be good.
Example 4
In this embodiment, the pot handle is made of 304 stainless steel, and the surface of the pot handle is ground and polished and then placed in a sand blastSand blasting, deoiling, ultrasonic cleaning, drying, putting the dried handle of the pan into an arc ion plating machine, adopting an aluminum-silicon alloy target, and when the vacuum degree in a vacuum chamber reaches 6 × 10-3Heating the vacuum chamber to 450 ℃ when Pa is needed; introducing argon into the vacuum chamber, and adjusting the air pressure to 2.0 Pa; the substrate is applied with pulse negative bias at-700V to make the gas generate glow discharge, and the sample is cleaned for 26 minutes in glow; adjusting the flow of argon gas to make the air pressure of the vacuum chamber be 0.35Pa, simultaneously starting an aluminum-silicon alloy target arc source, setting the arc current to be 65A, and continuously carrying out ion bombardment on the handle of the pot for 8 minutes; adjusting the flow of argon gas to make the air pressure of a vacuum chamber be 0.2Pa, adjusting the negative bias of a pulse to-110V, depositing an AlSi film, namely a transition layer, for 6 minutes at a duty ratio, wherein the thickness of the transition layer formed by the AlSi film is 0.1 micron, and the content of Al is 75 at%; then introducing oxygen, wherein the flow ratio of the oxygen to the argon is 2:1, and the total deposition pressure is controlled to be 0.8 Pa; applying pulse negative bias of-120V to the substrate, regulating the duty ratio to 65%, and regulating the aluminum-silicon alloy target current to 70A; starting an electromagnetic field device at the rear part of the target, and adjusting the current of a magnetic field coil to be 1.5A; the deposition time was 120 minutes; after the deposition is finished, stopping arc, stopping the pulse negative bias of the substrate, stopping introducing gas, closing the electromagnetic field device, continuing vacuumizing, cooling the pan handle to below 80 ℃ along with the furnace, opening the vacuum chamber, taking out the pan handle, and finishing the film coating process.
Obtained Al2O3/SiO2The appearance of the cookware handle with the composite coating is purple black, the total thickness of the coating tested by a scanning electron microscope is 15.4 microns, and Al2O3/SiO2Al in composite coating2O3The content of (b) is 65 at.%, and the heat insulating effect is tested to be good.
The embodiment result shows that the invention is completed by adopting the magnetic field enhanced arc ion plating technology, and the thermal insulation coating prepared by the method has the advantages of good thermal insulation performance, high hardness, scratch resistance and the like, and is suitable for the fields of thermal insulation of kitchen ware parts, thermal insulation of mechanical parts and the like.

Claims (4)

1. A preparation method of a heat-insulating coating on the surface of a pot handle is characterized in that the pot is placed in a potTransition layer formed by depositing AlSi film on surface of handle in sequence and Al2O3/SiO2Composite coating of Al2O3/SiO2The thickness of the composite coating is 1-50 microns;
the preparation method of the heat-insulating coating on the surface of the cookware handle comprises the following specific steps:
(1) pre-cleaning the surface of a cookware handle: the handle of the pot is placed in a sand blasting machine for sand blasting treatment, then oil removal treatment, ultrasonic cleaning and drying are carried out;
(2) plating transition layer, namely placing the dried pot handle in an arc ion plating machine, adopting an aluminum-silicon alloy target, and when the vacuum degree in a vacuum chamber reaches 5 × 10-4Pa～1×10-2Heating the vacuum chamber to 300-650 ℃ when Pa is needed; introducing argon into the vacuum chamber, and controlling the air pressure to be 0.5-4.0 Pa; the substrate is applied with pulse negative bias in the range of-500 to-1000V to cause the gas to generate glow discharge, and the sample is subjected to glow cleaning for 5 to 30 minutes; adjusting the flow of argon gas to make the air pressure of the vacuum chamber be 0.01-3.0 Pa, simultaneously starting an aluminum-silicon alloy target arc source, controlling the arc current to be 40-100A, and continuously carrying out ion bombardment on the handle of the cooker for 1-10 minutes; adjusting the flow of argon gas to make the air pressure of the vacuum chamber be 0.01-2.0 Pa, adjusting the negative bias of the pulse to-50V-500V, and depositing an AlSi film, namely a transition layer, for 1-30 minutes;
(3) plated with Al2O3/SiO2And (3) composite coating: adopting an aluminum-silicon alloy target, controlling the total deposition pressure within the range of 0.01-2 Pa, and controlling the flow ratio of oxygen to argon to be 1-5: 1; applying pulse negative bias of-50V to-600V to the substrate, regulating the duty ratio to be 20-80%, and regulating the current of the aluminum-silicon alloy target to be 40-100A; starting an electromagnetic field device at the rear part of the target, adjusting the current of a magnetic field coil to be 0.1-5A, and setting the deposition time to be 20-300 minutes;
(4) after the deposition is finished, stopping arc, stopping the pulse negative bias of the substrate, stopping introducing gas, closing the electromagnetic field device, continuing vacuumizing, cooling the pan handle to below 80 ℃ along with the furnace, opening the vacuum chamber, and taking out the pan handle.
2. The preparation method of the heat insulating coating on the surface of the cookware handle as claimed in claim 1, wherein the thickness of the transition layer formed by the AlSi film is 0.1-5 μm.
3. The method for preparing a heat insulating coating on the surface of a cookware handle as claimed in claim 1, wherein the transition layer formed by the AlSi film contains 20 to 90at.% of Al.
4. The method for preparing a heat insulating coating on the surface of a cookware handle as claimed in claim 1 wherein Al is2O3/SiO2Al in composite coating2O3The content of (A) is 20-90 at.%.
CN201710953443.6A 2017-10-13 2017-10-13 Cookware handle surface heat-insulating coating and preparation method thereof Active CN109666903B (en)

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