CN108865115A - A kind of photoelectric material preparation method of acid imide containing graphene and its derivative - Google Patents

A kind of photoelectric material preparation method of acid imide containing graphene and its derivative Download PDF

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CN108865115A
CN108865115A CN201810562941.2A CN201810562941A CN108865115A CN 108865115 A CN108865115 A CN 108865115A CN 201810562941 A CN201810562941 A CN 201810562941A CN 108865115 A CN108865115 A CN 108865115A
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acid imide
graphene
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filtrate
alkynyl
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林前锋
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Hunan Guosheng Graphite Technology Co Ltd
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Abstract

The invention discloses the photoelectric material preparation methods of a kind of acid imide containing graphene and its derivative.Include the following steps:A. acid imide or derivatives thereof is blended with graphene, said mixture heating for dissolving is formed into solution W in high boiling solvent;B. under inert gas shielding and under heating, solution W is filtered while hot, filtrate is kept in dark place;C. it is added additive into filtrate, the holding time≤for 24 hours;D., filtrate is distilled to removal solvent under vacuum conditions, obtains mixture of the acid imide or derivatives thereof with graphene.By the way that graphene and additive are added in acid imide or derivatives thereof, after obtained intermingling material film forming, relatively before the acid imide film forming for being not added with graphene and additive after obtained electron mobility be obviously improved.

Description

A kind of photoelectric material preparation method of acid imide containing graphene and its derivative
Technical field
The invention belongs to optoelectronic materials technologies.More particularly, to a kind of acid imide containing graphene and its The photoelectric material preparation method of derivative.
Background technique
In recent years, imide derivative attracts attention in the application aspect of organic photoelectric functional material, widely Applied to fields such as organic photovoltaic cell, optical conductor, electroluminescent, self assembly and biological fluorescent labelings.This aspect be due to Acid imide material has good light, heat and resistance to weather, corrosion resistance, chemical inertness, optical absorption characteristics and higher Fluorescence quantum yield the features such as;It on the other hand is that there is big total phenyl ring planar structure and two imines ring structures due to it, It is a kind of typical n-type material with high electron affinity and very strong electronic capability.Additionally can at " bay " and Amide position is modified its dissolubility, photoelectric property.At present, the progress both at home and abroad about acid imide material is equal It has been reported that, imide derivative has very big as a kind of performance n-type material outstanding in fields such as organic photovoltaic cells Potentiality, with going deep into for research, the application of field of photovoltaic materials will be more and more.
Acid imide is as the major defect of n-type material, and compared with PCBM, electron mobility is lower.Such as PCBM Electron mobility can generally reach 10-3~10-2cm2V-1s-1, and the electron mobility of acid imide or derivatives thereof is only capable of reaching 10-8~10-5cm2V-1s-1.Therefore, need to overcome acid imide and its not high defect of derivative electron mobility.
Summary of the invention
The present invention is directed to overcome above-mentioned the deficiencies in the prior art, graphene is added to shape in acid imide or derivatives thereof At blend, electron mobility is obviously improved after this blend film forming.
Specifically, above-mentioned purpose of the present invention is achieved through the following technical solutions:
The photoelectric material preparation method of a kind of acid imide containing graphene and its derivative, includes the following steps:
A. acid imide or derivatives thereof is blended with graphene, said mixture is dissolved by heating in high boiling solvent Form solution W;
B. under inert gas shielding and under heating, solution W is filtered while hot, filtrate is kept in dark place;
C. it is added additive into filtrate, the holding time≤for 24 hours;
D., filtrate is distilled to removal solvent under vacuum conditions, obtains mixing of the acid imide or derivatives thereof with graphene Object;
Wherein, the molecular structural formula of acid imide and its derivative is:
Wherein, R1、R2For C1-C22 alkyl perhaps the alkoxy alkyl of C1-C22 or alkoxy be straight chain, branch Chain or ring-type, wherein one or more carbon atoms can be by oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxylics Base, ester group, cyano, nitro replace, and hydrogen atom can be by halogen atom, oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl Base, carboxyl, ester group, cyano or nitro replace;
X1-X4For hydrogen atom, halogen atom, oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxyl, ester group, Cyano or nitro;
Wherein, the mass ratio of the acid imide and graphene is 1:(0.01-0.1);The additive is diiodo-octane Or chloronaphthalene;Accounting of the additive in solution W filtrate is 0.1-1wt%.
Further, the photoelectric material preparation method of a kind of acid imide containing graphene and its derivative, the height Boiling point solvent and donor material mass ratio are 10:1~100:1.
Further, the photoelectric material preparation method of a kind of acid imide containing graphene and its derivative, wherein institute The molecular structural formula for stating acid imide and its derivative is
Wherein, R1、R2For C1-C22 alkyl perhaps the alkoxy alkyl of C1-C22 or alkoxy be straight chain, branch Chain or ring-type, wherein one or more carbon atoms can be by oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxylics Base, ester group, cyano, nitro replace, and hydrogen atom can be by halogen atom, oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl Base, carboxyl, ester group, cyano or nitro replace;
X1-X4For halogen atom.
The advantage of the invention is that:
Graphene has good photoelectric properties and electron mobility, itself and acid imide or derivatives thereof are carried out physics It is blended, additive is added, uniform structure can be formed.Blend solution film forming can effectively be promoted into electricity as n-type material Transport factor.
Detailed description of the invention
Fig. 1 is blend film (imide derivative in embodiment 1:Graphene=1:0.01) Atomic Mechanics microscope Figure.
Fig. 2 is blend film (imide derivative in embodiment 2:Graphene=1:0.05) Atomic Mechanics microscope Figure.
Fig. 3 is blend film (imide derivative in embodiment 3:Graphene=1:0.1) Atomic Mechanics microscope figure.
Fig. 4 is blend film (imide derivative in embodiment 4:Graphene=1:0.1) Atomic Mechanics microscope figure.
Fig. 5 is the structure of imide derivative in embodiment 1 and embodiment 5.
Fig. 6 is the structure of imide derivative in embodiment 2 and embodiment 5.
Fig. 7 is the structure of imide derivative in embodiment 3 and embodiment 5.
Fig. 8 is the structure of imide derivative in embodiment 4.
Fig. 9 is the structure of imide derivative in embodiment 5.
Figure 10 is the structure of imide derivative in embodiment 5.
Figure 11 is the structure of imide derivative in embodiment 5.
Figure 12 is the structure of imide derivative in embodiment 5.
Specific embodiment
The present invention is further illustrated below in conjunction with Figure of description and specific embodiment, but embodiment is not to the present invention It limits in any form.Unless stated otherwise, the present invention uses reagent, method and apparatus routinely try for the art Agent, method and apparatus.
Unless stated otherwise, following embodiment agents useful for same and material are commercially available.
Embodiment 1
Imide derivative and graphene are mixed to form blend, and mass ratio is imide derivative:Graphene= 1:0.01, blends described above is dissolved in chlorobenzene and is heated to 100 DEG C, formation solution W;Under protection of argon gas, solution W is kept Temperature is 100 DEG C, is filtered while hot with the filter that aperture is 0.45 micron, filtrate is stored in brown reagent bottle, is then added Diiodo-octane saves 3h.Filtrate is finally distilled to removal solvent under vacuum conditions, obtains imide derivative and graphene Mixture.
When electron mobility to be tested, first said mixture is again dissolved in 100 DEG C of chlorobenzenes, and spin coating is at blend film, With a thickness of 40nm.The hole mobility of intermingling material is measured using the method for space charge limited current (SCLC).SCLC device Structure is ITO/PEDOT/ blend film/MoO3/Al.According to formula:JSCLC=(9/8) εoεrμo(V2/L3), it is calculated, J is Electric current, μoIt is the mobility under zero strength, εoIt is permittivity of vacuum, εrIt is the dielectric constant of material, L is the thickness of material, V It is the effective voltage of polymeric layer, by the application voltage (V of deviceappl) subtract the built in field voltage (V of devicebi) and device its Voltage drop (the V of its layer resistances):V=Vappl-Vbi-Vs.The mobility of device can pass through J1/2The slope of curve of-V calculates It arrives.Blend film has been done electron mobility test by us, as a comparison, also tested a series of orthogonal tests.Acquired results are such as Under.
Wherein the structure of imide derivative is as shown in Figure 5.
Embodiment 2
Imide derivative and graphene are mixed to form blend, and mass ratio is imide derivative:Graphene= 1:0.05, blends described above is dissolved in toluene and is heated to 120 DEG C, formation solution W;Under protection of argon gas, solution W is kept Temperature is 120 DEG C, is filtered while hot with the filter that aperture is 0.7 micron, filtrate is stored in brown reagent bottle, is then added two Iodo-octane saves 5h.Filtrate is finally distilled to removal solvent under vacuum conditions, obtains imide derivative and graphene Mixture.
When electron mobility to be tested, first said mixture is again dissolved in 120 DEG C of toluene, and spin coating is at blend film, With a thickness of 40nm.The hole mobility of intermingling material is measured using the method for space charge limited current (SCLC).SCLC device Structure is ITO/PEDOT/ blend film/MoO3/Al.According to formula:JSCLC=(9/8) εoεrμo(V2/L3), it is calculated, J is Electric current, μoIt is the mobility under zero strength, εoIt is permittivity of vacuum, εrIt is the dielectric constant of material, L is the thickness of material, V It is the effective voltage of polymeric layer, by the application voltage (V of deviceappl) subtract the built in field voltage (V of devicebi) and device its Voltage drop (the V of its layer resistances):V=Vappl-Vbi-Vs.The mobility of device can pass through J1/2The slope of curve of-V calculates It arrives.Blend film has been done electron mobility test by us, as a comparison, also tested a series of orthogonal tests.Acquired results are such as Under.
Wherein the structure of imide derivative is as shown in Figure 6.
Embodiment 3
Imide derivative and graphene are mixed to form blend, and mass ratio is imide derivative:Graphene= 1:0.1, blends described above is dissolved in trimethylbenzene and is heated to 140 DEG C, formation solution W;Under protection of argon gas, solution is kept W temperature is 140 DEG C, is filtered while hot with the filter that aperture is 1 micron, filtrate is stored in brown reagent bottle, chlorine is then added Naphthalene saves 5h.Filtrate is finally distilled to removal solvent under vacuum conditions, obtains the mixing of imide derivative and graphene Object.
When electron mobility to be tested, first said mixture is again dissolved in 140 DEG C of trimethylbenzenes, and spin coating is at blending Film, with a thickness of 40nm.The hole mobility of intermingling material is measured using the method for space charge limited current (SCLC).SCLC device Part structure is ITO/PEDOT/ blend film/MoO3/Al.According to formula:JSCLC=(9/8) εoεrμo(V2/L3), it is calculated, J It is electric current, μoIt is the mobility under zero strength, εoIt is permittivity of vacuum, εrIt is the dielectric constant of material, L is the thickness of material, V is the effective voltage of polymeric layer, by the application voltage (V of deviceappl) subtract the built in field voltage (V of devicebi) and device Voltage drop (the V of other layers of resistances):V=Vappl-Vbi-Vs.The mobility of device can pass through J1/2The slope of curve of-V calculates It arrives.Blend film has been done electron mobility test by us, as a comparison, also tested a series of orthogonal tests.Acquired results are such as Under.
Wherein the structure of imide derivative is as shown in Figure 7.
Embodiment 4
Imide derivative and graphene are mixed to form blend, and mass ratio is imide derivative:Graphene= 1:0.1, blends described above is dissolved in dimethylbenzene and is heated to 140 DEG C, formation solution W;Under protection of argon gas, solution is kept W temperature is 140 DEG C, is filtered while hot with the filter that aperture is 1 micron, filtrate is stored in brown reagent bottle, chlorine is then added Naphthalene saves 5h.Filtrate is finally distilled to removal solvent under vacuum conditions, obtains the mixing of imide derivative and graphene Object.
When electron mobility to be tested, first said mixture is again dissolved in 140 DEG C of dimethylbenzene, and spin coating is at blending Film, with a thickness of 40nm.The hole mobility of intermingling material is measured using the method for space charge limited current (SCLC).SCLC device Part structure is ITO/PEDOT/ blend film/MoO3/Al.According to formula:JSCLC=(9/8) εoεrμo(V2/L3), it is calculated, J It is electric current, μoIt is the mobility under zero strength, εoIt is permittivity of vacuum, εrIt is the dielectric constant of material, L is the thickness of material, V is the effective voltage of polymeric layer, by the application voltage (V of deviceappl) subtract the built in field voltage (V of devicebi) and device Voltage drop (the V of other layers of resistances):V=Vappl-Vbi-Vs.The mobility of device can pass through J1/2The slope of curve of-V calculates It arrives.Blend film has been done electron mobility test by us, as a comparison, also tested a series of orthogonal tests.Acquired results are such as Under.
Wherein the structure of imide derivative is as shown in Figure 8.
Embodiment 5
Different imide derivatives and graphene are mixed to form blend, and mass ratio is imide derivative:Stone Black alkene=1:0.05, blends described above is dissolved in dimethylbenzene and is heated to 140 DEG C, formation solution W;Under protection of argon gas, Keeping solution W temperature is 140 DEG C, is filtered, filtrate is stored in brown reagent bottle, so with the filter that aperture is 1 micron while hot After be added chloronaphthalene, save 5h.Filtrate is finally distilled to removal solvent under vacuum conditions, obtains imide derivative and graphite The mixture of alkene.
When electron mobility to be tested, first said mixture is again dissolved in 140 DEG C of dimethylbenzene, and spin coating is at blending Film, with a thickness of 30nm.The hole mobility of intermingling material is measured using the method for space charge limited current (SCLC).SCLC device Part structure is ITO/PEDOT/ blend film/MoO3/Al.According to formula:JSCLC=(9/8) εoεrμo(V2/L3), it is calculated, J It is electric current, μoIt is the mobility under zero strength, εoIt is permittivity of vacuum, εrIt is the dielectric constant of material, L is the thickness of material, V is the effective voltage of polymeric layer, by the application voltage (V of deviceappl) subtract the built in field voltage (V of devicebi) and device Voltage drop (the V of other layers of resistances):V=Vappl-Vbi-Vs.The mobility of device can pass through J1/2The slope of curve of-V calculates It arrives.Blend film has been done electron mobility test by us, as a comparison, also tested a series of orthogonal tests.Acquired results are such as Under.
The above embodiment is a preferred embodiment of the present invention, but embodiments of the present invention are not by above-described embodiment Limitation, other any changes, modifications, substitutions, combinations, simplifications made without departing from the spirit and principles of the present invention, It should be equivalent substitute mode, be included within the scope of the present invention.

Claims (3)

1. the photoelectric material preparation method of a kind of acid imide containing graphene and its derivative, which is characterized in that including such as Lower step:
A. acid imide or derivatives thereof is blended with graphene, said mixture is dissolved by heating and is formed in high boiling solvent Solution W;
B. under inert gas shielding and under heating, solution W is filtered while hot, filtrate is kept in dark place;
C. it is added additive into filtrate, the holding time≤for 24 hours;
D., filtrate is distilled to removal solvent under vacuum conditions, obtains mixture of the acid imide or derivatives thereof with graphene;
Wherein, the molecular structural formula of acid imide and its derivative is:
Wherein, R1、R2For C1-C22 alkyl perhaps the alkoxy alkyl of C1-C22 or alkoxy be straight chain, branch or Person is cyclic annular, wherein one or more carbon atoms can be by oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxyl, ester Base, cyano, nitro replace, and hydrogen atom can be by halogen atom, oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxylic Base, ester group, cyano or nitro replace;
X1-X4For hydrogen atom, halogen atom, oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxyl, ester group, cyano Or nitro;
Wherein, the mass ratio of the acid imide and graphene is 1:0.01-0.1;The additive is diiodo-octane or chloronaphthalene; Accounting of the additive in solution W filtrate is 0.1-1wt%.
2. the photoelectric material preparation method of a kind of acid imide containing graphene and its derivative according to claim 1, It is characterized in that, the high boiling solvent is 10 with quality of materials ratio is blended:1~100:1.
3. the photoelectric material preparation method of a kind of acid imide containing graphene and its derivative according to claim 1, It is characterized in that, the molecular structural formula of the acid imide and its derivative is
Wherein, R1、R2For C1-C22 alkyl perhaps the alkoxy alkyl of C1-C22 or alkoxy be straight chain, branch or Person is cyclic annular, wherein one or more carbon atoms can be by oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxyl, ester Base, cyano, nitro replace, and hydrogen atom can be by halogen atom, oxygen atom, alkenyl, alkynyl, aryl, hydroxyl, amino, carbonyl, carboxylic Base, ester group, cyano or nitro replace;
X1-X4For halogen atom.
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Application publication date: 20181123