CN109516444B - Preparation method of tungsten ditelluride - Google Patents
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- WFGOJOJMWHVMAP-UHFFFAOYSA-N tungsten(iv) telluride Chemical compound [Te]=[W]=[Te] WFGOJOJMWHVMAP-UHFFFAOYSA-N 0.000 title claims abstract description 43
- 238000002360 preparation method Methods 0.000 title claims abstract description 27
- 239000002994 raw material Substances 0.000 claims abstract description 68
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 45
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 38
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 38
- 239000010937 tungsten Substances 0.000 claims abstract description 38
- 239000002904 solvent Substances 0.000 claims abstract description 22
- 239000011261 inert gas Substances 0.000 claims abstract description 17
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 238000002156 mixing Methods 0.000 claims abstract description 8
- 125000003916 ethylene diamine group Chemical group 0.000 claims abstract description 6
- 238000001816 cooling Methods 0.000 claims abstract description 5
- 230000001603 reducing effect Effects 0.000 claims abstract description 5
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 claims abstract description 3
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 claims abstract description 3
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 claims abstract description 3
- XHYHOBJDYHRWHO-UHFFFAOYSA-H tungsten;hexachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[W] XHYHOBJDYHRWHO-UHFFFAOYSA-H 0.000 claims abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 43
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 32
- 239000007789 gas Substances 0.000 claims description 22
- 229910052757 nitrogen Inorganic materials 0.000 claims description 20
- 229910052786 argon Inorganic materials 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000011541 reaction mixture Substances 0.000 claims description 10
- 238000001291 vacuum drying Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 2
- 238000005119 centrifugation Methods 0.000 claims 2
- 230000000536 complexating effect Effects 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000003054 catalyst Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 4
- 238000010668 complexation reaction Methods 0.000 abstract description 3
- 230000007547 defect Effects 0.000 abstract description 2
- 238000005265 energy consumption Methods 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 description 15
- 238000003756 stirring Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 10
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 9
- 239000000843 powder Substances 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 229910052593 corundum Inorganic materials 0.000 description 5
- 239000010431 corundum Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 238000001237 Raman spectrum Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- OFDISMSWWNOGFW-UHFFFAOYSA-N 1-(4-ethoxy-3-fluorophenyl)ethanamine Chemical compound CCOC1=CC=C(C(C)N)C=C1F OFDISMSWWNOGFW-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical group 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- HPQRSQFZILKRDH-UHFFFAOYSA-M chloro(trimethyl)plumbane Chemical compound C[Pb](C)(C)Cl HPQRSQFZILKRDH-UHFFFAOYSA-M 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- -1 transition metal chalcogenide compounds Chemical class 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B19/00—Selenium; Tellurium; Compounds thereof
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Abstract
本发明公开了一种二碲化钨的制备方法,包括:将由具有络合作用的第一溶剂和钨原料组成的钨原料液与由具有还原作用的第二溶剂和碲原料组成的碲原料液混合均匀后,在惰性气体保护下高温反应,冷却后即得;钨原料为六氯化钨和/或钨粉,第一溶剂为乙二胺,碲原料为碲粉和/或二氧化碲,第二溶剂为乙二胺和/或水合肼。本发明提供了一种采用新原料且制备过程更加温和的二碲化钨的制备方法,有效克服了现有技术中的制备方法高能耗、长时间的缺陷,且本发明的制备方法所述设备和仪器简单常见,具有重要的推广价值;本发明的产物结晶性好,产量大,纯度高,理论和实际意义重大。
The invention discloses a preparation method of tungsten ditelluride, which comprises: a tungsten raw material liquid composed of a first solvent with complexation effect and a tungsten raw material and a tellurium raw material liquid composed of a second solvent with reducing effect and a tellurium raw material After mixing evenly, react at high temperature under the protection of inert gas, and obtain after cooling; the tungsten raw material is tungsten hexachloride and/or tungsten powder, the first solvent is ethylenediamine, and the tellurium raw material is tellurium powder and/or tellurium dioxide, The second solvent is ethylenediamine and/or hydrazine hydrate. The present invention provides a preparation method of tungsten ditelluride which adopts new raw materials and has a milder preparation process, which effectively overcomes the defects of high energy consumption and long time in the preparation method in the prior art, and the equipment of the preparation method of the present invention And the instrument is simple and common, and has important promotion value; the product of the invention has good crystallinity, large yield, high purity, and has great theoretical and practical significance.
Description
技术领域technical field
本发明属于非磁性半金属材料的制备技术领域,涉及一种过渡族金属硫族化合物的制备方法,具体涉及一种二碲化钨的制备方法。The invention belongs to the technical field of preparation of non-magnetic semi-metal materials, relates to a preparation method of transition metal chalcogenide compounds, and in particular relates to a preparation method of tungsten ditelluride.
背景技术Background technique
过渡族金属二元硫族化合物(Transition-metal Dichalcogenides,TMDCs)是一种典型的类石墨烯层状材料,通常表示为MX2(M代表一种过渡族金属,X代表一种硫族元素),二碲化钨就是其中一员。Transition-metal Dichalcogenides (TMDCs) are typical graphene-like layered materials, usually denoted as MX 2 (M represents a transition metal, X represents a chalcogen) , Tungsten ditelluride is one of them.
二碲化钨被重点关注是源自2014年普林斯顿大学教授R.J.Cava研究组发现其在常压低温下的大磁阻效应(LMR),而且在极高的外加磁场下依然不饱和。2015年Lv H Y等人通过第一性原理计算了二碲化钨的电子结构,并证实了二碲化钨材料中存在完美的电子-空穴补偿;同年,中国科学院物理研究所的科研人员对二碲化钨的超导电性进行了探索。The focus of tungsten ditelluride is that in 2014, the research group of Princeton University professor R.J. Cava discovered its large magnetoresistance effect (LMR) at atmospheric pressure and low temperature, and it is still unsaturated under extremely high external magnetic field. In 2015, Lv H Y et al. calculated the electronic structure of tungsten ditelluride through first-principles, and confirmed the existence of perfect electron-hole compensation in tungsten ditelluride material; in the same year, researchers from the Institute of Physics, Chinese Academy of Sciences The superconductivity of tungsten ditelluride was explored.
对二碲化钨的热电性能、巨磁阻效应以及超导电性的探索与研究一直在持续进行当中,但是,对于二碲化钨的制备工艺,目前主要是实验室条件的合成,包括化学气相沉积法、高温高压法和化学气相输运法提纯等,但仅能制备出薄膜制品,或者单晶样品的大小基本上只有1.5mm*0.7mm*0.02mm,且反应保温时间为一至两周,甚至长至三个月才能生长出二碲化钨,同时,上述方法还可能会制备出掺入四氯化碲杂质的混合产物,后续还需经过除杂、再提纯等处理。The exploration and research on the thermoelectric properties, giant magnetoresistance effect and superconductivity of tungsten ditelluride have been ongoing. However, for the preparation process of tungsten ditelluride, it is mainly synthesized in laboratory conditions, including chemical vapor phase. Deposition method, high temperature and high pressure method and chemical vapor transport method purification, etc., but only thin film products can be prepared, or the size of single crystal samples is basically only 1.5mm*0.7mm*0.02mm, and the reaction holding time is one to two weeks. It can even take up to three months to grow tungsten ditelluride. At the same time, the above method may also prepare a mixed product doped with tellurium tetrachloride impurities, which needs to be processed by impurity removal and repurification.
迄今为止,尚未见到有关快速且能大批量制备二碲化钨的方法的相关报道。So far, there is no relevant report on the method for the rapid and large-scale preparation of tungsten ditelluride.
发明内容SUMMARY OF THE INVENTION
本发明的目的在于,针对现有技术的二碲化钨制备过程中的能耗高、流程久和产品掺杂等问题,提供一种更加温和的二碲化钨的制备方法,适用于未来二碲化钨应用于电磁元器件制造的快速、大批量生产,提供一些可能的参考。The purpose of the present invention is to provide a milder preparation method of tungsten ditelluride, which is suitable for the future two The application of tungsten telluride in the rapid and mass production of electromagnetic components provides some possible references.
本发明采用如下技术方案:The present invention adopts following technical scheme:
一种二碲化钨的制备方法,包括:将由具有络合作用的第一溶剂和钨原料组成的钨原料液与由具有还原作用的第二溶剂和碲原料组成的碲原料液混合均匀后,在惰性气体保护下高温反应,冷却后即得。A method for preparing tungsten ditelluride, comprising: after uniformly mixing a tungsten raw material solution composed of a first solvent with complexation and a tungsten raw material and a tellurium raw material solution composed of a second solvent with reducing action and a tellurium raw material, It is reacted at high temperature under the protection of inert gas and obtained after cooling.
在上述技术方案中,所述钨原料为六氯化钨和/或钨粉,且纯度大于等于99.5%。In the above technical solution, the tungsten raw material is tungsten hexachloride and/or tungsten powder, and the purity is greater than or equal to 99.5%.
在上述技术方案中,所述碲原料为碲粉和/或二氧化碲,且纯度大于等于99.95%。In the above technical solution, the tellurium raw material is tellurium powder and/or tellurium dioxide, and the purity is greater than or equal to 99.95%.
在上述技术方案中,所述第一溶剂为乙二胺,且纯度大于等于99.5%。In the above technical solution, the first solvent is ethylenediamine, and the purity is greater than or equal to 99.5%.
在上述技术方案中,所述第二溶剂为乙二胺和/或水合肼,且纯度大于等于99.5%。In the above technical solution, the second solvent is ethylenediamine and/or hydrazine hydrate, and the purity is greater than or equal to 99.5%.
进一步地,在上述技术方案中,在所述钨原料液中,所述钨原料与所述第一溶剂的料液比为1g:12-18ml。Further, in the above technical solution, in the tungsten raw material solution, the ratio of the tungsten raw material to the first solvent is 1 g: 12-18 ml.
进一步地,在上述技术方案中,在所述碲原料液中,所述碲原料与所述第二溶剂的料液比为1g:6-15ml。Further, in the above technical solution, in the tellurium raw material solution, the material-to-liquid ratio of the tellurium raw material to the second solvent is 1g:6-15ml.
在上述技术方案中,所述惰性气体为氩气或氮气。In the above technical solution, the inert gas is argon or nitrogen.
优选地,在上述技术方案中,所述惰性气体的纯度大于等于99.99%,所述惰性气体的流速为10-400SCCM。Preferably, in the above technical solution, the purity of the inert gas is greater than or equal to 99.99%, and the flow rate of the inert gas is 10-400 SCCM.
在上述技术方案中,所述高温反应的反应温度和反应时间分别为750-850℃和10-20h。In the above technical solution, the reaction temperature and reaction time of the high temperature reaction are respectively 750-850° C. and 10-20 h.
进一步地,在上述技术方案中,所述制备方法还包括,在高温反应前,将混合均匀后的钨原料液和碲原料液离心分离后置于真空干燥箱中低温烘干。Further, in the above technical solution, the preparation method further includes, before the high temperature reaction, centrifuging the uniformly mixed tungsten raw material liquid and the tellurium raw material liquid, and then placing them in a vacuum drying box for low-temperature drying.
再进一步地,在上述技术方案中,所述离心分离的离心转速为3000-4500rpm,离心时间为3-5min。Still further, in the above technical solution, the centrifugal rotation speed of the centrifugal separation is 3000-4500 rpm, and the centrifugal time is 3-5 min.
再进一步地,在上述技术方案中,所述低温烘干的干燥温度为29-55℃,干燥时间为4.5-8.5h。Still further, in the above technical solution, the drying temperature of the low-temperature drying is 29-55° C., and the drying time is 4.5-8.5 h.
又进一步地,在上述技术方案中,所述高温反应过程中,还包括对气氛炉进行封闭炉管开放的操作,具体为,在120-205℃时通入惰性气体,并采用放松橡胶管的方式打开出气口,保持5-20min,不通入惰性气体,恢复封闭操作,再在320-410℃时通入惰性气体,并再采用放松橡胶管的方式打开出气口,保持5-20min,不通入惰性气体,恢复封闭操作。Still further, in the above technical solution, the high temperature reaction process also includes an operation of opening the closed furnace tube of the atmosphere furnace, specifically, introducing an inert gas at 120-205 ° C, and using a method of loosening the rubber tube. Open the air outlet by means of the method, keep it for 5-20min, do not pass inert gas, resume the closed operation, and then pass in the inert gas at 320-410 ℃, and then open the air outlet by loosening the rubber tube, keep it for 5-20min, do not let in Inert gas, resume closed operation.
还进一步地,在上述技术方案中,所述制备方法包括以下步骤:Still further, in the above-mentioned technical scheme, the preparation method comprises the following steps:
S1、将具有络合作用的第一溶剂逐滴加入到钨原料中,混合均匀后得到钨原料液,同时将具有还原作用的第二溶剂逐滴加入到碲原料中,混合均匀后得到碲原料液;S1, the first solvent with complexation is added dropwise to the tungsten raw material, the tungsten raw material solution is obtained after mixing, the second solvent with reducing action is added dropwise to the tellurium raw material, and the tellurium raw material is obtained after mixing liquid;
S2、将步骤S1中的钨原料液和碲原料液混合均匀后离心分离得到反应混合料,随后置于真空干燥箱中低温烘干;S2, the tungsten raw material liquid and the tellurium raw material liquid in step S1 are mixed uniformly and centrifuged to obtain a reaction mixture, which is then placed in a vacuum drying oven for low-temperature drying;
S3、将步骤S2中的烘干后的反应混合料置于气氛炉中,在惰性气氛下高温反应,冷却后即得。S3. The oven-dried reaction mixture in step S2 is placed in an atmosphere furnace, reacted at a high temperature in an inert atmosphere, and obtained after cooling.
与现有技术相比,本发明的有益效果如下:Compared with the prior art, the beneficial effects of the present invention are as follows:
(1)本发明提供了一种采用新原料且制备过程更加温和的二碲化钨的制备方法,有效克服了现有技术中的制备方法高能耗、长时间的缺陷,且本发明的制备方法所述设备和仪器简单常见,具有重要的推广价值;(1) the present invention provides a kind of preparation method of tungsten ditelluride which adopts new raw material and the preparation process is milder, effectively overcomes the defects of high energy consumption and long time of the preparation method in the prior art, and the preparation method of the present invention The equipment and instruments are simple and common, and have important promotion value;
(2)本发明所提供的制备方法制备得到的二碲化钨产物结晶性好,产量大,并且纯度高无掺杂其他元素,无需进行水洗、醇洗等一系列步骤,为大批量生产具有优质热电性能、巨磁阻效应以及超导电性的二碲化钨材料提供了理论参考。(2) The tungsten ditelluride product prepared by the preparation method provided by the present invention has good crystallinity, large yield, high purity and no doping of other elements, and does not require a series of steps such as water washing and alcohol washing, which is suitable for mass production. High-quality thermoelectric properties, giant magnetoresistance effect, and superconductive tungsten ditelluride materials provide theoretical references.
附图说明Description of drawings
图1为本发明实施例1-3所制备得到自掺杂非化学计量比的二碲化钨的X射线衍射图谱;Fig. 1 is the X-ray diffraction pattern of self-doping non-stoichiometric tungsten ditelluride prepared in Example 1-3 of the present invention;
图2为本发明实施例2所制备得到的化学计量比纯相二碲化钨的拉曼图谱。FIG. 2 is the Raman spectrum of the pure phase tungsten ditelluride in the stoichiometric ratio prepared in Example 2 of the present invention.
具体实施方式Detailed ways
为了便于理解本发明,下面结合附图和实施例,对本发明的二碲化钨的制备方法作进一步更全面和详细的描述。In order to facilitate the understanding of the present invention, the preparation method of tungsten ditelluride of the present invention will be described in a more comprehensive and detailed manner below with reference to the accompanying drawings and examples.
说明书附图中给出了本发明的较佳实施例;但是,本发明可以以多种不同的形式来实现,而并不限于本文中所描述的实施例;相反地,提供这些实施例的目的是使对本发明的公开内容的理解更加透彻全面。Preferred embodiments of the present invention are shown in the accompanying drawings; however, the present invention may be embodied in many different forms and is not limited to the embodiments described herein; rather, these embodiments are provided for the purpose of This is to make the understanding of the disclosure of the present invention more thorough and complete.
除非另有定义,本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本发明。本文所使用的术语“和/或”包括一个或多个相关的所列项目的任意的和所有的组合。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terms used herein in the description of the present invention are for the purpose of describing specific embodiments only, and are not intended to limit the present invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
本发明实施例和对比例中所用的原料和相关实验设备均为市售产品。The raw materials and related experimental equipment used in the examples and comparative examples of the present invention are all commercially available products.
实施例1Example 1
本发明实施例提供了一种二碲化钨的制备方法,具体包括如下步骤:The embodiment of the present invention provides a preparation method of tungsten ditelluride, which specifically includes the following steps:
S1、将1.19g六氯化钨置于50ml烧杯中,将15ml乙二胺逐滴加入该烧杯中,搅拌30min,混合均匀,制得钨原料液;将15ml乙二胺逐滴加入装有1.952g碲粉的烧杯中,搅拌30min,混合均匀,制得碲原料液。S1. Place 1.19g of tungsten hexachloride in a 50ml beaker, add 15ml of ethylenediamine dropwise to the beaker, stir for 30min, mix well to obtain a tungsten raw material solution; add 15ml of ethylenediamine dropwise to the beaker containing 1.952 In a beaker of g tellurium powder, stir for 30 minutes, and mix well to obtain a tellurium raw material solution.
S2、将步骤S1中的钨原料液和碲原料液混合均匀(钨和碲的原料摩尔比例为1:2.55),搅拌30min,转移至50ml离心管中,4000rpm转速下离心5min,放入真空干燥箱中30℃烘干7h。S2. Mix the tungsten raw material solution and the tellurium raw material solution in step S1 evenly (the raw material molar ratio of tungsten and tellurium is 1:2.55), stir for 30 min, transfer to a 50 ml centrifuge tube, centrifuge at 4000 rpm for 5 min, and put into vacuum drying Dry in a box at 30°C for 7h.
S3、将步骤S2中干燥后的反应混合料转移至刚玉坩埚中,加盖,放入管式炉,通入400SCCM氮气清洗炉管,抽真空至0.10MPa后,通入80SCCM氮气,压力为正常大气压时,密封炉管后,停止通入氮气,升温至150℃,继续通入氮气并打开出气口,之后封闭炉管,关闭气体阀门,升温至360℃,通入氮气,开启炉管后,继续通入氮气并封闭炉管,升温至800℃,保温12h,停止加热,关闭氮气,坩埚随炉冷却至室温,即制备得到具有巨磁阻性质的二碲化钨的粉体材料。S3. Transfer the dried reaction mixture in step S2 to a corundum crucible, cover it, put it into a tube furnace, pass 400SCCM nitrogen to clean the furnace tube, evacuate to 0.10MPa, pass 80SCCM nitrogen, and the pressure is normal At atmospheric pressure, after sealing the furnace tube, stop feeding nitrogen, raise the temperature to 150 °C, continue feeding nitrogen and open the gas outlet, then close the furnace tube, close the gas valve, heat up to 360 °C, pass nitrogen, and open the furnace tube, Continue to introduce nitrogen gas and seal the furnace tube, raise the temperature to 800°C, keep the temperature for 12 hours, stop heating, turn off nitrogen, and cool the crucible to room temperature with the furnace, thus preparing the powder material of tungsten ditelluride with giant magnetoresistive properties.
实施例2Example 2
本发明实施例提供了一种二碲化钨的制备方法,具体包括如下步骤:The embodiment of the present invention provides a preparation method of tungsten ditelluride, which specifically includes the following steps:
S1、将1.19g六氯化钨置于50ml烧杯中,将15ml乙二胺逐滴加入该烧杯中,搅拌30min,混合均匀,制得钨原料液;将15ml乙二胺逐滴加入装有2.297g碲粉的烧杯中,搅拌30min,混合均匀,制得碲原料液。S1. Place 1.19g of tungsten hexachloride in a 50ml beaker, add 15ml of ethylenediamine dropwise to the beaker, stir for 30min, and mix well to obtain a tungsten raw material solution; add 15ml of ethylenediamine dropwise to the beaker containing 2.297 In a beaker of g tellurium powder, stir for 30 minutes, and mix well to obtain a tellurium raw material solution.
S2、将步骤S1中的钨原料液和碲原料液混合均匀(钨和碲的原料摩尔比例为1:3.00),搅拌30min,转移至50ml离心管中,3500rpm转速下离心5min,放入真空干燥箱中30℃烘干7h。S2. Mix the tungsten raw material solution and the tellurium raw material solution in step S1 evenly (the raw material molar ratio of tungsten and tellurium is 1:3.00), stir for 30min, transfer to a 50ml centrifuge tube, centrifuge at 3500rpm for 5min, put into vacuum drying Dry in a box at 30°C for 7h.
S3、将步骤S2中干燥后的反应混合料转移至刚玉坩埚中,加盖,放入管式炉,通入400SCCM氮气清洗炉管,抽真空至0.10MPa后,通入80SCCM氮气,压力为正常大气压时,密封炉管后,停止通入氮气,升温至150℃,继续通入氮气并打开出气口,之后封闭炉管,关闭气体阀门,升温至360℃,通入氮气,开启炉管后,继续通入氮气并封闭炉管,升温至800℃,保温12h,停止加热,关闭氮气,坩埚随炉冷却至室温,即制备得到具有巨磁阻性质的二碲化钨的粉体材料。S3. Transfer the dried reaction mixture in step S2 to a corundum crucible, cover it, put it into a tube furnace, pass 400SCCM nitrogen to clean the furnace tube, evacuate to 0.10MPa, pass 80SCCM nitrogen, and the pressure is normal At atmospheric pressure, after sealing the furnace tube, stop feeding nitrogen, raise the temperature to 150 °C, continue feeding nitrogen and open the gas outlet, then close the furnace tube, close the gas valve, heat up to 360 °C, pass nitrogen, and open the furnace tube, Continue to introduce nitrogen gas and seal the furnace tube, heat up to 800°C, keep the temperature for 12 hours, stop heating, turn off nitrogen, and cool the crucible to room temperature with the furnace to prepare the powder material of tungsten ditelluride with giant magnetoresistive properties.
实施例3Example 3
本发明实施例提供了一种二碲化钨的制备方法,具体包括如下步骤:The embodiment of the present invention provides a preparation method of tungsten ditelluride, which specifically includes the following steps:
S1、将1.19g六氯化钨置于50ml烧杯中,将15ml乙二胺逐滴加入该烧杯中,搅拌30min,混合均匀,制得钨原料液;将15ml乙二胺逐滴加入装有2.641g碲粉的烧杯中,搅拌30min,混合均匀,制得碲原料液。S1. Place 1.19g of tungsten hexachloride in a 50ml beaker, add 15ml of ethylenediamine dropwise to the beaker, stir for 30min, and mix well to obtain a tungsten raw material solution; add 15ml of ethylenediamine dropwise to the beaker containing 2.641 In a beaker of g tellurium powder, stir for 30 minutes, and mix well to obtain a tellurium raw material solution.
S2、将步骤S1中的钨原料液和碲原料液混合均匀(钨和碲的原料摩尔比例为1:3.45),搅拌30min,转移至50ml离心管中,4200rpm转速下离心5min,放入真空干燥箱中30℃烘干7h。S2, mix the tungsten raw material liquid and the tellurium raw material liquid in step S1 evenly (the raw material molar ratio of tungsten and tellurium is 1:3.45), stir for 30min, transfer to a 50ml centrifuge tube, centrifuge at 4200rpm for 5min, put into vacuum drying Dry in a box at 30°C for 7h.
S3、将步骤S2中干燥后的反应混合料转移至刚玉坩埚中,加盖,放入管式炉,通入400SCCM氮气清洗炉管,抽真空至0.10MPa后,通入80SCCM氮气,压力为正常大气压时,密封炉管后,停止通入氮气,升温至150℃,继续通入氮气并打开出气口,之后封闭炉管,关闭气体阀门,升温至360℃,通入氮气,开启炉管后,继续通入氮气并封闭炉管,升温至800℃,保温12h,停止加热,关闭氮气,坩埚随炉冷却至室温,即制备得到具有巨磁阻性质的二碲化钨的粉体材料。S3. Transfer the dried reaction mixture in step S2 to a corundum crucible, cover it, put it into a tube furnace, pass 400SCCM nitrogen to clean the furnace tube, evacuate to 0.10MPa, pass 80SCCM nitrogen, and the pressure is normal At atmospheric pressure, after sealing the furnace tube, stop feeding nitrogen, raise the temperature to 150 °C, continue feeding nitrogen and open the gas outlet, then close the furnace tube, close the gas valve, heat up to 360 °C, pass nitrogen, and open the furnace tube, Continue to introduce nitrogen gas and seal the furnace tube, raise the temperature to 800°C, keep the temperature for 12 hours, stop heating, turn off nitrogen, and cool the crucible to room temperature with the furnace, thus preparing the powder material of tungsten ditelluride with giant magnetoresistive properties.
实施例4Example 4
本发明实施例提供了一种二碲化钨的制备方法,具体包括如下步骤:The embodiment of the present invention provides a preparation method of tungsten ditelluride, which specifically includes the following steps:
S1、将2.38g六氯化钨置于50ml烧杯中,将20ml乙二胺逐滴加入该烧杯中,搅拌60min,混合均匀,制得钨原料液;将20ml乙二胺逐滴加入装有4.60g碲粉的烧杯中,搅拌60min,混合均匀,制得碲原料液。S1. Place 2.38g of tungsten hexachloride in a 50ml beaker, add 20ml of ethylenediamine dropwise to the beaker, stir for 60min, and mix evenly to obtain a tungsten raw material solution; In a beaker of g tellurium powder, stir for 60 min, and mix evenly to obtain a tellurium raw material solution.
S2、将步骤S1中的钨原料液和碲原料液混合均匀,搅拌60min,转移至100ml离心管中,4000rpm转速下离心5min,放入真空干燥箱中50℃烘干6h。S2. Mix the tungsten raw material solution and the tellurium raw material solution in step S1 evenly, stir for 60 min, transfer to a 100 ml centrifuge tube, centrifuge at 4000 rpm for 5 min, and put it into a vacuum drying box for drying at 50° C. for 6 h.
S3、将步骤S2中干燥后的反应混合料转移至刚玉坩埚中,加盖,放入管式炉,通入400SCCM氩气清洗炉管,抽真空至0.10MPa后,通入80SCCM氩气,压力为正常大气压时,密封炉管后,停止通入氩气,升温至160℃,继续通入氩气并打开出气口,之后封闭炉管,关闭气体阀门,升温至400℃,通入氩气,开启炉管后,继续通入氩气并封闭炉管,升温至800℃,保温16h,停止加热,关闭氩气,坩埚随炉冷却至室温,即制备得到具有巨磁阻性质的二碲化钨的粉体材料。S3. Transfer the dried reaction mixture in step S2 to a corundum crucible, cover it, put it into a tube furnace, pass 400SCCM argon to clean the furnace tube, evacuate to 0.10MPa, pass 80SCCM argon, pressure When it is at normal atmospheric pressure, after sealing the furnace tube, stop feeding argon gas, heat up to 160 °C, continue feeding argon gas and open the gas outlet, then close the furnace tube, close the gas valve, heat up to 400 °C, and pass argon gas, After opening the furnace tube, continue to pass argon gas and seal the furnace tube, heat up to 800 ° C, keep the temperature for 16 hours, stop heating, turn off the argon gas, and cool the crucible to room temperature with the furnace, that is, tungsten ditelluride with giant magnetoresistance properties is prepared. powder material.
实施例5Example 5
本发明实施例提供了一种二碲化钨的制备方法,具体包括如下步骤:The embodiment of the present invention provides a preparation method of tungsten ditelluride, which specifically includes the following steps:
S1、将3.97g钨粉置于50ml烧杯中,将20ml乙二胺逐滴加入该烧杯中,搅拌75min,混合均匀,制得钨原料液;将20ml乙二胺逐滴加入装有4.79g二氧化碲的烧杯中,搅拌75min,混合均匀,制得碲原料液。S1. Place 3.97g of tungsten powder in a 50ml beaker, add 20ml of ethylenediamine dropwise to the beaker, stir for 75min, and mix evenly to obtain a tungsten raw material solution; add 20ml of ethylenediamine dropwise to the beaker containing 4.79g In the beaker of tellurium oxide, stir for 75 minutes, and mix well to obtain the tellurium raw material solution.
S2、将步骤S1中的钨原料液和碲原料液混合均匀,搅拌75min,转移至100ml离心管中,4000rpm转速下离心5min,放入真空干燥箱中55℃烘干4.5h。S2. Mix the tungsten raw material solution and the tellurium raw material solution in step S1 evenly, stir for 75 min, transfer to a 100 ml centrifuge tube, centrifuge at 4000 rpm for 5 min, and put it into a vacuum drying box for drying at 55° C. for 4.5 h.
S3、将步骤S2中干燥后的反应混合料转移至刚玉坩埚中,加盖,放入管式炉,通入400SCCM氩气清洗炉管,抽真空至0.10MPa后,通入80SCCM氩气,压力为正常大气压时,密封炉管后,停止通入氩气,升温至180℃,继续通入氩气并打开出气口,之后封闭炉管,关闭气体阀门,升温至410℃,通入氩气,开启炉管后,继续通入氩气并封闭炉管,升温至800℃,保温16h,停止加热,关闭氩气,坩埚随炉冷却至室温,即制备得到具有巨磁阻性质的二碲化钨的粉体材料。S3. Transfer the dried reaction mixture in step S2 to a corundum crucible, cover it, put it into a tube furnace, pass 400SCCM argon to clean the furnace tube, evacuate to 0.10MPa, pass 80SCCM argon, pressure When it is normal atmospheric pressure, after sealing the furnace tube, stop feeding argon gas, raise the temperature to 180 °C, continue feeding argon gas and open the gas outlet, then close the furnace tube, close the gas valve, heat up to 410 °C, and pass argon gas, After opening the furnace tube, continue to pass argon gas and seal the furnace tube, heat up to 800 ° C, keep the temperature for 16 hours, stop heating, turn off the argon gas, and cool the crucible to room temperature with the furnace, that is, tungsten ditelluride with giant magnetoresistance properties is prepared. powder material.
本发明中,所述二碲化钨粉体材料由钨、碲以化学元素比1:2形成的过渡族金属化合物,其中钨为+4价,碲为-2价。In the present invention, the tungsten ditelluride powder material is a transition group metal compound formed by tungsten and tellurium in a chemical element ratio of 1:2, wherein tungsten has a valence of +4, and tellurium has a valence of -2.
如图1所示为本发明实施例1-3所制备得到自掺杂非化学计量比的二碲化钨的X射线衍射图谱,图中从下而上依次为实施例1中的掺钨非化学计量比二碲化钨样品、实施例2中的纯相二碲化钨样品和实施例3中的掺碲非化学计量比二碲化钨样品,实施例1中的掺钨非化学计量比二碲化钨样品的XRD图谱中的小号字体所标出的对应于钨的衍射峰,实施例3中的掺碲非化学计量比二碲化钨样品的XRD图谱中的小号字体所标出的对应于碲的衍射峰,X射线衍射图谱中大号字体所标出的对应于二碲化钨的衍射峰,与标准图谱对照发现,所制得的二碲化钨为[002]取向的二碲化钨材料。Figure 1 shows the X-ray diffraction pattern of the self-doped non-stoichiometric tungsten ditelluride prepared in Examples 1-3 of the present invention. The stoichiometric tungsten ditelluride sample, the pure-phase tungsten ditelluride sample in Example 2, and the non-stoichiometric tellurium-doped tungsten ditelluride sample in Example 3, the non-stoichiometric tungsten-doped tungsten sample in Example 1 The small font in the XRD pattern of the tungsten ditelluride sample corresponds to the diffraction peak of tungsten, and the small font in the XRD pattern of the tellurium-doped non-stoichiometric tungsten ditelluride sample in Example 3 is marked with a small font The diffraction peaks corresponding to tellurium shown, the diffraction peaks corresponding to tungsten ditelluride marked in large fonts in the X-ray diffraction pattern, compared with the standard atlas, it is found that the prepared tungsten ditelluride is [002] orientation tungsten ditelluride material.
图2所示为激光沿b轴方向激发本发明实施例2所制备得到的化学计量比纯相二碲化钨时的拉曼图谱。FIG. 2 shows the Raman spectrum of the pure phase tungsten ditelluride in the stoichiometric ratio prepared in Example 2 of the present invention when the laser is excited along the b-axis direction.
最后,以上仅为本发明的较佳实施方案,并非用于限定本发明的保护范围。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。Finally, the above are only preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.
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