CN109545432B - Transparent conductive film, touch screen and preparation method thereof - Google Patents

Transparent conductive film, touch screen and preparation method thereof Download PDF

Info

Publication number
CN109545432B
CN109545432B CN201710863010.1A CN201710863010A CN109545432B CN 109545432 B CN109545432 B CN 109545432B CN 201710863010 A CN201710863010 A CN 201710863010A CN 109545432 B CN109545432 B CN 109545432B
Authority
CN
China
Prior art keywords
transparent conductive
layer
particles
optical adjustment
conductive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201710863010.1A
Other languages
Chinese (zh)
Other versions
CN109545432A (en
Inventor
喻文志
侯晓伟
黄伟庭
古荣治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangxi Xinfei New Material Co ltd
Jiangxi Zhanyao Microelectronics Co ltd
Original Assignee
Nanchang OFilm Display Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanchang OFilm Display Technology Co Ltd filed Critical Nanchang OFilm Display Technology Co Ltd
Priority to CN201710863010.1A priority Critical patent/CN109545432B/en
Publication of CN109545432A publication Critical patent/CN109545432A/en
Application granted granted Critical
Publication of CN109545432B publication Critical patent/CN109545432B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0236—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element
    • G02B5/0242—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place within the volume of the element by means of dispersed particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Abstract

The invention relates to a transparent conductive film, wherein particles form a plurality of bulges on the surface of a first metal layer and/or a second metal layer, so that the transparent conductive film has an anti-adhesion function. Further, the transparent conductive film does not include a hard coat layer, and the particles are located in the optical adjustment layer, as compared with the conventional conductive film. On one hand, the film layer structure can be reduced after the hard coating is omitted, so that the light shielding is reduced. On the other hand, the optical adjustment layer has the function of adjusting the optical effect, so that the refraction and scattering phenomena generated when the light passes through the particles in the optical adjustment layer are enhanced. Moreover, the particles are made of the same material as the optical adjustment layer, so that the particles and the optical adjustment layer are approximately integrated. When light passes through the optical adjustment layer containing particles, the distortion of the propagation path is small. Therefore, the whole light transmittance of the transparent conductive film is increased, so that the optical effect can be effectively improved. In addition, the invention also provides a touch screen and a preparation method thereof.

Description

Transparent conductive film, touch screen and preparation method thereof
Technical Field
The invention relates to the technical field of capacitive touch screens, in particular to a transparent conductive film, a touch screen and a preparation method thereof.
Background
The transparent conductive film is a core element of the capacitive touch screen. With the rapid development of intelligent terminals, the demand for transparent conductive thin films is increasing. The transparent conductive film generally includes a substrate, and a hard coating layer, a conductive layer and a metal layer disposed on both sides of the substrate. Currently, since amorphous polymer films have the advantage of having a lower birefringence and uniformity than crystalline polymer films, most transparent conductive films use a substrate formed of an amorphous polymer film.
Amorphous polymer films are more fragile than crystalline polymer films, and their surfaces are more susceptible to damage. When the transparent conductive film is rolled into a cylindrical shape, there is a problem that the metal layers of the adjacent transparent conductive films are stuck to each other and are pressure-bonded. Therefore, there has appeared a transparent conductive film in which particles are added to the hard coat layer to form projections on the surface of the metal layer. The protrusions allow the adjacent metal layers to form point contacts, thereby preventing adhesion and pressure welding.
However, after the particles are added to the hard coating, light passing through the hard coating is refracted, scattered and shielded, so that the overall transmittance of the conductive film is reduced, and the optical effect of the conductive film is poor.
Disclosure of Invention
Therefore, it is necessary to provide a transparent conductive film, a touch panel and a method for manufacturing the same, which can effectively improve the optical effect, for solving the problem that the existing transparent conductive film with an anti-blocking function has a poor optical effect.
A transparent conductive film comprising:
the substrate comprises a first surface and a second surface which are oppositely arranged;
a first optical adjustment layer, a first transparent conductive layer and a first metal layer which are sequentially formed on the first surface;
a second optical adjustment, a second transparent conductive layer and a second metal layer sequentially formed on the second surface;
the first optical adjustment layer and/or the second optical adjustment layer contain a plurality of particles so as to form a plurality of bulges on the surface of the first metal layer and/or the second metal layer;
the material of the particles is the same as that of the first optical adjustment layer and the second optical adjustment layer, and the particles are both organic.
Compared with the traditional conductive film, the transparent conductive film does not comprise a hard coating, and the particles are positioned in the optical adjusting layer (at least one of the first optical adjusting layer and the second optical adjusting layer). On one hand, the film layer structure can be reduced after the hard coating is omitted, so that the light shielding is reduced. On the other hand, the optical adjustment layer has the function of adjusting the optical effect, so that the refraction and scattering phenomena generated when the light passes through the particles in the optical adjustment layer are enhanced. Therefore, the whole light transmittance of the transparent conductive film is increased, so that the optical effect can be effectively improved.
Moreover, the structure of the film layer can be reduced after the hard coating is omitted from the transparent conductive film, so that the structure of the transparent conductive film is simplified. Therefore, the processing technology of the transparent conductive film is simplified and the cost is reduced.
Further, in the conventional conductive film, the hard coating layer may release moisture or organic solvent, thereby causing poor crystallinity and non-uniform sheet resistance of the conductive layer (e.g., ITO layer). The transparent conductive film does not comprise a hard coating, so that the amount of released water vapor or organic solvent is reduced, the crystallinity of the conductive layer can be improved, and the sheet resistance of the conductive layer is more uniform. And the brittleness of the transparent conductive film is reduced, and the processing performances of cutting and winding of the conductive film are greatly improved, so that the cracking of a large-piece material during punching can be effectively avoided.
In addition, since the particles are made of the same material as the first optical adjustment layer and the second optical adjustment layer (hereinafter collectively referred to as optical adjustment layers), the optical parameters of the particles and the optical adjustment layers are also the same. Therefore, at the interface where the particles and the optical adjustment layer are connected, the light propagation is less affected, and the particles and the optical adjustment layer are closer to a whole. When light passes through the optical adjustment layer containing particles, the distortion of the propagation path is small. Therefore, the transparent conductive film can achieve the purposes of adhesion resistance and bonding resistance, and can avoid the adverse effect on the optical performance.
In one embodiment, the plurality of particles are spaced from the surface of the substrate, and the particles have a particle size smaller than the thickness of a flat region, which is a region where the particles are not disposed in the first optical adjustment layer or the second optical adjustment layer.
In the conventional conductive film having the anti-blocking function, the particle diameter of the particles must be larger than the thickness of the hard coat layer to form the protrusions on the surface of the metal layer. Therefore, the particle size of the particles is limited by the thickness of the hard coat layer, and cannot be further reduced. However, the larger the particle diameter of the particles, the higher the haze value of the conductive thin film and the lower the light transmittance, which further affect the optical effect of the conductive thin film.
In the present embodiment, however, the particle diameter of the particles is smaller than the thickness of the optical adjustment layer. Therefore, the particle size of the particles is not limited by the thickness of the optical adjustment layer, and the particle size of the particles can be further reduced compared with the particle size of the particles in the existing anti-blocking conductive film, so that the haze value is reduced, the light transmittance is improved, and the optical effect is finally improved.
In one embodiment, the proportion of the particles in the first or second optical alignment layer is less than one-half of the proportion of the particles.
Since the particles are made of the same material as the optical adjustment layer, the adhesion of the particles in the optical adjustment layer is increased. Therefore, even if the portion of the particles embedded in the optical adjustment layer is less than half of the entire particles, the stability of particle adhesion is not impaired. The less the particles are embedded in the optical adjustment layer, the smaller the particle size of the particles is at the same protrusion height, so the less the particles can shield light, and the optical effect can be further improved.
In one embodiment, the thickness of the flat region is 45 to 145 nanometers.
Within this range, the optical adjustment layer has the best optical adjustment effect, and the optical effect of the transparent conductive film can be in the best state.
In one embodiment, the material of the particles is a silicone polymer or an acrylate polymer.
Above two kinds of materials are comparatively common and be convenient for acquire. Therefore, the particles and the optical adjustment layer made of the two materials are beneficial to reducing the cost.
In one embodiment, the substrate is a cyclic olefin polymer film.
Cycloolefin polymers (COPs) are novel amorphous polymer materials and have high hardness and excellent light transmittance. Therefore, by using COP material as the base material, the base material can have high hardness and good light transmittance.
In one embodiment, the distribution density of the protrusions is 100-3000/mm2。
When the distribution density of the protrusions is too high, the haze value of the transparent conductive film is too high, the light transmittance is reduced, and the appearance and the optical effect of the transparent conductive film are seriously affected. And if the distribution density of the protrusions is too small, the effect of blocking resistance is limited. Within the above density range, the transparent conductive film can preferably give consideration to both the anti-blocking property and the optical effect.
In one embodiment, the height of the plurality of protrusions is 0.1-0.5 μm in a direction perpendicular to the surface of the first metal layer and/or the second metal layer.
The higher the height of the protrusions, the better the anti-blocking effect. However, as the height increases, the size of the particles needs to be increased accordingly, so that the haze value of the transparent conductive film is increased accordingly, and the optical effect of the transparent conductive film is seriously affected to a certain extent. Within the height range, the transparent conductive film can better give consideration to both the anti-blocking effect and the optical effect.
A touch panel made of the transparent conductive film according to any one of the above preferred embodiments, the touch panel including a touch area and a lead area, the first metal layer and the second metal layer being located in the lead area; the touch area comprises a first electrode formed by etching the first transparent conductive layer and a second electrode formed by etching the second transparent conductive layer; the lead area comprises a first lead formed by etching the first metal layer and the first transparent conductive layer positioned in the lead area, and a second lead formed by etching the second metal layer and the second transparent conductive layer positioned in the lead area.
In the touch screen, the first lead and the second lead are obtained by directly etching the first metal layer, the second metal layer, the first transparent conductive layer and the second transparent conductive layer. Therefore, it is not necessary to form a lead wire electrically connected to the first electrode and the second electrode by a screen printing method. Compared with the traditional touch screen, the width of the electrode lead formed by the yellow light process can be further reduced due to no silk screen printing, so that the touch screen has a narrow frame.
A preparation method of a touch screen comprises the following steps:
providing a transparent conductive film as described in any of the preferred embodiments above;
etching the first metal layer and the second metal layer to expose the first transparent conductive layer and the second transparent conductive layer in the touch area and form a metal lead pattern in the lead area;
and etching the first transparent conductive layer and the second transparent conductive layer to form a first electrode and a second electrode which are positioned in a touch area, and forming a transparent lead pattern positioned in a lead area, wherein the metal lead pattern and the transparent lead pattern jointly form an electrode lead.
When the touch screen is prepared by adopting the method, the first metal layer, the second metal layer, the first transparent conducting layer and the second transparent conducting layer are directly etched, so that the first electrode, the second electrode and the electrode lead wire electrically connected with the first electrode and the second electrode can be obtained. Therefore, the lead wire does not need to be formed in a silk-screen printing mode, so that the process is effectively simplified, and the processing efficiency is improved. Moreover, the touch screen prepared by the method has a narrow frame.
Drawings
FIG. 1 is a schematic view of a laminated structure of a transparent conductive film according to a preferred embodiment of the present invention;
FIG. 2 is an enlarged view of a portion A of the transparent conductive film shown in FIG. 1;
FIG. 3 is a schematic view of a stacked structure of a transparent conductive film according to another embodiment of the present invention;
FIG. 4 is a schematic diagram of a stacked structure of a touch screen according to a preferred embodiment of the invention;
fig. 5 is a flowchart illustrating a method for manufacturing a touch screen according to a preferred embodiment of the invention.
Detailed Description
To facilitate an understanding of the invention, the invention will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present invention are shown in the drawings. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
Referring to fig. 1 and 2, a transparent conductive film 10 in a preferred embodiment of the invention includes a substrate 11, a first optical adjustment layer 12, a first transparent conductive layer 13, a first metal layer 14, a second optical adjustment layer 22, a second transparent conductive layer 23, and a second metal layer 24.
The substrate 11 includes a first surface (an upper surface shown in fig. 1) and a second surface (a lower surface shown in fig. 1) that are oppositely disposed. The first surface and the second surface are only used for distinguishing the two surfaces of the substrate 11, and the positions of the first surface and the second surface can be interchanged. The substrate 11 is formed of an amorphous polymer film. Since the amorphous polymer film has a smaller birefringence and is more uniform than the crystalline polymer film, color unevenness in the transparent conductive film 10 of the present invention can be eliminated. The in-plane birefringence of the amorphous polymer film used in the present invention is preferably 0 to 0.001, and more preferably 0 to 0.0005. The variation in-plane birefringence of the amorphous polymer film used in the present invention is preferably 0.0005 or less, and more preferably 0.0003 or less.
The birefringence and the variation thereof can be achieved by selecting an appropriate type of amorphous polymer film. The thickness of the substrate 11 formed of the amorphous polymer thin film is 20 μm to 200 μm.
The first optical adjustment layer 12, the first transparent conductive layer 13 and the first metal layer 14 are sequentially formed on the first surface of the substrate 11. The second optical adjustment layer 22, the second transparent conductive layer 23, and the second metal layer 24 are sequentially formed on the second surface of the substrate 11. Wherein:
the first optical adjustment layer 12 is used to improve the optical effect of the transparent conductive film 10. In the subsequent step, after patterning the first transparent conductive layer 13, the difference in reflectance between the portion of the first transparent conductive layer 13 and the portion without the first transparent conductive layer 13 is reduced, and the pattern of the first transparent conductive layer 13 is made invisible.
In addition, the first optical adjustment layer 12 is also used to improve the refraction of light passing through different film structures. The refractive index of the first optical adjustment layer 12 is preferably set to a value between the refractive index of the base material 11 and the refractive index of the first transparent conductive layer 13. Therefore, the transition effect can be realized on the propagation path of the light. The material forming the first optical adjustment layer 12 is, for example, a coating layer of one or more of silicone polymer, acrylate polymer, aromatic ring or naphthalene ring polymer, zirconia, titania, and antimony oxide.
The first transparent conductive layer 13 is formed on the surface of the first optical adjustment layer 12. The first transparent conductive layer 13 has a high transmittance (80% or more) in the visible light region (380nm to 780nm) and a surface resistance value per unit area (unit: Ω/m)2) Is 500 omega/m2The following layers are formed. The thickness of the first transparent conductive layer 13 is preferably 15nm to 100nm, more preferably 15nm to 50 nm. The first transparent conductive layer 13 is formed of, for example, any one of Indium Tin Oxide (ITO), indium tin oxide, or an indium oxide-zinc oxide composite.
The first metal layer 14 is formed on the surface of the first transparent conductive layer 13. The first metal layer 14 is used to form a wiring outside the touch input region when the transparent conductive film of the present invention is used in, for example, a touch panel. As the material for forming the first metal layer 15, copper and silver are representative, and any metal having excellent conductivity other than these may be used. The thickness of the first metal layer 14 is preferably 50nm to 500nm, more preferably 100nm to 300 nm.
Further, the second optical adjustment layer 22, the second transparent conductive layer 23 and the second metal layer 24 have the same film structure, function and physical properties as the first optical adjustment layer 12, the first transparent conductive layer 13 and the first metal layer 14, respectively, and therefore, the description thereof is omitted.
In addition, the first optical adjustment layer 12 and/or the second optical adjustment layer 22 contain a plurality of particles 15 to form a plurality of protrusions 16 on the surface of the first metal layer 14 and/or the second metal layer 24. The material of the particles 15 is the same as the material of the first optical adjustment layer 12 and the second optical adjustment layer 22, and both are organic materials.
In particular, the particles 15 may be randomly, or may be distributed within the first optical adjustment layer 12 and/or the second optical adjustment layer 22 in a predetermined regular (e.g., uniform) manner. The particles 15 may be spherical particles or amorphous particles. The particle diameter, i.e. the diameter, of the particles 15 when they are spherical; and the particle diameter of the particle 15, when the particle 15 is an amorphous particle, refers to an arithmetic average of the sizes of the particle 15 in a plurality of predetermined directions. Wherein, the particles 15 can be contained only in the first optical adjustment layer 12 or the second optical adjustment layer 22, thereby obtaining the transparent conductive film 10 with the protrusions 16 formed on one side; the particles 15 may be contained in both the first optical adjustment layer 12 and the second optical adjustment layer 22, thereby obtaining the transparent conductive film 10 having the protrusions 16 formed on both surfaces.
The first optical adjustment layer 12 is taken as an example for explanation:
the particles 15 protrude from the surface of the first optical adjustment layer 12 such that the surface of the first optical adjustment layer 12 forms a convex region, and the region of the first optical adjustment layer 12 not provided with the particles 15 forms a flat region 17. Since the first transparent conductive layer 13 and the first metal layer 14 are sequentially stacked on the surface of the first optical adjustment layer 12, the surface shapes of the two layers are the same as the surface shape of the first optical adjustment layer 12. Therefore, a plurality of protrusions 16 are formed in the first metal layer 14 in the regions corresponding to the particles 14.
Similarly, when the second optical adjustment layer 22 contains the particles 15, the surface of the second metal layer 24 may also form a plurality of protrusions 16.
When the transparent conductive film 10 is manufactured in a roll-to-roll process, the plurality of protrusions 16 are formed on the surface of the first metal layer 14 and/or the second metal layer 24 due to the particles 15. Therefore, when the transparent conductive film 10 is rolled, the plurality of protrusions 16 can form point contact between two adjacent metal layers, thereby preventing adhesion and pressure contact between the metal layers.
In contrast to conventional conductive films, the transparent conductive film 10 does not include a hard coat layer, and the particles 15 are located in the optical adjustment layer (at least one of the first optical adjustment layer 12 and the second optical adjustment layer 22). On one hand, the film layer structure can be reduced after the hard coating is omitted, so that the light shielding is reduced. Moreover, the structure is simplified, which is beneficial to simplifying the process and reducing the cost. On the other hand, the optical adjustment layer itself has the function of adjusting the optical effect, so that the refraction and scattering phenomena generated when the light passes through the particles 15 in the optical adjustment layer are enhanced.
Further, in the conventional conductive film, the hard coating layer may release moisture or organic solvent, thereby causing poor crystallinity and non-uniform sheet resistance of the conductive layer (e.g., ITO layer). The transparent conductive film 10 of the present invention does not include a hard coat layer, and thus, the amount of water vapor or organic solvent released is reduced, thereby improving the crystallinity of the conductive layer and making the sheet resistance thereof more uniform. In addition, the brittleness of the transparent conductive film 10 is reduced, and the processing performance of cutting and winding the conductive film is greatly improved, so that the cracking of a large-piece material during punching can be effectively avoided.
In addition, since the particles 15 are made of the same material as the first optical adjustment layer 12 and the second optical adjustment layer 22 (hereinafter collectively referred to as optical adjustment layers), the optical parameters of the particles 15 and the optical adjustment layers are also the same. Therefore, at the interface of the particles 15 and the optical adjustment layer, the light propagation is less affected, and the particles 15 and the optical adjustment layer are closer to a whole. The light rays have less distortion in their propagation path as they pass through the optical adjustment layer containing the particles 15. Therefore, the transparent conductive film 10 can prevent the optical properties from being adversely affected while achieving the anti-blocking and anti-bonding purposes.
Specifically, in this embodiment, the material of the particles 15 is a silicone polymer or an acrylate polymer.
Since the material of the particles is the same as that of the optical adjustment layer, the material of the first optical adjustment layer 12 and the second optical adjustment layer 22 is also a silicone-based polymer or an acrylic-based polymer. Above two kinds of materials are comparatively common and be convenient for acquire. Therefore, the optical adjustment layer, which is particles made of the two materials, can be beneficial to reducing the cost.
In the present embodiment, the substrate 11 is a cycloolefin polymer film.
Cycloolefin polymers (COPs) are novel amorphous polymer materials and have high hardness and excellent light transmittance. Therefore, by forming the substrate 11 from a COP material, the substrate 11 can have high hardness and excellent light transmittance.
In the present embodiment, the first optical adjustment layer 12 and the second optical adjustment layer 22 both contain particles 15, so that a plurality of protrusions 16 are formed on the surfaces of the first metal layer 14 and the second metal layer 24.
That is, the plurality of protrusions 16 are formed on both surfaces of the obtained transparent conductive film 10. Therefore, when the transparent conductive film 10 is rolled, the number of points of point contact between two adjacent metal layers increases, and therefore the effects of blocking resistance and pressure resistance are more excellent.
Referring to fig. 3, in another embodiment, either the first optical adjustment layer 12 or the second optical adjustment layer 22 contains particles 15, such that a plurality of protrusions 16 are formed on the surface of the first metal layer 14 or the second metal layer 24.
That is, the obtained transparent conductive film 10 has a plurality of bumps 16 formed on only one surface. Therefore, the adhesion resistance and the compression resistance are achieved, and meanwhile, the shadows of the two layers of particles 15 can be prevented from being superposed with each other, so that the haze is reduced, and the optical effect of the transparent conductive film 10 is further improved.
In the present embodiment, a plurality of particles 15 are spaced from the surface of the substrate 11, and the particle diameter of the particles 15 is smaller than the thickness of the flat region 17. The flat region 17 is a region where the first optical adjustment 12 or the second optical adjustment layer 22 is not provided with particles 15.
In the conventional conductive film having the anti-blocking function, the particle diameter of the particles must be larger than the thickness of the hard coat layer to form the protrusions on the surface of the metal layer. Therefore, the particle size of the particles is limited by the thickness of the hard coat layer, and cannot be further reduced. However, the larger the particle diameter of the particles, the higher the haze value of the conductive thin film and the lower the light transmittance, which further affect the optical effect of the conductive thin film.
In this embodiment, the particle diameter of the particles 15 is smaller than the thickness of the optical adjustment layer. Therefore, the particle diameter of the particles 15 is not limited by the thickness of the optical adjustment layer, and the particle diameter of the particles 15 can be further reduced compared with the particle diameter of the particles in the existing anti-blocking conductive film, so as to further reduce the haze value, improve the light transmittance, and finally improve the optical effect.
In the present embodiment in particular, the proportion of the particles 15 in the first optical adjustment layer 12 or the second optical adjustment layer 22 is less than one-half of the proportion of the particles 15.
Since the particles 15 are made of the same material as the optical adjustment layer, the adhesion of the particles 15 in the optical adjustment layer is increased. Therefore, even if the portion of the particles 15 embedded in the optical adjustment layer is less than half of the entire particles 15, the stability of the adhesion of the particles 15 is not impaired. Further, the less the portion of the particles 15 embedded in the optical adjustment layer, the smaller the particle diameter of the particles 15 at the same protrusion height. The smaller the particle size, the less the light-shielding effect of the particles 15. Therefore, the optical effect of the transparent conductive film 10 can be further improved.
Further, in this embodiment, the particles 15 are spherical or ellipsoidal.
The spherical or ellipsoidal particles 15 have a smooth outer surface. Accordingly, the outer surface of the formed protrusion 16 is also smooth. When the bumps 16 form point supports to prevent sticking, the surfaces of the bumps 16 abut the metal layer, and the bumps 16 having smooth outer surfaces can avoid damaging the metal layer. In addition, when light passes through the particles 15 having smooth outer surfaces, the optical path deformation caused by refraction and scattering is small, so that the optical performance of the transparent conductive film 10 can be further improved.
In the present embodiment, the thickness of the flat region 17 is 45 to 145 nm.
As previously mentioned, the flat region 17 is a region where the first optical adjustment layer 12 or the second optical adjustment layer 22 is not provided with particles 15. Within this range, the optical adjustment effect of the optical adjustment layer is the best, and the optical effect of the transparent conductive film 10 can be made the best.
In order to achieve better anti-blocking and anti-welding effects, there is a corresponding requirement for the density of the protrusions 16.
In the present embodiment, the distribution density of the protrusions 16 is 100 to 3000 protrusions/mm2。
When the distribution density of the protrusions 16 is too high, the haze value of the transparent conductive film 10 is too high, and the light transmittance is lowered, thereby seriously affecting the appearance and the optical effect of the transparent conductive film 10. Whereas if the distribution density of the protrusions 16 is too small, the effect of blocking resistance is limited. Within the above density range, the transparent conductive film 10 can preferably achieve both the anti-blocking effect and the optical effect.
Wherein, the distribution density of the projections 16 can be changed by adjusting the shape, size and content of the particles 15.
Further, in the present embodiment, the height of the plurality of protrusions 16 is 0.1 to 0.5 μm in a direction perpendicular to the surface of the first metal layer 14 and/or the second metal layer 24.
The height of the bump 16 refers to the height of the bump 16 protruding from the surface of the first metal layer 14 and/or the second metal layer 24. Because of the small size of the particles 15, it is difficult to precisely control the height of each protrusion 16. Therefore, the height of the projection 16 may be controlled within the above height range. It should be noted that, in actual production, since it is difficult to accurately control each particle 15, it is difficult to avoid that the height of the projection 16 formed by a very small portion of the particle 15 is outside the above range. However, the effect of the portion of the projection 16 is negligible.
In general, the higher the height of the protrusions 16, the better the anti-blocking effect. However, as the height increases, the size of the particles 15 needs to be increased, so that the haze value of the transparent conductive film 10 is increased, and the optical effect of the transparent conductive film 10 is seriously affected to a certain extent. Within the above height range, the transparent conductive film 10 can achieve both the anti-blocking effect and the optical effect.
In the transparent conductive film 10, the particles 15 form a plurality of protrusions 16 on the surface of the first metal layer 14 and/or the second metal layer 24, so that the transparent conductive film 10 has an anti-blocking function. Further, the transparent conductive film 10 does not include a hard coat layer, and the particles 15 are located in the optical adjustment layer, as compared with the existing conductive film. On one hand, the film layer structure can be reduced after the hard coating is omitted, so that the light shielding is reduced. On the other hand, the optical adjustment layer itself has the function of adjusting the optical effect, so that the refraction and scattering phenomena generated when the light passes through the particles 15 in the optical adjustment layer are enhanced. The particles 15 are made of the same material as the optical adjustment layer, and the particles 15 are integrated with the optical adjustment layer. The light rays have less distortion in their propagation path as they pass through the optical adjustment layer containing the particles 15. Therefore, the overall light transmittance of the transparent conductive film 10 is increased, so that the optical effect can be effectively improved.
In addition, the invention also provides a touch screen. Referring to fig. 4, the touch panel 200 of the preferred embodiment of the invention is made of the transparent conductive film 10 of the above embodiment. Wherein:
touch screen 200 includes a touch area 210 and a lead area 220. Specifically, the touch area 210 is located in the middle of the touch screen 200, and the lead area 220 is disposed around the circumference of the touch area 210. The first metal layer 14 and the second metal layer 24 are located in the lead area 220.
The touch area 210 includes a first electrode 211 and a second electrode 212. Wherein, the first electrode 211 is formed by etching the first transparent conductive layer 13; the second electrode 212 is etched from the second transparent conductive layer 23. The first electrode 211 and the second electrode 212 are etched into electrode patterns. Specifically, the electrode pattern is generally in the shape of a long strip and is vertically intersected to form a grid, and the first electrode 211 and the second electrode 212 which are opposite to each other form two poles of a capacitor structure.
The lead region 220 includes a first lead 221 and a second lead 222. The first lead 221 is formed by etching the first metal layer 14 and the first transparent conductive layer 13 in the lead area 220; the second lead 222 is formed by etching the second metal layer 24 and the second transparent conductive layer 23 located in the lead region 220. The first and second wires 221 and 222 are of a double-layered structure, and thus are electrically connected to the first and second electrodes 211 and 212.
In the touch panel, the first lead 221 and the second lead 222 are directly etched from the first metal layer 14, the second metal layer 24, the first transparent conductive layer 13 and the second transparent conductive layer 23. Therefore, the width of the electrode lead formed by the yellow light process can be further reduced without silk printing, so that the touch screen has a narrow frame.
Referring to fig. 5, the present invention further provides a method for manufacturing a touch panel, including steps S310 to S330:
step S310: a transparent conductive film is provided.
Specifically, the transparent conductive film is the transparent conductive film 100 in the above embodiment, and includes a first transparent conductive layer 13 and a first metal layer 14, which are stacked, and a second transparent conductive layer 23 and a second metal layer 24, which are stacked.
Step S320: etching the first metal layer 14 and the second metal layer 24 to expose the first transparent conductive layer 13 and the second transparent conductive layer 23 in the touch area and form a metal lead pattern in the lead area
Specifically, a metal lead pattern can be formed on the surface of the metal layer by a yellow light process. The metal lead patterns are arranged along the edge of the touch screen. After the metal layer is etched, the first transparent conductive layer 13 and the second transparent conductive layer 24 under the metal layer are partially exposed.
Step S330, etching the first transparent conductive layer 13 and the second transparent conductive layer 23 to form the first electrode 211 and the second electrode 212 in the touch area, and forming a transparent lead pattern in the lead area, wherein the metal lead pattern and the transparent lead pattern together form an electrode lead.
Specifically, another photolithography process is used to etch the exposed portions of the first transparent conductive layer 13 and the second transparent conductive layer 24 to form electrode patterns, so as to obtain the first electrode 211 and the second electrode 212. Meanwhile, the first metal layer 14 and the second metal layer 24 in the metal lead pattern are respectively overlapped with the first transparent conductive layer 13 and the second transparent conductive layer 23 in the lead region, thereby forming the first lead 221 and the second lead 222 in a double-layer structure. The first and second leads 221 and 222 are electrically connected to the first and second electrodes 211 and 212, respectively.
When the touch screen is manufactured by the method, the first metal layer 14, the second metal layer 24, the first transparent conductive layer 13 and the second transparent conductive layer 23 are directly etched, so that the first electrode 211, the second electrode 212, and the first lead 221 and the second lead 222 electrically connected with the first electrode 211 and the second electrode 212 can be obtained. Therefore, the lead wire does not need to be formed in a silk-screen printing mode, so that the process is effectively simplified, and the processing efficiency is improved. Moreover, the touch screen prepared by the method has a narrow frame.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (8)

1. A transparent conductive film comprising:
the substrate comprises a first surface and a second surface which are oppositely arranged;
a first optical adjustment layer, a first transparent conductive layer and a first metal layer which are sequentially formed on the first surface;
a second optical adjustment, a second transparent conductive layer and a second metal layer sequentially formed on the second surface;
the first optical adjustment layer and/or the second optical adjustment layer contain a plurality of particles so as to form a plurality of bulges on the surface of the first metal layer and/or the second metal layer;
the material of the particles is the same as that of the first optical adjustment layer and the second optical adjustment layer, the particles are both organic, intervals exist between the particles and the surface of the substrate, the particle size of the particles is smaller than the thickness of a flat area, the flat area is an area where the particles are not arranged on the first optical adjustment layer or the second optical adjustment layer, and the proportion of the particles in the first optical adjustment layer or the second optical adjustment layer is smaller than one half.
2. The transparent conductive film of claim 1, wherein the flat region has a thickness of 45 to 145 nanometers.
3. The transparent conductive film according to claim 1, wherein the material of the particles is a silicone polymer or an acrylate polymer.
4. The transparent conductive film according to claim 1, wherein the substrate is a cycloolefin polymer film.
5. The transparent conductive film according to claim 1, wherein the distribution density of the protrusions is 100 to 3000/mm2。
6. The transparent conductive film according to claim 1, wherein the plurality of protrusions have a height of 0.1 to 0.5 μm in a direction perpendicular to a surface of the first metal layer and/or the second metal layer.
7. A touch panel made of the transparent conductive film according to any one of claims 1 to 6, the touch panel including a touch area and a lead area, the first metal layer and the second metal layer being located in the lead area; the touch area comprises a first electrode formed by etching the first transparent conductive layer and a second electrode formed by etching the second transparent conductive layer; the lead area comprises a first lead formed by etching the first metal layer and the first transparent conductive layer positioned in the lead area, and a second lead formed by etching the second metal layer and the second transparent conductive layer positioned in the lead area.
8. A preparation method of a touch screen is characterized by comprising the following steps:
providing a transparent conductive film according to any one of claims 1 to 6;
etching the first metal layer and the second metal layer to expose the first transparent conductive layer and the second transparent conductive layer in the touch area and form a metal lead pattern in the lead area;
and etching the first transparent conductive layer and the second transparent conductive layer to form a first electrode and a second electrode which are positioned in a touch area, and forming a transparent lead pattern positioned in a lead area, wherein the metal lead pattern and the transparent lead pattern jointly form an electrode lead.
CN201710863010.1A 2017-09-22 2017-09-22 Transparent conductive film, touch screen and preparation method thereof Active CN109545432B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710863010.1A CN109545432B (en) 2017-09-22 2017-09-22 Transparent conductive film, touch screen and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710863010.1A CN109545432B (en) 2017-09-22 2017-09-22 Transparent conductive film, touch screen and preparation method thereof

Publications (2)

Publication Number Publication Date
CN109545432A CN109545432A (en) 2019-03-29
CN109545432B true CN109545432B (en) 2021-08-10

Family

ID=65828222

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710863010.1A Active CN109545432B (en) 2017-09-22 2017-09-22 Transparent conductive film, touch screen and preparation method thereof

Country Status (1)

Country Link
CN (1) CN109545432B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104290407A (en) * 2013-05-22 2015-01-21 日东电工株式会社 Double-sided transparent conductive film and touch panel
CN104407734A (en) * 2014-11-04 2015-03-11 苏州欧菲光科技有限公司 Manufacturing method for touch screen and touch screen
CN106782772A (en) * 2016-12-19 2017-05-31 南昌欧菲显示科技有限公司 Transparent conductive film
CN106843610A (en) * 2016-12-19 2017-06-13 南昌欧菲显示科技有限公司 Transparent conducting film
JP2017122992A (en) * 2016-01-05 2017-07-13 日東電工株式会社 Transparent conductive film

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104290407A (en) * 2013-05-22 2015-01-21 日东电工株式会社 Double-sided transparent conductive film and touch panel
CN104407734A (en) * 2014-11-04 2015-03-11 苏州欧菲光科技有限公司 Manufacturing method for touch screen and touch screen
JP2017122992A (en) * 2016-01-05 2017-07-13 日東電工株式会社 Transparent conductive film
CN106782772A (en) * 2016-12-19 2017-05-31 南昌欧菲显示科技有限公司 Transparent conductive film
CN106843610A (en) * 2016-12-19 2017-06-13 南昌欧菲显示科技有限公司 Transparent conducting film

Also Published As

Publication number Publication date
CN109545432A (en) 2019-03-29

Similar Documents

Publication Publication Date Title
TWI503875B (en) Patterned transparent conductive film
US20140353003A1 (en) Touch-screen conductive film and manufacturing method thereof
JP2014191465A (en) Electrode substrate for touch panel, touch panel, and image display device
US9538654B2 (en) Conductive film, method for manufacturing the same, and touch screen including the same
CN111699461A (en) Transparent electrode member, laminated transparent electrode member, and capacitance sensor
CN109545432B (en) Transparent conductive film, touch screen and preparation method thereof
CN109545437B (en) Transparent conductive film, touch screen and preparation method thereof
US9089061B2 (en) Conductive film, method for making the same, and touch screen including the same
CN207458607U (en) Transparent conducting film and touch screen
CN207458611U (en) Transparent conducting film and touch screen
CN109545445A (en) Transparent conductive film, touch screen and preparation method thereof
CN109656414A (en) Touch panel unit, the preparation method of touch panel unit and touching device
WO2018018890A1 (en) Touch control screen and manufacturing method thereof, and touch control display device
CN109545429A (en) Transparent conductive film, touch screen and preparation method thereof
CN207458606U (en) Transparent conducting film and touch screen
CN109545430A (en) Transparent conductive film, touch screen and preparation method thereof
CN109545428A (en) Transparent conductive film, touch screen and preparation method thereof
CN109545444A (en) Transparent conductive film, touch screen and preparation method thereof
US10739921B2 (en) Transparent conductive film, touch screen and manufacturing method thereof
CN109545442A (en) Transparent conductive film, touch screen and preparation method thereof
TWI684519B (en) Composite conductive material
CN109545439A (en) Transparent conductive film, touch screen and preparation method thereof
CN207458610U (en) Transparent conducting film and touch screen
CN109545446A (en) Transparent conductive film, touch screen and preparation method thereof
CN109545447A (en) Transparent conductive film, touch screen and preparation method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: Room 422, 4th floor, building 1, Linrui youth apartment, 955 rulehu street, Airport Economic Zone, Nanchang City, Jiangxi Province 330000

Patentee after: Jiangxi zhanyao Microelectronics Co.,Ltd.

Address before: 330100, two / F, office building, Nanchang, Jiangxi.

Patentee before: NANCHAGN OFILM DISPLAY TECHNOLOGY Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20220513

Address after: Room 1020, 2nd floor, Yangke Road, Xinchang District, Xinjiang District, Jiangxi Province

Patentee after: Jiangxi Xinfei New Material Co.,Ltd.

Address before: Room 422, 4th floor, building 1, Linrui youth apartment, 955 rulehu street, Airport Economic Zone, Nanchang City, Jiangxi Province 330000

Patentee before: Jiangxi zhanyao Microelectronics Co.,Ltd.