CN109116016A - The manufacturing method of the porous ELISA Plate of quartz glass and a kind of quartz glass ELISA Plate - Google Patents
The manufacturing method of the porous ELISA Plate of quartz glass and a kind of quartz glass ELISA Plate Download PDFInfo
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- CN109116016A CN109116016A CN201710483318.3A CN201710483318A CN109116016A CN 109116016 A CN109116016 A CN 109116016A CN 201710483318 A CN201710483318 A CN 201710483318A CN 109116016 A CN109116016 A CN 109116016A
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 121
- 238000002965 ELISA Methods 0.000 title claims abstract description 70
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 26
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000005520 cutting process Methods 0.000 claims abstract description 12
- 238000001035 drying Methods 0.000 claims abstract description 8
- 238000000227 grinding Methods 0.000 claims abstract description 8
- 239000000126 substance Substances 0.000 claims abstract description 8
- 238000000137 annealing Methods 0.000 claims abstract description 4
- 230000005540 biological transmission Effects 0.000 claims description 23
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 18
- 239000008367 deionised water Substances 0.000 claims description 11
- 229910021641 deionized water Inorganic materials 0.000 claims description 11
- 239000000843 powder Substances 0.000 claims description 11
- 239000005350 fused silica glass Substances 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 9
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 9
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 9
- 239000003082 abrasive agent Substances 0.000 claims description 7
- 229910000831 Steel Inorganic materials 0.000 claims description 6
- 238000005188 flotation Methods 0.000 claims description 6
- 239000010959 steel Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims description 3
- 239000010730 cutting oil Substances 0.000 claims description 3
- 238000007667 floating Methods 0.000 claims description 3
- 229910002804 graphite Inorganic materials 0.000 claims description 3
- 239000010439 graphite Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 238000007654 immersion Methods 0.000 claims description 3
- 239000011259 mixed solution Substances 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 3
- 229910052682 stishovite Inorganic materials 0.000 claims description 3
- 229910052905 tridymite Inorganic materials 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- 239000004575 stone Substances 0.000 claims description 2
- 238000004134 energy conservation Methods 0.000 abstract description 2
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 239000000427 antigen Substances 0.000 description 5
- 102000036639 antigens Human genes 0.000 description 5
- 108091007433 antigens Proteins 0.000 description 5
- 239000002253 acid Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000004566 IR spectroscopy Methods 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 230000028993 immune response Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000002211 ultraviolet spectrum Methods 0.000 description 2
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000003018 immunoassay Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
- G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
- G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
- G01N33/551—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals the carrier being inorganic
- G01N33/552—Glass or silica
Landscapes
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Hematology (AREA)
- Urology & Nephrology (AREA)
- Biomedical Technology (AREA)
- Molecular Biology (AREA)
- Microbiology (AREA)
- Cell Biology (AREA)
- Biotechnology (AREA)
- Inorganic Chemistry (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Glass Compositions (AREA)
Abstract
The present invention relates to the manufacturing method of the porous ELISA Plate of quartz glass and a kind of prepared quartz glass ELISA Plates.Step of the present invention is to prepare quartz glass plate；Cutting, turn hole；Fine grinding；It is impregnated with 10% ~ 20% hydrofluoric acid solution, water is cleaned to neutrality, drying；Flame polish；Annealing destressing, until quartz glass ELISA Plate is unstressed.Prepared quartz glass ELISA Plate has hardness high, and chemical stability is good, is not limited by various conditions, can assemble use, energy conservation and environmental protection repeatedly.
Description
Technical field
The present invention relates to immunoassay device preparation and device production technical fields, and it is porous to relate in particular to quartz glass
The manufacturing method of ELISA Plate and a kind of prepared quartz glass ELISA Plate.
Background technique
Immune detection is the method for the most common detection target molecule of life science, enzyme-linked immunosorbent assay
(ELISA) be immune detection important component.ELISA is broadly divided into two kinds of reactions: one is between antigen and antibody
Immune response, another kind is biomolecule and adsorbed solid phase surface.In enzyme-linked immunosorbent assay (ELISA), participate in
Purity, concentration and the ratio of the antigen of immunological response, antibody, labelled antibody or antigen；Buffer type, concentration and ion are strong
The conditions such as degree, pH value and reaction temperature, time play key effect.In addition, the ELISA Plate surface as carrier is to antigen, antibody
Or the absorption of antigen antibody complex also plays very important effect.
In the prior art, the most common material of ELISA ELISA Plate is polystyrene, and there are the following problems for polystyrene:
(1) not oil resistant rouge, not acid and alkali-resistance, ultraviolet light transmission is not high, and poor chemical stability is easily deformed, and is dissolvable in water organic molten
In liquid；
(2) material hardness is low, and chemical structure is unstable, and surface is easy to oxidize, discoloration is easy after being irradiated by ultraviolet light, to spectrum
Measurement data changes greatly, and stability is not high.
Summary of the invention
The purpose of the present invention is to solve the above problem, provides a kind of manufacturer of porous ELISA Plate of high-performance quartz glass
Method and a kind of prepared quartz glass ELISA Plate.
To solve the above-mentioned problems, The technical solution adopted by the invention is as follows:
The manufacturing method of the porous ELISA Plate of quartz glass, mainly comprises the technical steps that:
(1) quartz glass plate is prepared；
(2) quartz glass plate is cut, turn hole processing；
(3) fine grinding is carried out to the quartz glass plate after cutting, turn hole processing, obtains quartz glass ELISA Plate blank；
(4) quartz glass ELISA Plate blank is impregnated 10 ~ 30 minutes with 10% ~ 20% hydrofluoric acid solution, and deionized water is used after taking-up
Cleaning is put into drying box and carries out drying and processing to neutrality；
(5) the quartz glass ELISA Plate blank dried, is placed in graphite polished land, using oxyhydrogen flame to quartz glass
ELISA Plate blank carries out flame polish；
(6) annealing destressing is carried out after the completion of polishing, is annealed 1000 ~ 1100 DEG C of set temperature, 2 ~ 3h of constant temperature, is then dropped naturally
Temperature；
(7) above-mentioned step (6) is repeated, until quartz glass ELISA Plate is unstressed.
The optimization of manufacturing method about the porous ELISA Plate of quartz glass, the preparation method of quartz glass plate include following work
Skill step:
(1) prepare qualified quartz glass, qualified quartz glass SiO2Mass percentage is transparent not less than 99.99%
Bubble-free, it is seen that the transmitance of light and ultraviolet light is not less than 90% or more；
(2) qualified quartz glass ore is put into immersion 20h or more in the hydrochloric acid of mass percentage 10% ~ 20%, then used
Water rinses, and is finally cleaned up with deionized water, is heated up to 900 ~ 950 DEG C, keeps the temperature 3 ~ 5h, then that quartz glass ore is quick
It is broken to pour into water in cold water；
(3) the quartz glass ore after water is broken is crushed with dismembyator, is then sieved, the silica glass particle sieved
0.02 ~ 0.1mm, then impregnate 20h or more with hydrochloric acid and hydrofluoric acid mixed solution, wherein hydrochloric acid 10% ~ 20%, hydrofluoric acid quality percentage
Then content 5% ~ 10% is cleaned with deionized water to neutrality, cleaned fused silica powder is carried out flotation, removes its floating material
With non-quartz glass substance, deionized water of the fused silica powder with resistance greater than 1m after flotation cleans up repeatedly, then
Dehydration, drying；
(4) quartz glass sticks together processing: fused silica powder obtained above is fused into glass at a temperature of 1750 DEG C or more
State, the glass of fusing are gradually cooled into column solid quartz glass and stick together；
(5) quartz glass plate is processed: by quartz glass plate cut growth cube, 120 ~ 130 millimeters of length is 80 ~ 90 millimeters wide,
It is 10 ~ 15 millimeters thick, it is spare.
It advanced optimizes, quartz glass plate cutting process, steel tool section moves back and forth, and in cutting process, sprays into notch
The mixed liquor of silicon carbide micro-powder abrasive material and cutting oil, tool section brings abrasive material in notch into, until workpiece is cut open.
Advanced optimize, in step (3) quartz glass plate use first 280 mesh silicon carbide to quartz glass ELISA Plate surface into
Row grinding, the tool marks that removal machining center leaves；Then surface fine grinding processing is carried out with 600 mesh silicon carbide again.
It advanced optimizes, oxyhydrogen flame hydrogen atom and oxygen atom molar ratio are 2:1 in step (5) flame polish.
A kind of quartz glass enzyme mark prepared by manufacturing method using the above-mentioned porous ELISA Plate of any one quartz glass
Plate, ELISA Plate are cuboid, grow 120 ~ 130 millimeters, 80 ~ 90 millimeters wide, 10 ~ 15 millimeters thick, lateral on ELISA Plate, longitudinal direction
It is equipped with light transmission groove side by side, light transmission groove is cylindrical through-hole.
A kind of optimization of quartz glass ELISA Plate, light transmission groove top and bottom are respectively equipped with lens.
It advanced optimizes, the lens are push button, and lens are the cylindrical of one side opening comprising bottom surface and side
Wall, side wall diameter are consistent with light transmission groove diameter.
It advanced optimizes, is integrally of coupled connections between lens side wall and light transmission groove.
It advanced optimizes, lens side wall and bottom surface junction are using whole groove.
The invention has the benefit that
(1) the quartz glass ELISA Plate prepared by the present invention has extremely low thermal expansion coefficient, and the temperature tolerance of superelevation is high
Chemical stability, excellent electrical insulating property, optimal ultraviolet spectra and visible light and infrared spectroscopy performance, it is resistance to acid, alkali
Corrosive nature enhancing.
(2) the quartz glass ELISA Plate prepared by the present invention has hardness high, and chemical stability is good, not by various items
Part limitation, it can be used repeatedly, reaches energy conservation and environmental protection.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of quartz glass ELISA Plate；
Fig. 2 is the structural schematic diagram of lens；
Appended drawing reference: ELISA Plate -1, light transmission groove -2, lens -3, bottom surface -31, side wall -32, groove -33.
Specific embodiment
The preferred embodiment of the present invention is described in detail below so that advantages and features of the invention can be easier to by
It will be appreciated by those skilled in the art that so as to make a clearer definition of the protection scope of the present invention.
Specific embodiment one: the manufacturing method of the porous ELISA Plate of quartz glass
The manufacturing method of the porous ELISA Plate of quartz glass, mainly comprises the technical steps that:
(1) prepare quartz glass plate: the preparation method of quartz glass plate comprises the technical steps that:
Prepare qualified quartz glass, qualified quartz glass SiO2Mass percentage is not less than 99.99%, transparent nothing
Bubble, it is seen that the transmitance of light and ultraviolet light is not less than 90% or more；
Qualified quartz glass ore is put into immersion 20h or more in the hydrochloric acid of mass percentage 10% ~ 20%, is then rushed with water
It washes, is finally cleaned up with deionized water, be heated up to 900 ~ 950 DEG C, be quickly poured into quartz glass ore after 3 ~ 5h of heat preservation cold
Water is broken in water；
Quartz glass after water is broken is crushed with dismembyator, is then sieved, and the silica glass particle 0.02 sieved ~
0.1mm, then impregnate 20h or more with hydrochloric acid and hydrofluoric acid mixed solution, wherein hydrochloric acid 10% ~ 20%, hydrofluoric acid mass percentage
5% ~ 10%, it is then cleaned with deionized water to neutrality, cleaned fused silica powder is subjected to flotation, remove its floating material and non-
Quartz particles, deionized water of the fused silica powder with resistance greater than 1m after flotation clean up repeatedly, are then dehydrated, dry
It is dry；
Quartz glass sticks together processing: fused silica powder obtained above being fused into glassy state at a temperature of 1750 DEG C or more, is melted
The glass of change is gradually cooled into column solid quartz glass and sticks together；
Quartz glass plate processing: by quartz glass plate cut growth cube, 120 ~ 130 millimeters are grown, 80 ~ 90 millimeters wide, thickness 10
It is ~ 15 millimeters, spare.Ready-made quartz glass is sticked together to be fixed on multi-cutting machine device with glue and be fixed by quartz glass plate cutting process
On platform, a number of steel tool section is fixed on knife platform, drives steel tool section to move reciprocatingly by crank link mechanism.Stone
English glass, which sticks together, applies pressure to steel tool section from bottom to top, while spraying into 240 mesh silicon carbide abrasives from top to bottom and cutting oil
Mixed liquor, steel tool section can bring abrasive material and oil in notch into, and quartz glass sticks together and is slowly cut open.Present embodiment one
It is secondary to cut multi-disc quartz glass plate, smooth cut, cutting accuracy height.
(2) quartz glass plate is cut, turn hole processing；Quartz glass plate is fixed on CNC numerical control machining center to put down
On platform, the quartz glass ELISA Plate sheet template machining center program that will be drawn with CAD is proofreaded along edge, is adjusted and is added
Work center feeding speed, revolving speed, diamond particles degree, aperture depth are opened CNC numerical control machining center program and are processed, seen
Screen data situation of change is examined, whether there is or not variations for comparison machining center feed cutting speed and data.It examines in CNC numerical control processing
Whether the quartz glass ELISA Plate blank size that the heart is completed is up to standard, spacing between fixation hole, checks whether surface is coarse, whether there is or not
Chipping, arrisdefect phenomenon.
(3) fine grinding is carried out to the quartz glass plate after cutting, turn hole processing, obtains quartz glass ELISA Plate blank；It is first
First quartz glass ELISA Plate surface is ground with 280 mesh silicon carbide, the tool marks that removal machining center leaves；Then it uses again
600 mesh silicon carbide carry out surface fine grinding processing.
(4) quartz glass ELISA Plate blank with 10% ~ 20% hydrofluoric acid solution impregnate 10 ~ 30 minutes, spent after taking-up from
Sub- water is cleaned to neutrality, is put into drying box and is carried out drying and processing；
(5) the quartz glass ELISA Plate blank dried, is placed in graphite polished land, mixes up ratio using oxyhydrogen flame,
Oxyhydrogen flame hydrogen atom and oxygen atom molar ratio are 2:1.Flame polish is carried out to quartz glass ELISA Plate blank；
(6) annealing destressing is carried out after the completion of polishing, is annealed 1000 ~ 1100 DEG C of set temperature, 2 ~ 3h of constant temperature, then cutting electricity
Source when waiting that temperature is down to 300C ° in furnaces, opens fire door and continues to be cooled to room temperature；.
(7) above-mentioned step (6) is repeated, until quartz glass ELISA Plate is unstressed.
Quartz glass ELISA Plate prepared by this method has extremely low thermal expansion coefficient, and the temperature tolerance of superelevation is high
Chemical stability, excellent electrical insulating property, optimal ultraviolet spectra and visible light and infrared spectroscopy performance, to acid, alkali
Corrosion resistance enhancing.
A kind of specific embodiment two: quartz glass ELISA Plate
Using a kind of quartz glass ELISA Plate prepared by specific embodiment one, ELISA Plate 1 is cuboid, length 120 ~ 130
Millimeter, 80 ~ 90 millimeters wide, lateral, longitudinal on thick 10 ~ 15 millimeters of ELISA Plates to be equipped with light transmission groove 2 side by side, light transmission groove 2 is to justify
Cylinder shape through-hole, light transmission groove 2 is for storing liquid material.
For the ease of observing light transmission inside grooves state, lens 3 are respectively equipped at the top and bottom of light transmission groove 2.
For the ease of the installation of lens, the lens 3 are push button, and lens 3 are the cylindrical of one side opening comprising
Bottom surface 31 and side wall 32, side wall diameter is consistent with light transmission groove diameter, and lens withhold light transmission bottom portion of groove and top.
For being fixedly connected between lens and light transmission groove, the whole company of coupling between lens side wall 32 and light transmission groove 2
It connects, this connection type enhances the translucency between lens recess side wall and light transmission groove.
In order to further increase the translucency between lens side wall and light transmission groove, lens side wall 32 and 31 junction of bottom surface
Using whole groove 33, groove 33 guarantees no leakage in use, does not rupture.
The basic principles, main features and advantages of the present invention have been shown and described above.The technology of the industry
For personnel it should be appreciated that the present invention is not limited to the above embodiments, the description in above embodiments and description is only the present invention
Preference, the present invention do not limited by above-mentioned preference, without departing from the spirit and scope of the present invention, the present invention
Can also there are various changes and modifications, these changes and improvements are both fallen in the scope of protection of present invention.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding
And modification, the scope of the present invention is defined by the appended.
Claims (10)
1. the manufacturing method of the porous ELISA Plate of quartz glass, mainly comprises the technical steps that:
(1) quartz glass plate is prepared；
(2) quartz glass plate is cut, turn hole processing；
(3) fine grinding is carried out to the quartz glass plate after cutting, turn hole processing, obtains quartz glass ELISA Plate blank；
(4) quartz glass ELISA Plate blank is impregnated 10 ~ 30 minutes with 10% ~ 20% hydrofluoric acid solution, and deionized water is used after taking-up
Cleaning is put into drying box and carries out drying and processing to neutrality；
(5) the quartz glass ELISA Plate blank dried, is placed in graphite polished land, using oxyhydrogen flame to quartz glass
ELISA Plate blank carries out flame polish；
(6) annealing destressing is carried out after the completion of polishing, is annealed 1000 ~ 1100 DEG C of set temperature, 1 ~ 3h of constant temperature, is then dropped naturally
Temperature；
(7) above-mentioned step (6) is repeated, until quartz glass ELISA Plate is unstressed.
2. the manufacturing method of the porous ELISA Plate of quartz glass according to claim 1, which is characterized in that quartz glass plate
Preparation method comprises the technical steps that:
(1) prepare qualified quartz glass, qualified quartz glass SiO2Mass percentage is transparent not less than 99.99%
Bubble-free, it is seen that the transmitance of light and ultraviolet light is not less than 90%；
(2) qualified quartz glass is put into immersion 20h or more in the hydrochloric acid of mass percentage 10% ~ 20%, is then rushed with water
It washes, is finally cleaned up with deionized water, be heated up to 900 ~ 950 DEG C, quartz glass is quickly poured into cold water after keeping the temperature 1 ~ 5h
Water is broken；
(3) quartz glass after water is broken is crushed with dismembyator, is then sieved, and the silica glass particle 0.02 sieved ~
0.1mm, then impregnate 20h or more with hydrochloric acid and hydrofluoric acid mixed solution, wherein hydrochloric acid 10% ~ 20%, hydrofluoric acid mass percentage
5% ~ 10%, it is then cleaned with deionized water to neutrality, cleaned fused silica powder is subjected to flotation, remove its floating material and non-
Quartz glass substance, deionized water of the fused silica powder with resistance greater than 1m after flotation clean up, are then dehydrated, dry
It is dry；
(4) quartz glass sticks together processing: fused silica powder obtained above is fused into glass at a temperature of 1750 DEG C or more
State, the glass of fusing are gradually cooled into column solid quartz glass and stick together；
(5) quartz glass plate is processed: by quartz glass plate cut growth cube, 120 ~ 130 millimeters of length is 80 ~ 90 millimeters wide,
It is 10 ~ 15 millimeters thick, it is spare.
3. the manufacturing method of the porous ELISA Plate of quartz glass according to claim 2, which is characterized in that quartz glass plate is cut
Cut process, steel tool section moves back and forth, and in cutting process, sprays into the mixed liquor of abrasive material and cutting oil in notch, and tool section is by abrasive material
It brings into notch, until workpiece is cut open, the abrasive material is silicon carbide micro-powder.
4. the manufacturing method of the porous ELISA Plate of quartz glass according to claim 1, which is characterized in that stone in step (3)
English glass plate first grinds quartz glass ELISA Plate surface with 280 mesh silicon carbide, the tool marks that removal machining center leaves；
Then surface fine grinding processing is carried out with 600 mesh silicon carbide again.
5. the manufacturing method of the porous ELISA Plate of quartz glass according to claim 1, which is characterized in that step (5) flame
Oxyhydrogen flame hydrogen atom and oxygen atom molar ratio are 2:1 in polishing.
6. a kind of quartzy glass prepared by the manufacturing method using the porous ELISA Plate of Claims 1-4 any one quartz glass
Glass ELISA Plate, which is characterized in that ELISA Plate is cuboid, 120 ~ 130 millimeters of length, 80 ~ 90 millimeters wide, 10 ~ 15 millimeters thick,
Lateral on ELISA Plate, longitudinal to be equipped with light transmission groove side by side, light transmission groove is cylindrical through-hole.
7. a kind of quartz glass ELISA Plate according to claim 6, which is characterized in that light transmission groove top and bottom difference
Equipped with lens.
8. a kind of quartz glass ELISA Plate according to claim 7, which is characterized in that the lens are push button, lens
For the cylindrical of one side opening comprising bottom surface and side wall, side wall diameter are consistent with light transmission groove diameter.
9. a kind of quartz glass ELISA Plate according to claim 8, which is characterized in that between lens side wall and light transmission groove
Entirety is of coupled connections.
10. a kind of quartz glass ELISA Plate according to claim 8, which is characterized in that lens side wall and bottom surface junction
Using whole groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710483318.3A CN109116016A (en) | 2017-06-23 | 2017-06-23 | The manufacturing method of the porous ELISA Plate of quartz glass and a kind of quartz glass ELISA Plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710483318.3A CN109116016A (en) | 2017-06-23 | 2017-06-23 | The manufacturing method of the porous ELISA Plate of quartz glass and a kind of quartz glass ELISA Plate |
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| Publication Number | Publication Date |
|---|---|
| CN109116016A true CN109116016A (en) | 2019-01-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710483318.3A Pending CN109116016A (en) | 2017-06-23 | 2017-06-23 | The manufacturing method of the porous ELISA Plate of quartz glass and a kind of quartz glass ELISA Plate |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112919782A (en) * | 2021-03-03 | 2021-06-08 | 盐城明洋石英制品有限公司 | Automatic sintering device for quartz glass |
-
2017
- 2017-06-23 CN CN201710483318.3A patent/CN109116016A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112919782A (en) * | 2021-03-03 | 2021-06-08 | 盐城明洋石英制品有限公司 | Automatic sintering device for quartz glass |
| CN112919782B (en) * | 2021-03-03 | 2023-11-14 | 盐城明洋石英制品有限公司 | Be used for quartz glass automatic sintering device |
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