CN109316913A - A kind of application of wet discharge reactor in removal SO 2 in waste gas gas - Google Patents
A kind of application of wet discharge reactor in removal SO 2 in waste gas gas Download PDFInfo
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- CN109316913A CN109316913A CN201811172082.2A CN201811172082A CN109316913A CN 109316913 A CN109316913 A CN 109316913A CN 201811172082 A CN201811172082 A CN 201811172082A CN 109316913 A CN109316913 A CN 109316913A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/48—Sulfur compounds
- B01D53/50—Sulfur oxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/75—Multi-step processes
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- Treating Waste Gases (AREA)
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Abstract
The invention discloses a kind of application of wet discharge reactor in removal SO 2 in waste gas gas, the absorption liquid circulating device that the wet discharge reactor includes hollow shell, the shell intracorporal exoelectrical reaction area and is connect by the shell with the exoelectrical reaction area, absorbing liquid can flow from above to below to form absorbing liquid liquid film along grounding electrode plate by the absorption liquid circulating device.The distance between described discharge electrode and grounding electrode plate constitute the airflow channel of gas processed, the space length can be with dynamic regulation, when the air-flow of gaseous pollutant containing sulfur dioxide passes through the gas discharge reaction zone between the electrode pair, the pollutant is oxidized and degrades, catabolite or intermediate product are absorbed by the absorbing liquid liquid film, and purified air-flow is discharged by gas vent.
Description
Technical field
The present invention relates to a kind of application of wet discharge reactor in removal SO 2 in waste gas gas, belong to atmosphere
Contamination control and environmental protection technical field.
Background technique
The a large amount of discharges for the sulfur dioxide that mankind's activity generates are the main reason for causing atmosphere acid rain.Wherein fuel combustion
Sulfur dioxide (the SO of generation2) accounting about 90% or more, followed by metallurgy, sulfuric acid and the industrial process such as oil refining and chemical pharmaceutical.
Wet process form waste gas of sulfur dioxide Treatment process is to carry out absorption processing to sulfur dioxide using various aqueous solutions, since sulfur dioxide exists
Course of dissolution is a reversible reaction in water, therefore, very low as absorption efficiency of the absorbent to sulfur dioxide using clear water.Using
The alkali absorption methods such as lime/lime stone are the main methods of current SO 2 from fume waste gas pollution control and treatment, but system complex, equipment are thrown
Money is big, and desulfurization product is difficult to recycle.
The nonequilibrium plasma generated by gas discharge has started as a new waste gas Treatment process in industrial mistake
Cheng Yingyong, the basic principle is that generating a large amount of high energy electrons, atom and free radical using gas discharge.These high energy electrons, original
Son and free radical react with pernicious gas molecule and it are made to aoxidize or dissociate.Present inventor has once reported using corona discharge pulse
Removal experimental result (" Journal of Chemical Industry and Engineering " English edition 2011,19 (3): 518-522) of the reactor to sulfur dioxide.Although pulse air
Body electric discharge is a kind of producing method of very effective plasma, but since the technical requirements of the pulse power are high thus difficult
With large-scale application in the industry.
Summary of the invention
It is an object of the present invention to provide a kind of application of wet discharge reactor in removal SO 2 in waste gas gas.
Wet discharge reactor of the present invention includes hollow shell, the intracorporal exoelectrical reaction area of the shell and leads to
The absorption liquid circulating device that the shell is connect with the exoelectrical reaction area is crossed, the shell of the discharge reactor is hollow
Rectangular parallelepiped structure, the corresponding upper bottom surface and bottom surface and horizontal plane of the rectangular parallelepiped structure are at same angle, the shell
Body is equipped with gas access and gas vent;The enclosure interior constitutes and the upper bottom surface parallel gas flow channels, described
Gas passage in the discharge electrode and grounding electrode being parallel to each other are installed, the discharge electrode is close to the upper bottom surface
And it is parallel with the upper bottom surface, the grounding electrode is mounted on the bottom surface, and the discharge electrode is by discharging
Electrode plate and the pin electrode being uniformly arranged on the discharge electrode plate are constituted;The grounding electrode is by grounding electrode plate and
The even water-blocking bank being arranged in the grounding electrode plate is constituted;The pin electrode is opposite with the water-blocking bank and one is a pair of
It answers;The high voltage power supply is electrically connected with the discharge electrode;The bottom surface upper end is equipped with absorbing liquid entrance, described
Bottom surface lower end is exported equipped with absorbing liquid;
The absorption liquid circulating device includes the inlet tube and the feed liquor that one end is connect with the exoelectrical reaction area
The circulating pump of pipe connection, absorbing liquid circulating slot and deflector composition, described inlet tube one end are connect with absorbing liquid entrance, the other end
Be connected to by the circulating pump with the absorbing liquid circulating water chennel, the described absorbing liquid outlet with circulating water chennel connect,
The deflector is located in exoelectrical reaction area at absorbing liquid entrance fluid outlet, and the position of the deflector makes the absorption
The liquid stream that liquid entrance enters is guided by the deflector and is flowed from above to below along the grounding electrode plate;
The pin electrode is electrically connected with high voltage power supply;The discharge reactor is integrally in airtight closes.
Further, the application are as follows: high voltage is applied to the discharge electrode, starting absorbs liquid circulating device, institute
The absorbing liquid stated flows into the inner cavity of the discharge reactor by pressurization pump circulation from absorbing liquid entrance along grounding electrode plate,
The ground electrode surface forms one layer of uniform absorbing liquid liquid film, from the gas access of described reactor one end be passed through to
The gas of processing, when absorbing liquid passes through the water-blocking bank, the distance between the discharge electrode and grounding electrode shorten,
Gas moment between the pin electrode and grounding electrode plate water-blocking bank liquid level is ionized, and the gas to be processed in air-flow is by oxygen
Change or degrades, the absorbing liquid that the water-soluble intermediate product of degradation process or water-soluble final product are formed on the grounding electrode
Liquid film absorbs, to achieve the purpose that degradation;The absorbing liquid includes clear water or dilute sulfuric acid.
Further, the gas to be processed is the flue gas or metallurgy, sulfuric acid, oil refining or chemical industry of combustion of fossil fuel
The exhaust gas of each production technology discharge, can add the oxidants such as oxygen, aqueous vapor or argon gas etc. to improve the titanium dioxide in pharmacy
The oxygenation efficiency of sulphur, specifically optionally uses.
It is absorbent that absorbing liquid of the present invention, which generally can be used clear water, lye or acid solution and be used as, specifically can basis
Different processing requirements selects corresponding absorbing liquid, using clear water or the available recycling dilute sulfuric acid of dilution heat of sulfuric acid, using alkali
Property absorbing liquid effect is more preferable, but cannot recycle dilute sulfuric acid.The liquid film of formation of the flow of the general absorbing liquid in electrode surface
With a thickness of 1-5mm, specifically can optionally adjust.
Further, the deflector is rectangular slab, the deflector and the grounding electrode plate upper half
Divide and form angle, and the angle is acute angle, it is described there are making between the deflector and the grounding electrode plate
Absorbing liquid is by deflector along the gap that the grounding electrode plate flows, the rectangular slab and the shell dimension
Match.
Further, the discharge electrode and the material of grounding electrode plate are generally stainless steel, titanium, tungsten, lead and alloy etc.
Well conducting and the metal material and related compound material of corrosion-resistant and resistance to electric discharge, the gas discharge performance of the material is substantially
Quite.
Further, the power supply mode of the discharge electrode is generally direct current (containing high-frequency impulse), is also possible to pulse, effect
About the same, wherein direct current supply voltage is generally positive 1kV or more, or negative -1kV is hereinafter, it is preferred that ± 10kV- ± 150kV, just
The effect of voltage and negative voltage is about the same, and positive voltage is a little better, the pulse recurrence frequency of pulse power supply be generally 1Hz with
On, preferably 10Hz-500Hz, frequency increases, and input energy increases, and the conversion ratio of the sulfur dioxide improves, and pulse repeats frequency
When rate is 500Hz or more, actual effect increase rate is less.Electrode application voltage is related with electrode spacing, and interelectrode distance is got over
Greatly, applying voltage can be higher, the general every increase 10mm of electrode distance, and voltage can increase 5kV -10kV, the release of voltage high-energy
Greatly, the high conversion rate of sulfur dioxide.
Further, residence time of the gas processed of the present invention in the exoelectrical reaction area be generally 0.2s with
On, the residence time is longer, and effect is better, preferably 3s-120s, and more than 120s, the conversion rate of oxidation increase rate of sulfur dioxide becomes
It is small.
Compared with prior art, the invention has the advantages that by between dynamic regulation grounding electrode plate and discharge electrode
Distance makes gas discharge, and DC power supply can be used instead of high-voltage pulse power source, reduce equipment investment and use cost, improves
System operation reliability, the sulfur dioxide in air-flow are oxidized to be grounded the absorbing liquid liquid film institute of pole surface after sulfur trioxide
It absorbs, dilute sulfuric acid can be recycled, realize recycling for resource.
Detailed description of the invention
Fig. 1 is the wet discharge reactor schematic diagram that the present invention uses;
Fig. 2 is the sectional view for the wet discharge reactor that the present invention uses.
Specific embodiment
The present invention will be described in further detail below with reference to the embodiments of the drawings.
In figure: 1 gas access;2 high voltage power supply connecting lines;3 return pipes;4 inlet tubes;5 central electrode sticks;6 deflectors;7
Gas vent;8 filling openings;9 absorbing liquid circulating slots;10 leakage fluid drams;11 pin electrodes;12 grounding electrode plates;13 circulating pumps;14 connections
Pipe;15 discharge electrode plates;16 water-blocking banks.
Embodiment 1:
A kind of wet type gas discharge reactor is as illustrated in fig. 1 and 2.Discharge reactor is about 500mm, wide about 250mm, high about
80mm, exoelectrical reaction area effective length about 250mm, integral sealing, inleakage is less than 1%, integral inclined about 15 ° of placements, with benefit
Absorbing liquid thin film drainage.Gas flow is single channel, and electrode is to board-like for needle-, and wherein pin electrode 11 is fixed on discharge electrode electrode
On plate 15, respectively there is 9 groups of pin electrodes (two-phase discharge electrode distance is about 20mm, uniformly distributed) along airflow direction and uprush direction,
Needle-discharging electrode applies positive or negative high voltage having a size of Φ 3 × 20 for steel alloy, and 9 gears are arranged in another grounding electrode plate 12
Water bank 16 (vertical height is 15mm, width 5mm), symmetrical with pin electrode 11,12 front end of grounding electrode plate is provided with
Deflector 6 makes 12 surface of grounding electrode plate of the reactor form absorbing liquid liquid film, and the uninterrupted of the absorbing liquid can be with
Time is adjusted by preset frequency, so that making the electrode to it when absorbing liquid flows through the water-blocking bank 16 of grounding electrode plate 12
Between distance change.The absorbing liquid is collected by the absorbing liquid circulating slot of reactor lower part, can be recycled by circulating pump 13
It uses.
Its processing technological flow be the air-flow of the exhaust gas to be processed containing sulfur dioxide is imported by gas access 1 it is described
Discharge reactor connect pin electrode 11 with high-voltage power-line 2 by discharge electrode plate 15, and grounding electrode plate 12 is grounded, meanwhile,
Importing absorbing liquid by deflector 6 makes 12 surface of grounding electrode plate form absorbing liquid liquid film, the uninterrupted of absorbing liquid with
Time is changed by preset frequency, and when the excessively described water-blocking bank 16 of absorbing liquid, discharge electrode and grounding electrode Distance Shortened are described
Gas moment between electric discharge pin electrode 11 and 16 liquid level of water-blocking bank of grounding electrode plate 12 is ionized, gas discharge, from described
Gas access import polluting objects containing air-flow behind the gas-discharge zone between the electrode pair, in air-flow
Sulfur-bearing, nitrogen and halogen gaseous pollutant are oxidized or degrade, and water-soluble catabolite or intermediate product are by earthing pole table
The absorbing liquid liquid film in face absorbs, and is removed from air-flow, and purified air-flow passes through the gas that the reactor other end is arranged in
7 discharge of outlet, to achieve the purpose that gas purification.The return pipe 3 of the reacted device lower part of absorbing liquid is followed into absorbing liquid
After annular groove 9, then pass through connecting tube 15, the deflector 6 of circulating pump 14 and the importing of inlet tube 4 gas discharge reactor front, circulation
It uses.
Experiment condition are as follows: boiler combustion flue gas, flow about 3m3/ h, wherein oxygen about 8% (volume, similarly hereinafter), carbon dioxide
About 12%, moisture about 10%, sulfur dioxide gas inlet concentration is about 800mg/m3, the gas feed of flue gas stream is about 70
DEG C, initial absorption liquid is clear water, and it is 0.3 time/s that frequency, which is added, in absorbing liquid, and absorbing liquid integrated flow is about 30L/h, in water-blocking bank
Upper maximum fluid height is about 10mm, and electrode power supply mode is positive DC power supply, voltage about 25kV, power about 60W, rotation
Motor speed is about 50 revs/min.
Experimental result is that the exit concentration of sulfur dioxide is about 15mg/m3。
Embodiment 2: experimental provision is the same as embodiment 1.Air-flow is sulfuric acid plant's tail gas, flow about 3m3/ h, wherein oxygen about 4%
(volume, similarly hereinafter), moisture about 20%, sulfur dioxide gas inlet concentration is about 1500mg/m3, the gas feed of air-flow is about 70
DEG C, initial absorption liquid is 5% dilution heat of sulfuric acid, 5% argon gas is added in air-flow, other conditions are the same as embodiment 4.
Experimental result is that the exit concentration of sulfur dioxide is about 41mg/m3。
It should be noted that the above examples are only used to illustrate the technical scheme of the present invention, protection scope of the present invention is not
It is limited to this.All within the spirits and principles of the present invention, it modifies to technical solution documented by each embodiment, or to it
In some technical characteristics carry out any equivalent replacement, modification, changes and improvements etc., should be included in protection scope of the present invention
Within.
Claims (10)
1. a kind of application of wet discharge reactor in removal SO 2 in waste gas gas, the discharge reactor include
It hollow shell, the intracorporal exoelectrical reaction area of the shell and is followed by the absorbing liquid that the shell is connect with the exoelectrical reaction area
Loop device, the shell of the discharge reactor are hollow rectangular parallelepiped structure, the corresponding upper bottom of the rectangular parallelepiped structure
At same angle, the shell is equipped with gas access (1) and gas vent (7) for face and bottom surface and horizontal plane;Described
Enclosure interior constitutes and the upper bottom surface parallel gas flow channels, and the electric discharge electricity being parallel to each other is equipped in the gas passage
Pole and grounding electrode, the discharge electrode is close to the upper bottom surface and parallel with the upper bottom surface, the ground connection electricity
Pole is mounted on the bottom surface, and the discharge electrode is by discharge electrode plate (15) and is uniformly arranged on the discharge electrode
Pin electrode (11) on plate (15) is constituted;The grounding electrode is by grounding electrode plate (12) and is uniformly arranged on the ground connection electricity
Water-blocking bank (16) on pole plate (12) is constituted;The pin electrode (11) is opposite with the water-blocking bank (16) and one is a pair of
It answers;The high voltage power supply is electrically connected with the discharge electrode;The bottom surface upper end is equipped with absorbing liquid entrance, described
Bottom surface lower end is exported equipped with absorbing liquid;
The absorption liquid circulating device includes the inlet tube (4) and the feed liquor that one end is connect with the exoelectrical reaction area
Manage the circulating pump (13) of (4) connection, absorbing liquid circulating slot (9) and deflector (6) composition, described inlet tube (4) one end and absorption
The connection of liquid entrance, the other end are connected to by the circulating pump (13) with the absorbing liquid circulating water chennel, and the absorbing liquid goes out
Mouthful with circulating water chennel connect, the deflector (6) is located in exoelectrical reaction area at absorbing liquid entrance fluid outlet, described
The position liquid stream that enters the absorbing liquid entrance of deflector (6) connect by deflector (6) guidance along described
Ground electrode plate (12) flows from above to below;
The pin electrode (11) is electrically connected with high voltage power supply;The discharge reactor is integrally in airtight closes.
2. application as described in claim 1, it is characterised in that: the application are as follows: apply high electricity to the discharge electrode
Pressure, starting absorb liquid circulating device, and the absorbing liquid is by pressurization pump circulation from absorbing liquid entrance along grounding electrode plate
(12) inner cavity of the discharge reactor is flowed into, the ground electrode surface forms one layer of uniform absorbing liquid liquid film, from
The gas feed of described reactor one end is passed through gas to be processed, when absorbing liquid passes through water-blocking bank (16), institute
The distance between discharge electrode and grounding electrode for stating shorten, the water-blocking bank of the pin electrode (11) and grounding electrode plate (12)
(16) the gas moment between liquid level is ionized, and the gas to be processed in air-flow is oxidized or degrades, degradation process it is water-soluble
Property the absorbing liquid liquid film that is formed on the grounding electrode of intermediate product or water-soluble final product absorb, to reach degradation
Purpose;The absorbing liquid includes clear water or dilute sulfuric acid.
3. application as claimed in claim 2, it is characterised in that: the gas to be processed be combustion of fossil fuel flue gas,
The exhaust gas of each production technology discharge such as metallurgy, building materials or chemical pharmaceutical.
4. application as claimed in claim 2, it is characterised in that: the deflector (6) stated is rectangular slab, the deflector
(6) angle is formed with grounding electrode plate (12) top half, and the angle is acute angle, the deflector (6)
There are make the absorbing liquid by deflector (6) along the grounding electrode plate between the grounding electrode plate (12)
(12) gap flowed, the rectangular slab match with the shell dimension.
5. application as claimed in claim 2, it is characterised in that: the water-blocking bank (16) and the rectangular parallelepiped structure are along air-flow
The central axis in direction.
6. application as claimed in claim 2, it is characterised in that: the material of the discharge electrode or grounding electrode includes stainless
Steel, titanium, zirconium, tantalum, tungsten, lead or alloy and associate conductive material.
7. application as claimed in claim 2, it is characterised in that: the power supply mode of the discharge electrode be direct current, pulse or
Exchange.
8. the use as claimed in claim 7, it is characterised in that: the voltage of the direct current supply is ± 10kV~± 150kV;Institute
The voltage for stating pulse power supply is ± 10kV~± 150kV, and the pulse recurrence frequency of pulse power supply is 10Hz~500Hz;The friendship
The voltage of stream power supply is 1kV~300kV, and frequency is 10Hz~1000Hz.
9. application as claimed in claim 2, it is characterised in that: stop of the gas to be processed in the exoelectrical reaction area
Time is 3s~120s.
10. application as claimed in claim 2, it is characterised in that: the absorbing liquid liquid film with a thickness of 1-5mm.
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CN201811172082.2A CN109316913B (en) | 2018-10-09 | 2018-10-09 | Application of wet discharge reactor in removing sulfur dioxide gas in waste gas |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN114074948A (en) * | 2021-03-31 | 2022-02-22 | 浙江工业大学 | Method and device for preparing ammonia |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN200966977Y (en) * | 2006-09-07 | 2007-10-31 | 武汉科技大学 | Bipolar corona discharging type plasma desulfurization and denitration device |
CN201357041Y (en) * | 2009-01-20 | 2009-12-09 | 浙江工商大学 | Wet-type pulse corona flue gas treatment reactor |
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2018
- 2018-10-09 CN CN201811172082.2A patent/CN109316913B/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN200966977Y (en) * | 2006-09-07 | 2007-10-31 | 武汉科技大学 | Bipolar corona discharging type plasma desulfurization and denitration device |
CN201357041Y (en) * | 2009-01-20 | 2009-12-09 | 浙江工商大学 | Wet-type pulse corona flue gas treatment reactor |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114074948A (en) * | 2021-03-31 | 2022-02-22 | 浙江工业大学 | Method and device for preparing ammonia |
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