CN109046817B - Macromolecule deposition method - Google Patents
Macromolecule deposition method Download PDFInfo
- Publication number
- CN109046817B CN109046817B CN201810830620.6A CN201810830620A CN109046817B CN 109046817 B CN109046817 B CN 109046817B CN 201810830620 A CN201810830620 A CN 201810830620A CN 109046817 B CN109046817 B CN 109046817B
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- cavity
- buffer gas
- gas outlet
- vacuum
- ion beam
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
- B05B5/08—Plant for applying liquids or other fluent materials to objects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
- B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
- B05B5/03—Discharge apparatus, e.g. electrostatic spray guns characterised by the use of gas, e.g. electrostatically assisted pneumatic spraying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
Abstract
The invention relates to the field of material preparation, in particular to a macromolecule deposition method, wherein a pump set is vacuumized; introducing the solution; the buffer gas is introduced into the buffer gas cavity, enters the spray cavity through the gas outlet and is finally discharged from the buffer gas outlet; applying a voltage between the outer tube and the inner tube to enable part of molecules to be deposited in the solution to be in an ionic form, enabling the solution to form atomized liquid drops at an outlet of the electrospray device, adjusting the voltage, and adjusting the position of the electrospray device; part of atomized liquid drops formed at the outlet of the electrospray device sequentially pass through the air outlet II and the buffer gas cavity to enter the vacuum cavity, and ions of molecules to be deposited, solvent molecules and ion beam composed of impurities are left in the liquid drops; as the ion beam passes through the diverter I, solvent molecules are heated and evaporated by collisions with the diverter I walls, thereby deviating from the ion beam; the impurities are heated and scattered by collisions with the walls of the splitter II to deviate from the ion beam current; the middle separator of the ion beam is deposited on the baffle; molecules to be deposited are deposited on the sample.
Description
Technical Field
The invention relates to the field of material preparation, in particular to a macromolecule deposition method with a special spraying device and a filtering method.
Background
The electrospray deposition method is a method for depositing molecules having a large molecular weight and being easily decomposed, atomizing a solution containing the molecules to be deposited by an electrospray device, and charging the molecules to enter a vacuum system in an ionic form, moving under the action of an electric field or a difference in air pressure of different vacuum sections, and finally depositing on a substrate. Defect one of the prior art: the use of a room temperature shunt to separate different vacuum segments within the vacuum chamber has the disadvantage of being prone to clogging, resulting in lower transmittance of the molecules to be deposited; the defects of the prior art are as follows: the mass flow output of the spray generated by the electrospray device adopted in the prior art is low, and the electrospray device is not suitable for depositing a large number of molecules; defects three in the prior art: in the prior art, the purpose of stabilizing electrospray jet flow is achieved by adopting the countercurrent of buffer gas, namely, the flowing direction of the buffer gas is opposite to the spraying jet flow, but the countercurrent of the buffer gas has no level in space, and is extremely easy to form turbulence, so that the uniformity and the mass flow of spraying can be influenced, and the macromolecular deposition method can solve the problem.
Disclosure of Invention
In order to solve the problems, the invention provides a macromolecule deposition method, which adopts a special method for outputting atomized liquid drops, a special buffer gas countercurrent method and a heated diverter in an ion beam path, overcomes the defects and is suitable for depositing a large number of macromolecules.
The technical scheme adopted by the invention is as follows:
the macromolecule deposition device mainly comprises a buffer gas outlet, a spray cavity, an electrospray device, a high-voltage power supply, a buffer gas cavity, an air outlet I, an air outlet II, a buffer gas inlet, a vacuum cavity, a pump group I, a shunt I, a pump group II, a shunt II, a pump group III, a deposition cavity, a baffle, a direct current power supply and a sample, wherein xyz is a three-dimensional coordinate system, the spray cavity, the buffer gas cavity, the vacuum cavity and the deposition cavity are sequentially connected, the vacuum cavity is divided into a vacuum section I, a vacuum section II and a vacuum section III by the shunt I and the shunt II, the vacuum section I and the vacuum section III are respectively positioned at the starting end and the tail end of the vacuum cavity, the starting end and the tail end of the vacuum cavity are provided with small holes, and the starting end of the deposition cavity is provided with small holes; the pump group I, the pump group II and the pump group III are respectively connected with the vacuum section I, the vacuum section II and the vacuum section III; the baffle and the sample are positioned in the deposition cavity, the baffle is made of metal and is provided with a through hole, and the diameter of the through hole ranges from one millimeter to ten millimeters; one electrode of the direct current power supply is connected with the baffle plate, and the other electrode is grounded, so that charges accumulated on the baffle plate can be neutralized; the electric spraying device is located in the spraying cavity and comprises an outer tube, an inner tube, a baffle and a liquid inlet, the baffle seals the end port of the inner tube, the outer tube and the inner tube are cylindrical, the inner diameter of the outer tube is 3000 microns, the outer diameter of the inner tube is 2700 microns, the outer tube and the inner tube are in coaxial nested configuration, a liquid channel is arranged between the outer tube and the inner tube, the liquid inlet is connected with the outer wall of the outer tube and is communicated with the liquid channel, and a high-voltage power supply is connected with an outer tube through a cable. The buffer gas cavity is provided with a gas outlet I, a gas outlet II and a buffer gas inlet, the gas outlet II is round with the diameter of two millimeters and is positioned on an xy plane, the gas outlet I is annular with the inner diameter of six millimeters and the outer diameter of eight millimeters and is positioned on the xy plane, the gas outlet I is concentric with the gas outlet II, the buffer gas enters the buffer gas cavity from the buffer gas inlet and can enter the spray cavity through the gas outlet I and the gas outlet II, and finally is discharged from the buffer gas outlet, and the buffer gas is nitrogen or helium; the inner wall of the tail end of the outer tube of the electrospray device is provided with a plurality of notches with the same shape, the intervals between the adjacent notches are equal, so that a local electric field can be increased to generate more liquid spray, and the shunt I is provided with a heating wire, and the temperature of the heating wire can be adjusted from room temperature to 500 ℃; the number of the notches on the inner wall of the tail end of the outer tube is four to twelve, and the notches are semicircular, square or triangular.
The macromolecule deposition method comprises the following steps:
firstly, opening a pump group I, a pump group II and a pump group III to enable the vacuum of a vacuum section I, a vacuum section II and a vacuum section III to respectively reach 1 multiplied by 10 -2 mbar、1×10 -5 mbar、1×10 -7 mbar；
Introducing a solution containing molecules to be deposited from a liquid inlet of the electrospray device, wherein the flow rate is typically 20mL/M (milliliter/minute);
thirdly, introducing buffer gas into a buffer gas cavity from a buffer gas inlet, and entering a spray cavity through a gas outlet I and a gas outlet II, and finally discharging from a buffer gas outlet, wherein the flow rate range is 2-10 SLM (SLM is standard gas per liter/min);
applying voltage between an outer tube and an inner tube of the electrospray device, wherein the voltage is 1000V to 6000V, so that part of molecules to be deposited in the solution are in an ionic form, atomized liquid drops are formed at an outlet of the electrospray device by the solution, the molecules to be deposited, other impurities and the solvent are contained in the liquid drops, the shape of liquid spray can be adjusted by adjusting the voltage, and the position of the electrospray device is adjusted, so that the outer tube is concentric with an air outlet II;
fifthly, atomized liquid drops formed at the outlet of the part of electrospray device sequentially enter the vacuum cavity through the air outlet II and the buffer gas cavity, most of solvent in the liquid drops is pumped out of the vacuum cavity by the pump group I, and ion beam current composed of ions of molecules to be deposited, part of solvent molecules and other impurities remained in the liquid drops continues to move in the vacuum cavity;
sixthly, enabling the temperature of the diverter I to reach 300 ℃, and when the ion beam flows through the diverter I, solvent molecules are heated and evaporated due to collision with the wall of the diverter I so as to deviate from the ion beam;
seventhly, the temperature of the shunt II reaches 400 ℃, and part of other impurities are heated and scattered due to collision with the wall of the shunt II so as to deviate from the ion beam;
eighth, the ion beam middle separator is deposited on the baffle plate, the output current of the direct current power supply is set to be in the range of 0.1mA to 1mA, and the ion beam middle separator is used for neutralizing the charge accumulated on the baffle plate;
and ninth, depositing part of molecules to be deposited in the ion beam current on the sample.
The beneficial effects of the invention are as follows:
the mass flow output of the liquid spray of the sample to be deposited, which is generated by the method, is higher and more uniform; secondly, the invention can obviously increase the transmissivity of ions in the ion beam path; finally, the buffer gas countercurrent has smaller influence on the uniformity and the mass flow of the liquid spray of the sample to be deposited on the basis of filtering impurities, thereby ensuring the quality of deposited sample molecules.
Drawings
The following is further described in connection with the figures of the present invention:
FIG. 1 is a schematic illustration of the present invention;
FIG. 2 is a top view of the electrospray device;
fig. 3 is a side view of an electrospray device.
In the figure, 1. Buffer gas outlet, 2. Spray chamber, 3. Electrospray device, 3-1. Outer tube, 3-2. Inner tube, 3-3. Baffle, 3-4. Liquid inlet, 4. High voltage power supply, 5. Buffer gas chamber, 6. Gas outlet I,7. Gas outlet II,8. Buffer gas inlet, 9. Vacuum chamber, 9-1. Vacuum section I,9-2. Vacuum section II,9-3. Vacuum section III,10. Pump group I,11. Shunt I,12. Pump group II,13. Shunt II,14. Pump group III,15. Deposition chamber, 16. Baffle, 17. DC power supply, 18 samples.
Detailed Description
As shown in fig. 1, the macromolecule deposition device mainly comprises a buffer gas outlet (1), a spray cavity (2), an electrospray device (3), a high-voltage power supply (4), a buffer gas cavity (5), a gas outlet I (6), a gas outlet II (7), a buffer gas inlet (8), a vacuum cavity (9), a pump group I (10), a shunt I (11), a pump group II (12), a shunt II (13), a pump group III (14), a deposition cavity (15), a baffle plate (16), a direct current power supply (17) and a sample (18), xyz is a three-dimensional coordinate system, the spray cavity (2), the buffer gas cavity (5), the vacuum cavity (9) and the deposition cavity (15) are sequentially connected, the vacuum cavity (9) is divided into a vacuum section I (9-1), a vacuum section II (9-2) and a vacuum section III (9-3) by the shunt I (11), the vacuum section I (9-1) and the vacuum section III (9-3) are respectively positioned at the starting end and the tail end of the vacuum cavity (9), the starting end and the deposition cavity (15) are provided with small holes, and the starting end and the deposition cavity (15) are provided with small holes; the pump group I (10), the pump group II (12) and the pump group III (14) are respectively connected with the vacuum section I (9-1), the vacuum section II (9-2) and the vacuum section III (9-3); the baffle plate (16) and the sample (18) are positioned in the deposition cavity (15), the baffle plate (16) is made of metal and is provided with a through hole, and the diameter of the through hole ranges from one millimeter to ten millimeters; one electrode of the direct current power supply (17) is connected with the baffle plate (16), and the other electrode is grounded, so that the charges accumulated on the baffle plate (16) can be neutralized; the electrospray device (3) is positioned in the spray cavity (2). The buffer gas cavity (5) is provided with a gas outlet I (6), a gas outlet II (7) and a buffer gas inlet (8), the gas outlet II (7) is round with a diameter of two millimeters and is positioned on an xy plane, the gas outlet I (6) is annular with an inner diameter of six millimeters and an outer diameter of eight millimeters and is positioned on the xy plane, the gas outlet I (6) is concentric with the gas outlet II (7), buffer gas enters the buffer gas cavity (5) from the buffer gas inlet (8) and can enter the spray cavity (2) through the gas outlet I (6) and the gas outlet II (7), and finally, the buffer gas is discharged from the buffer gas outlet (1) and is nitrogen or helium; the inner wall of the tail end of the outer tube (3-1) of the electrospray device (3) is provided with a plurality of notches with the same shape, the intervals between the adjacent notches are equal, so that the local electric field can be increased to generate more liquid spray, and the diverter I (11) is provided with a heating wire, and the temperature of the heating wire can be adjusted from room temperature to 500 ℃.
Referring to fig. 2, which is a top view of an electrospray device, referring to fig. 3, which is a side view of the electrospray device, the electrospray device (3) is composed of an outer tube (3-1), an inner tube (3-2), a baffle (3-3) and a liquid inlet (3-4), wherein the baffle (3-3) seals an end port of the inner tube (3-2), the outer tube (3-1) and the inner tube (3-2) are both cylindrical, the inner diameter of the outer tube (3-1) is 3000 micrometers, the outer diameter of the inner tube (3-2) is 2700 micrometers, the outer tube (3-1) and the inner tube (3-2) are in a coaxial nested configuration, a liquid channel is arranged between the outer tube (3-1) and the inner tube (3-2), the liquid inlet (3-4) is connected with the outer wall of the outer tube (3-1) and is communicated with the liquid channel, and the high-voltage power supply (4) is connected with the outer tube (3-1) through a cable; the number of the notches on the inner wall of the tail end of the outer tube (3-1) is four to twelve, and the notches are semicircular, square or triangular.
The macromolecule deposition method comprises the following steps:
firstly, opening a pump group I (10), a pump group II (12) and a pump group III (14) to ensure that the vacuum of a vacuum section I (9-1), a vacuum section II (9-2) and a vacuum section III (9-3) respectively reach 1 multiplied by 10 -2 mbar、1×10 -5 mbar、1×10 -7 mbar；
Passing a solution containing molecules to be deposited from a liquid inlet (3-4) of an electrospray device (3), the flow rate typically being 20mL/M (milliliter/minute);
thirdly, introducing buffer gas into a buffer gas cavity (5) from a buffer gas inlet (8), entering a spray cavity (2) through a gas outlet I (6) and a gas outlet II (7), and finally discharging from a buffer gas outlet (1), wherein the flow rate range is 2-10 SLM (SLM is standard gas per liter/min);
applying a voltage between an outer tube (3-1) and an inner tube (3-2) of the electrospray device (3), wherein the voltage ranges from 1000V to 6000V, so that part of molecules to be deposited in the solution are in an ionic form, atomized liquid drops are formed at an outlet of the electrospray device (3), the molecules to be deposited, other impurities and the solvent are contained in the liquid drops, adjusting the voltage can adjust the shape of liquid spray, and adjusting the position of the electrospray device (3) so that the outer tube (3-1) is concentric with an air outlet II (7);
fifthly, atomized liquid drops formed at the outlet of the part of electrospray device (3) sequentially pass through the air outlet II (7) and the buffer gas cavity (5) to enter the vacuum cavity (9), most of solvent in the liquid drops is pumped out of the vacuum cavity (9) by the pump group I (10), and ion beam composed of ions of molecules to be deposited, part of solvent molecules and other impurities remained in the liquid drops continuously move in the vacuum cavity (9);
sixth, make the temperature of the diverter I (11) reach 300 degrees celsius, when the ion beam flows through diverter I (11), solvent molecule is heated and evaporated and deviated from the ion beam flow because of colliding with wall of diverter I (11);
seventhly, the temperature of the shunt II (13) reaches 400 ℃, and part of other impurities are heated and scattered due to collision with the wall of the shunt II (13) so as to deviate from the ion beam;
eighth, the ion beam middle separator is deposited on the baffle plate (16), the output current of the direct current power supply (17) is set to be in the range of 0.1mA to 1mA, and the ion beam middle separator is used for neutralizing the charge accumulated on the baffle plate (16);
and nine, depositing part of molecules to be deposited in the ion beam on the sample (18).
The method adopts a special electrospray method, and the mass flow output of the generated liquid spray is higher; secondly, a heated diverter is adopted in the ion beam path, so that the transmittance of ions in the ion beam path is obviously increased; finally, the buffer gas countercurrent method with more uniform output gas flow is adopted to filter impurities in the liquid spray, so that the quality of deposited sample molecules is ensured, and the method is suitable for depositing a large number of macromolecules.
Claims (1)
1. The macromolecule deposition method mainly comprises a buffer gas outlet (1), a spray cavity (2), an electrospray device (3), a high-voltage power supply (4), a buffer gas cavity (5), a gas outlet I (6), a gas outlet II (7), a buffer gas inlet (8), a vacuum cavity (9), a pump group I (10), a shunt I (11), a pump group II (12), a shunt II (13), a pump group III (14), a deposition cavity (15), a baffle plate (16), a direct current power supply (17) and a sample (18), xyz is a three-dimensional coordinate system, the spray cavity (2), the buffer gas cavity (5), the vacuum cavity (9) and the deposition cavity (15) are sequentially connected, the vacuum cavity (9) is divided into a vacuum section I (9-1), a vacuum section II (9-2) and a vacuum section III (9-3) by the shunt I (11), the vacuum section I (9-1) and the vacuum section III (9-3) are respectively positioned at the starting end and the tail end of the vacuum cavity (9), the starting end and the tail end of the vacuum cavity (9) are provided with small holes, and the deposition cavity (15) is provided with the starting end; the pump group I (10), the pump group II (12) and the pump group III (14) are respectively connected with the vacuum section I (9-1), the vacuum section II (9-2) and the vacuum section III (9-3); the baffle plate (16) and the sample (18) are positioned in the deposition cavity (15), the baffle plate (16) is made of metal and is provided with a through hole, and the diameter of the through hole ranges from one millimeter to ten millimeters; one electrode of the direct current power supply (17) is connected with the baffle plate (16), and the other electrode is grounded, so that the charges accumulated on the baffle plate (16) can be neutralized; the electric spraying device (3) is positioned in the spraying cavity (2), the electric spraying device (3) consists of an outer tube (3-1), an inner tube (3-2), a baffle (3-3) and a liquid inlet (3-4), the baffle (3-3) seals the tail end port of the inner tube (3-2), the outer tube (3-1) and the inner tube (3-2) are both cylindrical, the inner diameter of the outer tube (3-1) is 3000 micrometers, the outer diameter of the inner tube (3-2) is 2700 micrometers, the outer tube (3-1) and the inner tube (3-2) are in a coaxial nested structure, a liquid channel is arranged between the outer tube (3-1) and the inner tube (3-2), the liquid inlet (3-4) is connected with the outer wall of the outer tube (3-1) and is communicated with the liquid channel, and the high-voltage power supply (4) is connected with the outer tube (3-1) through a cable. The buffer gas cavity (5) is provided with a gas outlet I (6), a gas outlet II (7) and a buffer gas inlet (8), the gas outlet II (7) is round with a diameter of two millimeters and is positioned on an xy plane, the gas outlet I (6) is annular with an inner diameter of six millimeters and an outer diameter of eight millimeters and is positioned on the xy plane, the gas outlet I (6) is concentric with the gas outlet II (7), buffer gas enters the buffer gas cavity (5) from the buffer gas inlet (8) and can enter the spray cavity (2) through the gas outlet I (6) and the gas outlet II (7), and finally, the buffer gas is discharged from the buffer gas outlet (1) and is nitrogen or helium; the inner wall of the tail end of the outer tube (3-1) of the electrospray device (3) is provided with a plurality of notches with the same shape, the intervals between the adjacent notches are equal, so that a local electric field can be increased to generate more liquid spray, and the diverter I (11) is provided with a heating wire, and the temperature of the heating wire can be adjusted from room temperature to 500 ℃; the number of the notches on the inner wall of the tail end of the outer tube (3-1) is four to twelve, the notches are semicircular, square or triangular,
the method is characterized in that: the macromolecule deposition method comprises the following steps:
firstly, opening a pump group I (10), a pump group II (12) and a pump group III (14) to ensure that the vacuum of a vacuum section I (9-1), a vacuum section II (9-2) and a vacuum section III (9-3) respectively reach 1 multiplied by 10 -2 mbar、1×10 -5 mbar、1×10 -7 mbar；
Passing a solution containing molecules to be deposited from a liquid inlet (3-4) of an electrospray device (3), the flow rate typically being 20mL/M (milliliter/minute);
thirdly, introducing buffer gas into a buffer gas cavity (5) from a buffer gas inlet (8), entering a spray cavity (2) through a gas outlet I (6) and a gas outlet II (7), and finally discharging from a buffer gas outlet (1), wherein the flow rate range is 2-10 SLM (SLM is standard gas per liter/min);
applying a voltage between an outer tube (3-1) and an inner tube (3-2) of the electrospray device (3), wherein the voltage ranges from 1000V to 6000V, so that part of molecules to be deposited in the solution are in an ionic form, atomized liquid drops are formed at an outlet of the electrospray device (3), the molecules to be deposited, other impurities and the solvent are contained in the liquid drops, adjusting the voltage can adjust the shape of liquid spray, and adjusting the position of the electrospray device (3) so that the outer tube (3-1) is concentric with an air outlet II (7);
fifthly, atomized liquid drops formed at the outlet of the part of electrospray device (3) sequentially pass through the air outlet II (7) and the buffer gas cavity (5) to enter the vacuum cavity (9), most of solvent in the liquid drops is pumped out of the vacuum cavity (9) by the pump group I (10), and ion beam composed of ions of molecules to be deposited, part of solvent molecules and other impurities remained in the liquid drops continuously move in the vacuum cavity (9);
sixth, make the temperature of the diverter I (11) reach 300 degrees celsius, when the ion beam flows through diverter I (11), solvent molecule is heated and evaporated and deviated from the ion beam flow because of colliding with wall of diverter I (11);
seventhly, the temperature of the shunt II (13) reaches 400 ℃, and part of other impurities are heated and scattered due to collision with the wall of the shunt II (13) so as to deviate from the ion beam;
eighth, the ion beam middle separator is deposited on the baffle plate (16), the output current of the direct current power supply (17) is set to be in the range of 0.1mA to 1mA, and the ion beam middle separator is used for neutralizing the charge accumulated on the baffle plate (16);
and nine, depositing part of molecules to be deposited in the ion beam on the sample (18).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810830620.6A CN109046817B (en) | 2018-07-13 | 2018-07-13 | Macromolecule deposition method |
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| CN201810830620.6A CN109046817B (en) | 2018-07-13 | 2018-07-13 | Macromolecule deposition method |
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| CN109046817B true CN109046817B (en) | 2023-09-05 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101356012A (en) * | 2005-12-07 | 2009-01-28 | 玛丽皇后与西田学院 | An electrospray device and a method of electrospraying |
| CN104316385A (en) * | 2014-10-13 | 2015-01-28 | 赵烨梁 | Device for preparing mono-molecule sample and electric spraying method of device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9900955D0 (en) * | 1999-01-15 | 1999-03-10 | Imperial College | Material deposition |
| US7424980B2 (en) * | 2004-04-08 | 2008-09-16 | Bristol-Myers Squibb Company | Nano-electrospray nebulizer |
| US7882799B2 (en) * | 2004-10-18 | 2011-02-08 | Msp Corporation | Method and apparatus for generating charged particles for deposition on a surface |
| US8007871B2 (en) * | 2006-01-26 | 2011-08-30 | Nanoselect, Inc. | Electrospray deposition: devices and methods thereof |
| WO2011137127A1 (en) * | 2010-04-27 | 2011-11-03 | Synos Technology, Inc. | Vaporizing or atomizing of electrically charged droplets |
| US9878493B2 (en) * | 2014-12-17 | 2018-01-30 | Palo Alto Research Center Incorporated | Spray charging and discharging system for polymer spray deposition device |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101356012A (en) * | 2005-12-07 | 2009-01-28 | 玛丽皇后与西田学院 | An electrospray device and a method of electrospraying |
| CN104316385A (en) * | 2014-10-13 | 2015-01-28 | 赵烨梁 | Device for preparing mono-molecule sample and electric spraying method of device |
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