CN108893712A - Coated objects made from precious metals of surface band and preparation method thereof - Google Patents
Coated objects made from precious metals of surface band and preparation method thereof Download PDFInfo
- Publication number
- CN108893712A CN108893712A CN201810737768.5A CN201810737768A CN108893712A CN 108893712 A CN108893712 A CN 108893712A CN 201810737768 A CN201810737768 A CN 201810737768A CN 108893712 A CN108893712 A CN 108893712A
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- China
- Prior art keywords
- noble metal
- metal matrix
- layer
- vacuum
- pvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000010970 precious metal Substances 0.000 title claims abstract description 74
- 238000002360 preparation method Methods 0.000 title claims abstract description 39
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 111
- 239000011159 matrix material Substances 0.000 claims abstract description 104
- 239000010931 gold Substances 0.000 claims abstract description 101
- 229910052737 gold Inorganic materials 0.000 claims abstract description 101
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 100
- 239000011248 coating agent Substances 0.000 claims abstract description 72
- 238000000576 coating method Methods 0.000 claims abstract description 72
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 62
- 238000001962 electrophoresis Methods 0.000 claims abstract description 32
- 229910052709 silver Inorganic materials 0.000 claims abstract description 12
- 239000004332 silver Substances 0.000 claims abstract description 10
- 238000005240 physical vapour deposition Methods 0.000 claims description 92
- 239000007789 gas Substances 0.000 claims description 72
- 238000000034 method Methods 0.000 claims description 69
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 48
- 238000007747 plating Methods 0.000 claims description 48
- 238000004140 cleaning Methods 0.000 claims description 31
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 25
- 229910052786 argon Inorganic materials 0.000 claims description 24
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 claims description 15
- 238000001704 evaporation Methods 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 14
- 230000003746 surface roughness Effects 0.000 claims description 14
- QRJOYPHTNNOAOJ-UHFFFAOYSA-N copper gold Chemical compound [Cu].[Au] QRJOYPHTNNOAOJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 229910052718 tin Inorganic materials 0.000 claims description 8
- 239000011135 tin Substances 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 239000011651 chromium Substances 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 239000000428 dust Substances 0.000 claims description 7
- 239000004744 fabric Substances 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 6
- 229910010038 TiAl Inorganic materials 0.000 claims description 6
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 6
- 239000004411 aluminium Substances 0.000 claims description 6
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910010037 TiAlN Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- 229910052684 Cerium Inorganic materials 0.000 claims description 4
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 4
- 229910008484 TiSi Inorganic materials 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052746 lanthanum Inorganic materials 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- 239000006187 pill Substances 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 229910052727 yttrium Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 238000009210 therapy by ultrasound Methods 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 claims description 2
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims description 2
- 229910019974 CrSi Inorganic materials 0.000 claims description 2
- 229910002546 FeCo Inorganic materials 0.000 claims description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910000943 NiAl Inorganic materials 0.000 claims description 2
- 229910006164 NiV Inorganic materials 0.000 claims description 2
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 claims description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 2
- 229910033181 TiB2 Inorganic materials 0.000 claims description 2
- 229910010380 TiNi Inorganic materials 0.000 claims description 2
- 229910008651 TiZr Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims description 2
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 150000002222 fluorine compounds Chemical group 0.000 claims description 2
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 238000003475 lamination Methods 0.000 claims 1
- 230000009182 swimming Effects 0.000 claims 1
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- 239000003086 colorant Substances 0.000 abstract description 6
- 230000005923 long-lasting effect Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 115
- 239000000047 product Substances 0.000 description 16
- 241000416536 Euproctis pseudoconspersa Species 0.000 description 10
- 239000007924 injection Substances 0.000 description 10
- 238000002347 injection Methods 0.000 description 10
- 238000001291 vacuum drying Methods 0.000 description 10
- 239000010939 rose gold Substances 0.000 description 6
- 229910001112 rose gold Inorganic materials 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000012153 distilled water Substances 0.000 description 5
- 238000002203 pretreatment Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 241000784726 Lycaena thetis Species 0.000 description 4
- 241000220317 Rosa Species 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 239000011265 semifinished product Substances 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- FFRBMBIXVSCUFS-UHFFFAOYSA-N 2,4-dinitro-1-naphthol Chemical compound C1=CC=C2C(O)=C([N+]([O-])=O)C=C([N+]([O-])=O)C2=C1 FFRBMBIXVSCUFS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 235000019993 champagne Nutrition 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- -1 sulphur Compound Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 235000014101 wine Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/62—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of gold
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to precious metal surface coating field, a kind of coated objects made from precious metals of surface band and preparation method thereof is disclosed；Wherein, which includes：Noble metal matrix and the PVD layers being in turn attached on the noble metal matrix or water coating or electrophoresis layer and transparent film layer, the noble metal are gold or silver.The objects made from precious metals surface is formed by that film layer is relatively thin, and different colors can be presented, and improves the single gold of noble metal matrix, and the change of the color will not influence the quality of noble metal matrix；And the transparent film layer, it is more stable to make to be formed by film layer, increases wearability, and the color to be formed can be made more longlasting colour-fast.
Description
Technical field
The present invention relates to precious metal surface coating fields, and in particular to a kind of coated objects made from precious metals of surface band and its
Preparation method.
Background technique
Gold product color is vivid, and stability is good, usually as jewellery, extensively gets consumer reception.The production of product at present
Technique mainly includes casting wax, reverse mould, surface deburring Shape correction.In order to improve the glossiness on gold product surface, generally use
Electric plating method handles the surface of gold product.
CN106521594A discloses the manufacturing method and its equipment that a kind of karat gold is processed into gold true qualities, previously prepared head
Adorn semi-finished product；Plating processing is carried out to jewellery semi-finished product, the color for keeping it external is reduced to the true qualities of gold；To the head after plating
Decorations semi-finished product are surface-treated, and jewellery finished product is formed.
But using electric plating method in gold product surface coating, the film layer on gold product surface is unstable, is easy stripping
From falling off.
CN107675136A discloses a kind of method of workpiece surface physical vapour deposition (PVD) (PVD) plated film, and workpiece to be plated is put
Enter coating chamber to vacuumize, heat, leads to argon gas later, ion bombardment processing is carried out to workpiece to be plated, then be passed through working gas, treat
Plating workpiece is biased, and the coating of respective material is deposited on workpiece to be plated.
CN105803412A discloses PVD coating of air speed pipe surface and preparation method thereof, pitot after a polish
On matrix surface, the single coat of metal is plated using physical vaporous deposition.
Above method, in workpiece surface plated film, improves the binding ability of plated film and workpiece to be plated using PVD method.But mesh
Before, PVD is only applicable in the higher material surface plated film of hardness, in the material table of hardness lower (for example mohs hardness is 2-3)
When the plated film of face, the binding force between film layer and substrate is still weaker.
Summary of the invention
The purpose of the invention is to overcome the problems, such as that the coating of the existing technology on precious metal surface is unstable, or
The low problem of person's coating brightness or the too thin problem of coating, and provide a kind of coated objects made from precious metals of surface band and
Preparation method can form different types of film layer on objects made from precious metals surface using this method, it is steady to be formed by film layer structure
Fixed perhaps brightness is high or thickness of coating is thick, and different colors can be presented.
To achieve the goals above, first aspect present invention provides a kind of objects made from precious metals, wherein the objects made from precious metals
Including：Noble metal matrix and the first layer and the second layer being in turn attached on the noble metal matrix；Wherein, the first layer is
Any one in PVD layers, water coating and electrophoresis layer, the second layer are transparent film layer, and the noble metal is Huang
Gold or silver.
Second aspect of the present invention provides the preparation method of the aforementioned objects made from precious metals, wherein this method include with
Lower step：
(1) first layer is formed on the surface of noble metal matrix；
(2) second layer is deposited using physical vapour deposition (PVD) on the first layer；
Wherein, using physical vapour deposition (PVD) noble metal matrix surface deposits physical vapor deposition layer；It is plated using water
Technique forms water coating on the surface of noble metal matrix；Electrophoresis is formed on the surface of noble metal matrix using electrophoresis process
Layer.
Through the above technical solutions, being surface-treated in advance to noble metal matrix, improve the coarse of noble metal matrix surface
Then degree forms PVD layers in noble metal matrix surface plated film using PVD, can form coloury film layer, change
The single gold of kind noble metal matrix, the change of the color will not influence the quality of noble metal matrix；Or use water depositing process
Water coating is formed on the noble metal matrix, can form coloury film layer, is improved the single gold of noble metal matrix, is increased
The brightness of blooming layer；Or electrophoresis layer is formed on noble metal matrix using electrophoresis process, coloury film layer can be formed,
Improve the single gold of noble metal matrix；And again using PVD on PVD layers, perhaps on water coating or
Transparent film layer is deposited over the electrophoretic layer, and it is more stable to make to be formed by film layer, increases wearability, and can make the color to be formed
It is color more longlasting colour-fast.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of objects made from precious metals.
Description of symbols
1, noble metal matrix 1
2, first layer (PVD layers or water coating or electrophoresis layer)
3, the second layer (transparent film layer)
Specific embodiment
The endpoint of disclosed range and any value are not limited to the accurate range or value herein, these ranges or
Value should be understood as comprising the value close to these ranges or value.For numberical range, between the endpoint value of each range, respectively
It can be combined with each other between the endpoint value of a range and individual point value, and individually between point value and obtain one or more
New numberical range, these numberical ranges should be considered as specific open herein.
First aspect present invention provides a kind of objects made from precious metals, wherein as shown in Figure 1, the objects made from precious metals includes：It is expensive
Metallic matrix 1 and the first layer 2 and the second layer 3 being in turn attached on the noble metal matrix 1；Wherein, the first layer 2 is object
Any one in physical vapor deposition layer, water coating and electrophoresis layer, the second layer 3 are transparent film layer, and the noble metal is Huang
Gold or silver.
According to the present invention, the content of noble metal can be 33-99.99 weight % in the noble metal matrix 1, preferably
99-99.99 weight %；For example, in the present invention, the noble metal matrix 1 can be karat gold, it is also possible to pure gold.Wherein, institute
It states karat gold and refers to the noble metal matrix 1 that Jin Yuyin, zinc, copper, palladium or nickel mixed smelting are formed；The pure gold refers to noble metal matrix 1
In, golden content is no less than 99 weight %；In the present invention, the pure gold includes 3D firmly golden.
According to the present invention, content silver-colored in the silver is 92.5-99 weight %.
According to the present invention, the surface roughness of the noble metal matrix 1 is preferably 0.001-50 μm, preferably 0.005-
0.1μm；In the present invention, the surface roughness is Ra, i.e. the injustice of smaller spacing and small peak valley that has of finished surface
Degree.Surfagauge can be used directly to test.
In the present invention, it if 1 raw material of noble metal matrix itself meets the restriction of above-mentioned surface roughness, directly carries out subsequent
Step.It, can be using chemistry or mechanical side if 1 raw material of noble metal matrix is unsatisfactory for the restriction of above-mentioned surface roughness
Method handles noble metal matrix 1, and this method is not particularly limited, as long as can satisfy the above roughness.
In the present invention, the surface roughness of noble metal matrix 1 meets conditions above, it is easier in the table of noble metal matrix
Face plated film.If surface roughness is too low, the being firmly combined property of film layer and noble metal matrix declines；If surface roughness is too big, shadow
Ring the color of final objects made from precious metals.
According to the present invention, the gold content of the PVD layers can be below 0.1 weight % or in 33 weights
Measure % or more, it is preferable that the 0.01 weight % of gold content or less of the PVD layers or 70-90 weight % it
Between, it is highly preferred that the gold content 0.001-0.008 weight % of the PVD layers or between 75-85 weight %.
According to the present invention, the thickness of the PVD layers can for 10nm-50 μm (such as 10nm, 20nm, 30nm,
Arbitrary value between 50nm, 80nm, 100nm, 250nm, 500nm, 800nm, 1 μm, 10 μm, 30 μm, 50 μm or aforementioned value),
Preferably 0.04-0.3 μm；In the present invention, in the thickness range, between PVD layers and noble metal matrix 1
In conjunction with stronger, and when detecting to objects made from precious metals, which will not influence noble metal matrix 1 itself
Quality.
According to the present invention, the color of the PVD layers can be single pure color or variegated；For example, can use
PVD deposits upper same single pure color, specifically, the PVD layers in the entire surface of noble metal matrix 1
Material can be the coloured metal oxide of common tool, metal nitride, metal carbides, metal fluoride, metal sulphur
Compound, metal boride, diamond-like carbon film-coating, such as：Ni,Ti,Zn,Cr,Mg,Nb,Sn,Al,In,Fe,Zr,Si,Cu,Ta,
Ge、Ag、Co、Au、Gd、La、Y、Ce、W、Hf、Mo、CrN、TiN、TiAlCN、TiCN、TiAlN、AlTiN、TiB2、ZrN、FeCo、
In AlSi, TiSi, CrSi, ZnAl, TiZn, TiAl, TiZr, TiSi, TiNi, NiAl, NiV, NiFe, gold copper and DLC
It is one or more, preferably gold copper；Wherein, DLC is the carbon film with amorphous structure.
In addition, in the present invention, PVD can also be used to deposit on the surface of noble metal matrix 1 variegated, and specifically, example
Such as, the surface portion of noble metal matrix 1 can be made into another color, CNC can also be passed through by the method for masking
The method of (Computer numerical control, numerically-controlled machine tool) or manual polishing polishing, by the noble metal matrix 1
Surface on the part colours that deposit remove so that a variety of different colors are presented in the surface of the noble metal matrix 1.
According to the present invention, the surface of the PVD layers can be plane or male and fomale(M&F), with show it is various not
Same pattern.
According to the present invention, the thickness of the water coating can be 0.05-50 μm, preferably 0.1-1.5 μm, more preferably
0.5-1.5μm；In the present invention, the thickness limit of the water coating can be increased into the glossiness of film layer in above range.Institute
The material for stating water coating can be gold copper, wherein in gold copper, the weight ratio of the content of Jin Hetong can be (85-
75)：(15-25), preferably 85：15 or 75：25.
According to the present invention, the thickness of the transparent film layer can be 0.0001-10 μm, preferably 0.0005-0.1 μm；?
In the present invention, under preferable case, the material of the transparent film layer can be fluoride；For example, for example, the fluoride can be
AF pill；In the present invention, AF pill can be commercially available, for example, AF pill can be purchased from the special electricity of producer Huizhou film U.S.
Sub- Technology Co., Ltd., model TS-2AB.
In the present invention, by the thickness of the material of the transparent film layer and the above-mentioned limited range of material, first is that energy
Enough making to be formed by film layer prevents from aoxidizing, and keeps it more stable, and another is to increase wearability, and the color to be formed can be made more to hold
It is colour-fast long.In the present invention, especially when being formed by film layer is rose golden, since used target contains copper,
It is easy to aoxidize, so, applying AF film on it can prevent from aoxidizing, and play a protective role.
According to the present invention, the thickness of the electrophoresis layer can be 0.1-20 μm, preferably 1-15 μm, more preferably 5-10 μ
m。
In the present invention, glossiness is surveyed using 60 degree of angle, the glossiness of the objects made from precious metals 1 can be 880-
950Gu, preferably 880-900Gu.In the present invention, Gu is the meaning of English gloss unit, 1 gloss unit=1Gu.
Second aspect of the present invention provides the preparation method of the aforementioned objects made from precious metals, wherein this method include with
Lower step：
(1) first layer 2 is formed on the surface of noble metal matrix 1；
(2) second layer 3 is deposited on the first layer 2 using physical vapour deposition (PVD)；
Wherein, using physical vapour deposition (PVD) noble metal matrix 1 surface deposits physical vapor deposition layer；It is plated using water
Technique forms water coating on the surface of noble metal matrix 1；Electrophoresis is formed on the surface of noble metal matrix 1 using electrophoresis process
Layer.
According to the present invention, the surface deposits in step (1), using physical vapour deposition (PVD) in noble metal matrix (1)
Physical vapor deposition layer, wherein the mode of the physical vapour deposition (PVD) is vacuum vapor plating, vacuum sputtering coating or vacuum ionic
Plated film；
Preferably, the mode of the physical vapour deposition (PVD) is vacuum ion membrane plating；
It is highly preferred that the step of vacuum ion membrane plating, includes：The noble metal matrix 1 is carried out under vacuum conditions
Heating starts metallic target, and injects gas, loads bias, carries out plated film on the surface of the noble metal matrix 1；
It wherein, is 1 × 10 in vacuum degree-2Pa to 9.5 × 10-3Under the vacuum condition of Pa, heating temperature is 50-260 DEG C,
Temperature can have an impact the binding force and color of coating and noble metal matrix 1, especially when producing rose golden, general furnace
Interior heating temperature is 100-250 DEG C, preferably 200 DEG C.
Wherein, plated film time 2-2000min, in the present invention, sedimentation time is according to target and to be plated color different
Sample, plated film time can be different, and target divides arc target, column target, three kinds of horizontal target, and arc target ion particle is most thick, secondly horizontal target, column target from
Sub- particle is most thin, so the coloring of arc target is fast, secondly horizontal target, column target are coloured slowly, and by taking rose golden as an example, the plated film time of arc target exists
10min or so, the plated film time of column target is in 20-30min, in addition, illusion-colour plated film time 10min or so, purple plated film time is most
It is short, it is 2-3min, so plating purple color difference is big, color is unstable.
Wherein, metal used by the metallic target be selected from nickel, zinc, magnesium, tin, iron, chromium, silicon, copper, titanium, zirconium, molybdenum, tungsten,
Aluminium, niobium, indium, tantalum, germanium, silver, gold, cobalt, gadolinium, lanthanum, yttrium, cerium, hafnium, tungsten, stainless steel and its alloy or oxide, nitride, carbon
At least one of compound, fluoride, sulfide, gold copper and boride；Preferably gold copper.
Wherein, the gas includes protective gas and toning gas, and the protective gas is inert gas, the toning gas
Body is selected from one of nitrogen, acetylene, methane and oxygen or a variety of；In the case of in the present invention, it is preferred to, argon gas is as protection gas
Body, argon gas are used to adjust vacuum degree, and the gas flow of the protective gas is 20-200sccm, preferably 20-150sccm；?
In the present invention, under preferable case, nitrogen, acetylene, methane or oxygen are used to adjust color, the gas stream for being used to adjust color
Amount is 50-500sccm；In the present invention, the gas flow rate of nitrogen, acetylene, methane or oxygen can have an impact to color.
Wherein, the load bias is 10-150V, duty ratio 10-80%.In the present invention, " duty ratio " refers to one
The ratio of pulse occupies in section stream time time and total time.In the present invention, under normal circumstances, bias is higher,
Brightness is bigger, but is more than certain value, and objects made from precious metals edge can turn to be yellow；Therefore, load bias is limited to above range, imitated
Fruit is best.
Wherein, the target current of the metallic target is：Column target 3-120A, preferably 10-120A, more preferably 20-120A,
Arc target 50-200A；In the present invention, electric current is bigger, and ion particles can be thicker, causes the electroplating surface layer of objects made from precious metals more dim
Moon bright, that is, glossiness is bad, and especially influence of the electric current of arc target to glossiness is maximum, influence of the electric current of column target to glossiness
Dynamics is slightly poorer, and suitable electric current is critically important for coating glossiness, therefore, target current is limited to above range, effect
It is best.
According to the present invention, according to vacuum sputtering coating, noble metal matrix 1 is 1 × 10 in vacuum degree-2Pa to 7 × 10- 3100-250 DEG C is heated under conditions of Pa, plating metal target removes surface film oxide.Under conditions of plasma, argon gas electricity
Positive ion bombardment target material surface from rear formation, using magnetron sputtering in noble metal matrix surface plated film, sputtering voltage selection
300-700V, plating metal form film in noble metal matrix surface.
According to the present invention it is possible to be carried out according to color shown by final objects made from precious metals to select metallic target and protection gas
Body；For example, by taking objects made from precious metals shows rose golden as an example, metallic target can be able to be for golden copper target or TiAl column target, gas
Nitrogen.Specifically, it can be specifically described in embodiment.
According to the present invention, in step (1), this method further includes the surface deposits qi-regulating phase in noble metal matrix 1
Vacuum is carried out before sedimentary, wherein the vacuum degree according to the requirement of plated film color and target, in vacuum
It is 1 × 10-2Pa to 7 × 10-3Pa, this process are to guarantee that vacuum environment is clean in furnace, and furnace inner environment is made to be suitble to vacuum sputtering plating
Film；According to the difference of prepared noble metal products, vacuum level requirements are different in furnace, and the pumpdown time is generally small in 0.5-2
When.
According to the present invention, in step (1), water coating is formed on the surface of noble metal matrix (1) using water depositing process,
Wherein, the water plating solution in the water depositing process is not particularly limited, and can be this field conventional selection, for example, can choose gold
Copper alloy, wherein the weight ratio of the content of Jin Hetong can be (85-75)：(15-25), preferably 85：15 or 75：25；Water
Plating electric current is 0.5-0.9A, preferably 0.7-0.8A；Temperature is 50-80 DEG C, preferably 65-75 DEG C；The water plating time is 1-5min,
Preferably 2-3min.In the present invention, the term restriction water plated is above range, is capable of forming defined by the present invention
The thickness of water coating.
Specifically, the technique of water plating includes：First upper to hang, then product surface cleans, water plating.
According to the present invention, in step (1), electrophoresis layer is formed on the surface of noble metal matrix (1) using electrophoresis process,
Wherein, the condition of the electrophoresis includes：DC voltage is 100-200V, electro coat 3-10min, is 120-250 DEG C in temperature
Lower baking 10-30min.In the present invention, the material of electrophoresis is not particularly limited, for example, can be paint, specifically, the oil
The component of paint can contain one of water-soluble resin, pigment, filler, auxiliary agent, solvent and neutralizer or a variety of.
Specifically, electrophoresis process includes：It is first upper to hang, it is surface-treated (surface cleaning oil removing), then (1-2 points of electrophoretic paint
Clock), it cleans (the residual electrophoretic paint for rinsing out excess surface), baking.
According to the present invention, in step (2), the mode of the physical vapour deposition (PVD) is vacuum vapor plating, vacuum sputtering
Plated film or vacuum ion membrane plating；
Preferably, the mode of the physical vapour deposition (PVD) is vacuum vapor plating；
Preferably, the mode of the vacuum vapor plating includes：Evaporation ource electric current is opened, fluoride is evaporated, is formed transparent
Film layer；
Preferably, the mode of the vacuum vapor plating includes：It is evaporated under conditions of evaporating ource electric current and being 700-750A
170-190s；170-190s is evaporated under conditions of evaporating ource electric current and being 750-800A again；It then is 800- in evaporation ource electric current
410-430s is evaporated under conditions of 900A.
In addition, carrying out the vacuum vapor plating at normal temperature, vacuum degree is 3 × 10-1Pa to 6 × 10-1Pa, argon flow
For 50-60sccm, oxygen flow 70-80sccm, load bias is 30-40V, duty ratio 30-40%, time 20-
30min；Target is aluminium target, silicon target, when aluminium target, electric current 2-3A, and when selecting silicon target, electric current 2-3A.
According to the present invention, in step (1) and/or step (2), it is clear that aura is carried out before the physical vapour deposition (PVD)
It washes, wherein the condition of aura cleaning includes：Argon flow is 100-320sccm, preferably 280-320sccm, and load is inclined
Pressure is 380-1000V, preferably 380-420V, duty ratio 10-80%, preferably 48-52%, and time 160-720s is excellent
It is selected as 160-200s.
According to the present invention, clear the method also includes carrying out the surface of the noble metal matrix 1 before step (1)
It washes.
In the present invention, different according to the surface texture of noble metal matrix 1, area and clean-up performance, it selects different clear
Wash mode.Under normal conditions, the mode of cleaning can there are two types of.
The first：By noble metal matrix 1 under conditions of 20-30kHz supersound washing 1-15min；In the present invention, it needs
Illustrate, the ultrasonic cleaning time can be extended in special circumstances, to carry out after the completion of ultrasonic cleaning clear water clean 6 times with
On, removal surface cleaning agent residual after the completion of cleaning, need to carry out drying and processing to be dehydrated baking.
Second：The surface of noble metal matrix 1 is clean, non-oxidation layer, and the wine of 95-98 weight % can be directly dipped in non-dust cloth
Smart wiped clean surface is not necessarily to ultrasonic cleaning.
In the present invention, the mode of cleaning can be the first or second, and under preferable case, the mode of cleaning can be with
For the first and second.
In the present invention, noble metal matrix 1 carries out ultrasonic treatment and/or ethanol wash in the above conditions, can be into one
Step improves the binding force of PVD layers and noble metal matrix 1；It and in a relatively short period of time, can be in noble metal matrix table
The film layer that face is formed with a thickness of 10nm-50 μm, it is more stable to be formed by film layer.
According to the present invention, the method also includes drying to the noble metal matrix 1 after ultrasonic treatment, drying temperature is
100-150 DEG C, drying time 5-30min.
Wherein, there is no particular limitation for the surface treatment method of noble metal matrix 1, can be using physics polishing or chemistry
The method of corrosion, as long as the surface roughness that can be realized noble metal matrix 1 is 0.001-50 μm, preferably 0.005-0.1 μm
Condition.
The present invention will be described in detail by way of examples below.
In the following Examples and Comparative Examples：
Glossiness：Using the glossiness of objects made from precious metals at 60 degree of LS192 glossiness instrument test.
Wearability：The WS-97 coating adhesion scratch tester pair that Ke Kaihua Science and Technology Development Co., Ltd. researches and develops in
Objects made from precious metals carries out scratch test.The scratch test scriber top with smooth circular cone, is portrayed in the case where gradually increasing load
Coating surface, until coating is destroyed, when breakdown of coating, added load was critical load, and attached in this, as coating and matrix
The measurement of intensity.Loading speed is set as 10N/min, loaded load 30N, scratch speed is 2mm/min, and scratch length is
5mm。
Embodiment 1
The present embodiment is the pure gold product using the coffee-like plating TiAlN film of method preparation of the invention.
(1) pre-treatment
Select noble metal matrix 1：Select pure gold as noble metal matrix 1, surface roughness is 0.02 μm；
Cleaning：The pure gold is cleaned by ultrasonic 10min using distilled water under conditions of 20kHz, the pure gold after cleaning is 150
30min is dried at DEG C, dips in the alcohol wipe clean surface of 98 weight % using non-dust cloth later；
It is vacuumized in furnace：Pure gold after drying is put in vacuum drying oven, adjustment vacuum degree is 3 × 10-3Pa, to guarantee in furnace
Vacuum environment is clean, and furnace inner environment is made to be suitble to be electroplated；
(2) PVD layers are deposited
Aura cleaning：It is 300sccm in argon flow, load bias is 400V, and duty ratio 50%, the time is 400s's
Under the conditions of carry out aura cleaning；
Then, in-furnace temperature is adjusted to 200 DEG C, starts TiAl column target, wherein Ti/Al atomic ratio is 7：3, target current
For 25A；Injection protection gas argon gas, gas flow 130sccm inject nitrogen, and gas flow 150sccm adjusts vacuum degree
It is 3.0 × 10-1Pa loads bias 100V, and duty ratio 50% deposits 30min, and coffee-like TiAlN is formed on pure gold surface
Film, with a thickness of 0.3 μm；
(3) transparent film layer
The pure gold that surface is coated with PVD layers is put in vacuum drying oven, normal by the way of vacuum vapor plating
Temperature is lower to carry out plated film, wherein adjustment vacuum degree is 2.0 × 10-2Pa makes furnace inner environment be suitble to be electroplated, and injects argon gas, argon institute flow
For 60sccm, adjustment vacuum degree is 1.5 × 10 ° of Pa, and aura cleans 180s, injects oxygen, oxygen flow 80sccm, adjustment is very
Reciprocal of duty cycle is 4.0 × 10-Aluminium target 90s, silicon target 180s is respectively started in 1Pa, is then shut off aluminium target, silicon target power supply, starting evaporation source electricity
Source, silicon target electric current are 3A；180s is evaporated under conditions of evaporating ource electric current and being 720A；The condition for being again 780A in evaporation ource electric current
Lower evaporation 180s；Then 420s is evaporated under conditions of evaporating ource electric current and being 850A；Form the transparent film layer with a thickness of 0.05 μm.
The objects made from precious metals of preparation is denoted as S1 (structure is as shown in Figure 1), and it is tested for the property, as a result such as table 1
It is shown.
Embodiment 2
The present embodiment is to prepare the pure gold product of the plating CrN film of grey black using method of the invention.
(1) pre-treatment
Select noble metal matrix 1：Select pure gold as noble metal matrix 1, surface roughness is 0.05 μm；
Cleaning：The pure gold is cleaned by ultrasonic 5min using distilled water under conditions of 30kHz, the pure gold after cleaning is 150
30min is dried at DEG C, dips in the alcohol wipe clean surface of 98 weight % using non-dust cloth later；
It is vacuumized in furnace：Pure gold after drying is put in vacuum drying oven, adjustment vacuum degree is 3 × 10-3Pa, by in-furnace temperature
It is adjusted to 200 DEG C；
(2) PVD layers are deposited
Aura cleaning：It is 300sccm in argon flow, load bias is 400V, and duty ratio 50%, the time is 400s's
Under the conditions of carry out aura cleaning；
Then, start high-purity intermediate frequency chromium arc target, target current 100A；Nitrogen is injected, institute's body flow is 230sccm, is adjusted
Whole vacuum degree is 3 × 10-1Pa loads bias 100V, and duty ratio 50% deposits 5min, forms grey black on pure gold surface
CrN film, with a thickness of 0.15 μm；
(3) transparent film layer
The pure gold that surface is coated with PVD layers is put in vacuum drying oven, is plated by the way of vacuum vapor plating
Film forms the transparent film layer with a thickness of 0.001 μm.
The objects made from precious metals of preparation is denoted as S2, and it is tested for the property, the results are shown in Table 1.
Embodiment 3
The present embodiment is to prepare the pure gold product of the plating DLC film of black using method of the invention.
(1) pre-treatment
Select noble metal matrix 1：Select pure gold as noble metal matrix 1, surface roughness is 0.2 μm；
Cleaning：The pure gold is cleaned by ultrasonic 10min using distilled water under conditions of 25kHz, the pure gold after cleaning is 150
30min is dried at DEG C, dips in the alcohol wipe clean surface of 98 weight % using non-dust cloth later；
It is vacuumized in furnace：Pure gold after drying is put in vacuum drying oven, adjustment vacuum degree is 3 × 10-3Pa, to guarantee in furnace
Vacuum environment is clean, and furnace inner environment is made to be suitble to be electroplated；
(2) PVD layers are deposited
Aura cleaning：It is 300sccm in argon flow, load bias is 400V, and duty ratio 50%, the time is 400s's
Under the conditions of carry out aura cleaning；
Then, in-furnace temperature being adjusted to 200 DEG C, starts chromium target column target, target current 20A, gas argon gas is protected in injection,
Gas flow is 130sccm, injects acetylene gas, and gas flow 200sccm loads bias 50V, and duty ratio 50% is sunk
Product 50min forms the film layer of black on pure gold surface, with a thickness of 0.5 μm.It is then turned off chromium target column target power supply, injects acetylene gas
Body, gas flow 200sccm load bias 1000V, and duty ratio 80% deposits 5h, form DLC film on pure gold surface, thick
Degree is 0.1 μm.
(3) transparent film layer
The pure gold that surface is coated with PVD layers is put in vacuum drying oven, is plated by the way of vacuum vapor plating
Film forms the transparent film layer with a thickness of 0.01 μm.
The objects made from precious metals of preparation is denoted as S3, and it is tested for the property, the results are shown in Table 1.
Embodiment 4
The present embodiment is the pure gold product using the golden yellow plating TiN film of method preparation of the invention.
(1) pre-treatment
Select noble metal matrix 1：Select pure gold as noble metal matrix 1, surface roughness is 0.03 μm；
Cleaning：The pure gold is cleaned by ultrasonic 10min using distilled water under conditions of 25kHz, the pure gold after cleaning is 150
30min is dried at DEG C, dips in the alcohol wipe clean surface of 98 weight % using non-dust cloth later；
It is vacuumized in furnace：Pure gold after drying is put in vacuum drying oven, adjustment vacuum degree is 3 × 10-3Pa, to guarantee in furnace
Vacuum environment is clean, and furnace inner environment is made to be suitble to be electroplated；
(2) PVD layers are deposited
Aura cleaning：It is 300sccm in argon flow, load bias is 400V, and duty ratio 50%, the time is 400s's
Under the conditions of carry out aura cleaning；
Then, start Ti column target, target current 20A.Injection protection gas argon gas, gas flow 130sccm inject nitrogen
Gas, gas flow 200sccm, adjustment vacuum degree are 5 × 10-1Pa.Bias 100V is loaded, duty ratio 50% deposits 30min,
Golden yellow TiN film is formed, on pure gold surface with a thickness of 0.2 μm.
(3) transparent film layer
The pure gold that surface is coated with PVD layers is put in vacuum drying oven, is plated by the way of vacuum vapor plating
Film forms the transparent film layer with a thickness of 0.01 μm.
The objects made from precious metals of preparation is denoted as S4, and it is tested for the property, the results are shown in Table 1.
Embodiment 5
The present embodiment is the 18k gold objects made from precious metals using the coffee-like plating TiAlN film of method preparation of the invention.
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：Pure gold is replaced with
18k gold.
The objects made from precious metals of preparation is denoted as S5, and it is tested for the property, the results are shown in Table 1.
Embodiment 6
The present embodiment is to prepare the partially red pure gold objects made from precious metals of rose gold using method of the invention.
(1) pre-treatment
Select noble metal matrix 1：Select pure gold as noble metal matrix 1, surface roughness is 0.02 μm；
Cleaning：The pure gold is cleaned by ultrasonic 10min using distilled water under conditions of 25kHz, the pure gold after cleaning is 150
30min is dried at DEG C, dips in the alcohol wipe clean surface of 98 weight % using non-dust cloth later；
It is vacuumized in furnace：Pure gold after drying is put in vacuum drying oven, adjustment vacuum degree is 3 × 10-3Pa, to guarantee in furnace
Vacuum environment is clean, and furnace inner environment is made to be suitble to be electroplated；
(2) PVD layers are deposited
Aura cleaning：It is 300sccm in argon flow, load bias is 400V, and duty ratio 50%, the time is 400s's
Under the conditions of carry out aura cleaning；
Then, in-furnace temperature is adjusted to 200 DEG C, starts golden copper target column target, gold/copper atom ratio is 75:25, target current
For 3A.Injection protection gas argon gas, gas flow 130sccm, adjustment vacuum degree are 3 × 10-1Pa.Load bias 100V, duty
Than being 50%, 20min is deposited, the partially red film layer of rose gold is formed on pure gold surface, with a thickness of 0.1 μm.
(3) transparent film layer
The pure gold that surface is coated with PVD layers is put in vacuum drying oven, is plated by the way of vacuum vapor plating
Film forms the transparent film layer with a thickness of 0.01 μm.
The objects made from precious metals of preparation is denoted as S6, and it is tested for the property, the results are shown in Table 1.
Embodiment 7
The present embodiment is to prepare the partially purple pure gold objects made from precious metals of rose gold using method of the invention.
According to method same as Example 6 pure gold overlay coating, institute the difference is that：In step (2), starting
TiAl column target, wherein Ti/Al atomic ratio is 7:3, target current 20A.Injection protection gas argon gas, gas flow 130sccm,
Nitrogen, gas flow 200sccm are injected, adjustment vacuum degree is 5.0 × 10-1Pa, load bias 100V, duty ratio 50%,
30min is deposited, the film layer of the inclined purple of rose gold is formed on pure gold surface, with a thickness of 0.3 μm.
The objects made from precious metals of preparation is denoted as S7, and it is tested for the property, the results are shown in Table 1.
Embodiment 8
The present embodiment is to prepare the partially yellow pure gold objects made from precious metals of rose gold using method of the invention.
According to method same as Example 6 pure gold overlay coating, institute the difference is that：In step (2), starting
TiAl column target, wherein Ti/Al atomic ratio is 8:2, target current 20A.Injection protection gas argon gas, gas flow 130sccm,
Adjusting vacuum degree is 5.0 × 10-1Pa injects nitrogen, and gas flow 100sccm loads bias 100V, and duty ratio 50% is sunk
Product 30min forms the film of the inclined yellow of rose gold on pure gold surface, with a thickness of 0.3 μm.
The objects made from precious metals of preparation is denoted as S8, and it is tested for the property, the results are shown in Table 1.
Embodiment 9
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：In step (2), do not have
PVD layers are formed, but form water coating, wherein the condition for forming the water coating includes：It is first upper to hang, it will be through step
Suddenly the product surface of (1) is cleaned, and then uses water plating material for golden copper, and the weight ratio of the content of Jin Hetong is 75：25,
It is golden copper that water, which plates material, and the ratio of the content of Jin Hetong is 75：25, water plate electric current be 0.8A, temperature be 70 DEG C, water plating the time be
2min。
The objects made from precious metals of preparation is denoted as S9, and it is tested for the property, the results are shown in Table 1.
Embodiment 10
The present embodiment is to prepare the pure gold objects made from precious metals of purple using method of the invention.
According to method same as Example 6 pure gold overlay coating, institute the difference is that：In step (2), by furnace
Interior temperature is adjusted to 200 DEG C, starts Ti target arc target, target current 100A, and gas argon gas is protected in injection, and gas flow is
130sccm, adjustment vacuum degree are 2.0 × 10-1Pa, injects oxygen, and gas flow 100sccm loads bias 100V, duty ratio
50%, 3min is deposited, forms the film with a thickness of 0.1 μm on pure gold surface.
The objects made from precious metals of preparation is denoted as S10, and it is tested for the property, the results are shown in Table 1.
Embodiment 11
The present embodiment is to prepare violaceous pure gold objects made from precious metals using method of the invention.
According to method same as Example 6 pure gold overlay coating, institute the difference is that：In step (2), by furnace
Interior temperature is adjusted to 260 DEG C, starts TiAL target arc target, and wherein Ti/Al atomic ratio is 7:3, target current 90A inject nitrogen,
Gas flow is 240sccm, and adjustment vacuum degree is 6.0 × 10-1Pa loads bias 120V, and duty ratio 40% deposits 20min,
The film that pure gold surface is formed with a thickness of 0.3 μm.
The objects made from precious metals of preparation is denoted as S11, and it is tested for the property, the results are shown in Table 1.
Embodiment 12
The present embodiment is to prepare the pure gold objects made from precious metals of champagne gold using method of the invention.
According to method same as Example 6 pure gold overlay coating, institute the difference is that：In step (2), by furnace
Interior temperature is adjusted to 200 DEG C, starts Ti target arc target, target current 80A, and gas argon gas is protected in injection, and gas flow is
130sccm, adjustment vacuum degree are 3.0 × 10-1Pa, injects nitrogen, and gas flow 100sccm loads bias 80V, duty ratio
60%, 5min is deposited, forms the film with a thickness of 0.1 μm on pure gold surface.
The objects made from precious metals of preparation is denoted as S12, and it is tested for the property, the results are shown in Table 1.
Embodiment 13
The present embodiment is to prepare the pure gold objects made from precious metals of illusion-colour color using method of the invention.
According to method same as Example 6 pure gold overlay coating, institute the difference is that：In step (2), by furnace
Interior temperature is adjusted to 150 DEG C, starts Ti target arc target, target current 100A, and gas argon gas is protected in injection, and gas flow is
130sccm adjusts vacuum degree 3.0 × 10-1Pa, injects oxygen, and gas flow 100sccm loads bias 100V, duty ratio
50%, 10min is deposited, forms the film with a thickness of 0.2 μm on pure gold surface.
The objects made from precious metals of preparation is denoted as S13, and it is tested for the property, the results are shown in Table 1.
Embodiment 14
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：The rough surface of pure gold
Degree is 0.008 μm.
The objects made from precious metals of preparation is denoted as S14, and it is tested for the property, the results are shown in Table 1.
Embodiment 15
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：The rough surface of pure gold
Degree is 1 μm.
The objects made from precious metals of preparation is denoted as S15, and it is tested for the property, the results are shown in Table 1.
Embodiment 16
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：Item of the pure gold in 5kHz
It is cleaned by ultrasonic 10min under part.
The objects made from precious metals of preparation is denoted as S16, and it is tested for the property, the results are shown in Table 1.
Embodiment 17
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：Pure gold is 50kHz's
Under the conditions of be cleaned by ultrasonic 10min.
The objects made from precious metals of preparation is denoted as S17, and it is tested for the property, the results are shown in Table 1.
Embodiment 18
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：After to cleaning
Pure gold carries out drying and processing.
The objects made from precious metals of preparation is denoted as S18, and it is tested for the property, the results are shown in Table 1.
Embodiment 19
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：The sedimentary of formation
With a thickness of 5nm, water coating with a thickness of 0.01 μm, transparent film layer with a thickness of 0.15 μm.
The objects made from precious metals of preparation is denoted as S19, and it is tested for the property, the results are shown in Table 1.
Embodiment 20
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：In step (4), shape
At the fluoride transparent film layer with a thickness of 0.001 μm.
The objects made from precious metals of preparation is denoted as S20, and it is tested for the property, the results are shown in Table 1.
Embodiment 21
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：In step (2), Ti/
Al atomic ratio is 6:4, target current 10A；Injection protection gas argon gas, gas flow 600sccm inject nitrogen, gas stream
Amount is 600sccm, and adjustment vacuum degree is 3.5 × 10-1Pa loads bias 200V, duty ratio 90%.
The objects made from precious metals of preparation is denoted as S21, and it is tested for the property, the results are shown in Table 1.
Embodiment 22
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：Form the water coating
Condition include：It is 1.0A that water, which plates electric current, and temperature is 90 DEG C, and water plates the time as 6min.
The objects made from precious metals of preparation is denoted as S22, and it is tested for the property, the results are shown in Table 1.
Embodiment 23
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：Step is being steamed in (4)
The electric current that rises evaporates 200s under conditions of being 600A；200s is evaporated under conditions of evaporating ource electric current and being 700A again；Then it is steaming
The electric current that rises evaporates 300s under conditions of being 750A.
The objects made from precious metals of preparation is denoted as S23, and it is tested for the property, the results are shown in Table 1.
Embodiment 24
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：In step (2), do not have
PVD layers are formed, but form electrophoresis layer, wherein the condition for forming the electrophoresis layer includes：DC voltage is
150V, electro coat 5min.
The objects made from precious metals of preparation is denoted as S24, and it is tested for the property, the results are shown in Table 1.
Embodiment 25
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：In step (2), do not have
PVD layers are formed, but form water coating, wherein the condition for forming the water coating includes：Using water depositing process
It is 0.8A in water plating electric current, temperature is 70 DEG C, and water plates the time as 2min, forms the water coating with a thickness of 1.0 μm；
The objects made from precious metals of preparation is denoted as S25, and it is tested for the property, the results are shown in Table 1.
Comparative example 1
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：In step (2), to foot
Gold carries out copper plating treatment, and the pH of copper-contained electroplating liquid is 0.1, and electroplating temperature is 25 DEG C, cathode-current density 4A/dm2, plating
1h forms the layers of copper with a thickness of 800 microns on pure gold surface.
The objects made from precious metals of preparation is denoted as DS1, and it is tested for the property, the results are shown in Table 1.
Comparative example 2
In the same manner as shown in Example 1 in the overlay coating of pure gold, institute the difference is that：Using aluminium alloy as base
Body.
The objects made from precious metals of preparation is denoted as DS2, and it is tested for the property, the results are shown in Table 1.
Table 1
| Serial number | Glossiness (Gu) | Wearability (N) |
| S1 | 897 | 21 |
| S2 | 915 | 21.8 |
| S3 | 886 | 19.4 |
| S4 | 865 | 21.9 |
| S5 | 860 | 25.7 |
| S6 | 923 | 25.4 |
| S7 | 909 | 24.9 |
| S8 | 905 | 21.2 |
| S9 | 870 | 23.8 |
| S10 | 875 | 24.3 |
| S11 | 872 | 26.4 |
| S12 | 880 | 23.7 |
| S13 | 885 | 23.6 |
| S14 | 850 | 21.1 |
| S15 | 763 | 20.9 |
| S16 | 798 | 20.8 |
| S17 | 785 | 20.4 |
| S18 | 836 | 20.8 |
| S19 | 840 | 18.9 |
| S20 | 861 | 20.1 |
| S21 | 850 | 19.5 |
| S22 | 845 | 19.6 |
| S23 | 857 | 19.9 |
| S24 | 865 | 19.2 |
| S25 | 900 | 19.3 |
| DS1 | 833 | 17.8 |
| DS2 | 806 | 18.2 |
As the result of table 1 can be seen that using objects made from precious metals surface made from above method be formed by film layer compared with
It is thin, different colors can be presented.Through the above technical solutions, being surface-treated in advance to noble metal matrix, improve noble metal base
Then the roughness in body surface face forms PVD layers in noble metal matrix surface plated film using PVD, can form color
Film layer abundant, improves the single gold of noble metal matrix, and the change of the color will not influence the quality of noble metal matrix；Or
Water coating is formed on the noble metal matrix using water depositing process, increases the brightness of film layer；Or existed using electrophoresis process
Electrophoresis layer is formed on noble metal matrix, to increase the thickness of objects made from precious metals；And again using PVD in PVD layers
On, transparent film layer is perhaps deposited on water coating or over the electrophoretic layer, it is more stable to make to be formed by film layer, increases
Wearability, and the color to be formed can be made more longlasting colour-fast.
Embodiment 26-50 and comparative example 3-4
Objects made from precious metals is prepared according to the method for embodiment 1-25 and comparative example 1-2 respectively, unlike, respectively using silver
(silver content is by 92.5 weight %) replace noble metal, and the performance test results are shown in Table 2.
Table 2
| Serial number | Glossiness (Gu) | Wearability (N) |
| S26 | 893 | 21 |
| S27 | 915 | 21.8 |
| S28 | 886 | 19.4 |
| S29 | 865 | 21.9 |
| S30 | 860 | 25.7 |
| S31 | 923 | 25.4 |
| S32 | 909 | 24.9 |
| S33 | 905 | 21.2 |
| S34 | 870 | 23.8 |
| S35 | 875 | 24.3 |
| S36 | 872 | 26.4 |
| S37 | 880 | 23.7 |
| S38 | 885 | 23.6 |
| S39 | 850 | 21.1 |
| S40 | 763 | 20.9 |
| S41 | 798 | 20.8 |
| S42 | 785 | 20.4 |
| S43 | 836 | 20.8 |
| S44 | 840 | 18.9 |
| S45 | 861 | 20.1 |
| S46 | 850 | 19.5 |
| S47 | 845 | 19.6 |
| S48 | 857 | 19.9 |
| S49 | 865 | 19.2 |
| S50 | 900 | 19.3 |
| DS3 | 833 | 17.8 |
| DS4 | 806 | 18.2 |
As the result of table 2 can be seen that using objects made from precious metals surface made from above method be formed by film layer compared with
It is thin, different colors can be presented.Through the above technical solutions, being surface-treated in advance to noble metal matrix, improve noble metal base
Then the roughness in body surface face forms PVD layers in noble metal matrix surface plated film using PVD, can form color
Film layer abundant, improves the single gold of noble metal matrix, and the change of the color will not influence the quality of noble metal matrix；Or
Water coating is formed on the noble metal matrix using water depositing process, increases the brightness of film layer；Or existed using electrophoresis process
Electrophoresis layer is formed on noble metal matrix, to increase the thickness of objects made from precious metals；And again using PVD in PVD layers
On, transparent film layer is perhaps deposited on water coating or over the electrophoretic layer, it is more stable to make to be formed by film layer, increases
Wearability, and the color to be formed can be made more longlasting colour-fast.
The preferred embodiment of the present invention has been described above in detail, and still, the present invention is not limited thereto.In skill of the invention
In art conception range, can with various simple variants of the technical solution of the present invention are made, including each technical characteristic with it is any its
Its suitable method is combined, and it should also be regarded as the disclosure of the present invention for these simple variants and combination, is belonged to
Protection scope of the present invention.
Claims (12)
1. a kind of objects made from precious metals, which is characterized in that the objects made from precious metals includes：Noble metal matrix (1) and it is in turn attached to institute
State the first layer (2) and the second layer (3) on noble metal matrix (1)；Wherein, the first layer (2) is PVD layers, water
Any one in coating and electrophoresis layer, the second layer (3) are transparent film layer, and the noble metal is gold or silver.
2. objects made from precious metals according to claim 1, wherein the content of gold is 33-99.99 weight in the gold
Measure %, preferably 99-99.99 weight %；Silver-colored content is 92.5-99 weight % in the silver；
Preferably, the surface roughness of the noble metal matrix (1) is 0.001-50 μm, preferably 0.005-0.1 μm.
3. objects made from precious metals according to claim 1, wherein the PVD layers with a thickness of 10nm-50 μm；
Preferably, the material of the PVD layers be Ni, Ti, Zn, Cr, Mg, Nb, Sn, Al, In, Fe, Zr, Si, Cu,
Ta、Ge、Ag、Co、Au、Gd、La、Y、Ce、W、Hf、Mo、CrN、TiN、TiAlCN、TiCN、TiAlN、AlTiN、TiB2、ZrN、
FeCo, AlSi, TiSi, CrSi, ZnAl, TiZn, TiAl, TiZr, TiSi, TiNi, NiAl, NiV, NiFe, gold copper and DLC
One of or it is a variety of；Preferably gold copper；
Preferably, the color of the PVD layers is single pure color or variegated；
Preferably, the surface of the PVD layers is plane or male and fomale(M&F).
4. objects made from precious metals according to claim 1, wherein the water coating with a thickness of 0.05-50 μm, preferably
0.1-1.5μm；The material of the water coating is gold copper.
5. objects made from precious metals according to claim 1, wherein the transparent film layer with a thickness of 0.0001-10 μm, preferably
0.0005-0.1 μm of ground；
Preferably, the material of the transparent film layer is fluoride；
Preferably, the fluoride is AF pill.
6. objects made from precious metals according to claim 1, wherein the electrophoresis layer with a thickness of 0.1-20 μm.
7. the preparation method of objects made from precious metals described in any one of claim 1-6, which is characterized in that this method include with
Lower step：
(1) first layer (2) are formed on the surface of noble metal matrix (1)；
(2) second layer (3) is deposited on the first layer (2) using physical vapour deposition (PVD)；
Wherein, using physical vapour deposition (PVD) noble metal matrix (1) surface deposits physical vapor deposition layer；Work is plated using water
Skill forms water coating on the surface of noble metal matrix (1)；Electricity is formed on the surface of noble metal matrix (1) using electrophoresis process
Swimming layer.
8. according to the method described in claim 7, wherein, in step (1), using physical vapour deposition (PVD) in noble metal matrix
(1) surface deposits physical vapor deposition layer, wherein the mode of the physical vapour deposition (PVD) is vacuum vapor plating, vacuum
Sputter coating or vacuum ion membrane plating；
Preferably, the mode of the physical vapour deposition (PVD) is vacuum ion membrane plating；
It is highly preferred that the step of vacuum ion membrane plating, includes：The noble metal matrix (1) is added under vacuum conditions
Heat starts metallic target, and injects gas, loads bias, carries out plated film on the surface of the noble metal matrix (1)；
It wherein, is 1 × 10 in vacuum degree-2Pa to 9.5 × 10-1Under the vacuum condition of Pa, heating temperature is 50-260 DEG C, when plated film
Between be 2-2000min；
Wherein, metal used by the metallic target be selected from nickel, zinc, magnesium, tin, iron, chromium, silicon, copper, titanium, zirconium, molybdenum, tungsten, aluminium, niobium,
Indium, tantalum, germanium, silver, gold, cobalt, gadolinium, lanthanum, yttrium, cerium, hafnium, tungsten, stainless steel and its alloy or oxide, nitride, carbide, fluorine
At least one of compound, sulfide, gold copper and boride；Preferably gold copper；
Wherein, the gas includes protective gas and toning gas, and the protective gas is inert gas, the toning gas choosing
From one of nitrogen, acetylene, methane and oxygen or a variety of；Wherein, the gas flow of the protective gas is 20-200sccm；
The gas flow of the toning gas is 50-500sccm；
Wherein, the load bias is 10-150V, duty ratio 10-80%；
Wherein, the target current of the metallic target is：Column target 3-120A, arc target 50-200A；
Preferably, in step (1), the surface deposits qi-regulating using physical vapour deposition (PVD) in noble metal matrix (1) is mutually sunk
It further include carrying out vacuum before the surface deposits physical vapor deposition layer of noble metal matrix (1) when lamination,
In, the vacuum degree in vacuum is 1.0 × 10-2Pa to 7.0 × 10-3Pa。
9. according to the method described in claim 7, wherein, in step (2), using water depositing process in noble metal matrix (1)
Water coating is formed on surface, wherein the condition of water plating includes：It is 0.5-0.9A that water, which plates electric current, and temperature is 50-80 DEG C, water
The plating time is 1-30min；
Preferably, in step (2), electrophoresis layer is formed on the surface of noble metal matrix (1) using electrophoresis process, wherein institute
The condition for stating electrophoresis includes：The electrophoresis includes ability cathode electrophoresis and anodic electrophoresis, DC voltage 100-200V, electrophoresis 1-
10min。
10. according to the method described in claim 7, wherein, in step (2), the mode of the physical vapour deposition (PVD) is vacuum
Evaporation coating, vacuum sputtering coating or vacuum ion membrane plating；
Preferably, the mode of the physical vapour deposition (PVD) is vacuum vapor plating；
Preferably, the mode of the vacuum vapor plating includes：Evaporation ource electric current is opened, fluoride is evaporated, forms transparent film layer；
Preferably, the mode of the vacuum vapor plating includes：170- is evaporated under conditions of evaporating ource electric current and being 700-750A
190s；170-190s is evaporated under conditions of evaporating ource electric current and being 750-800A again；Then re-evaporation ource electric current is 800-900A
Under conditions of evaporate 410-430s.
11. according to the method described in claim 7, wherein, in step (1) and/or step (2), sinking in the physical vapor
Aura cleaning is carried out before product, wherein the condition of aura cleaning includes：Argon flow is 100-320sccm, loads bias
For 380-1000V, duty ratio 10-80%, time 160-720s.
12. according to the method described in claim 7, wherein, the method also includes before step (1) by the noble metal base
The surface of body (1) is cleaned, and the mode of cleaning is：By noble metal matrix (1) under conditions of 20-30kHz supersound washing 1-
15min, and/or, cleaning is wiped using the alcohol that non-dust cloth dips in 95-98 weight %；
Preferably, the method also includes being dried to the noble metal matrix (1) after ultrasonic treatment, drying temperature 100-
150 DEG C, drying time 5-30min.
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| CN201810737768.5A CN108893712A (en) | 2018-07-06 | 2018-07-06 | Coated objects made from precious metals of surface band and preparation method thereof |
| SG11202101253RA SG11202101253RA (en) | 2018-07-06 | 2019-07-05 | Precious metal article having plating layer on surface and preparation method thereof |
| PCT/CN2019/094844 WO2020007357A1 (en) | 2018-07-06 | 2019-07-05 | Precious metal article having plated layer at its surface and preparation method therefor |
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| CN201810737768.5A CN108893712A (en) | 2018-07-06 | 2018-07-06 | Coated objects made from precious metals of surface band and preparation method thereof |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020007357A1 (en) * | 2018-07-06 | 2020-01-09 | 深圳市联合蓝海科技开发有限公司 | Precious metal article having plated layer at its surface and preparation method therefor |
| CN110983393A (en) * | 2019-12-27 | 2020-04-10 | 广东电网有限责任公司电力科学研究院 | Silver-niobium carbide composite coating and preparation method thereof |
| CN112080723A (en) * | 2020-08-20 | 2020-12-15 | 深圳市矽谷溅射靶材有限公司 | Nano multilayer composite anti-scratching film on surface of gold product and preparation method thereof |
| CN112499987A (en) * | 2020-12-10 | 2021-03-16 | 四川南玻节能玻璃有限公司 | Infrared reflection combined film layer and coated glass |
| AT17511U1 (en) * | 2020-12-15 | 2022-06-15 | Plansee Se | TITANIUM-IBORIDE COATED REFRACTORY METAL COMPONENT |
| CN115198242A (en) * | 2022-07-20 | 2022-10-18 | 深圳市金弘珠宝首饰有限公司 | Preparation method of wear-resistant gold coating of jewelry |
| CN115257219A (en) * | 2022-07-13 | 2022-11-01 | 深圳市信物工坊实业有限公司 | Ophio effect enamel applied to precious metal surface and manufacturing method thereof |
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| CN106637128B (en) * | 2016-12-08 | 2019-05-14 | 华南理工大学 | Gold and its alloy surface transparent diamond nano thin-film and preparation method thereof |
| CN108893712A (en) * | 2018-07-06 | 2018-11-27 | 深圳市联合蓝海科技开发有限公司 | Coated objects made from precious metals of surface band and preparation method thereof |
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| CN101802267A (en) * | 2007-09-19 | 2010-08-11 | 西铁城控股株式会社 | Decorative component |
| US20120304692A1 (en) * | 2011-06-03 | 2012-12-06 | Frederick Goldman Inc. | Coated metallic products and methods for making the same |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020007357A1 (en) * | 2018-07-06 | 2020-01-09 | 深圳市联合蓝海科技开发有限公司 | Precious metal article having plated layer at its surface and preparation method therefor |
| CN110983393A (en) * | 2019-12-27 | 2020-04-10 | 广东电网有限责任公司电力科学研究院 | Silver-niobium carbide composite coating and preparation method thereof |
| CN112080723A (en) * | 2020-08-20 | 2020-12-15 | 深圳市矽谷溅射靶材有限公司 | Nano multilayer composite anti-scratching film on surface of gold product and preparation method thereof |
| CN112499987A (en) * | 2020-12-10 | 2021-03-16 | 四川南玻节能玻璃有限公司 | Infrared reflection combined film layer and coated glass |
| CN112499987B (en) * | 2020-12-10 | 2023-09-26 | 四川南玻节能玻璃有限公司 | Infrared reflection combined film and coated glass |
| AT17511U1 (en) * | 2020-12-15 | 2022-06-15 | Plansee Se | TITANIUM-IBORIDE COATED REFRACTORY METAL COMPONENT |
| CN115257219A (en) * | 2022-07-13 | 2022-11-01 | 深圳市信物工坊实业有限公司 | Ophio effect enamel applied to precious metal surface and manufacturing method thereof |
| CN115257219B (en) * | 2022-07-13 | 2024-06-11 | 深圳市信物工坊实业有限公司 | European-Perot-effect enamel applied to noble metal surface and manufacturing method thereof |
| CN115198242A (en) * | 2022-07-20 | 2022-10-18 | 深圳市金弘珠宝首饰有限公司 | Preparation method of wear-resistant gold coating of jewelry |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020007357A1 (en) | 2020-01-09 |
| SG11202101253RA (en) | 2021-03-30 |
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