CN109023265A - CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and the preparation method and application thereof - Google Patents
CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and the preparation method and application thereof Download PDFInfo
- Publication number
- CN109023265A CN109023265A CN201811108258.8A CN201811108258A CN109023265A CN 109023265 A CN109023265 A CN 109023265A CN 201811108258 A CN201811108258 A CN 201811108258A CN 109023265 A CN109023265 A CN 109023265A
- Authority
- CN
- China
- Prior art keywords
- crn
- crnin
- laminated coating
- nano laminated
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to nitride coatings technical fields more particularly to CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and the preparation method and application thereof.The invention discloses CrN/CrNiN nano laminated coating, CrN/CrNiN nano laminated coating is deposited on alloy substrate surface；The CrN/CrNiN nano laminated coating include alternately laminated setting CrN layer and CrNiN layers.The nano laminated coating good toughness, surface roughness is low, and consistency is high, good corrosion resistance, and hardness is high, and stability is high, and binding force is strong, solves existing nitride base coating and alloy binding force difference stability is poor, and the technical problem with the binding ability of alloy difference.
Description
Technical field
The present invention relates to nitride coatings technical field more particularly to CrN/CrNiN nano laminated coating and its preparation sides
Method, nano laminated coating and the preparation method and application thereof.
Background technique
Nitride base CrN coating obtains due to high rigidity, high-wearing feature in fields such as cutter, mold, engines wide
General application.
In order to further improve the performance of CrN coating, various alloying elements, such as Al, Ti, Ni etc. are added to, such as
Mulligan's et al. research shows that alloying element Ag presence in the form of the second phase in CrN film, can play the work of self-lubricating
With the wear-resisting property of raising CrN film.But there is also poor, the high-temperature stabilities with alloy binding force for existing nitride base coating
Difference, the problem of corrosion-resistant difference.
Summary of the invention
The present invention provides CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and its preparation sides
Method and application, solve existing nitride base coating and alloy binding force difference stability are poor and poor with the binding ability of alloy
The technical issues of.
Its specific technical solution is as follows:
The present invention provides a kind of CrN/CrNiN nano laminated coating, CrN/CrNiN nano laminated coating is deposited on alloy
Matrix surface；
The CrN/CrNiN nano laminated coating include alternately laminated setting CrN layer and CrNiN layers.
In the embodiment of the present invention, alloy substrate is preferably WC-Co hard alloy.
Preferably, described CrN layers with a thickness of 5nm~30nm, more preferably 10nm~30nm；
Described CrNiN layers with a thickness of 0nm~30nm, more preferably 10nm~30nm.
The present invention also provides a kind of preparation methods of CrN/CrNiN nano laminated coating, are passed through nitrogen, the first pulse electricity
Arc power cathode vaporation Cr metallic target uses the second pulsed arc power supply cathode vaporation Ni80Cr20Alloys target obtains being deposited on conjunction
The CrN/CrNiN nano laminated coating of golden matrix surface.
CrN/CrNiN nano laminated coating is by the CrN phase of hexagonal crystallographic texture and the face-centered cubic crystal structure of NaCl type
CrN phase and the W metal phase composition that is not dissolved so that coating has good toughness, surface roughness is low, and consistency is high, corrosion-resistant
Property it is good, hardness is high.
Preferably, the flow of the nitrogen be 80sccm~700sccm, more preferably 80sccm~500sccm, further
Preferably 80sccm；The pressure of the nitrogen be 0.4Pa~2.5Pa, more preferably 0.8Pa~1.5Pa, further preferably
1.0Pa；
The sedimentation time is 0.5h~4h, more preferably 1h~4h, further preferably 1h；
The operating temperature of the alloy substrate is 350 DEG C~450 DEG C, more preferably 400 DEG C；
Pivoted frame speed is 0.5rpm~5rpm, more preferably 1rpm~5rpm during the deposition.
The present invention provides a kind of nano laminated coatings, comprising: CrN transition zone and CrN/CrNiN nano laminated coating；
The CrN transition zone is deposited on alloy substrate surface, and the CrN/CrNiN nano laminated coating is deposited on described
CrN transition layer surface.
CrN transition zone is used to enhance the bond strength of CrN/CrNiN nano laminated coating and alloy substrate, alleviates alloy-based
Body and CrN/CrNiN nano laminated coating thermal expansion coefficient be excuse me, but I must be leaving now problem.
Preferably, the CrN transition zone with a thickness of 100nm~500nm, more preferably 300nm~500nm.
CrN and CrNiN is to compare corrosion-resistant material, is bonded them together, alternately heavy with nano-scale thickness
Product can generate nano effect in matrix surface, such as: the crystal of grain boundaries is total to lattice growth, and power-power cooperation improves corrosion-resistant
Property.
The presence of Ni improves the roughness of coating, increases the contact angle with solution, therefore can be further improved corrosion resistance.
Contact angle is bigger, and liquid flows away surface is easier.
The present invention also provides the preparation methods of above-mentioned nano laminated coating, comprising the following steps:
Step 1: being passed through nitrogen, using the first pulsed arc power supply cathode vaporation Cr metallic target, form CrN, be deposited on conjunction
The surface of auri body obtains the CrN transition zone；
Step 2: with the first pulsed arc power supply cathode vaporation Cr metallic target, using the second pulsed arc power supply cathode
Evaporate Ni80Cr20Alloys target deposits CrN/CrNiN nano laminated coating in the CrN transition zone, obtains in nitrogen atmosphere
Nano laminated coating.
Step 1 and step 2 use pulse arc ion plate to can be further improved target ionization level and utilization rate, so can mention
High deposition rate.
Preferably, the flow of nitrogen described in step 1 and step 2 is 80sccm~700sccm, it is highly preferred that step 1 nitrogen
Throughput is 80sccm~400sccm, and step 2 nitrogen flow is 80sccm~500sccm, further preferably 80sccm；
The chamber pressure of deposition described in step 1 be 0.5Pa~2.5Pa, more preferably 0.8Pa~1.5Pa, further preferably
For 1.0Pa.
Pressure 0.4Pa~2.5Pa of nitrogen described in step 2, more preferably 0.8Pa~1.5Pa, further preferably
1.0Pa。
Sedimentation time 10min~30min described in step 1, more preferably 30min；
Sedimentation time described in step 2 is 0.5h~4h, more preferably 1h~4h, further preferably 1h.
Preferably, the technological parameter of first pulse arc ion plate are as follows: 50~150A of target current, 0~50Hz of frequency,
Duty ratio 0~100%, 0~-200V of bias.
It is highly preferred that 80~120A of target current, 20~50Hz of frequency, duty ratio 15-50%, bias -80~-100V.
Further preferably, target current is 80~120A, frequency 30Hz, duty ratio 15%, bias -80V.
Preferably, the chamber operating temperature of the deposition is 300 DEG C~400 DEG C, more preferably 400 DEG C；
The operating temperature of the alloy substrate is 350 DEG C~450 DEG C, more preferably 400 DEG C.
It should be noted that the chamber operating temperature of deposition is heated to 350 DEG C~400 DEG C, can be added by long-time
Heat baking cavity, removes the pollutants such as steam and the oxygen of cavity inner wall absorption.
Preferably, the technological parameter of second pulse arc ion plate are as follows: 50~150A of target current, 0~50Hz of frequency,
Duty ratio 0~100%, 0~-200V of bias.
It is highly preferred that 80~120A of target current, 20~50Hz of frequency, duty ratio 15-50%, bias -80~-100V.
Further preferably, 80~120A of target current, frequency 30Hz, duty ratio 15%, bias -80V.
Preferably, before being passed through nitrogen described in step 1 further include: when the Chamber vacuum degree of the deposition is 4.0 × 10-3Pa~
6.0×10-3After Pa, it is passed through the protective gas of 100sccm~300sccm, adjusting the cavity indoor pressure is 0.5Pa~3.0Pa,
Cr metal targets target current is 80~120A, and frequency is 20~50Hz, duty ratio 15-50%, and work 30min, clears up target
The oxide and impurity on surface, Cr metal targets are 10cm~30cm at a distance from alloy substrate.
It should be noted that also needing to set 300 DEG C~400 DEG C of temperature of deposition chamber, alloy before carrying out above-mentioned steps
Substrate temperature is heated to 350 DEG C~450 DEG C, and extracts the intracorporal gas of deposit cavity.
Wherein, temperature is heated to 350 DEG C~450 DEG C, cavity can be roasted by long-time heating, removes cavity inner wall
The pollutants such as the steam and oxygen of absorption.
It is highly preferred that protective gas is argon gas；
Vacuum degree is 5.0 × 10-3The flow of Pa, protective gas are 300sccm~400sccm, and the indoor pressure of chamber is
0.8Pa~1.5Pa, further preferably 1.0Pa, target current 80A-120A, frequency 30Hz, duty ratio 15%, Cr gold
Belonging to target is 20cm at a distance from alloy substrate.
Preferably, before the step 1 further include: pre-processed to alloy substrate；
The pretreatment are as follows: after cleaning for the first time using organic solvent and deionized water to alloy substrate, then use ion
Source bombardment carries out second and cleans.
It is highly preferred that cleaning for the first time specifically:
First it is cleaned by ultrasonic 30min using acetone, 95%~99% alcoholic solution ultrasonic cleaning 30min is reused, after taking-up
It is cleaned by ultrasonic 30min, drying for standby with deionized water again；
Second of cleaning specifically:
Cleaning 30min is carried out using ion source；
The environmental pressure of ion source Bombardment and cleaning processing is 0.1Pa~2.0Pa, more preferably 1.0Pa, and argon flow is
300sccm~600sccm, more preferably 300sccm, substrate bias are -800V~-1000V, more preferably -1000V.
The present invention also provides CrN/ made from above-mentioned CrN/CrNiN nano laminated coating or above-mentioned preparation method
Application of the CrNiN nano laminated coating in cutter, mold or engine.
Preferably, the coating is deposited on cutter, mold or engine surface.
As can be seen from the above technical solutions, the invention has the following advantages that
The present invention provides a kind of CrN/CrNiN nano laminated coating, CrN/CrNiN nano laminated coating is deposited on alloy
Matrix surface；CrN/CrNiN nano laminated coating include alternately laminated setting CrN layer and CrNiN layers.CrN/CrNiN nanometers
Laminated coating by hexagonal crystallographic texture Cr2The CrN phase of the face-centered cubic crystal structure of N phase and NaCl type and the metal not being dissolved
Ni phase composition.Heavy metal Ni element is added in CrN base hard coat while tribological property under enhancing coating high-temp, is improved
Hardness, corrosion resistance.Increase the consistency of coating by the invigoration effect of CrN/CrNiN nanometer multilayer modulated structure, reduces
Holiday improves the toughness and wearability of coating, so promote the corrosion resistance and mechanical performance of enhancing CrN coating.And by
Experimental result is it is found that nano laminated coating consistency provided by the present application is high, and hardness is high, and corrosion resistance and good, stability is good, knot
Conjunction ability is strong.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention without any creative labor, may be used also for those of ordinary skill in the art
To obtain other attached drawings according to these attached drawings.
Fig. 1 is a kind of schematic diagram of nano laminated coating depositing system provided in an embodiment of the present invention；
Fig. 2 is a kind of nano laminated coating structural schematic diagram provided in an embodiment of the present invention；
Fig. 3 is the XRD comparison diagram for the CrN/CrNiN nano laminated coating that 1-4 of the embodiment of the present invention is provided, wherein N1~
N4 respectively indicates the CrN/CrNiN nano laminated coating of 1~embodiment of embodiment 4；
Fig. 4 is the SEM comparison diagram for the CrN/CrNiN nano laminated coating that 1-4 of the embodiment of the present invention is provided, wherein (a)~
(d) the CrN/CrNiN nano laminated coating of 1~embodiment of embodiment 4 is respectively indicated；
Fig. 5 is the hardness for the CrN/CrNiN nano laminated coating that 1-4 of the embodiment of the present invention is provided and the comparison of elasticity modulus
Figure, wherein N1~N4 respectively indicates the CrN/CrNiN nano laminated coating of 1~embodiment of embodiment 4；
Fig. 6 is the scratch pair of the CrN/CrNiN nano laminated coating that provides of 1-4 of the embodiment of the present invention under an optical microscope
Than figure, wherein N1~N4 respectively indicates the CrN/CrNiN nano laminated coating of 1~embodiment of embodiment 4；
Fig. 7 is the tower phenanthrene curve comparison figure for the CrN/CrNiN nano laminated coating that 1-4 of the embodiment of the present invention is provided,
In, N1~N4 respectively indicates the CrN/CrNiN nano laminated coating of 1~embodiment of embodiment 4.
Specific embodiment
In order to make the invention's purpose, features and advantages of the invention more obvious and easy to understand, below in conjunction with the present invention
Attached drawing in embodiment, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that disclosed below
Embodiment be only a part of the embodiment of the present invention, and not all embodiment.Based on the embodiments of the present invention, this field
Those of ordinary skill's all other embodiment obtained without making creative work, belongs to protection of the present invention
Range.
CrN/CrNiN nano laminated coating provided by the invention and preparation method thereof, nano laminated coating and its preparation side
Method is available on the market with raw material used in application and reagent.
Below with regard to CrN/CrNiN nano laminated coating provided by the present invention and preparation method thereof, nano laminated coating and
Preparation method is described further with application.
Embodiment 1
(1) alloy substrate pre-processes:
Cleaning matrix is carried out using solvent；The detailed process of the solvent cleaning treatment are as follows: be first cleaned by ultrasonic using acetone
30min reuses 98% alcoholic solution ultrasonic cleaning 30min, is cleaned by ultrasonic 30min with deionized water again after taking-up；It is laggard
The processing of row ion source Bombardment and cleaning: cleaning 30min is carried out to matrix using ion source, obtains pretreated matrix；Wherein, institute
The environmental pressure for stating the processing of ion source Bombardment and cleaning is 1.0Pa, and Ar throughput is 300sccm, and substrate bias is -1000V.
(2) surface of matrix after the pre-treatment uses pulsed arc power supply cathode vaporation Cr target, in N2It is heavy to react in gas
Product CrN coating specifically: by depositing and setting cavity temperature be 400 DEG C, matrix is 450 DEG C, and extracts deposition chamber gas；It is long
Time heated baking cavity removes the pollutants such as steam and the oxygen of cavity inner wall absorption；When Chamber vacuum reaches background vacuum
5.0×10-3After Pa, it is passed through Ar gas, gas flow is set as 300sccm, and adjusting deposition chamber environmental pressure to 1.0Pa will
The current regulation of metal Cr target arc power target arc power is 80~120A, frequency 30Hz, duty ratio 15%, work
Make 30min；Metal Cr target sets cavity temperature as 400 DEG C, matrix is 450 DEG C, rotates sample stage, makes after prevapourising is handled
Matrix face metal Cr target, and be 20cm at a distance from target, Ar gas is closed, N is passed through2Gas adjusts flow, so that N2Throughput
For 300sccm, deposition chamber pressure is adjusted to 1.0Pa, and Cr metal arc target power output is 450W, sedimentation time 30min, is sunk
Matrix loads back bias voltage during product, and size is -80V, sedimentation time 0.5h, and deposition obtains CrN transition zone.
(3) after CrN deposition is completed, maintenance cavity temperature is 350 DEG C, substrate temperature is 400 DEG C, and chamber is maintained to be pressed in
1.0Pa, it is -80V that matrix, which loads back bias voltage size, and turntable revolving speed is 1.0rmp, evaporates Cr metallic target simultaneously using pulsed arc
And Ni80Cr20Alloy target material, source current adjusting are 80~120A, frequency 30Hz, duty ratio 15%, using pulse electricity
Arc hydatogenesis CrN/CrNiN nano laminated coating, obtains nano laminated coating.
Embodiment 2
(1) substrate pretreated: the specific steps are the same as those in embodiment 1.
(2) pulsed arc power supply cathode vaporation Cr target is used in the pretreated matrix surface that step (1) obtains, in N2
Reactive deposition obtains CrN coating in atmosphere: the specific steps are the same as those in embodiment 1.
(3) after CrN deposition is completed, maintenance cavity temperature is 350 DEG C, substrate temperature is 400 DEG C, and chamber is maintained to be pressed in
1.0Pa, it is -80V that matrix, which loads back bias voltage size, and turntable revolving speed is 2.0rmp, evaporates Cr metallic target simultaneously using pulsed arc
And Ni80Cr20Alloy target material, source current adjusting are 80~120A, frequency 30Hz, duty ratio 15%, using pulse electricity
Arc hydatogenesis obtains CrN/CrNiN nano laminated coating.
Embodiment 3
The embodiment of the invention provides the third specific embodiments, the specific steps are as follows:
(1) close substrate pretreated: the specific steps are the same as those in embodiment 1.
(2) pulsed arc power supply cathode vaporation Cr target is used in the pretreated matrix surface that step (1) obtains, in N2
Reactive deposition obtains CrN coating in atmosphere: the specific steps are the same as those in embodiment 1.
(3) after CrN deposition is completed, maintenance cavity temperature is 350 DEG C, substrate temperature is 400 DEG C, and chamber is maintained to be pressed in
1.0Pa, it is -80V that matrix, which loads back bias voltage size, and turntable revolving speed is 3.0rmp, evaporates Cr metallic target simultaneously using pulsed arc
And Ni80Cr20Alloy target material, source current adjusting are 80~120A, frequency 30Hz, duty ratio 15%, using pulse electricity
Arc hydatogenesis obtains CrN/CrNiN nano laminated coating.
Embodiment 4
The embodiment of the invention provides the 4th kind of specific embodiments, the specific steps are as follows:
(1) substrate pretreated: the specific steps are the same as those in embodiment 1.
(2) pulsed arc power supply cathode vaporation Cr target is used in the pretreated matrix surface that step (1) obtains, in N2
Reactive deposition obtains the first CrN coating in atmosphere: the specific steps are the same as those in embodiment 1.
(3) after the first CrN deposition is completed, maintenance cavity temperature is 350 DEG C, substrate temperature is 400 DEG C, maintains chamber pressure
In 1.0Pa, it is -80V that matrix, which loads back bias voltage size, and turntable revolving speed is 4.0rmp, evaporates Cr metal simultaneously using pulsed arc
Target and Ni80Cr20Alloy target material, source current adjusting is 80~120A, frequency 30Hz, duty ratio 15%, using pulse
Arc evaporation deposits to obtain CrN/CrNiN nano laminated coating.
Embodiment 5
SEM and XRD analysis are carried out to the CrN/CrNiN nano laminated coating that the embodiment of the present invention 1~4 provides respectively, and
It carries out mechanical property and rotproofness is tested.
From the figure 3, it may be seen that the CrN/CrNiN nano laminated coating that the embodiment of the present invention 1~4 provides is to be by CrN phase and Ni
Metal phase composition.
As shown in Figure 4, the surface and section for the CrN/CrNiN nano laminated coating that the embodiment of the present invention 1~4 provides are all very
It is fine and close.
As shown in Figure 5, the CrN/CrNiN nano laminated coating hardness that the embodiment of the present invention 1~4 provides is high, wherein N1's
Hardness highest reaches 25GPa, and N1>N3<N4<N2.
It will be appreciated from fig. 6 that under the test condition of same load dynamics and speed, the CrN/ of the offer of the embodiment of the present invention 1~4
CrNiN nano laminated coating binding ability is strong, N1 < N2 < N3 < N4, wherein and N4 binding force is most strong, and coating is more early to be scratched, in conjunction with
Power is poorer.
As shown in Figure 7, Fig. 7 abscissa is polarization current, and ordinate is polarization potential.Polarization current is smaller, polarization potential
Higher, then the corrosion resistance of coating is stronger (both polarization curve was in the coordinate upper left corner than lower right corner corrosion resistance and good).This
The CrN/CrNiN nano laminated coating corrosion resistance and good that inventive embodiments 1~4 provide, wherein the corrosion resistant performance of N2 is best,
And N2>N3<N4<N1.
The above, the above embodiments are merely illustrative of the technical solutions of the present invention, rather than its limitations；Although referring to before
Stating embodiment, invention is explained in detail, those skilled in the art should understand that: it still can be to preceding
Technical solution documented by each embodiment is stated to modify or equivalent replacement of some of the technical features；And these
It modifies or replaces, the spirit and scope for technical solution of various embodiments of the present invention that it does not separate the essence of the corresponding technical solution.
Claims (10)
1. a kind of CrN/CrNiN nano laminated coating, which is characterized in that CrN/CrNiN nano laminated coating is deposited on alloy-based
Body surface face；
The CrN/CrNiN nano laminated coating include alternately laminated setting CrN layer and CrNiN layers.
2. CrN/CrNiN nano laminated coating according to claim 1, which is characterized in that
Described CrN layers with a thickness of 5nm~30nm；
Described CrNiN layers with a thickness of 0nm~30nm.
3. a kind of preparation method of CrN/CrNiN nano laminated coating, which is characterized in that be passed through nitrogen, the first pulsed arc electricity
Cathode vaporation Cr metallic target in source uses the second pulsed arc power supply cathode vaporation Ni80Cr20Alloys target obtains being deposited on alloy-based
The CrN/CrNiN nano laminated coating in body surface face.
4. preparation method according to claim 3, which is characterized in that
The flow of the nitrogen is 80sccm~700sccm；
The pressure of the nitrogen is 0.4Pa~2.5Pa；
The sedimentation time is 0.5h~4h；
The operating temperature of the alloy substrate is 350 DEG C~450 DEG C；
Pivoted frame speed is 0.5rpm~5rpm during the deposition.
5. a kind of nano laminated coating characterized by comprising CrN transition zone and CrN/CrNiN of any of claims 1 or 2
CrN/CrNiN nano laminated coating made from preparation method described in nano laminated coating or claim 3 or 4；
The CrN transition zone is deposited on the alloy substrate surface, and the CrN/CrNiN nano laminated coating is deposited on described
CrN transition layer surface.
6. nano laminated coating according to claim 5, which is characterized in that the CrN transition zone with a thickness of 100nm~
500nm。
7. the preparation method of the nano laminated coating of claim 5 or 6, which comprises the following steps:
Step 1: being passed through nitrogen, using the first pulsed arc power supply cathode vaporation Cr metallic target, form CrN, be deposited on institute
The surface for stating alloy substrate obtains the CrN transition zone；
Step 2: with the first pulsed arc power supply cathode vaporation Cr metallic target, using the second pulsed arc power supply cathode
Evaporate the Ni80Cr20Alloys target deposits the CrN/CrNiN nanometer multilayer in the CrN transition zone and applies in nitrogen atmosphere
Layer, obtains the nano laminated coating.
8. preparation method according to claim 7, which is characterized in that the flow of nitrogen described in step 1 and step 2 is
80sccm~700sccm；
The pressure of nitrogen described in step 1 is 0.5Pa~2.5Pa, and the sedimentation time is 10min~30min, the deposition
Chamber operating temperature is 300 DEG C~400 DEG C.
The pressure of nitrogen described in step 2 is 0.4Pa~2.5Pa, and the sedimentation time is 0.5h~4h, the alloy substrate
Operating temperature is 350 DEG C~450 DEG C.
9. preparation method according to claim 7, which is characterized in that pivoted frame speed during being deposited described in step 1
For 1.5rpm；
Pivoted frame speed is 0.5rpm~5rpm during depositing described in step 2.
10. CrN/CrNiN nano laminated coating of any of claims 1 or 2 or nanometer multilayer described in claim 5 or 6 apply
Application of the layer in cutter, mold or engine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811108258.8A CN109023265A (en) | 2018-09-21 | 2018-09-21 | CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and the preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811108258.8A CN109023265A (en) | 2018-09-21 | 2018-09-21 | CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and the preparation method and application thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109023265A true CN109023265A (en) | 2018-12-18 |
Family
ID=64617951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811108258.8A Pending CN109023265A (en) | 2018-09-21 | 2018-09-21 | CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and the preparation method and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109023265A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109778119A (en) * | 2019-01-09 | 2019-05-21 | 南京航空航天大学 | A kind of Ni-CrSiN wear-and corrosion-resistant coating and preparation method thereof |
| CN110453174A (en) * | 2019-06-12 | 2019-11-15 | 广东工业大学 | A kind of protective coating and preparation method thereof for titanium alloy substrate surface |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101698363A (en) * | 2009-10-30 | 2010-04-28 | 华南理工大学 | TiN/(TiN+CrN)/CrAlN nano composite coating and preparation method thereof |
| CN102691033A (en) * | 2011-03-22 | 2012-09-26 | 鸿富锦精密工业（深圳）有限公司 | Antibacterial film coating member and its preparation method |
| CN103029366A (en) * | 2012-12-06 | 2013-04-10 | 浙江工业大学 | Product containing NiCrN ternary coating and preparation method thereof |
| CN108193173A (en) * | 2017-12-29 | 2018-06-22 | 马鞍山市安工大工业技术研究院有限公司 | Multilayer composite coating of low-adhesion tire mold and preparation method thereof |
-
2018
- 2018-09-21 CN CN201811108258.8A patent/CN109023265A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101698363A (en) * | 2009-10-30 | 2010-04-28 | 华南理工大学 | TiN/(TiN+CrN)/CrAlN nano composite coating and preparation method thereof |
| CN102691033A (en) * | 2011-03-22 | 2012-09-26 | 鸿富锦精密工业（深圳）有限公司 | Antibacterial film coating member and its preparation method |
| CN103029366A (en) * | 2012-12-06 | 2013-04-10 | 浙江工业大学 | Product containing NiCrN ternary coating and preparation method thereof |
| CN108193173A (en) * | 2017-12-29 | 2018-06-22 | 马鞍山市安工大工业技术研究院有限公司 | Multilayer composite coating of low-adhesion tire mold and preparation method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109778119A (en) * | 2019-01-09 | 2019-05-21 | 南京航空航天大学 | A kind of Ni-CrSiN wear-and corrosion-resistant coating and preparation method thereof |
| CN109778119B (en) * | 2019-01-09 | 2020-10-20 | 南京航空航天大学 | Ni-CrSiN wear-resistant corrosion-resistant coating and preparation method thereof |
| CN110453174A (en) * | 2019-06-12 | 2019-11-15 | 广东工业大学 | A kind of protective coating and preparation method thereof for titanium alloy substrate surface |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106893986B (en) | A kind of high rigidity AlCrN nano-composite coating and its preparation process | |
| CN107557736B (en) | A kind of AlCrSiVN nano-composite coating and preparation method thereof | |
| CN103212729B (en) | A kind of have NC cutting tool of CrAlTiN superlattice coating and preparation method thereof | |
| CN107083551A (en) | A kind of ternary doping nano composite multiple layer diamond-like coating and its preparation method and application | |
| Liang et al. | Fabrication and performance of TiN/TiAlN nanometer modulated coatings | |
| CN108517487B (en) | TiAlN/W with high hardness and high wear resistance2N-multilayer coating and method for producing same | |
| CN107058943A (en) | TiCN/CrCN nano-multilayer films and preparation method thereof | |
| CN108796453A (en) | A kind of AlCrSiN nano-composite coatings of high-temperature wearable and preparation method thereof | |
| CN109023265A (en) | CrN/CrNiN nano laminated coating and preparation method thereof, nano laminated coating and the preparation method and application thereof | |
| Li et al. | Structure and protective effect of AlN/Al multilayered coatings on NdFeB by magnetron sputtering | |
| CN110241387A (en) | A kind of CrAlN coating production based on HIPIMS technology | |
| CN106119783A (en) | Diamond-like carbon film of functionally gradient and preparation method thereof and goods | |
| CN107740053A (en) | A kind of AlCrSiN/VSiN nano laminated coatings and preparation method thereof | |
| CN112359319B (en) | Preparation method of double-period wear-resistant antibacterial and high-toughness composite film | |
| CN107058949A (en) | A kind of preparation method of wear-resisting tungsten disulfide film | |
| CN112853281B (en) | Carbon-based multilayer film and preparation method and application thereof | |
| Kumar et al. | Modern coating processes and technologies | |
| CN112941463A (en) | Nano multilayer oxynitride corrosion-resistant protective coating on titanium alloy surface and preparation method and application thereof | |
| CN108118305A (en) | A kind of tough integrated fullerene carbon nitrogen multi-layer compound film and preparation method thereof | |
| CN107227447B (en) | A kind of titanium alloy/zirconium diboride nano-multilayer film and the preparation method and application thereof | |
| CN107881469B (en) | Diamond-like composite coating, preparation method and application thereof and coated tool | |
| CN103045998A (en) | Product containing CrNiTiAlN quinary coating and preparation method thereof | |
| CN103757614B (en) | A kind of coating of magnesium and magnesium alloy and preparation method thereof | |
| CN108149198B (en) | A kind of WC hard alloy film and its gradient layer technology room temperature preparation method | |
| CN110438421A (en) | A kind of aluminum alloy materials and the synchronous intensifying method of Aluminium Alloy Solution Treatment+PVD coating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181218 |