CN108873497B - Liquid crystal box based on photoetching process and preparation method - Google Patents
Liquid crystal box based on photoetching process and preparation method Download PDFInfo
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- CN108873497B CN108873497B CN201810518119.6A CN201810518119A CN108873497B CN 108873497 B CN108873497 B CN 108873497B CN 201810518119 A CN201810518119 A CN 201810518119A CN 108873497 B CN108873497 B CN 108873497B
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- liquid crystal
- glass substrate
- photoresist
- lower glass
- upper glass
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a liquid crystal box based on a photoetching process and a preparation method thereof, belonging to the technical field of liquid crystal optics. The liquid crystal box comprises a lower glass substrate (1), a transparent conductive film (2), photoresist (3), liquid crystal (4), an upper glass substrate (5) and frame glue (6). The invention uses the photoresist to replace the traditional metal particles or insulating particles as the spacer of the liquid crystal box, has simple process and low cost, can obtain different liquid crystal box thicknesses by selecting different glue types, can realize uniform box thickness, and has potential application in the application fields of liquid crystal display, liquid crystal phase control and the like.
Description
Technical Field
The invention belongs to the technical field of liquid crystal optics, and particularly relates to a liquid crystal box preparation method based on a photoetching process.
Background
Liquid crystal display devices are the mainstream of display devices because of their advantages such as low weight, small size, and low power consumption. The liquid crystal cell is a core component of the liquid crystal display device, and the quality of the liquid crystal cell plays a significant role in the display effect of the liquid crystal display device. Furthermore, liquid crystal cells are also an important basis for liquid crystal optical phased arrays. The liquid crystal cell is composed of two glass substrates, and a layer of Indium Tin Oxide (ITO) or indium oxide (In) is arranged on the inner surfaces of the glass substrates2O3) And when a certain voltage is loaded at the two ends of the transparent electrode, the orientation of the liquid crystal material molecules filled between the two substrates can be in a certain state, so that the target function is realized. Cell thickness is an important structural parameter of a liquid crystal cell. For liquid crystal display devices, uneven cell thickness can lead to poor display performance; for liquid crystal optical phased arrays, the non-uniform cell thickness can cause the actual beam steering effect to deviate from the theoretical result. Therefore, a uniform cell thickness is necessary. To achieve a uniform cell thickness, a diameter is typically usedThe uniform metal particles or the insulating particles and the frame glue of the liquid crystal box are uniformly mixed according to a certain proportion so as to ensure that the liquid crystal box has uniform thickness. The glass plate is hermetically sealed around it in order to prevent moisture and oxygen from interacting with the liquid crystal. The sealing material is usually an organic material such as epoxy resin or an inorganic sealing material such as low-melting glass frit, which is screen printing ink. The method for preparing the liquid crystal box relates to the fact that metal particles or insulating particles are very expensive, screen printing is time-consuming, and the process is complex, so that the method for preparing the liquid crystal box based on the photoetching process is provided, photoresist is used for replacing the metal particles or the insulating particles, the process is simple, the cost is low, different liquid crystal box thicknesses can be obtained by selecting different glue types, and uniform box thickness can be achieved.
Disclosure of Invention
The invention aims to provide a simple and low-cost liquid crystal box preparation method based on a photoetching process, which utilizes photoresist to replace metal particles or insulating particles, not only can realize uniform liquid crystal box thickness, but also can obtain different liquid crystal box thicknesses by selecting different glue types, and can simplify the liquid crystal box preparation process.
The technical scheme adopted by the invention is that the liquid crystal box prepared based on the photoetching technology comprises a lower glass substrate (1), a transparent conductive film (2), a photoresist (3), a liquid crystal (4), an upper glass substrate (5) and a frame glue (6). The liquid crystal display panel is characterized in that the liquid crystal (4) is bonded on the frame glue (6) through the photoresist (3), the liquid crystal (4) and the frame glue (6) are of a liquid crystal layer structure, a layer of transparent conductive film (2) is arranged on the lower glass substrate (1), a liquid crystal layer structure is arranged on the transparent conductive film (2), another layer of transparent conductive film (2) is arranged on the liquid crystal layer structure, and an upper glass substrate (5) is arranged on the transparent conductive film (2).
Drawings
FIG. 1: the invention adopts the side view of the whole structure of the liquid crystal box prepared by the photoetching process;
FIG. 2: a side view of the lower glass substrate;
FIG. 3: a side view of the glass substrate after sputtering the transparent conductive film;
FIG. 4: the lower glass substrate is coated with photoresist in a spinning mode;
FIG. 5: a side view of the lower glass substrate after the photoresist has undergone a photolithography process;
FIG. 6: covering the photoresist with the upper glass substrate, and preliminarily forming the liquid crystal box;
FIG. 7: schematic diagram of sealed liquid crystal box with frame sealant and liquid crystal filled in
In the figure: 1. the liquid crystal display panel comprises a lower glass substrate 2, a transparent conductive film 3, a photoresist 4, a liquid crystal 5, an upper glass substrate 6 and frame glue.
Detailed Description
The process for preparing a liquid crystal cell according to the present invention will now be described with reference to fig. 2 to 7.
A liquid crystal box prepared based on a photoetching technology comprises a lower glass substrate (1), a transparent conductive film (2), photoresist (3), liquid crystal (4), an upper glass substrate (5) and frame glue (6). The liquid crystal display panel is characterized in that the liquid crystal (4) is bonded on the frame glue (6) through the photoresist (3), the liquid crystal (4) and the frame glue (6) are of a liquid crystal layer structure, a layer of transparent conductive film (2) is arranged on the lower glass substrate (1), the liquid crystal layer structure is arranged on the transparent conductive film (2), another layer of transparent conductive film (2) is arranged on the liquid crystal layer structure, and an upper glass substrate (5) is arranged on the other layer of transparent conductive film (2).
A method for preparing a liquid crystal box based on photoetching technology comprises the following steps:
And 2, drying the cleaned upper glass substrate (5) and the cleaned lower glass substrate (1) by using a nitrogen gun, and then placing the glass substrates in an oven with the temperature of 100 ℃ for drying for 10 minutes to ensure that the surfaces of the upper glass substrate (5) and the lower glass substrate (1) are dried.
And 3, sputtering an ITO transparent electrode on one surface of the upper glass substrate (5) and the lower glass substrate (1), and performing an annealing process on the sputtered ITO transparent electrode to obtain the ITO glass substrate with good performance.
And 4, selecting the type of the photoresist (3) according to the thickness requirement of the liquid crystal box. And spin-coating photoresist on the lower glass substrate (1), and selecting a corresponding photoetching plate according to the size of the reserved window to perform exposure under ultraviolet light.
And step 5, developing: and selecting a developing solution corresponding to the type of the photoresist (3) for developing to obtain a photoetching pattern. And then, the photoresist is applied for 5 minutes by a glue applicator to ensure that no photoresist (3) remains in the exposed area.
And 6, enabling the surface sputtered with the ITO of the upper glass substrate (5) to face downwards and to be parallel to the lower glass substrate (1) to form a liquid crystal box. And then coating a proper amount of frame glue on the periphery of the photoresist to reinforce the bonding of the upper substrate and the lower substrate.
And 7, injecting liquid crystal by using the capillary action of the liquid crystal box, and then sealing the liquid crystal injection opening and the air outlet by using frame glue (6) to finish the manufacture of the liquid crystal box.
The photoresist used includes positive photoresist, negative photoresist and reversal photoresist.
The frame glue comprises adhesives such as epoxy resin glue, AB glue and the like.
Claims (1)
1. A liquid crystal box prepared based on a photoetching technology is characterized in that: the liquid crystal box comprises a lower glass substrate (1), a transparent conductive film (2), a photoresist (3), a liquid crystal (4), an upper glass substrate (5) and a frame glue (6); the liquid crystal (4) is bonded on the frame glue (6) through the photoresist (3), the liquid crystal (4) and the frame glue (6) are of a liquid crystal layer structure, a layer of transparent conductive film (2) is arranged on the lower glass substrate (1), the liquid crystal layer structure is arranged on the transparent conductive film (2), another layer of transparent conductive film (2) is arranged on the liquid crystal layer structure, an upper glass substrate (5) is arranged on the other layer of transparent conductive film (2),
step 1, ultrasonically cleaning an upper glass substrate (5) and a lower glass substrate (1); placing the upper glass substrate (5) and the lower glass substrate (1) in two different beakers containing acetone to prevent the surfaces from being scratched due to mutual friction, and then placing the beakers in an ultrasonic machine for ultrasonic cleaning; repeating twice, then changing acetone into ethanol, and repeating ultrasonic cleaning; then the upper glass substrate (5) and the lower glass substrate (1) are washed by deionized water for 20 times or more; obtaining an upper glass substrate (5) and a lower glass substrate (1) after cleaning;
2, drying the cleaned upper glass substrate (5) and the cleaned lower glass substrate (1) by using a nitrogen gun, and then placing the glass substrates in a drying oven with the temperature of 100 ℃ for drying for 10 minutes to ensure that the surfaces of the upper glass substrate (5) and the lower glass substrate (1) are dried;
step 3, sputtering an ITO transparent electrode on one surface of the upper glass substrate (5) and the lower glass substrate (1), and performing an annealing process on the sputtered ITO transparent electrode to obtain an ITO glass substrate with good performance;
step 4, selecting the type of the photoresist (3) according to the thickness requirement of the liquid crystal box; spin-coating photoresist on the lower glass substrate (1), and then selecting a corresponding photoetching plate according to the size of a reserved window to carry out exposure under ultraviolet light;
and step 5, developing: developing with a developing solution corresponding to the type of the photoresist (3) to obtain a photoetching pattern; then, gluing for 5 minutes by using a gluing machine to ensure that no photoresist (3) remains in an exposure area;
step 6, enabling the surface of the upper glass substrate (5) sputtered with the ITO to face downwards and to be parallel to the lower glass substrate (1) to form a liquid crystal box; then coating a proper amount of frame glue on the periphery of the photoresist to reinforce the bonding of the upper substrate and the lower substrate;
step 7, realizing the injection of liquid crystal by utilizing the capillary action of the liquid crystal box, and then sealing the liquid crystal injection port and the air outlet by using frame glue (6) to finish the manufacture of the liquid crystal box;
the photoresist comprises positive photoresist, negative photoresist and reversal photoresist;
the frame glue comprises epoxy resin glue and AB glue adhesive.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810518119.6A CN108873497B (en) | 2018-05-27 | 2018-05-27 | Liquid crystal box based on photoetching process and preparation method |
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| CN201810518119.6A CN108873497B (en) | 2018-05-27 | 2018-05-27 | Liquid crystal box based on photoetching process and preparation method |
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| CN108873497A CN108873497A (en) | 2018-11-23 |
| CN108873497B true CN108873497B (en) | 2021-11-26 |
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| CN110780498A (en) * | 2019-11-06 | 2020-02-11 | 四川大学 | Preparation method of LCoS micro-display chip based on microstructure |
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| CN102566151A (en) * | 2012-02-06 | 2012-07-11 | 深圳市瑞福达液晶显示技术股份有限公司 | Liquid crystal box of flexible liquid crystal display |
| CN202362559U (en) * | 2011-11-02 | 2012-08-01 | 信利半导体有限公司 | Liquid crystal display device |
| CN102654666A (en) * | 2011-03-04 | 2012-09-05 | 苏州汉朗光电有限公司 | Smectic phase liquid crystal dimming sheet and manufacturing method thereof |
| CN103454815A (en) * | 2013-09-12 | 2013-12-18 | 合肥京东方光电科技有限公司 | Display panel as well as manufacturing method and display device thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4609679B2 (en) * | 2000-07-19 | 2011-01-12 | 日本電気株式会社 | Liquid crystal display |
| JP4646975B2 (en) * | 2005-03-18 | 2011-03-09 | シャープ株式会社 | Liquid crystal panel and manufacturing method thereof |
| CN105372867A (en) * | 2015-12-02 | 2016-03-02 | 深圳市华星光电技术有限公司 | Quantum dot color film substrate manufacturing method |
| CN105824153A (en) * | 2016-05-26 | 2016-08-03 | 豪威半导体（上海）有限责任公司 | Manufacturing method for displayer |
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102654666A (en) * | 2011-03-04 | 2012-09-05 | 苏州汉朗光电有限公司 | Smectic phase liquid crystal dimming sheet and manufacturing method thereof |
| CN202362559U (en) * | 2011-11-02 | 2012-08-01 | 信利半导体有限公司 | Liquid crystal display device |
| CN102566151A (en) * | 2012-02-06 | 2012-07-11 | 深圳市瑞福达液晶显示技术股份有限公司 | Liquid crystal box of flexible liquid crystal display |
| CN103454815A (en) * | 2013-09-12 | 2013-12-18 | 合肥京东方光电科技有限公司 | Display panel as well as manufacturing method and display device thereof |
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