CN108977783A - A kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line - Google Patents
A kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line Download PDFInfo
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- CN108977783A CN108977783A CN201810914508.0A CN201810914508A CN108977783A CN 108977783 A CN108977783 A CN 108977783A CN 201810914508 A CN201810914508 A CN 201810914508A CN 108977783 A CN108977783 A CN 108977783A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Abstract
The invention discloses a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production lines, including flip module, go up and down module, pass in and out piece module, vacuum coating module, slice goes up and down module, the vacuum coating module is made of multiple vacuum cavities and multiple cavities bracket, and all vacuum cavities are all mounted on chamber mount, interior conveyer system is equipped with inside the vacuum cavity, configured with maintenance driving above the vacuum cavity, substrate return system is installed on the chamber mount, the vacuum coating module is divided into import vacuum zone, import buffer vacuum section, import transition vacuum zone, coating process vacuum zone, outlet transition vacuum zone, export seven sections of vacuum zone of buffer vacuum section and outlet, the present invention realizes the high-volume continuous production of compact ceramic piece magnetron sputtering metallization plated film, daily production capacity can achieve 60,000 - 10 ten thousand, it is especially suitable for the plated film of Neodymium iron boron magnetic potsherd surface two-sided metallization functional membrane, can satisfy the demand of the marketization.
Description
Technical field
The present invention relates to neodymium iron boron ceramic surface metallization magnetron sputtering technology field, specially a kind of neodymium iron boron pottery
Porcelain surface metalation magnetron sputtering film production line.
Background technique
Using the noble metal of refining, fusing forging, calendering processing or the manufacture of powder metallurgy technique and its sputtering target of alloy
Material is widely used in semiconductor devices, display device, recording medium, magnetic modified material and wave and absorbs modification etc..Such as
Au, Pt, Pd, Ag target are used for integrated circuit and large scale integrated circuit, and the alloy target materials such as CoCrPt, CoPt and CoPd are used for magnetic
Record, Te (terbium), Dy (dysprosium) target are modified etc. for neodymium iron boron ceramic magnetic.
With the fast development of hybrid vehicle (HEV) industry, the ndfeb magnet of automobile requires high rectify
Stupid power and energy high-temperature service.And industry is all conventional wisdom is that the heavy metals rare element such as dysprosium/terbium (Dy/Tb) replaces in sintered NdFeB
Nd in Nd2Te14B crystal grain will improve the anisotropy field of main phase crystal, and the coercivity of magnet is increased considerably.But
It is that heavy rare earth scarcity of resources is expensive, cost can be increased considerably by improving coercivity using traditional alloyage, more serious
, under will cause after original addition remanent magnetism and magnetic energy product significantly due to the anti-magnetic coupling between Heavy rare earth and iron ion
Drop.
Dysprosium infiltration terbium technology is seeped using grain boundary decision recently, processing is modified to magnet, the magnet after changing technical treatment
Dysprosium or terbium are distributed in around crystal boundary, are formd the crystal modification area for seeping dysprosium or terbium, are avoided excessive substitution main phase crystals
Neodymium, effectively avoid it is excessive use dysprosium or terbium, while improving decline that is coercitive while avoiding remanent magnetism.
Seep in ndfeb magnet ceramic surface the technology of dysprosium infiltration terbium, process program is to make pottery first in iron boron magnets
The method that porcelain surface first uses magnetron sputtering deposits dysprosium or terbium metal film layer, then carries out heat treatment process to ceramics again and seeps
Thoroughly, the crystal modification area for seeping dysprosium or terbium is formed.
In recent years, since electric car, wind-power electricity generation, mobile phone and unmanned plane are fast-developing.Boundary's diffusion of use is seeped dysprosium and is seeped
The ndfeb magnet demand that terbium technology is modified processing to magnet is huge, and existing neodymium iron boron ceramic surface spraying terbium and
The production line of the technique of dysprosium is not able to batch continuous production mostly, has damage to human body, and unfriendly to environment, production efficiency is low
Under, it is difficult to meet the market demand.A kind of test manufacture of neodymium iron boron ceramic surface metallization magnetron sputtering film production line of the present invention at
Function makes it possible that automation is produced in enormous quantities and seeps dysprosium infiltration terbium ceramic product.
Summary of the invention
The purpose of the present invention is to provide a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production lines, it can have
Effect solves the problems, such as background technique.
To achieve the above object, the invention provides the following technical scheme: a kind of neodymium iron boron ceramic surface metallization magnetic control splashes
Penetrate coating film production line, including flip module (1), lifting module (2), disengaging piece module (3), vacuum coating module (4), slice liter
It drops module (5)；It is characterized by: the vacuum coating module (4) is by multiple vacuum cavities (6) and multiple cavities bracket (7) group
At, and all vacuum cavities (6) are all mounted on chamber mount (7), and interior conveyer system is equipped with inside the vacuum cavity (6)
(12), it drives a vehicle (14) above the vacuum cavity (6) configured with maintenance, substrate passback system is installed on the chamber mount (7)
It unites (13), the vacuum coating module (4) is divided into import vacuum zone (41), import buffer vacuum section (42), import transition vacuum
Section (43), coating process vacuum zone (44), outlet transition vacuum zone (45), outlet buffer vacuum section (46) and outlet vacuum zone
(47) seven sections, the import vacuum zone (41) is made of vacuum cavity (6-1) and chamber mount (7-1), the vacuum cavity (6-
1) entrance is equipped with isolating valve (10-1), and vacuum cavity (6-1) top plate is equipped with cavity maintenance door (11), the cavity dimension
It repairs and is equipped with low vacuum forepump system (8) beside door (11), the pump-line that the low vacuum forepump system (8) passes through
(18) it is connected to the bottom of vacuum cavity (6-1), is provided with vacuum valve (17), the vacuum chamber on the pump-line (18)
The side design of body (6-1) has filtering air charging system (19), and the import buffer vacuum section (42) is by vacuum cavity (6-2) and chamber
Body support frame (7-2) composition, the vacuum cavity (6-2) connect with vacuum cavity (6-1), and junction is equipped with isolating valve (10-
2), vacuum cavity (6-2) top plate is equipped with cavity maintenance door (11), is equipped with fine pumping system (91) on bottom plate,
The fine pumping system (91) is formed by being no less than two molecular pumps (20), and the molecular pump (20) passes through flapper valve (21)
It is connect with pipeline (22) with high vacuum forepump system (92), the import transition vacuum zone (43) is by vacuum cavity (6-3)
It is formed with chamber mount (7-3), the vacuum cavity (6-3) connect with vacuum cavity (6-2), and junction is equipped with isolating valve
(10-3), vacuum cavity (6-3) top plate are equipped with cavity maintenance door (11), are equipped with fine pumping system on bottom plate
(91), the fine pumping system (91) is formed by being no less than two molecular pumps (20), and the molecular pump (20) passes through baffle
Valve (21) and pipeline (22) are connect with high vacuum forepump system (92), and the coating process vacuum zone (44) is by being no less than one
A independent technique vacuum zone composition, each independent technique vacuum zone is by vacuum cavity (6-4) and chamber mount (7-4) group
At being equipped with fine pumping system (91) on vacuum cavity (6-4) bottom plate, the fine pumping system
(91) it is formed by being no less than two molecular pumps (20), the molecular pump (20) passes through flapper valve (21) and pipeline (22) and high vacuum
Forepump system (92) connection, the outlet transition vacuum zone (45) is by vacuum cavity (6-5) and chamber mount (7-5) group
At the vacuum cavity (6-5) connect with vacuum cavity (6-4), and junction is equipped with isolating valve (10-4), the vacuum cavity
The top plate of (6-5) is equipped with cavity maintenance door (11), is equipped with fine pumping system (91), the Gao Zhen on bottom plate
Empty extract system (91) is formed by being no less than two molecular pumps (20), and the molecular pump (20) passes through flapper valve (21) and pipeline
(22) it is connect with high vacuum forepump system (92), the outlet buffer vacuum section (46) is by vacuum cavity (6-6) and cavity
Bracket (7-6) composition, the vacuum cavity (6-6) connect with vacuum cavity (6-5), and junction is equipped with isolating valve (10-5),
The top plate of the vacuum cavity (6-6) is equipped with cavity maintenance door (11), is equipped with fine pumping system on bottom plate
(91), the fine pumping system (91) is formed by being no less than two molecular pumps (20), and the molecular pump (20) passes through baffle
Valve (21) and pipeline (22) are connect with high vacuum forepump system (92), and the outlet vacuum zone (47) is by vacuum cavity (6-
5) it is formed with chamber mount (7-5), is equipped with isolating valve (10-6) at vacuum cavity (6-5) mouth, the vacuum cavity (6-7)
Top plate is equipped with cavity maintenance door (11), is equipped with low vacuum forepump system (8) beside the cavity maintenance door (11), described
Low vacuum forepump system (8) is made of mechanical pump (15) and lobe pump (16), and the low vacuum forepump system (8) is logical
The pump-line (18) crossed is connected to the bottom of vacuum cavity (6-1), is provided with vacuum valve on the pump-line (18)
(17), the side design of the vacuum cavity (6-1) has filtering air charging system (19).
Further, a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line, it is characterised in that: institute
It states disengaging piece module (3) and vacuum coating module (4) is designed with conveyer system (24) and lower conveyer system (25), the substrate
Pallet (23) is transmitted in upper conveyer system (24) and lower conveyer system (25).
Further, a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line, it is characterised in that: institute
State isolating valve (10-1), isolating valve (102), isolating valve (10-3), isolating valve (10-4), isolating valve (10-5), isolating valve (10-
6) independent flap valve or independent gate valve are used.
Further, a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line, it is characterised in that: institute
It states the low vacuum forepump system (8) and is made up of with lobe pump (16) pipeline mechanical pump (15).
Further, a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line, it is characterised in that: institute
High vacuum forepump system (92) are stated, are made of mechanical pump (15) and Lodz pump (16).
Further, a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line, it is characterised in that: institute
State the nitrogen of filtering air charging system (19) connection filtration drying or the compressed air of filtration drying.
Further, a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line, it is characterised in that: institute
The process Installation vacancy for setting three standards on the top plate of vacuum cavity (6-4) is stated, linear ion source (26) are installed respectively, are linearly put down
Face magnetic control sputtering cathode (27) and Linear Rotation sputter cathode (28)
Compared with prior art, the beneficial effects of the present invention are: the present invention carries out infiltration dysprosium using magnetron sputtering plating mode
With the sputtering sedimentation plated film for seeping the heavy metals such as terbium, the exact controllability and process repeatability of magnetron sputtering are not fully exerted,
Compare the usage amount reduction of spray coating method and chemical method to material, realizes accurate control, has saved the use of exotic material, mentioned
High utilization rate, largely reduces production cost；The sputter coating of high-energy is carried out under vacuum conditions, and terbium and dysprosium metal exist
The penetration depth of neodymium iron boron ceramic surface is big, effectively reduces the difficulty of later period osmosis process；Technological design of the invention is adopted
With full-automatic industrial mode, and part technique carries out modularized design, and technical module can be according to actual production
Demand carries out the improvement and adjustment of part；The method of the physical vacuum deposition used completely, no gas, no liquid and gas particles
Discharge, it is environmentally friendly；Production line is full-automatic production, and personnel contact less with material, or do not contact, it is entirely avoided
The damage to human body is operated using spraying and chemical method；Neodymium iron boron ceramic surface metallization magnetron sputtering film production line uses
Modularized design can select the value volume and range of product of technical module, according to the actual conditions of each company to be suitble to various production capacities
Demand, and control cost appropriate is simple to the upgrading of technique and product, realizes high-volume continuous production, daily production
60,000-10 ten thousand can be can achieve, can satisfy the demand of the marketization.
Detailed description of the invention
Fig. 1 is main view of the invention；
Fig. 2 is top view of the invention；
Fig. 3 is left view of the invention；
Fig. 4 is the left view of low vacuum forepump system；
In appended drawing reference: flip module -1, lifting module -2, disengaging piece module -3, vacuum coating module -4, import vacuum
Section -41, import buffer vacuum section -42, import transition vacuum zone -43, coating process vacuum zone -44, outlet transition vacuum zone -
45, export buffer vacuum section -46 and outlet vacuum zone -47, slice lifting module -5, vacuum cavity -6, vacuum cavity-(6-1),
It is vacuum cavity-(6-2), vacuum cavity-(6-3), vacuum cavity-(6-4), vacuum cavity-(6-5), vacuum cavity-(6-6), true
Cavity body-(6-7), chamber mount -7, chamber mount-(7-1), chamber mount-(7-2), chamber mount-(7-3), cavity branch
Frame-(7-4), chamber mount-(7-5), chamber mount-(7-6), chamber mount-(7-7), low vacuum forepump system -8, height
Vacuum-pumping system -91, high vacuum forepump system -92, isolating valve-(10-1), isolating valve-(10-2), isolating valve-(10-
3), isolating valve-(10-4), isolating valve-(10-5), isolating valve-(10-6), cavity maintenance door -11, interior conveyer system -12, substrate
Return system -13, maintenance driving -14, mechanical pump -15, lobe pump -16, vacuum valve -17, pump-line -18, filtering inflation
Device -19, molecular pump -20, flapper valve -21, pipeline -22, substrate tray -23, upper conveyer system 24, lower conveyer system 25, line
Property ion source -26, linear plane magnetic control sputtering cathode -27, Linear Rotation sputter cathode -28.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts all other
Embodiment shall fall within the protection scope of the present invention.
Fig. 1-Fig. 4 is please referred to, the invention provides the following technical scheme: a kind of neodymium iron boron ceramic surface metallization magnetron sputtering
Coating film production line, including flip module 1, lifting module 2, disengaging piece module 3, vacuum coating module 4, slice go up and down module 5；Very
Sky plating film module 4 is made of multiple vacuum cavities 6 and multiple cavities bracket 7, and all vacuum cavities 6 are all mounted on cavity branch
On frame 7, it is equipped with interior conveyer system 12 inside vacuum cavity 6, is configured with above vacuum cavity 6 and safeguards driving 14, on chamber mount 7
Substrate return system 13 is installed, vacuum coating module 4 is divided for import vacuum zone 41, import buffer vacuum section 42, import transition
47 7 sections of vacuum zone of vacuum zone 43, coating process vacuum zone 44, outlet transition vacuum zone 45, outlet buffer vacuum section 46 and outlet
Composition, import vacuum zone 41 are made of vacuum cavity 6-1 and chamber mount 7-1, and vacuum cavity 6-1 entrance is equipped with isolating valve
10-1, vacuum cavity 6-1 top plate are equipped with cavity maintenance door 11, are equipped with low vacuum forepump system beside cavity maintenance door 11
8, the pump-line 18 that low vacuum forepump system 8 passes through is connected to the bottom of vacuum cavity 6-1, is arranged on pump-line 18
There is vacuum valve 17；The side design of vacuum cavity 6-1 has filtering air charging system 19, and filtering air charging system 19 connects filtration drying
Nitrogen or filtration drying compressed air, import buffer vacuum section 42 is made of vacuum cavity 6-2 and chamber mount 7-2,
Vacuum cavity 6-2 is connect with vacuum cavity 6-1, and junction is equipped with isolating valve 10-2, and vacuum cavity 6-2 top plate is equipped with cavity
Maintenance door 11 is equipped with fine pumping system 91 on bottom plate, and fine pumping system 91 is by being no less than 20 groups of two molecular pumps
Connect by flapper valve 21 and pipeline 22 with high vacuum forepump system 92 at, molecular pump 20, import transition vacuum zone 43 by
Vacuum cavity 6-3 and chamber mount 7-3 composition, vacuum cavity 6-3 are connect with vacuum cavity 6-2, and junction is equipped with isolating valve
10-3, vacuum cavity 6-3 top plate are equipped with cavity maintenance door 11, and fine pumping system 91 is equipped on bottom plate, and high vacuum is taken out
Gas system 91 is formed by being no less than two molecular pumps 20, and molecular pump 20 passes through flapper valve 21 and pipeline 22 and high vacuum forepumping
System 92 connects, and coating process vacuum zone 44 is formed by being no less than an independent technique vacuum zone, and each independent technique is true
Dead band is made of vacuum cavity 6-4 and chamber mount 7-4, and the process Installation that three standards are set on the top plate of vacuum cavity 6-4 is empty
Linear ion source 24, linear plane magnetic control sputtering cathode 25 and Linear Rotation sputter cathode 26, vacuum cavity 6- are installed in position respectively
Fine pumping system 91 is installed on 4 bottom plates, fine pumping system 91 is formed by being no less than two molecular pumps 20,
Molecular pump 20 is connect by flapper valve 21 and pipeline 22 with high vacuum forepump system 92, and outlet transition vacuum zone 45 is by vacuum
Cavity 6-5 and chamber mount 7-5 composition, vacuum cavity 6-5 are connect with vacuum cavity 6-4, and junction is equipped with isolating valve 10-4,
The top plate of vacuum cavity 6-5 is equipped with cavity maintenance door 11, is equipped with fine pumping system 91, high vacuum on bottom plate
Extract system 91 is formed by being no less than two molecular pumps 20, and molecular pump 20 is taken out by flapper valve 21 and pipeline 22 and high vacuum prime
Gas system 92 connects, and outlet buffer vacuum section 46 is made of vacuum cavity 6-6 and chamber mount 7-6, vacuum cavity 6-6 and vacuum
Cavity 6-5 connection, and junction is equipped with isolating valve 10-5, the top plate of vacuum cavity 6-6 are equipped with cavity maintenance door 11, on bottom plate
Fine pumping system 91 is installed, fine pumping system 91 is formed by being no less than two molecular pumps 20, molecular pump
20 connects by flapper valve 21 and pipeline 22 with high vacuum forepump system 92, export vacuum zone 47 by vacuum cavity 6-5 with
Chamber mount 7-5 is formed, and isolating valve 10-6 is equipped at 6-5 mouthfuls of vacuum cavity, and vacuum cavity 6-7 top plate is equipped with cavity maintenance door
11, low vacuum forepump system 8 is equipped with beside cavity maintenance door 11, low vacuum forepump system 8 is by mechanical pump 15 and sieve
16 composition of thatch pump, the pump-line 18 that low vacuum forepump system 8 passes through are connected to the bottom of vacuum cavity 6-1, exhaust tube
It is provided with vacuum valve 17 on road 18, the side design of vacuum cavity 6-1 has a filtering air charging system 19, disengaging piece module 3 and true
Sky plating film module 4 is designed with conveyer system 24 and lower conveyer system 25.In use, disengaging piece module 3 and vacuum coating module 4
The uninterrupted continuous production of substrate tray 23 is allowed to recycle by going up and down the cooperation of module 5 with lifting module 2 and slice, flip module 1 will
The clamping overturning of substrate tray 23 that lifting module 2 is sent, is realized by plated film ceramic member turn-over, and original position is put into substrate tray again
23, production cycle is sent to by lifting module 2 again and realizes double-sided coating, realizes the metallization plating of compact ceramic piece magnetron sputtering
The high-volume continuous production of film, daily production capacity can achieve 60,000-10 ten thousand, be especially suitable for Neodymium iron boron magnetic potsherd surface
The plated film of two-sided metallization functional membrane also includes electric control system and safeguards the cooperation of driving system during this.
Finally, it should be noted that the foregoing is only a preferred embodiment of the present invention, it is not intended to restrict the invention,
Although the present invention is described in detail referring to the foregoing embodiments, for those skilled in the art, still may be used
To modify the technical solutions described in the foregoing embodiments or equivalent replacement of some of the technical features.
All within the spirits and principles of the present invention, any modification, equivalent replacement, improvement and so on should be included in of the invention
Within protection scope.
Claims (7)
1. a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line, including flip module (1), lifting module (2),
Pass in and out piece module (3), vacuum coating module (4), slice lifting module (5)；It is characterized by: the vacuum coating module (4)
It is made of multiple vacuum cavities (6) and multiple cavities bracket (7), and all vacuum cavities (6) are all mounted on chamber mount (7)
On, interior conveyer system (12) are equipped with inside the vacuum cavity (6), configured with maintenance driving above the vacuum cavity (6)
(14), it is equipped with substrate return system (13) on the chamber mount (7), the vacuum coating module (4) is divided into import vacuum
Section (41), import buffer vacuum section (42), import transition vacuum zone (43), coating process vacuum zone (44), outlet transition vacuum
(47) seven sections of vacuum zone of section (45), outlet buffer vacuum section (46) and outlet, the import vacuum zone (41) is by vacuum cavity (6-
1) and chamber mount (7-1) composition, vacuum cavity (6-1) entrance are equipped with isolating valve (10-1), the vacuum cavity (6-
1) top plate is equipped with cavity maintenance door (11), is equipped with low vacuum forepump system (8) beside the cavity maintenance door (11), institute
State the bottom that the pump-line (18) that low vacuum forepump system (8) passes through is connected to vacuum cavity (6-1), the exhaust tube
It is provided on road (18) vacuum valve (17), the side design of the vacuum cavity (6-1) has filtering air charging system (19), described
Import buffer vacuum section (42) is made of vacuum cavity (6-2) and chamber mount (7-2), the vacuum cavity (6-2) and vacuum
Cavity (6-1) connection, and junction is equipped with isolating valve (10-2), vacuum cavity (6-2) top plate is equipped with cavity maintenance door
(11), it is equipped on bottom plate fine pumping system (91), the fine pumping system (91) is by being no less than two molecular pumps
(20) it forming, the molecular pump (20) is connect by flapper valve (21) and pipeline (22) with high vacuum forepump system (92),
The import transition vacuum zone (43) is made of vacuum cavity (6-3) and chamber mount (7-3), the vacuum cavity (6-3) with
Vacuum cavity (6-2) connection, and junction is equipped with isolating valve (10-3), vacuum cavity (6-3) top plate is tieed up equipped with cavity
It repairs door (11), is equipped on bottom plate fine pumping system (91), the fine pumping system (91) is by being no less than two points
Son pump (20) composition, the molecular pump (20) pass through flapper valve (21) and pipeline (22) and high vacuum forepump system (92) even
It connects, the coating process vacuum zone (44) is formed by being no less than an independent technique vacuum zone, each independent technique vacuum
Section is made of vacuum cavity (6-4) and chamber mount (7-4), is equipped with Gao Zhen on vacuum cavity (6-4) bottom plate
Empty extract system (91), the fine pumping system (91) are formed by being no less than two molecular pumps (20), the molecular pump
(20) it is connect by flapper valve (21) and pipeline (22) with high vacuum forepump system (92), the outlet transition vacuum zone
(45) it being made of vacuum cavity (6-5) and chamber mount (7-5), the vacuum cavity (6-5) connect with vacuum cavity (6-4),
And junction is equipped with isolating valve (10-4), the top plate of the vacuum cavity (6-5) is equipped with cavity maintenance door (11), pacifies on bottom plate
Equipped with being equipped with fine pumping system (91), the fine pumping system (91) is by being no less than two molecular pump (20) groups
Connect by flapper valve (21) and pipeline (22) with high vacuum forepump system (92) at, the molecular pump (20), it is described out
Mouth buffer vacuum section (46) is made of vacuum cavity (6-6) and chamber mount (7-6), the vacuum cavity (6-6) and vacuum chamber
Body (6-5) connection, and junction is equipped with isolating valve (10-5), the top plate of the vacuum cavity (6-6) is equipped with cavity maintenance door
(11), it is equipped on bottom plate fine pumping system (91), the fine pumping system (91) is by being no less than two
Molecular pump (20) composition, the molecular pump (20) pass through flapper valve (21) and pipeline (22) and high vacuum forepump system (92)
Connection, the outlet vacuum zone (47) are made of vacuum cavity (6-5) and chamber mount (7-5), vacuum cavity (6-5) mouth
Place is equipped with isolating valve (10-6), and vacuum cavity (6-7) top plate is equipped with cavity maintenance door (11), the cavity maintenance door
(11) side is equipped with low vacuum forepump system (8), and the low vacuum forepump system (8) is by mechanical pump (15) and Roots
(16) composition is pumped, the pump-line (18) that the low vacuum forepump system (8) passes through is connected to the bottom of vacuum cavity (6-1)
Portion is provided with vacuum valve (17) on the pump-line (18), and the side design of the vacuum cavity (6-1) has filtering to inflate
Device (19).
2. a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line according to claim 1, feature exist
In: the disengaging piece module (3) and vacuum coating module (4) are designed with upper conveyer system (24) and lower conveyer system (25), institute
Substrate tray (23) is stated to transmit in upper conveyer system (24) and lower conveyer system (25).
3. a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line according to claim 1, feature exist
In: the isolating valve (10-1), isolating valve (102), isolating valve (10-3), isolating valve (10-4), isolating valve (10-5), isolating valve
(10-6) uses independent flap valve or independent gate valve.
4. a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line according to claim 1, feature exist
In: the low vacuum forepump system (8) is made up of with lobe pump (16) pipeline mechanical pump (15).
5. a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line according to claim 1, feature exist
In: the high vacuum forepump system (92) is made of mechanical pump (15) and Lodz pump (16).
6. a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line according to claim 1, feature exist
In: the nitrogen of filtering air charging system (19) the connection filtration drying or the compressed air of filtration drying.
7. a kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line according to claim 1, feature exist
In: the process Installation vacancy of three standards is set on the top plate of the vacuum cavity (6-4), respectively install linear ion source (26),
Linear plane magnetic control sputtering cathode (27) and Linear Rotation sputter cathode (28).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810914508.0A CN108977783A (en) | 2018-08-13 | 2018-08-13 | A kind of neodymium iron boron ceramic surface metallization magnetron sputtering film production line |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109750269A (en) * | 2019-01-11 | 2019-05-14 | 包头中科泰磁涂层科技有限责任公司 | A kind of mobile phone nd-fe-b magnet is aluminized coating production line and production technology |
| CN110699659A (en) * | 2019-11-27 | 2020-01-17 | 北京七星华创集成电路装备有限公司 | Continuous vacuum coating equipment |
| CN111218655A (en) * | 2020-03-10 | 2020-06-02 | 沈阳中北真空设备有限公司 | Surface coating equipment and surface coating method for neodymium iron boron permanent magnet device |
| CN111621763A (en) * | 2020-04-22 | 2020-09-04 | 广东生波尔光电技术有限公司 | Special workpiece coating control system |
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| CN102943243A (en) * | 2012-11-27 | 2013-02-27 | 湘潭宏大真空技术股份有限公司 | Magnetron sputtering coating production line for capacitive touch screens |
| CN205062179U (en) * | 2015-07-29 | 2016-03-02 | 河源市璐悦自动化设备有限公司 | Large tracts of land diamond -like chemical vapor deposition coating film production line |
| CN206970710U (en) * | 2017-06-28 | 2018-02-06 | 武汉科瑞达真空科技有限公司 | A kind of vacuum system to display screen module continuous magnetron sputtering plated film |
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| CN102943243A (en) * | 2012-11-27 | 2013-02-27 | 湘潭宏大真空技术股份有限公司 | Magnetron sputtering coating production line for capacitive touch screens |
| CN205062179U (en) * | 2015-07-29 | 2016-03-02 | 河源市璐悦自动化设备有限公司 | Large tracts of land diamond -like chemical vapor deposition coating film production line |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109750269A (en) * | 2019-01-11 | 2019-05-14 | 包头中科泰磁涂层科技有限责任公司 | A kind of mobile phone nd-fe-b magnet is aluminized coating production line and production technology |
| CN110699659A (en) * | 2019-11-27 | 2020-01-17 | 北京七星华创集成电路装备有限公司 | Continuous vacuum coating equipment |
| CN110699659B (en) * | 2019-11-27 | 2022-09-02 | 北京七星华创集成电路装备有限公司 | Continuous vacuum coating equipment |
| CN111218655A (en) * | 2020-03-10 | 2020-06-02 | 沈阳中北真空设备有限公司 | Surface coating equipment and surface coating method for neodymium iron boron permanent magnet device |
| CN111621763A (en) * | 2020-04-22 | 2020-09-04 | 广东生波尔光电技术有限公司 | Special workpiece coating control system |
| CN111621763B (en) * | 2020-04-22 | 2022-06-17 | 广东生波尔光电技术有限公司 | Special workpiece coating control system |
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Application publication date: 20181211 |