CN109161897A - A kind of polishing agent and preparation method thereof for copper-titanium alloy - Google Patents
A kind of polishing agent and preparation method thereof for copper-titanium alloy Download PDFInfo
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- CN109161897A CN109161897A CN201811084384.4A CN201811084384A CN109161897A CN 109161897 A CN109161897 A CN 109161897A CN 201811084384 A CN201811084384 A CN 201811084384A CN 109161897 A CN109161897 A CN 109161897A
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- China
- Prior art keywords
- parts
- polishing agent
- copper
- titanium alloy
- pomelo peel
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
Abstract
The polishing agent and preparation method thereof that the invention discloses a kind of for copper-titanium alloy.Polishing agent includes the raw material of following parts by weight: 10-20 parts of pomelo peel extracting solution, 4-9 parts of chitosan, 10-20 parts of polyethylene glycol, 3-8 parts of sodium tripolyphosphate, 3-8 parts of silicon carbide micro-powder and 4-6 parts of film forming agent.Polishing agent of the invention is stablized, and has the function of preventing copper-titanium alloy surface discolouration, oxidation, and brightness coverage capability is strong, can increase metal surface brightness, while product not chlorine-containing components, and decomposition product is few, and non-corrosive gas not will cause environmental pollution.
Description
Technical field
The polishing agent and preparation method thereof that the present invention relates to a kind of for copper-titanium alloy belongs to titanic alloy machining technology neck
Domain.
Background technique
The processing method means of Treatment of Metal Surface are varied, such as plating, electrophoresis, chemical treatment, surface polishing.And
Metal product in use, due to oxidation, moist or contact chemical substance and corrosive gas etc. in air, causes
Surface of metal product corrosion, adheres to foul greasy dirt situation, in order to increase surface of metal product finish, it is often necessary to made of metal
Product carry out surface polishing treatment.Polishing agent is often added during polishing treatment, to improve the brightness of metal parts, and it is clear
Clean metal surface, polishing are a kind of burnishing actions.Polishing agent " tears " scalping, below one layer of flowing for keeping it within moment
Property, it is and before curing, smoothened due to the effect of surface tension, also have and thinks that polishing is a kind of face surface tension effect
It answers, during the polishing process, the heat generated for friction can make surface softening melting, so not being simple mechanical grinding.?
Matallic surface layer is melted when polishing, but since substrate metal has high thermal conductivity, superficial layer is promptly frozen into amorphous state again,
Before curing, smoothened due to surface tension and the effect of the frictional force of polishing agent.
Traditional polishing agent is to polish metal product in three sour (phosphorus acid-sulfur acid-nitric acid) solution, can also be by fatty alcohol
Polyoxyethylene ether, sodium gluconate, aminotriacetic acid disodium, lauric acid diethyl amide, sodium nitrite, silica etc. are prepared
It forms, to obtain the effect of blast leveling.But the most commonly used is silica polishings for medal polish at present, although available
Preferable surface effect, but polishing time is long, and too long polishing is easy to cause metal surface to generate corrosion default.Therefore,
Producing a kind of lower metal polish of corrosivity has the very big market demand.
Summary of the invention
For overcome the deficiencies in the prior art, the present invention provides a kind of for the polishing agent of copper-titanium alloy and its preparation side
Method.
The present invention is achieved through the following technical solutions:
A kind of polishing agent for copper-titanium alloy, the raw material including following parts by weight: 10-20 parts of pomelo peel extracting solution, shell are poly-
4-9 parts sugared, 10-20 parts of polyethylene glycol, 3-8 parts of sodium tripolyphosphate, 3-8 parts of silicon carbide micro-powder and 4-6 parts of film forming agent.
A kind of polishing agent for copper-titanium alloy, the pomelo peel extracting solution is through the following steps that obtain: will
Pomelo peel is placed in water, and is heated to 80-100 DEG C, and after reacting 1-2h, after filtering is cooled to 30-40 DEG C, adjusting supernatant pH value is
Pectase and cellulase are added into supernatant by 4-5, and keeping reaction temperature is 30-40 DEG C, react 60-90min；In concentration
Clear liquid obtains adopting after concentrate being extracted with ethyl acetate, and obtains acetic acid ethyl acetate extract, acetic acid ethyl acetate extract is concentrated into closely
It is dry to obtain pomelo peel extracting solution.
A kind of polishing agent for copper-titanium alloy is in terms of 10 parts by pomelo peel parts by weight, and the water of addition is 20-
30 parts, the pectase of addition is 0.1-0.3 parts, and the cellulase of addition is 0.2-0.4 parts.
A kind of polishing agent for copper-titanium alloy, the film forming agent include the raw material of following parts by weight: silicic acid
10-15 parts of sodium, 1-5 parts of methylcellulose, 10-20 parts of monobutyl ether acetate and 10-20 parts of polyurethane.
A kind of polishing agent for copper-titanium alloy, the film forming agent through the following steps that obtain: by poly- ammonia
Ester and monobutyl ether acetate mix in a kettle, then sequentially add methylcellulose and sodium metasilicate, obtain into after mixing
Film.
A kind of preparation method of the polishing agent for copper-titanium alloy: polyethylene glycol is placed in reaction kettle, under stirring condition,
It sequentially adds sodium tripolyphosphate and silicon carbide micro-powder and sequentially adds chitosan and pomelo peel extracting solution, most after adjusting pH value is 7
After film forming agent is added, obtain polishing agent after mixing.
Advantageous effects of the invention:
Polishing agent of the invention is stablized, and has the function of preventing copper-titanium alloy surface discolouration, oxidation, brightness coverage capability is strong, can
Increase metal surface brightness, while product not chlorine-containing components, decomposition product is few, and non-corrosive gas not will cause environmental pollution.
Using pomelo peel extracting solution, pomelo peel is taken full advantage of, environmentally protective, obtained pomelo peel extracting solution improves throwing
The stability of photo etching entirety.
Film former component of the invention is used cooperatively, and can be worked with polishing agent other components one, is quickly closed in copper titanium
Gold surface forms layer protecting film, and copper-titanium alloy is prevented to be corroded.
Specific embodiment
The following examples are only intended to illustrate the technical solution of the present invention more clearly, and cannot be used as a limitation the limitation present invention
Protection scope.
Embodiment 1
A kind of polishing agent for copper-titanium alloy, the raw material including following parts by weight: 10 parts of pomelo peel extracting solution, chitosan 4
Part, 20 parts of polyethylene glycol, 3 parts of sodium tripolyphosphate, 8 parts of silicon carbide micro-powder and 4 parts of film forming agent.
Polyethylene glycol is placed in reaction kettle, under stirring condition, sequentially adds sodium tripolyphosphate and silicon carbide micro-powder, is adjusted
After pH value is 7, chitosan and pomelo peel extracting solution are sequentially added, film forming agent is eventually adding, obtains polishing agent after mixing.
The pomelo peel extracting solution is through the following steps that obtain: pomelo peel being placed in water, is heated to 80-100 DEG C, instead
After answering 1-2h, after filtering is cooled to 30-40 DEG C, adjusting supernatant pH value is 4-5, and pectase and cellulose are added into supernatant
Enzyme, keeping reaction temperature is 30-40 DEG C, reacts 60-90min；Concentrated supernatant obtains adopting after concentrate being extracted with ethyl acetate,
Acetic acid ethyl acetate extract is obtained, acetic acid ethyl acetate extract is concentrated into and close dry obtains pomelo peel extracting solution.
It is in terms of 10 parts by pomelo peel parts by weight, the water of addition is 20 parts, and the pectase of addition is 0.1 part, the fibre of addition
Tieing up plain enzyme is 0.2 part.
The film forming agent includes the raw material of following parts by weight: 15 parts of sodium metasilicate, 1 part of methylcellulose, monobutyl ether acetate
20 parts and 20 parts of polyurethane.The film forming agent through the following steps that obtain: by polyurethane and monobutyl ether acetate in reaction kettle
Then middle mixing sequentially adds methylcellulose and sodium metasilicate, obtains film forming agent after mixing.
Embodiment 2
A kind of polishing agent for copper-titanium alloy, the raw material including following parts by weight: 20 parts of pomelo peel extracting solution, chitosan 9
Part, 10 parts of polyethylene glycol, 8 parts of sodium tripolyphosphate, 3 parts of silicon carbide micro-powder and 6 parts of film forming agent.
Polyethylene glycol is placed in reaction kettle, under stirring condition, sequentially adds sodium tripolyphosphate and silicon carbide micro-powder, is adjusted
After pH value is 7, chitosan and pomelo peel extracting solution are sequentially added, film forming agent is eventually adding, obtains polishing agent after mixing.
The pomelo peel extracting solution is through the following steps that obtain: pomelo peel being placed in water, is heated to 80-100 DEG C, instead
After answering 1-2h, after filtering is cooled to 30-40 DEG C, adjusting supernatant pH value is 4-5, and pectase and cellulose are added into supernatant
Enzyme, keeping reaction temperature is 30-40 DEG C, reacts 60-90min；Concentrated supernatant obtains adopting after concentrate being extracted with ethyl acetate,
Acetic acid ethyl acetate extract is obtained, acetic acid ethyl acetate extract is concentrated into and close dry obtains pomelo peel extracting solution.
It is in terms of 10 parts by pomelo peel parts by weight, the water of addition is 30 parts, and the pectase of addition is 0.3 part, the fibre of addition
Tieing up plain enzyme is 0.4 part.
The film forming agent includes the raw material of following parts by weight: 10 parts of sodium metasilicate, 5 parts of methylcellulose, monobutyl ether acetate
10 parts and 10 parts of polyurethane.The film forming agent through the following steps that obtain: by polyurethane and monobutyl ether acetate in reaction kettle
Then middle mixing sequentially adds methylcellulose and sodium metasilicate, obtains film forming agent after mixing.
Embodiment 3
A kind of polishing agent for copper-titanium alloy, the raw material including following parts by weight: 15 parts of pomelo peel extracting solution, chitosan 5
Part, 16 parts of polyethylene glycol, 5 parts of sodium tripolyphosphate, 5 parts of silicon carbide micro-powder and 5 parts of film forming agent.
Polyethylene glycol is placed in reaction kettle, under stirring condition, sequentially adds sodium tripolyphosphate and silicon carbide micro-powder, is adjusted
After pH value is 7, chitosan and pomelo peel extracting solution are sequentially added, film forming agent is eventually adding, obtains polishing agent after mixing.
The pomelo peel extracting solution is through the following steps that obtain: pomelo peel being placed in water, is heated to 80-100 DEG C, instead
After answering 1-2h, after filtering is cooled to 30-40 DEG C, adjusting supernatant pH value is 4-5, and pectase and cellulose are added into supernatant
Enzyme, keeping reaction temperature is 30-40 DEG C, reacts 60-90min；Concentrated supernatant obtains adopting after concentrate being extracted with ethyl acetate,
Acetic acid ethyl acetate extract is obtained, acetic acid ethyl acetate extract is concentrated into and close dry obtains pomelo peel extracting solution.
It is in terms of 10 parts by pomelo peel parts by weight, the water of addition is 20-30 parts, and the pectase of addition is 0.2 part, addition
Cellulase is 0.4 part.
The film forming agent includes the raw material of following parts by weight: 12 parts of sodium metasilicate, 3 parts of methylcellulose, monobutyl ether acetate
15 parts and 15 parts of polyurethane.The film forming agent through the following steps that obtain: by polyurethane and monobutyl ether acetate in reaction kettle
Then middle mixing sequentially adds methylcellulose and sodium metasilicate, obtains film forming agent after mixing.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, several improvement and deformations can also be made, these improvement and deformations
Also it should be regarded as protection scope of the present invention.
Claims (6)
1. a kind of polishing agent for copper-titanium alloy, characterized in that the raw material including following parts by weight: pomelo peel extracting solution
10-20 parts, 4-9 parts of chitosan, 10-20 parts of polyethylene glycol, 3-8 parts of sodium tripolyphosphate, 3-8 parts of silicon carbide micro-powder and film forming agent 4-
6 parts.
2. a kind of polishing agent for copper-titanium alloy according to claim 1, characterized in that the pomelo peel extracting solution is
It is obtained by following steps: pomelo peel is placed in water, be heated to 80-100 DEG C, after reacting 1-2h, filtering is cooled to 30-40 DEG C
Afterwards, adjusting supernatant pH value is 4-5, and pectase and cellulase are added into supernatant, and keeping reaction temperature is 30-40 DEG C,
React 60-90min；Concentrated supernatant obtains adopting after concentrate being extracted with ethyl acetate, and acetic acid ethyl acetate extract is obtained, by acetic acid
Ethyl ester extract liquor, which is concentrated into, close dry obtains pomelo peel extracting solution.
3. a kind of polishing agent for copper-titanium alloy according to claim 2, characterized in that be with pomelo peel parts by weight
10 parts of meters, the water of addition are 20-30 parts, and the pectase of addition is 0.1-0.3 parts, and the cellulase of addition is 0.2-0.4 parts.
4. a kind of polishing agent for copper-titanium alloy according to claim 1, characterized in that the film forming agent includes following
The raw material of parts by weight: 10-15 parts of sodium metasilicate, 1-5 parts of methylcellulose, 10-20 parts of monobutyl ether acetate and polyurethane 10-20
Part.
5. a kind of polishing agent for copper-titanium alloy according to claim 1, characterized in that the film forming agent be by with
What lower step obtained: polyurethane and monobutyl ether acetate being mixed in a kettle, then sequentially add methylcellulose and silicic acid
Sodium obtains film forming agent after mixing.
6. according to the preparation method of polishing agent described in any of the above claim, characterized in that polyethylene glycol is placed in reaction
In kettle, under stirring condition, sequentially add sodium tripolyphosphate and silicon carbide micro-powder, adjust after pH value is 7, sequentially add chitosan and
Pomelo peel extracting solution is eventually adding film forming agent, obtains polishing agent after mixing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811084384.4A CN109161897A (en) | 2018-09-18 | 2018-09-18 | A kind of polishing agent and preparation method thereof for copper-titanium alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811084384.4A CN109161897A (en) | 2018-09-18 | 2018-09-18 | A kind of polishing agent and preparation method thereof for copper-titanium alloy |
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|---|---|
| CN109161897A true CN109161897A (en) | 2019-01-08 |
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|---|---|---|---|
| CN201811084384.4A Pending CN109161897A (en) | 2018-09-18 | 2018-09-18 | A kind of polishing agent and preparation method thereof for copper-titanium alloy |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114323885A (en) * | 2021-12-06 | 2022-04-12 | 万华化学集团股份有限公司 | Double-phase stainless steel etching agent and etching method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002184729A (en) * | 2000-11-23 | 2002-06-28 | Samsung Electronics Co Ltd | Chemical mechanical polishing slurry and method of manufacturing copper wiring by use of the same |
| CN1787895A (en) * | 2003-05-12 | 2006-06-14 | 高级技术材料公司 | Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
| CN102585706A (en) * | 2012-01-09 | 2012-07-18 | 清华大学 | Acidic chemical and mechanical polishing composition |
| CN102796458B (en) * | 2012-07-17 | 2014-04-23 | 清华大学 | Chemical mechanical polishing aqueous composite and chemical mechanical polishing process of titanium substrate |
-
2018
- 2018-09-18 CN CN201811084384.4A patent/CN109161897A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002184729A (en) * | 2000-11-23 | 2002-06-28 | Samsung Electronics Co Ltd | Chemical mechanical polishing slurry and method of manufacturing copper wiring by use of the same |
| CN1787895A (en) * | 2003-05-12 | 2006-06-14 | 高级技术材料公司 | Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
| CN102585706A (en) * | 2012-01-09 | 2012-07-18 | 清华大学 | Acidic chemical and mechanical polishing composition |
| CN102796458B (en) * | 2012-07-17 | 2014-04-23 | 清华大学 | Chemical mechanical polishing aqueous composite and chemical mechanical polishing process of titanium substrate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114323885A (en) * | 2021-12-06 | 2022-04-12 | 万华化学集团股份有限公司 | Double-phase stainless steel etching agent and etching method |
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Application publication date: 20190108 |
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