CN109030134A - The preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample - Google Patents

The preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample Download PDF

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CN109030134A
CN109030134A CN201810617275.8A CN201810617275A CN109030134A CN 109030134 A CN109030134 A CN 109030134A CN 201810617275 A CN201810617275 A CN 201810617275A CN 109030134 A CN109030134 A CN 109030134A
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sample
polishing
nickel
stainless steel
austenitic stainless
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王振华
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Yanshan University
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Yanshan University
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • G01N2001/2873Cutting or cleaving

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

A kind of preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample mainly processes the sample to grinding and polishing with NC wirecut EDM machine and inlays sample with epoxy resin;First polished 3~5 minutes with 4000# sand paper;It uses the diamond paste of W0.1 as polishing agent again, just throws 1 minute;Using the colloidal silicon dioxide that the widely applied partial size in silicon wafer polishing field is 20nm as polishing fluid, finishing polish is carried out to the sample just thrown;900~1400 revs/min of polishing machine revolving speed, sample is located at away from polishing 20~50mm of disk center, and polishing drop speed is 5~10 ml/mins, total polishing time 5~10 minutes;EBSD sample distilled water flushing is clean, drying.The present invention is at low cost, high-efficient, is easy to grasp, suitable for deformation states, annealed state high nitrogen and nickel-less austenitic stainless steel inside, the observation of mantle micro structure, the sample there are crackle is also suitable.

Description

The preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample
Technical field
The present invention relates to metal physical and chemical inspection methods, the especially preparation method of stainless steel EBSD sample.
Background technique
High nitrogen and nickel-less austenitic stainless steel is that nickel expensive in tradition AISI300 series austenitic stainless steel is replaced with nitrogen Element.The solution strengthening effect of nitrogen is very strong, improves the work hardening rate of steel, can get very high good tough combination.Nitrogen is to expand The element of big austenitic area, high nitrogen and nickel-less austenitic stainless steel even large deformation at quite low temperatures are also less prone to and answer Become induced martensite, what can be kept is nonmagnetic.Moreover, nitrogen can improve resistance to spot corrosion and the slit and corrosion resistant energy of material Power.High nitrogen and nickel-less austenitic stainless steel is applied more and more widely in the energy, is changed because of its excellent performance and cheap price Work, machinery and health field.
In the casting of high nitrogen and nickel-less austenitic stainless steel, powder metallurgy, forging, rolling, punching press, heat treatment and crystal boundary work During journey processing, it is often necessary to carry out institutional framework inspection to workpiece or part, EBSD (backscattered electron diffraction) is very A kind of strong detection means.Analyzed by EBSD, can obtain crystallite dimension and orientation, texture, crystal boundary type, Taylor because The results such as son distribution.However, high nitrogen and nickel-less austenitic stainless steel is softer, and when preparing EBSD sample, conventional grinding and polishing Program, it is difficult to obtain smooth, bright and clean, without residual stress sample surfaces.EBSD sample surfaces quality is bad, can be to high-nitrogen nickel-free Austenitic stainless steel EBSD analysis brings very big adverse effect.
Summary of the invention
It not only can get smooth, bright and clean, without residual stress sample surfaces, Er Qiezhi the object of the present invention is to provide a kind of The preparation method of amount stability high nitrogen and nickel-less austenitic stainless steel EBSD sample that is high, at low cost, being easy to grasp.
Technical solution of the present invention is specific as follows:
Step 1, the sample to grinding and polishing is processed with NC wirecut EDM machine, 2~3mm of thickness of sample, sample is long 5~10mm, length 2mm long compared with width are spent, it is optimal having a size of 6mm × 4mm × 2mm.
Step 2, sample step 1 processed is inlayed with epoxy resin, 15~30mm of diameter of inlaying samples, with a thickness of straight The 1/2~2/3 of diameter, it is optimal having a size of 20 × 10mm of Φ.
Step 3, with 4000# sand paper polish 3~5 minutes, until sample surfaces wire cutting oxidation decoloration, be covered with mill Trace;Bruting process takes common tap water and washes away abrasive dust on sand paper.
Step 4, attached flannelette is added on rotary polisher polishing disk, uses the diamond paste of W0.1 as polishing agent, just It throws 1 minute.
Step 5, attached flannelette is added on rotary polisher polishing disk, is 20nm by the widely applied partial size in silicon wafer polishing field Colloidal silicon dioxide as polishing fluid, the sample that step 4 was just thrown carries out finishing polish;900~1400 turns of polishing machine revolving speed/ Minute, sample is located at away from polishing 20~50mm of disk center, and polishing drop speed is 5~10 ml/mins, polishing fluid dripping position It is polishing sample close to polishing disk center of circle side, every 1 minute with 100ml distilled water flushing polishing disk, total polishing time 5~10 Minute.
Step 6, the inlay of sample is crushed after being thrown step 5 essence with mechanical force, and EBSD sample distilled water flushing is clean, Drying.
The invention has the following advantages over the prior art:
(1) CNC WEDM processing to grinding and polishing sample, size meets the testing requirements of EBSD equipment, and just In judging sample position and direction from sample topography;
(2) the sample size after inlaying is easily guaranteed that buffed surface is smooth convenient for hand-held polishing, is easy to grasp.
(3) high nitrogen and nickel-less austenitic stainless steel quality is softer, directly with 4000# sand paper polish, can in 3~5 minutes incite somebody to action The oxide layer of wire cutting section is cut, and efficiency is good many by number mode of polishing compared with by low sand paper to height sand paper, and does not deposit In the polishing of low sand paper, strained layer is difficult to the problem of being removed with height sand paper deeply very much.
(4) polishing fluid uses the widely applied partial size of silicon wafer manufacture field for the colloidal silicon dioxide of 20nm, cheap.
(5) angular speed, linear velocity, polishing fluid rate of addition this three it is reasonably combined, be able to achieve optimal essence and throw effect, It was dumped every 1 minute with 10ml distilled water flushing, can avoid polishing fluid crystallization, lesioned sample surface.
(6) rotary machine polishing machine is used, it is much lower compared with using vibratory finishing machine cost.
(7) fracture edges and fractured edge can be kept bright and sharp.
(8) technology be suitable for inside the high nitrogen and nickel-less austenitic stainless steel of deformation states, annealed state, mantle micro structure Observation, is also suitable the sample there are crackle.
Detailed description of the invention
Fig. 1 is high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.5N steel, microscopic structure after annealing 1 hour at 1200 DEG C EBSD mass contrast figure (Image quality figure), also known as Kikuchi lines contrast figure (Band contrast image).
Fig. 2 is high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.5N steel, at 1000 DEG C with 0.01s-1After compression 30% The EBSD mass contrast figure of microscopic structure.
Fig. 3 is high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.6N steel, at 1100 DEG C with 0.001s-1After stretching 30% The EBSD mass contrast figure of microscopic structure and crackle.
Fig. 4 is high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.6N steel, at 1100 DEG C with 0.001s-1After breaking, fracture The EBSD mass contrast figure of neighbouring microscopic structure.
Specific embodiment
Below by way of specific embodiment, the present invention will be described in detail.
Embodiment 1
By typical high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.5N, anneal 1 hour at 1200 DEG C.
Step 1, the sample to grinding and polishing, thickness of sample 3mm, sample length are processed with NC wirecut EDM machine 10mm, width 8mm.
Step 2, sample step 1 processed is inlayed with epoxy resin, the diameter 30mm of inlaying samples, with a thickness of 15mm.
Step 3, with 4000# sand paper polish 5 minutes, until sample surfaces wire cutting oxidation decoloration, be covered with polishing scratch;It beats Honed journey takes common tap water and washes away abrasive dust on sand paper.
Step 4, attached flannelette is added on rotary polisher polishing disk, uses the diamond paste of W0.1 as polishing agent, just It throws 1 minute.
Step 5, attached flannelette is added on rotary polisher polishing disk, is 20nm by the widely applied partial size in silicon wafer polishing field Colloidal silicon dioxide as polishing fluid, the sample that step 4 was just thrown carries out finishing polish;1400 revs/min of polishing machine revolving speed, Sample is located at away from polishing disk center 50mm, and polishing drop speed is 10 ml/mins, and polishing fluid dripping position is that polishing sample leans on Nearly polishing disk center of circle side, every 1 minute with 100ml distilled water flushing polishing disk, total polishing time 10 minutes.
Step 6, the inlay of sample is crushed after being thrown step 5 essence with mechanical force, and EBSD sample distilled water flushing is clean, Drying.
The EBSD mass contrast figure of sample microscopic structure is polished as shown in Figure 1, being clear that crystal boundary and twin boundary.At Image quality amount is very high, no marking, the residual stress without sample preparation introducing, smooth no relief.
Embodiment 2
By typical high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.5N, at 1000 DEG C with 0.01s-1Compression 30%.
Step 1, the sample to grinding and polishing, thickness of sample 2mm, sample length are processed with NC wirecut EDM machine 5mm, the long 3mm of width.
Step 2, sample step 1 processed is inlayed with epoxy resin, the diameter 15mm of inlaying samples, with a thickness of diameter 10mm。
Step 3, with 4000# sand paper polish 3 minutes, until sample surfaces wire cutting oxidation decoloration, be covered with polishing scratch;It beats Honed journey takes common tap water and washes away abrasive dust on sand paper.
Step 4, attached flannelette is added on rotary polisher polishing disk, uses the diamond paste of W0.1 as polishing agent, just It throws 1 minute.
Step 5, attached flannelette is added on rotary polisher polishing disk, is 20nm by the widely applied partial size in silicon wafer polishing field Colloidal silicon dioxide as polishing fluid, the sample that step 4 was just thrown carries out finishing polish;900 revs/min of polishing machine revolving speed, Sample is located at away from polishing disk center 20, and polishing drop speed is 5 ml/mins, and polishing fluid dripping position is that polishing sample is close Polishing disk center of circle side, every 1 minute with 100ml distilled water flushing polishing disk, total polishing time 5 minutes.
Step 6, the inlay of sample is crushed after being thrown step 5 essence with mechanical force, and EBSD sample distilled water flushing is clean, Drying.
The EBSD mass contrast figure of sample microscopic structure is polished as shown in Fig. 2, being clear that sub boundary and crystal boundary.At Image quality amount is very high, no marking, the residual stress without sample preparation introducing, smooth no relief.
Embodiment 3
By typical high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.6N, at 1100 DEG C with 0.001s-1Stretch 30%.
Step 1, the sample to grinding and polishing is processed in necking down position with NC wirecut EDM machine, thickness of sample 2mm, Sample is having a size of 6mm × 4mm × 2mm.
Step 2, sample step 1 processed is inlayed with epoxy resin, and the size of inlaying samples is 20 × 10mm of Φ.
Step 3, with 4000# sand paper polish 4 minutes, until sample surfaces wire cutting oxidation decoloration, be covered with polishing scratch;It beats Honed journey takes common tap water and washes away abrasive dust on sand paper.
Step 4, attached flannelette is added on rotary polisher polishing disk, uses the diamond paste of W0.1 as polishing agent, just It throws 1 minute.
Step 5, attached flannelette is added on rotary polisher polishing disk, is 20nm by the widely applied partial size in silicon wafer polishing field Colloidal silicon dioxide as polishing fluid, the sample that step 4 was just thrown carries out finishing polish;1400 revs/min of polishing machine revolving speed, Sample is located at away from polishing disk center 40mm, and polishing drop speed is 6 ml/mins, and polishing fluid dripping position is that polishing sample leans on Nearly polishing disk center of circle side, every 1 minute with 100ml distilled water flushing polishing disk, total polishing time 8 minutes.
Step 6, the inlay of sample is crushed after being thrown step 5 essence with mechanical force, and EBSD sample distilled water flushing is clean, Drying.
The EBSD mass contrast figure of sample microscopic structure is polished as shown in figure 3, being clear that the crackle of black, crackle Extensions path includes along brilliant and transcrystalline.The sharpness of border of crackle, the crystal boundary and twin boundary in other regions are clearly demarcated, and image quality is very Height, no marking, the residual stress without sample preparation introducing, smooth no relief.
Embodiment 4
By typical high nitrogen and nickel-less austenitic stainless steel 18Mn18Cr0.6N, at 1100 DEG C with 0.001s-1It stretches disconnected.
Step 1, the sample to grinding and polishing, sample are processed along sample axis in incision position with NC wirecut EDM machine Thickness 2mm, sample length 6mm, width 4mm.
Step 2, sample step 1 processed is inlayed with epoxy resin, and the size of inlaying samples is 20 × 10mm of Φ.
Step 3, with 4000# sand paper polish 3 minutes, until sample surfaces wire cutting oxidation decoloration, be covered with polishing scratch;It beats Honed journey takes common tap water and washes away abrasive dust on sand paper.
Step 4, attached flannelette is added on rotary polisher polishing disk, uses the diamond paste of W0.1 as polishing agent, just It throws 1 minute.
Step 5, attached flannelette is added on rotary polisher polishing disk, is 20nm by the widely applied partial size in silicon wafer polishing field Colloidal silicon dioxide as polishing fluid, the sample that step 4 was just thrown carries out finishing polish;900 revs/min of polishing machine revolving speed, Sample is located at away from polishing disk center 40mm, and polishing drop speed is 8 ml/mins, and polishing fluid dripping position is that polishing sample leans on Nearly polishing disk center of circle side, every 1 minute with 100ml distilled water flushing polishing disk, total polishing time 10 minutes.
Step 6, the inlay of sample is crushed after being thrown step 5 essence with mechanical force, and EBSD sample distilled water flushing is clean, Drying.
The EBSD mass contrast figure of sample microscopic structure is polished as shown in figure 4, the black region in figure left side is except fracture. It is clear that the small grains of fracture surface layer and the coarse grain far from fracture.Crystal boundary and twin boundary are clearly demarcated, at image quality Measure very high, no marking, the residual stress without sample preparation introducing, smooth no relief.

Claims (3)

1. a kind of preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample, it is characterised in that: the method includes following Step:
Step 1, the sample to grinding and polishing is processed with NC wirecut EDM machine, 2~3mm of thickness of sample, sample length 5~ 10mm, length 2mm long compared with width,
Step 2, sample step 1 processed is inlayed with epoxy resin, 15~30mm of diameter of inlaying samples, with a thickness of diameter 1/2~2/3,
Step 3, with 4000# sand paper polish 3~5 minutes, until sample surfaces wire cutting oxidation decoloration, be covered with polishing scratch;It beats Honed journey takes common tap water and washes away abrasive dust on sand paper,
Step 4, attached flannelette is added on rotary polisher polishing disk, uses the diamond paste of W0.1 as polishing agent, just throws 1 point Clock,
Step 5, attached flannelette is added on rotary polisher polishing disk, the glue for being 20nm by the widely applied partial size in silicon wafer polishing field For state silica as polishing fluid, the sample that step 4 was just thrown carries out finishing polish;900~1400 revs/min of polishing machine revolving speed Clock, sample are located at away from polishing 20~50mm of disk center, and polishing drop speed is 5~10 ml/mins, and polishing fluid dripping position is Sample is polished close to polishing disk center of circle side, every 1 minute with 100ml distilled water flushing polishing disk, 5~10 points of total polishing time Clock,
Step 6, the inlay of sample is crushed after being thrown step 5 essence with mechanical force, and EBSD sample distilled water flushing is clean, blows It is dry.
2. the preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample according to claim 1, it is characterised in that: sample Product are optimal having a size of 6mm × 4mm × 2mm.
3. the preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample according to claim 1, it is characterised in that: edge Embedding sample is optimal having a size of 20 × 10mm of Φ.
CN201810617275.8A 2018-06-15 2018-06-15 The preparation method of high nitrogen and nickel-less austenitic stainless steel EBSD sample Pending CN109030134A (en)

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CN109855931A (en) * 2018-12-20 2019-06-07 河钢股份有限公司 A kind of preparation method of austenitic alloy EBSD sample
CN111855337A (en) * 2019-04-26 2020-10-30 国标(北京)检验认证有限公司 Method for preparing high-purity ruthenium target EBSD sample
CN113046534A (en) * 2021-03-15 2021-06-29 长春工业大学 Preparation method of high-nitrogen nickel-free austenitic stainless steel with high twin crystal density

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Publication number Priority date Publication date Assignee Title
CN109855931A (en) * 2018-12-20 2019-06-07 河钢股份有限公司 A kind of preparation method of austenitic alloy EBSD sample
CN111855337A (en) * 2019-04-26 2020-10-30 国标(北京)检验认证有限公司 Method for preparing high-purity ruthenium target EBSD sample
CN113046534A (en) * 2021-03-15 2021-06-29 长春工业大学 Preparation method of high-nitrogen nickel-free austenitic stainless steel with high twin crystal density
CN113046534B (en) * 2021-03-15 2023-02-03 长春工业大学 Preparation method of high-nitrogen nickel-free austenitic stainless steel with high twin crystal density

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Application publication date: 20181218