CN109112362A - A kind of dedicated substrate of Ti-Ni marmem and preparation method thereof of 4D printing flawless - Google Patents

A kind of dedicated substrate of Ti-Ni marmem and preparation method thereof of 4D printing flawless Download PDF

Info

Publication number
CN109112362A
CN109112362A CN201811004388.7A CN201811004388A CN109112362A CN 109112362 A CN109112362 A CN 109112362A CN 201811004388 A CN201811004388 A CN 201811004388A CN 109112362 A CN109112362 A CN 109112362A
Authority
CN
China
Prior art keywords
marmem
flawless
powder
printing
dedicated substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201811004388.7A
Other languages
Chinese (zh)
Other versions
CN109112362B (en
Inventor
李瑞迪
袁铁锤
李澜波
王敏卜
牛朋达
宋波
史玉升
陈超
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central South University
Original Assignee
Central South University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central South University filed Critical Central South University
Priority to CN201811004388.7A priority Critical patent/CN109112362B/en
Publication of CN109112362A publication Critical patent/CN109112362A/en
Application granted granted Critical
Publication of CN109112362B publication Critical patent/CN109112362B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • C22C19/03Alloys based on nickel or cobalt based on nickel
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00Materials specially adapted for additive manufacturing
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/0433Nickel- or cobalt-based alloys
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/045Alloys based on refractory metals
    • C22C1/0458Alloys based on titanium, zirconium or hafnium
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C14/00Alloys based on titanium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Powder Metallurgy (AREA)

Abstract

The invention discloses a kind of dedicated substrates of Ti-Ni marmem and preparation method thereof of 4D printing flawless, the substrate is made of Ni, Ti, Zr, by percentage to the quality, the Ni content is 40%~80%, the Ti content is 10%~60%, the Zr content is 2~10%.The dedicated substrate of the 4D printing Ti-Ni marmem of flawless has been prepared in the present invention, and substrate hardness prepared by the present invention and intensity are high, good toughness, not easy to crack.

Description

A kind of dedicated substrate and its preparation of the Ti-Ni marmem of 4D printing flawless Method
Technical field
The invention belongs to alloy preparation and increases material manufacturing technology fields, and in particular to a kind of titanium nickel shape of 4D printing flawless Dedicated substrate of shape memory alloys and preparation method thereof.
Background technique
Ti-Ni marmem is the memorial alloy developed earliest, since exploitation in 1963, due to its memory effect Answer excellent, performance is stable, good biocompatibility and receive the extensive attention of material science and engineering circles.Since titanium nickel shape is remembered Recall the processing cost height of alloy and preparation processing technology is complicated, limits it in the application in many fields.It is asked to solve these Topic, needs researchers constantly to develop new preparation process.The existing method for preparing Ti-Ni marmem Totally five kinds other than SLM: smelting process, powder metallurgic method, discharge sintering method, Ti-Ni marmem sputtering method and from climing Prolong high-temperature synthesis.These methods have the shortcomings that common: can not prepare complex-shaped workpiece.SLM technology is to utilize metal Powder is completely melt under the heat effect of laser beam, molding a kind of increasing material (Additive through cooled and solidified Manufacturing) technology.For selective laser melting process for conventional method, the sample dimensional accuracy of preparation is higher, And it is capable of processing the part with complex shape that conventional method is not capable of processing.SLM, which prepares Ti-Ni marmem needs, to be made It is easily cracked with the titanium ni substrate of the titanium ni substrate of same composition, but the preparation of existing process, influences its use Performance.
How to prepare the dedicated substrate of the Ti-Ni marmem of the 4D printing of flawless is the key that this technology.
Summary of the invention
The purpose of this section is to summarize some aspects of the embodiment of the present invention and briefly introduce some preferable implementations Example.It may do a little simplified or be omitted to avoid our department is made in this section and the description of the application and the title of the invention Point, the purpose of abstract of description and denomination of invention it is fuzzy, and this simplification or omit and cannot be used for limiting the scope of the invention.
In view of above-mentioned technological deficiency, the present invention is proposed.
Therefore, as one aspect of the present invention, the present invention overcomes the deficiencies in the prior art, provides a kind of 4D Print the dedicated substrate of the Ti-Ni marmem of flawless.
In order to solve the above technical problems, the present invention provides the following technical scheme that a kind of titanium nickel shape of 4D printing flawless The dedicated substrate of shape memory alloys, in which: the substrate is made of Ni, Ti, Zr, and by percentage to the quality, the Ni content is 40%~80%, the Ti content is 10%~60%, the Zr content is 2~10%.
A kind of preferred side of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless Case: by percentage to the quality, the Ni content is 50%~70%, the Ti content is 20%~50%, the Zr content is 2 ~6%.
A kind of preferred side of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless Case: the weight percent of its each component is as follows: Ni:60%, Ti:37%, Zr:3%.
As another aspect of the present invention, the present invention overcomes the deficiencies in the prior art, provides the 4D printing The preparation method of the dedicated substrate of the Ti-Ni marmem of flawless.
In order to solve the above technical problems, the present invention provides the following technical scheme that the titanium nickel shape of 4D printing flawless The preparation method of the dedicated substrate of shape memory alloys comprising,
Ni powder, Ti powder and Zr powder are mixed, and the polyvinyl alcohol adhesive that 1~5wt% is added is sufficiently mixed;
By Ni, Ti, Zr mixed-powder according to 100~500 tons of pressure compression moulding;
By Ni, Ti, Zr mixed-powder vacuum-sintering at plate.
The preparation method of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless A kind of preferred embodiment: the Ni powder is the pure Ni powder of nanoscale, the Ti powder is the pure Ti powder of nanoscale, the Zr powder is that nanoscale is pure Zr powder.
The preparation method of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless A kind of preferred embodiment: the vacuum-sintering, sintering temperature are 800~1200 DEG C, and sintering time is 1~6h.
The preparation method of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless A kind of preferred embodiment: the polyvinyl alcohol mass fraction is 2wt%.
The preparation method of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless A kind of preferred embodiment: by Ni, Ti, Zr mixed-powder according to 400 tons of pressure compression moulding.
The preparation method of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless A kind of preferred embodiment: the vacuum-sintering, sintering temperature are 1100 DEG C.
The preparation method of the dedicated substrate of Ti-Ni marmem as 4D of the present invention printing flawless A kind of preferred embodiment: the substrate surface flawless, hardness is in 280HV or more, and tensile strength is in 760Mpa or more.
Beneficial effects of the present invention: the present invention promotes Ti by addition Zr element2The precipitation of the second phase of Ni hinders crystal grain raw It grows and has refined crystal grain.When average grain size is smaller, the number of grain boundaries in unit volume is more, and the extension needs of crackle are worn More crystal boundaries are crossed, this makes the generation and expansion of crackle obtain very big inhibition.Meanwhile the addition of Zr improves memory and closes The restoring force of gold, principle are that the binding force with the addition of more Zr, between atom increases, and the intensity of alloy increases accordingly, And the yield strength of martensite is also correspondingly improved.Therefore, the 4D printing titanium nickel shape note of flawless has been prepared Recall the dedicated substrate of alloy, and substrate hardness prepared by the present invention and intensity are high, it is good toughness, not easy to crack.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, required use in being described below to embodiment Attached drawing be briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for this For the those of ordinary skill of field, without any creative labor, it can also be obtained according to these attached drawings other Attached drawing.Wherein:
Fig. 1 is the substrate figure after machine-shaping of the present invention.
Specific embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, right combined with specific embodiments below A specific embodiment of the invention is described in detail.
In the following description, numerous specific details are set forth in order to facilitate a full understanding of the present invention, but the present invention can be with Implemented using other than the one described here other way, those skilled in the art can be without prejudice to intension of the present invention In the case of do similar popularization, therefore the present invention is not limited by the specific embodiments disclosed below.
Secondly, " one embodiment " or " embodiment " referred to herein, which refers to, may be included at least one realization side of the invention A particular feature, structure, or characteristic in formula." in one embodiment " that different places occur in the present specification not refers both to The same embodiment, nor the individual or selective embodiment mutually exclusive with other embodiments.
Embodiment 1:
The dedicated substrate of the 4D printing Ti-Ni marmem of flawless, the weight percent of each component are as follows: Ni: 60%, Ti:37%, Zr:3%.
The preparation method of the dedicated substrate of the 4D printing Ti-Ni marmem of flawless, includes the following steps:
The polyvinyl alcohol adhesive that the pure Ni powder of micron order, pure Ti powder and pure Zr powder are mixed, and 2wt% is added carries out abundant Mixing;
By mixed NiTiZr powder according to 400 tons of pressure compression moulding;
It is with conventional vacuum sintering process that NiTiZr is powder sintered at plate, sintering parameter are as follows: 1100 DEG C of sintering temperature, sintering Time 4h, and by NiTiZr sheet fabrication at the dedicated substrate of 4D printing Ti-Ni marmem.
The dedicated substrate flawless of Ti-Ni marmem, hardness are printed by the 4D that above method is prepared 280HV, tensile strength 760MPa.
Embodiment 2:
The dedicated substrate of the 4D printing Ti-Ni marmem of flawless, the weight percent of each component are as follows: Ni: 60%, Ti:38%, Zr:2%.
The preparation method of the dedicated substrate of the 4D printing Ti-Ni marmem of flawless, includes the following steps:
The polyvinyl alcohol adhesive that the pure Ni powder of micron order, pure Ti powder and pure Zr powder are mixed, and 1wt% is added carries out abundant Mixing;
By mixed NiTiZr powder according to 390 tons of pressure compression moulding;
It is with conventional vacuum sintering process that NiTiZr is powder sintered at plate, sintering parameter are as follows: 1080 DEG C of sintering temperature, sintering Time 3h, and by NiTiZr sheet fabrication at the dedicated substrate of 4D printing Ti-Ni marmem.
The dedicated substrate flawless of Ti-Ni marmem, hardness are printed by the 4D that above method is prepared 290HV, tensile strength 780MPa.
Embodiment 3:
The dedicated substrate of the 4D printing Ti-Ni marmem of flawless, the weight percent of each component are as follows: Ni: 60%, Ti:39%, Zr:1%.
The preparation method of the dedicated substrate of the 4D printing Ti-Ni marmem of flawless, includes the following steps:
The polyvinyl alcohol adhesive that the pure Ni powder of micron order, pure Ti powder and pure Zr powder are mixed, and 3wt% is added carries out abundant Mixing;
By mixed NiTiZr powder according to 380 tons of pressure compression moulding;
It is with conventional vacuum sintering process that NiTiZr is powder sintered at plate, sintering parameter are as follows: 1060 DEG C of sintering temperature, sintering Time 2h, and by NiTiZr sheet fabrication at the dedicated substrate of 4D printing Ti-Ni marmem.
The dedicated substrate flawless of Ti-Ni marmem, hardness are printed by the 4D that above method is prepared 295HV, tensile strength 775MPa.
Embodiment 4:
The dedicated substrate of the 4D printing Ti-Ni marmem of flawless, the weight percent of each component are as follows: Ni: 60%, Ti:36%, Zr:4%.
The preparation method of the dedicated substrate of the 4D printing Ti-Ni marmem of flawless, includes the following steps:
The polyvinyl alcohol adhesive that the pure Ni powder of micron order, pure Ti powder and pure Zr powder are mixed, and 4wt% is added carries out abundant Mixing;
By mixed NiTiZr powder according to 410 tons of pressure compression moulding;
It is with conventional vacuum sintering process that NiTiZr is powder sintered at plate, sintering parameter are as follows: 1120 DEG C of sintering temperature, sintering Time 5h, and by NiTiZr sheet fabrication at the dedicated substrate of 4D printing Ti-Ni marmem.
The dedicated substrate flawless of Ti-Ni marmem, hardness are printed by the 4D that above method is prepared 300HV, tensile strength 795MPa.
Embodiment 5:
The dedicated substrate of the 4D printing Ti-Ni marmem of flawless, the weight percent of each component are as follows: Ni: 60%, Ti:35%, Zr:5%.
The preparation method of the dedicated substrate of the 4D printing Ti-Ni marmem of flawless, includes the following steps:
The polyvinyl alcohol adhesive that the pure Ni powder of micron order, pure Ti powder and pure Zr powder are mixed, and 5wt% is added carries out abundant Mixing;
By mixed NiTiZr powder according to 420 tons of pressure compression moulding;
It is with conventional vacuum sintering process that NiTiZr is powder sintered at plate, sintering parameter are as follows: 1140 DEG C of sintering temperature, sintering Time 6h, and by NiTiZr sheet fabrication at the dedicated substrate of 4D printing Ti-Ni marmem, finished product is as shown in Figure 1.
The dedicated substrate flawless of Ti-Ni marmem, hardness are printed by the 4D that above method is prepared 305HV, tensile strength 800MPa.
Embodiment 6:
In order to study influence of the sintering temperature to 4D printing Ti-Ni marmem performance, setting sintering temperature is respectively 1000,1100,1200 and 1300 DEG C, remaining experimental procedure and parameter setting are same as Example 1.
The experimental results showed that at a lower temperature (1000 DEG C), powder particle is not combined through diffusion substantially, in conjunction with Power is lower, largely remains starting powder and simply piles up state, and hole quantity is more, is distributed in irregular shape and size Unevenly.With the raising of sintering temperature, powder particle combine it is even closer, pore appearance tends to be round and smooth, quantity reduce.But The generation that excessively high sintering temperature (1300 DEG C) will lead to a large amount of liquid phases, it is unfavorable to being sintered, because excessive liquid phase will lead to burning Certain contraction and collapsing occur for knot Product size, make sample deformation.
Embodiment 7:
The influence of Ti-Ni marmem performance is printed to 4D for research sintering time,
It is respectively 1h, 2h, 4h and 6h that sintering time, which is arranged, remaining experimental procedure and parameter setting are same as Example 1.
The experimental results showed that most of powder particle remains original simple when soaking time is less than or equal to 4h Pile up state, the combination of powder also defective tightness, sintering also carries out incomplete, and the densification degree of sample is extremely low.Work as the time When increasing to 6h, hole quantity is reduced, and pore-size is also reduced.It is less than or equal to the sample phase of 4h with soaking time Than powder particle is even closer in combination.Mutual bonding and fusion between powder particle are the counterdiffusion of atom phase and infiltration Result.
Embodiment 8:
The influence of Ti-Ni marmem performance is printed to 4D for research pressing pressure,
It is respectively 100,200,300 and 400 tons that pressing pressure, which is arranged, remaining experimental procedure and parameter setting are and embodiment 1 is identical.
The experimental results showed that being easy to produce more porous, induction crackle generation when pressing pressure too small (≤200 tons);And Pressure too big (400 tons) when, be easy to produce internal stress in substrate, improve the formation rate of crackle.When pressing pressure is 300 tons When, substrate performance reaches best.
Embodiment 9:
In order to study metallic element to 4D printing Ti-Ni marmem substrate performance influence, be respectively adopted NiTi, NiTiHf, NiTiNb, NiTiSc and NiTiZr are tested, and are found through experiments that, NiTi, NiTiHf, NiTiNb and NiTiSc Occur influencing the service performance of substrate compared with multiple cracks on substrate, and without any crackle on NiTiZr substrate, service performance is good It is good.
As one aspect of the present invention, the present invention is eliminated by the content of optimization polyvinyl alcohol, compacting and sintering parameter The crackle of substrate, improves its service performance.For polyvinyl alcohol, the very few bond effect that will lead to of content is poor, powder Between combination it is weak, be easy to produce crackle;Content excessively then will lead to the generation of big particle agglomerate, also will increase crackle appearance Probability.For pressing pressure, when pressing pressure is too small, it is easy to produce more porous, induction crackle generation;And pressure is too When big, it is easy to produce internal stress in substrate, improves the formation rate of crackle.For sintering temperature, when sintering temperature is too low, Sintering neck is thinner, and powder particle is not bonded through diffusion substantially, and binding force is lower, and hole quantity is more, is also easy to produce Crackle;And when sintering temperature is excessively high, a large amount of liquid phases generate, and cause sintered product that certain contraction respectively occurs to size, collapses, Make sample deformation, meanwhile, increased thermal stress is also easy to generate crackle.It is therefore desirable to select optimal polyvinyl alcohol content, Compacting and sintering parameter are to prepare the dedicated substrate that the 4D of flawless prints Ti-Ni marmem.Meanwhile the present invention passes through It adds Zr element and promotes Ti2The precipitation of the second phase of Ni hinders grain growth and has refined crystal grain.When average grain size is smaller When, the number of grain boundaries in unit volume is more, and the extension of crackle is needed across more crystal boundaries, this makes the generation and expansion of crackle Exhibition has obtained very big inhibition.Meanwhile the addition of Zr improves the restoring force of memorial alloy, principle is as more Zr add Enter, the binding force between atom increases, and the intensity of alloy increases accordingly, and the yield strength of martensite is also obtained and mentioned accordingly It is high.Therefore, the dedicated substrate of the 4D printing Ti-Ni marmem of flawless, and base prepared by the present invention has been prepared Plate hardness and strength are high, good toughness, not easy to crack.
It should be noted that the above examples are only used to illustrate the technical scheme of the present invention and are not limiting, although referring to preferable Embodiment describes the invention in detail, those skilled in the art should understand that, it can be to technology of the invention Scheme is modified or replaced equivalently, and without departing from the spirit and scope of the technical solution of the present invention, should all be covered in this hair In bright scope of the claims.

Claims (10)

1. a kind of dedicated substrate of the Ti-Ni marmem of 4D printing flawless, it is characterised in that: the substrate by Ni, Ti, Zr composition, by percentage to the quality, the Ni content is 40%~80%, the Ti content is 10%~60%, the Zr Content is 2~10%.
2. the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as described in claim 1, it is characterised in that: with Mass percent meter, the Ni content is 50%~70%, the Ti content is 20%~50%, the Zr content be 2~ 6%.
3. the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as claimed in claim 1 or 2, feature exist In: the weight percent of its each component is as follows: Ni:60%, Ti:37%, Zr:3%.
4. the preparation side of the dedicated substrate of the Ti-Ni marmem of any one of claims 1 to 3 4D printing flawless Method, it is characterised in that: including,
Ni powder, Ti powder and Zr powder are mixed, and the polyvinyl alcohol adhesive that 1~5wt% is added is sufficiently mixed;
By Ni, Ti, Zr mixed-powder according to 100~500 tons of pressure compression moulding;
By Ni, Ti, Zr mixed-powder vacuum-sintering at plate.
5. the preparation method of the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as claimed in claim 4, Be characterized in that: the Ni powder is the pure Ni powder of nanoscale, the Ti powder is the pure Ti powder of nanoscale, the Zr powder is the pure Zr of nanoscale Powder.
6. the preparation method of the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as claimed in claim 4, Be characterized in that: the vacuum-sintering, sintering temperature are 800~1200 DEG C, and sintering time is 1~6h.
7. the preparation method of the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as claimed in claim 4, Be characterized in that: the polyvinyl alcohol mass fraction is 2wt%.
8. the preparation method of the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as claimed in claim 4, It is characterized in that: by Ni, Ti, Zr mixed-powder according to 400 tons of pressure compression moulding.
9. the preparation method of the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as claimed in claim 6, Be characterized in that: the vacuum-sintering, sintering temperature are 1100 DEG C.
10. the preparation method of the dedicated substrate of the Ti-Ni marmem of 4D printing flawless as claimed in claim 4, Be characterized in that: the substrate surface flawless, hardness is in 280HV or more, and tensile strength is in 760Mpa or more.
CN201811004388.7A 2018-08-30 2018-08-30 Special substrate for 4D printing of crack-free titanium-nickel shape memory alloy and preparation method thereof Active CN109112362B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811004388.7A CN109112362B (en) 2018-08-30 2018-08-30 Special substrate for 4D printing of crack-free titanium-nickel shape memory alloy and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811004388.7A CN109112362B (en) 2018-08-30 2018-08-30 Special substrate for 4D printing of crack-free titanium-nickel shape memory alloy and preparation method thereof

Publications (2)

Publication Number Publication Date
CN109112362A true CN109112362A (en) 2019-01-01
CN109112362B CN109112362B (en) 2020-08-04

Family

ID=64861425

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811004388.7A Active CN109112362B (en) 2018-08-30 2018-08-30 Special substrate for 4D printing of crack-free titanium-nickel shape memory alloy and preparation method thereof

Country Status (1)

Country Link
CN (1) CN109112362B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110340933A (en) * 2019-06-28 2019-10-18 华中科技大学 A kind of intelligent bionic crawl clamping device based on 4D printing shaping

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130130112A1 (en) * 2011-11-17 2013-05-23 Byung-joo Chung Silicon based shape memory alloy negative active material, negative active material composition including same, rechargeable lithium battery including same, and method of preparing same
CN105908000A (en) * 2016-06-16 2016-08-31 华南理工大学 Light high-strength and high-tenacity NiTi shape memory alloy composite damping material with wide temperature range and preparing method and application thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130130112A1 (en) * 2011-11-17 2013-05-23 Byung-joo Chung Silicon based shape memory alloy negative active material, negative active material composition including same, rechargeable lithium battery including same, and method of preparing same
CN105908000A (en) * 2016-06-16 2016-08-31 华南理工大学 Light high-strength and high-tenacity NiTi shape memory alloy composite damping material with wide temperature range and preparing method and application thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
岡田直樹等: ""Ti-Ni-Zr合金の形状記憶特性と加工性に及ぼすZr 濃度の影響"", 《日本金属学会誌》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110340933A (en) * 2019-06-28 2019-10-18 华中科技大学 A kind of intelligent bionic crawl clamping device based on 4D printing shaping
CN110340933B (en) * 2019-06-28 2020-08-28 华中科技大学 Intelligent bionic grabbing and clamping device based on 4D printing forming

Also Published As

Publication number Publication date
CN109112362B (en) 2020-08-04

Similar Documents

Publication Publication Date Title
CN109022920A (en) A kind of 4D printing Ti-Ni marmem of flawless and preparation method thereof
CN102363215A (en) Method for preparing chromium aluminum alloy target by powder vacuum hot pressed sintering
CN105734390A (en) Method for preparing cubic boron nitride glomerocryst composite combined with high-entropy alloy
CN110238401A (en) A kind of method that powder rolling prepares high-compactness Fine Grain Ti Alloy
CN106903294B (en) A kind of preparation method and low cost amorphous alloy part of low cost amorphous alloy part
CN102203032A (en) Molybdenum silicide composite material
CN104942291B (en) A kind of hot-pressing sintering method of Ti 6Al 4V alloys
CN109112362A (en) A kind of dedicated substrate of Ti-Ni marmem and preparation method thereof of 4D printing flawless
CN104342579B (en) A kind of high-strength high-elasticity Cu Ni Mn alloys and preparation method thereof
CN106048302B (en) A kind of founding materials for being applied to nuclear power and wind-powered electricity generation and preparation method thereof
CN101224496B (en) Manufacture method of sputtering targets
CN107761094A (en) A kind of method that gradient-structure cladding layer is prepared using combination process in aluminum alloy surface
CN107234196A (en) The atomic ratio Ti-Ni alloy large-sized casting ingot forging method such as one kind
CN110227734A (en) A method of improving Mg/Ti linkage interface performance
CN104550962B (en) A kind of microwave sintering manufacture craft of high-compactness polycrystalline diamond wire drawing die
CN110791693B (en) High-entropy alloy with low Al content, high strength and toughness and acid corrosion resistance and preparation method thereof
CN107034375A (en) A kind of method that utilization hydride powder prepares high-compactness titanium article
CN101649398B (en) Method for synthesizing TiCx particle enhanced nickel base composite material by reaction in-situ
CN1081242C (en) Process for preparing TiNi-base marmem directly from elements powder
CN104588634B (en) A kind of discharge plasma sintering manufacture craft of high rigidity polycrystalline diamond wire drawing die
CN110306075A (en) A kind of New-energy electric vehicle charging pile leads tellurium zirconium copper alloy continuous casting process with Cutting free height
CN107723491B (en) A kind of alterant and metamorphism treatment method for equipping dedicated cast aluminium alloy gold for IC
CN110180913A (en) A method of improving Mg/Al linkage interface performance
CN102732747A (en) Method for preparing Ti-24Nb-8Sn alloy by using TiH2 powder as raw material though powder metallurgy
CN103981398A (en) High-performance metal ceramic cladding material and preparation method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant