The compound of a kind of fluorenes of xanthene containing spiral shell and its on organic electroluminescence device
Using
Technical field
The present invention relates to technical field of semiconductors, more particularly, to a kind of change containing oxa- spiro fluorene and nitrogenous five-ring heterocycles
Close object, and its application on organic electroluminescence device.
Background technique
Organic electroluminescent (OLED:Organic Light Emission Diodes) device technology can not only be used to
New display product is manufactured, can be also used for production novel illumination product, and be expected to substitute existing liquid crystal display and fluorescent lamp
Illumination, be widely used prospect.OLED luminescent device is a kind of sandwich structure, including electrode material film layer, with
And it is clipped in the organic functional material between Different electrodes film layer, various different function materials are overlapped mutually together altogether depending on the application
With composition OLED luminescent device.As current device, when the two end electrodes application voltage to OLED luminescent device, and pass through electric field
The positive and negative charge in organic layer functional material film layer is acted on, positive and negative charge is further compound in luminescent layer, i.e. generation OLED electricity
Photoluminescence.
Currently, OLED display technology in smart phone, applied by the fields such as tablet computer, further will also be to electricity
Depending on etc. large scales application field extension, still, the luminous efficiency of OLED device, the application requirement of the performances such as service life and product
Compared to needing further to be promoted.Research for improving OLED luminescent device performance specifically includes that the driving electricity for reducing device
Pressure, improves the luminous efficiency of device, improves the service life etc. of device.In order to realize OLED device performance continuous promotion,
Not only OLED device structure and manufacture craft are innovated, also oled light sulfate ferroelectric functional material is constantly studied and created
Newly, to create the OLED functional material of higher performance.Oled light sulfate ferroelectric functional material applied to OLED device is from purposes
Two major classes, i.e. charge injection transmission material and luminescent material can be substantially divided into, charge injection transmission material can be divided into electricity again
Son injection transmission material, electron-blocking materials, hole injection transmission material and hole barrier materials, and luminescent material includes main body
Luminescent material and dopant material.High performance OLED luminescent device, it is desirable that various organic functional materials must have good light
Electrical characteristics, for example, as charge transport materials, it is desirable that there is good carrier mobility, higher glass transition temperature
There is good bipolarity Deng, the material of main part of luminescent layer, HOMO/LUMO appropriate can rank etc..
The oled light sulfate ferroelectric functional material film layer for constituting OLED device includes at least two layers or more structure, applies in industry
OLED device structure then includes hole injection layer, hole transmission layer, electronic barrier layer, luminescent layer, hole blocking layer, electronics biography
A variety of film layers such as defeated layer, electron injecting layer, that is to say, that the photoelectric functional material applied to OLED device is infused including at least hole
Enter material, hole mobile material, luminescent material, electron transport material etc., material type and collocation form with rich and more
The characteristics of sample.In addition, used photoelectric functional material has stronger for the collocation of the OLED device of different structure
Selectivity, performance of the identical material in different structure device, it is also possible to completely totally different.Therefore, for current OLED
The industry application requirement of device and the different function film layer of OLED device, the photoelectric characteristic demand of device, it is necessary to which selection is more suitable
It closes, OLED functional material or combination of materials with high performance, is just able to achieve the comprehensive of the high efficiency of device, long-life and low-voltage
Close characteristic.For current OLED shows the actual demand of Lighting Industry, the development of OLED material at present also lags far behind face
The requirement of plate manufacturing enterprise, the organic functional material as material enterprise development higher performance are particularly important.
Summary of the invention
In view of the above-mentioned problems existing in the prior art, the applicant provide a kind of fluorenes of xanthene containing spiral shell compound and its
Application on organic electroluminescence device.It is fluorene structured that the compounds of this invention contains spiral shell xanthene, and vitrifying with higher turns
Temperature and molecule thermal stability, suitable HOMO and lumo energy can effectively improve device after being applied to OLED device production
Luminous efficiency and OLED device service life.
Technical scheme is as follows: a kind of compound of the fluorenes of xanthene containing spiral shell, the structure of the compound such as general formula (1)
It is shown:
Wherein, Ar1、Ar2、Ar3、Ar4Independently be expressed as singly-bound, substituted or unsubstituted C6-60Arlydene contains
One of one or more substituted or unsubstituted 5~60 yuan of heteroarylidenes of hetero atom;The hetero atom be nitrogen, oxygen or sulphur,
Ar1、Ar2、Ar3、Ar4It is identical or different;
M, n, p, q independently be expressed as number 0 or 1, and m+n+p+q >=1;
R1、R2、R3、R4Independently be expressed as structure shown in general formula (2);R1、R2、R3、R4It is identical or different;
In general formula (2), R5、R6Independently be expressed as hydrogen atom, general formula (3), general formula (4), general formula (5) or general formula (6)
Shown structure;R5、R6It is identical or different;
In general formula (3) and general formula (4), X1、X2、X3Independently be expressed as oxygen atom, sulphur atom, C1-10Straight chain or branch
One in imido grpup that alkylidene, alkyl-substituted imido grpup or the aryl of alkylidene, aryl substitution that alkyl group replaces replace
Kind;
General formula (3), general formula (4), general formula (5) pass through CL1-CL2Key, CL2-CL3Key, CL3-CL4Key, CL’1-CL’2Key, CL'2-
CL’3Key or CL’3-CL’4Key is connected with general formula (2) and ring;
In general formula (6), R7、R8Independently be expressed as substituted or unsubstituted C6-60Aryl, containing one or more miscellaneous
One of substituted or unsubstituted 5-60 unit's heteroaryl of atom;The hetero atom is nitrogen, oxygen or sulphur.
Based on the above technical solution, the present invention can also be improved as follows.
Further, any one of described general formula (1) structure meeting formula (I)-(II):
Further, any one of described general formula (1) structure meeting formula (III)-(VIII):
Further, any one of described general formula (1) structure meeting formula (I)-(VIII):
Further, any one of described general formula (1) structure meeting formula (1-1)-(1-8):
Further, in above-mentioned general formula, Ar used1、Ar2、Ar3、Ar4Independently indicate are as follows: Or one of singly-bound.
Further, R7、R8Independently be expressed as phenyl, naphthalene, dibiphenylyl, terphenyl, dibenzofurans, two
One of benzothiophene, 9,9- dimethyl fluorene or N- phenyl carbazole.
Further, the concrete structure formula of the compound are as follows:
Any one of.
The present invention also provides a kind of preparation methods of compound as described above, comprising:
Work as Ar1、Ar2、Ar3、Ar4When being expressed as singly-bound, the reaction equation that occurs in preparation process are as follows:
The specific reaction process of above-mentioned reaction equation are as follows:
1) by raw material A and H-R1It is dissolved with toluene, wherein the raw material A and H-R1Molar ratio be 1:(1.0~1.5);
2) Pd is added into the reaction system in 1)2(dba)3, tri-tert-butylphosphine and sodium tert-butoxide, obtain mixed solution;
Wherein, the Pd2(dba)3It is (0.005~0.01) with the molar ratio of raw material A: 1, the tri-tert-butylphosphine and former
The molar ratio for expecting A is (0.005~0.02): 1, the molar ratio of the sodium tert-butoxide and raw material A is (1.5~3.0): 1;
3) under the protection of inert gas, above-mentioned mixed solution reacts to 10 under the conditions of 95~110 DEG C of temperature~
For 24 hours, cooled to room temperature is filtered reaction solution, then rotates to filtrate, finally crosses neutral silica gel column, obtains
To intermediate M;
4) by intermediate M and H-R2It is dissolved with toluene, wherein the intermediate M and H-R2Molar ratio be 1:(1.0~
1.5);
5) Pd is added into reaction system 4)2(dba)3, tri-tert-butylphosphine and sodium tert-butoxide, obtain mixed solution;
Wherein, the Pd2(dba)3Be (0.005~0.01) with the molar ratio of intermediate M: 1, the tri-tert-butylphosphine with
The molar ratio of intermediate M is (0.005~0.02): 1, the molar ratio of the sodium tert-butoxide and intermediate M are (1.5~3.0): 1;
6) under the protection of inert gas, above-mentioned mixed solution reacts to 10 under the conditions of 95~110 DEG C of temperature~
For 24 hours, cooled to room temperature, and filtering reacting solution, filtrate rotate to solvent-free, cross neutral silica gel column, obtain intermediate N;
7) by intermediate N and H-R3It is dissolved with toluene, wherein the intermediate N and H-R3Molar ratio be 1:(1.0~
1.5);
8) Pd is added into reaction system 7)2(dba)3, tri-tert-butylphosphine and sodium tert-butoxide, obtain mixed solution;
Wherein, the Pd2(dba)3Be (0.005~0.01) with the molar ratio of intermediate N: 1, the tri-tert-butylphosphine with
The molar ratio of intermediate N is (0.005~0.02): 1, the molar ratio of the sodium tert-butoxide and intermediate N are (1.5~3.0): 1;
9) under the protection of inert gas, above-mentioned mixed solution reacts to 10 under the conditions of 95~110 DEG C of temperature~
For 24 hours, cooled to room temperature, and filtering reacting solution, filtrate rotate to solvent-free, cross neutral silica gel column, obtain intermediate P;
10) by intermediate P and H-R4It is dissolved with toluene, wherein the intermediate P and H-R4Molar ratio be 1:(1.0~
1.5);
11) Pd is added into reaction system 10)2(dba)3, tri-tert-butylphosphine and sodium tert-butoxide, obtain mixed solution;
Wherein, the Pd2(dba)3Be (0.005~0.01) with the molar ratio of intermediate P: 1, the tri-tert-butylphosphine with
The molar ratio of intermediate P is (0.005~0.02): 1, the molar ratio of the sodium tert-butoxide and intermediate P are (1.5~3.0): 1;
12) under the protection of inert gas, above-mentioned mixed solution reacts to 10 under the conditions of 95~110 DEG C of temperature~
For 24 hours, cooled to room temperature, and filtering reacting solution, filtrate rotate to solvent-free, cross neutral silica gel column, obtain target chemical combination
Object;
Work as Ar1、Ar2、Ar3、Ar4When not being expressed as singly-bound, the reaction equation that occurs in preparation process are as follows:
The specific reaction process of above-mentioned reaction equation are as follows:
1) with raw material A andBoronic acid compounds are raw material, and toluene dissolution, the toluene dosage is every gram of original
Expect that A uses 30-50ml toluene, wherein the raw material A and the molar ratio of boronic acid compounds are 1:(1.0~1.5);
2) Pd (PPh is added into reaction system 1)3)4And sodium carbonate, obtain mixed solution;
Wherein, the Pd (PPh3)4It is (0.005~0.01) with the molar ratio of raw material A: 1, the sodium carbonate and raw material A
Molar ratio is (1.5~3.0): 1;
3) it under nitrogen protection, by above-mentioned mixed solution in 95~110 DEG C, reacts 10~24 hours, naturally cools to room
Temperature, and filtering reacting solution, filtrate carry out vacuum rotary steam, cross neutral silica gel column, obtain intermediate N;
4) with intermediate N andBoronic acid compounds are raw material, and toluene dissolution, the toluene dosage is every gram
Intermediate N uses 30-50ml toluene, wherein the molar ratio of the intermediate N and boronic acid compounds is 1:(1.0~1.5);
5) Pd (PPh is added into reaction system 4)3)4And sodium carbonate, obtain mixed solution;
Wherein, the Pd (PPh3)4It is (0.005~0.01) with the molar ratio of intermediate N: 1, the sodium carbonate and intermediate
The molar ratio of body N is (1.5~3.0): 1;
6) it under nitrogen protection, by above-mentioned mixed solution in 95~110 DEG C, reacts 10~24 hours, naturally cools to room
Temperature, and filtering reacting solution, filtrate carry out vacuum rotary steam, cross neutral silica gel column, obtain intermediate M.
7) with intermediate M andBoronic acid compounds are raw material, and toluene dissolution, the toluene dosage is every gram
Intermediate M uses 30-50ml toluene, wherein the molar ratio of the intermediate M and boronic acid compounds is 1:(1.0~1.5);
8) Pd (PPh is added into reaction system 7)3)4And sodium carbonate, obtain mixed solution;
Wherein, the Pd (PPh3)4It is (0.005~0.01) with the molar ratio of intermediate M: 1, the sodium carbonate and intermediate
The molar ratio of body M is (1.5~3.0): 1;
9) it under nitrogen protection, by above-mentioned mixed solution in 95~110 DEG C, reacts 10~24 hours, naturally cools to room
Temperature, and filtering reacting solution, filtrate carry out vacuum rotary steam, cross neutral silica gel column, obtain intermediate P;
10) with intermediate P andBoronic acid compounds are raw material, and toluene dissolution, the toluene dosage is every gram
Intermediate P uses 30-50ml toluene, wherein the molar ratio of the intermediate P and boronic acid compounds is 1:(1.0~1.5);
11) Pd (PPh is added into reaction system 10)3)4And sodium carbonate, obtain mixed solution;
Wherein, the Pd (PPh3)4It is (0.005~0.01) with the molar ratio of intermediate P: 1, the sodium carbonate and intermediate
The molar ratio of body P is (1.5~3.0): 1;
12) it under nitrogen protection, by above-mentioned mixed solution in 95~110 DEG C, reacts 10~24 hours, naturally cools to room
Temperature, and filtering reacting solution, filtrate carry out vacuum rotary steam, cross neutral silica gel column, obtain target compound.
The present invention also provides a kind of organic electroluminescence device, the organic electroluminescence device includes at least one layer of function
Layer contains the compound of the above-mentioned fluorenes of xanthene containing spiral shell.
Based on the above technical solution, the present invention can also be improved as follows.
Further, the organic electroluminescence device, including hole transmission layer/electronic barrier layer, the hole transport
Layer/electronic barrier layer contains the compound of the fluorenes of xanthene containing spiral shell as described above.
Further, the organic electroluminescence device, including luminescent layer, the luminescent layer contain as described above containing spiral shell
The compound of xanthene fluorenes.
The present invention also provides a kind of illumination or display elements, including organic electroluminescence device as described above.
The present invention is beneficial to be had the technical effect that
The compounds of this invention connects carbazole derivates long branched chain structure, due to branched group using spiral shell xanthene fluorenes as skeleton
Electron donation is strong and weak different, adjust the HOMO energy level of compound entirety structure can freely, the shallow compound of HOMO energy level can
As hole transmission layer/electronic barrier layer materials'use;The material of HOMO energy level depth can be used as the luminous layer main body material of inclined cavity type
Material uses.
In addition, spiral shell xanthene fluorene group is bipolarity group, branch is backbone, destroys the symmetrical of molecular structure
Property, avoid intermolecular aggtegation;It using spiral shell xanthene fluorenes as parent nucleus, avoids group and rotates freely, enhance center mother
The rigidity of core group, the branched group of the compounds of this invention also have very strong rigidity, and therefore, molecule is not easy accumulative crystallization, has
Good film forming, and glass transition temperature with higher and thermal stability, so, the compounds of this invention is applied to OLED
When device, membranous layer stability after can keeping material filming improves OLED device service life.
In addition, the compounds of this invention has high triplet, it can effectively stop energy loss and be conducive to energy to pass
It passs.Therefore, after compound of the present invention is applied to OLED device as organic electroluminescent functional layer material, the electric current of device
Efficiency, power efficiency and external quantum efficiency are greatly improved;Meanwhile device lifetime is promoted clearly, in OLED
There is good application effect in luminescent device, there is good industrialization prospect.
Detailed description of the invention
Fig. 1 is the structural schematic diagram that material cited by the present invention is applied to OLED device;
Wherein, 1 is transparent substrate layer, and 2 be ito anode layer, and 3 be hole injection layer, and 4 be hole transmission layer, and 5 hinder for electronics
Barrier, 6 be luminescent layer, and 7 be hole barrier/electron transfer layer, and 8 be electron injecting layer, and 9 be cathode reflection electrode layer;
Fig. 2 is the efficiency curve diagram that device measures at different temperatures.
Specific embodiment
Below in conjunction with drawings and examples, the present invention is specifically described.
Work as Ar1、Ar2、Ar3、Ar4When not being expressed as singly-bound,
Intermediate boronic acid compounds's
Synthesis:
(1) under nitrogen atmosphere, R is weighed1- H and Br-Ar1- Cl is dissolved in toluene, then by Pd2(dba)3, tri-tert-butylphosphine
It is added, stirs mixture, add sodium tert-butoxide, by the mixed solution of above-mentioned reactant at 95~110 DEG C of reaction temperature, add
Heat reflux 10~for 24 hours, it after reaction, is cooled to room temperature, and filtering reacting solution, filtrate rotates to solvent-free, excessively neutral silicon
Rubber column gel column obtains intermediate R1-Ar1-Cl;
(2) under nitrogen atmosphere, intermediate R is weighed1-Ar1- Cl is dissolved in tetrahydrofuran (THF), then will be bis- (pinacol root
Base) two boron, (1,1 '-bis- (diphenylphosphine) ferrocene) dichloro palladium (II) and potassium acetate addition, mixture is stirred, it will be above-mentioned anti-
The mixed solution of object is answered to be heated to reflux at 70-90 DEG C of reaction temperature 5-10 hours;After reaction, add water cooling and will mix
Close object filtering and the drying in vacuum drying oven.Residue obtained is crossed into silica gel column separating purification, obtains intermediate
Ar used above1、Ar2、R1、R2The meaning of equal symbols is identical as the definition of specification Summary.
By taking the synthesis of intermediate B 1 as an example:
(1) in the there-necked flask of 250ml, lead under nitrogen protection, 0.02mol raw material B2,0.024mol para chlorobromobenzene be added,
0.04mol sodium tert-butoxide, 1 × 10-4mol Pd2(dba)3, 1 × 10-4Mol tri-tert phosphorus, 150ml toluene are heated to reflux 24
Hour, sample contact plate, fully reacting;Natural cooling, filtering, filtrate revolving, column chromatograph to obtain intermediate A 1, HPLC purity
99.4%, yield 71.3%;
Elemental analysis structure (molecular formula C27H20ClN): theoretical value C, 82.33;H,5.12;Cl,9.00;N,3.56;Test
Value: C, 82.32;H,5.11;Cl,9.02;N,3.55.ESI-MS(m/z)(M+): theoretical value 393.13, measured value are
393.58。
(2) in 250mL there-necked flask, it is passed through nitrogen, 0.02mol intermediate A 1 is added and is dissolved in 150ml tetrahydrofuran,
Again by 0.024mol bis- (pinacol foundation) two boron, 0.0002mol (1,1 '-bis- (diphenylphosphine) ferrocene) dichloro palladium (II) with
And 0.05mol potassium acetate is added, stirring mixture heats back by the mixed solution of above-mentioned reactant at 80 DEG C of reaction temperature
Stream 5 hours;After reaction, it cools down and is added 100ml water and mixture is filtered and is dried in vacuum drying oven.It will be obtained
The residue obtained crosses silica gel column separating purification, obtains intermediate B 1;HPLC purity 99.5%, yield 92.1%.
Elemental analysis structure (molecular formula C33H32BNO2): theoretical value C, 81.65;H,6.64;B,2.23;N,2.89;O,
6.59;Test value: C, 81.68;H,6.65;B,2.21;N,2.88;O,6.58.ESI-MS(m/z)(M+): theoretical value is
485.25 measured value 485.61.
Intermediate B is prepared with the synthetic method of intermediate B 1, specific structure is as shown in table 1.
Table 1
Embodiment 1: the synthesis of compound 8:
In the there-necked flask of 250ml, lead under nitrogen protection, 0.01mol raw material A 1,0.012mol raw material B1,150ml is added
Toluene is stirred, then addition 0.03mol sodium tert-butoxide, and 5 × 10-5molPd2(dba)3, 5 × 10-5Mol tri-tert-butylphosphine,
105 DEG C are heated to, back flow reaction 24 hours, samples contact plate, display is without bromo-derivative residue, fully reacting;Cooled to room temperature,
Filtering, filtrate carry out vacuum rotary steam (- 0.09MPa, 85 DEG C), cross neutral silica gel column, obtain target product, HPLC purity
99.3%, yield 84.7%;
Elemental analysis structure (molecular formula C49H30N2O): theoretical value C, 88.80;H,4.56;N,4.23;O,2.41;Test
Value: C, 88.75;H,4.65;N,4.05;O,2.56.ESI-MS(m/z)(M+): theoretical value 662.24, measured value are
662.79。
Embodiment 2: the synthesis of compound 15:
In the there-necked flask of 250ml, lead under nitrogen protection, 0.01mol raw material A 1,0.012mol raw material B2,150ml is added
Toluene is stirred, then addition 0.03mol sodium tert-butoxide, and 5 × 10-5molPd2(dba)3, 5 × 10-5Mol tri-tert-butylphosphine,
105 DEG C are heated to, back flow reaction 24 hours, samples contact plate, display is without bromo-derivative residue, fully reacting;Cooled to room temperature,
Filtering, filtrate carry out vacuum rotary steam (- 0.09MPa, 85 DEG C), cross neutral silica gel column, obtain target product, HPLC purity
99.5%, yield 82.9%;
Elemental analysis structure (molecular formula C46H31NO): theoretical value C, 90.02;H,5.09;N,2.28;O,2.61;Test
Value: C, 90.08;H,5.13;N,2.26;O,2.65.ESI-MS(m/z)(M+): theoretical value 613.24, measured value are
613.76。
Embodiment 3: the synthesis of compound 16:
The preparation method is the same as that of Example 1 for compound 16, the difference is that replacing raw material B1 with raw material B3.
Elemental analysis structure (molecular formula C49H30N2O): theoretical value C, 88.80;H,4.56;N,4.23;O,2.41;Test
Value: C, 88.77;H,4.49;N,4.09;O,2.37.ESI-MS(m/z)(M+): theoretical value 662.24, measured value are
662.59。
Embodiment 4: the synthesis of compound 23:
The preparation method is the same as that of Example 1 for compound 23, the difference is that replacing raw material B1 with raw material B4.
Elemental analysis structure (molecular formula C46H31NO): theoretical value C, 90.02;H,5.09;N,2.28;O,2.61;Test
Value: C, 90.07;H,5.12;N,2.25;O,2.57.ESI-MS(m/z)(M+): theoretical value 613.24, measured value are
613.77。
Embodiment 5: the synthesis of compound 40:
The preparation method is the same as that of Example 1 for compound 40, the difference is that replacing raw material A 1 with raw material A 5, is replaced with raw material B5
Change raw material B1.
Elemental analysis structure (molecular formula C46H31NO2): theoretical value C, 87.73;H,4.96;N,2.22;O,5.08;Test
Value: C, 87.69;H,4.95;N,2.19;O,5.03.ESI-MS(m/z)(M+): theoretical value 629.24, measured value are
629.86。
Embodiment 6: the synthesis of compound 46:
The preparation method is the same as that of Example 1 for compound 46, the difference is that replacing raw material B1 with raw material B6.
Elemental analysis structure (molecular formula C52H36N2O): theoretical value C, 88.61;H,5.15;N,3.97;O,2.27;Test
Value: C, 88.58;H,5.13;N,3.91;O,2.26.ESI-MS(m/z)(M+): theoretical value 704.28, measured value are
704.87。
Embodiment 7: the synthesis of compound 60:
The preparation method is the same as that of Example 1 for compound 60, the difference is that replacing raw material B1 with raw material B7.
Elemental analysis structure (molecular formula C64H44N2O): theoretical value C, 89.69;H,5.17;N,3.27;O,1.87;Test
Value: C, 89.67;H,5.14;N,3.25;O,1.85.ESI-MS(m/z)(M+): theoretical value 856.35, measured value are
856.87。
Embodiment 8: the synthesis of compound 65:
The preparation method is the same as that of Example 1 for compound 65, the difference is that replacing raw material B1 with raw material B8.
Elemental analysis structure (molecular formula C45H27NO): theoretical value C, 90.43;H,4.55;N,2.34;O,2.68;Test
Value: C, 90.45;H,4.57;N,2.26;O,2.65.ESI-MS(m/z)(M+): theoretical value 597.21, measured value are
597.72。
Embodiment 9: the synthesis of compound 80:
The preparation method is the same as that of Example 1 for compound 80, the difference is that replacing raw material A 1 with raw material A 2, is replaced with raw material B9
Change raw material B1.
Elemental analysis structure (molecular formula C49H30N2O): theoretical value C, 88.80;H,4.56;N,4.23;O,2.41;Test
Value: C, 88.88;H,4.51;N,4.21;O,2.47.ESI-MS(m/z)(M+): theoretical value 662.79, measured value are
662.92。
Embodiment 10: the synthesis of compound 68:
The preparation method is the same as that of Example 1 for compound 68, the difference is that replacing raw material B1 with raw material B10.
Elemental analysis structure (molecular formula C58H40N2O): theoretical value C, 89.20;H,5.16;N,3.59;O,2.05;Test
Value: C, 89.22;H,5.17;N,3.62;O,2.07.ESI-MS(m/z)(M+): theoretical value 780.31, measured value are
780.97。
Embodiment 11: the synthesis of compound 104:
The preparation method is the same as that of Example 1 for compound 104, the difference is that raw material A 1 is replaced with raw material A 3, with raw material B11
Replace raw material B1.
Elemental analysis structure (molecular formula C43H25NOS): theoretical value C, 85.55;H,4.17;N,2.32;S,5.31;O,
2.65;Test value: C, 85.57;H,4.15;N,2.33;S,5.32;O,2.63.ESI-MS(m/z)(M+): theoretical value is
603.17 measured value 603.74.
Embodiment 12: the synthesis of compound 108:
The preparation method is the same as that of Example 1 for compound 108, the difference is that raw material A 1 is replaced with raw material A 3, with raw material B12
Replace raw material B1
Elemental analysis structure (molecular formula C43H25NOS): theoretical value C, 85.55;H,4.17;N,2.32;S,5.31;O,
2.65;Test value: C, 85.57;H,4.15;N,2.33;S,5.32;O,2.63.ESI-MS(m/z)(M+): theoretical value is
603.17 measured value 603.69.
Embodiment 13: the synthesis of compound 121:
In the there-necked flask of 250ml, lead under nitrogen protection, addition 0.01mol raw material A 1,0.012mol intermediate B 2,
150ml toluene is stirred, then addition 0.02mol sodium carbonate, and 1 × 10-4molPd(PPh3)4, 105 DEG C are heated to, reflux is anti-
It answers 24 hours, samples contact plate, display is without bromo-derivative residue, fully reacting;Cooled to room temperature, filtering, filtrate are depressurized
It rotates (- 0.09MPa, 85 DEG C), crosses neutral silica gel column, obtain target product, HPLC purity 99.2%, yield 78.5%;
Elemental analysis structure (molecular formula C55H34N2O): theoretical value C, 89.41;H,4.64;N,3.79;O,2.17;Test
Value: C, 89.43;H,4.65;N,3.77;O,2015.ESI-MS(m/z)(M+): theoretical value 738.27, measured value are
738.89。
Embodiment 14: the synthesis of compound 133:
The preparation method is the same as that of Example 13 for compound 133, the difference is that replacing raw material A 1 with raw material A 4, uses intermediate
B3 replaces intermediate B 2.
Elemental analysis structure (molecular formula C58H39NO): theoretical value C, 90.95;H,5.13;N,1.83;O,2.09;Test
Value: C, 90.96;H,5.19;N,1.85;O,2.11.ESI-MS(m/z)(M+): theoretical value 765.30, measured value are
765.86。
Embodiment 15: the synthesis of compound 138:
The preparation method is the same as that of Example 13 for compound 138, the difference is that replacing raw material A 1 with raw material A 4, uses intermediate
B4 replaces intermediate B 2.
Elemental analysis structure (molecular formula C61H38N2O): theoretical value C, 89.90;H,4.70;N,3.44;O,1.96;Test
Value: C, 89.93;H,4.65;N,3.47;O,2.05.ESI-MS(m/z)(M+): theoretical value 814.30, measured value are
814.95。
Embodiment 16: the synthesis of compound 147:
The preparation method is the same as that of Example 13 for compound 147, the difference is that replacing raw material A 1 with raw material A 4, uses intermediate
B5 replaces intermediate B 2.
Elemental analysis structure (molecular formula C58H39NO): theoretical value C, 90.95;H,5.13;N,1.83;O,2.09;Test
Value: C, 90.98;H,5.12;N,1.87;O,2.11.ESI-MS(m/z)(M+): theoretical value 765.96, measured value are
765.99。
Embodiment 17: the synthesis of compound 154:
The preparation method is the same as that of Example 1 for compound 154, the difference is that raw material A 1 is replaced with raw material A 6, with raw material B13
Replace raw material B1.
Elemental analysis structure (molecular formula C52H36N2O): theoretical value C, 88.61;H,5.15;N,3.97,O,2.27;Test
Value: C, 88.65;H,5.32;N,3.96;O,2.36.ESI-MS(m/z)(M+): theoretical value 704.28, measured value are
704.87。
Embodiment 18: the synthesis of compound 166:
The preparation method is the same as that of Example 13 for compound 166, the difference is that replacing raw material A 1 with raw material A 5, uses intermediate
B6 replaces intermediate B 2.
Elemental analysis structure (molecular formula C58H40N2O): theoretical value C, 89.20;H,5.16;N,3.59;O,2.05;Test
Value: C, 80.21;H,5.17;N,3.57;O,2.03.ESI-MS(m/z)(M+): theoretical value 780.31, measured value are
780.97。
Embodiment 19: the synthesis of compound 189:
The preparation method is the same as that of Example 1 for compound 189, the difference is that raw material A 1 is replaced with raw material A 6, with raw material B14
Replace raw material B1.
Elemental analysis structure (molecular formula C43H52NO2): theoretical value C, 87.88;H,4.29;N,2.38,O,5.54;Test
Value: C, 87.85;H,5.52;N,2.36;O,5.56.ESI-MS(m/z)(M+): theoretical value 587.19, measured value are
587.68。
Embodiment 20: the synthesis of compound 229:
The preparation method is the same as that of Example 1 for compound 230, the difference is that raw material A 1 is replaced with raw material A 7, with raw material B15
Replace raw material B1.
Elemental analysis structure (molecular formula C81H52N4O): theoretical value C, 88.66;H,4.78;N,5.11;O,1.46;Test
Value: C, 88.67;H,4.79;N,5.09;O,1.45.ESI-MS(m/z)(M+): theoretical value 1096.41, measured value are
1096.94。
Embodiment 21: the synthesis of compound 234:
In the there-necked flask of 250ml, lead under nitrogen protection, 0.01mol raw material A 8,0.048mol carbazole, 150ml first is added
Benzene is stirred, then addition 0.06mol sodium tert-butoxide, and 1 × 10-4molPd2(dba)3, 1 × 10-4Mol tri-tert-butylphosphine, adds
Heat samples contact plate, display is without bromo-derivative residue, fully reacting to 105 DEG C, back flow reaction 24 hours;Cooled to room temperature, mistake
Filter, filtrate carry out vacuum rotary steam (- 0.09MPa, 85 DEG C), cross neutral silica gel column, obtain target product, HPLC purity 99.1%,
Yield 79.6%;
Elemental analysis structure (molecular formula C73H44N4O): theoretical value C, 88.28;H,4.47;N,5.64;O,1.61;Test
Value: C, 88.29;H,4.45;N,5.63;O,1.59.ESI-MS(m/z)(M+): theoretical value 992.35, measured value are
993.18。
This organic compound uses in luminescent device, has high glass transition temperature (Tg) and triplet
(T1), suitable HOMO, lumo energy act not only as hole transmission layer/electronic barrier layer materials'use, are alternatively arranged as sending out
Photosphere materials'use.Carry out hot property, T1 energy level and the test of HOMO energy level, knot respectively to the compounds of this invention and current material
Fruit is as shown in table 2.
Table 2
Note: triplet T1 is tested by the F4600 Fluorescence Spectrometer of Hitachi, and the test condition of material is 2*10-5's
Toluene solution;Glass transition temperature Tg is by differential scanning calorimetry (DSC, German Nai Chi company DSC204F1 differential scanning calorimeter)
Measurement, 10 DEG C/min of heating rate;Highest occupied molecular orbital HOMO energy level and minimum occupied molecular orbital lumo energy be by
Photoelectron emissions spectrometer (AC-2 type PESA) test, is tested as atmospheric environment.
By upper table data it is found that NPB, CBP and TPAC material that comparison is applied at present, organic compound of the invention have
High glass transition temperature can be improved the phase stability of membrane material, further increase device service life;Material of the present invention
While there is similar HOMO energy level with application material, also there is high triplet (T1), luminescent layer energy can be stopped
Amount loss, to promote device light emitting efficiency.Therefore, the organic material that the present invention contains xanthene fluorenes is being applied to OLED device
Different function layer after, the luminous efficiency and service life of device can be effectively improved.
Below by way of device embodiments 1~21 and device comparative example 1 OLED material that the present invention will be described in detail synthesizes in device
Application effect in part.Device embodiments 2~21 of the present invention, the device compared with device embodiments 1 of device comparative example 1
Manufacture craft it is identical, and use identical baseplate material and electrode material, the film thickness of electrode material is also kept
Unanimously, except that the emitting layer material in 1~12 pair of device of device embodiments converts;13~21 pairs of device embodiments
The hole transmission layer of device/electronic blocking layer material converts, the performance test results of each embodiment obtained device such as 3 institute of table
Show.
Device embodiments 1:
As shown in Figure 1, a kind of electroluminescent device, preparation step include:
A) the ito anode layer 2 on transparent substrate layer 1 is cleaned, cleans each 15 with deionized water, acetone, EtOH Sonicate respectively
Minute, then handled 2 minutes in plasma cleaner;
B) on ito anode layer 2, hole injection layer material HAT-CN is deposited by vacuum evaporation mode, with a thickness of 10nm,
This layer is as hole injection layer 3;
C) on hole injection layer 3, hole mobile material NPB is deposited by vacuum evaporation mode, with a thickness of 60nm, the layer
For hole transmission layer 4;
D) on hole transmission layer 4, electron-blocking materials TPAC is deposited by vacuum evaporation mode, it, should with a thickness of 20nm
Layer is electronic barrier layer 5;
E) luminescent layer 6 is deposited on electronic barrier layer 5, material of main part is 8 He of compound of preparation of the embodiment of the present invention
Compound GHN, dopant material are Ir (ppy)3, compound 8, GHN and Ir (ppy)3Three's mass ratio is 50:50:10, thickness
For 30nm;
F) on luminescent layer 6, electron transport material TPBI is deposited by vacuum evaporation mode, with a thickness of 40nm, this layer
Organic material is used as hole barrier/electron transfer layer 7;
G) on hole barrier/electron transfer layer 7, vacuum evaporation electron injecting layer LiF, with a thickness of 1nm, which is electricity
Sub- implanted layer 8;
H) on electron injecting layer 8, vacuum evaporation cathode Al (100nm), the layer is cathode reflection electrode layer 9;
After the production for completing electroluminescent device according to above-mentioned steps, the driving voltage of measurement device, current efficiency, knot
Fruit is shown in Table 3.The molecular structural formula of associated materials is as follows:
Device embodiments 2:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: the compound 15 and Ir (ppy) of preparation of the embodiment of the present invention3Constituted by weight 88:12 blending)/empty
Cave blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al is (thick
Degree: 100nm).
Device embodiments 3:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: the compound 23 and Ir (ppy) of preparation of the embodiment of the present invention3Constituted by weight 92:8 blending)/empty
Cave blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al is (thick
Degree: 100nm).
Device embodiments 4:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 80, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 70:30:10 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 5:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 104, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 60:40:10 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 6:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 108, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 40:60:10 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 7:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 121, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 30:70:10 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 8:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 133, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 50:50:8 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 9:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 138, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 50:50:12 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 10:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 147, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 50:50:10 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 11:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 189, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 50:50:10 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 12:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: compound 234, GHN and the Ir (ppy) of preparation of the embodiment of the present invention3By weight 50:50:10 blending
Constitute)/hole barrier/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material:
LiF)/Al (thickness: 100nm).
Device embodiments 13:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 16) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/hole
Blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al (thickness:
100nm)。
Device embodiments 14:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 40) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/hole
Blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al (thickness:
100nm)。
Device embodiments 15:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 46) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/hole
Blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al (thickness:
100nm)。
Device embodiments 16:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 60) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/hole
Blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al (thickness:
100nm)。
Device embodiments 17:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 65) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/hole
Blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al (thickness:
100nm)。
Device embodiments 18:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 68) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/hole
Blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al (thickness:
100nm)。
Device embodiments 19:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 154) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/empty
Cave blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al is (thick
Degree: 100nm).
Device embodiments 20:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 166) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/empty
Cave blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al is (thick
Degree: 100nm).
Device embodiments 21:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB) (thickness: 20nm, material: embodiment of the present invention system of/electronic barrier layer 5
Standby compound 229) (the thickness: 40nm, material: CBP and Ir (ppy) of/luminescent layer 63Constituted by weight 90:10 blending)/empty
Cave blocking/electron transfer layer 7 (thickness: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al is (thick
Degree: 100nm).
Device comparative example 1:ITO anode layer 2 (thickness: 150nm)/hole injection layer 3 (thickness: 10nm, material: HAT-
CN)/hole transmission layer 4 (thickness: 60nm, material: NPB)/electronic barrier layer 5 (thickness: 20nm, material: TAPC)/luminescent layer 6
(thickness: 40nm, material: CBP and Ir (ppy)3Constituted by weight 90:10 blending)/hole barrier/electron transfer layer 7 (thickness
Degree: 35nm, material: TPBI)/electron injecting layer 8 (thickness: 1nm, material: LiF)/Al (thickness: 100nm).Gained electroluminescent
The detection data of device is shown in Table 3.
Table 3
Number |
Current efficiency (cd/A) |
Color |
LT95 service life (Hr)@5000nits |
Device embodiments 1 |
53.1 |
Green light |
23.7 |
Device embodiments 2 |
48.7 |
Green light |
20.5 |
Device embodiments 3 |
46.9 |
Green light |
18.3 |
Device embodiments 4 |
56.1 |
Green light |
25.7 |
Device embodiments 5 |
54.7 |
Green light |
25.7 |
Device embodiments 6 |
53.5 |
Green light |
24.9 |
Device embodiments 7 |
53.3 |
Green light |
28.1 |
Device embodiments 8 |
51.2 |
Green light |
26.3 |
Device embodiments 9 |
54.7 |
Green light |
23.5 |
Device embodiments 10 |
53.9 |
Green light |
26.3 |
Device embodiments 11 |
52.3 |
Green light |
25.4 |
Device embodiments 12 |
53.5 |
Green light |
26.1 |
Device embodiments 13 |
41.2 |
Green light |
21.1 |
Device embodiments 14 |
43.1 |
Green light |
19.5 |
Device embodiments 15 |
40.3 |
Green light |
19.3 |
Device embodiments 16 |
43.5 |
Green light |
18.2 |
Device embodiments 17 |
40.3 |
Green light |
18.6 |
Device embodiments 18 |
39.7 |
Green light |
20.7 |
Device embodiments 19 |
42.5 |
Green light |
18.5 |
Device embodiments 20 |
41.3 |
Green light |
21.2 |
Device embodiments 21 |
41.6 |
Green light |
18.9 |
Device comparative example 1 |
32.5 |
Green light |
14.3 |
Organic compound of the present invention can be applied to the production of OLED luminescent device it can be seen from the result of table 3, and with than
It is compared compared with example, either efficiency or service life obtain larger change, the especially service life of device than known OLED material
Obtain biggish promotion.The OLED device of further material preparation of the present invention is able to maintain the long-life at high temperature, by device
In 85 DEG C of progress high temperature driven life tests, acquired results are as shown in table 4 for part Examples 1 to 20 and device comparative example 1.
Table 4
From the data of table 4 it is found that device embodiments 1~20 are the device architecture of material of the present invention and known materials collocation,
It is compared with device comparative example 1, under high temperature, OLED device provided by the invention has the driving service life well.
Work limitation rate is also more stable at low temperature for the OLED device of further material preparation of the present invention, by device reality
Example 2,8,12 and device comparative example 1 are applied in -10~80 DEG C of progress efficiency tests, acquired results are as shown in table 5, Fig. 2.
Table 5
From the data of table 5 it is found that device embodiments 2,8,12 are the device architecture of material of the present invention and known materials collocation,
It is compared with device comparative example 1, not only Efficiency at Low Temperature is high, but also in temperature elevation process, efficiency is steadily increased.
The foregoing is merely presently preferred embodiments of the present invention, is not intended to limit the invention, it is all in spirit of the invention and
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.