CN109521643A - A kind of manufacturing method of Nano-imprinting materials - Google Patents
A kind of manufacturing method of Nano-imprinting materials Download PDFInfo
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- CN109521643A CN109521643A CN201811393941.0A CN201811393941A CN109521643A CN 109521643 A CN109521643 A CN 109521643A CN 201811393941 A CN201811393941 A CN 201811393941A CN 109521643 A CN109521643 A CN 109521643A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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Abstract
The present invention relates to a kind of manufacturing methods of Nano-imprinting materials, using at high temperature with heat resistance and the high polyflon or polyimide resin stretched, Nano-imprinting materials obtained can solidify at a high temperature of 230~280 DEG C, in addition, also having the performances such as excellent hardness, wear-resistant and solvent resistance.
Description
Technical field
The present invention relates to Material Fields, and in particular, to a kind of manufacturing method of Nano-imprinting materials.
Background technique
In the prior art, there are performance difficulty points for the additional nano impression of magnalium plate (NIL), for example, protecting in high temperature punching press
Cuticula can shrink or melt because heated, secondly, Nano-imprinting materials are limited only to photocuring technology.
As shown in Figure 1, existing solution party is (to carry film as protection membrane material using acrylic acid series or polyester based resin
11), then applied/coating release agent 12, nano-imprinted layers (NIL layers) the 13, (gold if necessary of ink layer (pattern layer) 14
Belong to texture, be coated with one layer of deposit metal films layer 15), it is finally covered with one layer of adhesion layer 16 again, and mould material is put into work
In the cooperating equipment of part, heating is vacuumized, and combines adhesion layer with workpiece (substrate 17), after vacuum to be taken off, outer layer
OMR layers can automatically strip, and pass through ultraviolet light irradiation, and material is made to can have the appearances such as various characteristic patterns.
NIL scheme used at present is only suitable for the processing of material in the case where room temperature or not high temperature, still
Once encountering the pyroprocessing temperature such as magnesium alloy, these protections membrane materials the problems such as will shrinking or melting.
Secondly, used NIL material also will receive pyroprocessing temperature influence, so the heat/light being commonly used at present
Nano-imprinting materials need further improvement, to avoid the influence for causing a series of subsequent tests.
Summary of the invention
[technical problem]
In view of the above-mentioned problems, the inventors discovered that, using at high temperature with heat resistance and the high protection membrane material stretched, example
Such as, thus polytetrafluoroethylene (PTFE) (PTFE) resin or polyimides (Polyimide) resin, can effectively solve the above problems, and
It can be using the application mode of the integrated Nano-imprinting materials such as light/light, light heat and hot hot.
[technical solution]
Therefore, for Nano-imprinting materials and sticking together being influenced by the hot high temperature that may be subjected to for layer material, the present invention
Provide a kind of manufacturing method of Nano-imprinting materials comprising following steps:
(1) it is to carry film with tetrafluoroethene or polyimide resin layer, carries out texture coining；
(2) one layer of mould release is coated on the carrying film；
(3) the epoxysilicone resin of liquid is coated in the parting agent layer of step (2)；
(4) it is irradiated by light and solidifies the epoxysilicone resin portion of step (3)；
(5) decide whether successively to give different coloured patterns and sedimentary according to demand；
(6) after step (5), be coated with alkoxy silane coupling agent, with help that step (5) obtains stack material with plus
Work magnesium metal aluminium plate part is closely sealed；
(7) plate for obtaining step (6) receives continuous preheating, sizing and stamping procedure more than once；
(8) after the workpiece that step (7) obtains is cooling, the tetrafluoroethene on surface or polyimide resin layer is carried into film and torn
From；And
(9) it carries out second by the workpiece that heating or light irradiation obtain step (8) to solidify, to form nano impression
Layer.
In above-mentioned steps (1), the substrate that the tetrafluoroethene or polyimide resin layer can be used as nano impression is protected
Protective material, both materials belong to the splendid protective layer of heat-resistant quality.
In addition, in above-mentioned steps (2), the mould release is polyacrylic acid or silica type mould release, so as to form from
Type layer (release layer).Alternatively, the present invention can also be directly using the low surface tension for carrying film without additionally adding
Add release layer.
In above-mentioned steps (3), the epoxysilicone resin has the epoxy group of at least two or 2 or more, thus
It can be anti-with the curing agent such as amido, acid anhydrides, polyamide, boron trifluoride-amine compound, dicyandiamide and cyanate respectively
It answers.In addition, the epoxysilicone resin also has acrylate group, in order to carry out photocuring reaction.
In above-mentioned steps (4), the epoxysilicone resin portion solidifies the nanometer pressure that will form semi-cured state
Print layer.
In addition, when needing, the present invention may further include the table in the nano-imprinted layers in above-mentioned steps (5)
Face coats the step of one or more layers coat of colo(u)r, i.e., the described color pattern is formed by coating one or more layers coat of colo(u)r.With
And when needing, the present invention further comprises being coated with physical or chemically metallic luster film after the coat of colo(u)r is dry
The step of sedimentary, to show metal-like.
In above-mentioned steps (6), in the nano-imprinted layers coat alkoxy silane coupling agent be in order to metalwork,
As magnesium alloy is closely closely sealed.Later, plate is made to receive continuous preheating, sizing and stamping procedure more than once, by institute
It states tetrafluoroethene or polyimide resin layer removes, and the nano-imprinted layers exposed are solidified.
In addition, the present invention also provides one kind Nano-imprinting materials as made from above-mentioned manufacturing method.
[beneficial effect]
Nano-imprinting materials made from manufacturing method according to the invention can solidify at a high temperature of 230~280 DEG C, this
Outside, also there are the performances such as excellent hardness, wear-resistant and solvent resistance.
Detailed description of the invention
Fig. 1 is the structure of Nano-imprinting materials.
[appended drawing reference]
11, film is carried, with W (or not having W/O) pattern
12, mould release
13, NIL layers (transparent)
14, pattern layer
15, sedimentary
16, adhesion layer
17, substrate
Specific embodiment
Hereinafter, preferred embodiment is provided to more fully understand the present invention.However, these embodiments are only used for
Improving eyesight, and the present invention is not intended to be limited to these embodiments.
Referring to Fig.1, an embodiment of the invention provides a kind of manufacturing method of Nano-imprinting materials comprising:
To be to carry film 11 with heat resistance and the high tetrafluoroethene stretched or polyimide resin layer, texture coining is carried out；It is carrying
One layer of mould release 12 is coated on film 11；Coat the epoxysilicone resin of liquid；It is irradiated by light by epoxysilicone resin portion
Divide solidification；Decide whether successively to give different coloured patterns layer 14 and sedimentary 15 according to demand；It is even to be coated with alkoxy silane
Mixture is closely sealed to help to stack material and processing magnesium metal aluminium plate part (substrate 17) as adhesion layer 16；Plate is set to receive company
Continuous preheating, sizing and stamping procedure more than once；After cooling, by the tetrafluoroethene or polyimide resin layer of plate surface
Film is carried to tear off；And workpiece is carried out second by heating or light irradiation and is solidified, i.e., by partially cured epoxysilicone
Resin further solidifies, to form nano-imprinted layers (NIL layers) 13.
Wherein, the epoxysilicone resin can have hardening double mode, i.e. 1) hot (low temperature)/hot (high temperature) solidification；2)
Heat (low temperature)/UV solidification；Or 3) UV (low energy)/UV (high-energy) solidification.
In addition, in the examples below, having ignored the addition of coat of colo(u)r and metallic luster thin film deposition layer, but this and unawareness
Taste can not add above-mentioned layer.
Embodiment 1 (heat/light type)
Polyimide resin layer (38.1 μ of thickness is formed using the 150FN019 of Du Pont's kapton (DuPont Kapton)
M), polyacrylic acid coating mould release is 1 minute dry at 60 DEG C later to form release layer on it.Then, it is coated with scraper
(it is by 80~120 parts by weight of epoxysilicone pre-polymerization resin, activity for the epoxysilicone pre-polymerization resin of the hot light-cured type of liquid
10~30 parts by weight of diluent, 2~5 parts by weight of light initiator and 5~20 parts by weight group of curing agent reacted with epoxy group
At) about 10~15 μm of thickness, it is dried 2 minutes at 120 DEG C later.Then, alkoxy silane coupling agent is coated on it
(XIAMETER OFS-6075, DOW CORNING (Dow Coring) company).
Nano-imprinting materials achieved above are bonded with magnesium alloy plate.Put the workpiece in 230~280 DEG C of mold
In, it can be bonded in the punching course together to multiple tracks with alkoxy silane coupling agent with subalkaline magnesium alloy,
And the reason in the Kapton of the Nano-imprinting materials top side because being coated with mould release and low surface tension, therefore most
It can be dialled after the completion of punching press afterwards from removing.At this point, solidifying to nano surface impression materials, that is, it is placed on 1000mJ/cm2's
It is irradiated under light.
Embodiment 2 (light/light type)
By PTFE resin layer (model HAT-F08,80 μm of thickness) surface with sided corona treatment, on it polyacrylic acid coating from
Type agent is 1 minute dry at 60 DEG C later to form release layer.Then, with the epoxy of the light light-cured type of scraper coating liquid
(it is by epoxysilicone -2~5 parts by weight of acrylic acid pre-polymerization resin, six functional group's aromatic series for silicone-acrylic pre-polymerization resin
88.5~93.8 parts by weight of 4~6 parts by weight of acrylate monomer, 0.2~0.5 parts by weight of light initiator and methyl methacrylate
Composition) about 10~15 μm of thickness, and with ultraviolet light (energy 100mJ/cm2) irradiation, it causes partially cured, then coats on it
Alkoxy silane coupling agent (Z-6300, Dow Corning Corporation).
Nano-imprinting materials achieved above are bonded with magnesium alloy plate.Put the workpiece in 230~280 DEG C of mold
In, it can be bonded in the punching course together to multiple tracks with alkoxy silane coupling agent with subalkaline magnesium alloy,
And the reason in the polytetrafluoroethylene film of the Nano-imprinting materials top side because being coated with mould release and low surface tension, therefore
It can be dialled after the completion of last punching press from removing.At this point, solidifying to nano surface impression materials, that is, it is placed on 1000mJ/cm2
Light under irradiate.
The various external appearance characteristics in the surface of the product according to made from Examples 1 and 2 can be tested by the following method
1) hardness test: by Mitsubishi's pencil (6B~9H) of different hardness be put into 45 degree of gradient holes (make pencil with
Test surfaces are in 45 degree angles) cart, and load 500 grams of loading, release 6.5mm distance inspects appearance lines whether there is or not scratching,
Damaged or obvious scratch, confirmation hardness (refer to ASTM D3363).
2) wear test: using Norman abrasion meter-IBB type, carries out loading 175g loop friction testing, environment item
For part at 23 ± 2 DEG C, 55% humidity (refers to ASTM F2357).
3) solvent resistance is tested: being changed 5 layers (30 × 30mm) using 100% pure cotton white yarn cloth, is soaked following 95% ethyl alcohol
Solvent carries out abrasion test.Condition is as follows: 500g/cm2Power, distance 6cm, speed are 60 back and forth/minute, and wiping is tested back and forth
Region is tried, one is calculated as 1 circulation back and forth, cleans out after wiping, and places 2 hours, and confirmation is by 500 circulations.It is not answered after test
There are the reduction of Deposit appearance grade, such as visible color change, loss of gloss；And it not can produce blistering, corrugation, cracking, deform, fall off and base
Phenomena such as material exposure.
| Hardness test | Wear test | Solvent resistance test | |
| Embodiment 1 | 2H | ◎ | ◎ |
| Embodiment 2 | 2H | ◎ | ◎ |
◎ is seriously affected without zero minimal effect Δ medium influence X is influenced
It can be seen that embodiment according to the present invention 1 and 2 can solidify at a high temperature of 230~280 DEG C, and have excellent
The performances such as good hardness, wear-resistant and solvent resistance.
Claims (6)
1. a kind of manufacturing method of Nano-imprinting materials, successively the following steps are included:
(1) it is to carry film with tetrafluoroethene or polyimide resin layer, carries out texture coining；
(2) one layer of mould release is coated on the carrying film；
(3) the epoxysilicone resin of liquid is coated in the parting agent layer of step (2)；
(4) it is irradiated by light and solidifies the epoxysilicone resin portion of step (3)；
(5) decide whether successively to give different coloured patterns and sedimentary according to demand；
(6) after step (5), it is coated with alkoxy silane coupling agent, to help what step (5) obtained to stack material and processing gold
It is closely sealed to belong to magnalium board；
(7) plate for obtaining step (6) receives continuous preheating, sizing and stamping procedure more than once；
(8) after the workpiece that step (7) obtains is cooling, the tetrafluoroethene on surface or polyimide resin layer is carried into film and torn off；
And
(9) it carries out second by the workpiece that heating or light irradiation obtain step (8) to solidify, to form nano-imprinted layers.
2. the manufacturing method according to claim 1, wherein in step (2), the mould release is polyacrylic acid or silica type
Mould release.
3. the manufacturing method according to claim 1, wherein in step (3), the epoxysilicone resin has at least
2 or 2 or more epoxy groups and acrylate group.
4. the manufacturing method according to claim 1, wherein in step (5), the color pattern by coating one layer or
Multi-layer pigments layers is formed.
5. manufacturing method according to claim 4 further comprises being coated with physical after the coat of colo(u)r is dry
Or chemically metallic luster thin film deposition layer the step of.
6. a kind of Nano-imprinting materials as made from manufacturing method described in any one of claim 1 to 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811393941.0A CN109521643A (en) | 2018-11-21 | 2018-11-21 | A kind of manufacturing method of Nano-imprinting materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811393941.0A CN109521643A (en) | 2018-11-21 | 2018-11-21 | A kind of manufacturing method of Nano-imprinting materials |
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| Publication Number | Publication Date |
|---|---|
| CN109521643A true CN109521643A (en) | 2019-03-26 |
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ID=65778340
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811393941.0A Pending CN109521643A (en) | 2018-11-21 | 2018-11-21 | A kind of manufacturing method of Nano-imprinting materials |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104442061A (en) * | 2014-12-29 | 2015-03-25 | 东莞市卓艺印刷制品有限公司 | Transfer film with UV (ultraviolet) coating layer |
| CN105636784A (en) * | 2013-10-11 | 2016-06-01 | 日东电工株式会社 | Sheet for transferring thin layer, thin-layer-transferring sheet with electrode catalyst layer, process for producing sheet for transferring thin layer, and process for producing membrane electrode assembly |
| CN106313923A (en) * | 2015-07-03 | 2017-01-11 | 禹辉（上海）转印材料股份有限公司 | Method for producing high abrasion-resistant solvent-resistant heat transfer film |
-
2018
- 2018-11-21 CN CN201811393941.0A patent/CN109521643A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105636784A (en) * | 2013-10-11 | 2016-06-01 | 日东电工株式会社 | Sheet for transferring thin layer, thin-layer-transferring sheet with electrode catalyst layer, process for producing sheet for transferring thin layer, and process for producing membrane electrode assembly |
| CN104442061A (en) * | 2014-12-29 | 2015-03-25 | 东莞市卓艺印刷制品有限公司 | Transfer film with UV (ultraviolet) coating layer |
| CN106313923A (en) * | 2015-07-03 | 2017-01-11 | 禹辉（上海）转印材料股份有限公司 | Method for producing high abrasion-resistant solvent-resistant heat transfer film |
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Application publication date: 20190326 |