CN109470577A - The method of TATB base PBX internal stress is characterized under power-heat effect - Google Patents
The method of TATB base PBX internal stress is characterized under power-heat effect Download PDFInfo
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- CN109470577A CN109470577A CN201811319457.3A CN201811319457A CN109470577A CN 109470577 A CN109470577 A CN 109470577A CN 201811319457 A CN201811319457 A CN 201811319457A CN 109470577 A CN109470577 A CN 109470577A
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- JDFUJAMTCCQARF-UHFFFAOYSA-N tatb Chemical compound NC1=C([N+]([O-])=O)C(N)=C([N+]([O-])=O)C(N)=C1[N+]([O-])=O JDFUJAMTCCQARF-UHFFFAOYSA-N 0.000 title claims abstract description 77
- 238000000034 method Methods 0.000 title claims abstract description 50
- 230000000694 effects Effects 0.000 title claims abstract description 21
- 230000035882 stress Effects 0.000 claims abstract description 67
- 239000013078 crystal Substances 0.000 claims abstract description 48
- 238000001683 neutron diffraction Methods 0.000 claims abstract description 26
- 238000012512 characterization method Methods 0.000 claims abstract description 13
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 206010057040 Temperature intolerance Diseases 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/08—Investigating strength properties of solid materials by application of mechanical stress by applying steady tensile or compressive forces
- G01N3/18—Performing tests at high or low temperatures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
- G01N23/046—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/201—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering
- G01N23/202—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials by measuring small-angle scattering using neutrons
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
- G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N3/02—Details
- G01N3/06—Special adaptations of indicating or recording means
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/0058—Kind of property studied
- G01N2203/0069—Fatigue, creep, strain-stress relations or elastic constants
- G01N2203/0075—Strain-stress relations or elastic constants
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
- G01N2203/022—Environment of the test
- G01N2203/0222—Temperature
- G01N2203/0228—Low temperature; Cooling means
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N2203/02—Details not specific for a particular testing method
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- G01N2203/0641—Indicating or recording means; Sensing means using optical, X-ray, ultraviolet, infrared or similar detectors
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- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
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- G01N2203/067—Parameter measured for estimating the property
- G01N2203/0676—Force, weight, load, energy, speed or acceleration
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
- G01N2203/06—Indicating or recording means; Sensing means
- G01N2203/067—Parameter measured for estimating the property
- G01N2203/0682—Spatial dimension, e.g. length, area, angle
Abstract
The invention discloses the methods that TATB base PBX internal stress is characterized under power-heat effect, include the following steps: to carry out PBX mechanical stress in situ/thermal stress load, the lattice lattice parameter of TATB crystal is obtained using neutron diffraction techniques, obtains mechanical stress, the relationship of temperature and TATB lattice lattice parameter;Meanwhile the microscopical structure of PBX is obtained using internal microstructure characterization technique;The performance inflection point of PBX, TATB crystal response Behavior law inside the final PBX obtained under coupling thermal and mechanical effect are obtained by mechanical stress, the relationship of temperature and TATB lattice lattice parameter and microscopical structure.Neutron diffraction techniques are introduced energetic material research field for the first time by the present invention, the lattice parameters such as displacement, widthization, the asymmetry at TATB crystal diffraction peak in PBX under non-intrusion type Nondestructive observation mechanical stress/thermal stress provide the parameter on basis for the macro property assessment of energetic material.
Description
Technical field
The present invention relates to a kind of characterizing methods of explosive internal stress, and in particular to TATB base is characterized under a kind of power-heat effect
The method of plastic bonded explosive internal stress.
Background technique
TATB (1,3,5- triamido -2,4,6- trinitrobenzen) is that the currently the only insensitiveness approved by U.S. Department of Energy is fried
Medicine has good safety and stability because its mechanical sensitivity and heat sensitivity are lower.With TATB powder crystal (TATB
Powder crystals) be base plastic bonded explosive (Polymer bonded explosive, PBX) it is military at home and abroad
Device industry is used widely, and at home and abroad always around its structural safety performance, mechanical property and Study on Detonation Performance
It is hot spot.
TATB base PBX is TATB that TATB explosive crystal and bonding agent are granulated into certain grain size distribution with water suspension method
Grain (TATB granules) compression moulding afterwards.Because ambient pressure acts in forming process, different degrees of elastoplasticity occurs and becomes
Shape can put aside certain elastic strain energy after pressure removal, generate internal stress.The performance difference of TATB explosive crystal and binder
Very big, this makes PBX be different from traditional particles filled formula composite material, there is some special mechanical properties, from a large amount of thin sights
It is a kind of fragile material containing initial damage that observation and experiment of machanics result, which can be seen that PBX,.PBX adds in cold-heat treatment, machinery
Will receive various mechanical, temperature loading effects in work, transport, use and storage process, inside all there may be internal stress.
Internal stress will cause initial damage and further develop, with reinforcement fracture, interfacial detachment, binder matrix cracking, deformation twins with
And the forms such as shear band deteriorate the mechanical property of explosive, decline the strength and stiffness of structure.Under lasting load effect,
Various forms of damages meeting further growths, polymerization, form macroscopic cracking, eventually lead to material damage.
TATB base PBX is polycrystalline, the multiple solutions, heterogeneous, low-intensity by the bonding aggregation of numerous TATB powder crystals
Complex system, intensity are lower (compression strength is less than 45MPa, and tensile strength is less than 10MPa).Internal stress will affect inside PBX
The mechanical behavior of each component, and the change of the mechanical behavior of each component is its changed principal element of macroscopic view inside PBX.It is right
The research of PBX system mechanical behavior must be possible to establish more accurate mechanical model from microscopical structure:
(1) TATB has plane molecular structure, and crystal category anorthic system has the layer structure similar to graphite,
It there are stronger hydrogen bond action between same layer TATB molecule, is tightly combined, and acts on very weak between different layer, this anisotropy makes
Multi-crystal system response mechanism becomes complicated.TATB crystal belongs to fragile material, and as the high polymer of binder with very good
Toughness, larger deformation can be born, can play the role of cohering blasting explosive granules and transmitting stress.TATB crystal structure is not right
Claim, under the conditions of temperature increases, anisotropic expansion will occur, the anisotropic expansion of crystal is to lead to PBX thermal deformation, inside
The key factor of micro-crack etc..The mechanical behavior of each component has codetermined the macro property of PBX system inside PBX.
(2) PBX (PBX comprising TATB base) substance mechanical characteristic is generally built upon constitutive relationship of stress-strain basis
On, not careful consideration explosive crystal, binder, deterrent and plasticizer etc. carefully see factor, each inside PBX under power-heat effect
The mechanical response characteristic of having differences property of component, therefore study extraneous thermal stress, the lower inside the PBX TATB strain of mechanical stress effect
Response pattern is of great significance, and intensification is energetic material to the understanding of such compound system structure and performance change by this
Macro property assessment and material microstructure simulation provide the parameter on basis.
In conclusion TATB base PBX belongs to typical polycrystalline multiple solutions heterogeneous material, the lower (compression strength of intensity
Less than 45MPa, tensile strength be less than 10MPa), PBX system carefully see each component thermal response with diversity and difference it is obvious, it is comprehensive
It takes a group photo and rings macro-mechanical property, studying these has very important science and engineering significance.
Summary of the invention
The purpose of the present invention is to provide one kind by carrying out PBX neutron diffraction lattice parameter experimental study, establishes mechanical
It is brilliant to obtain TATB inside the PBX under power-thermal coupling effect for stress, thermal stress and TATB crystal neutron diffraction lattice parameter relationship
The method of body respondent behavior rule.
The present invention is implemented as follows:
The method that TATB base PBX internal stress is characterized under power-heat effect, includes the following steps:
Mechanical stress in situ/thermal stress load is carried out to PBX, the lattice-site of TATB crystal is obtained using neutron diffraction techniques
Battle array parameter, obtains mechanical stress, the relationship of temperature and TATB lattice lattice parameter;
Meanwhile the microscopical structure of PBX is obtained using internal microstructure characterization technique;
It is turned by the performance that mechanical stress, the relationship of temperature and TATB lattice lattice parameter and microscopical structure obtain PBX
Point, the final inside the PBX TATB crystal response Behavior law obtained under coupling thermal and mechanical effect.
Further scheme is:
The neutron diffraction techniques, specifically:
Using neutron stress diffraction screen, PBX external environment is controlled are as follows: -55 DEG C to 200 DEG C of temperature, mechanical stress 0MPa
~40Mpa obtains the inside PBX TATB lattice lattice parameter under composite force, thermal environment.
Further scheme is:
The relationship of mechanical stress, temperature and TATB lattice lattice parameter, obtains particular by following method:
The change of stress and temperature will lead to the change of spacing of lattice, and neutron diffraction measures the lattice between crystallographic plane
Spacing, so that elastic strain is exported, then according to strain calculation stress and thermal expansion coefficient.When crystalline material by with its crystal face
When the radiation exposure of spacing close-spaced wavelength, ray will be diffracted to form specific bragg peak, the angle that diffracted ray generates
It is provided by Bragg diffraction law:
2dhkl sinθhkl=λ (1)
In formula: λ is beam wavelength;dhklFor (hkl) interplanar distance for generating bragg peak;θhklFor Bragg angle.
The observation position of diffraction maximum and incident beam are at 2 θhklAngle, strain measurement are on the direction of Scattering of Vector, it divides equally
The angle of incident beam and diffracted beam.The variation for measuring interplanar distance d from sample can calculate the size of strain stress:
In formula, d0For the interplanar distance value of unstressed standard sample.
To the neutron that stationary reactor generates, the neutron beam of a certain fixed wave length, sample interplanar distance are selected with monochromator
Variation (Δ d) can cause corresponding diffraction maximum peak position offset (Δ θ).The diffraction of a certain crystal face of sample is measured in this way
Peak, and determine using Gauss/Lorentz lorentz's fit procedure the peak position of diffraction maximum.Therefore elastic strain are as follows:
In formula, θ0For the peak position at the Bragg diffraction peak of unstressed standard sample.
When known to principal direction, the measurement in 3 directions determines a complete stress tensor enough.
In formula, E is elasticity modulus, and v is Poisson's ratio, εxx、εyyAnd εzzIt is the bullet that 3 directions in space are measured from sample respectively
Property strain.
Obtaining TATB explosive crystal mechanical stress/temperature under rarefaction with TATB crystal neutron diffraction lattice parameter is
Linear relationship.
Further scheme is:
The internal microstructure characterization technique includes: that scanning electron microscope (SEM) technology, Microfocus X-ray x-ray tomography are swept
Retouch (μ CT) technology, neutron small angle scattering (SANS) technology etc..
Scanning electron microscope (SEM) technology is a kind of common observation method, be commonly used to the material of 10nm~1mm into
Row microscopic sdIBM-2+2q.p.approach is, it can be achieved that the high-precision of PBX section is observed.
Microfocus X-ray x-ray tomography (μ CT) technology is that a kind of lossless acquisition material internal (Asia) micro-meter scale of energy is three-dimensional
The technology of structural information.It can realize that PBX underbead crack, hole etc. lack in conjunction with the FInite Element and image digitization correlation method of CT image
Fall into Accurate Model and displacement field precise measurement.
Neutron small angle scattering (SANS) technology is a kind of powerful that quantitatively characterizing can be carried out to material porosity rate, it can
To differentiate an open and close porosity, to obtain whole porosities and the more accurate measurement result of surface area.Carry out the small angle of neutron
Diffraction characterization technique research realizes the quantitative analysis of PBX Micro-v oid.
Above-mentioned technology is the more mature prior art at present, and the present invention can choose one of them or several obtain
Obtain the microscopical structure of PBX.For the field conventional scheme that bases on practicality of above-mentioned technology, details are not described herein again.
Further scheme is:
The performance inflection point is the inflection point of the PBX microscopical structure variation obtained by internal microstructure characterization technique.
Characteristic and innovation of the invention is that neutron diffraction techniques are introduced energetic material research field for the first time, non-to invade
Enter under formula Nondestructive observation mechanical stress/thermal stress the dot matrix such as displacement, widthization, the asymmetry at TATB crystal diffraction peak in PBX to join
Number, TATB crystal and binder are in different mechanical stress loads and temperature load phase from meso-scale research PBX system
Role, analyses in depth the respondent behaviors such as lattice strain, the thermal expansion of TATB crystal and TATB crystal and binder are mutual
The thermodynamics Evolution of function, for energetic material macro property assessment provide basis parameter, will be disclose PBX this
Kind has the characteristics that the primary innovation of the high fillibility Compound Material Engineering meso-scale research mode of multiple dimensioned, unordered micro-structure.
Detailed description of the invention
Fig. 1 is method flow schematic diagram of the invention;
Fig. 2 is neutron diffraction-original position power-heat effect synchronous scanning schematic diagram of one embodiment of the invention.
Specific embodiment
The present invention is further illustrated in the following with reference to the drawings and specific embodiments.
As shown in Fig. 1, the present invention provides a kind of methods that TATB base PBX internal stress is characterized under power-heat effect, including
Following steps:
Mechanical stress in situ/thermal stress load is carried out to PBX, the lattice-site of TATB crystal is obtained using neutron diffraction techniques
Battle array parameter, obtains mechanical stress, the relationship of temperature and TATB lattice lattice parameter;
Meanwhile the microscopical structure of PBX is obtained using internal microstructure characterization technique;
It is turned by the performance that mechanical stress, the relationship of temperature and TATB lattice lattice parameter and microscopical structure obtain PBX
Point, the final inside the PBX TATB crystal response Behavior law obtained under coupling thermal and mechanical effect.
Each specific steps of the invention are described in detail below.
(1) PBX in situ neutron diffraction under power, heat condition
PBX belongs to low-intensity material, and compressive strength is less than 45MPa, tensile strength is less than 10MPa;PBX Performance Assessment temperature
Range is -55 DEG C~200 DEG C;In addition PBX is suitable for carrying out small sample test there are also risk of explosion under the condition of high temperature;In adding
Requirement of the sub- diffraction method to homeostatic reaction neutron pile.The present invention is based on China Engineering Physics Research Institute's nuclear physics and chemical research
Neutron stress diffraction screen, realize in composite force, thermal environment (- 55 DEG C of temperature~200 DEG C, mechanical stress 0MPa~
40MPa) TATB lattice lattice parameter nondestructive characterisation (NDC) inside PBX.
Wherein, neutron stress diffraction screen is using in Inst. of Nuclear Physics and Chemistry, Chinese Engineering Physics Research Ins
Sub- stress diffraction screen, spectrometer resolution ax d/d are 0.2%, 50 μ ε of strain resolution, neutron streaming intensity at sample position:
Neutron wavelength range: 0.12nm~0.28nm, specification (sampling) body is adjusted in 4.7 × 106n ﹒ cm-2 ﹒ s-1 (heap power 20MW)
Product range: 0.5mm × 0.5mm × 0.5mm~5mm × 5mm × 20mm, sample stage maximum capacity: 500kg has 5 freedom degrees
(X-Y moves horizontally ± 300mm, and Z goes up and down 500mm, 0 °~360 ° of rotation, ± 30 ° of inclinations), can use diffraction angular region: 0 °~
140°.According to " the neutron diffraction side of non-destructive testing measurement residual stress 26140-2010/ISO/TS of GB/T 21432:2005
Method " neutron diffraction internal stress measuring is carried out to sample, the spacing of lattice between crystallographic plane is measured by neutron diffraction, from crystalline substance
Compartment away from change, export elastic strain, then according to strain calculation stress.
The working principle of neutron stress diffraction screen has in above-mentioned national standard to be introduced in detail.
It, can be using the conventional experimental provision that can be realized heating power loading effect, as long as can guarantee PBX in the present invention
In situ neutron diffraction is carried out within the scope of the temperature and mechanical stress met the requirements.
In order to realize in mechanical load environment inside (mechanical stress 0MPa~40MPa) PBX TATB lattice lattice parameter without
Damage characterization, it is desirable that mechanical load unit is with the stretching in 2mm*2mm*2mm-30mm*30mm*30mm sample size range, pressure
Contracting (uniaxial compression/disk compression), 3 points, four kinds of load load capabilities of four-point bending, provide replaceable fixture;Mechanical loading
Ability (stretching/compressing) is not less than 5KN, accuracy of reading 1%, and loading force minimum resolution amount is not more than 1N;Jaw travel is not small
In 20mm, velocity of displacement range is 0.1mm/min to 2mm/min.
In order to realize in high/low temperature loading environment, TATB lattice lattice parameter is lossless inside (- 55 DEG C of temperature~200 DEG C) PBX
Characterization, it is desirable that 200 DEG C of -55 DEG C~﹢ of high/low temperature loading unit high/low temperature loading range, accuracy of reading are not more than 1 DEG C, temperature fluctuation
No more than 1 DEG C, temperature hold-time is not less than 20 hours, provides the settling mode of automatic temperature-adjusting control.
Based on the above-mentioned requirement for mechanical load (power load) and high/low temperature load (heat loads), those skilled in the art
Heat, power can be loaded as long as can satisfy PBX according to the relevant heating power loading experimental apparatus of above-mentioned requirements designed, designed
It is required that.
(3) mechanical stress/temperature and TATB crystal neutron diffraction lattice parameter relationship experiments are studied
The change of stress and temperature will lead to the change of spacing of lattice, and neutron diffraction measures the lattice between crystallographic plane
Spacing, so that elastic strain is exported, then according to strain calculation stress and thermal expansion coefficient.When crystalline material by with its crystal face
When the radiation exposure of spacing close-spaced wavelength, ray will be diffracted to form specific bragg peak, the angle that diffracted ray generates
It is provided by Bragg diffraction law:
2dhkl sinθhkl=λ (1)
In formula: λ is beam wavelength;dhklFor (hkl) interplanar distance for generating bragg peak;θhklFor Bragg angle.
The observation position of diffraction maximum and incident beam are at 2 θhklAngle, strain measurement are on the direction of Scattering of Vector, it divides equally
The angle of incident beam and diffracted beam.The variation for measuring interplanar distance d from sample can calculate the size of strain stress:
In formula, d0For the interplanar distance value of unstressed standard sample.
To the neutron that stationary reactor generates, the neutron beam of a certain fixed wave length, sample interplanar distance are selected with monochromator
Variation (Δ d) can cause corresponding diffraction maximum peak position offset (Δ θ).The diffraction of a certain crystal face of sample is measured in this way
Peak, and determine using Gauss/Lorentz lorentz's fit procedure the peak position of diffraction maximum.Therefore elastic strain are as follows:
In formula, θ0For the peak position at the Bragg diffraction peak of unstressed standard sample.
When known to principal direction, the measurement in 3 directions determines a complete stress tensor enough.
In formula, E is elasticity modulus, and v is Poisson's ratio, εxx、εyyAnd εzzIt is the bullet that 3 directions in space are measured from sample respectively
Property strain.
TATB explosive crystal mechanical stress/temperature and TATB crystal neutron diffraction lattice parameter under rarefaction are linear
Relationship;And power-thermal response of the TATB explosive crystal under polycrystalline compacting PBX system status is then more complicated.
(4) the accurate characterizing method of PBX microscopical structure
This project combination meso-scale precision characterizing method grasps the inflection point of microscopical structure variation, realizes to the inside PBX
The Accurate Analysis of the different thermal response behaviors of TATB crystal provides experiment for the research of TATB crystal dynamics Behavior law and supports.
Wherein:
Scanning electron microscope (SEM) technology is a kind of common observation method, be commonly used to the material of 10nm~1mm into
Row microscopic sdIBM-2+2q.p.approach is, it can be achieved that the high-precision of PBX section is observed.
Microfocus X-ray x-ray tomography (μ CT) technology is that a kind of lossless acquisition material internal (Asia) micro-meter scale of energy is three-dimensional
The technology of structural information.It can realize that PBX underbead crack, hole etc. lack in conjunction with the FInite Element and image digitization correlation method of CT image
Fall into Accurate Model and displacement field precise measurement.
Neutron small angle scattering (SANS) technology is a kind of powerful that quantitatively characterizing can be carried out to material porosity rate, it can
To differentiate an open and close porosity, to obtain whole porosities and the more accurate measurement result of surface area.Carry out the small angle of neutron
Diffraction characterization technique research realizes the quantitative analysis of PBX Micro-v oid.
(5) TATB crystal response Behavior law research in the PBX under power-thermal coupling effect
Since PBX system is under mechanical stress and temperature action, TATB crystal and binder play different roles, special
It is not highly-filled TATB crystal, characteristic and complicated system environment due to itself, in conjunction under Thermal-mechanical Coupling effect
TATB lattice parameter, microscopical structure variation can more further investigate TATB crystal response Behavior law, assess for macro property
The parameter on basis is provided.
The present invention is answered from loose TATB crystal mechanical stress/temperature-responsive research largely carrying out the original position PBX machinery
On the basis of the mechanical response rule of its internal TATB crystal is tested and grasped in power load neutron diffraction, gradually to alternating temperature item in situ
TATB Crystal study gos deep into PBX under part, and the accurate characterizing method development in conjunction with PBX microscopical structure is compound for Li-heat of PBX
Load in situ and experimental data analytic technique, grasp TATB crystal neutron diffraction lattice parameter changing rule, deepen understanding PBX and exist
It is defeated to provide experimental data for PBX macro property evaluation criteria for internal stress response pattern under the changes in environmental conditions such as power, heat
Enter.
Although reference be made herein to invention has been described for explanatory embodiment of the invention, and above-described embodiment is only this hair
Bright preferable embodiment, embodiment of the present invention are not limited by the above embodiments, it should be appreciated that those skilled in the art
Member can be designed that a lot of other modification and implementations, these modifications and implementations will fall in principle disclosed in the present application
Within scope and spirit.
Claims (5)
1. characterizing the method for TATB base PBX internal stress under a kind of power-heat effect, it is characterised in that include the following steps:
Mechanical stress in situ/thermal stress load is carried out to PBX, is joined using the lattice dot matrix that neutron diffraction techniques obtain TATB crystal
Number obtains mechanical stress, the relationship of temperature and TATB lattice lattice parameter;
Meanwhile the microscopical structure of PBX is obtained using internal microstructure characterization technique;
The performance inflection point of PBX is obtained by mechanical stress, the relationship of temperature and TATB lattice lattice parameter and microscopical structure, most
TATB crystal response Behavior law inside the PBX under coupling thermal and mechanical effect is obtained eventually.
2. the method for TATB base PBX internal stress is characterized under power-heat effect according to claim 1, it is characterised in that:
The neutron diffraction techniques, specifically:
Using neutron stress diffraction screen, PBX external environment is controlled are as follows: -55 DEG C to 200 DEG C of temperature, mechanical stress 0MPa~
40Mpa obtains the inside PBX TATB lattice lattice parameter under composite force, thermal environment.
3. the method for TATB base PBX internal stress is characterized under power-heat effect according to claim 2, it is characterised in that:
The relationship of mechanical stress, temperature and TATB lattice lattice parameter, obtains particular by following method:
The change of stress and temperature will lead to the change of spacing of lattice, and neutron diffraction measures between the lattice between crystallographic plane
Away from so that elastic strain is exported, then according to strain calculation stress and thermal expansion coefficient;When crystalline material by with its interplanar
When radiation exposure away from close-spaced wavelength, ray will be diffracted to be formed specific bragg peak, the angle that diffracted ray generates by
Bragg diffraction law provides:
2dhkl sinθhkl=λ (1)
In formula: λ is beam wavelength;dhklFor the hkl interplanar distance for generating bragg peak;θhklFor Bragg angle;
The observation position of diffraction maximum and incident beam are at 2 θhklAngle, strain measurement are on the direction of Scattering of Vector, it divides incidence equally
The angle of beam and diffracted beam;The variation for measuring interplanar distance d from sample can calculate the size of strain stress:
In formula, d0For the interplanar distance value of unstressed standard sample;
To the neutron that stationary reactor generates, the neutron beam of a certain fixed wave length, the change of sample interplanar distance are selected with monochromator
Corresponding diffraction maximum peak position shifted by delta θ can be caused by changing Δ d;The diffraction maximum of a certain crystal face of sample is measured in this way, and is used
Gauss/Lorentz lorentz's fit procedure determines the peak position of diffraction maximum;Therefore elastic strain are as follows:
In formula, θ0For the peak position at the Bragg diffraction peak of unstressed standard sample;
When known to principal direction, the measurement in 3 directions determines a complete stress tensor enough;
In formula, E is elasticity modulus, and v is Poisson's ratio, εxx、εyyAnd εzzIt is to measure the elasticity in 3 directions in space from sample to answer respectively
Become;
It is linear for obtaining TATB explosive crystal mechanical stress/temperature and TATB crystal neutron diffraction lattice parameter under rarefaction
Relationship.
4. the method for TATB base PBX internal stress is characterized under power-heat effect according to claim 1, it is characterised in that:
The internal microstructure characterization technique include: Scanning electron microscopy, Microfocus X-ray x-ray tomography technology or in
Sub- small-angle scattering technology.
5. the method for TATB base PBX internal stress is characterized under power-heat effect according to claim 1, it is characterised in that:
The performance inflection point is the inflection point of the PBX microscopical structure variation obtained by internal microstructure characterization technique.
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