CN109485254A - Alkali-free alumina silicate glass composition, alkali-free alumina silicate glass and its preparation method and application - Google Patents
Alkali-free alumina silicate glass composition, alkali-free alumina silicate glass and its preparation method and application Download PDFInfo
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- CN109485254A CN109485254A CN201811360031.2A CN201811360031A CN109485254A CN 109485254 A CN109485254 A CN 109485254A CN 201811360031 A CN201811360031 A CN 201811360031A CN 109485254 A CN109485254 A CN 109485254A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/004—Refining agents
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
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Abstract
The present invention relates to glass manufacturing areas, disclose alkali-free alumina silicate glass composition, alkali-free alumina silicate glass and its preparation method and application.On the basis of the integral molar quantity of the alkali-free alumina silicate glass composition, in terms of oxide, which contains the SiO of 65-73mol%2, 10-18mol% Al2O3, 6-10mol% B2O3, 1-9mol% MgO, 3-10mol% CaO, 1-6mol% SrO, 0.01-1.5mol% ZrO2With the Ta of 0.01-0.2mol%2O5.Alkali-free alumina silicate glass composition of the invention or alkali-free alumina silicate glass have lesser shrinking percentage and good crack resistance, can be obviously improved yield of the glass substrate in printing, filming process.
Description
Technical field
The present invention relates to glass arts, and in particular to a kind of alkali-free alumina silicate glass composition, alkali-free alumina silicate
Glass and its preparation method and application.
Background technique
In flat-panel display panel processing procedure, need in glass baseplate surface plating metal or sull, and substrate glass
Alkali metal ion in glass can spread to damage film characteristics into film, and therefore, base plate glass uses alkali-free glass.
As the requirement to flat-panel monitor image resolution ratio is higher and higher, corresponding glass substrate printing material, plating membrane material
The heat treatment temperature of material is also higher and higher, the printing material, plating membrane material if glass substrate shrinking percentage is excessively high, after the completion of being heat-treated
Material can deform, and seriously affect properties of product, therefore, it is necessary to the shrinking percentages of strict control glass substrate in more than ten ppm or so.
If the shrinking percentage of glass substrate is reduced to 10ppm hereinafter, glass substrate can be obviously improved in printing, filming process
Yield.Meanwhile existing TFT glass substrate has that crack resistance is poor, when measuring its crack resistance with microhardness tester,
It is easily cracked under 0.3kgf.
Accordingly, it is desirable to provide a kind of dimensionally stable and the excellent glass substrate of crack resistance.
Summary of the invention
The purpose of the invention is to overcome the problems such as glass substrate shrinking percentage of the existing technology is big, crack resistance is poor,
A kind of alkali-free alumina silicate glass composition, alumina silicate glass and its preparation method and application, the alumino-silicate glass are provided
Glass has lesser shrinking percentage and good crack resistance.
To achieve the goals above, in a first aspect, the present invention provides a kind of alkali-free alumina silicate glass composition, with
On the basis of the integral molar quantity of the alkali-free alumina silicate glass composition, in terms of oxide, the alkali-free alumina silicate glass group
Close the SiO that object contains 65-73mol%2, 10-18mol% Al2O3, 6-10mol% B2O3, 1-9mol% MgO, 3-
The ZrO of SrO, 0.01-1.5mol% of CaO, 1-6mol% of 10mol%2With the Ta of 0.01-0.2mol%2O5。
Preferably, on the basis of the integral molar quantity of the alkali-free alumina silicate glass composition, in terms of oxide, the alkali-free
Alumina silicate glass composition contains the SiO of 69-73mol%2, 10-14mol% Al2O3, 6-8mol% B2O3、1-
The ZrO of SrO, 0.02-0.1mol% of CaO, 1-3mol% of MgO, 3-9mol% of 5mol%2With 0.05-0.18mol%'s
Ta2O5。
Preferably, with molar percent, CaO+MgO+SrO is 6.5-12.5mol% and (CaO+MgO)/SrO > 3.
Preferably, the alkali-free alumina silicate glass composition also contains clarifying agent.
Preferably, the clarifying agent is SnO2And CeO.
Preferably, on the basis of the total mole number of each component, the SnO2Content be 0.05-0.3mol%, CeO's contains
Amount is 0.02-1.5mol%.
Second aspect, the present invention provides a kind of method for preparing alkali-free alumina silicate glass, this method includes sending out this
The bright alkali-free alumina silicate glass successively carries out melt process, forming processes, annealing and machining with composition
Processing.
Preferably, the drop-down extraction of the forming processes is 150-180m/ hours.
Preferably, the average cooling rate of the annealing is 360-400 DEG C/min.
The third aspect, the present invention provides the alkali-free alumina silicate glass that the above method is prepared.
Preferably, the alkali-free alumina silicate glass with a thickness of 0.3-0.6mm.
Preferably, the alkali-free alumina silicate glass is in 50-350 DEG C of thermal expansion coefficient less than 38 × 10-7/ DEG C, strain
Point is greater than 680 DEG C, 608 DEG C, the shrinking percentage under 8min be less than 8ppm, crack resistance is greater than 0.3kgf.
Fourth aspect, the present invention provides alkali-free alumina silicate glass composition of the present invention or alkali-free manosil ASs
Salt glass is preparing the application in display device and/or photoelectric device, preferably preparation TFT-LCD glass substrate and/or
Application in OLED glass substrate.
Alkali-free alumina silicate glass of the present invention has lesser shrinking percentage and good crack resistance, can be obviously improved glass
Yield of the glass substrate in printing, filming process.
Other features and advantages of the present invention will the following detailed description will be given in the detailed implementation section.
Specific embodiment
Detailed description of the preferred embodiments below.It should be understood that described herein specific
Embodiment is merely to illustrate and explain the present invention, and is not intended to restrict the invention.
In a first aspect, the present invention provides a kind of alkali-free alumina silicate glass composition, with the alkali-free alumina silicate glass
On the basis of the integral molar quantity of glass composition, in terms of oxide, which contains 65-
The SiO of 73mol%2, 10-18mol% Al2O3, 6-10mol% B2O3, 1-9mol% MgO, 3-10mol% CaO, 1-
The ZrO of SrO, 0.01-1.5mol% of 6mol%2With the Ta of 0.01-0.2mol%2O5。
In the preferred embodiments of the present invention, using the integral molar quantity of the alkali-free alumina silicate glass composition as base
Standard, in terms of oxide, which contains the SiO of 69-73mol%2, 10-14mol%
Al2O3, 6-8mol% B2O3, 1-5mol% MgO, 3-9mol% CaO, 1-3mol% SrO, 0.02-0.1mol%
ZrO2With the Ta of 0.05-0.18mol%2O5。
In alkali-free alumina silicate glass composition of the invention, SiO2It is glass former, if SiO2Content mistake
It is low, it is unfavorable for the enhancing of endurance, will cause that the coefficient of expansion is excessively high, strain point is too low, causes glass to be easy devitrification, while can band
It is too small to carry out glass high-temperature resistivity, joule heating effect weakens, and self-heating amount is made to be unable to reach the needs of fusing.Work as SiO2Contain
When amount increases, helps to reduce thermal expansion coefficient, improve strain point, enhancing endurance, increase high-temperature resistivity；But too high levels
It will also result in the fusion temperature raising of glass, high temperature viscosity dramatically increases, is unfavorable for the melting clarification of glass.In order to further mention
The strain point of high glass reduces thermal expansion coefficient, improves its chemical resistance, with the total of the alkali-free alumina silicate glass composition
On the basis of mole, in terms of oxide, SiO2Content be 65-73mol%, preferably 69-73mol%, further preferably
70-73mol%, specifically, such as can for 65mol%, 66mol%, 67mol%, 68mol%, 69mol%,
69.09mol%, 69.64mol%, 70mol%, 70.15mol%, 70.83mol%, 71.13mol%, 71.9mol%,
The arbitrary number in range that any two in 72.28mol%, 72.68mol%, 73mol% and these numerical value are constituted
Value.
In alkali-free alumina silicate glass composition of the invention, work as Al2O3Content it is too low when, it is glass heat resistance, resistance to
Chemical corrosion is poor, and Young's modulus is lower, and the coefficient of expansion is larger；Work as Al2O3Content increase when, help to improve glass and answer
Height, Young's modulus, light transmission rate etc., but too high levels can be such that the fusion temperature of glass increases, meltbility reduces, while liquid phase
Temperature increases, devitrification resistance reduces.In order to further increase strain point of glass, Young's modulus and the translucency for increasing glass, with
On the basis of the integral molar quantity of the alkali-free alumina silicate glass composition, in terms of oxide, Al2O3Content be 10-18mol%,
Preferably 10-14mol%, further preferably 10-13mol%, specifically, such as can for 10mol%, 10.05mol%,
10.22mol%, 10.77mol%, 11.54mol%, 11.88mol%, 12.32mol%, 13mol%, 13.02mol%,
Any two institute in 13.76mol%, 14mol%, 15mol%, 16mol%, 17mol%, 18mol% and these numerical value
Any number in the range of composition.
In alkali-free alumina silicate glass composition of the invention, B2O3It is glass former and flux constituents, adds
The coefficient of expansion for entering to improve the melting of glass, reducing devitrification temperature, reducing glass, improves the light transmission rate of glass.Therefore,
Strain point, chemical resistance and Young's modulus are comprehensively considered, using the integral molar quantity of the alkali-free alumina silicate glass composition as base
Standard, in terms of oxide, B2O3Content be 6-10mol%, preferably 6-8mol%, specifically, for example, can for 6mol%,
6.02mol%, 6.12mol%, 6.55mol%, 7.28mol%, 7.78mol%, 8mol%, 8.21mol%, 8.92mol%,
Any number in range that any two in 9.88mol%, 10mol% and these numerical value are constituted.
In alkali-free alumina silicate glass composition of the invention, MgO can reduce the thermal expansion coefficient and density of glass,
Facilitate the melting of glass.Relative to other alkaline-earth metal, MgO is to improve glass Young's modulus without increasing glass density and heat
The effective component of the coefficient of expansion.But the excessively high glass that will lead to of content of MgO generates calculus.Therefore, comprehensively consider, with the alkali-free aluminium silicon
On the basis of the integral molar quantity of silicate glass composition, in terms of oxide, the content of MgO is 1-9mol%, preferably 1-
5mol%, specifically, such as can for 1mol%, 1.04mol%, 1.14mol%, 2.16mol%, 2.4mol%,
2.56mol%, 2.99mol%, 3.22mol%, 4.85mol%, 5mol%, 6mol%, 7mol%, 8mol%, 9mol% with
And any number in the range that is constituted of any two in these numerical value.
In alkali-free alumina silicate glass composition of the invention, CaO is that have reduction high temperature viscosity, increase low temperature viscous
Degree is mainly used for adjusting the ingredient of glass processability.In alkaline-earth metal, CaO is to be only second to having for MgO to can be improved glass
Effective component of the glass Young's modulus without increasing glass density and thermal expansion coefficient.But CaO content is excessively high, and glass is easily analysed
Crystalline substance, and make glass embrittlement, thermal expansion coefficient also can substantially become larger.Therefore, comprehensively consider, with the alkali-free alumina silicate glass group
On the basis of the integral molar quantity for closing object, in terms of oxide, the content of CaO is 3-10mol%, preferably 3-9mol%, specifically, example
Such as can for 3mol%, 3.01mol%, 3.12mol%, 3.13mol%, 3.76mol%, 4.79mol%, 5.6mol%,
The model that any two in 7.83mol%, 8.86mol%, 9mol%, 9.5mol%, 10mol% and these numerical value are constituted
Any number in enclosing.
In alkali-free alumina silicate glass composition of the invention, SrO is that have to prevent glass from the main of crystallization occur
Ingredient.But the density of SrO too high levels, glass can become larger, and strain point will be greatly reduced.Therefore, comprehensively consider, with the nothing
On the basis of the integral molar quantity of alkali alumina silicate glass composition, in terms of oxide, the content of SrO is 1-6mol%, preferably
1-3mol%, specifically, such as can for 1mol%, 1.02mol%, 1.28mol%, 1.45mol%, 1.76mol%,
2.07mol%, 2.89mol%, 3mol%, 3.5mol%, 4mol%, 4.5mol%, 5mol%, 5.5mol%, 6mol% with
And any number in the range that is constituted of any two in these numerical value.
In alkali-free alumina silicate glass composition of the invention, ZrO2It is to promote glass to melt, improve glass Young
Modulus, the ingredient for reducing glass high-temperature resistivity, promoting stability, glass.Density that is excessive then will increase glass increases glass
Thermal expansion coefficient, reduce the stability of glass.Therefore, comprehensively consider, with the total of the alkali-free alumina silicate glass composition
On the basis of mole, in terms of oxide, ZrO2Content be 0.01-1.5mol%, preferably 0.02-0.1mol%, further
Preferably 0.03-0.07mol%, specifically, such as can for 0.01mol%, 0.02mol%, 0.03mol%,
0.04mol%, 0.05mol%, 0.06mol%, 0.07mol%, 0.08mol%, 0.09mol%, 0.1mol%,
Any two in 0.2mol%, 0.5mol%, 1mol%, 1.25mol%, 1.45mol%, 1.5mol% and these numerical value
Any number in range constituted.
In alkali-free alumina silicate glass composition of the invention, Ta2O5It is capable of the chemical stability and heat of reinforcing glass
Stability improves glass surface wellability, but excessively then crystallization easily occurs to content in glass.Therefore, comprehensively consider, with the nothing
On the basis of the integral molar quantity of alkali alumina silicate glass composition, in terms of oxide, Ta2O5Content be 0.01-0.2mol%,
Preferably 0.05-0.18mol%, specifically, such as can for 0.01mol%, 0.03mol%, 0.05mol%,
It is any in 0.06mol%, 0.08mol%, 0.1mol%, 0.15mol%, 0.18mol%, 0.2mol% and these numerical value
Any number in two ranges constituted.
In alkali-free alumina silicate glass composition of the invention, in order to further ensure glass has lesser contraction
Rate and good crack resistance, it is preferable that with molar percent, CaO+MgO+SrO is 6.5-12.5mol% and (CaO+MgO)/
SrO>3；It is highly preferred that CaO+MgO+SrO is 8.5-12.5mol%.
In alkali-free alumina silicate glass composition of the invention, the alkali-free alumina silicate glass composition also contains
There is clarifying agent.
In the preferred embodiments of the present invention, the clarifying agent is SnO2And CeO.It is with the total mole number of each component
Benchmark, the SnO2Content be 0.05-0.3mol%, preferably 0.05-0.25mol%；The content of CeO is 0.02-
1.5mol%, preferably 0.03-0.45mol%.
Second aspect, the present invention provides a kind of method for preparing alkali-free alumina silicate glass, this method includes sending out this
The bright alkali-free alumina silicate glass successively carries out melt process, forming processes, annealing and machining with composition
Processing.
In the method for the invention, it is preferable that the drop-down extraction of the forming processes is 150-180m/ hours；It is more excellent
Selection of land, the drop-down extraction of the forming processes are 155-175m/ hours.
In the method for the invention, it is preferable that the average cooling rate of the annealing is 360-400 DEG C/min；More
Preferably, the average cooling rate of the annealing is 365-390 DEG C/min.
The third aspect, the present invention provides the alkali-free alumina silicate glass that the above method is prepared.
Under preferable case, alkali-free alumina silicate glass of the invention with a thickness of 0.3-0.6mm.
Under preferable case, alkali-free alumina silicate glass of the invention is in 50-350 DEG C of thermal expansion coefficient less than 38 × 10-7/
DEG C, strain point is greater than 680 DEG C, 608 DEG C, the shrinking percentage under 8min be less than 8ppm, crack resistance is greater than 0.3kgf.
Fourth aspect, the present invention provides alkali-free alumina silicate glass composition of the present invention or alkali-free manosil ASs
Salt glass is preparing the application in display device and/or photoelectric device, preferably preparation TFT-LCD glass substrate and/or
Application in OLED glass substrate.
Embodiment
The present invention will be described in detail by way of examples below.It is unless otherwise instructed, used in following embodiment
Each material can be commercially available, and unless otherwise instructed, method used is the conventional method of this field.
In following embodiment and comparative example, the glass heat of 50-350 DEG C of horizontal expander instrument measurement is used referring to ASTM E-228
The coefficient of expansion, unit 10-7/℃。
Strain point of glass is measured using annealing point strain point tester referring to ASTM C-336, unit is DEG C.
The test method of shrinking percentage: under experimental temperature, the glass substrate sample of strip is put into high temperature furnace burner hearth, is protected
It holds and wants seeking time, take out glass substrate sample, cooled to room temperature measures the dimensional contraction in glass substrate sample plane direction
Rate, unit ppm.
The test method of crack resistance: on microhardness tester, diamond Vickers indenter is in glass base under test force
Plate surface keeps 15s, is more than that the minimum test force of 2 μm of crackles indicates the crack resistance of glass substrate with length is generated at impression, single
Position is kgf.
Embodiment 1-7
Each component is weighed according to shown in table 1, mixes, pours into platinum crucible, at 1700 DEG C or more, keeps the temperature 10h, and use
The stirring of platinum stick is discharged bubble and is homogenized glass metal, then injects in stainless steel mould the glass metal melted, is configured to
Defined both bulk glasses product, it is cooling after then glassware being annealed in the lehr 2 hours.Glassware is cut
It cuts, grind, polish, then cleaned up and dried with deionized water, the glass finished-product with a thickness of 0.5mm is made.Respectively to glass
Glass end properties is tested, and the results are shown in Table 1.
Embodiment 8-9
According to the method for embodiment 1, unlike, the performance of mixture ingredient (corresponding glass composition) and obtained product
Measurement result is shown in Table 2.
Comparative example 1-4
According to the method for embodiment 1, unlike, the performance of mixture ingredient (corresponding glass composition) and obtained product
Measurement result is shown in Table 2.
Table 1
Table 2
By embodiment it is found that the present invention utilizes the SiO containing certain content compared with the data of comparative example2、Al2O3、B2O3、
CaO、MgO、SrO、ZrO2And Ta2O3The glass that is prepared of composition there is lesser shrinking percentage and good crack resistance.This
The alkali-free alumina silicate glass composition or alkali-free alumina silicate glass of invention can be used for preparing display device and/or phototube
In part, particularly for preparation TFT-LCD glass substrate and/or OLED glass substrate.
The preferred embodiment of the present invention has been described above in detail, and still, the present invention is not limited thereto.In skill of the invention
In art conception range, can with various simple variants of the technical solution of the present invention are made, including each technical characteristic with it is any its
Its suitable method is combined, and it should also be regarded as the disclosure of the present invention for these simple variants and combination, is belonged to
Protection scope of the present invention.
Claims (11)
1. a kind of alkali-free alumina silicate glass composition, which is characterized in that with the alkali-free alumina silicate glass composition
On the basis of integral molar quantity, in terms of oxide, which contains the SiO of 65-73mol%2、10-
The Al of 18mol%2O3, 6-10mol% B2O3, 1-9mol% MgO, 3-10mol% CaO, 1-6mol% SrO,
The ZrO of 0.01-1.5mol%2With the Ta of 0.01-0.2mol%2O5。
2. alkali-free alumina silicate glass composition according to claim 1, which is characterized in that with the alkali-free alumina silicate
On the basis of the integral molar quantity of glass composition, in terms of oxide, which contains 69-
The SiO of 73mol%2, 10-14mol% Al2O3, 6-8mol% B2O3, 1-5mol% MgO, 3-9mol% CaO, 1-
The ZrO of SrO, 0.02-0.1mol% of 3mol%2With the Ta of 0.05-0.18mol%2O5。
3. alkali-free alumina silicate glass composition according to claim 1 or 2, which is characterized in that with molar percentage
Meter, CaO+MgO+SrO are 6.5-12.5mol% and (CaO+MgO)/SrO > 3.
4. alkali-free alumina silicate glass composition described in any one of -3 according to claim 1, which is characterized in that described
Alkali-free alumina silicate glass composition also contains clarifying agent；
Preferably, the clarifying agent is SnO2And CeO；
It is further preferred that on the basis of the total mole number of each component, the SnO2Content be 0.05-0.3mol%, CeO's
Content is 0.02-1.5mol%.
5. a kind of method for preparing alkali-free alumina silicate glass, which is characterized in that this method includes will be any in claim 1-4
Alkali-free alumina silicate glass described in one successively carries out melt process, forming processes, annealing and machinery with composition and adds
Work processing.
6. according to the method described in claim 5, it is characterized in that, the drop-down extraction of the forming processes is 150-180m/
Hour.
7. method according to claim 5 or 6, which is characterized in that the average cooling rate of the annealing is 360-
400 DEG C/min.
8. the alkali-free alumina silicate glass that method described in any one of claim 5-7 is prepared.
9. alkali-free alumina silicate glass according to claim 8, which is characterized in that the thickness of the alkali-free alumina silicate glass
Degree is 0.3-0.6mm.
10. alkali-free alumina silicate glass according to claim 9, which is characterized in that the alkali-free alumina silicate glass exists
50-350 DEG C of thermal expansion coefficient is less than 38 × 10-7/ DEG C, strain point is greater than 680 DEG C, and 608 DEG C, the shrinking percentage under 8min is less than
8ppm, crack resistance are greater than 0.3kgf.
11. appointing in alkali-free alumina silicate glass composition described in any one of claim 1-4 or claim 8-10
Alkali-free alumina silicate glass described in meaning one is preparing the application in display device and/or photoelectric device, is preferably preparing
Application in TFT-LCD glass substrate and/or OLED glass substrate.
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| CN201811360031.2A CN109485254A (en) | 2018-11-15 | 2018-11-15 | Alkali-free alumina silicate glass composition, alkali-free alumina silicate glass and its preparation method and application |
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| CN201811360031.2A CN109485254A (en) | 2018-11-15 | 2018-11-15 | Alkali-free alumina silicate glass composition, alkali-free alumina silicate glass and its preparation method and application |
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| US5326730A (en) * | 1993-01-22 | 1994-07-05 | Corning Incorporated | Barium aluminosilicate glasses |
| US20080110208A1 (en) * | 2006-11-13 | 2008-05-15 | Adam James Gillmar Ellison | Alkali-free glasses containing iron and tin as fining agents |
| CN101439930A (en) * | 2008-12-19 | 2009-05-27 | 成都光明光电股份有限公司 | Optical glass for precise compression molding |
| CN101591141A (en) * | 2008-05-30 | 2009-12-02 | 康宁股份有限公司 | Boroalumino silicate glasses |
| CN102603183A (en) * | 2005-06-28 | 2012-07-25 | 康宁股份有限公司 | Fining of boroalumino silicate glasses |
| CN105916825A (en) * | 2012-02-28 | 2016-08-31 | 康宁股份有限公司 | High strain point aluminosilicate glasses |
| CN106746600A (en) * | 2011-08-12 | 2017-05-31 | 康宁股份有限公司 | Fusible shaping, not alkali metal containing, the glass with intermediate thermal expansion coefficient |
| US20170152170A1 (en) * | 2014-10-31 | 2017-06-01 | Corning Incorporated | Dimensionally stable fast etching glasses |
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2018
- 2018-11-15 CN CN201811360031.2A patent/CN109485254A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5326730A (en) * | 1993-01-22 | 1994-07-05 | Corning Incorporated | Barium aluminosilicate glasses |
| CN102603183A (en) * | 2005-06-28 | 2012-07-25 | 康宁股份有限公司 | Fining of boroalumino silicate glasses |
| US20080110208A1 (en) * | 2006-11-13 | 2008-05-15 | Adam James Gillmar Ellison | Alkali-free glasses containing iron and tin as fining agents |
| CN101591141A (en) * | 2008-05-30 | 2009-12-02 | 康宁股份有限公司 | Boroalumino silicate glasses |
| CN101439930A (en) * | 2008-12-19 | 2009-05-27 | 成都光明光电股份有限公司 | Optical glass for precise compression molding |
| CN106746600A (en) * | 2011-08-12 | 2017-05-31 | 康宁股份有限公司 | Fusible shaping, not alkali metal containing, the glass with intermediate thermal expansion coefficient |
| CN105916825A (en) * | 2012-02-28 | 2016-08-31 | 康宁股份有限公司 | High strain point aluminosilicate glasses |
| US20170152170A1 (en) * | 2014-10-31 | 2017-06-01 | Corning Incorporated | Dimensionally stable fast etching glasses |
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