CN109324418A - Anti-counterfeit structure, holographic thermoprinted anti false film and preparation method thereof - Google Patents
Anti-counterfeit structure, holographic thermoprinted anti false film and preparation method thereof Download PDFInfo
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- CN109324418A CN109324418A CN201811277809.3A CN201811277809A CN109324418A CN 109324418 A CN109324418 A CN 109324418A CN 201811277809 A CN201811277809 A CN 201811277809A CN 109324418 A CN109324418 A CN 109324418A
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- low frequency
- grating
- embossment
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- 238000002360 preparation method Methods 0.000 title claims abstract description 10
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- 230000003287 optical effect Effects 0.000 claims description 10
- 210000002469 basement membrane Anatomy 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 6
- 239000012943 hotmelt Substances 0.000 claims description 5
- 238000010276 construction Methods 0.000 claims description 4
- 239000004411 aluminium Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
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- 230000000694 effects Effects 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 239000002184 metal Substances 0.000 abstract description 6
- 239000006185 dispersion Substances 0.000 abstract description 2
- 239000007787 solid Substances 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 210000004379 membrane Anatomy 0.000 description 4
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- 238000001259 photo etching Methods 0.000 description 4
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- 238000010923 batch production Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000001093 holography Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000006263 metalation reaction Methods 0.000 description 2
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- 229940079593 drug Drugs 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/20—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
- G02B30/26—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type
- G02B30/27—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type involving lenticular arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F3/00—Labels, tag tickets, or similar identification or indication means; Seals; Postage or like stamps
- G09F3/02—Forms or constructions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Holo Graphy (AREA)
- Credit Cards Or The Like (AREA)
Abstract
Anti-counterfeit structure provided by the invention, the anti-counterfeit structure being superimposed using low frequency embossment structure layer with high-frequency grating structure sheaf, the high-frequency grating structure sheaf of nanoscale thickness is attached directly on the low frequency embossment structure layer of micron order thickness, the diffraction angular of two kinds of structure sheafs is different, does not interfere with each other, the De-dispersion of low frequency camegraph, solid, metal sense effect is presented in low-angle observation, wide-angle observes that the gorgeous iris of high-frequency grating image, antifalse effect novel and unique have stronger anti-counterfeiting power.In addition, the present invention also provides a kind of holographic thermoprinted anti false films and preparation method thereof.
Description
Technical field
The present invention relates to optical anti-counterfeiting field of material technology more particularly to a kind of anti-counterfeit structure, holographic thermoprinted anti false film and
Preparation method.
Background technique
Techniques of Optical Security is one of main counterfeit protection measures of current trade mark.Laser Holographic Counterfeit-proof Technique can not only be presented
The main image of object or design configuration, moreover it is possible to make the image to be in the change of viewing angle by the principle of optical diffraction
Rich in colorization and diversification, it is decorative strong;With high content of technology, threshold is high;It can be carried out on a large scale with moulding holographic technology
Production, it is at low cost.Therefore, very popular as public anti-counterfeiting technology, be extremely widely used at present tobacco, card,
The industries such as banknote, the wine industry, drug, health care product, gift, cosmetics.
With the popularization and application of rainbow holography trade mark, people start aestheticly tired occur.Recent years, gradually prevalence had
Celature sense, sense of stereoscopic vision optical anti-counterfeiting effect, anti-fake visual effect is different from rainbow holography, but plate-making technology connects
Closely.With the universal of these technologies and come into the open, antiforge function is declined, and allows fraud businessman to have an opportunity to take advantage of, by single
Techniques of Optical Security is extremely difficult to higher antifalse effect.
Summary of the invention
Have in view of that, it is necessary in view of the defects existing in the prior art, provide a kind of anti-counterfeiting performance more preferably anti-counterfeit structure.
To achieve the above object, the present invention adopts the following technical solutions:
On the one hand, the present invention provides a kind of anti-counterfeit structures, comprising: low frequency embossment structure layer and to be attached to the low frequency floating
The high-frequency grating structure sheaf on structure sheaf is carved, the spatial frequency range of the low frequency embossment structure layer is 20-125 line/mm, described
The spatial frequency range of high-frequency grating structure sheaf is 1000-3000 line/mm.
In some preferred embodiments, the height of the low frequency embossment structure layer is higher than the high-frequency grating structure sheaf
Big 6 times or more are spent, the height of the low frequency embossment structure layer is less than 2.5 μm.
In some preferred embodiments, the section of the low frequency embossment structure layer is zigzag or sinusoidal, the height
The section of frequency optical grating construction layer is sinusoidal or rectangle.
In some preferred embodiments, the Two dimensional Distribution of the low frequency embossment structure layer is contour map or optical grating point
Battle array.
In some preferred embodiments, the distribution of the high-frequency grating structure sheaf is the grating or grating in one-dimensional equal periods
Dot matrix.
In some preferred embodiments, the high-frequency grating structure sheaf with a thickness of between 30nm-400nm, it is described low
The thickness of frequency embossment structure layer is between 0.3 μm -2.5 μm.
On the other hand, the present invention also provides a kind of holographic thermoprinted anti false films, comprising: the basement membrane that is cascading, from
Type layer, low frequency embossment structure layer, high-frequency grating structure sheaf, coating and gum layer, the spatial frequency of the low frequency embossment structure layer
Range is 20-125 line/mm, and the spatial frequency range of the high-frequency grating structure sheaf is 1000-3000 line/mm.
In addition, including the following steps: the present invention also provides a kind of preparation method of holographic thermoprinted anti false film
Release layer is coated on basement membrane;Information resin layer is coated on the release layer;By the low frequency embossed layer and institute
The overlaying structure hot padding of high-frequency grating structure sheaf is stated on information resin layer;One layer of the Vacuum Deposition plating on the overlaying structure again
Layer;The coating hot melt gum layer on the coating.
In some preferred embodiments, the basement membrane is PET or BOPP, and the release layer is that fusing point is 80-90 DEG C
Water wax, the information resin layer thickness are 1-3 μm, and the coating is the medium of high refractive index or the aluminium layer of high reflection, the plating
Thickness degree is less than 50nm.
The present invention by adopting the above technical scheme the advantages of be:
Anti-counterfeit structure provided by the invention including low frequency embossment structure layer and is attached on the low frequency embossment structure layer
High-frequency grating structure sheaf, the spatial frequency range of the low frequency embossment structure layer are 20-125 line/mm, the high-frequency grating structure
The spatial frequency range of layer is 1000-3000 line/mm, due to two kinds of structure sheafs of low frequency embossment structure layer and high-frequency grating structure sheaf
Diffraction angular it is different, do not interfere with each other, the De-dispersion of low frequency camegraph, solid, metal sense effect is presented in low-angle observation,
Wide-angle observes that the gorgeous iris of high-frequency grating image, antifalse effect novel and unique attract public eyeball.
In addition, anti-counterfeit structure provided by the invention, can be made into entirely by the anti-counterfeit structure that low frequency embossment is superimposed with high-frequency grating
Cease anti false film, such as blocking film, transfer membrane, composite membrane, label, suitable for current mature holographic anti-counterfeiting film batch production technique, at
This is low.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
Other attached drawings are obtained according to these attached drawings.
Fig. 1 is the anti-counterfeit structure schematic diagram that the embodiment of the present invention 1 provides.
Fig. 2 is the using renderings for the anti-counterfeit structure that the embodiment of the present invention 1 provides.
Fig. 3 is the structural schematic diagram for the holographic thermoprinted anti false film that the embodiment of the present invention 2 provides.
Fig. 4 is the step flow chart of the preparation method for the holographic thermoprinted anti false film that the embodiment of the present invention 2 provides.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts all other
Embodiment shall fall within the protection scope of the present invention.
Embodiment 1
Referring to Fig. 1, be anti-counterfeit structure provided by the invention structural schematic diagram, comprising: low frequency embossment structure layer 110 and
The high-frequency grating structure sheaf 120 being attached on the low frequency embossment structure layer 110, wherein the low frequency embossment structure layer 110
Spatial frequency range is 20-125 line/mm, the spatial frequency range of the high-frequency grating structure sheaf 120 be 1000-3000 line/
mm。
In some preferred embodiments, the height of the low frequency embossment structure layer 110 is than the high-frequency grating structure sheaf
Big 6 times of 120 height or more, the height of the low frequency embossment structure layer 110 is less than 2.5 μm.
In some preferred embodiments, the section of the low frequency embossment structure layer 110 be zigzag or sinusoidal, it is described
The section of high-frequency grating structure sheaf 120 is sinusoidal or rectangle.
In some preferred embodiments, the Two dimensional Distribution of the low frequency embossment structure layer 110 is contour map or grating
Dot matrix, the grating lattice have different directions, different cycles, different duty.
In some preferred embodiments, the distribution of the high-frequency grating structure sheaf 120 be one-dimensional equal periods grating or
Grating lattice, the grating lattice have different directions, different cycles, different duty.
In some preferred embodiments, the high-frequency grating structure sheaf 120 with a thickness of between 30nm-400nm, it is described
The thickness of low frequency embossment structure layer 110 is between 0.3 μm -2.5 μm.
Anti-counterfeit structure provided by the invention can be prepared by following processing steps:
Make the mold of low frequency camegraph.
Specifically, it can directly be processed and be carved on the materials such as metal or PMMA by Ultra-precision CNC Machine, it can also be with entirely
Breath dot matrix direct-write photoetching system exposes on photoetching hectograph, metal die is made in development, surface metalation, electroplating work procedure.
Position etching high-frequency grating structure is accurately covered on low frequency camegraph mold.
Specifically, photoresist layer identical with high-frequency grating depth of structural layer is first coated on low frequency camegraph mold;
Then the method photoetching interfered with double laser beam is one-dimensional to wait periods high-frequency grating, can also be exposed with holographic dot matrix direct-write photoetching system
Light have different directions, different cycles, different duty high-frequency grating.
The metal mold of low frequency embossment Yu high-frequency grating overlaying structure is made up of exposure, development, surface metalation, plating
Tool.
Referring to Fig. 2, being the using renderings of anti-counterfeit structure provided by the invention, using low frequency embossment structure layer and high frequency
The anti-counterfeit structure of optical grating construction layer superposition, the high-frequency grating structure sheaf of nanoscale thickness are attached directly to the low frequency embossment of micron order thickness
On structure sheaf, the diffraction angular of two kinds of structure sheafs is different, does not interfere with each other, and the colour killing of low frequency camegraph is presented in low-angle observation
It dissipates, three-dimensional, metal sense effect, wide-angle observes that the gorgeous iris of high-frequency grating image, antifalse effect novel and unique have
Stronger anti-counterfeiting power.
Embodiment 2
Referring to Fig. 3, being the structural schematic diagram of holographic thermoprinted anti false film provided in an embodiment of the present invention, comprising: successively layer
Basement membrane 210, release layer 220, low frequency embossment structure layer 230, high-frequency grating structure sheaf 240, coating 250 and the gum layer of folded setting
260, the spatial frequency range of the low frequency embossment structure layer 230 is 20-125 line/mm, the high-frequency grating structure sheaf 240
Spatial frequency range is 1000-3000 line/mm.
Referring to Fig. 4, including the following steps: the present invention also provides a kind of preparation method of holographic thermoprinted anti false film
Step S310: release layer is coated on basement membrane.
In some preferred embodiments, the basement membrane is PET or BOPP.
Step S320: information resin layer is coated on the release layer;
In some preferred embodiments, the release layer is the water wax that fusing point is 80-90 DEG C,
Step S330: by the overlaying structure hot padding of the low frequency embossed layer and the high-frequency grating structure sheaf in inforamtion tree
On rouge layer;
In some preferred embodiments, the information resin layer thickness is 1-3 μm.
Step S340: one layer of coating of Vacuum Deposition on the overlaying structure again;
In some preferred embodiments, the coating is the medium of high refractive index or the aluminium layer of high reflection, the coating
Thickness is less than 50nm.
Step S350: the coating hot melt gum layer on the coating.
It is appreciated that the coating hot melt gum layer on the coating, gum layer hot melt becomes sticky when thermoprint, by anti-counterfeit structure layer
It is attached to and is scalded on ground.
Anti-counterfeit structure provided by the invention can be made into holographic false proof by the anti-counterfeit structure that low frequency embossment is superimposed with high-frequency grating
Film, such as blocking film, transfer membrane, composite membrane, label, it is at low cost suitable for current mature holographic anti-counterfeiting film batch production technique.
Certainly anti-counterfeit structure of the invention can also have a variety of transformation and remodeling, it is not limited to the tool of above embodiment
Body structure.In short, protection scope of the present invention should include those obvious changes to those skilled in the art
It changes or substitutes and retrofit.
Claims (9)
1. a kind of anti-counterfeit structure characterized by comprising low frequency embossment structure layer and be attached on the low frequency embossment structure layer
High-frequency grating structure sheaf, the spatial frequency range of the low frequency embossment structure layer is 20-125 line/mm, the high-frequency grating knot
The spatial frequency range of structure layer is 1000-3000 line/mm.
2. anti-counterfeit structure as described in claim 1, which is characterized in that the height of the low frequency embossment structure layer is than the high frequency
Big 6 times of the height of optical grating construction layer or more, the height of the low frequency embossment structure layer is less than 2.5 μm.
3. anti-counterfeit structure as described in claim 1, which is characterized in that the section of the low frequency embossment structure layer be zigzag or
Sinusoidal, the section of the high-frequency grating structure sheaf are sinusoidal or rectangle.
4. anti-counterfeit structure as described in claim 1, which is characterized in that the Two dimensional Distribution of the low frequency embossment structure layer is contour
Line chart or grating lattice.
5. anti-counterfeit structure as described in claim 1, which is characterized in that the distribution of the high-frequency grating structure sheaf is one-dimensional isoperimetric
The grating or grating lattice of phase.
6. anti-counterfeit structure as described in claim 1, which is characterized in that the high-frequency grating structure sheaf with a thickness of 30nm-
Between 400nm, the thickness of the low frequency embossment structure layer is between 0.3 μm -2.5 μm.
7. a kind of holographic thermoprinted anti false film characterized by comprising basement membrane, release layer, the low frequency embossment knot being cascading
Structure layer, high-frequency grating structure sheaf, coating and gum layer, the spatial frequency range of the low frequency embossment structure layer be 20-125 line/
Mm, the spatial frequency range of the high-frequency grating structure sheaf are 1000-3000 line/mm.
8. a kind of preparation method of holographic thermoprinted anti false film, which is characterized in that include the following steps:
Release layer is coated on basement membrane;Information resin layer is coated on the release layer;By the low frequency embossed layer and the height
The overlaying structure hot padding of frequency optical grating construction layer is on information resin layer;One layer of coating of Vacuum Deposition on the overlaying structure again;
The coating hot melt gum layer on the coating.
9. the preparation method of holographic thermoprinted anti false film as claimed in claim 8, which is characterized in that the basement membrane be PET or
BOPP, the release layer are the water wax that fusing point is 80-90 DEG C, and the information resin layer thickness is 1-3 μm, and the coating is high folding
The medium of rate or the aluminium layer of high reflection are penetrated, the thickness of coating is less than 50nm.
Priority Applications (1)
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CN201811277809.3A CN109324418A (en) | 2018-10-30 | 2018-10-30 | Anti-counterfeit structure, holographic thermoprinted anti false film and preparation method thereof |
Applications Claiming Priority (1)
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CN201811277809.3A CN109324418A (en) | 2018-10-30 | 2018-10-30 | Anti-counterfeit structure, holographic thermoprinted anti false film and preparation method thereof |
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Family
ID=65260443
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CN201811277809.3A Pending CN109324418A (en) | 2018-10-30 | 2018-10-30 | Anti-counterfeit structure, holographic thermoprinted anti false film and preparation method thereof |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111210713A (en) * | 2020-01-21 | 2020-05-29 | 武汉大学 | Anti-counterfeiting shading and image multiplexing-based anti-counterfeiting super surface design method |
CN117460625A (en) * | 2021-04-09 | 2024-01-26 | 苏利斯 | Reflective visible optical security element, production of such an element and security document provided with such an element |
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CN209028338U (en) * | 2018-10-30 | 2019-06-25 | 深圳市深大极光科技有限公司 | Anti-counterfeit structure, holographic thermoprinted anti false film |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111210713A (en) * | 2020-01-21 | 2020-05-29 | 武汉大学 | Anti-counterfeiting shading and image multiplexing-based anti-counterfeiting super surface design method |
CN117460625A (en) * | 2021-04-09 | 2024-01-26 | 苏利斯 | Reflective visible optical security element, production of such an element and security document provided with such an element |
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