CN108873453B - Color film substrate, preparation method thereof and display panel - Google Patents

Color film substrate, preparation method thereof and display panel Download PDF

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Publication number
CN108873453B
CN108873453B CN201810688010.7A CN201810688010A CN108873453B CN 108873453 B CN108873453 B CN 108873453B CN 201810688010 A CN201810688010 A CN 201810688010A CN 108873453 B CN108873453 B CN 108873453B
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layer
ion
absorption layer
substrate
ion absorption
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CN108873453A (en
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聂晓辉
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)

Abstract

The application discloses a color film substrate, a preparation method thereof and a display panel, wherein the preparation method of the color film substrate comprises the following steps: providing a substrate base plate; sequentially forming a light shielding layer, a color block, a covering layer and an ion absorption layer on the substrate; and after the ion absorption layer fully absorbs at least one ion impurity in the shading layer, the color block and the covering layer, removing the ion absorption layer. The ion absorption layer can fully absorb ion impurities in the shading layer, the color blocking block and the covering layer, and the ion absorption layer is removed after the ion absorption layer is fully absorbed, so that the concentration of the ion impurities in the color film substrate can be reduced, the occurrence of picture residues is reduced, and the display quality is improved.

Description

Color film substrate, preparation method thereof and display panel
Technical Field
The application relates to the technical field of display, in particular to a color film substrate, a manufacturing method thereof and a display panel.
Background
The frame sticking of the display panel means a phenomenon that the same still picture is displayed for a long time and when the still picture is switched to another picture, the previous picture is still displayed.
The inventors of the present application have found, in long-term research and development, two essential factors causing picture sticking: firstly, a direct current bias voltage exists on the drive; and secondly, ionic impurities exist in the display screen. Due to the pixel structure, the process technology and the like, an area with asymmetric alternating current driving can be generated in the pixel area, and the voltage deviating from the symmetric center forms a direct current bias voltage. Due to the existence of ionic impurities in the screen, the ionic impurities in the screen can be attracted by the direct current bias, so that residual direct current bias is formed at the place where the alternating current drive is asymmetric. Thus, after the image is switched, the liquid crystal molecules cannot be arranged according to the design requirement due to the residual DC bias, so that the image before is residual. The image sticking causes a ghost image of a new image, so that the contrast is reduced and the image is blurred.
The inventors of the present application have further found that the cover layer (Over Coater), the Black Matrix (Black Matrix), and the color resist layer (RGB) in the color filter substrate all contain resin components, and ionic impurities are easily introduced. In addition, an ITO thin film for shielding ionic impurities of the organic layer from entering the liquid crystal layer is not disposed on the side of the color film substrate of the In-Plane Switching (In-Plane Switching) and Fringe Field Switching (Fringe Field Switching) type liquid crystal display panel, so that the ionic impurities In each organic layer easily enter the liquid crystal layer, and the occurrence of picture retention is aggravated.
Therefore, it is necessary to provide a color film substrate, a method for manufacturing the color film substrate, and a display panel to solve the above technical problems.
Disclosure of Invention
The technical problem mainly solved by the application is to provide a color film substrate, a manufacturing method thereof and a display panel.
In order to solve the above technical problem, a first technical scheme adopted by the present application is to provide a method for manufacturing a color film substrate, where the method includes: providing a substrate base plate; sequentially forming a light shielding layer, a color block, a covering layer and an ion absorption layer on the substrate; and after the ion absorption layer fully absorbs at least one ion impurity in the shading layer, the color block and the covering layer, removing the ion absorption layer.
In order to solve the above technical problem, a second technical scheme adopted by the present application is to provide a color filter substrate, where the color filter substrate is manufactured according to any one of the above methods.
In order to solve the above technical problem, a third technical solution adopted in the present application is to provide a display panel, where the display panel includes the color film substrate described above.
The beneficial effect of this application is: different from the situation of the prior art, the ion absorption layer is formed on the covering layer after the light shielding layer, the color block and the covering layer are sequentially formed on the substrate, and the ion absorption layer is used for fully absorbing the ion impurities in the light shielding layer, the color block and the covering layer, so that the concentration of the ion impurities in the color film substrate can be reduced, the occurrence of image residues is reduced, and the display quality is improved.
Drawings
Fig. 1 is a schematic flow chart illustrating a method for manufacturing a color filter substrate according to an embodiment of the present disclosure;
fig. 2 is a schematic structural diagram of an embodiment of a color filter substrate provided in the present application;
fig. 3 is a schematic structural diagram of an embodiment of a display panel provided in the present application.
Detailed Description
The present application is provided to further explain the present application in detail, so as to make the purpose, technical solution and technical effects of the present application clearer and clearer, and it should be understood that the specific embodiments described herein are only used for explaining the present application and are not used for limiting the present application.
In the liquid crystal display panel, when ion impurities exist in the screen, the direct current bias attracts the ion impurities in the screen, so that residual direct current bias is formed at the place where the alternating current drive is asymmetric, and after the picture is switched, liquid crystal molecules cannot be arranged according to the design requirement due to the effect of the residual direct current bias, so that the previous picture is residual. In order to solve the technical problem, according to the technical scheme adopted by the application, when the color film substrate is prepared, the ion absorption layer is formed after the light shielding layer, the color resistance block and the covering layer are sequentially formed on the substrate, and the ion absorption layer is removed after ion impurities in the light shielding layer, the color resistance block and the covering layer are fully absorbed by the ion absorption layer, so that the concentration of the ion impurities in the color film substrate can be reduced, and the occurrence of picture residues is reduced. The following detailed description is made with reference to the accompanying drawings.
Referring to fig. 1, fig. 1 is a schematic flow chart of an embodiment of a method for manufacturing a color filter substrate provided in the present application, and the color filter substrate is manufactured through the steps in fig. 1.
Step 11: a base substrate is provided.
The base substrate in this embodiment is a glass substrate, and in other embodiments, may be a transparent base substrate made of other materials. The glass substrate is washed with ethanol, propanol, deionized water, etc., and dried after the washing, and the dried glass substrate is used in the following steps.
Step 12: a light-shielding layer, a color resist block, a covering layer, and an ion-absorbing layer are sequentially formed on a base substrate.
A shading layer, a color resistance block and a covering layer are sequentially formed on a glass substrate in a physical or chemical mode, and then an ion absorption layer is formed on the covering layer. In this embodiment, the material of the covering layer is organic photoresist.
Specifically, the color resistance blocks comprise red resistance blocks, green resistance blocks and blue resistance blocks, the red resistance blocks, the green resistance blocks and the blue resistance blocks are arranged at intervals and are evenly distributed on the glass substrate, and the light shielding layer is located in a gap between every two adjacent color resistance blocks.
Because the covering layer, the black matrix and the color resistance layer all contain resin components, ion impurities are easy to introduce. In addition, indium tin oxide films for shielding ionic impurities are not arranged on the side of the color film substrate of the in-plane switching type liquid crystal display panel and the fringe field switching type liquid crystal display panel, so that the phenomenon of picture retention is more likely to occur.
In order to remove the ionic impurities in the light shielding layer, the color block and the covering layer, in this embodiment, an ion absorption layer with a thickness of 2 micrometers to 2.5 micrometers is coated on the covering layer by a coater, and the ion absorption layer with a thickness of 2 micrometers to 2.5 micrometers can absorb the ionic impurities better. In addition, the ion absorption layer in this embodiment is a crown ether and/or crown ether derivative layer, and the crown ether molecule contains a plurality of-OCHs2CH2-a structural unit.
Crown ether refers to a compound containing a plurality of-OCH in the molecule2CH2Macrocyclic polyethers of structural units, which are distinguished in particular by a specific cavity structure which permits complex adsorption of cations, in particular alkali metal ions. For example, 18-crown-6 ether can not only complex with potassium ions, but also complex with sodium ions, and has an extraction and concentration effect on positive ions in the material. In this embodiment, ion impurities in the light shielding layer, the color resist block, and the cover layer can be adsorbed by complexing by using a substance containing crown ether or a crown ether derivative as the ion absorbing layer.
Step 13: and after the ion absorption layer fully absorbs at least one ion impurity in the shading layer, the color block and the covering layer, removing the ion absorption layer.
The method comprises the steps that a shading layer, a color resistance block and a covering layer which are formed on a glass substrate contain various impurity ions, after an ion absorption layer is formed on the covering layer, the glass substrate containing the ion absorption layer is baked in an environment of 70-90 ℃, and the ion absorption layer is enabled to fully absorb the ion impurities in the shading layer, the color resistance block and the covering layer; after the ion impurities are fully absorbed, the ion absorption layer is removed in a cleaning mode through cleaning liquid.
Preferably, the glass substrate containing the ion absorption layer is baked in an environment of 80 ℃ so that the ion absorption layer fully complexes and adsorbs ion impurities in the shading layer, the color block and the covering layer. For example, the glass substrate including the ion absorption layer is placed in an oven, the temperature of the oven is set to 80 degrees celsius, and the baking is continued for 8 to 12 minutes, and then the glass substrate is taken out.
More preferably, the glass substrate coated with the ion absorption layer is placed in an oven at a temperature of 80 degrees celsius for a continuous baking time of 10 minutes and then taken out. The crown ether and/or crown ether derivative layer can be faster and more sufficiently complexed to adsorb ionic impurities by setting the baking temperature to 80 ℃.
After the crown ether and/or crown ether derivative layer is fully complexed to adsorb ion impurities, the crown ether and/or crown ether derivative layer is cleaned for 4-6 minutes by using isopropanol, and the crown ether and/or crown ether derivative layer is cleaned by using the isopropanol because the isopropanol has better compatibility with the crown ether and/or crown ether derivative layer, the crown ether and/or crown ether derivative can be dissolved in the isopropanol, so that the crown ether and/or crown ether derivative layer is removed.
And after the crown ether and/or crown ether derivative layer is removed by isopropanol, drying the glass substrate, and forming an alignment film on the covering layer after drying.
In this example, the glass substrate from which the crown ether and/or crown ether derivative layer was removed was put into an oven to be dried.
In this embodiment, after the light-shielding layer, the color resist block, and the cover layer are sequentially formed on the substrate, the ion absorption layer is formed on the cover layer, ion impurities in the light-shielding layer, the color resist block, and the cover layer are sufficiently absorbed by the ion absorption layer, and the ion absorption layer is removed after the ion absorption layer is sufficiently absorbed, so that the concentration of the ion impurities in the color film substrate can be reduced, the occurrence of image sticking is reduced, and the display quality is improved.
Referring to fig. 2, fig. 2 is a schematic structural diagram of a color film substrate according to an embodiment of the present disclosure. As shown in fig. 2, the color filter substrate includes an underlying substrate 21, and a light-shielding layer 22, a color resist block 23, a cover layer 24, and an ion absorption layer 25 sequentially disposed on the underlying substrate 21, where the ion absorption layer 25 is used to absorb ion impurities in the light-shielding layer 22, the color resist block 23, and the cover layer 24. After the ion absorption layer 25 sufficiently absorbs the ion impurities in the light shielding layer 22, the color resist blocks 23, and the cover layer 24, they are removed. There may be a small amount of residue of the ion absorbing layer 25 after removal, so in some cases, the ion absorbing layer 25 residue is still present in the final product of the color filter substrate, and this residue is also referred to as the ion absorbing layer 25 in this application.
The color film substrate in this embodiment is a color film substrate manufactured according to any one of the above methods. It should be noted that although the cover layer 24 can play a certain role in isolating the ion impurities in the light shielding layer 22 and the color resist block 23, the ion impurities in the light shielding layer 22 and the color resist block 23 can still diffuse into the cover layer 24 after a long time, and the cover layer 24 also contains the ion impurities, so that the ion absorption layer 25 is formed on the cover layer 24, and after the ion impurities in the light shielding layer 22, the color resist block 23 and the cover layer 24 are fully absorbed by the ion absorption layer 25, the ion absorption layer 25 is removed, so that the ion impurities can be removed from the source, and the problem of ion impurity diffusion does not exist.
In this embodiment, by providing the ion absorption layer 25 on the cover layer 24, the ion impurity concentration in the light shielding layer 22, the color resist block 23, and the cover layer 24 can be greatly reduced, thereby reducing the occurrence of image sticking and improving the display quality.
Referring to fig. 3, fig. 3 is a schematic structural diagram of an embodiment of a display panel provided in the present application. As shown in fig. 3, the display panel includes a color filter substrate 31, an array substrate 32, and a liquid crystal 33 located between the color filter substrate 31 and the array substrate 32. The color filter substrate 31 is the color filter substrate in any of the above embodiments.
The beneficial effect of this application is: different from the situation of the prior art, the ion absorption layer is formed on the covering layer after the light shielding layer, the color block and the covering layer are sequentially formed on the substrate, and the ion absorption layer is used for fully absorbing the ion impurities in the light shielding layer, the color block and the covering layer, so that the concentration of the ion impurities in the color film substrate can be reduced, the occurrence of image residues is reduced, and the display quality is improved.
The above description is only an embodiment of the present application, and not intended to limit the scope of the present application, and all modifications of equivalent structures and equivalent processes, which are made by using the contents of the specification and the drawings, or directly or indirectly applied to other related technical fields, are also included in the scope of the present application.

Claims (9)

1. A preparation method of a color film substrate is characterized by comprising the following steps:
providing a substrate base plate;
forming a light shielding layer, a color block, a covering layer and an ion absorption layer on the substrate in sequence;
removing the ion absorption layer after the ion absorption layer fully absorbs at least one ion impurity in the light shielding layer, the color block and the covering layer;
wherein, the step of forming a light shield layer, a color block, a covering layer and an ion absorption layer in sequence on the substrate comprises:
forming a light shielding layer, a color resist block and a covering layer on the substrate in sequence;
and coating an ion absorption layer with the thickness of 2-2.5 microns on the covering layer through a coating machine.
2. The preparation method according to claim 1, wherein the ion absorption layer is a crown ether and/or crown ether derivative layer, and the crown ether molecule contains a plurality of-OCH2CH2-a structural unit.
3. The method according to claim 1, wherein the step of removing the ion-absorbing layer after the ion-absorbing layer sufficiently absorbs at least one ion impurity of the light-shielding layer, the color resist block, and the cover layer comprises:
baking the substrate containing the ion absorption layer in an environment of 70-90 ℃ to enable the ion absorption layer to fully absorb at least one ion impurity in the light shielding layer, the color block and the covering layer;
and after the ion impurities are fully absorbed, removing the ion absorption layer in a cleaning mode by using cleaning liquid.
4. The method according to claim 3, wherein the step of baking the ion absorption layer in an environment of 70-90 degrees Celsius comprises:
putting the substrate base plate coated with the ion absorption layer into a thermostat, and setting the temperature of the thermostat to be 70-90 ℃;
and continuously baking the substrate coated with the ion absorption layer for 8-12 minutes.
5. A method according to claim 3, wherein said step of removing said ion-absorbing layer by cleaning with a cleaning solution comprises:
and cleaning the ion absorption layer by isopropanol for 4-6 minutes.
6. The method according to claim 4, wherein the step of cleaning the ion absorption layer with isopropyl alcohol for 4 to 6 minutes further comprises:
drying the substrate base plate;
and forming an alignment film layer on the covering layer.
7. The method according to claim 1, wherein the material of the cover layer is an organic photoresist.
8. A color filter substrate, wherein the color filter substrate is manufactured by the method according to any one of claims 1 to 7.
9. A display panel comprising the color filter substrate according to claim 8.
CN201810688010.7A 2018-06-28 2018-06-28 Color film substrate, preparation method thereof and display panel Active CN108873453B (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01112607A (en) * 1987-10-26 1989-05-01 Nippon Telegr & Teleph Corp <Ntt> Pattern-shaped electrolytic oxidated film and its manufacture
CN1582074A (en) * 2003-08-08 2005-02-16 精工爱普生株式会社 Organic EL device, method of manufacturing the same, and electronic apparatus
CN1912723A (en) * 2006-08-28 2007-02-14 友达光电股份有限公司 Half-penetration half-reflection liquid crystal display panel
CN101840099A (en) * 2009-03-18 2010-09-22 北京京东方光电科技有限公司 Liquid crystal display panel and manufacture method thereof
CN106110707A (en) * 2016-06-17 2016-11-16 阜阳欣奕华材料科技有限公司 A kind of liquid crystal monomer or the purification process of liquid-crystal composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01112607A (en) * 1987-10-26 1989-05-01 Nippon Telegr & Teleph Corp <Ntt> Pattern-shaped electrolytic oxidated film and its manufacture
CN1582074A (en) * 2003-08-08 2005-02-16 精工爱普生株式会社 Organic EL device, method of manufacturing the same, and electronic apparatus
CN1912723A (en) * 2006-08-28 2007-02-14 友达光电股份有限公司 Half-penetration half-reflection liquid crystal display panel
CN101840099A (en) * 2009-03-18 2010-09-22 北京京东方光电科技有限公司 Liquid crystal display panel and manufacture method thereof
CN106110707A (en) * 2016-06-17 2016-11-16 阜阳欣奕华材料科技有限公司 A kind of liquid crystal monomer or the purification process of liquid-crystal composition

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