CN108873365A - The combined metal nanometer thin film chirality optical device of double structure - Google Patents
The combined metal nanometer thin film chirality optical device of double structure Download PDFInfo
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- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
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Abstract
The present invention relates to a kind of combined metal nanometer thin film chirality optical devices of double structure, including：Substrate and the chiral structure two-dimensional array in substrate；Chiral structure two-dimensional array includes multiple chiral building blocks；Chiral building block includes metal film, the U-typed being provided on metal film seam and " one " word seam.The combined metal nanometer thin film chirality optical device of the double structure of the embodiment of the present invention, using the chiral structure two-dimensional array being made of multiple double structure metal nanometer thin film chiral building blocks, one " one " word of addition stitches chiral building block again on the foundation structure that single U-typed is stitched, more magnetic dipoles are produced near " one " word seam, compared to the chiral optical device of the existing chiral structure two-dimensional array with single structure chiral building block composition, circular dichroism is significantly enhanced.
Description
Technical field
The present invention relates to optical field, in particular to a kind of combined metal nanometer thin film chirality optical device of double structure.
Background technique
Chirality refers to the property that structure cannot be overlapped with its mirror image, and chiral structure is prevalent in the Nature, such as egg
The large biological molecules such as white matter, carbohydrate and DNA, chirality play a key role in biochemistry and life concern, therefore right
The chiral analysis of chiral molecules is most important.
The most directly effective technology of molecular chiral analysis at present is circular dichroism spectra, and the principle of the technology is chiral molecules to a left side
The absorption of right-hand circularly polarized light is different.When a certain chiral sample of the monochromatic left-handed circularly polarized light irradiation with dextrorotation, the chirality sample
Product are different to the absorption of left-right rotary circularly polarized light, and this chiral molecules absorbs difference at different wavelengths and is known as circular dichroism spectra.
Chirality can be divided into according to its design feature：Inherent chiral and external chirality.Inherent chiral i.e. structure itself has
Chirality, external chirality refers to the chirality that structure is constituted together with incident light.
In the research of chiral molecules asymmetry, when left circularly polarized light and right-circularly polarized light incidence, chiral material
Material can show different effective refractive indexs and spread speed is also different.When Meta Materials have extremely strong chirality, or even can present
Negative index out, material with negative refractive index are also referred to as chiral Meta Materials.Can be stealthy to object progress using material with negative refractive index,
It realizes and breaks through subwavelength resolution imaging of diffraction limit etc..This is for fields such as physics, engineering science, optics and materialogies
Research be possible to generate great influence.Therefore electromagnetism and optical field forefront are become for the research of chiral structure
Research topic.It, can be real by designing two-dimensional metallic film chiral structure in the chiral structural research of the prior art
The now modulation to light beam polarization characteristic or for detecting the circular dichroism spectra of chiral material, but when detected signal itself compares
When faint, obtained circular dichroism spectra signal is unobvious, i.e., detection effect is not so good.
Summary of the invention
Therefore, a kind of combined gold of double structure is proposed to solve technological deficiency and deficiency, the present invention of the existing technology
Belong to nano thin-film chirality optical device.
Specifically, the combined metal nanometer thin film chirality optics device of a kind of double structure that one embodiment of the invention proposes
Part, including：
Substrate and the chiral structure two-dimensional array in substrate；
Chiral structure two-dimensional array includes multiple chiral building blocks；
Chiral building block includes metal film, the U-typed being provided on metal film seam and " one " word seam.
In one embodiment of the invention, chiral structure two-dimensional array is square array, several chiral building block edges
Transversely arranged number and the number being arranged in the vertical direction are at least 500.
In one embodiment of the invention, chiral structure two-dimensional array is circular array, several chiral building block edges
The number of arranged radially is at least 500.
In one embodiment of the invention, " one " word seam is located at the side of U-typed seam, flat with the lower brachium of U-typed seam
Row is placed.
In one embodiment of the invention, " one " the word seam position first position concordant with the lower end that U-typed is stitched.
In one embodiment of the invention, the left arm length of U-typed seam, the length of the long and lower brachium of right arm are 100nm
~300nm, width are 30nm~50nm.
In one embodiment of the invention, the length of " one " word seam is 100nm~300nm, and width is 30nm~50nm.
In one embodiment of the invention, the spacing of U-typed seam and " one " word seam is 30nm~50nm.
In one embodiment of the invention, the material of metal film is gold, with a thickness of 20nm~100nm.
Based on this, the present invention has following advantage：
The combined metal nanometer thin film chirality optical device of the double structure of the embodiment of the present invention, using by multiple double structure gold
Belong to the chiral structure two-dimensional array of nano thin-film chiral building block composition, chiral building block is on the basis that single U-typed is stitched
One " one " word of addition stitches again on structure, produces more magnetic dipoles near " one " word seam, has compared to existing
The chiral optical device of the chiral structure two-dimensional array of single structure chiral building block composition, significantly enhances circular dichroism.
Through the following detailed description with reference to the accompanying drawings, other aspects of the invention and feature become obvious.But it should know
Road, which is only the purpose design explained, not as the restriction of the scope of the present invention, this is because it should refer to
Appended claims.It should also be noted that unless otherwise noted, it is not necessary to which scale attached drawing, they only try hard to concept
Ground illustrates structure and process described herein.
Detailed description of the invention
Below in conjunction with attached drawing, specific embodiments of the present invention will be described in detail.
Fig. 1 is a kind of structure of the combined metal nanometer thin film chirality optical device of double structure provided in an embodiment of the present invention
Schematic diagram；
Fig. 2 is the structural schematic diagram of chiral building block provided in an embodiment of the present invention；
Fig. 3 is the schematic illustration that chiral building block provided in an embodiment of the present invention generates circular dichroism；
Fig. 4 (a) and Fig. 4 (b) is existing chiral building block and chiral building block provided in an embodiment of the present invention
Structure Comparison figure；
Fig. 5 is the circular dichroism spectra that existing chiral building block and chiral building block provided in an embodiment of the present invention generate
Comparison diagram.
Specific embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing to the present invention
Specific embodiment be described in detail.
Embodiment one
Referring to Figure 1, Fig. 1 is a kind of combined metal nanometer thin film chirality optics of double structure provided in an embodiment of the present invention
The structural schematic diagram of device.The optical device includes：Substrate 11 and chiral structure two-dimensional array 12.
The material of substrate 11 uses the material for having high transmittance to optical band used, such as silica, quartz, thickness
It is 200 μm~500 μm.
Chiral structure two-dimensional array 12 includes several evenly distributed chiral building blocks 13, chiral structure two-dimensional array 12
In, the period 1 that chiral building block 13 is arranged in the horizontal direction is Px, the second round being arranged in the vertical direction is Py.Chiral structure two
The shape of dimension array 12 can be the array of circular array, square array or other shapes, with specific reference to preparation process, material used
The shape feature of light beam determines in material and applied optical system.The size of chiral structure two-dimensional array 12 is with specific reference to entering
The size of hot spot is penetrated to determine, if square array, then the number of the chiral building block 13 of horizontal and vertical arrangement is at least
It is 500, if circular array, then the number of the chiral building block 13 of diametrical direction arrangement is at least 500.
In one embodiment of the invention, the substrate 11 of the combined metal nanometer thin film chirality optical device of the double structure
Using silica, with a thickness of 200 μm；Chiral structure two-dimensional array 12 is square array, the chiral knot of horizontal and vertical arrangement
The number of structure unit 13 is 1000, and the period 1 being arranged in the horizontal direction is equal to the second round being arranged in the vertical direction, and is Px=Py
=500nm.
Fig. 2 is referred to, Fig. 2 is the structural schematic diagram of chiral building block provided in an embodiment of the present invention.The chiral structure
Unit 13 includes：Metal film 21, the U-typed being provided on metal film seam 22 and " one " word seam 23.U-typed seam 22 and " one "
Word seam 23 penetrates metal film upper and lower surface, and through-hole is formed on metal film.
The shape of metal film 21 be it is rectangular, there is the first side length and the second side length, the length of the first side length is equal to chiral knot
The period 1 P of structure two-dimensional array 12x, the length of the second side length is equal to the second round P of chiral structure two-dimensional array 12y, first
The magnitude range of side length and the second side length is 400nm~1000nm.Metal film with a thickness of T, range is 20nm~100nm.
The material of metal film 21 uses good conductor, such as gold, silver, copper, aluminium noble metal.
U-typed seam 22 includes that three brachiums are that left arm is long, the long and lower brachiums of right arm, and left arm is long, the long and lower brachium of right arm
Length is respectively l1、l2、l3, length range is 100nm~300nm, and three brachiums can be equal, can not also wait, three brachiums
Width having the same is w, and magnitude range is 30nm~50nm.
" one " word seam 23 is set to the side of U-typed seam 22, is placed in parallel with the lower brachium of U-typed seam 22." one " word seam
It may be disposed at the first position concordant with the lower end of U-typed seam, or be set to the second position concordant with the upper end of U-typed seam,
Or it is set to any position between first position and the second position.The length l of " one " word seam 234With three of U-typed seam 22
The similar length of brachium, be 100nm~300nm, with U-typed stitch 22 width having the same be w, magnitude range be 30nm~
50nm。
Be divided into d between U-typed seam 22 and " one " word seam, interval d is close with the magnitude range of width w, for 30nm~
50nm。
In one embodiment of the invention, for metal film 21 using golden material, the first side length and the second side length are equal, are Px
=Py=500nm；Metal film with a thickness of T=30nm；Three brachiums of U-typed seam 22 are equal, are l1=l2=l3=200nm,
Width is w=40nm；" one " word seams the first position for being placed in U-typed seam right side, length l4=180nm, width and U-typed
Slit width degree is equal, is w=40nm；D=40nm is divided between U-typed seam and " one " word seam.
Fig. 3 is referred to, Fig. 3 is that the chiral building block of the embodiment of the present invention generates the schematic illustration of circular dichroism.When
A branch of left-hand polarization light (left circularly polarized, LCP) is incident from chiral building block front, by this
After chiral building block, the transmissivity of the left-hand polarization light received is T--, as a branch of right-handed polarized light (right
Circularly polarized, RCP) it is incident from chiral building block front, after the chiral building block, receive
Right-handed polarized light transmissivity be T++, wherein subscript " -- " is expressed as left-hand polarization light, and " ++ " is expressed as right-handed polarized light, then
The circular dichroism of the chiral building block can be expressed as：
CD=T++-T--(1)
The transmissivity of left-hand polarization light and right-handed polarized light after chiral building block is different, i.e. T++≠T--,
Therefore, the size of CD represents the power of the circular dichroism of chiral building block.
Fig. 4 is referred to, Fig. 4 is the knot of existing chiral building block and chiral building block provided in an embodiment of the present invention
Structure comparison diagram.Fig. 4 (a) is the chiral building block of the prior art, and it includes single U-typed seam, Fig. 4 (b) is implementation of the present invention
The chiral building block of example, it includes U-typed seams and " one " word seam.
Please also refer to Fig. 5, Fig. 5 is existing chiral building block and chiral building block provided in an embodiment of the present invention
The comparison diagram of the circular dichroism spectra of generation.Make a branch of left circularly polarized light in Z-X plane, edge and X-axis negative direction and Z axis negative direction
Angle is to detect to obtain a left side in the exit facet side of chiral building block in 45 degree of direction oblique incidence to chiral building block
The transmissivity T of rounding polarised light--；Make a branch of right-circularly polarized light in Z-X plane again, edge and X-axis negative direction and Z axis negative direction
Angle is to detect to obtain the right side in the exit facet side of chiral building block in 45 degree of direction oblique incidence to chiral building block
The transmissivity T of rounding polarised light++；The circular dichroism spectra generated according to the chiral building block that formula (1) can be calculated.
In Fig. 5, square point curve indicates the circular dichroism that the existing chiral building block with single U-typed seam generates
Spectrum, circle point curve indicate the circular dichroism that the chiral building block with U-typed seam plus " one " word seam of the embodiment of the present invention generates
Spectrum.As can be seen that the circular dichroism spectra that the chiral structure only with single U-typed seam generates is in wavelength X1=590nm, λ2=
740nm、λ3=860nm, λ4=960nm, λ5Nearby there is CD signal in=1690nm, signal magnitude is followed successively by 0.6%, 8%,
8%, 4.8%, 12%, and the circular dichroism spectra that the chiral structure with U-typed seam plus " one " word seam generates is in wavelength X1=
590nm、λ2=760nm, λ3=910nm, λ4=1020nm, λ5Nearby there is CD signal in=1710nm, and signal magnitude is followed successively by
3%, 14.9%, 24.6%, 12.7%, 12.5%.Illustrate after U-typed stitches side addition " one " word seam, the CD signal of generation
It is significantly increased.The reason is that the addition of " one " word seam changes the current direction on U-typed seam surrounding metal film,
There is magnetic dipole at " one " word seam, enhances circular dichroism.
In conclusion the combined metal nanometer thin film chirality optical device of the double structure of the embodiment of the present invention, using by more
The chiral structure two-dimensional array of a double structure metal nanometer thin film chiral building block composition, chiral building block is at single " U "
One " one " word of addition stitches again on the foundation structure of type seam, produces more magnetic dipoles near " one " word seam, compares
The chiral optical device of the existing chiral structure two-dimensional array with single structure chiral building block composition, significantly enhances circle
Dichroism.
In conclusion specific case used herein is to the combined metal nanometer thin film chirality light of double structure of the invention
It learns device to be expounded, the above description of the embodiment is only used to help understand the method for the present invention and its core ideas；Together
When, for those of ordinary skill in the art, according to the thought of the present invention, have in specific embodiments and applications
Change place, in conclusion the contents of this specification are not to be construed as limiting the invention, protection scope of the present invention should be with institute
Subject to attached claim.
Claims (9)
1. a kind of combined metal nanometer thin film chirality optical device of double structure, which is characterized in that including：Substrate and it is located at described
Chiral structure two-dimensional array in substrate；
The chiral structure two-dimensional array includes several chiral building blocks；
The chiral building block includes metal film, the U-typed being provided on metal film seam and " one " word seam.
2. the combined metal nanometer thin film chirality optical device of double structure according to claim 1, which is characterized in that described
Chiral structure two-dimensional array is square array, number that several chiral building blocks are arranged in the horizontal direction and is arranged in the vertical direction
Number is at least 500.
3. the combined metal nanometer thin film chirality optical device of double structure according to claim 1, which is characterized in that described
Chiral structure two-dimensional array is circular array, and the radially arranged number of several chiral building blocks is at least 500.
4. the combined metal nanometer thin film chirality optical device of double structure according to claim 1, which is characterized in that described
" one " word seam is located at the side of U-typed seam, is placed in parallel with the lower brachium of U-typed seam.
5. the combined metal nanometer thin film chirality optical device of double structure according to claim 4, which is characterized in that described
" one " word seam is located at the first position concordant with the lower end that the U-typed is stitched.
6. the combined metal nanometer thin film chirality optical device of double structure according to claim 1, which is characterized in that described
The left arm of U-typed seam is long, the length of the long and lower brachium of right arm is 100nm~300nm, and width is 30nm~50nm.
7. the combined metal nanometer thin film chirality optical device of double structure according to claim 1, which is characterized in that described
The length of " one " word seam is 100nm~300nm, and width is 30nm~50nm.
8. the combined metal nanometer thin film chirality optical device of double structure according to claim 1, which is characterized in that described
The spacing of U-typed seam and " one " word seam is 30nm~50nm.
9. the combined metal nanometer thin film chirality optical device of double structure according to claim 1, which is characterized in that described
The material of metal film is gold, with a thickness of 20nm~100nm.
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Cited By (7)
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| CN109521509A (en) * | 2018-12-07 | 2019-03-26 | 中山科立特光电科技有限公司 | A kind of plane micro-nano structure can produce circular dichroism signal |
| CN109991168A (en) * | 2019-05-05 | 2019-07-09 | 韩山师范学院 | A kind of plane micro-nano structure can produce circular dichroism |
| CN110208186A (en) * | 2019-04-28 | 2019-09-06 | 陕西师范大学 | A kind of micronano optical structure |
| CN110865428A (en) * | 2019-11-28 | 2020-03-06 | 陕西师范大学 | Preparation of strong-induction CD structure and preparation method thereof |
| CN111641046A (en) * | 2020-05-07 | 2020-09-08 | 宁波大学 | Microwave band broadband circular dichroism chirality wave absorber |
| CN112630869A (en) * | 2020-12-30 | 2021-04-09 | 中国人民解放军军事科学院国防科技创新研究院 | Polarization device based on diffraction chiral metamaterial, preparation method and photoelectronic device |
| CN114235712A (en) * | 2021-12-08 | 2022-03-25 | 大连海事大学 | Monomolecular sensor based on chiral metal nanostructure array |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109521509A (en) * | 2018-12-07 | 2019-03-26 | 中山科立特光电科技有限公司 | A kind of plane micro-nano structure can produce circular dichroism signal |
| CN110208186A (en) * | 2019-04-28 | 2019-09-06 | 陕西师范大学 | A kind of micronano optical structure |
| CN109991168A (en) * | 2019-05-05 | 2019-07-09 | 韩山师范学院 | A kind of plane micro-nano structure can produce circular dichroism |
| CN109991168B (en) * | 2019-05-05 | 2021-09-07 | 韩山师范学院 | Planar micro-nano structure capable of generating circular dichroism |
| CN110865428A (en) * | 2019-11-28 | 2020-03-06 | 陕西师范大学 | Preparation of strong-induction CD structure and preparation method thereof |
| CN110865428B (en) * | 2019-11-28 | 2021-08-24 | 陕西师范大学 | Preparation of strong-induction CD structure and preparation method thereof |
| CN111641046A (en) * | 2020-05-07 | 2020-09-08 | 宁波大学 | Microwave band broadband circular dichroism chirality wave absorber |
| CN112630869A (en) * | 2020-12-30 | 2021-04-09 | 中国人民解放军军事科学院国防科技创新研究院 | Polarization device based on diffraction chiral metamaterial, preparation method and photoelectronic device |
| CN112630869B (en) * | 2020-12-30 | 2021-10-29 | 中国人民解放军军事科学院国防科技创新研究院 | Polarization device based on diffraction chiral metamaterial, preparation method and photoelectronic device |
| CN114235712A (en) * | 2021-12-08 | 2022-03-25 | 大连海事大学 | Monomolecular sensor based on chiral metal nanostructure array |
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