CN109518129A - The preparation method of bend glass - Google Patents

The preparation method of bend glass Download PDF

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Publication number
CN109518129A
CN109518129A CN201710839757.3A CN201710839757A CN109518129A CN 109518129 A CN109518129 A CN 109518129A CN 201710839757 A CN201710839757 A CN 201710839757A CN 109518129 A CN109518129 A CN 109518129A
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Prior art keywords
glass
sio
preparation
layer
plate glass
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CN201710839757.3A
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CN109518129B (en
Inventor
刘伟
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Anhui Jingzhuo Optical Display Technology Co Ltd
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Nanchang OFilm Optical Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00—Re-forming shaped glass
    • C03B23/20—Uniting glass pieces by fusing without substantial reshaping
    • C03B23/203—Uniting glass sheets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2

Abstract

The present invention provides a kind of preparation methods of bend glass, comprising: provides plate glass and side glass, is respectively coated with a SiO in the side to be bonded of the plate glass and side glass2Layer makes the side flattening of the plate glass and side glass；The plate glass of the planarization and side glass are subjected to vacuum thermal bonding, then cut using glass associated after CNC cutter para-linkage, to obtain the bend glass of required shape.The present invention is first respectively coated with a SiO before the glass baseplate that will be used to prepare bend glass carries out vacuum thermal bonding at pre- bonding2Layer, can reduce the surface roughness of glass baseplate in this way, promote its planarization, bubble occur to avoid or reduce when being bonded, improve bond strength.

Description

The preparation method of bend glass
Technical field
The present invention relates to bend glass technical field more particularly to a kind of preparation methods of bend glass.
Background technique
Bend glass refers to the glass of curved edge, and bend glass is used for the touch screen of the electronic equipments such as mobile phone, can mention The whole visual effect of screen and fuselage, more visual Tension are risen, and feel can be promoted.
Plate glass and side glass are usually directlyed adopt vacuum thermal bonding skill by the preparation of existing bend glass Art, or be fixed using gluing mode, then use CNC (Computer Numerical Control, computer digit control Lathe processed) the cutting removal of the redundant structure of surrounding carries out surface polishing by technique again, the bend glass of required shape can be obtained (unilateral/opposite side/tetra- side warp architectures).The cost of the preparation process is low, bend glass flexible design, and hot bending yield is higher, Even if but the surface of two kinds of glass raw materials used is after being polished, and it is still rougher under microscopic appearance (as shown in Figure 1), It is easy to generate bubble in bonded interface when by two kinds of glass raw material Direct Bondings, it is insecure so as to cause being bonded.
Summary of the invention
In view of this, will be used in the prior art the present invention provides a kind of preparation method of bend glass for solving The glass baseplate Direct Bonding for preparing bend glass easily leads to the problem of bubble in bonded interface.
Specifically, the present invention provides a kind of preparation methods of bend glass, comprising the following steps:
Plate glass and side glass are provided, are respectively coated with one in the side to be bonded of the plate glass and side glass SiO2Layer planarizes the face to be bonded of the plate glass and side glass；
The plate glass of the planarization and side glass are subjected to vacuum thermal bonding, then use CNC cutter para-linkage Afterwards glass associated is cut, to obtain the bend glass of required shape.
Wherein, SiO on the plate glass2Layer with a thickness of 20-2000nm.
Wherein, SiO on the side glass2Layer with a thickness of 20-2000nm.
SiO on the plate glass and side glass2The presence of layer, can reduce the rough surface of both glass baseplates Degree, promotes their planarization, to can avoid or reduce bubble occur when being bonded them, improve them Between bond strength.
Wherein, the SiO2Layer is coated with using magnetron sputtering technique, is selected Si target to make target, is specifically coated with process such as Under:
(1) before plated film, the intracavitary vacuum degree of the plated film of magnetron sputtering apparatus is evacuated to 1.0 × 10-5~3.0 × 10- 5mbar；
(2) Xiang Suoshu plated film is intracavitary is passed through working gas, and the air pressure for controlling the plating membrane cavity is 1.6 × 10-5~3.6 × 10-3mbar；Wherein, the working gas is the mixed gas of argon gas and oxygen；
(3) Si target is opened, the target power output of adjustment Si target is 5~25kW, deposition growing SiO2, form the SiO2Layer.
Using SiO made from the magnetron sputtering technique2The appearance of layer is more uniform, smooth, fine and close, and on the glass substrate Adhesive force is preferable.
Wherein, the plate glass with a thickness of 0.1~2mm.
Wherein, the side glass with a thickness of 0.1~2mm.
Preferably, the thickness of the plate glass is less than the thickness of the side glass.It can guarantee gained curved surface glass in this way The integral thickness of glass is relatively thin, and arc side position have it is deeper under curved height.
Wherein, detailed process is as follows for the vacuum thermal bonding:
(1) plate glass and side glass are placed in a vacuum chamber, plate glass is pushed down using upper lower lock block respectively With side glass, and controlling pressure that the upper lower lock block is applied on the plate glass and side glass is 0.1-10MPa；
(2) the indoor vacuum degree of the vacuum chamber is evacuated to 1.0 × 10-4~9 × 10-3Pa, then will be in the vacuum chamber Temperature be warming up to 400-800 DEG C and be bonded.
Vacuum degree, temperature, the corresponding pressure of the mechanical pressure of application when controlling vacuum thermal bonding, can be in above range So that the plate glass and side glass is more closely bonded together, further avoids bubble occur when bonding.
Wherein, it is being coated with the SiO2Before layer, further includes: to the side to be bonded of the plate glass and side glass It is polished, and is cleaned.In this way, the face to be bonded of plate glass and side glass can more fully contact, bonding effect is improved Fruit.
It wherein, further include that surface polishing treatment is carried out to bend glass after the cutting.In this way, surface can be obtained The higher bend glass of brightness.
Wherein, the bend glass includes unilateral bending, opposite side bending or four side warp architectures.
Wherein, the subsequent corrosion of the bend glass is 2-50mm.
Wherein, central angle corresponding to the curved surface of the bend glass is 30-150 °.
The preparation method of bend glass provided by the invention, before glass baseplate is carried out vacuum thermal bonding, first in glass The surface of glass substrate (that is, plate glass and side glass) is respectively coated with one layer of SiO2Layer, reduces the surface roughness of glass baseplate, Its planarization is promoted, to avoid or reduce when glass baseplate to be bonded and bubble occur, improves glass baseplate Bond strength.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below There is attached drawing needed in technical description to be briefly described.
Fig. 1 is to be used to prepare the plate glass of bend glass and the surface topography schematic diagram of side glass in the prior art；
Fig. 2 (a) is the front view for being used to prepare the glass baseplate of bend glass before and after bonding；
Fig. 2 (b) is side view of the glass baseplate shown in (B) before and after bonding in Fig. 2 (a)；
Fig. 3 (a) is to be coated with SiO in the embodiment of the present invention2The plate glass of layer and the side view of side glass；
Fig. 3 (b) is to be coated with SiO in Fig. 3 (a)2The glass knot that the plate glass and side glass of layer are formed after thermal bonding Fit side view；
Fig. 3 (c) is the schematic diagram cut glass associated to Fig. 3 (b)；
Fig. 3 (d) is the side view of gained bend glass after cut glass associated to Fig. 3 (b)；
Fig. 4 is to be coated with SiO in another embodiment of the present invention2The plate glass of layer and the side view of side glass；
Fig. 5 is SiO in the embodiment of the present invention2Layer is coated with process schematic；
Fig. 6 is the process schematic representation of vacuum thermal bonding in the embodiment of the present invention.
Specific embodiment
With reference to the accompanying drawings and embodiments, technical scheme in the embodiment of the invention is clearly and completely described, shows So, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It should be pointed out that this place The specific embodiment of description is only used to explain the present invention, is not intended to limit the present invention.
The embodiment of the invention provides a kind of preparation methods of bend glass, comprising the following steps:
S10, plate glass and side glass are provided, respectively plates one in the side to be bonded of the plate glass and side glass SiO2Layer planarizes the face to be bonded of the plate glass and side glass；
S20, the plate glass of the planarization and side glass are subjected to vacuum thermal bonding, then use CNC cutter pair Glass associated after bonding is cut, to obtain the bend glass of required shape.
In step S10, it is used to prepare the glass baseplate (such as Fig. 2 (a) and Fig. 2 (b) are shown) of bend glass, including plate glass Glass 10 and side glass 20.Bend glass presoma is cut, the bend glass of required shape can be obtained.Wherein, when When needing to prepare the bend glass of unilateral warp architecture, one block of side glass 20 can be selected；When needing to prepare opposite side warp architecture Bend glass when, can be selected two blocks of side glass 20；When needing to prepare the bend glass of four side warp architectures, it can be selected four Block side glass 20.
Further, plate glass 10 used, side glass 20 can be used general optical glass, transmitance T >=92%, Its material can be soda-lime glass, aluminosilicate glass or Pyrex etc..Preferably, the heat of plate glass 10 used, side glass 20 The coefficient of expansion will differ smaller, material preferably of the same race.
It is illustrated for preparing unilateral bend glass in the embodiment of the present invention, as shown in Fig. 3 (a), plate glass 10 Thickness d 1 be 0.1~2mm, further, preferably 0.3-1.2mm.The thickness d 2 of side glass 20 is 0.1~2mm, preferably For 0.3-1.2mm.The thickness d 1 of plate glass 10 can be the same or different with the thickness d 2 of side glass 20.As excellent It selects, the thickness d 1 of the plate glass 10 in the present embodiment is less than the thickness d 2 of side glass 20, can guarantee gained curved surface glass in this way The integral thickness of glass is relatively thin, and arc side position have it is deeper under curved height.
In step S10, in plating SiO2Before layer, further includes: to the to be bonded of the plate glass 10 and side glass 20 Side is polished, and is cleaned.In this way, plate glass 10 contacts more abundant, raising key with the side to be bonded of side glass 20 Close effect.
In the present embodiment, the SiO being coated on the plate glass 102The thickness d 3 of layer 30 is 20-2000nm, further , preferably 100-500nm.The SiO being coated on the side glass 202The thickness d 4 of layer 30 is 20-2000nm, further , preferably 100-500nm.The SiO being coated on the plate glass 10 and the side glass 202The thickness of layer can phase Deng can not also wait.
It should be noted that can both be plated on the side to be bonded of the plate glass 10 and side glass 20 with whole face SiO processed2Layer 30 (such as Fig. 3 (a) shown in), can also the bond area only on the side to be bonded of glass baseplate be coated with SiO2Layer 30 (as shown in Figure 4).
" being coated with " in the application, refers to deposition.In the present embodiment, the SiO2Layer 30 is coated with can be of mode Vapor deposition, physical vapour deposition (PVD) etc. are learned, wherein chemical vapor deposition includes but is not limited to hot-wire chemical gas-phase deposition, plasma Body enhances chemical vapor deposition etc., and physical vapour deposition (PVD) includes but is not limited to magnetron sputtering, vacuum evaporation, ion plating (such as electricity Arc ion plating, RF ion plating) etc..It is preferred that being formed using magnetron sputtering mode, the film of appearance uniform densification can be formed in this way Layer surface, and SiO2The adhesive force of layer is higher.
In the step S10 of the present embodiment, the SiO2Layer 30 is prepared using magnetron sputtering technique, and Si target is selected to make target Material, refering to Fig. 5, specific preparation process example is as follows:
S101: before plated film, the intracavitary vacuum degree of the plated film of magnetron sputtering apparatus is evacuated to 1.0 × 10-5~3.0 × 10-5mbar；
S102: Xiang Suoshu plated film is intracavitary to be passed through working gas, and the air pressure of control plating membrane cavity is 1.6 × 10-5~3.6 × 10- 3Mbar, wherein the working gas is the mixed gas of argon gas and oxygen；
S103: opening Si target, and the target power output for adjusting the Si target is 5~25kW, deposition growing SiO2, form the SiO2 Layer.
If the air pressure for plating membrane cavity in step S102 is made to reach 1.6 × 10 on the basis of S101-5~3.6 × 10-3Mbar, The working gas (such as argon gas, oxygen) of 5N (5N indicates that gas purity is 99.999%) can be reached by adjusting the purity being passed through Flow realize.
Optionally, in step S103, the control SiO2Deposition rate be 0.2~0.4nm/s.According to required SiO2Layer Thickness, can accordingly adjust sedimentation time.Preferably, the sedimentation time is 60-900s.
In step S102 and S103, the design parameters root such as air pressure, sputtering power, sputtering time, deposition rate when plated film According to actually required SiO2The thickness of layer is adjusted, however it is not limited to above-mentioned shown parameter area.
Refering to Fig. 6, in step S20, detailed process is as follows for the vacuum thermal bonding:
S201: plate glass 10 and side glass 20 are placed in a vacuum chamber, are pushed down respectively using upper lower lock block flat Glass sheet 10 and side glass 20, and control the pressure that the upper lower lock block is applied on the plate glass 10 and side glass 20 It is by force 0.1-10MPa；
S202: the indoor vacuum degree of the vacuum chamber is evacuated to 1.0 × 10-4~9 × 10-3Pa, then by the vacuum chamber Interior temperature is warming up to 400-800 DEG C, is bonded.
Vacuum degree, temperature, the corresponding pressure of the mechanical pressure of application when controlling vacuum thermal bonding, can be in above range So that the plate glass and side glass is more closely bonded together, further avoids bubble occur when bonding.
It is that can push down plate glass 10 using a upper holder block in S201, side glass is pushed down using a lower lock block 20.In S202, the temperature when vacuum thermal bonding is preferably 600-800 DEG C.
Fig. 3 (b) is that plating is formed with SiO2The plate glass 10 of layer 30 and plating are formed with SiO2The side glass 20 of layer 30 is in thermal bonding The glass associated schematic diagram formed afterwards.From Fig. 3 (b) as can be seen that bubble is not present at the bonding of two glass baseplates, this Illustrate that the bonding between two glass baseplates is closer.
It, can be according to required outer when being cut using CNC cutter glass associated after thermal bonding in step S20 The bend glass of shape selects cutting position and angle.As shown in Fig. 3 (c), thicker line is two the line of cuts in figure.It will be hot Formed after bonding it is glass associated cut after, shown in the structure of gained bend glass such as Fig. 3 (d).
It further, further include to bend glass resulting after cutting after carrying out the CNC cutting in step S20 Surface polishing treatment is carried out, to form the bend glass of surface-brightening.
As shown in Fig. 3 (d), curved surface (generally arc-shaped curved surface) the radius R of gained bend glass can be according to specific design It needs to select, typically no less than 0.5mm, in order to avoid improve the difficulty and cost of CNC processing.Preferably 2-50mm, it is further excellent It is selected as 5-20mm.General surface radius R is bigger, and the whole radian effect of the bend glass is less obvious, but processing is easier to.
Wherein, central angle θ 1 corresponding to the curved surface of gained bend glass is 30-150 °, preferably 60-120 °.
The preparation method of bend glass provided in an embodiment of the present invention, by glass baseplate (plate glass 10 and side glass Glass 20) carry out vacuum thermal bonding before, first on the surface of glass baseplate be respectively coated with one layer of SiO2Layer 30, reduces the table of glass baseplate Surface roughness promotes its planarization, thus when glass baseplate to be bonded, then based on the bulk composition in glass baseplate Also contain SiO2, flatness layer SiO2Effect is preferable in conjunction with the entirety of glass baseplate, avoids or reduces and bubble occurs, and it is strong to improve bonding Degree.In addition, SiO on glass baseplate2The presence of layer 30, moreover it is possible in bonding process, avoid thermal stress etc. to the damage of glass baseplate Wound.SiO2Layer 30 and the refractive index of glass baseplate are closer to, and are not easy interface reflection occur in combination interface, this makes interface cohesion Locate unobvious, does not influence the appearance integration effect of bend glass.
As shown in Fig. 3 (d), bend glass in one embodiment of the invention, including the first glass body 110 and with the first glass The join domain of the second glass body 120 that glass ontology 110 connects, the first glass body 110 and the second glass body 120 is cut Face is arc, which includes the interior camber line and outer camber line of the concyclic heart.First glass body 110 is equipped with the first connection Face, the second glass body 120 are equipped with the second joint face (label of two joint faces out not shown), and the first joint face and second connects SiO is equipped in junction2Layer 30；First joint face and the second joint face pass through SiO2Layer 30 phases bonding, and the first joint face 111 Bonding position with the second joint face 121 is between the interior camber line and outer camber line of the arc join domain.
Wherein, SiO on first joint face2Layer 30 with a thickness of 20-2000nm；SiO on second joint face2Layer 30 with a thickness of 20-2000nm.SiO on first joint face2SiO on the thickness and the second joint face of layer 302The thickness of layer 30 can be with It is equal, it can not also wait.
Wherein, the bend glass includes unilateral bending, opposite side bending or four side warp architectures.The song of the bend glass Radius surface is 2-50mm.Central angle corresponding to the curved surface of the bend glass is 30-150 °.
It should be noted that according to the above description the announcement of book and with illustrate, those skilled in the art in the invention also It can change and modify the above embodiment.Therefore, the invention is not limited to specific realities disclosed and described above Mode is applied, some equivalent modifications of the invention and change should also be as within scope of protection of the claims of the invention.This Outside, although using some specific terms in this specification, these terms are merely for convenience of description, not to the present invention Constitute any restrictions.

Claims (10)

1. a kind of preparation method of bend glass, it is characterised in that: the following steps are included:
Plate glass and side glass are provided, are respectively coated with a SiO in the side to be bonded of the plate glass and side glass2Layer, Planarize the face to be bonded of the plate glass and side glass；
The plate glass of the planarization and side glass are subjected to vacuum thermal bonding, then using after CNC cutter para-linkage It is glass associated to be cut, to obtain the bend glass of required shape.
2. preparation method as described in claim 1, which is characterized in that SiO on the plate glass2Layer with a thickness of 20- 2000nm。
3. preparation method as described in claim 1, which is characterized in that SiO on the side glass2Layer with a thickness of 20- 2000nm。
4. preparation method as described in claim 1, which is characterized in that the SiO2Layer is coated with using magnetron sputtering technique, It selects Si target to make target, it is as follows to be specifically coated with process:
(1) before plated film, the intracavitary vacuum degree of the plated film of magnetron sputtering apparatus is evacuated to 1.0 × 10-5~3.0 × 10-5mbar；
(2) Xiang Suoshu plated film is intracavitary is passed through working gas, and the air pressure for controlling the plating membrane cavity is 1.6 × 10-5~3.6 × 10- 3mbar；Wherein, the working gas is the mixed gas of argon gas and oxygen；
(3) Si target is opened, the target power output of adjustment Si target is 5~25kW, deposition growing SiO2, form the SiO2Layer.
5. preparation method as described in claim 1, which is characterized in that the plate glass with a thickness of 0.1~2mm, it is described Side glass with a thickness of 0.1~2mm.
6. preparation method as claimed in claim 5, which is characterized in that the thickness of the plate glass is less than the side glass Thickness.
7. preparation method as described in claim 1, which is characterized in that detailed process is as follows for the vacuum thermal bonding:
(1) plate glass and side glass are placed in a vacuum chamber, plate glass and side is pushed down using upper lower lock block respectively Side glass, and controlling the pressure that the upper lower lock block is applied on the plate glass and side glass is 0.1-10MPa；
(2) the indoor vacuum degree of the vacuum chamber is evacuated to 1.0 × 10-4~9 × 10-3Pa, then by the indoor temperature of the vacuum Degree is warming up to 400-800 DEG C and is bonded.
8. such as the described in any item preparation methods of claim 1-7, which is characterized in that be coated with the SiO2Before layer, also wrap It includes: the side to be bonded of the plate glass and side glass being polished, and is cleaned；
It wherein, further include that surface polishing treatment is carried out to bend glass after the cutting.
9. preparation method as described in claim 1, which is characterized in that the subsequent corrosion of the bend glass is 2-50mm.
10. preparation method as described in claim 1, which is characterized in that central angle corresponding to the curved surface of the bend glass It is 30-150 °.
CN201710839757.3A 2017-09-18 2017-09-18 Preparation method of curved glass Active CN109518129B (en)

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CN113415981A (en) * 2021-06-22 2021-09-21 泰极微(成都)技术发展有限公司 Glass bonding method

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CN103951278A (en) * 2014-05-04 2014-07-30 江南大学 Super-hydrophobic super-oleophobic anti-reflection glass surface layer and preparation method thereof
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WO2021158808A1 (en) * 2020-02-06 2021-08-12 Tesla, Inc. Automotive glass structure having feature lines and related method of manufacture
CN113415981A (en) * 2021-06-22 2021-09-21 泰极微(成都)技术发展有限公司 Glass bonding method

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