CN109307907A - The preparation method of anti-reflection coating and backlight module with the anti-reflection coating - Google Patents
The preparation method of anti-reflection coating and backlight module with the anti-reflection coating Download PDFInfo
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- CN109307907A CN109307907A CN201811206420.XA CN201811206420A CN109307907A CN 109307907 A CN109307907 A CN 109307907A CN 201811206420 A CN201811206420 A CN 201811206420A CN 109307907 A CN109307907 A CN 109307907A
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- Prior art keywords
- solution
- antireflection
- reflection coating
- light
- guide plate
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0013—Means for improving the coupling-in of light from the light source into the light guide
- G02B6/0023—Means for improving the coupling-in of light from the light source into the light guide provided by one optical element, or plurality thereof, placed between the light guide and the light source, or around the light source
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/061—Special surface effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Planar Illumination Modules (AREA)
Abstract
The present invention relates to display fields, more particularly to a kind of anti-reflection coating and preparation method thereof and a kind of backlight module, the backlight module includes at least LED light bar, light guide plate, anti-reflection coating, the reflectance coating be by light guide plate after the homogeneous mixture solotion that side of LED light bar uniformly applies silica and silicon nitride by being formed by curing, this invention addresses in the prior art because light light guide plate close to the side of lamp bar due to reflection, the reasons such as scattering and caused by the utilization rate of light the problem of falling, light is improved in the transmitance and final utilization rate of light guide plate side.
Description
Technical field
The present invention relates to the preparation method of display field more particularly to anti-reflection coating and with the back of the anti-reflection coating
Optical mode group.
Background technique
In life, liquid crystal display has become most common display device, and digitlization, fine definition, color are forced
The features such as true, brings many conveniences to people's life.Wherein, the quality height of liquid crystal display panel decides that liquid crystal display is final
Display effect, liquid crystal display panel is made of liquid crystal board and backlight module.In the prior art, backlight module include LED light bar, it is anti-
Piece, light guide plate and optical diaphragm are penetrated, its working principles are as follows: the linear light source that LED light bar issues is incident on light guide plate, by leaded light
The effect of plate is converted to area source, and wherein most anaclasis to top modulates to form uniform face light using optical diaphragm
Source is utilized herein after the effect reflection for passing through reflector plate there are also fraction light.But each time in light guide plate close to lamp bar
Side can all exist light reflection, scattering phenomena such as, to reduce the utilization rate of light.
In the prior art in backlight module there is light light guide plate close to the side of lamp bar due to reflecting, scattering etc.
And the problem for causing the utilization rate of light low, therefore, above-mentioned technology has improved space.
Summary of the invention
The present invention provides the preparation method of anti-reflection coating and backlight modules, for solving the LED light in backlight module
The linear light source that item issues is by light guide plate, reflector plate and the benefit for causing light when optical diaphragm due to reflecting, scattering etc.
With the low problem of rate.
To solve the above problems, the present invention provides a kind of backlight module, include at least: glue frame and be located at the glue frame
Internal light source and light guide plate;The light source is located at the incident side of the light guide plate;
Wherein, the incident side surface of the light guide plate is equipped with anti-reflection coating, for reduce the emergent light of the light source into
Enter the light guide plate later and reflects the light quantity of the light guide plate.
Wherein, the anti-reflection coating covers the entire incident side surface of the light guide plate.
Accordingly for above-mentioned backlight module, the present invention provides a kind of preparation method of anti-reflection coating, including walks as follows
It is rapid:
Step 1: providing the powder of silica and silicon nitride, the powder of the silica and silicon nitride is added to
In volatile solvent;
Step 2: the solution for being mixed with SiO 2 powder and alpha-silicon nitride powders is equably stirred with magnetic bar, shape
At antireflection solution;
Step 3: the antireflection solution is equably coated in substrate surface;
Step 4: the substrate for being coated with the antireflection solution is positioned below under 100 DEG C of environment under low pressure, so that described anti-
Reflective solutions are formed by curing antireflection film in the substrate surface.
Wherein, the solidification temperature of the antireflection solution is 70 DEG C~90 DEG C.
Wherein, the finally formed anti-reflection coating is with a thickness of 1~5um.
The present invention also provides a kind of preparation methods of anti-reflection coating, include the following steps:
Step 1: providing the powder of niobium pentaoxide, the powder of the niobium pentaoxide is added to volatile solvent
In;
Step 2: equably being stirred the solution for being mixed with niobium pentaoxide powder with magnetic bar, it is molten to form antireflection
Liquid;
Step 3: the antireflection solution is equably coated in substrate surface;
Step 4: the substrate for being coated with the antireflection solution is positioned below under 100 DEG C of environment under low pressure, so that described anti-
Reflective solutions are formed by curing antireflection film in the substrate surface.
Wherein, the solidification temperature of the antireflection solution is 70 DEG C~90 DEG C.
Wherein, the finally formed anti-reflection coating is with a thickness of 1~5um.
The present invention also provides the preparation methods of another anti-reflection coating, include the following steps:
Step 1: providing evaporated device, heating in evaporated device is placed the substrate in;
Step 2: providing PFA organic solution, the PFA organic solution is placed in the evaporation cavity room of the evaporated device
Heated;
Step 3: the PFA organic solution evaporates to form PFA molecule deposition in the substrate surface, to the PFA molecule
Antireflection film is formed in the substrate surface after cooling.
Wherein, the finally formed anti-reflection coating is with a thickness of 1~5um.
Technical solution of the present invention can produce following effect:
A kind of backlight module provided by the invention, wherein light guide plate is equipped with anti-reflection coating close to the incident side of backlight,
When the light of LED light bar passes through this side, transmitance be will increase, and reflectivity can reduce, and the light intensity into light guide plate is bigger, from
And improve the final utilization rate of light.
Silica and nitridation is utilized in the preparation method of three kinds of anti-reflection coatings provided by the invention, two of them method
Silicon has only used niobium pentaoxide, and it is firm that antireflective film may be implemented in the properties such as high temperature resistant, stabilization of above-mentioned three kinds of materials
The characteristics of, while solution-gel method is used, the powder of the powder or only niobium pentaoxide of silica and silicon nitride is used
The solution that magnetic bar is stirring uniformly to obtain uniformly is put on the surface of solids, then is solidified by high temperature, finally in body surface shape
At very thin, uniform antireflection film, thickness is only 1~5um;Another method is prepared using PFA organic solution, and PFA has
Corrosion resistant effect, flame retardant property are high.The anti-reflection coating prepared by the above method is with high purity, hardness is high, thickness is thin, equal
It is even, conducive to the transmitance for increasing light, the reflection of light is reduced, so that reducing dazzle, picture is more clear in liquid crystal display
It is clear.
Detailed description of the invention
Below by attached drawing, invention is further explained.It should be noted that the accompanying drawings in the following description is only
Explanation some embodiments of the present invention are only for not make the creative labor for those skilled in the art
Under the premise of, it is also possible to obtain other drawings based on these drawings.
Fig. 1 is the cross section structure schematic diagram of backlight module provided in an embodiment of the present invention.
Fig. 2 is the flow chart of the preparation method of anti-reflection coating provided in an embodiment of the present invention.
Fig. 3 is the flow chart of another preparation method of anti-reflection coating provided in an embodiment of the present invention.
Fig. 4 is the flow chart of another preparation method of anti-reflection coating provided in an embodiment of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Whole description.Obviously, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those skilled in the art's every other implementation obtained without creative efforts
Example, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that, term " on ", "lower", "inner", "outside", " cross ", " perpendicular ", " table
The orientation or positional relationship of the instructions such as face " is to be based on the orientation or positional relationship shown in the drawings, and is merely for convenience of describing this hair
Bright and simplified description, rather than the device or element of indication or suggestion meaning must have a particular orientation, with specific orientation
Construction and operation, therefore be not considered as limiting the invention.In addition, term " thickness ", " width ", " distance " are all neutral
Word does not indicate that deviation is thick or thin, wide or narrow, long or short, only the objective a certain attribute for indicating device, and term " thin " is then clear
Indicate that the distance between flat articles upper and lower surface is small.
In addition, it should also be noted that, attached drawing offer is only and Relationship Comparison of the present invention close structure and/or step
Suddenly, some and little details of inventive relationship is omitted, it is therefore intended that simplify attached drawing, keeps inventive point very clear, rather than table
Bright device in practice and/or method are exactly and attached drawing is the same, not as the limitation of device in practice and/or method.
Such as Fig. 1, the cross section structure schematic diagram of backlight module provided in an embodiment of the present invention is illustrated, in this embodiment,
Backlight module has been built whole frame by backboard 207 and glue frame 201.Wherein, LED light bar 202 is laterally disposed in glue frame four
The either side of side;Reflector plate 204, light guide plate 205, optical diaphragm 206 successively horizontal abutment in the upper surface of backboard.Wherein, exist
Light guide plate 205 is equipped with anti-reflection coating 203 close to that side of incident side, it should be noted that the anti-reflection coating 203 is
The side of the entire light guide plate is covered evenly.Wherein, the essence of the anti-reflection coating 203 can be silica and nitrogen
SiClx mixed solution or only niobium pentaoxide solution utilize thin film made of solution-gel method, the thickness of this layer film
For 1~5um;Similarly, the essence of the anti-reflection coating 203 is also possible to the thin film that PFA is formed by vapour deposition method, this layer
Film with a thickness of 1~5um.
Since silica and silicon nitride, niobium pentaoxide, PFA have the properties such as high temperature resistant, stabilization, so being finally made
Anti-reflection coating have the characteristics that hardness is high, thickness is thin.Therefore, in light guide plate 205 close to that side table of LED light bar 202
Face is equipped with anti-reflection coating 203, can directly improve the transmitance of light, reduce refractive index, further improves light source light
The utilization rate of line, while dazzle is also reduced, picture is more clear in liquid crystal display.
Such as Fig. 2, the flow chart of the preparation method of anti-reflection coating provided in an embodiment of the present invention is illustrated, in the embodiment
In, the preparation method of the anti-reflection coating is included the following steps: using solution-gel method
S101, the powder of silica and silicon nitride is provided, the powder of the silica and silicon nitride is added to easily
In the solvent of volatilization;
It is unsuitable too low to should be noted that solution proportion shared by silica herein and alpha-silicon nitride powders, in case the later period is molten
Liquid is excessive rarefied, cannot achieve good anti-reflective function, and ratio is also unsuitable excessively high, in order to avoid the later period is caused to be difficult to stir evenly,
Therefore need reasonably to control the ratio of powder according to the actual situation.
The volatile solvent can be water either some rate of volatilizations than faster organic solvent, such as methanol,
Ethyl alcohol.
S102, the solution for being mixed with SiO 2 powder and alpha-silicon nitride powders is equably stirred with magnetic bar, is formed
Antireflection solution;
Wherein, magnetic bar plays the role of two in whipping process: being to keep powder abundant with solvent and uniformly mix respectively
With remove the Ferromagnetic Impurities in the mixture, so must during churning periodic cleaning be adsorbed on it is miscellaneous on magnetic bar
Matter not only can improve the uniformity of stirring, and the purity of solution is also improved.
S103, the antireflection solution is equably coated in substrate surface;
Wherein, smearing should be along the same direction, in order to avoid causing to smear unevenly, the thickness of smearing will finally guarantee 1
~5um, it is unsuitable excessively thin or blocked up.
Step S104, the substrate for being coated with the antireflection solution is positioned below under 100 DEG C of environment under low pressure, so that described
Antireflection solution is formed by curing antireflection film in the substrate surface.
It is understood that the homogeneity of solvent volatilization can be improved for the environment under low pressure lower than 100 DEG C for curing environment,
In, temperature can be set to 70 DEG C~90 DEG C, and curing time was at 30 minutes or so.
Such as Fig. 3, above-mentioned SiO 2 powder and alpha-silicon nitride powders are replaced with into niobium pentaoxide, also can use same
Process prepares anti-reflection coating.
Such as Fig. 4, the flow chart of another preparation method of anti-reflection coating provided in an embodiment of the present invention is illustrated, at this
In embodiment, the preparation method of the anti-reflection coating is included the following steps: using vapour deposition method
S101, evaporated device is provided, places the substrate in heating in evaporated device;
Wherein, substrate, substrate frame and vacuum chamber interior walls should be cleaned in advance, so as not to influence later period film layer purity and
Binding force.
S102, provide PFA organic solution, by the PFA organic solution be placed in the evaporation cavity room of the evaporated device into
Row heat treatment;
It should be noted that must be covered with baffle before PFA organic solution reaches evaporation effect PFA organic solution and
It is other slurry to have been avoided to be splashed on substrate during this period the equipment that substrate pollutes.
S103, the PFA organic solution, which are evaporated, to form PFA molecule deposition in the substrate surface, cold to the PFA molecule
But antireflection film is formed in the substrate surface after.
It is understood that baffle can be taken away by vapor deposition in substrate table after PFA organic solution is begun vaporization
Face, during this period, substrate temperature, plating material evaporating temperature, deposition pressure all affect the effect of vapor deposition, so will be for vapor deposition material
The suitable parameter of material selection.It should be noted that antireflection film is used herein with a thickness of 1~5um after thicknesses of layers reaches requirement
Baffle covers evaporation source and stops heating, but not import air at once.
The preparation method and backlight module for being provided for the embodiments of the invention anti-reflection coating above have carried out detailed Jie
It continues, used herein a specific example illustrates the principle and implementation of the invention, and the explanation of above embodiments is only
It is to be used to help understand technical solution of the present invention and its core concept;Those skilled in the art should understand that: its according to
It is so possible to modify the technical solutions described in the foregoing embodiments, or part of technical characteristic is equally replaced
It changes;And these are modified or replaceed, the technical solution for various embodiments of the present invention that it does not separate the essence of the corresponding technical solution
Range.
Claims (10)
1. a kind of backlight module, which is characterized in that include at least: glue frame and light source and leaded light inside the glue frame
Plate;The light source is located at the incident side of the light guide plate;
Wherein, the incident side surface of the light guide plate is equipped with anti-reflection coating, and the emergent light for reducing the light source enters institute
It states light guide plate later and reflects the light quantity of the light guide plate.
2. backlight module as described in claim 1, which is characterized in that the anti-reflection coating covers the entire of the light guide plate
Incident side surface.
3. a kind of preparation method of anti-reflection coating as described in claim 1, which comprises the steps of:
Step 1: providing the powder of silica and silicon nitride, the powder of the silica and silicon nitride is added to and is easily waved
In the solvent of hair;
Step 2: equably being stirred the solution for being mixed with SiO 2 powder and alpha-silicon nitride powders with magnetic bar, formed anti-
Reflective solutions;
Step 3: the antireflection solution is equably coated in substrate surface;
Step 4: the substrate for being coated with the antireflection solution is positioned below under 100 DEG C of environment under low pressure, so that the antireflection
Solution is formed by curing antireflection film in the substrate surface.
4. method as claimed in claim 3, which is characterized in that the solidification temperature of the antireflection solution is 70 DEG C~90 DEG C.
5. method as claimed in claim 3, which is characterized in that the antireflection film is with a thickness of 1~5um.
6. a kind of preparation method of anti-reflection coating as described in claim 1, which comprises the steps of:
Step 1: providing the powder of niobium pentaoxide, the powder of the niobium pentaoxide is added in volatile solvent;
Step 2: equably being stirred the solution for being mixed with niobium pentaoxide powder with magnetic bar, antireflection solution is formed;
Step 3: the antireflection solution is equably coated in substrate surface;
Step 4: the substrate for being coated with the antireflection solution is positioned below under 100 DEG C of environment under low pressure, so that the antireflection
Solution is formed by curing antireflection film in the substrate surface.
7. method as claimed in claim 6, which is characterized in that the solidification temperature of the antireflection solution is 70 DEG C~90 DEG C.
8. method as claimed in claim 6, which is characterized in that the antireflection film is with a thickness of 1~5um.
9. a kind of preparation method of anti-reflection coating as described in claim 1, which comprises the steps of:
Step 1: providing evaporated device, heating in evaporated device is placed the substrate in;
Step 2: providing PFA organic solution, the PFA organic solution is placed in the evaporation cavity room of the evaporated device and is carried out
Heat treatment;
Step 3: the PFA organic solution evaporates to form PFA molecule deposition in the substrate surface, to PFA molecule cooling
Antireflection film is formed in the substrate surface afterwards.
10. method as claimed in claim 9, which is characterized in that the antireflection film is with a thickness of 1~5um.
Priority Applications (2)
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CN201811206420.XA CN109307907A (en) | 2018-10-17 | 2018-10-17 | The preparation method of anti-reflection coating and backlight module with the anti-reflection coating |
PCT/CN2019/074831 WO2020077920A1 (en) | 2018-10-17 | 2019-02-12 | Preparation method for antireflective coating and backlight module having same |
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CN201811206420.XA CN109307907A (en) | 2018-10-17 | 2018-10-17 | The preparation method of anti-reflection coating and backlight module with the anti-reflection coating |
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CN109307907A true CN109307907A (en) | 2019-02-05 |
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CN201811206420.XA Pending CN109307907A (en) | 2018-10-17 | 2018-10-17 | The preparation method of anti-reflection coating and backlight module with the anti-reflection coating |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2020077920A1 (en) * | 2018-10-17 | 2020-04-23 | 深圳市华星光电半导体显示技术有限公司 | Preparation method for antireflective coating and backlight module having same |
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WO2020077920A1 (en) * | 2018-10-17 | 2020-04-23 | 深圳市华星光电半导体显示技术有限公司 | Preparation method for antireflective coating and backlight module having same |
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