CN108896837B - Integrated optical waveguide three-dimensional electric field sensor system - Google Patents
Integrated optical waveguide three-dimensional electric field sensor system Download PDFInfo
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- CN108896837B CN108896837B CN201810599447.3A CN201810599447A CN108896837B CN 108896837 B CN108896837 B CN 108896837B CN 201810599447 A CN201810599447 A CN 201810599447A CN 108896837 B CN108896837 B CN 108896837B
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Abstract
The invention relates to an integrated optical waveguide three-dimensional electric field sensor system, and belongs to the technical field of electric field measurement. The integrated optical waveguide three-dimensional electric field sensing probe is formed by adhering an integrated optical waveguide two-dimensional electric field probe and an integrated optical waveguide one-dimensional electric field probe together. The integrated optical waveguide three-dimensional electric field sensor provided by the invention is composed of a single-chip integrated optical waveguide two-dimensional electric field sensor and a single-chip integrated optical waveguide one-dimensional electric field sensor, can realize three-dimensional detection of a space electric field, and has the advantages of small volume, high spatial resolution and the like.
Description
Technical Field
The invention relates to an integrated optical waveguide three-dimensional electric field sensor system, belongs to the technical field of electric field measurement, and is particularly suitable for three-dimensional measurement of an electric field with an unknown spatial direction.
Background
In recent years, with the continuous development and progress of science and technology such as national defense, electric power, medical treatment and the like, the demand of electric field measurement is continuously increased, and new and higher requirements on the performance of the electric field sensor are also provided. For example, nuclear electromagnetic pulses, high-power microwaves and radar pulses which need to be measured in the field of national defense research, and long-gap discharge electric fields, partial discharge electric fields, lightning pulses and the like which need to be measured in the field of high-voltage engineering generally have the characteristics of fast rising edge (up to ns magnitude) and high peak field intensity (up to MV/m magnitude). Therefore, the corresponding electric field sensor is required to have the advantages of wide bandwidth, quick response, adaptability to large field intensity measurement, strong anti-interference capability and the like. Obviously, conventional active electric field sensors based on metal antennas have not been able to meet the requirements for such electric field measurements.
It is worth noting that a passive optical electric field sensor based on optical technology, especially an optical waveguide electric field sensor based on integrated optical technology, has become a hot spot for electric field measurement, especially for transient strong electric field measurement research, due to its advantages of fast response, small size, wide bandwidth, strong anti-electromagnetic interference capability, and small interference to the measured electric field. However, research on integrated optical waveguide electric field sensors has been focused on one-dimensional electric field sensors, i.e., electric field sensors are being researched that are mainly used to measure electric fields with known directions. Considering that the directions of most of actual measured electric fields are usually unknown, in order to meet the actual measurement requirements, a three-dimensional electric field sensor needs to be developed to realize three-dimensional measurement of any electric field in the spatial direction.
Foreign scholars study that three Mach-Zehnder interferometer type integrated optical waveguide electric field sensors are arranged on three side surfaces of a regular triangular prism to form an integrated optical waveguide three-dimensional electric field sensor [ "Tajima, K; kobayashi, R; kuwabara, N; tokuda, M, Development of optical isotope E-field sensor operating mean 10GHz using Mach-Zehnder interferometers ", IEICE Transactions on Electronics, E85-C (4),2002: 961-. However, the existing integrated optical waveguide three-dimensional electric field sensor has a large volume and a low spatial resolution, and because of the existence of non-negligible spatial distances among the three sensors, the measurement results of the three electric field sensors arranged on the three sides of the triangular prism are synthesized to be used as the field intensity at the center point of the triangular prism, which inevitably causes a large error.
Disclosure of Invention
The invention aims to solve the technical problem of providing an integrated optical waveguide three-dimensional electric field sensor system, overcomes the defects of the prior art, and has the advantages of simple structure, small volume and high spatial resolution.
The technical scheme adopted by the invention is as follows: an integrated optical waveguide three-dimensional electric field sensor system comprises
A broadband laser source 1 for outputting a laser signal of a specific wavelength range;
the single-mode optical fiber 2 is used for inputting a laser signal output by the broadband laser source 1 into the optical fiber coupler 3, inputting an optical signal output by the optical fiber coupler 3 into the integrated optical waveguide three-dimensional electric field probe, and inputting the optical signal output by the integrated optical waveguide three-dimensional electric field probe into the optical wavelength demodulator 8;
the optical fiber coupler 3 is used for dividing the output light of the broadband laser source 1 into two parts which are respectively input into one integrated optical waveguide two-dimensional electric field probe and the other integrated optical waveguide one-dimensional electric field probe in the integrated optical waveguide three-dimensional electric field probes;
the integrated optical waveguide three-dimensional electric field sensing probe is formed by adhering an integrated optical waveguide two-dimensional electric field probe and an integrated optical waveguide one-dimensional electric field probe together and is used for detecting a spatial detected electric field and converting the detected change of the electric field intensity into the change of the optical wavelength;
and the optical wavelength demodulator 8 is used for carrying out wavelength demodulation on an optical signal output by the integrated optical waveguide three-dimensional electric field sensing probe so as to acquire the strength of the spatial measured electric field.
Specifically, the integrated optical waveguide two-dimensional electric field probe and the integrated optical waveguide one-dimensional electric field probe in the integrated optical waveguide three-dimensional electric field probe are that an annular optical waveguide 5 and a straight waveguide 6 are manufactured on the surface of a substrate 4 with an electro-optic effect by adopting an integrated optical manufacturing process technology, the annular optical waveguide 5 and the straight waveguide 6 form an optical waveguide micro-ring resonant cavity, annular metal electrodes 7 are manufactured on two sides of the annular optical waveguide 5 in the integrated optical waveguide two-dimensional electric field probe, strip-shaped metal electrodes 9 are manufactured on two sides of the annular optical waveguide 5 in the integrated optical waveguide one-dimensional electric field probe, and the annular metal electrodes 7 and the strip-shaped metal electrodes.
Specifically, the resonant wavelength of the optical waveguide micro-ring resonant cavity of the integrated optical waveguide three-dimensional electric field probe is
λ＝2πneffR/m (1)
In the formula (1), R is the radius of the annular optical waveguide 5, and neffIs the effective refractive index of the annular optical waveguide 5, m is a positive integer, and can be known from the formula (1), when the integrated optical wave three-dimensional electric field probe detects the electric field E (E)x,Ey,Ez) When the voltage is induced between the two annular metal electrodes 7 and between the two strip-shaped metal electrodes 9, the effective refractive index of the annular optical waveguide 5 is changed by the electro-optic effect of the substrate 4, which is expressed as Δ neff(E) Therefore, the resonance wavelength shift of the integrated optical waveguide two-dimensional electric field probe is delta lambda1The resonance wavelength offset of the integrated optical waveguide one-dimensional electric field probe is delta lambda2May be respectively represented as
Δλ1＝2πΔneff(Ey,Ez)neffR/m＝2πγ(√Ey 2+Ez 2)R/m (2)
Δλ2＝2πneff(Ex)R/m＝2πγExR/m (3)
In the formulas (2) and (3), gamma is an electro-optic modulation coefficient, Ex，Ey，EzWhen 2 pi γ R/m is k, which is three components in the x-axis, y-axis, and z-axis directions of the spatial measured electric field, the intensity of the measured electric field E can be obtained from the expressions (2) and (3)
According to the analysis formula (4), the wavelength demodulator 8 is used at the output end of the integrated optical waveguide three-dimensional electric field probe to detect the resonance wavelength shift delta lambda of the integrated optical waveguide three-dimensional electric field probe1And Δ λ2And obtaining the strength of the spatial measured electric field.
Preferably, the broadband laser source (1) adopts an ASE laser with the central wavelength of 1550nm for optical fiber communication.
Preferably, the single-mode optical fiber (2) adopts a standard optical fiber for optical fiber communication with the central wavelength of 1550 nm.
Preferably, the optical fiber coupler (3) adopts a standard optical fiber coupler for optical fiber communication with the central wavelength of 1550 nm.
Preferably, the substrate (4) is made of electro-optic polymer.
Preferably, the material of the annular metal electrode (7) and the strip-shaped metal electrode (9) can be gold.
Preferably, the optical wavelength demodulator (8) is a spectrometer or a commercial fiber grating demodulator.
The invention has the beneficial effects that:
1) the spatial resolution of the measurement is improved. Only two integrated optical waveguide electric field sensors are adopted to form one integrated optical waveguide three-dimensional electric field sensor, so that the size of the sensor is obviously reduced, and the spatial resolution is improved.
2) The accuracy of measurement is improved. Because the two integrated optical waveguide electric field sensors forming the integrated optical waveguide three-dimensional electric field probe are close to each other, the measurement result of the two integrated optical waveguide electric field sensors is approximate to the synthetic field intensity at a certain position, the error is small, and the measurement accuracy is improved.
3) A plurality of electric field probes can be cascaded, and multipoint simultaneous measurement is realized. Because the broadband laser signal is used as the input signal of the sensor, and the electric field intensity is obtained at the output end by adopting the method of detecting the resonance wavelength shift of the sensor, a plurality of electric field sensors can be cascaded by only one broadband light source and one wavelength demodulator in the same measuring system, and the simultaneous measurement of space and multiple points is realized.
Drawings
FIG. 1 is a schematic structural diagram of an integrated optical waveguide three-dimensional electric field sensor system provided by the present invention;
fig. 2 is a schematic structural diagram of a one-dimensional electric field probe in the integrated optical waveguide three-dimensional electric field probe provided by the invention.
The reference numbers in the figures are: 1-broadband laser source, 2-single mode fiber, 3-fiber coupler, 4-substrate, 5-annular optical waveguide, 6-straight waveguide, 7-annular metal electrode, 8-wavelength demodulator and 9-strip metal electrode.
Detailed Description
The invention will be further described with reference to the following figures and specific examples, but the scope of the invention is not limited thereto.
Example 1: 1-2, an integrated optical waveguide three-dimensional electric field sensor system includes
A broadband laser source 1 for outputting a laser signal of a specific wavelength range;
the single-mode optical fiber 2 is used for inputting a laser signal output by the broadband laser source 1 into the optical fiber coupler 3, inputting an optical signal output by the optical fiber coupler 3 into the integrated optical waveguide three-dimensional electric field probe, and inputting the optical signal output by the integrated optical waveguide three-dimensional electric field probe into the optical wavelength demodulator 8;
the optical fiber coupler 3 is used for dividing the output light of the broadband laser source 1 into two parts which are respectively input into one integrated optical waveguide two-dimensional electric field probe and the other integrated optical waveguide one-dimensional electric field probe in the integrated optical waveguide three-dimensional electric field probes;
the integrated optical waveguide three-dimensional electric field sensing probe is formed by adhering an integrated optical waveguide two-dimensional electric field probe and an integrated optical waveguide one-dimensional electric field probe together and is used for detecting a spatial detected electric field and converting the detected change of the electric field intensity into the change of the optical wavelength;
and the optical wavelength demodulator 8 is used for carrying out wavelength demodulation on an optical signal output by the integrated optical waveguide three-dimensional electric field sensing probe so as to acquire the strength of the spatial measured electric field.
Further, the integrated optical waveguide two-dimensional electric field probe and the integrated optical waveguide one-dimensional electric field probe in the integrated optical waveguide three-dimensional electric field probe are that an annular optical waveguide 5 and a straight waveguide 6 are manufactured on the surface of a substrate 4 with an electro-optic effect by adopting an integrated optical manufacturing process technology, the annular optical waveguide 5 and the straight waveguide 6 form an optical waveguide micro-ring resonant cavity, annular metal electrodes 7 are manufactured on two sides of the annular optical waveguide 5 in the integrated optical waveguide two-dimensional electric field probe, strip-shaped metal electrodes 9 are manufactured on two sides of the annular optical waveguide 5 in the integrated optical waveguide one-dimensional electric field probe, and the annular metal electrodes 7 are perpendicular to the strip-shaped metal.
The integrated optical waveguide two-dimensional electric field probe has the following composition principle: the annular optical waveguide 5 and the straight waveguide 6 are manufactured on the surface of a substrate with an electro-optic effect, the annular optical waveguide 5 and the straight waveguide 6 form a micro-ring resonant cavity, and the annular metal electrodes 7 are arranged on two sides of the annular optical waveguide 5, so that the integrated optical waveguide two-dimensional electric field probe can detect any electric field with the direction of the electric field parallel to the surface of the integrated optical waveguide two-dimensional electric field probe, and the integrated optical waveguide two-dimensional electric field sensor is formed.
The integrated optical waveguide three-dimensional electric field probe has the following composition principle: and adhering the integrated optical waveguide two-dimensional electric field probe and the integrated optical waveguide one-dimensional electric field probe together, and enabling the strip metal electrode 9 of the integrated optical waveguide one-dimensional electric field probe and the annular metal electrode 7 of the integrated optical waveguide two-dimensional electric field probe to be perpendicular to each other, so as to form the integrated optical waveguide three-dimensional electric field sensor.
Furthermore, the resonant wavelength of the optical waveguide micro-ring resonant cavity of the integrated optical waveguide three-dimensional electric field probe is
λ＝2πneffR/m (1)
In the formula (1), R is the radius of the annular optical waveguide 5, and neffIs the effective refractive index of the annular optical waveguide 5, m is a positive integer, and can be known from the formula (1), when the integrated optical wave three-dimensional electric field probe detects the electric field E (E)x,Ey,Ez) When the voltage is induced between the two annular metal electrodes 7 and between the two strip-shaped metal electrodes 9, the effective refractive index of the annular optical waveguide 5 is changed by the electro-optic effect of the substrate 4, which is expressed as Δ neff(E) Therefore, the resonance wavelength shift of the integrated optical waveguide two-dimensional electric field probe is delta lambda1The resonance wavelength offset of the integrated optical waveguide one-dimensional electric field probe is delta lambda2May be respectively represented as
Δλ1＝2πΔneff(Ey,Ez)neffR/m＝2πγ(√Ey 2+Ez 2)R/m (2)
Δλ2＝2πneff(Ex)R/m＝2πγExR/m (3)
In the formulas (2) and (3), gamma is an electro-optic modulation coefficient, Ex，Ey，EzWhen 2 pi γ R/m is k, which is three components in the x-axis, y-axis, and z-axis directions of the spatial measured electric field, the intensity of the measured electric field E can be obtained from the expressions (2) and (3)
According to the analysis formula (4), the wavelength demodulator 8 is used at the output end of the integrated optical waveguide three-dimensional electric field probe to detect the resonance wavelength shift delta lambda of the integrated optical waveguide three-dimensional electric field probe1And Δ λ2And obtaining the strength of the spatial measured electric field.
Further, in the present invention, the broadband laser source 1 may employ an ASE laser having a center wavelength of 1550nm for optical fiber communication. The single-mode optical fiber 2 can be a standard optical fiber for optical fiber communication with a center wavelength of 1550 nm. The optical fiber coupler 3 can adopt a standard optical fiber coupler for optical fiber communication with the central wavelength of 1550 nm. The substrate 4 of the integrated optical waveguide electric field sensor may be made of an electro-optic polymer. The material of the annular metal electrode 7 and the strip-shaped metal electrode 9 may be gold. The optical wavelength demodulator 8 can be a spectrometer or a commercial fiber grating demodulator, and can also be independently developed according to actual measurement requirements.
The working principle of the invention is as follows: the broadband laser source 1 outputs light waves in a certain wavelength range, and the light waves are input into the integrated optical waveguide three-dimensional electric field probe through the single-mode optical fiber 2 and the optical fiber coupler 3. When the integrated optical waveguide electric field probe detects a space electric field, an induced voltage is generated between the two annular metal electrodes 7 and between the two strip-shaped metal electrodes 9, and by utilizing the electro-optic effect of the substrate 4, the induced voltage causes the effective refractive index of the annular optical waveguide 5 to change, so that the phase of the light wave transmitted in the annular optical waveguide changes, as a result, the resonance wavelength of the waveguide micro-annular resonant cavity shifts, and the shift of the resonance wavelength is analyzed by using the optical wavelength demodulator 8 at the output end, so that the intensity of the detected electric field can be obtained.
According to the invention, two integrated optical waveguide electric field sensors are adopted to form one integrated optical waveguide three-dimensional electric field sensor, the device volume is obviously reduced, and the spatial resolution and the measurement accuracy are improved. And because the measuring system adopts the broadband laser signal as the input signal of the integrated optical waveguide three-dimensional electric field probe, and simultaneously adopts the method of detecting the resonance wavelength deviation of the integrated optical waveguide three-dimensional electric field probe to obtain the electric field intensity, a plurality of electric field sensors can be cascaded by only one broadband laser source 1 and one wavelength demodulator 8 in the same measuring system, thereby realizing the simultaneous measurement of multiple points in space.
While the present invention has been described in detail with reference to the embodiments shown in the drawings, the present invention is not limited to the embodiments, and various changes can be made without departing from the spirit of the present invention within the knowledge of those skilled in the art.
Claims (8)
1. An integrated optical waveguide three-dimensional electric field sensor system, characterized by: comprises that
A broadband laser source (1) for outputting a laser signal of a specific wavelength range;
the single-mode optical fiber (2) is used for inputting a laser signal output by the broadband laser source (1) into the optical fiber coupler (3), inputting an optical signal output by the optical fiber coupler (3) into the integrated optical waveguide three-dimensional electric field probe, and inputting an optical signal output by the integrated optical waveguide three-dimensional electric field probe into the optical wavelength demodulator (8);
the optical fiber coupler (3) is used for dividing the output light of the broadband laser source (1) into two parts which are respectively input into one integrated optical waveguide two-dimensional electric field probe and the other integrated optical waveguide one-dimensional electric field probe in the integrated optical waveguide three-dimensional electric field probes;
the integrated optical waveguide three-dimensional electric field sensing probe is formed by adhering an integrated optical waveguide two-dimensional electric field probe and an integrated optical waveguide one-dimensional electric field probe together, is used for detecting a spatial measured electric field and converting the change of the detected electric field intensity into the change of optical wavelength, and comprises the following components: manufacturing an annular optical waveguide (5) and a straight waveguide (6) on the surface of a substrate (4) with an electro-optic effect by adopting an integrated optical manufacturing process technology, wherein the annular optical waveguide (5) and the straight waveguide (6) form an optical waveguide micro-ring resonant cavity, annular metal electrodes (7) are manufactured on two sides of the annular optical waveguide (5) in an integrated optical waveguide two-dimensional electric field probe, strip-shaped metal electrodes (9) are manufactured on two sides of the annular optical waveguide (5) in the integrated optical waveguide one-dimensional electric field probe, and the annular metal electrodes (7) and the strip-shaped metal electrodes (9) are mutually vertical;
and the optical wavelength demodulator (8) is used for demodulating the wavelength of the optical signal output by the integrated optical waveguide three-dimensional electric field sensing probe so as to acquire the strength of the spatial measured electric field.
2. An integrated optical waveguide three dimensional electric field sensor system according to claim 1, wherein: the resonance wavelength of the optical waveguide micro-ring resonant cavity of the integrated optical waveguide three-dimensional electric field probe is
λ＝2πneffR/m (1)
In the formula (1), R is the radius of the annular optical waveguide (5), neffIs the effective refractive index of the annular optical waveguide (5), m is a positive integer, and can be known from the formula (1) when the integrated optical wave three-dimensional electric field probe detects an electric field E (E)x,Ey,Ez) When the light source is used, induced voltage is generated between the two annular metal electrodes (7) and between the two strip-shaped metal electrodes (9), and the effective refractive index of the annular light waveguide (5) is changed by the voltage through the electro-optic effect of the substrate (4), wherein the effective refractive index is expressed as delta neff(E) Therefore, the resonance wavelength shift of the integrated optical waveguide two-dimensional electric field probe is delta lambda1The resonance wavelength offset of the integrated optical waveguide one-dimensional electric field probe is delta lambda2Are respectively represented as
Δλ1＝2πΔneff(Ey,Ez)neffR/m＝2πγ(√Ey 2+Ez 2)R/m (2)
Δλ2＝2πneff(Ex)R/m＝2πγExR/m (3)
In the formulas (2) and (3), gamma is an electro-optic modulation coefficient, Ex，Ey，EzWhen 2 pi γ R/m is k, which is three components in the x-axis, y-axis, and z-axis directions of the spatial measured electric field, the intensity of the measured electric field E can be obtained from the expressions (2) and (3)
According to the analysis formula (4), the optical wavelength demodulator (8) is used at the output end of the integrated optical waveguide three-dimensional electric field probe to detect the resonance wavelength shift delta lambda of the integrated optical waveguide three-dimensional electric field probe1And Δ λ2And obtaining the strength of the spatial measured electric field.
3. An integrated optical waveguide three dimensional electric field sensor system according to claim 1, wherein: the broadband laser source (1) adopts an ASE laser with the central wavelength of 1550nm for optical fiber communication.
4. An integrated optical waveguide three dimensional electric field sensor system according to claim 1, wherein: the single-mode optical fiber (2) adopts an optical fiber communication standard optical fiber with the central wavelength of 1550 nm.
5. An integrated optical waveguide three dimensional electric field sensor system according to claim 1, wherein: the optical fiber coupler (3) adopts a standard optical fiber coupler for optical fiber communication with the central wavelength of 1550 nm.
6. An integrated optical waveguide three dimensional electric field sensor system according to claim 1, wherein: the substrate (4) adopts electro-optic polymer.
7. An integrated optical waveguide three dimensional electric field sensor system according to claim 1, wherein: the annular metal electrode (7) and the strip-shaped metal electrode (9) are made of gold.
8. An integrated optical waveguide three dimensional electric field sensor system according to claim 1, wherein: the optical wavelength demodulator (8) is a spectrometer or a commercial fiber grating demodulator.
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| CN102288839A (en) * | 2011-05-12 | 2011-12-21 | 清华大学 | Optoelectronic integration three-dimensional electric field sensor system |
| JP2013164615A (en) * | 2013-04-18 | 2013-08-22 | Nec Corp | Optical device, optical integrated device, and manufacturing method of optical device |
| CN104280841A (en) * | 2014-09-30 | 2015-01-14 | 浙江大学 | Electric field sensitive element of full-fiber structure and electric field sensing device |
| CN107918061A (en) * | 2017-11-22 | 2018-04-17 | 昆明理工大学 | One kind is based on time-multiplexed integrated light guide three-dimensional electric field measuring system and method |
| CN108120883A (en) * | 2017-11-22 | 2018-06-05 | 昆明理工大学 | A kind of integrated light guide three-dimensional electric field sensor |
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| CN102288839A (en) * | 2011-05-12 | 2011-12-21 | 清华大学 | Optoelectronic integration three-dimensional electric field sensor system |
| JP2013164615A (en) * | 2013-04-18 | 2013-08-22 | Nec Corp | Optical device, optical integrated device, and manufacturing method of optical device |
| CN104280841A (en) * | 2014-09-30 | 2015-01-14 | 浙江大学 | Electric field sensitive element of full-fiber structure and electric field sensing device |
| CN107918061A (en) * | 2017-11-22 | 2018-04-17 | 昆明理工大学 | One kind is based on time-multiplexed integrated light guide three-dimensional electric field measuring system and method |
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