CN109576640A - One kind preparing TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure - Google Patents

One kind preparing TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure Download PDF

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CN109576640A
CN109576640A CN201811438799.7A CN201811438799A CN109576640A CN 109576640 A CN109576640 A CN 109576640A CN 201811438799 A CN201811438799 A CN 201811438799A CN 109576640 A CN109576640 A CN 109576640A
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multiple dimensioned
tio
micro
piece
sputtering
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程永健
宋娟
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Jiangsu University
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Jiangsu University
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
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  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

The present invention relates to the preparation technical fields of surface micronano functional structure, specially a kind of that TiO is prepared in titanium substrate2The method of multiple dimensioned micro-nano compound structure.Level-one micrometer structure, ultrasonic cleaning are prepared to pure Ti piece surface etch in deionized water or dehydrated alcohol using ultrafast laser first；Then pass through Ti piece surface gold-plating film of the magnetron sputtering after laser ablation；Finally the Ti piece after gold-plated film is placed in Muffle furnace and is heat-treated, second level nanostructure is prepared on micrometer structure surface, obtains crystal type TiO2Multiple dimensioned composite micro-nano rice structure.

Description

One kind preparing TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure
Technical field
The present invention relates to the preparation technical fields of surface micronano functional structure, specially a kind of to prepare in titanium substrate TiO2The method of multiple dimensioned micro-nano compound structure.
Background technique
TiO2Because its high chemical stability, it is nontoxic, inexpensive the advantages that, be widely used in photocatalysis, photoelectricity turn Change, the anti-corrosion fields such as antifouling, medical, military.
There are many kinds of construct three-dimensional TiO at present2The method of structure: mainly including hydro-thermal method, sol-gel method is also Colloidal crystal template technology.The titanium dioxide of hydro-thermal method, the three-dimensional structure that the chemical methodes such as sol-gel method are constructed is mainly Nanoscale chondritic is easily reunited, and is not easily recycled and is reused.And institute's structure based on colloidal crystal template technology The TiO made2Structure is mainly three-dimensional order pore structure, but there is still a need for cooperation sol-gel method or depositions for the construction of this structure Method is filled, and step is complex.Also there are the method combined using ultrafast laser with hydro-thermal, collosol and gel, but such side Method step is more, and the structure generated is single, is also easy to produce impurity, pollutes environment.
Summary of the invention
In view of the above-mentioned problems, efficiently, controllable prepares crystal type TiO the present invention provides a kind of simple2It is multiple dimensioned compound The new method of micro nano structure.Have many advantages, such as simple process, stable structure, easily recycles, is produced on a large scale, it can Applied to the fields such as photocatalysis, Surface enhanced Raman scattering and surface-enhanced fluorescence, the antifouling, photoelectric conversion of antibacterial.
The specific technical solution that the present invention uses is as follows:
One kind preparing TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure, it is characterized in that: first using ultrafast Laser prepares level-one micrometer structure, ultrasonic cleaning to pure Ti piece surface etch in deionized water or dehydrated alcohol；Then pass through Ti piece surface gold-plating film of the magnetron sputtering after laser ablation；Finally the Ti piece after gold-plated film is placed in Muffle furnace and carries out hot place Reason prepares second level nanostructure on micrometer structure surface, obtains crystal type TiO2Multiple dimensioned composite micro-nano rice structure.
Further, the purity of Ti piece is in 95wt.% or more.
Further, ultrafast laser may include pulsewidth less than 10 picoseconds picosecond to femtosecond laser, ultrafast laser etching Energy density range are as follows: 3J/cm2~35J/cm2；In deionized water, 200-600 μm of pipeline purging speed/s；100- in dehydrated alcohol 500μm/s。
Further, the JFC-1100 type magnetic control sputtering device developed using Amada Co., Ltd., using gold as target, use is two-sided Glue, which on the sample stage in titanium sheet magnetic control sputtering device, will be evacuated to after pressure is 0.5Pa, can start to sputter；Sputtering parameter: it splashes 25 DEG C of temperature are penetrated, sputtering pressure 0.5Pa, sputtering power 150W；The time of magnetron sputtering is 30s-15min.
Further, it is heat-treated in Muffle furnace, temperature is 750-800 DEG C, soaking time 4-8h.
The invention has the advantages that
1) this method simple process, the rutile TiO prepared in substrate2Multiple dimensioned composite micro-nano rice structure, distribution Uniformly, reproducible；Stable structure, it is reusable.
2) ultrafast laser etching parameters and heat treatment parameter can respectively the pattern type to micrometer structure and size with receive The pattern type and size of rice structure are regulated and controled, to be adapted to the application demand of different field.
3) its with multiple dimensioned composite micro-nano rice structure, specific surface area is higher, absorption property and photo absorption performance are all mentioned It is high.
4) multiple dimensioned composite micro-nano rice structure is bound directly with substrate so that charge transfer impedance is small, and load has gold in structure Particle can reduce TiO2Forbidden bandwidth, effectively prevent electron-hole pair it is compound, accelerate light induced electron transfer rate, from And improve the absorption and utilization further improved to light.
The present invention is multiple dimensioned using ultrafast laser is directly prepared in titanium substrate with the process that heat treatment combines Composite micro-nano rice structure, method is simple, cleanliness without any pollution.The rutile TiO prepared2Multiple dimensioned composite micro-nano rice structure is not Only specific surface area is bigger, and stability is good, and load has noble metal granule, more conducively photoelectric conversion and absorption, has important reality Use meaning.Crystal type TiO prepared by the present invention2Multiple dimensioned micro-nano compound structure and current existing various three-dimensional TiO2Structure It compares, there is higher specific surface area, be conducive to improve its absorbing properties and substance-adsorbing energy, there is important practical meaning Justice.
Detailed description of the invention
Fig. 1 is level-one micron knot of the Ti piece in deionized water and dehydrated alcohol after different parameters femtosecond laser etching Structure changes scanning electron microscope (SEM) photograph.(a) Ti piece in deionized water by different parameters femtosecond laser etching after level-one micrometer structure Change scanning electron microscope (SEM) photograph；(b) level-one micrometer structure of the Ti piece in removing dehydrated alcohol after different parameters femtosecond laser etching Change scanning electron microscope (SEM) photograph；Fig. 1 (a) is demonstrated by carrying out ultrafast laser etching in deionized water, can be made in titanium substrate Standby level-one hump shape micrometer structure out, and with the energy-flux density of laser or sweep fast Parameters variation, thus it is possible to vary hump structure Diameter dimension.Fig. 1 (b) is demonstrated by carrying out ultrafast laser etching in dehydrated alcohol, and one can be prepared in titanium substrate The grade streaky hump shape micrometer structure of surface band, and with the energy-flux density of laser or sweep fast Parameters variation, thus it is possible to vary camel The diameter dimension of peak structure.Laser parameter variation (energy density, pipeline purging speed, media environment) is mainly used for changing level-one micron Structure and morphology and size.What is formed in deionized water is hump shape micrometer structure, and what is formed in dehydrated alcohol is surface band Streaky hump shape micrometer structure.And structure size is energy density and the coefficient result of pipeline purging speed: energy is bigger, Speed is smaller, and hump shape diameter of movement is bigger；Energy is smaller, and speed is bigger, and hump type diameter of movement size is smaller.
Fig. 2 is for level-one micrometer structure of the embodiment 1 after femtosecond laser etches with it using more rulers after heat treatment Spend the scanning electron microscope (SEM) photograph of composite micro-nano rice structure；(a) level-one micrometer structure Electronic Speculum of the embodiment 1 after femtosecond laser etches Figure；(b) TiO that embodiment 1 finally obtains2Multiple dimensioned composite micro-nano rice structural scan Electronic Speculum low power figure；(c) embodiment 1 is final The TiO of acquisition2Multiple dimensioned composite micro-nano rice structural scan Electronic Speculum high power figure.The process according to embodiment 1 is proved, in titanium-based Multiple dimensioned composite micro-nano rice structure has been prepared on bottom.
Fig. 3 is for level-one micrometer structure of the embodiment 2 after femtosecond laser etches with it using more rulers after heat treatment Spend the scanning electron microscope (SEM) photograph of composite micro-nano rice structure；(a) level-one micrometer structure Electronic Speculum of the embodiment 2 after femtosecond laser etches Figure；(b) TiO that embodiment 2 finally obtains2Multiple dimensioned composite micro-nano rice structural scan Electronic Speculum low power figure；(c) embodiment 2 is final The TiO of acquisition2Multiple dimensioned composite micro-nano rice structural scan Electronic Speculum high power figure.The process according to embodiment 2 is proved, in titanium-based Multiple dimensioned composite micro-nano rice structure has been prepared on bottom.
Fig. 4 is for level-one micrometer structure of the embodiment 3 after femtosecond laser etches with it using more rulers after heat treatment Spend the scanning electron microscope (SEM) photograph of composite micro-nano rice structure；(a) level-one micrometer structure Electronic Speculum of the embodiment 3 after femtosecond laser etches Figure；(b) TiO that embodiment 3 finally obtains2Multiple dimensioned composite micro-nano rice structural scan Electronic Speculum low power figure；(c) embodiment 3 is final The TiO of acquisition2Multiple dimensioned composite micro-nano rice structural scan Electronic Speculum high power figure.The process according to embodiment 3 is proved, in titanium-based Multiple dimensioned composite micro-nano rice structure has been prepared on bottom.
Fig. 5 is the XRD diagram on original Ti piece surface.
Fig. 6 is sample surfaces XRD and the EDS figure after embodiment 1 is heat-treated；(a) 1 sample surfaces TiO of embodiment2More rulers Spend composite micro-nano rice structure XRD diagram；(b) 1 sample surfaces TiO of embodiment2Multiple dimensioned composite micro-nano rice structure EDS figure.It demonstrates The ingredient for the multiple dimensioned composite micro-nano rice structure prepared is rutile TiO2, the particle loaded in structure is gold particle.
Fig. 7 is sample surfaces XRD and the EDS figure after embodiment 2 is heat-treated；(a) 2 sample surfaces TiO of embodiment2More rulers Spend composite micro-nano rice structure XRD diagram；(b) 2 sample surfaces TiO of embodiment2Multiple dimensioned composite micro-nano rice structure EDS figure.It demonstrates The ingredient for the multiple dimensioned composite micro-nano rice structure prepared is rutile TiO2, the particle loaded in structure is gold particle.
Fig. 8 is sample surfaces XRD and the EDS figure after embodiment 3 is heat-treated；(a) 3 sample surfaces TiO of embodiment2More rulers Spend composite micro-nano rice structure XRD diagram；(b) 3 sample surfaces TiO of embodiment2Multiple dimensioned composite micro-nano rice structure EDS figure.It demonstrates The ingredient for the multiple dimensioned composite micro-nano rice structure prepared is rutile TiO2, the particle loaded in structure is gold particle.
Specific embodiment
The present invention is further explained with reference to embodiments is mutually tied by ultrafast laser etching with heat treatment in Ti substrate The technique of conjunction prepares crystal type TiO2The method of multiple dimensioned composite micro-nano rice structure, but the present invention is not limited solely to following implementations Example.
Embodiment 1: level-one micron knot is prepared to pure Ti piece surface etch in deionized water using femtosecond laser first Structure, laser parameter are as follows: frequency: 1khz, pulsewidth 187fs, laser energy density: E=10.78J/cm2, sweep speed: v=400 μm/s； Then the Ti piece after laser ablation is placed in dehydrated alcohol and is cleaned by ultrasonic 5min, later using magnetron sputtering 15min in ultrasound Ti piece surface gold-plating film after cleaning；Finally the Ti piece after plated film is placed in Muffle furnace and is heat-treated, heating rate be 5 DEG C/ Min keeps the temperature 4 hours after being warming up to 750 DEG C, cooling with furnace temperature, prepares second level nanostructure, and finally acquisition load has gold particle Rutile TiO2Multiple dimensioned composite micro-nano rice structure.
Embodiment 2: level-one micron knot is prepared to pure Ti piece surface etch in deionized water using femtosecond laser first Structure, laser parameter are as follows: frequency: 1khz, pulsewidth 187fs, laser energy density: E=10.78J/cm2, sweep speed: v=400 μm/s； Then the Ti piece after laser ablation is placed in dehydrated alcohol and is cleaned by ultrasonic 5min, later using magnetron sputtering 15min in ultrasound Ti piece surface gold-plating film after cleaning；Finally the Ti piece after plated film is placed in Muffle furnace and is heat-treated, heating rate be 5 DEG C/ Min keeps the temperature 8 hours after being warming up to 800 DEG C, cooling with furnace temperature, prepares second level nanostructure, and finally acquisition load has gold particle Rutile TiO2Multiple dimensioned composite micro-nano rice structure.
Embodiment 3: level-one micron knot is prepared to pure Ti piece surface etch in deionized water using femtosecond laser first Structure, laser parameter are as follows: frequency: 1khz, pulsewidth 187fs, laser energy density: E=10.78J/cm2, sweep speed: v=400 μm/s； Then the Ti piece after laser ablation is placed in dehydrated alcohol and is cleaned by ultrasonic 5min, later using magnetron sputtering 15min in ultrasound Ti piece surface gold-plating film after cleaning；Finally the Ti piece after plated film is placed in Muffle furnace and is heat-treated, heating rate be 5 DEG C/ Min keeps the temperature 4 hours after being warming up to 800 DEG C, cooling with furnace temperature, prepares second level nanostructure, and finally acquisition load has gold particle Rutile TiO2Multiple dimensioned composite micro-nano rice structure.
Embodiment 1 and 3 compares, and laser parameter is identical, and heat treatment soaking time is identical, and the metal spraying time is identical, and heat treatment is protected Temperature is different, it will thus be seen that at 750 DEG C, forming surface growth has the hump type of the nano wire of top load gold particle compound Micro-nano structure；At 800 DEG C, forms surface and only load the hump type composite micro-nano structure for having gold particle, pattern is different.
Embodiment 2 and 3 compares, and laser parameter is identical, and heat treatment holding temperature is identical, and the metal spraying time is identical, and heat treatment is protected The warm time is different it can be seen that 800 DEG C keep the temperature 4 hours, and formation area load has the hump type composite micro-nano structure of gold particle；It protects Temperature 8 hours forms the hump type structure that there is striped on surface and load has gold particle., pattern is different, and heat treatment process is for compound The pattern type adjusting of micro-nano structure becomes apparent, less obvious in terms of size.

Claims (5)

1. one kind prepares TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure, which is characterized in that specific step is as follows: Level-one micrometer structure is prepared to pure Ti piece surface etch in deionized water or dehydrated alcohol using ultrafast laser first, ultrasound is clear It washes；Then pass through Ti piece surface gold-plating film of the magnetron sputtering after laser ablation；The Ti piece after gold-plated film is finally placed in Muffle It is heat-treated in furnace, prepares second level nanostructure on micrometer structure surface, obtain crystal type TiO2Multiple dimensioned composite micro-nano rice Structure.
2. one kind as described in claim 1 prepares TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure, feature exist In the purity of Ti piece is in 95wt.% or more.
3. one kind as described in claim 1 prepares TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure, feature exist In ultrafast laser may include picosecond energy density range that femtosecond laser, ultrafast laser etches of the pulsewidth less than 10 picoseconds Are as follows: 3J/cm2~35J/cm2；In deionized water, 200-600 μm of pipeline purging speed/s；100-500 μm in dehydrated alcohol/s.
4. one kind as described in claim 1 prepares TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure, feature exist In the JFC-1100 type magnetic control sputtering device that magnetron sputtering uses Amada Co., Ltd. to develop will with double-sided adhesive using gold as target On sample stage in titanium sheet magnetic control sputtering device, being evacuated to after pressure is 0.5Pa can start to sputter；Sputtering parameter: sputtering temperature 25 DEG C, sputtering pressure 0.5Pa, sputtering power 150W of degree；The time of magnetron sputtering is 30s-15min.
5. one kind as described in claim 1 prepares TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure, feature exist In the temperature being heat-treated in Muffle furnace is 750-800 DEG C, soaking time 4-8h.
CN201811438799.7A 2018-11-28 2018-11-28 One kind preparing TiO in titanium substrate2The method of multiple dimensioned micro-nano compound structure Pending CN109576640A (en)

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CN110560703A (en) * 2019-09-18 2019-12-13 清华大学 Preparation method and system of gold nanorod with high catalytic activity based on femtosecond laser
CN111850653A (en) * 2020-06-23 2020-10-30 清华大学 Method and system for preparing titanium dioxide with exposed high-activity surface by using femtosecond laser
CN114749173A (en) * 2022-04-24 2022-07-15 长春工业大学 Ag-TiO2Composite photocatalytic material and preparation method thereof
CN115008018A (en) * 2022-04-28 2022-09-06 西安交通大学 Method for preparing durable super-hydrophobic surface through femtosecond laser composite rare earth nano modification
CN115248204A (en) * 2022-07-20 2022-10-28 济南大学 Titanium dioxide solid-phase microextraction probe for Raman detection and preparation method thereof
CN116288347A (en) * 2023-03-01 2023-06-23 纳狮新材料有限公司杭州分公司 Method for reducing corrosive wear and marine environment surface corrosion wear resistant fluorocarbon base film

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110560703A (en) * 2019-09-18 2019-12-13 清华大学 Preparation method and system of gold nanorod with high catalytic activity based on femtosecond laser
US11110448B1 (en) 2019-09-18 2021-09-07 Tsinghua University Method for preparing gold nanorods having high catalytic activity by using femtosecond laser
CN111850653A (en) * 2020-06-23 2020-10-30 清华大学 Method and system for preparing titanium dioxide with exposed high-activity surface by using femtosecond laser
CN114749173A (en) * 2022-04-24 2022-07-15 长春工业大学 Ag-TiO2Composite photocatalytic material and preparation method thereof
CN115008018A (en) * 2022-04-28 2022-09-06 西安交通大学 Method for preparing durable super-hydrophobic surface through femtosecond laser composite rare earth nano modification
CN115248204A (en) * 2022-07-20 2022-10-28 济南大学 Titanium dioxide solid-phase microextraction probe for Raman detection and preparation method thereof
CN116288347A (en) * 2023-03-01 2023-06-23 纳狮新材料有限公司杭州分公司 Method for reducing corrosive wear and marine environment surface corrosion wear resistant fluorocarbon base film

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Application publication date: 20190405