CN109449181B - Display substrate, manufacturing method thereof and display device - Google Patents
Display substrate, manufacturing method thereof and display device Download PDFInfo
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- CN109449181B CN109449181B CN201811266874.6A CN201811266874A CN109449181B CN 109449181 B CN109449181 B CN 109449181B CN 201811266874 A CN201811266874 A CN 201811266874A CN 109449181 B CN109449181 B CN 109449181B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/50—OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
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Abstract
The invention provides a display substrate, a manufacturing method thereof and a display device, and belongs to the technical field of display. Wherein, the display substrate includes: a substrate base plate; the thin film transistor and the signal wire are positioned on the substrate base plate; the shading metal pattern is positioned on one side, away from the substrate, of the thin film transistor and the signal wiring; the light-emitting unit is positioned on one side, far away from the substrate base plate, of the light-shielding metal pattern and comprises an anode, a cathode and a light-emitting layer positioned between the anode and the cathode; the shading metal pattern comprises an imaging hole and an opening, and the anode is connected with the signal wiring through the opening; the display substrate further includes: and the light-shielding insulating layer is positioned between the light-emitting layer and the substrate base plate, and the orthographic projection of the opening on the substrate base plate falls into the orthographic projection of the light-shielding insulating layer on the substrate base plate. The technical scheme of the invention can improve the fingerprint identification precision.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display substrate, a manufacturing method thereof and a display device.
Background
In the existing OLED (organic light emitting diode) display substrate, in order to realize fingerprint identification, a second source drain metal layer is used for shading light, a small hole for imaging is formed in the second source drain metal layer, and light rays emitted by a light emitting layer can be reflected by a finger and then imaged through the small hole, so that the purpose of fingerprint identification is achieved. However, the first source-drain metal layer pattern needs to be connected with the anode, so that the function of the thin film transistor for driving the light emitting layer to emit light is realized, and after the second source-drain metal layer is used for making the whole light shielding layer, the connection between the first source-drain metal layer pattern and the anode is blocked, therefore, a space larger than 0.6um needs to be reserved between the metal connecting line between the first source-drain metal layer pattern and the anode and the opening edge of the second source-drain metal layer in the area where the first source-drain metal layer pattern is connected with the anode, so that the second source-drain metal layer is opened, and meanwhile, the process stability is considered, a space larger than 0.6um needs to be reserved between the metal connecting line between the first source-drain metal layer pattern and the anode and the opening edge of.
Disclosure of Invention
The invention aims to provide a display substrate, a manufacturing method thereof and a display device, which can improve the accuracy of fingerprint identification.
To solve the above technical problem, embodiments of the present invention provide the following technical solutions:
in one aspect, a display substrate is provided, including:
a substrate base plate;
the thin film transistor and the signal wire are positioned on the substrate base plate;
the shading metal pattern is positioned on one side, away from the substrate, of the thin film transistor and the signal wiring;
the light-emitting unit is positioned on one side, far away from the substrate base plate, of the light-shielding metal pattern and comprises an anode, a cathode and a light-emitting layer positioned between the anode and the cathode;
the shading metal pattern comprises an imaging hole and an opening, and the anode is connected with the signal wiring through the opening;
the display substrate further includes:
and the light-shielding insulating layer is positioned between the light-emitting layer and the substrate base plate, and the orthographic projection of the opening on the substrate base plate falls into the orthographic projection of the light-shielding insulating layer on the substrate base plate.
Further, the light-shielding insulating layer is multiplexed as a first flat layer between the light-shielding metal pattern and the thin film transistor.
Further, the light-shielding insulating layer is multiplexed as a second flat layer between the light-shielding metal pattern and the light-emitting unit.
Further, the light-shielding insulating layer has an optical density of more than 2.
Further, the display substrate further includes:
and the band-pass filter is arranged on one side of the substrate base plate, which is far away from the thin film transistor.
The embodiment of the invention also provides a display device which comprises the display substrate.
Further, the display device further includes:
and the light sensor is positioned on one side of the substrate base plate, which is far away from the thin film transistor, and a band-pass filter is arranged on one side of the light sensor, which faces the substrate base plate.
The embodiment of the invention also provides a manufacturing method of the display substrate, which comprises the following steps:
providing a substrate base plate;
forming a thin film transistor and a signal wire on the substrate base plate;
forming a shading metal pattern on one side of the thin film transistor and the signal wire, which is far away from the substrate;
forming a light-emitting unit on one side of the light-shielding metal pattern, which is far away from the substrate base plate, wherein the light-emitting unit comprises an anode, a cathode and a light-emitting layer positioned between the anode and the cathode;
the shading metal pattern comprises an imaging hole and an opening, and the anode is connected with the signal wiring through the opening;
the manufacturing method further comprises the following steps:
and forming a shading insulating layer between the luminous layer and the substrate base plate, wherein the orthographic projection of the opening on the substrate base plate falls into the orthographic projection of the shading insulating layer on the substrate base plate.
Further, forming the light-shielding insulating layer includes:
and forming a light-shielding first flat layer between the light-shielding metal pattern and the thin film transistor.
Further, forming the light-shielding insulating layer includes:
a light-shielding second planarization layer is formed between the light-shielding metal pattern and the light-emitting unit.
The embodiment of the invention has the following beneficial effects:
in the scheme, the shading insulating layer is arranged between the light emitting layer and the substrate base plate, the opening of the shading metal pattern is in the orthographic projection on the substrate base plate, the shading insulating layer is in the orthographic projection on the substrate base plate, the opening area can be shielded through the shading insulating layer, external stray light is prevented from leaking from the opening, the image quality of small-hole fingerprint imaging is improved, and the fingerprint identification precision is further improved.
Drawings
FIG. 1 is a schematic diagram of a conventional display substrate;
FIG. 2 is a schematic diagram of prior art fingerprint imaging;
FIG. 3 is a schematic structural diagram of another conventional display substrate;
FIG. 4 is another schematic diagram of a prior art fingerprint imaging;
FIG. 5 is a schematic view of a display substrate according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of fingerprint imaging according to an embodiment of the present invention;
FIG. 7 is a diagram of a synthesized fingerprint image according to an embodiment of the present invention.
Reference numerals
1 light sensor
2 substrate base plate
3 polyimide layer
4 buffer layer
5 first gate insulating layer
6 second gate insulating layer
7 interlayer insulating layer
8 first planarization layer
9 second flat layer
10 active layer
11 first gate metal layer pattern
12 second gate metal layer pattern
13 first source drain metal layer pattern
14 second source drain metal layer pattern
15 anode
Detailed Description
In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention clearer, the following detailed description will be given with reference to the accompanying drawings and specific embodiments.
Fig. 1 is a schematic structural diagram of an existing display substrate, and as shown in fig. 1, the existing OLED display substrate includes a polyimide layer 3, a buffer layer 4, a first gate insulating layer 5, a second gate insulating layer 6, an interlayer insulating layer 7, a first planarization layer 8, a second planarization layer 9, an active layer 10, a first gate metal layer pattern 11, a second gate metal layer pattern 12, a first source-drain metal layer pattern 13, a second source-drain metal layer pattern 14, and an anode 15, which are located on a substrate 2.
In the existing OLED display substrate, in order to realize fingerprint identification, the second source-drain metal layer pattern 14 is used for shading light, a small hole A for imaging is formed, metal wiring is subjected to evading design in the area of the small hole A, light emitted by the light emitting layer can be reflected by a finger and then imaged through the small hole A, and the purpose of fingerprint identification is achieved. However, since the first source-drain metal layer pattern 13 needs to be connected to the anode 15 to realize the function of the thin film transistor driving the light emitting layer to emit light, and after the second source-drain metal layer pattern 14 is used as the whole light shielding layer, the connection between the first source-drain metal layer pattern 13 and the anode 15 is blocked, therefore, a space larger than 0.6um needs to be reserved between the metal connection line between the first source-drain metal layer pattern 13 and the anode 15 and the edge of the opening B of the second source-drain metal layer pattern 14 in the area where the first source-drain metal layer pattern 13 is connected to the anode 15, so that external stray light is easily leaked from the opening B, the imaging effect of fingerprints is seriously disturbed, and the accuracy of fingerprint identification is further influenced. As shown in fig. 2, the fingerprint image cannot be seen through the small hole, and light leakage is serious.
As shown in fig. 3, in the current improvement scheme, the area of the anode 15 and the area of the first source-drain metal layer pattern 13 are increased, so that the anode 15, the first source-drain metal layer pattern 13 and the second source-drain metal layer pattern 14 are overlapped, the purpose of shielding most stray light is achieved, and a fingerprint can be imaged, as shown in fig. 4. However, light rays in the large-angle direction can still pass through the light leakage holes and are reflected and refracted among the second source-drain metal layer pattern 14, the anode 15 and the first source-drain metal layer pattern 13, so that a part of stray light leaks into the light leakage holes, and the signal-to-noise ratio and the definition of the fingerprint image are influenced to a certain extent.
In order to solve the above problems, embodiments of the present invention provide a display substrate, a method of manufacturing the same, and a display device, which can improve the accuracy of fingerprint recognition.
An embodiment of the present invention provides a display substrate, including:
a substrate base plate;
the thin film transistor and the signal wire are positioned on the substrate base plate;
the shading metal pattern is positioned on one side, away from the substrate, of the thin film transistor and the signal wiring;
the light-emitting unit is positioned on one side, far away from the substrate base plate, of the light-shielding metal pattern and comprises an anode, a cathode and a light-emitting layer positioned between the anode and the cathode;
the shading metal pattern comprises an imaging hole and an opening, and the anode is connected with the signal wiring through the opening;
the display substrate further includes:
and the light-shielding insulating layer is positioned between the light-emitting layer and the substrate base plate, and the orthographic projection of the opening on the substrate base plate falls into the orthographic projection of the light-shielding insulating layer on the substrate base plate.
In the embodiment, the shading insulating layer is arranged between the light emitting layer and the substrate base plate, the orthographic projection of the opening of the shading metal pattern on the substrate base plate falls into the orthographic projection of the shading insulating layer on the substrate base plate, so that the opening area can be shielded through the shading insulating layer, external stray light is prevented from leaking from the opening, the image quality of small-hole fingerprint imaging is improved, and the fingerprint identification precision is further improved.
Further, the light-shielding insulating layer is multiplexed as a first flat layer between the light-shielding metal pattern and the thin film transistor. Therefore, a new shading insulating layer does not need to be specially added, only the original first flat layer needs to be designed to be shading, and particularly, the first flat layer can be made of black shading materials.
Further, the light-shielding insulating layer is multiplexed as a second flat layer between the light-shielding metal pattern and the light-emitting unit. Therefore, a new shading insulating layer does not need to be specially added, only the original second flat layer needs to be designed to be shading, and particularly, the second flat layer can be made of black shading materials.
Further, in order to ensure that the light-shielding insulating layer can effectively shield the opening area, the optical density of the light-shielding insulating layer is preferably greater than 2.
Further, since the light-shielding insulating layer has different light transmittance properties in different bands, especially near red and infrared bands, and has a relatively strong light transmittance, in order to better shield the opening region, the display substrate further includes:
the band-pass filter is arranged on one side, far away from the thin film transistor, of the substrate base plate, can filter out wave band light rays which cannot be blocked by the shading insulating layer, greatly improves the signal-to-noise ratio of the fingerprint image, and obtains a very clear fingerprint image.
In a specific embodiment, as shown in fig. 5, unlike the conventional first and second planarization layers 8 and 9 made of transparent materials, the first and second planarization layers 8 and 9 of this embodiment are made of black light-shielding materials, which can shield external stray light in the large viewing angle direction, so that the light in the light leakage area is completely blocked, thereby effectively improving the definition of pinhole imaging and increasing the accuracy of fingerprint identification. Fig. 6 is a schematic diagram of fingerprint imaging according to the embodiment, and fig. 7 is a schematic diagram of a fingerprint image synthesized according to the embodiment, and it can be seen from fig. 7 that a very clear fingerprint image can be obtained.
In addition, as shown in fig. 5, the anode 15 and the first source-drain metal layer pattern 13 and the second source-drain metal layer pattern 14 have a larger overlapping size as much as possible, so that interference of strong direct external stray light in the vertical direction can be avoided.
The embodiment of the invention also provides a display device which comprises the display substrate. The display device may be: the display device comprises a television, a display, a digital photo frame, a mobile phone, a tablet personal computer and any other product or component with a display function, wherein the display device further comprises a flexible circuit board, a printed circuit board and a back plate.
Further, the display device further includes:
and the light sensor is positioned on one side of the substrate base plate, which is far away from the thin film transistor, and a band-pass filter is arranged on one side of the light sensor, which faces the substrate base plate.
The light sensor can receive light rays emitted by the light emitting layer and penetrating through the small holes to generate a fingerprint image. Because the shading insulating layer is different at different wave band light transmittance, especially is close to ruddiness and infrared band, has stronger light transmissivity, consequently, in order to better shade the open region, the light sense sensor orientation one side of substrate base plate is provided with band pass filter, can promote the SNR of fingerprint image by a wide margin with the wave band light filtering that the shading insulating layer can not block, obtains very clear fingerprint image.
The band-pass filter can be arranged on one side of the substrate base plate, which faces the light sensor, or on one side of the substrate base plate, which is far away from the thin film transistor, or on both sides of the substrate base plate, which faces the substrate base plate, and the substrate base plate, which is far away from the thin film transistor.
The embodiment of the invention also provides a manufacturing method of the display substrate, which comprises the following steps:
providing a substrate base plate;
forming a thin film transistor and a signal wire on the substrate base plate;
forming a shading metal pattern on one side of the thin film transistor and the signal wire, which is far away from the substrate;
forming a light-emitting unit on one side of the light-shielding metal pattern, which is far away from the substrate base plate, wherein the light-emitting unit comprises an anode, a cathode and a light-emitting layer positioned between the anode and the cathode;
the shading metal pattern comprises an imaging hole and an opening, and the anode is connected with the signal wiring through the opening;
the manufacturing method further comprises the following steps:
and forming a shading insulating layer between the luminous layer and the substrate base plate, wherein the orthographic projection of the opening on the substrate base plate falls into the orthographic projection of the shading insulating layer on the substrate base plate.
In the embodiment, the shading insulating layer is arranged between the light emitting layer and the substrate base plate, the orthographic projection of the opening of the shading metal pattern on the substrate base plate falls into the orthographic projection of the shading insulating layer on the substrate base plate, so that the opening area can be shielded through the shading insulating layer, external stray light is prevented from leaking from the opening, the image quality of small-hole fingerprint imaging is improved, and the fingerprint identification precision is further improved.
Further, forming the light-shielding insulating layer includes:
and forming a light-shielding first flat layer between the light-shielding metal pattern and the thin film transistor. Therefore, a new shading insulating layer does not need to be specially added, only the original first flat layer needs to be designed to be shading, and particularly, the first flat layer can be made of black shading materials.
Further, forming the light-shielding insulating layer includes:
a light-shielding second planarization layer is formed between the light-shielding metal pattern and the light-emitting unit. Therefore, a new shading insulating layer does not need to be specially added, only the original second flat layer needs to be designed to be shading, and particularly, the second flat layer can be made of black shading materials.
Further, in order to ensure that the light-shielding insulating layer can effectively shield the opening area, the optical density of the light-shielding insulating layer is preferably greater than 2.
Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. The use of "first," "second," and similar terms in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
It will be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element or intervening elements may be present.
While the foregoing is directed to the preferred embodiment of the present invention, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (10)
1. A display substrate, comprising:
a substrate base plate;
the thin film transistor and the signal wire are positioned on the substrate base plate;
the shading metal pattern is positioned on one side, away from the substrate, of the thin film transistor and the signal wiring;
the light-emitting unit is positioned on one side, far away from the substrate base plate, of the light-shielding metal pattern and comprises an anode, a cathode and a light-emitting layer positioned between the anode and the cathode;
the shading metal pattern comprises an imaging hole and an opening, and the anode is connected with the signal wiring through the opening;
characterized in that, the display substrate further comprises:
and the light-shielding insulating layer is positioned between the light-emitting layer and the substrate base plate, and the orthographic projection of the opening on the substrate base plate falls into the orthographic projection of the light-shielding insulating layer on the substrate base plate.
2. The display substrate of claim 1,
the shading insulating layer is multiplexed as a first flat layer between the shading metal pattern and the thin film transistor.
3. The display substrate of claim 1,
the light-shielding insulating layer is multiplexed as a second flat layer between the light-shielding metal pattern and the light-emitting unit.
4. The display substrate according to claim 1, wherein an optical density of the light-shielding insulating layer is greater than 2.
5. The display substrate of claim 1, further comprising:
and the band-pass filter is arranged on one side of the substrate base plate, which is far away from the thin film transistor.
6. A display device comprising the display substrate according to any one of claims 1 to 5.
7. The display device according to claim 6, further comprising:
and the light sensor is positioned on one side of the substrate base plate, which is far away from the thin film transistor, and a band-pass filter is arranged on one side of the light sensor, which faces the substrate base plate.
8. A manufacturing method of a display substrate comprises the following steps:
providing a substrate base plate;
forming a thin film transistor and a signal wire on the substrate base plate;
forming a shading metal pattern on one side of the thin film transistor and the signal wire, which is far away from the substrate;
forming a light-emitting unit on one side of the light-shielding metal pattern, which is far away from the substrate base plate, wherein the light-emitting unit comprises an anode, a cathode and a light-emitting layer positioned between the anode and the cathode;
the shading metal pattern comprises an imaging hole and an opening, and the anode is connected with the signal wiring through the opening;
the manufacturing method is characterized by further comprising the following steps:
and forming a shading insulating layer between the luminous layer and the substrate base plate, wherein the orthographic projection of the opening on the substrate base plate falls into the orthographic projection of the shading insulating layer on the substrate base plate.
9. The method of manufacturing a display substrate according to claim 8, wherein the forming the light-shielding insulating layer comprises:
and forming a light-shielding first flat layer between the light-shielding metal pattern and the thin film transistor.
10. The method of manufacturing a display substrate according to claim 8, wherein the forming the light-shielding insulating layer comprises:
a light-shielding second planarization layer is formed between the light-shielding metal pattern and the light-emitting unit.
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| CN109449181B true CN109449181B (en) | 2021-01-15 |
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| CN109830495B (en) * | 2019-03-21 | 2021-10-08 | 京东方科技集团股份有限公司 | Array substrate and preparation method thereof, display device and imaging method thereof |
| CN110729334B (en) * | 2019-10-22 | 2022-10-18 | 京东方科技集团股份有限公司 | Electroluminescent display substrate and display device |
| CN111162105B (en) * | 2019-12-31 | 2023-06-30 | 武汉天马微电子有限公司 | Display panel and display device |
| CN112885885A (en) * | 2021-02-01 | 2021-06-01 | 武汉华星光电半导体显示技术有限公司 | Display panel, display device and manufacturing method of display panel |
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