CN108864466A - A kind of manufacturing method with pattern nucleopore membranes - Google Patents
A kind of manufacturing method with pattern nucleopore membranes Download PDFInfo
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- CN108864466A CN108864466A CN201810756578.8A CN201810756578A CN108864466A CN 108864466 A CN108864466 A CN 108864466A CN 201810756578 A CN201810756578 A CN 201810756578A CN 108864466 A CN108864466 A CN 108864466A
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- manufacturing
- material film
- pattern
- macromolecule material
- nucleopore membranes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
The invention belongs to nuclear track etching technique fields, are related to a kind of manufacturing method with pattern nucleopore membranes.The manufacturing method in turn includes the following steps：(1) it irradiates：Macromolecule material film is irradiated；(2) it is heat-treated：Macromolecule material film after irradiation is placed on bottom plate resistant to high temperature, places be heat-treated with figuratum heat treatment template again thereon；(3) it etches：Macromolecule material film after heat treatment is placed in chemical etching liquor and is etched；(4) it cleans and dries：Macromolecule material film after etching is cleaned and dried.It, being capable of simple, low cost, time-saving manufacture band pattern nucleopore membranes using the manufacturing method of the invention with pattern nucleopore membranes.
Description
Technical field
The invention belongs to nuclear track etching technique fields, are related to a kind of manufacturing method with pattern nucleopore membranes.
Background technique
Nucleopore membranes are after utilizing heavy ion beam or reactor fission fragment irradiated polymer material film (former film) by changing
Learn a kind of microporous barrier that etching obtains.And using after Heavy Ion Beams Irradiation high molecular material by attaching most importance to of obtaining of chemical etching from
Sub- microporous barrier belongs to one kind of nucleopore membranes.
The manufacturing process of nucleopore membranes is divided into three steps, and the first step is irradiation, and second step is etching, and final step is cleaning, drying
Finished product out.Produce certain pattern in nucleopore membranes, have the characteristics that easy to identify, difficult imitation, can be widely used for trade mark or
Mark.
The pattern-making in nucleopore membranes there are two ways to.
First is that being imaged using mold.Also there are two types of modes for mold imaging.First way is irradiated in macromolecule material film
When, pattern mold is added before macromolecule material film, it is desirable that mold and former film are irradiated simultaneously, are then obtained through overetch
To pattern.This kind of mode requires synchronism to bring new requirement to the irradiation of macromolecule material film, due to poor synchronization
Influence the effect of pattern.The second way is to need after nucleopore membranes etch plus band pattern mold macromolecule material film
Double-layer films are combined together, therefore increase the combined process of double-layer films.
Second is that by smearing glue-line.Smearing glue-line, also there are two types of modes, and first way is in macromolecule material film spoke
The anti-radiation glue-line with setting pierced pattern is coated on one side according to preceding, prevents heavy ion beam current or reactor fission heap to high score
The irradiation of sub- material film finally carries out chemical etching and obtains with figuratum nucleopore membranes.This kind of antiacid alkali of mode coating needs
Etching.The second way is after the irradiation of former film, and the thin-film template with pierced pattern together, is then etched with melt viscosity,
Hollow out is exactly pattern, it is desirable that is combined together for two layers.The second way needs double-layer films, more wasteful.
Summary of the invention
The object of the present invention is to provide a kind of manufacturing method with pattern nucleopore membranes, with can simple, low cost, save when
Between manufacture band pattern nucleopore membranes.
In order to achieve this, the present invention provides a kind of manufacturing method with pattern nucleopore membranes in the embodiment on basis,
The manufacturing method in turn includes the following steps：
(1) it irradiates：Macromolecule material film is irradiated；
(2) it is heat-treated：Macromolecule material film after irradiation is placed on bottom plate resistant to high temperature, is placed again thereon with figure
The heat treatment template of case is heat-treated；
(3) it etches：Macromolecule material film after heat treatment is placed in chemical etching liquor and is etched；
(4) it cleans and dries：Nucleopore membranes after etching are cleaned and dried.
In a preferred embodiment, the present invention provides a kind of manufacturing method with pattern nucleopore membranes, wherein step
(1) in, the macromolecule material film is PC, PET, PI or PP film.
In a preferred embodiment, the present invention provides a kind of manufacturing method with pattern nucleopore membranes, wherein step
(1) in, the macromolecule material film with a thickness of 10-100 μm.
In a preferred embodiment, the present invention provides a kind of manufacturing method with pattern nucleopore membranes, wherein step
(1) in, the fission fragment irradiation that the high energy ion beam or reactor generated with accelerator the generates macromolecule material film.
In a preferred embodiment, the present invention provides a kind of manufacturing method with pattern nucleopore membranes, wherein step
(2) in, the heat treatment temperature is 100-500 DEG C, and the time is 10-120 seconds.
In a preferred embodiment, the present invention provides a kind of manufacturing method with pattern nucleopore membranes, wherein step
(3) in, the chemical etching liquor is selected from NaOH solution, NaClO solution or H2SO4And K2Cr2O7Mixed solution.
In a preferred embodiment, the present invention provides a kind of manufacturing method with pattern nucleopore membranes, wherein step
(3) in, the time of the etching is 10-300 minutes, and etching solution temperature is 40-90 DEG C.
In a preferred embodiment, the present invention provides a kind of manufacturing method with pattern nucleopore membranes, wherein step
(4) it in, is cleaned 2-5 times with deionized water, is dried in an oven.
The beneficial effects of the present invention are, using the manufacturing method of the invention with pattern nucleopore membranes, can it is simple, low at
Originally, time-saving manufacture band pattern nucleopore membranes.
The present invention obtains the nucleopore membranes with potential pattern by heat treatment.Macromolecule material film by heavy ion beam or
After the irradiation of reactor fragment, by being heat-treated with figuratum heat treatment template to former film, macromolecule material film warp
Overheating Treatment will deform after for a period of time, after overetch, the place through Overheating Treatment and the ground without Overheating Treatment
Fang Yanse is different.Place without Overheating Treatment normally portals white is presented, through Overheating Treatment it is more of light color close to
Former film true qualities are to obtain with figuratum nucleopore membranes.The present invention solves to be needed and macromolecule material film one in the prior art
The problem of rotating synchronously irradiation is acted, the difficulty of former film irradiation is reduced；Also it solves the problems, such as to smear glue-line, does not need to smear and appoint
What material (materials such as anti-radiation glue, hot melt adhesive), and thin film is only needed, additional film is not needed as substrate.Cause
This, method save the cost of the invention saves the operating time.
Detailed description of the invention
The schematic diagram that Fig. 1 is embodiment 1, is heat-treated in embodiment 2.
Fig. 2 is a kind of instance graph (heat treatment time 10 seconds) with pattern nucleopore membranes that the method for embodiment 1 manufactures.
Fig. 3 is another instance graph (heat treatment time 40 seconds) with pattern nucleopore membranes that the method for embodiment 1 manufactures.
Fig. 4 is a kind of instance graph (heat treatment time 60 seconds) with pattern nucleopore membranes that the method for embodiment 2 manufactures.
Fig. 5 is another instance graph (heat treatment time 120 seconds) with pattern nucleopore membranes that the method for embodiment 2 manufactures.
Specific embodiment
A specific embodiment of the invention is further illustrated with attached drawing with reference to embodiments.
Embodiment 1：Manufacture (one) with pattern nucleopore membranes
Step manufacture band pattern nucleopore membranes with the following method.
(1) it irradiates
Polyester (PET) film with a thickness of 10 μm is selected, is added in the HI-13 electrostatic tandem of China Atomic Energy Science Research Institute
It is irradiated on fast device, which provides incoming particle beam32S, projectile energy 140MeV, density are 5 × 105A/cm2。
(2) it is heat-treated
PET film after irradiation is placed in bottom plate resistant to high temperature (for 316 stainless steel plates), is placed again with pattern thereon
The heat treatment template of (pattern is depending on the pattern to be etched) is heat-treated, and the temperature of heat treatment is 100 DEG C, and the time is respectively
10 seconds and 40 seconds.The principle of heat treatment is thin in high molecular material as shown in Figure 1, place macromolecule material film 2 on bottom plate 3
It places on film 2 and is heat-treated with figuratum heat treatment template 1 again.
(3) it etches
PET film after heat treatment is placed in the NaOH solution of 2mol/L and is etched, etching period 10min, erosion
Etching solution temperature is 40 DEG C.
(4) it cleans and dries
PET film after etching is cleaned 2 times with deionized water, then 50 DEG C of drying in an oven.
After above-mentioned steps, local micropore in PET film through Overheating Treatment disappears or becomes smaller, and without heat
The place of processing forms striking contrast.The thermally treated place of PET film is pattern, and not thermally treated place is normal
Nucleopore membranes with holes thus form a kind of patterned nucleopore membranes (referring to figs. 2 and 3).The time of heat treatment is longer, through heat
The ground square hole of processing is with regard to smaller until disappearing.
Embodiment 2：Manufacture (two) with pattern nucleopore membranes
Step manufacture band pattern nucleopore membranes with the following method.
(1) it irradiates
The PI film with a thickness of 100 μm is selected, on the HI-13 electrostatic tandem accelerator of China Atomic Energy Science Research Institute
It is irradiated, which provides incoming particle beam32S, projectile energy 140MeV, density are 5 × 105A/cm2。
(2) it is heat-treated
PI film after irradiation is placed in bottom plate resistant to high temperature (for 316 stainless steel plates), is placed again with pattern thereon
The heat treatment template of (pattern is depending on the pattern to be etched), heat treatment temperature are 500 DEG C, and the time is respectively 60 seconds and 120 seconds.
The principle of heat treatment is placed on macromolecule material film 2 again as shown in Figure 1, place macromolecule material film 2 on bottom plate 3
It is heat-treated with figuratum heat treatment template 1.
(3) it etches
PI film after heat treatment is placed in the NaClO solution that mass percent concentration is 10% and is etched, when etching
Between be 300min, etch temperature be 90 DEG C.
(4) it cleans and dries
PI film after etching is cleaned 5 times with deionized water, then 60 DEG C of drying in an oven.
After above-mentioned steps, thermally treated local micropore disappears or becomes smaller on PI film, and not thermally treated
Place form comparison.The thermally treated place of PI film is pattern, and not thermally treated place is normal nucleopore with holes
Film thus forms a kind of patterned nucleopore membranes (referring to fig. 4 and Fig. 5).The time of heat treatment is longer, thermally treated place
Hole is with regard to smaller until disappearing.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art
Mind and range.If in this way, belonging to the model of the claims in the present invention and its equivalent technology to these modifications and changes of the present invention
Within enclosing, then the present invention is also intended to include these modifications and variations.Above-described embodiment or embodiment are only to the present invention
For example, the present invention can also be implemented with other ad hoc fashions or other particular form, without departing from of the invention
Main idea or substantive characteristics.Therefore, the embodiment of description is regarded as illustrative and non-limiting in any way.This
The range of invention should be illustrated that any variation equivalent with the intention and range of claim also should include by appended claims
Within the scope of the invention.
Claims (8)
1. a kind of manufacturing method with pattern nucleopore membranes, which is characterized in that the manufacturing method in turn includes the following steps：
(1) it irradiates：Macromolecule material film is irradiated；
(2) it is heat-treated：Macromolecule material film after irradiation is placed on bottom plate resistant to high temperature, is placed again with figuratum thereon
Heat treatment template is heat-treated；
(3) it etches：Macromolecule material film after heat treatment is placed in chemical etching liquor and is etched；
(4) it cleans and dries：Macromolecule material film after etching is cleaned and dried.
2. the manufacturing method according to claim 1, it is characterised in that：In step (1), the macromolecule material film is
PC, PET, PI or PP film.
3. the manufacturing method according to claim 1, it is characterised in that：In step (1), the macromolecule material film
With a thickness of 10-100 μm.
4. the manufacturing method according to claim 1, it is characterised in that：In step (1), with the energetic ion of accelerator generation
The fission fragment irradiation that beam or reactor the generate macromolecule material film.
5. the manufacturing method according to claim 1, it is characterised in that：In step (2), the heat treatment temperature is 100-
500 DEG C, the time is 10-120 seconds.
6. the manufacturing method according to claim 1, it is characterised in that：In step (3), the chemical etching liquor is selected from
NaOH solution, NaClO solution or H2SO4And K2Cr2O7Mixed solution.
7. the manufacturing method according to claim 1, it is characterised in that：In step (3), the time of the etching is 10-
300 minutes, etching solution temperature was 40-90 DEG C.
8. the manufacturing method according to claim 1, it is characterised in that：In step (4), cleaned 2-5 times with deionized water,
It is dried in baking oven.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810756578.8A CN108864466A (en) | 2018-07-11 | 2018-07-11 | A kind of manufacturing method with pattern nucleopore membranes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810756578.8A CN108864466A (en) | 2018-07-11 | 2018-07-11 | A kind of manufacturing method with pattern nucleopore membranes |
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| Publication Number | Publication Date |
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| CN108864466A true CN108864466A (en) | 2018-11-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201810756578.8A Pending CN108864466A (en) | 2018-07-11 | 2018-07-11 | A kind of manufacturing method with pattern nucleopore membranes |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111530297A (en) * | 2020-04-22 | 2020-08-14 | 中国原子能科学研究院 | Method for manufacturing nuclear pore membrane with pattern |
Citations (4)
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|---|---|---|---|---|
| CN1160911A (en) * | 1997-01-07 | 1997-10-01 | 高元杰 | Porous anti-fake mark making technology and equipment |
| CN1184992A (en) * | 1997-12-12 | 1998-06-17 | 清华大学 | Method for mfg. nuclear track anti-counterfeit adhesive film |
| CN1201962A (en) * | 1998-06-26 | 1998-12-16 | 清华大学 | Manufacture of anti-faking membrane |
| CN2570907Y (en) * | 2002-06-06 | 2003-09-03 | 中山国安火炬科技发展有限公司 | Integrated millipore digital false proof mark |
-
2018
- 2018-07-11 CN CN201810756578.8A patent/CN108864466A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1160911A (en) * | 1997-01-07 | 1997-10-01 | 高元杰 | Porous anti-fake mark making technology and equipment |
| CN1184992A (en) * | 1997-12-12 | 1998-06-17 | 清华大学 | Method for mfg. nuclear track anti-counterfeit adhesive film |
| CN1201962A (en) * | 1998-06-26 | 1998-12-16 | 清华大学 | Manufacture of anti-faking membrane |
| CN2570907Y (en) * | 2002-06-06 | 2003-09-03 | 中山国安火炬科技发展有限公司 | Integrated millipore digital false proof mark |
Non-Patent Citations (1)
| Title |
|---|
| ZHANG LISHENG: "Study on filtration properties of nuclear track membrane", 《RADIATION MEASUREMENTS》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111530297A (en) * | 2020-04-22 | 2020-08-14 | 中国原子能科学研究院 | Method for manufacturing nuclear pore membrane with pattern |
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Application publication date: 20181123 |
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